CN113337872B - Double-sided electrodeposition equipment, double-sided electrodeposition method and manufactured product - Google Patents
Double-sided electrodeposition equipment, double-sided electrodeposition method and manufactured product Download PDFInfo
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- CN113337872B CN113337872B CN202110899154.9A CN202110899154A CN113337872B CN 113337872 B CN113337872 B CN 113337872B CN 202110899154 A CN202110899154 A CN 202110899154A CN 113337872 B CN113337872 B CN 113337872B
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- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
- C25D17/10—Electrodes, e.g. composition, counter electrode
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/12—Process control or regulation
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- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D7/00—Electroplating characterised by the article coated
Abstract
The invention discloses a double-sided electrodeposition device, a double-sided electrodeposition method and a manufactured product, wherein the double-sided electrodeposition device comprises a front titanium basket and a rear titanium basket, and the double-sided electrodeposition device also comprises: the first rectifier is electrically connected to the front titanium basket, and the second rectifier is electrically connected to the rear titanium basket; according to the double-sided electrodeposition equipment disclosed by the embodiment of the invention, the first rectifier and the second rectifier are arranged to control the current distribution of the front titanium basket and the rear titanium basket and carry out electrodeposition on a product to be electrodeposited at least twice according to the preset current distribution ratio, so that the nonuniformity of nickel plating on the inner side of foamed nickel can be weakened, the overall nickel plating effect is improved, the deposition thickness is increased, and the compression resistance and the winding performance of the foamed nickel are improved.
Description
Technical Field
The invention relates to the technical field of processing, in particular to double-sided electrodeposition equipment, a double-sided electrodeposition method and a manufactured product.
Background
When the foamed nickel is manufactured, the resistance of a foamed plastic matrix is higher at the initial stage of traditional symmetrical electroplating, the current distribution is mainly concentrated at the current collector end, and the nickel plating quantity on the current collector side (the outer side of the foamed plastic) is high; at the moment, the resistance of a current collector (on the outer side of the foamed plastic) is very small and is close to the solution phase, and if the influence of liquid phase polarization is not considered, the current is mainly concentrated on the outer side, so that the nickel plating amount on the outer side of the foamed nickel is large, the nickel plating amount in the middle is small, the symmetrical distribution of the nickel plating amount inside and outside the foamed nickel is generated, and the symmetrical distribution cannot be weakened by secondary electroplating. So that the plating thickness of the nickel foam layer is small, resulting in a small deposition thickness and poor compression resistance and winding performance of the nickel foam.
Disclosure of Invention
The present invention is directed to solving at least one of the problems of the prior art. To this end, the present invention provides a double-sided electrodeposition apparatus capable of improving the deposition thickness ratio, the compression resistance characteristics, and the winding performance of the produced nickel foam.
On the other hand, the invention also provides a double-sided electrodeposition method using the double-sided electrodeposition equipment and a product prepared by the double-sided electrodeposition method.
A double-sided electrodeposition apparatus according to an embodiment of the first aspect of the present invention includes a front titanium basket and a rear titanium basket, the double-sided electrodeposition apparatus further including:
the first rectifier is electrically connected to the front titanium basket;
the second rectifier is electrically connected to the rear titanium basket;
the first rectifier is configured to distribute current to the front titanium basket, the second rectifier is configured to distribute current to the rear titanium basket, and electrodeposition is performed on a product to be electrodeposited at least twice according to a preset current distribution ratio.
The double-sided electrodeposition equipment provided by the embodiment of the invention has at least the following beneficial effects: the current distribution of the front titanium basket and the rear titanium basket is controlled by arranging the first rectifier and the second rectifier, and electrodeposition is carried out on a product to be electrodeposited at least twice according to a preset current distribution ratio, so that the nonuniformity of nickel plating on the inner side of the foamed nickel can be weakened, the overall nickel plating effect is improved, the deposition thickness is increased, and the compression resistance and the winding performance of the foamed nickel are improved.
