CN113322499A - Continuous production method for preparing multilayer electrolytic metal terminal by electrolytic treatment production equipment - Google Patents

Continuous production method for preparing multilayer electrolytic metal terminal by electrolytic treatment production equipment Download PDF

Info

Publication number
CN113322499A
CN113322499A CN202110459381.XA CN202110459381A CN113322499A CN 113322499 A CN113322499 A CN 113322499A CN 202110459381 A CN202110459381 A CN 202110459381A CN 113322499 A CN113322499 A CN 113322499A
Authority
CN
China
Prior art keywords
electrolytic
metal
nickel
electrolytic solution
power supply
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202110459381.XA
Other languages
Chinese (zh)
Inventor
门松明珠
周爱和
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kunshan A Tripod Plating Equipment Co ltd
Original Assignee
Kunshan A Tripod Plating Equipment Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kunshan A Tripod Plating Equipment Co ltd filed Critical Kunshan A Tripod Plating Equipment Co ltd
Priority to CN202110459381.XA priority Critical patent/CN113322499A/en
Publication of CN113322499A publication Critical patent/CN113322499A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C25D5/12—Electroplating with more than one layer of the same or of different metals at least one layer being of nickel or chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/08—Electroplating with moving electrolyte e.g. jet electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10—Electroplating with more than one layer of the same or of different metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00—Electroplating characterised by the article coated

Abstract

The invention discloses a continuous production method for preparing a multilayer electrolytic metal terminal by electrolytic treatment production equipment, wherein the electrolytic treatment production equipment is movable combined continuous surface electrolytic treatment production equipment, the continuous production method comprises a universal metal material discharging device, a pretreatment process, a post-treatment process and a multilayer metal electronic product receiving device, and also comprises a first electrolytic solution process to a sixth electrolytic solution process, each electrolytic solution process can be selected from a plurality of electrolytic modules according to the requirements of product specification and performance, and each electrolytic module consists of 2-4 identical electrolytic devices; the multilayer electrolytic metal terminal with 2-6 layers of metal films on the surface of the metal terminal is prepared by continuous surface electrolytic treatment production equipment formed by combining 2-6 different electrolytic solution processes. The multilayer electrolytic metal terminal obtained by the method has various types, and has the characteristics of excellent conductivity, excellent insertion and extraction wear resistance and strong corrosion resistance.

Description

Continuous production method for preparing multilayer electrolytic metal terminal by electrolytic treatment production equipment
Technical Field
The invention relates to the technical field of multilayer electrolytic metal terminals, in particular to a continuous production method for preparing a multilayer electrolytic metal terminal by electrolytic treatment production equipment.
Background
The multilayer electrolytic metal terminal is an important basic raw material in various electronic industries, has excellent conductivity, excellent plugging wear resistance, excellent corrosion resistance and the like, is an important raw material for producing precise and high-end electronic products, and has wider and wider application prospects in the fields of aerospace, medical instruments, various communication devices in modern electronic information industries and the like. Therefore, the multilayer electrolytic metal terminal has attracted much attention in the aforementioned fields, and particularly, under the current situation where the modern electronic information industry is rapidly developing, a surface treatment production facility capable of rapidly manufacturing the multilayer electrolytic metal terminal in response to the production is urgently required.
However, the current continuous surface treatment production equipment is a fixed integral mode surface treatment production equipment which is manufactured according to the specification requirements of the surface multilayer electrolytic metal terminal, and in the face of the production and manufacturing requirements of the surface multilayer electrolytic metal terminal of various different metals, the current continuous surface treatment production equipment can not directly use the surface treatment production equipment for production and manufacturing due to the difference of metal types, and can not disassemble the unnecessary process parts of the production equipment for replacing the unnecessary process parts for use, so the current surface treatment production equipment can not meet the production and manufacturing requirements of the surface multilayer electrolytic metal terminal.
Patent document 1, japanese patent application publication No. JP2019-206730 a, discloses a method of forming a multilayer electrolytic metal layer on the surface of a base material to improve the performance of an electronic component material, electrolyzing Ni, Sn and Ag on the surface of a surface-treated metal material, and forming Ni between layers by reflow treatment conditions3 Sn4、Ag3The FFC terminal or the FPC terminal obtained from the Sn alloy has better contact resistance and plugging resistance.
Patent document 2, japanese patent application laid-open No. JP 6267404B 1, discloses a method of electrolyzing a metallic material capable of suppressing tin whisker by a combination of three layers of electrolytic metals, i.e., a lower layer composed of elements Ni, Cr, Mn, Fe, Co and Cu, an intermediate layer being an alloy formed of the lower layer element and Sn or In, and an uppermost layer being an alloy formed of Ag, Au, Pt, Pd, Ru, Rh, Os and Ir and Sn or In; the method provides a material that maintains good solderability and low contact resistance even when exposed to high temperature environments, and the insertion force of the terminal and connector is low.
Patent document 3, japanese patent application laid-open No. JP2020-111796 a, discloses that by electrolytic deposition of a lower layer, an intermediate layer and an upper layer of metal on a substrate and by optimally combining the thickness and the metal composition, the resultant material has characteristics capable of effectively suppressing tin whisker, as well as wear resistance and high durability.
