CN113341660A - Shock suppression bearing seat of precision lithography machine - Google Patents

Shock suppression bearing seat of precision lithography machine Download PDF

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Publication number
CN113341660A
CN113341660A CN202110649299.3A CN202110649299A CN113341660A CN 113341660 A CN113341660 A CN 113341660A CN 202110649299 A CN202110649299 A CN 202110649299A CN 113341660 A CN113341660 A CN 113341660A
Authority
CN
China
Prior art keywords
seat
light source
main body
bottom plate
fixedly arranged
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110649299.3A
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Chinese (zh)
Inventor
商富彬
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jiangsu Ruixin Integrated Circuit Equipment Co ltd
Original Assignee
Jiangsu Ruixin Integrated Circuit Equipment Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jiangsu Ruixin Integrated Circuit Equipment Co ltd filed Critical Jiangsu Ruixin Integrated Circuit Equipment Co ltd
Priority to CN202110649299.3A priority Critical patent/CN113341660A/en
Publication of CN113341660A publication Critical patent/CN113341660A/en
Pending legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

The invention provides a shock suppression bearing seat of a precision lithography machine, which comprises a front end sub-seat, a middle main body seat and a tail end maintenance seat which are sequentially arranged in a straight line shape; the front-end light source sub-seat is fixedly arranged on a working site, and the upper surface of the front-end light source sub-seat is used for installing and fixing light source media; the middle main body seat is fixedly arranged on a working site; the tail end maintenance seat is fixedly arranged on a work site, the side edge of the tail end maintenance seat is tightly attached to the side edge of the middle main body seat, the tail end maintenance seat and the front end light source are respectively arranged on two sides of the middle main body seat, and the upper surface of the tail end maintenance seat is used for fixing the wafer processing device. The invention provides a shock suppression bearing seat of a precise photoetching machine, which is purposefully provided with a double-fixing structure and can meet the requirement of fixed installation of the photoetching machine, so that stable and precise production of the photoetching machine can be ensured.