According to some embodiments of the invention, the current distribution of the first rectifier to the front titanium basket is not equal to the current distribution of the second rectifier to the rear titanium basket.
According to a second aspect embodiment of the invention, a double-sided electrodeposition method using the double-sided electrodeposition apparatus of the first aspect of the invention comprises the following process steps:
determining the primary current distribution ratio of the first rectifier and the second rectifier to the front titanium basket and the rear titanium basket;
carrying out primary electrodeposition on a product to be electrodeposited;
determining the secondary current distribution ratio of the first rectifier and the second rectifier to the front titanium basket and the rear titanium basket;
and carrying out secondary electrodeposition on the product to be electrodeposited.
The double-sided electrodeposition method provided by the embodiment of the invention has at least the following beneficial effects: the current distribution ratio of the front titanium basket and the rear titanium basket is controlled by arranging the first rectifier and the second rectifier, and electrodeposition is performed on a product to be electrodeposited according to the preset current distribution ratio for two times, so that the nonuniformity of nickel plating on the inner side of the foamed nickel can be weakened, the overall nickel plating effect is improved, the deposition thickness is increased, and the compression resistance and the winding performance of the foamed nickel are improved.
According to some embodiments of the invention, the primary current distribution ratio of the first rectifier to the front titanium basket is greater than 60%; the primary current distribution ratio of the second rectifier to the rear titanium basket is less than 40%; the secondary current distribution ratio of the first rectifier to the front titanium basket is more than 80%; the secondary current distribution ratio of the second rectifier to the rear titanium basket is less than 20%.
According to some embodiments of the invention, the primary current distribution ratio of the first rectifier to the front titanium basket is less than 40%; the primary current distribution ratio of the second rectifier to the rear titanium basket is more than 60%; the secondary current distribution ratio of the first rectifier to the front titanium basket is less than 20%; the secondary current distribution ratio of the second rectifier to the rear titanium basket is greater than 80%.
According to some embodiments of the invention, the primary current distribution ratio of the first rectifier to the front titanium basket is 55-70%; the primary current distribution ratio of the second rectifier to the rear titanium basket is 30-45%; the secondary current distribution ratio of the first rectifier to the front titanium basket is 30-45%; and the secondary current distribution ratio of the second rectifier to the rear titanium basket is 55-70%.
According to some embodiments of the invention, the primary current distribution ratio of the first rectifier to the front titanium basket is 30-45%; the primary current distribution ratio of the second rectifier to the rear titanium basket is 55-70%; the secondary current distribution ratio of the first rectifier to the front titanium basket is 55-70%; the secondary current distribution ratio of the second rectifier to the rear titanium basket is 30-45%.
A product according to an embodiment of the third aspect of the invention, the product being made according to the double-sided electrodeposition method of the second aspect of the invention, the product being foamed nickel.
The product prepared by the double-sided electrodeposition method provided by the embodiment of the invention has at least the following beneficial effects: the deposition thickness of the nickel foam is increased and the compression resistance and the winding performance of the nickel foam are improved.
According to some embodiments of the invention, the product is nickel foam, the surface density of the nickel foam is 350 g/square meter, the deposition thickness ratio is 80-90%, the compressive strength is 0.38-0.40 Mpa, and the winding times are 6-7 times.
According to some embodiments of the invention, the product is nickel foam, the surface density of the nickel foam is 230 g/square meter, the deposition thickness ratio is 84-92%, the compressive strength is 0.28-0.30 Mpa, and the winding times are 7-8 times.
Additional aspects and advantages of the invention will be set forth in part in the description which follows and, in part, will be obvious from the description, or may be learned by practice of the invention.
Drawings
The above and/or additional aspects and advantages of the present invention will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings of which:
fig. 1 is a schematic diagram of the distribution of current in an equivalent analog circuit of a porous electrode according to an embodiment of the present invention.