Patent document 4, japanese patent application laid-open No. P2018-123422 a, discloses a process in which in a conventional plating material for Sn plating in a three-layer electrolytic metal layer, in order to improve whisker resistance and further reduce insertion/extraction force, the thickness of Sn plating should be reduced, and the resulting material has solderability and low contact resistance and has low insertion force of terminals and connectors.
Patent document 5, japanese patent application publication No. JP2008-177261 a, discloses a process for forming a nickel-phosphorus alloy layer on a conductor surface, using intermediate electrolytic palladium as an anticorrosive layer, and electrolyzing a gold layer on the outermost surface, and provides an electrolytic metal material which is hardly corroded and ensures the sealing performance of solder.
Patent document 6, japanese patent of invention, WO2015-198914, discloses a multilayer electrolytic metal method with excellent corrosion resistance by an electrolytic metal layer formed below a chromium plating film by including at least electrolytic chromium, tin and nickel, and using an acidic tin-nickel alloy electrolytic solution containing a triamine compound and a fluoride.
Patent document 7, japanese patent application laid-open No. JP2018-159104 a, discloses a Cu-Cr-Zr-Ti alloy material having excellent plating property and bending workability while maintaining conductivity and strength, which can be suitably used as a material for electronic parts such as terminals, connectors, switches, socket relays, lead frames, and the like, particularly for electronic parts that emit large heat and conduct large current.
Patent document 8, japanese patent application laid-open No. JP 1989-83686A, discloses a method for forming a multilayer electrolytic metal of a Ni — Au alloy used for mounting a component on a metallized ceramic substrate, which can provide an electronic product having a strong bonding force between electrolytic metal layers and excellent corrosion resistance.
Patent document 9, chinese invention patent, publication No. CN 101016639A, discloses a process for plating a platinum layer on a titanium substrate, and the prepared electrode material coated with platinum on titanium has the characteristics of good bonding force and bright and compact plating layer.
Patent document 10, chinese invention patent, publication No. CN 108130566A, discloses an electroplating solution for electroplating a platinum film on a surface of a nickel-based superalloy and an electroplating method thereof.
Patent document 11, U.S. patent application publication No. US 3671408A, discloses a plating method for a rhodium-platinum alloy, which can perform electrolysis on various metal materials such as phosphorus-copper, brass, nickel, mild steel, and silver, and in order to prevent the metal materials from being dissolved into the rhodium-platinum alloy solution by replacement, palladium, gold, and the like are electrolytically deposited on the surface of the metal materials in advance, thereby achieving the purpose of preventing the metal materials from being dissolved and maintained in the rhodium-platinum alloy solution by replacement, and the rhodium-platinum alloy product of the plating method has the characteristics of low stress and excellent insertion/extraction wear resistance.
Patent document 12, japanese patent application laid-open No. P2020-169360 a, discloses a bismuth-antimony alloy plating solution, and a plating film formed by using the plating solution has excellent sliding parts, and the plating solution usable for plating can be preferably used as a coating layer of engine parts such as bearings of gasoline and diesel engines.
Patent document 13, chinese invention patent, publication No. CN 110829080A, discloses a conductive terminal, which is made of a metal copper plate, the conductive terminal includes a contact area for butting with a butting connector, the contact area is formed with a metal plating layer on the surface of the metal copper plate by electroplating; the metal plating layer includes at least a first rhodium alloy plating layer, a second rhodium alloy plating layer, and a plurality of corrosion-resistant layers. At least two layers of rhodium alloy plating layers are electroplated on the surface of the conductive terminal, so that the resistance to electrolytic corrosion and chemical corrosion of the conductive terminal can be improved, the performance of the conductive terminal is improved, and the service life of the conductive terminal is prolonged.
Patent document 14, chinese invention patent, publication No. CN 111525314A, discloses a method for electrolyzing multilayer metal on the surface of a terminal, wherein a conductive terminal comprises a contact area for butting with a butting connector, and the contact area is plated on the surface of a copper metal plate to form a metal plating layer; the metal plating layer includes at least a first platinum plating layer, a second platinum plating layer, and a plurality of corrosion-resistant layers. At least two layers of platinized platinum are electroplated on the surface of the conductive terminal, so that the electrolytic corrosion resistance and the chemical corrosion resistance of the conductive terminal can be enhanced, and the electroplating cost of the conductive terminal is reduced.
Patent document 15, chinese invention patent publication No. CN 110350339A, discloses a multilayer electrolytic metal terminal, in which the first plating layer is a metal nickel-phosphorus mixture plating layer or a metal nickel plating layer, and the exterior plating layer is made of a metal rhodium alloy, and has the characteristics of excellent corrosion resistance and reduced cracking of the product.
Patent document 16, chinese patent application publication No. CN 111370894A, discloses a method for producing a surface electrolytic multilayer metal capable of improving corrosion resistance of an electrically conductive terminal.
Patent document 17, chinese invention patent publication No. CN 108400463A, discloses a nickel-tungsten alloy and palladium-nickel alloy plating layer in which conductive terminals are plated on the outer side of a copper base material in sequence, so as to improve the corrosion resistance of the conductive terminals.