Description

Shock suppression bearing seat of precision lithography machine
Technical Field
The invention relates to the technical field of photoetching machine fixing equipment, in particular to a shock suppression bearing seat of a precision photoetching machine.
Background
In the semiconductor industry, a lithography machine is a crucial production device, the production precision of which directly determines the basic performance of the product, and the lithography machine is very harsh to the production environment.
In order to ensure the installation environment of the lithography machine, the bearing seat for fixing the lithography machine on a working site is particularly critical. However, at present, there is no supporting socket that satisfies the fixed installation of the lithography machine, so as to ensure the stable and precise production of the lithography machine.
Disclosure of Invention
The present invention is directed to a shock-suppressing bearing seat of a precision lithography machine to solve the above-mentioned problems.
In order to achieve the purpose, the invention provides the following technical scheme: a shock suppression bearing seat of a precision lithography machine comprises a front end sub-seat, a middle main body seat and a tail end maintenance seat which are sequentially arranged in a straight line;
the front-end light source sub-seat is fixedly arranged on a working site, and the upper surface of the front-end light source sub-seat is used for installing and fixing light source media;
the middle body seat is fixedly arranged on a working site, the side edge of the middle body seat is tightly attached to the side edge of the front end light source sub-seat, and the upper surface of the middle body seat is used for fixing the main body of the photoetching machine;
the tail end maintenance seat is fixedly arranged on a work site, the side edge of the tail end maintenance seat is tightly attached to the side edge of the middle main body seat, the tail end maintenance seat and the front end light source are respectively arranged on two sides of the middle main body seat, and the upper surface of the tail end maintenance seat is used for fixing the wafer processing device.
As an improvement of the present invention, the front-end light source sub-mount includes:
the mounting working table is of a plate-shaped structure, and a plurality of movable plates for mounting light source media are embedded on the mounting working table;
the fixed support column is fixedly arranged on the lower surface of the mounting workbench surface and is of a cuboid block structure;
the shockproof support is fixedly arranged on the lower surface of the installation workbench surface;
the shockproof strut is arranged at a position close to the middle main body seat.
As an improvement of the present invention, the strut includes:
the fixed bottom plate is of a plate-shaped structure;
the I-shaped reinforcing frame is fixedly arranged on the upper end surface of the fixed bottom plate;
the upper fixing plate is fixedly connected with the upper end of the I-shaped reinforcing frame;
and a lower anchoring device and an upper jacking device are arranged on the shockproof strut.
As an improvement of the invention, it is characterized in that,
the lower anchoring device includes:
the upper end of the first branch pipe is fixedly connected with the lower surface of the mounting workbench surface, and the lower end of the first branch pipe is fixedly connected with the upper surface of the fixed bottom plate through a locking plate;
the anchoring rod is coaxially arranged in the first branch pipe, sequentially penetrates through the locking plate and the fixed bottom plate and is inserted into a working site, and the parts of the anchoring rod, which are positioned below the fixed bottom plate, are respectively provided with a butting clamping fin and an inverted claw;
the upper jacking device comprises:
the upper end of the second protective pipe is close to the lower surface of the mounting workbench surface, and the lower end of the second protective pipe is fixed on the upper surface of the upper fixing plate;
the sleeve is arranged between the upper fixing plate and the fixed bottom plate;
the screw rod is coaxially arranged in the second protective pipe in a built-in mode and is in threaded sleeve joint with the sleeve, and the upper end face of the screw rod is fixedly connected with the lower surface of the installation workbench face.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and claims hereof as well as the appended drawings.
The technical solution of the present invention is further described in detail by the accompanying drawings and embodiments.
Drawings
FIG. 1 is a schematic structural view of the present invention;
FIG. 2 is a front view of the present invention;
FIG. 3 is a schematic structural view of the anti-seismic brace of the present invention;
FIG. 4 is an interior cross-sectional view of the shock strut of the present invention.
The components in the figure are:
1. front-end sub-seats 11, an installation working table surface 12, a movable plate 13, a fixed strut 14, a shockproof strut 15, a fixed bottom plate 16, an I-shaped reinforcing frame 17 and an upper fixing plate,
2. a middle main body seat is arranged on the upper portion of the main body,
3. a tail end maintenance seat is arranged at the tail end of the device,
4. a lower anchoring device 41, a first branch pipe 42, a locking plate 43, an anchoring rod 44, an abutting clamping wing 45, an inverted claw,
5. the device comprises an upper jacking device 51, a second protective pipe 52, a sleeve pipe 53 and a screw rod.
Detailed Description
The preferred embodiments of the present invention will be described in conjunction with the accompanying drawings, and it will be understood that they are described herein for the purpose of illustration and explanation and not limitation.
Referring to fig. 1, a shock-suppressing bearing seat for a precision lithography machine includes a front sub-seat 1, a middle main body seat 2, and a tail maintenance seat 3, which are arranged in a line shape;
the front-end light source sub-seat is fixedly arranged on a working site, and the upper surface of the front-end light source sub-seat is used for installing and fixing light source media;
the middle body seat 2 is fixedly arranged on a working site, the side edge of the middle body seat 2 is tightly attached to the side edge of the front end light source sub-seat, and the upper surface of the middle body seat 2 is used for fixing a main body of the photoetching machine;
the tail end maintenance seat 3 is fixedly arranged on a work site, the side edge of the tail end maintenance seat 3 is tightly attached to the side edge of the middle main body seat 2, the tail end maintenance seat 3 and the front end light source are respectively arranged on two sides of the middle main body seat 2, and the upper surface of the tail end maintenance seat 3 is used for fixing a wafer processing device.
As an embodiment of the present invention, the front-end light source sub-mount includes:
the installation workbench surface 11 is of a plate-shaped structure, and a plurality of movable plates 12 for installing light source media are embedded on the installation workbench surface 11;
the fixed support column 13 is fixedly arranged on the lower surface of the mounting workbench surface 11, and the fixed support column 13 is of a cuboid block structure;
a shock-proof support column 14 fixedly arranged on the lower surface of the mounting workbench surface 11;
the shock absorbing strut 14 is disposed at a position close to the middle body mount 2.
As an embodiment of the present invention, the shock strut 14 includes:
a fixed base plate 15 having a plate-like structure;
an i-shaped reinforcing frame 16 fixedly provided on an upper end surface of the fixed base plate 15;
an upper fixing plate 17 fixedly connected to an upper end of the i-shaped reinforcing frame 16;
the shock strut 14 is provided with a lower anchoring device 4 and an upper jacking device 5.
As an example of the present invention, a,
the lower anchoring device 4 comprises:
the upper end of the first branch pipe 41 is fixedly connected with the lower surface of the installation workbench surface 11, and the lower end of the first branch pipe is fixedly connected with the upper surface of the fixed bottom plate 15 through a locking plate 42;
the anchoring rod 43 is coaxially arranged inside the first branch pipe 41, the anchoring rod 43 sequentially penetrates through the locking plate 42 and the fixed bottom plate 15 to be inserted into a work site, and the parts of the anchoring rod 43, which are positioned below the fixed bottom plate 15, are respectively provided with an abutting clamping fin 44 and a reverse claw 45;
the upper butting device 5 comprises:
the upper end of the second protective pipe 51 is close to the lower surface of the installation workbench surface 11, and the lower end is fixed on the upper surface of the upper fixing plate 17;
a sleeve 52, wherein the sleeve 52 is arranged between the upper fixing plate 17 and the fixing bottom plate 15;
and the screw 53 is coaxially arranged inside the second protection pipe 51 and is in threaded sleeve joint with the sleeve 52, and the upper end surface of the screw 53 is fixedly connected with the lower surface of the installation workbench surface 11.
The working principle and the beneficial effects of the technical scheme are as follows: the embodiment discloses a vibration suppression bearing seat for a precision lithography machine, which can provide a stable and reliable working environment. The general lithography machine has a light source medium part, a lithography main body part and a wafer processing part during installation work, wherein the stability of the light source medium part is particularly important. Therefore, the stability of the front-end light source sub-mount fixed on a working site is particularly important. In order to realize the stability of the front-end light source sub-seat, a supporting mode of a fixing support column 13 on one side and a shockproof support column 14 on the other side is adopted to realize the fixation. Wherein the shock-absorbing strut 14 is disposed on a side close to the middle body seat 2, the shock-absorbing function of the shock-absorbing strut 14 is mainly performed by the lower anchoring device 4 and the upper jacking device 5. When the front-end light source sub-seat shakes, the lower anchoring device 4 can be prevented from being lifted upwards, the upper jacking device 5 can be prevented from being pressed downwards, and the front-end light source sub-seat can be attached to the ground through the double structures of the lower anchoring device 4 and the upper jacking device 5.
The lower anchoring device 4 is fixedly connected with the front light source sub-seat through the first branch pipe 41, meanwhile, an anchoring rod 43 coaxially arranged in the first branch pipe 41 is inserted into the ground, an abutting clamping fin 44 arranged below the anchoring rod abuts against the fixed bottom plate 15 so as to have elastic abutting force with the fixed bottom plate, and the inverted claw 45 provides ground gripping force.
For the upper butting device 5, the matching of the screw 53 and the sleeve 52 can adjust the distance between the upper butting device and the front-end light source, and on the other hand, the upper butting device 5 can be prevented from being bent and deformed when stressed. Thereby avoiding the displacement of the front-end light source sub-seat caused by stress.
The invention provides a shock suppression bearing seat of a precise photoetching machine, which is purposefully provided with a double-fixing structure and can meet the requirement of fixed installation of the photoetching machine, so that stable and precise production of the photoetching machine can be ensured.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications may be made to the embodiments or portions thereof without departing from the spirit and scope of the invention.