Fig. 2 is a schematic diagram of the distribution of electric potential in an equivalent analog circuit of a porous electrode according to an embodiment of the present invention.
FIG. 3 is a schematic diagram of current distribution under combined polarization of solid-phase resistance and liquid-phase resistance of the porous electrode according to the embodiment of the present invention.
Fig. 4 is a schematic view of a double-sided electrodeposition apparatus according to an embodiment of the present invention.
FIG. 5 is a schematic diagram of the effect of asymmetric plating according to an embodiment of the present invention.
FIG. 6 is a schematic diagram of the thickness of the coating layer at different positions of the product under various process conditions according to the embodiment of the present invention.
FIG. 7 is a flow chart of a double-sided electrodeposition process according to an embodiment of the present invention.
The reference numbers are as follows:
a first rectifier 110; a second rectifier 120; a front titanium basket 130; a rear titanium basket 140; nickel foam 150.
Detailed Description
Reference will now be made in detail to embodiments of the present invention, examples of which are illustrated in the accompanying drawings, wherein like or similar reference numerals refer to the same or similar elements or elements having the same or similar function throughout. The embodiments described below with reference to the accompanying drawings are illustrative only for the purpose of explaining the present invention, and are not to be construed as limiting the present invention.
In the description of the present invention, it should be understood that the orientation or positional relationship referred to in the description of the orientation, such as the upper, lower, front, rear, left, right, etc., is based on the orientation or positional relationship shown in the drawings, and is only for convenience of description and simplification of description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
In the description of the present invention, the meaning of a plurality of means is one or more, the meaning of a plurality of means is two or more, and larger, smaller, larger, etc. are understood as excluding the number, and larger, smaller, inner, etc. are understood as including the number. If the first and second are described for the purpose of distinguishing technical features, they are not to be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated or implicitly indicating the precedence of the technical features indicated.
In the description of the present invention, unless otherwise explicitly limited, terms such as arrangement, installation, connection and the like should be understood in a broad sense, and those skilled in the art can reasonably determine the specific meanings of the above terms in the present invention in combination with the specific contents of the technical solutions.
In the traditional technology, when the foamed nickel is manufactured, the resistance of a foamed plastic matrix is higher at the initial stage of traditional symmetrical electroplating, the current distribution is mainly concentrated at the current collector end, and the nickel plating quantity on the current collector side (the outer side of the foamed plastic) is high; at the moment, the resistance of a current collector (on the outer side of the foamed plastic) is very small and is close to the solution phase, and if the influence of liquid phase polarization is not considered, the current is mainly concentrated on the outer side, so that the nickel plating amount on the outer side of the foamed nickel is large, the nickel plating amount in the middle is small, the symmetrical distribution of the nickel plating amount inside and outside the foamed nickel is generated, and the symmetrical distribution cannot be weakened by secondary electroplating.
How to increase the plating thickness of the middle layer of the existing foam nickel (namely, increase the deposition thickness ratio DTR), thereby improving the compression resistance of the foam nickel, and improving the winding performance and the penetration resistance; the method reduces rolling cracks and winding cracks in the electrode plate manufacturing process in the aspect of battery improvement, reduces the internal resistance of the battery, and improves the cycle characteristic of the battery, and is a key technical problem which is always sought to be broken through in the whole foam nickel manufacturing industry.
On the other hand, under the influence of the market competition of batteries, battery manufacturers are in the future in a great trend to develop nickel foam to a low surface density direction in order to reduce the cost of the batteries and reduce the surface density specification of the nickel foam. Under the premise of no change of battery capacity (powder filling amount), after the surface density of the foamed nickel is reduced, when powder (slurry) is filled in a manufactured polar plate, the most critical part influencing the crack rate of the polar plate is an intermediate plating layer of the foamed nickel, so that the improvement of DTR and compression resistance of the foamed nickel by adopting a DDT process is a key measure for developing low-surface-density products.