Patent document 18, chinese invention patent publication No. CN107546515A, discloses a conductive terminal comprising a copper material, a metal material or alloy plated on the outer side of the copper material, and a material such as rhodium or rhodium-ruthenium alloy positioned on the outermost side, wherein the outer layer of the conductive terminal is provided with rhodium or rhodium-ruthenium alloy, thereby improving the corrosion resistance of the conductive terminal.
Patent document 19, U.S. patent application publication No. US 3793162 a, discloses a method for plating ruthenium on the surface of an electronic component, in which cracking and peeling do not occur even if the thickness of the electrolytically deposited ruthenium film exceeds 5 μm.
Patent document 20, japanese patent application publication No. P2019-90086 a, discloses an electrolytic nickel-phosphorus-tungsten alloy plating method capable of providing an alloy electrolytic plating layer with high wear resistance and corrosion resistance to the surface of a mold.
Patent document 21, japanese patent application laid-open publication No. P2020-172675 a, discloses a terminal material for a connector and a method of manufacturing a terminal for a connector, which can improve wear resistance and heat resistance.
Patent document 22, japanese patent application laid-open, P2019-203156 a, discloses an alloy solution of electrolytic palladium copper that can obtain an electrolytic palladium-copper alloy foil with few defects such as pinholes and cracks, and the palladium-copper alloy plating solution is widely used for forming palladium-copper alloy foils for ornaments, dental materials, electronic materials, catalyst materials, and the like.
Patent document 23, japanese patent application, P2020-56057 a, discloses a method for manufacturing a connector terminal material, a connector terminal and a connector terminal material, which are capable of improving wear resistance and heat resistance.
Patent document 24, chinese invention patent publication No. CN 108376850A, discloses a method for manufacturing a conductive terminal plating layer and a connector, and provides a connector product with excellent corrosion resistance by a silver-tin alloy plating method.
The problems of the continuous production method of the multilayer electrolytic metal and the terminal product which can meet the variable requirements of the multilayer electrolytic metal terminal product in the actual surface treatment industrial field and the preparation method problems related to the conductive terminal recorded in the literature are summarized as follows:
the methods provided in patent documents 1 to 4 cannot satisfy the variable requirements for producing a multilayer electrolytic metal terminal; the multilayer metal electrolysis method and the alloy product provided by patent documents 5 to 12 cannot meet the special requirements of excellent plugging and pulling resistance and excellent corrosion resistance required by high-end electronic products in the modern electronic information industry; the surface treatment processes of the multilayer electrolytic metal terminals of patent documents 13 to 18 are too complicated, and a more concise surface treatment process with the same effect is required; none of the surface treatment methods for noble metals and alloys disclosed in patent documents 19 to 24 can satisfy the requirements of the multilayer electrolytic metal process for the terminal surface.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: in order to solve the problems existing in the background technology, the continuous production method for preparing the multilayer electrolytic metal terminal by the electrolytic treatment production equipment is provided, the same continuous surface treatment production equipment is fully utilized to the maximum extent through a module mode, various different electrolytic solution processes are arranged and combined, and the produced multilayer electrolytic metal terminal product has the characteristics of various types, excellent conductivity, excellent plugging wear resistance, excellent corrosion resistance and the like, and can completely meet the production and manufacturing requirements of the multilayer electrolytic metal terminal product.
The technical scheme adopted by the invention for solving the technical problems is as follows: a continuous production method for preparing a multilayer electrolytic metal terminal by using electrolytic treatment production equipment comprises a universal metal material discharging device, a pre-treatment process, a post-treatment process, a multilayer metal electronic product receiving device and an electrolytic solution process module, wherein the electrolytic solution process module comprises six sets of independent electrolytic solution processes, namely a first electrolytic solution process, a second electrolytic solution process, a third electrolytic solution process, a fourth electrolytic solution process, a fifth electrolytic solution process and a sixth electrolytic solution process; each electrolytic solution process is selected from a plurality of electrolytic modules according to the requirements of product specification and performance, each electrolytic module is composed of 2-4 identical electrolytic devices, and a multilayer electrolytic metal terminal with 2-6 layers of metal films on the surface of the metal terminal is prepared by continuous surface electrolytic treatment production equipment formed by combining 2-6 different electrolytic solution processes.
More specifically, in the above technical solution, the electrolytic solutions of the six independent electrolytic solution processes are different, that is, the six independent electrolytic solution processes include six electrolytic solutions; each independent electrolytic solution process consists of 2-4 independent electrolytic tanks, and each electrolytic tank is provided with an independent rectification power supply for electrolysis; six sets of independent electrolytic solution processes are randomly arranged and combined to form continuous surface treatment production equipment capable of manufacturing and processing various multilayer electrolytic metal terminals; when electrolytic solutions other than the six electrolytic solutions are required, a seventh set of electrolytic solution processes may be added to the required locations; or when there is an unnecessary electrolytic solution process among the six independent electrolytic solution processes, a seventh electrolytic solution process may be substituted.