Claims (4)

1. A shock suppression bearing seat of a precision lithography machine is characterized by comprising a front end sub-seat (1), a middle main body seat (2) and a tail end maintenance seat (3) which are sequentially arranged in a straight line;
the front-end light source sub-seat is fixedly arranged on a working site, and the upper surface of the front-end light source sub-seat is used for installing and fixing light source media;
the middle body seat (2) is fixedly arranged on a working site, the side edge of the middle body seat (2) is tightly attached to the side edge of the front end light source sub-seat, and the upper surface of the middle body seat (2) is used for fixing the main body of the photoetching machine;
terminal maintenance seat (3), fixed the setting in work place, the side of terminal maintenance seat (3) is hugged closely the side of middle part main part seat (2), just terminal maintenance seat (3) divide the seat with the front end light source to be listed as separately the both sides of middle part main part seat (2), the upper surface of terminal maintenance seat (3) is used for fixed wafer processing apparatus.
2. The shock absorbing socket of claim 1, wherein the front-end light source socket comprises:
the mounting table top (11), the mounting table top (11) is of a plate-shaped structure, and a plurality of movable plates (12) used for mounting light source media are embedded on the mounting table top (11);
the fixed support column (13) is fixedly arranged on the lower surface of the mounting working table top (11), and the fixed support column (13) is of a cuboid block structure;
the shockproof support column (14) is fixedly arranged on the lower surface of the mounting working table top (11);
the shockproof support column (14) is arranged at a position close to the middle main body seat (2).
3. The shock-absorbing mount for a precision lithography machine according to claim 2, wherein said shock-absorbing support (14) comprises:
the fixed bottom plate (15) is of a plate-shaped structure;
an I-shaped reinforcing frame (16) fixedly arranged on the upper end surface of the fixed bottom plate (15);
an upper fixing plate (17) fixedly connected with the upper end of the I-shaped reinforcing frame (16);
and a lower anchoring device (4) and an upper jacking device (5) are arranged on the shockproof strut (14).
4. The shock absorbing socket of claim 3, wherein the shock absorbing socket comprises a first end and a second end,
the lower anchoring device (4) comprises:
the upper end of the first branch pipe (41) is fixedly connected with the lower surface of the installation workbench surface (11), and the lower end of the first branch pipe is fixedly connected with the upper surface of the fixed bottom plate (15) through a locking plate (42);
the anchoring rod (43) is coaxially arranged inside the first branch pipe (41), the anchoring rod (43) sequentially penetrates through the locking plate (42) and the fixed bottom plate (15) to be inserted into a work site, and abutting clamping fins (44) and inverted claws (45) are respectively arranged at the positions, below the fixed bottom plate (15), of the anchoring rod (43);
the upper butting device (5) comprises:
the upper end of the second protective pipe (51) is close to the lower surface of the installation workbench surface (11), and the lower end of the second protective pipe is fixed on the upper surface of the upper fixing plate (17);
the sleeve (52) is arranged between the upper fixing plate (17) and the fixed bottom plate (15);
the screw rod (53) is coaxially arranged in the second protective pipe (51) and is in threaded sleeve joint with the sleeve (52), and the upper end face of the screw rod (53) is fixedly connected with the lower surface of the installation workbench face (11).
CN202110649299.3A 2021-06-10 2021-06-10 Shock suppression bearing seat of precision lithography machine Pending CN113341660A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110649299.3A CN113341660A (en) 2021-06-10 2021-06-10 Shock suppression bearing seat of precision lithography machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110649299.3A CN113341660A (en) 2021-06-10 2021-06-10 Shock suppression bearing seat of precision lithography machine