In addition, part of battery manufacturers require the winding performance of the oriented three-dimensional material, the oriented winding performance is in positive correlation with the surface density of a single surface, the larger the surface density is, the better the winding performance is, and under the requirements of cost and related performance of the battery at the current stage, the equivalent surface density is difficult to greatly break through, and double-surface electroplating (the surface density is increased while the surface density is reduced, so that the effect of controlling the whole surface density is achieved) is a difficult point which cannot be overcome by the existing electroplating equipment.
In order to better illustrate the inventive concept of the present invention, the following will specifically describe the theory relating to the polarization of porous electrodes.
When the porous electrode works, the inner surface of the porous electrode is not uniform to realize electrochemical reaction. The mass transfer resistance of the liquid phase in the pores generates concentration polarization in the porous electrode, so that the polarization on the electrode/electrolyte interface at each point in the electrode is not uniform, and the advantage of large specific surface area of the porous electrode is partially offset.
The main objective of the research on porous electrodes is to analyze the basic electrochemical behavior of such electrodes and to find ways to optimize their electrode performance. The main idea is to divide the electrode area into two phases: the solid particles form a solid phase; the gaps between the solid particles are filled with electrolyte and are in solution phase.
For a flat metal electrode, the potentials at each point inside the electrode can be considered to be equal, and the polarization potential is:
in the porous electrode, due to the existence of solid phase resistance and liquid phase resistance in the micropores, the inside points
And
and the polarization potentials at each point are different. Therefore, the reaction speed of each point is different, and the utilization rate of each position in the electrode is different: the reaction speed is high at the place with high polarization potential, and the utilization rate is high; place of low polarization potentialThe reaction speed is slow, and the utilization rate is low.
For convenient mathematical treatment, neglecting the structural details of the porous electrode, adopting a parameter 'effective value' with statistical average significance, and treating each part in the porous electrode as a macroscopic homogeneous body. In an equivalent analog circuit of a porous electrode, as shown in fig. 1, the electrode is divided in a direction parallel to the surface into a number of thin layers of thickness dx. The electrochemical reaction occurring in the sheet is represented by conversion of liquid phase current into solid phase current (-dIl ═ dIs), and ρ sdx, ρ ldx, z/dx are used to represent solid phase resistance, liquid phase resistance, and reaction resistance in the sheet, respectively. Due to the existence of the solid-phase resistance and the liquid-phase resistance, the liquid-phase potential and the solid-phase potential in the electrode are different (figure 2); as x increases, Il continuously decreases and Is continuously increases. Thus, the reaction current can be expressed as:
dI＝-dIl＝dIsη/(z/dx) ((η/z)) dx (formula 2)
By
And
can be obtained separately:
from equations (equation 3) and (equation 4), we can obtain:
the equation (formula 5) is the basic polarization equation of the porous electrode.
When the solid-liquid phase resistance is combined with polarization control
In this case, assuming that α ═ β ═ 0.5, equation (equation 5) can be written as:
at this time, the boundary conditions of the polarization equation are:
the mathematical processing of this equation is complex, but numerical solutions can be given by software calculations.
When solid-liquid joint polarization is carried out, the distribution of the potential and the bulk current density depends on the ratio K and R:
the reaction area on the electrode can be represented by FIG. 3, and when k is less than 0.1, the current distribution is substantially uniform; when k > 1, the polarization distribution is always non-uniform; when k is 0.1 to 1, the low polarization is relatively uniform, and the high polarization is not uniform.
In the actual foam nickel electroplating process, rho s & gt rho l at the initial electroplating stage, and R is far greater than 1, so that the current distribution close to the current collector is larger, and the current is plated firstly; as the nickel is increased near the current collector, the conductivity of the electrode is continuously improved, rho l & gt rho s appears, and R is far less than 1, and the reaction area is positioned on one side close to the liquid phase, namely the outer side of the foamed nickel. Therefore, the total ratio of the outer side of the foamed nickel to the inner side is easy to plate nickel, so that the inner and outer plating amount distribution is required to be adjusted by utilizing the porous electrode principle, and the uniform electroplating of the inner side and the outer side is realized.