More specifically, in the above technical solution, the metal thin films include a first electrolytic metal thin film, a second electrolytic metal thin film, a third electrolytic metal thin film, a fourth electrolytic metal thin film, a fifth electrolytic metal thin film, and a sixth electrolytic metal thin film, and the first electrolytic metal thin film is a unit metal, a binary alloy, and a ternary alloy of nickel, tungsten, and gold; the second electrolytic metal film is unit metal, binary alloy and ternary alloy of palladium, silver and platinum; the third electrolytic metal film is a binary alloy formed by gold, nickel and cobalt; the fourth electrolytic metal film is unit metal, binary alloy and ternary alloy of gold, silver and tin; the fifth electrolytic metal film is a unit metal and a binary alloy formed by silver, platinum and palladium; the sixth electrolytic metal film is a unit metal and a binary alloy formed by gold, antimony and nickel.
More specifically, in the above technical solution, the thickness of the first electrolytic metal thin film is in the range of 0.38 to 2.54 μm; the thickness range of the second electrolytic metal film is 0.38-1.13 mu m; the thickness range of the third electrolytic metal film is 0.05-0.76 mu m; the thickness of the fourth electrolytic metal film is in a range of 0.76 to 3.81 mu m; the thickness range of the fifth electrolytic metal film is 0.25-0.54 mu m; the thickness of the sixth electrolytic metal thin film is in the range of 0.07 to 0.37 μm.
More specifically, in the above technical solution, the surface electrolysis manner of the metal material includes an electrolytic solution immersion manner and an electrolytic solution spraying manner; the immersion mode of the electrolytic solution is to immerse the metal material into the electrolytic solution completely, or to immerse the metal material into the electrolytic solution partially, or to immerse the metal material into the electrolytic solution after masking the metal material partially by a masking jig; the electrolytic solution spraying mode is to shield the part of the metal material which does not need to be subjected to electrolytic treatment by using an electrolytic jig, and to spray the surface of the metal material by using the electrolytic solution.
More specifically, in the above technical solution, the rectification power supply of the electrolysis apparatus includes a high-frequency rectification power supply, a pulse rectification power supply and a pulse periodic reverse power supply, and the three power supplies have different functions to obtain multilayer electrolysis metal terminals with different performances.
More specifically, in the above-described aspect, the electrolytic anode of the electrolytic cell changes in accordance with the shape of the metal material, the change in the electrolytic processing region, the shape of the electrolytic processing region, and the size of the area of the electrolytic processing region.
More specifically, in the above technical solution, the metal films electrolytically precipitated have different properties according to different combinations of the rectification power supply and the electrolytic anode.
More specifically, in the above technical solution, the electrolytically precipitated unit metals include gold, silver, platinum, palladium, nickel, cobalt, rhodium, indium, iron, ruthenium, tin, manganese, zinc, iridium, antimony, chromium, and copper; the binary alloy separated out by electrolysis comprises gold cobalt, gold nickel, palladium nickel, zinc tin, nickel phosphorus, gold tin, gold antimony, iron nickel, nickel tin, nickel tungsten, rhodium ruthenium, nickel cobalt, gold and silver, platinum and silver, silver and copper, silver and tungsten, copper and tungsten, zinc and copper and zinc tin; the ternary alloy separated out by electrolysis comprises nickel-gold-tungsten, gold-cobalt-tungsten, gold-palladium-nickel, gold-iron-nickel, nickel-phosphorus-tungsten, cobalt-nickel-phosphorus, palladium-nickel-phosphorus, copper-nickel-tungsten, nickel-tin-copper, iron-rhodium-ruthenium, cobalt-rhodium-ruthenium, gold-tin-copper, gold-silver-tin, nickel-cobalt-palladium and iron-nickel-tin.
More specifically, in the above technical solution, the electrolytically deposited unit metal, binary alloy and ternary alloy are variously arranged and combined, and various electrolysis conditions are set on a plurality of electrolysis apparatuses for each electrolytic solution process, so as to control the performance of the multilayer electrolytic metal terminal material and meet various product specification requirements.
The invention has the beneficial effects that: the invention provides a continuous production method for preparing a multilayer electrolytic metal terminal by using electrolytic treatment production equipment, and provides simple and practical production equipment operation steps, a production and use method of a multilayer electrolytic metal terminal product and a product performance evaluation method; by a module mode, the same continuous surface treatment production equipment is fully utilized to the maximum extent, various different electrolytic solution processes are arranged and combined, and the produced multilayer electrolytic metal terminal product has the characteristics of various types, excellent conductivity, excellent plugging wear resistance, excellent corrosion resistance and the like; providing an important raw material foundation for producing and manufacturing precise and high-end electronic products; meanwhile, the utilization rate of the multilayer electrolytic metal terminal continuous production equipment is effectively improved, one machine has multiple purposes, and the production efficiency is greatly improved.