Publications (1)

Publication Number Publication Date
CN113341660A true CN113341660A (en) 2021-09-03

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ID=77476419

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110649299.3A Pending CN113341660A (en) 2021-06-10 2021-06-10 Shock suppression bearing seat of precision lithography machine

Country Status (1)

Country Link
CN (1) CN113341660A (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101581347A (en) * 2009-06-23 2009-11-18 上海微电子装备有限公司 Vibration reduction support device and photoetching machine using same
CN102141733A (en) * 2010-01-28 2011-08-03 上海微电子装备有限公司 Vibration absorption device and photolithographic device using same
CN203259773U (en) * 2013-03-27 2013-10-30 上海微电子装备有限公司 Micromotion module provided with vibration absorption device
DE102015223621A1 (en) * 2015-11-30 2016-10-27 Carl Zeiss Smt Gmbh Damping arrangement in a system, in particular in a microlithographic projection exposure apparatus
EP3181944A1 (en) * 2015-12-16 2017-06-21 Integrated Dynamics Engineering GmbH Vibration isolator with a vertically active pneumatic spring
CN208334911U (en) * 2018-07-02 2019-01-04 协伟集成电路设备（上海）有限公司 One kind being used for dry type and immersion type photolithography machine microvibration-preventing foundation base
CN208334910U (en) * 2018-06-22 2019-01-04 协伟集成电路设备（上海）有限公司 A kind of foundation base for extreme ultraviolet litho machine
CN111913367A (en) * 2020-08-17 2020-11-10 国为(南京)软件科技有限公司 A anti-vibration device and lithography machine for lithography machine

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101581347A (en) * 2009-06-23 2009-11-18 上海微电子装备有限公司 Vibration reduction support device and photoetching machine using same
CN102141733A (en) * 2010-01-28 2011-08-03 上海微电子装备有限公司 Vibration absorption device and photolithographic device using same
CN203259773U (en) * 2013-03-27 2013-10-30 上海微电子装备有限公司 Micromotion module provided with vibration absorption device
DE102015223621A1 (en) * 2015-11-30 2016-10-27 Carl Zeiss Smt Gmbh Damping arrangement in a system, in particular in a microlithographic projection exposure apparatus
EP3181944A1 (en) * 2015-12-16 2017-06-21 Integrated Dynamics Engineering GmbH Vibration isolator with a vertically active pneumatic spring
CN208334910U (en) * 2018-06-22 2019-01-04 协伟集成电路设备（上海）有限公司 A kind of foundation base for extreme ultraviolet litho machine
CN208334911U (en) * 2018-07-02 2019-01-04 协伟集成电路设备（上海）有限公司 One kind being used for dry type and immersion type photolithography machine microvibration-preventing foundation base
CN111913367A (en) * 2020-08-17 2020-11-10 国为(南京)软件科技有限公司 A anti-vibration device and lithography machine for lithography machine

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Application publication date: 20210903