In the initial stage of asymmetric electroplating, the phenomenon of uneven outer side and inner side electroplating of the foamed nickel is also caused, but due to different currents on two sides of the foamed nickel, the nickel plating quantity on the side with large current is high, the nickel plating quantity on the side with small current is low, and asymmetric distribution of the nickel plating quantity in the foamed nickel is formed. When the reverse secondary asymmetric electroplating is carried out, the side with less nickel plating amount is plated with more nickel, and the side with high nickel plating amount is plated with less nickel, so that reverse asymmetric distribution is formed. Thus, the positive and negative asymmetric electroplating superposition can further weaken the unevenness of nickel plating at the inner side of the foam nickel and improve the overall nickel plating effect.
To this end, the present invention provides a double-sided electrodeposition apparatus, as shown in fig. 4, including a front titanium basket 130 and a rear titanium basket 140, the double-sided electrodeposition apparatus further including: a first rectifier 110 electrically connected to the front titanium basket 130 and a second rectifier 120 electrically connected to the rear titanium basket 140; wherein the first rectifier 110 is configured to distribute current to the front titanium basket 130, the second rectifier 120 is configured to distribute current to the rear titanium basket 140, and at least two times of electrodeposition are performed on the electrodeposition product according to a predetermined current distribution ratio.
It is to be noted that the at least two times include two times, three times, four times, or more times as necessary.
The double-sided electrodeposition device according to the embodiment of the first aspect of the invention has at least the following advantages: the current distribution of the front titanium basket 130 and the rear titanium basket 140 is controlled by arranging the first rectifier 110 and the second rectifier 120, and the electrodeposition is performed on the product to be electrodeposited at least twice according to the predetermined current distribution ratio, so that the unevenness of nickel plating inside the nickel foam 150 can be weakened, the overall nickel plating effect can be improved, the deposition thickness can be increased, and the compression resistance and the winding performance of the nickel foam 150 can be improved.
In some embodiments, the current distribution of the first rectifier 110 to the front titanium basket 130 is not equal to the current distribution of the second rectifier 120 to the rear titanium basket 140.
It can be understood that, in the initial period of asymmetric electrodeposition, the uneven electrodeposition between the outer side and the inner side of the nickel foam 150 is also caused, but because the currents on the two sides of the nickel foam 150 are different, the nickel plating amount on the side with large current is high, and the nickel plating amount on the side with small current is low, so that the asymmetric distribution of the nickel plating amount in the nickel foam 150 is formed. When the reverse secondary asymmetric electrodeposition is carried out, the side with less nickel plating amount is plated with more nickel, and the side with high nickel plating amount is plated with less nickel, so that reverse asymmetric distribution is formed. The positive and negative asymmetric electrodeposition superposition can further weaken the unevenness of nickel plating on the inner side of the nickel foam 150 and improve the overall nickel plating effect.
A double-sided electrodeposition method according to an embodiment of the second aspect of the present invention, which uses the double-sided electrodeposition apparatus according to an embodiment of the first aspect of the present invention, is shown in fig. 7, and includes the following process steps:
step S210, determining the primary current distribution ratio of the first rectifier 110 and the second rectifier 120 to the front titanium basket 130 and the rear titanium basket 140;
step S310, performing primary electrodeposition on a product to be electrodeposited;
step S410, determining the secondary current distribution ratio of the first rectifier 110 and the second rectifier 120 to the front titanium basket 130 and the rear titanium basket 140;
and step S510, carrying out secondary electrodeposition on the product to be electrodeposited.