Drawings
In order to more clearly illustrate the embodiments or technical solutions in the prior art of the present invention, the drawings used in the description of the embodiments or prior art will be briefly described below, it is obvious that the drawings in the following description are only some embodiments described in the present application, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic flow chart of a continuous production apparatus for a multilayer electrolytic metal terminal according to an embodiment of the present invention;
FIG. 2 is a schematic view of a process module for electrolyzing a nickel-tungsten alloy solution according to embodiment 1 of the present invention;
FIG. 3 is a schematic view of a process module for electrolyzing a platinum solution according to embodiment 1 of the present invention;
FIG. 4 is a schematic view of a process module for electrolyzing a Au-Co alloy solution according to embodiment 1 of the present invention;
FIG. 5 is a schematic view of a first electrolytic metal terminal of example 1 of the present invention;
fig. 6 is a schematic diagram of a process module for electrolyzing a nickel-gold-tungsten alloy solution in embodiment 2 of the present invention;
FIG. 7 is a schematic view of a second electrolytic metal terminal of example 2 of the invention;
FIG. 8 is a schematic view of a process module for electrolyzing a nickel solution according to embodiment 3 of the present invention;
FIG. 9 is a schematic view of a process module for electrolyzing a nickel-phosphorus solution according to example 3 of the present invention;
FIG. 10 is a schematic view of an electrolytic palladium solution process module according to embodiment 3 of the present invention;
FIG. 11 is a schematic view of a process module for electrolyzing a rhodium-ruthenium solution according to embodiment 3 of the present invention
FIG. 12 is a schematic view of a third electrolytic metal terminal of example 3 of the invention;
FIG. 13 is a schematic view of a process module for electrolyzing Pd-Ni alloy solution in example 4 of the present invention;
FIG. 14 is a schematic view of a fourth electrolytic metal terminal of example 4 of the invention;
fig. 15 is a schematic view of an electrolytic rhodium-platinum alloy solution process module of example 5 of the present invention;
FIG. 16 is a schematic view of a process module for electrolyzing a platinum-silver alloy solution according to embodiment 5 of the present invention;
FIG. 17 is a schematic view of a fifth electrolytic metal terminal of example 5 of the present invention;
FIG. 18 is a graph showing the test results of sample 1 of example 1 of the present invention;
FIG. 19 is a graph showing the test results of sample 2 of example 2 of the present invention;
FIG. 20 is a graph showing the test results of sample 3 of example 3 of the present invention;
FIG. 21 is a graph showing the test results of sample 4 of example 4 of the present invention;
FIG. 22 is a graph showing the results of the tests of samples 1 and 2 of examples 1 and 2 of the present invention;
FIG. 23 is a graph showing the results of the tests of samples 3 and 4 of examples 3 and 4 of the present invention.
The reference numbers in the drawings are:
10. a metal material;
11. a first conductive wheel; 12. a second conductive wheel; 13. a third conductive wheel; 14. a fourth conductive wheel;
20. a blowing nozzle;
100. a first electrolysis mother tank; 110. a second electrolysis mother tank; 120. a third electrolysis mother tank; 130. a fourth electrolysis mother tank;
200. a first electrolytic bath; 210. a second electrolytic bath; 220. a third electrolytic bath; 230. a fourth electrolytic bath;
300. a first electrolytic anode; 310. a second electrolytic anode; 320. a third electrolytic anode; 330. a fourth electrolytic anode;
400. a first injection jig; 410. a second injection jig; 420. a third injection jig;
500. a first rectified power supply; 510. a second rectified power supply; 520. a third rectified power supply; 530. a fourth rectified power supply;
600. a first electrolytic metal terminal; 610. a second electrolytic metal terminal; 620. a third electrolytic metal terminal; 630. a fourth electrolytic metal terminal; 640. a fifth electrolytic metal terminal.
Detailed Description
In order to make the technical problems, technical solutions and advantageous effects solved by the present invention more clearly apparent, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
A continuous production method for preparing a multilayer electrolytic metal terminal by electrolytic treatment production equipment is characterized in that electrolytic treatment is carried out on the surface of a metal material 10, and a metal film is separated out by an electrolytic solution process, and the continuous production method comprises a universal metal material discharging device, a pre-treatment process, a post-treatment process and a multilayer metal electronic product receiving device, and further comprises an electrolytic solution process module, wherein the electrolytic solution process module comprises six sets of independent electrolytic solution processes, namely a first electrolytic solution process, a second electrolytic solution process, a third electrolytic solution process, a fourth electrolytic solution process, a fifth electrolytic solution process and a sixth electrolytic solution process; each electrolytic solution process is selected from 11 electrolytic modules (see figures 2, 3, 4, 6, 8, 9, 10, 11, 13, 15 and 16) according to the requirements of product specification and performance, each electrolytic module consists of 2-4 identical electrolytic devices, and the multilayer electrolytic metal terminal with 2-6 layers of metal films on the surface of the metal terminal is prepared by continuous surface electrolytic treatment production equipment formed by combining 2-6 different electrolytic solution processes.
The electrolytic solutions of the six independent electrolytic solution processes are different, namely the six independent electrolytic solution processes comprise six electrolytic solutions; each independent electrolytic solution process consists of 2-4 independent electrolytic tanks, each electrolytic tank is provided with an independent rectification power supply for electrolysis, and the electrolysis power supply of each independent electrolytic tank can independently set different electrolysis conditions.
The number of cells of the first electrolytic solution process may be selected according to the requirements of the product specification. The number of cells for the second electrolytic solution process is also selected according to the requirements of the product specification. In this way, the number of the electrolytic cells of the third electrolytic solution process to the number of the electrolytic cells of the sixth electrolytic solution process is also selected according to the requirements of the product specification.