The double-sided electrodeposition method according to the embodiment of the second aspect of the invention has at least the following beneficial effects: the current distribution ratio of the front titanium basket 130 and the rear titanium basket 140 is controlled by arranging the first rectifier 110 and the second rectifier 120, and the electrodeposition is performed twice on the product to be electrodeposited according to the predetermined current distribution ratio, so that the unevenness of nickel plating on the inner side of the nickel foam 150 can be weakened, the overall nickel plating effect is improved, the deposition thickness is increased, and the compression resistance and the winding performance of the nickel foam 150 are improved.
In some embodiments, a class 1 process: the primary current distribution ratio of the first rectifier 110 to the front titanium basket 130 is more than 60%; the primary current distribution ratio of the second rectifier 120 to the rear titanium basket 140 is less than 40%; the secondary current distribution ratio of the first rectifier 110 to the front titanium basket 130 is more than 80%; the secondary current distribution ratio of the second rectifier 120 to the rear titanium basket 140 is less than 20%. The proposal aims at the product with high single-side surface density, the one-way winding performance of the obtained nickel foam 150 can be greatly improved, and the surface density of the A surface of the nickel foam 150 is more than the surface density of the B surface.
In some embodiments, a class 2 process: the primary current distribution ratio of the first rectifier 110 to the front titanium basket 130 is less than 40%; the primary current distribution ratio of the second rectifier 120 to the rear titanium basket 140 is more than 60%; the secondary current distribution ratio of the first rectifier 110 to the front titanium basket 130 is less than 20%; the secondary current distribution ratio of the second rectifier 120 to the rear titanium basket 140 is greater than 80%. The proposal aims at the product with high single-side surface density, the one-way winding performance of the obtained nickel foam 150 can be greatly improved, and the surface density of the B surface of the nickel foam 150 is more than the surface density of the A surface.
In some embodiments, a class 3 process: the primary current distribution ratio of the first rectifier 110 to the front titanium basket 130 is 55-70%; the primary current distribution ratio of the second rectifier 120 to the rear titanium basket 140 is 30-45%; the secondary current distribution ratio of the first rectifier 110 to the front titanium basket 130 is 30-45%; the secondary current distribution ratio of the second rectifier 120 to the rear titanium basket 140 is 55-70%. The scheme is used for greatly improving the nickel content in the middle of a low-surface-density product, namely a product with the surface density less than 250 g/square meter. The plating-through property of the middle part is improved, and the density of the deposition thickness ratio DTR is improved, wherein the surface density of the A surface is equivalent to that of the middle part and the surface density of the B surface are equivalent.
In some embodiments, a class 4 process: the primary current distribution ratio of the first rectifier 110 to the front titanium basket 130 is 30-45%; the primary current distribution ratio of the second rectifier 120 to the rear titanium basket 140 is 55-70%; the secondary current distribution ratio of the first rectifier 110 to the front titanium basket 130 is 55-70%; the secondary current distribution ratio of the second rectifier 120 to the rear titanium basket 140 is 30-45%. The scheme is used for greatly improving the nickel content in the middle of a low-surface-density product, namely a product with the surface density less than 250 g/square meter. The plating-through property of the middle part is improved, and the DTR, A surface, middle part and B surface densities are equivalent.
The relevant principles of asymmetric deposition in the following 4 types of processes are described in connection with fig. 4: in the initial stage of asymmetric electrodeposition, the phenomenon of uneven electrodeposition between the outer side and the inner side of the nickel foam 150 is also caused, but because the currents on the two sides of the nickel foam 150 are different, the nickel plating amount on the side with large current is high, the nickel plating amount on the side with small current is low, and the asymmetric distribution of the nickel plating amount in the nickel foam 150 is formed. When the reverse secondary asymmetric electrodeposition is carried out, the side with less nickel plating amount is plated with more nickel, and the side with high nickel plating amount is plated with less nickel, so that reverse asymmetric distribution is formed. The positive and negative asymmetric electrodeposition superposition can further weaken the unevenness of nickel plating on the inner side of the nickel foam 150 and improve the overall nickel plating effect.
Fig. 5 shows a schematic diagram of the coating thickness of the product at different positions under the above 4 types of process conditions. Specifically, in the conventional process, the thickness of the surface A and the surface B of the foamed nickel 150 is 100 percent, and the thickness of the middle part is less than or equal to 65 percent; in the class 1 process, the thickness of the surface A of the foamed nickel 150 is more than or equal to 100 percent, the thickness of the middle part of the foamed nickel is more than or equal to 80 percent, and the thickness of the surface B of the foamed nickel is equal to that of the middle part of the foamed nickel; in the 2-class process, the thickness of the B surface of the foamed nickel 150 is more than or equal to 100 percent, the thickness of the middle part of the foamed nickel is more than or equal to 80 percent, and the thickness of the A surface of the foamed nickel is equal to that of the middle part of the foamed nickel; in the 3-class process and the 4-class process, the thickness of the surface A and the surface B of the foamed nickel 150 is 100%, and the thickness of the middle part is more than or equal to 80%. Therefore, the 4 types of processes can greatly improve the deposition thickness ratio of the nickel foam 150 according to needs, and improve the performance of the nickel foam 150.
The product according to an embodiment of the third aspect of the present invention, which is produced according to the double-sided electrodeposition method of the second aspect of the present invention, is nickel foam 150.
The product prepared by the double-sided electrodeposition method provided by the embodiment of the invention has at least the following beneficial effects: the deposition thickness of the nickel foam 150 is increased and the compression resistance and the winding property of the nickel foam 150 are improved.
Under the conventional process, aiming at the foamed nickel 150 with high areal density, the areal density is 350 g/square meter, the deposition thickness ratio is less than or equal to 65 percent, the compressive strength is 0.22 to 0.25Mpa, and the winding times are 3 to 4.
In some embodiments, the nickel foam 150 with high areal density is prepared according to the type 1 process, wherein the areal density is 350 g/square meter, the deposition thickness ratio is 80-90%, the compressive strength is 0.38-0.40 Mpa, and the winding times are 6-7.
Under the conventional process, aiming at the low-surface-density foamed nickel 150, the surface density is 230 g/square meter, the deposition thickness ratio is less than or equal to 65%, the compressive strength is 0.18-0.22 Mpa, and the winding times are 4-5 times.
In some embodiments, the low areal density nickel foam 150 is prepared according to the type 1 process, wherein the areal density is 230 g/square meter, the nickel foam 150 is deposited at a thickness of 84-92%, the compressive strength is 0.28-0.30 MPa, and the winding times are 7-8.
Therefore, by adopting the double-sided electrodeposition process disclosed by the invention, various performances of the foamed nickel 150 are greatly improved, specifically:
1. the DTR of the foamed nickel 150 is increased from about less than or equal to 65 percent to more than or equal to 80 percent, and the increasing level reaches more than 23 percent.
2. The compressive yield strength of the foamed nickel 150 is improved by more than 45 percent.
3. The winding times of the foamed nickel 150 are improved by 45 percent or more.
4. The unit power consumption is reduced by 0.19 yuan/m 2. After the DDT process is adopted for production, the overall voltage is reduced, and the power consumption is reduced by 0.14-0.19 yuan/m 2 according to different DDT processes, so that the production energy-saving effect is achieved.
5. The productivity of the electrodeposition is improved by more than 15 percent. When a conventional foam nickel 150 order is produced, the walking speed of the DDT process can be increased under the condition of keeping the same DTR level, and the productivity is increased by 10-18% according to different DDT processes.
In addition, by adopting the double-sided electrodeposition equipment and the double-sided electrodeposition process, the limited non-renewable metal resources on the earth can be effectively saved, and the utilization rate of the metal resources is increased. And the power consumption can be reduced, the consumption of electric energy is relieved, and the method contributes to the blue sky and white cloud cause of the earth.