The metal material 10 is preferably a terminal continuous material, and the functional area of the material is treated by a multi-layer electrolytic metal continuous production device and method formed by a plurality of different electrolytic solution processes, preferably according with the electrolytic production condition of a multi-layer electrolytic metal terminal product.
Six sets of independent electrolytic solution processes are randomly arranged and combined to form continuous surface treatment production equipment capable of manufacturing and processing various multilayer electrolytic metal terminals; when electrolytic solutions other than the six electrolytic solutions are required, the seventh set of electrolytic solution process may be added to the required location; or when there is an unwanted electrolytic solution process among the six independent electrolytic solution processes, the seventh set of electrolytic solution process may be substituted.
And carrying out electrolytic precipitation by 2-6 different electrolytic solution processes to obtain 2-6 layers of metal films on the surfaces of the metal terminals. The multilayer electrolytic metal terminal product is not limited to the range of 2-6 layers of electrolytic metal, more layers of electrolytic metal terminal products can be provided according to the requirements of the multilayer electrolytic metal terminal product, and each layer can be an electrolytic single metal layer or an alloy layer of two metals, or a ternary alloy or a multi-element alloy more than the ternary alloy, so that the special performance requirements of the multilayer electrolytic metal terminal product can be met.
The metal films comprise a first electrolytic metal film, a second electrolytic metal film, a third electrolytic metal film, a fourth electrolytic metal film, a fifth electrolytic metal film and a sixth electrolytic metal film, and the first electrolytic metal film is a unit metal, a binary alloy and a ternary alloy of nickel, tungsten and gold; the second electrolytic metal film is unit metal, binary alloy and ternary alloy of palladium, silver and platinum; the third electrolytic metal film is a binary alloy formed by gold, nickel and cobalt; the fourth electrolytic metal film is unit metal, binary alloy and ternary alloy of gold, silver and tin; the fifth electrolytic metal film is unit metal and binary alloy formed by silver, platinum and palladium; the sixth electrolytic metal film is a unit metal and a binary alloy of gold, antimony, and nickel. The first electrolytic metal film needs to have a good tendency of preventing metal in the metal material from migrating into the plated metal layer and forming alloy with the metal material, so that various special functions of the multilayer electrolytic metal terminal product can be ensured, and the film thickness of the first electrolytic metal film needs to have a thicker range to meet the requirement. The electrolytic metal film on the outermost layer of the metal electronic product needs to have excellent conductivity, and has strong hardness, plugging resistance and wear resistance, so that the film thickness of the electrolytic metal film on the outermost layer of the metal electronic product needs to have a thin range to meet the requirement. The lower electrolytic metal film of the electrolytic metal film on the outermost layer of the metal electronic product needs to have excellent insertion and extraction resistance and excellent corrosion resistance, so that the film thickness of the lower electrolytic metal film of the electrolytic metal film on the outermost layer of the metal electronic product needs to have a moderate range to meet the requirement.
The thickness of the first electrolytic metal film is in the range of 0.38-2.54 μm; the thickness of the second electrolytic metal film is in the range of 0.38-1.13 μm; the thickness of the third electrolytic metal film is 0.05-0.76 μm; the thickness of the fourth electrolytic metal film is in the range of 0.76 to 3.81 μm; the thickness of the fifth electrolytic metal film is in the range of 0.25-0.54 μm; the thickness of the sixth electrolytic metal thin film is in the range of 0.07 to 0.37 μm.
The surface electrolysis method of a metal material includes an electrolytic solution immersion method and an electrolytic solution spray method.
The immersion mode of the electrolytic solution is to immerse the metal material into the electrolytic solution completely, or to immerse the metal material into the electrolytic solution partially, or to immerse the metal material into the electrolytic solution after masking the metal material partially by the masking jig.
The electrolytic solution spraying method is to shield the part of the metal material which does not need to be subjected to electrolytic treatment by using an electrolytic jig, and to spray the surface of the metal material by using the electrolytic solution.
If the surface electrolysis of the metal material can adopt a local electrolytic solution immersion mode on the surface and a spraying mode, the spraying mode is preferentially adopted, and when the spraying mode is limited due to the shape of the product and the characteristics of the electrolytic solution, the local electrolytic solution immersion mode is adopted.
The rectification power supply of the electrolysis device can be selected from a high-frequency rectification power supply, a pulse rectification power supply and a pulse periodic reverse power supply according to the characteristics of an electrolytic solution and the specification requirements of a multilayer electrolysis metal terminal product and the requirements of the multilayer electrolysis metal terminal product on the thickness of an electrolytically precipitated metal film or metal film, and the three power supplies have different functions and can obtain multilayer electrolysis metal terminals with different performances. Namely, the performance of the electrolytic metal film is improved by selecting different types of rectifier power supplies, and the metal form obtained by electrolysis by adopting a high-frequency rectifier power supply is rough in crystal lattice and poor in compactness; the metal form crystal lattice electrolytically precipitated by adopting a pulse rectification power supply or a pulse periodic reverse power supply is regular and fine, and has excellent compactness; in particular, some electrolytic precipitation alloys have amorphous structures and very excellent corrosion resistance.
The electrolytic anode of the electrolytic cell changes depending on the shape of the metal material, the change in the electrolytic treatment area, the shape of the electrolytic treatment area, and the size of the area of the electrolytic treatment area. The distance between the electrolytic anode and the metal material affects various performances of the electrolytic metal.
The different combinations of the rectification power supply and the electrolytic anode lead the electrolytically precipitated metal films to have different properties.
The unit metals electrolytically precipitated include gold (Au), silver (Ag), platinum (Pt), palladium (Pd), nickel (Ni), cobalt (Co), rhodium (Rh), indium (In), iron (Fe), ruthenium (Ru), tin (Sn), manganese (Mn), zinc (Zn), iridium (Ir), antimony (Sb), chromium (Cr), copper (Cu), and the like.
The binary alloy to be electrolytically precipitated includes gold cobalt (Au/Co), gold nickel (Au/Ni), palladium nickel (Pd/Ni), zinc tin (Zn/Sn), nickel phosphorus (Ni/P), gold tin (Au/Sn), gold antimony (Au/Sb), iron nickel (Fe/Ni), nickel tin (Ni/Sn), nickel tungsten (Ni/W), rhodium ruthenium (Rh/Ru), nickel cobalt (Ni/Co), gold and silver (Au/Ag), platinum silver (Pt/Ag), silver copper (Ag/Cu), silver tungsten (Ag/W), copper (Cu/W), zinc copper (Zn/Cu), zinc tin (Zn/Sn) and the like.
The ternary alloy deposited by electrolysis includes nickel-gold-tungsten (Ni/Au/W), gold-cobalt-tungsten (Au/Co/W), gold-palladium-nickel (Au/Pd/Ni), gold-iron-nickel (Au/Fe/Ni), nickel-phosphorus-tungsten (Ni/P/W), cobalt-nickel-phosphorus (Co/Ni/P), palladium-nickel-phosphorus (Pd/Ni/P), copper-nickel-tungsten (Cu/Ni/W), nickel-tin-copper (Ni/Sn/Cu), iron-rhodium-ruthenium (Fe/Rh/Ru), cobalt-rhodium-ruthenium (Co/Rh/Ru), gold-tin-copper (Au/Sn/Cu), gold-silver-copper (Au/Ag/Cu), gold-silver-tin (Au/Ag/Sn), nickel-cobalt-palladium (Ni/Co/Pd) and iron-nickel-tin (Fe/Ni/Sn).
The properties of the electrolytically precipitated metal film mainly include three types: conductivity, plugging performance and corrosion resistance.
The various properties of the electrolytically deposited metal film are summarized in Table 1 below:
TABLE 1
Figure BDA0003041807840000151
The unit metal, binary alloy and ternary alloy separated out by electrolysis are classified and effectively applied to the continuous production of the multilayer electrolytic metal terminal, specifically, the unit metal, binary alloy and ternary alloy separated out by electrolysis can be randomly arranged and combined in various ways according to the product specification and the requirements of the multilayer electrolytic metal terminal product on conductivity, corrosion resistance, wear resistance of a plug-in terminal and the like, and meanwhile, various different electrolysis conditions are set on a plurality of electrolysis devices of each electrolytic solution process, so that the performance of the multilayer electrolytic metal terminal material is controlled, and the specification requirements of various products are met. In a multilayer electrolytic metal terminal product, in some occasions, when a binary alloy or a ternary alloy is electrolyzed and separated by a binary or ternary electrolytic solution module, the metal electronic product has the same functions as a film layer of two or three kinds of single metal. Preferably, fewer electrolytic metal layers are used to meet the requirements of the specification and performance of the multi-layer electrolytic metal electrolytic product.
The continuous production method for preparing the multilayer electrolytic metal terminal by the electrolytic treatment production equipment has the advantages that the assembly and disassembly of various electrolytic solution processes are simple and easy; the electrolytic jig of the production equipment meets the requirements of local electrolytic precipitation production and processing of the terminal; the combination of various electrolytic solution processes is easy to carry out; the continuous operation stability of the production equipment is good; the mechanization degree of the production equipment is high. Specifically, the continuous production method for preparing the multilayer electrolytic metal terminal by the electrolytic treatment production equipment can process and produce continuous metal materials into electrolytic metal terminal products by using actual production equipment, and the manufacturing core is as follows: by means of an electrolytic solution process, the same continuous surface treatment production equipment is fully utilized to the maximum extent, various different electrolytic solution processes are arranged and combined, and products produced by electrolysis are wide in variety and have the characteristics of excellent conductivity, excellent plugging wear resistance, excellent corrosion resistance and the like; providing an important raw material foundation for producing and manufacturing precise and high-end electronic products; the multi-layer electrolytic metal terminal continuous production equipment is formed by a plurality of sets of electrolytic solution processes, so that the utilization rate of the electrolytic metal continuous production equipment is effectively improved, the running period of the multi-layer electrolytic metal terminal continuous production equipment is prolonged, one machine has multiple purposes, and the production efficiency of multi-layer electrolytic metal terminal products is greatly improved.