The embodiments of the present invention have been described in detail with reference to the accompanying drawings, but the present invention is not limited to the above embodiments, and various changes can be made within the knowledge of those skilled in the art without departing from the gist of the present invention.
Claims (2)
1. A double-sided electrodeposition method of a foam substrate is characterized in that: the double-sided electrodeposition equipment utilized by the double-sided electrodeposition method comprises a front titanium basket, a rear titanium basket, a first rectifier and a second rectifier, wherein the first rectifier is electrically connected to the front titanium basket; the second rectifier is electrically connected to the rear titanium basket; the first rectifier is configured to distribute current to the front titanium basket, the second rectifier is configured to distribute current to the rear titanium basket, and electrodeposition is performed on a product to be electrodeposited at least twice according to a preset current distribution ratio, and the double-sided electrodeposition method comprises the following process steps:
determining the primary current distribution ratio of the first rectifier and the second rectifier to the front titanium basket and the rear titanium basket;
carrying out primary electrodeposition on a product to be electrodeposited;
determining the secondary current distribution ratio of the first rectifier and the second rectifier to the front titanium basket and the rear titanium basket;
carrying out secondary electrodeposition on the product to be electrodeposited;
the primary current distribution ratio of the first rectifier to the front titanium basket is 55-70%; the primary current distribution ratio of the second rectifier to the rear titanium basket is 30-45%; the secondary current distribution ratio of the first rectifier to the front titanium basket is 30-45%; and the secondary current distribution ratio of the second rectifier to the rear titanium basket is 55-70%.
2. A double-sided electrodeposition method of a foam substrate is characterized in that: the double-sided electrodeposition equipment utilized by the double-sided electrodeposition method comprises a front titanium basket, a rear titanium basket, a first rectifier and a second rectifier, wherein the first rectifier is electrically connected to the front titanium basket; the second rectifier is electrically connected to the rear titanium basket; the first rectifier is configured to distribute current to the front titanium basket, the second rectifier is configured to distribute current to the rear titanium basket, and electrodeposition is performed on a product to be electrodeposited at least twice according to a preset current distribution ratio, and the double-sided electrodeposition method comprises the following process steps:
determining the primary current distribution ratio of the first rectifier and the second rectifier to the front titanium basket and the rear titanium basket;
carrying out primary electrodeposition on a product to be electrodeposited;
determining the secondary current distribution ratio of the first rectifier and the second rectifier to the front titanium basket and the rear titanium basket;
carrying out secondary electrodeposition on the product to be electrodeposited;
the primary current distribution ratio of the first rectifier to the front titanium basket is 30-45%; the primary current distribution ratio of the second rectifier to the rear titanium basket is 55-70%; the secondary current distribution ratio of the first rectifier to the front titanium basket is 55-70%; the secondary current distribution ratio of the second rectifier to the rear titanium basket is 30-45%.
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| CN102691078A (en) * | 2012-02-20 | 2012-09-26 | 南京航空航天大学 | Foam metal, quick preparation method thereof, and device used in method |
| CN104928723A (en) * | 2014-03-21 | 2015-09-23 | 爱蓝天高新技术材料(大连)有限公司 | Foam metal plate and manufacturing method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US8110076B2 (en) * | 2006-04-20 | 2012-02-07 | Inco Limited | Apparatus and foam electroplating process |
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| US5374491A (en) * | 1993-01-27 | 1994-12-20 | Eltech Systems Corporation | High density, high capacity battery electrode |
| CN2587889Y (en) * | 2002-12-11 | 2003-11-26 | 吕明 | Electric deposition equipment for making high-porosity metal strip material |
| CN1786287A (en) * | 2005-11-16 | 2006-06-14 | 英可高新技术材料(沈阳)有限公司 | Gradient porous metal materiel manufactured by electrodeposition and its manufecturing technology |
| CN102691078A (en) * | 2012-02-20 | 2012-09-26 | 南京航空航天大学 | Foam metal, quick preparation method thereof, and device used in method |
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