Example 1
When the designed multilayer electrolytic metal terminal product is required to achieve the objectives of excellent conductivity and strong corrosion resistance, the electrolytic metal thin film on the surface of the metal material 10 can be selected from Cu, Ni/W, Ni/W/Au in table 1, and the Ni/W alloy electrolytic solution having the characteristics of high hardness, high wear resistance and excellent corrosion resistance is preferred in this embodiment 1. The intermediate metal thin film of the multilayer electrolytic metal terminal product can be selected from the corresponding columns of table 1, and this example 1 prefers a Pt electrolytic solution having excellent corrosion resistance and good conductivity characteristics. The electrolytic metal thin film on the outermost surface of the multi-layered electrolytic metal terminal product can be selected from the corresponding columns in table 1, and the Au/Co alloy electrolytic solution having excellent conductivity and better wear resistance characteristics is preferred in this example 1.
Referring to fig. 1 and 2, after the metal material 10 passes through the metal material discharging device and the pretreatment, the metal material 10 is introduced into a first electrolytic solution process, the first electrolytic solution process adopts a nickel-tungsten alloy electrolytic solution, the first electrolytic solution process consists of four continuous independent electrolytic cells, the four electrolytic cells are respectively a first electrolytic mother cell 100, a second electrolytic mother cell 110, a third electrolytic mother cell 120 and a fourth electrolytic mother cell 130, each electrolytic mother cell is provided with a pulse periodic reverse power supply, the first electrolytic mother cell 100 is provided with a first rectification power supply 500, the second electrolytic mother cell 110 is provided with a second rectification power supply 510, the third electrolytic mother cell 120 is provided with a third rectification power supply 520, the fourth electrolytic mother cell 130 is provided with a fourth rectification power supply 530, the first rectification power supply 500, the second rectification power supply 510, the third rectification power supply 520 and the fourth rectification power supply 530 are pulse periodic reverse power supplies, a first electrolytic sub-tank 200, a second electrolytic sub-tank 210, a third electrolytic sub-tank 220 and a fourth electrolytic sub-tank 230 are arranged in each electrolytic mother tank, a metal material 10 runs in the middle of each electrolytic sub-tank through a guiding and conducting device at the inlet and outlet of each electrolytic sub-tank, the guiding and conducting device comprises a first conducting wheel 11, a second conducting wheel 12, a third conducting wheel 13 and a fourth conducting wheel 14, a first electrolytic anode 300 is arranged on two sides of the first electrolytic sub-tank 200, a second electrolytic anode 310 is arranged on two sides of the second electrolytic sub-tank 210, a third electrolytic anode 320 is arranged on two sides of the third electrolytic sub-tank 220, a fourth electrolytic anode 330 is arranged on two sides of the fourth electrolytic sub-tank 230, the first electrolytic anode 300 is connected with the anode output of a first rectification power supply 500, the second electrolytic anode 310 is connected with the anode output of a second rectification power supply 510, the third electrolytic anode 320 is connected with the anode output of a third rectification power supply 520, the fourth electrolysis anode 330 is connected with the anode output of the fourth rectifying power supply 530, the cathode output of the first rectifying power supply 500 is connected with the first conducting wheel 11, the cathode output of the second rectifying power supply 510 is connected with the second conducting wheel 12, the cathode output of the third rectifying power supply 520 is connected with the third conducting wheel 13, the cathode output of the fourth rectifying power supply 530 is connected with the fourth conducting wheel 14, and a blowing nozzle 20 and water washing are arranged between each two electrolytic tanks to prevent the metal material 10 from bringing out excessive electrolytic solution. The first rectified power supply 500, the second rectified power supply 510, the third rectified power supply 520 and the fourth rectified power supply 530 periodically perform electrolytic precipitation and electrolytic stripping treatment on the surface of the metal material 10 through positive and negative pulses, so that the electrolytically precipitated nickel-tungsten alloy layer has the characteristics of high hardness, high wear resistance and excellent corrosion resistance.
Referring to fig. 2, after the first electrolytic solution process is finished, the first electrolytic solution process is washed by at least 3 to 7 times, and then enters a second electrolytic solution process shown in fig. 3, wherein the second electrolytic solution process adopts platinum electrolytic solution, the second electrolytic solution process is composed of three continuous and independent first electrolytic mother tanks 100, second electrolytic mother tanks 110 and third electrolytic mother tanks 120, the three electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510 and a third rectification power supply 520, the three rectification power supplies are all high-frequency rectification power supplies, meanwhile, the three electrolytic mother tanks are respectively provided with a first injection jig 400, a second injection jig 410 and a third injection jig 420, the three injection jigs are all wheel type electrolytic jigs, the electrolytic tanks adopt an electrolytic solution injection mode to only electrolyze functional areas of metal materials 10, the wheel type electrolytic jigs are provided with anodes corresponding to an electrolytic treatment area, the electrolytic efficiency and the electrolytic metal quality are improved; also, between each cell there is a blowing nozzle 20 and water wash, and the other operations are similar to the cells described above. The three rectifying power supplies only carry out electrolytic treatment on the functional area of the metal material 10 through the wheel type electrolytic jig to obtain a platinum metal layer with good conductivity, and have good hardness and plugging wear resistance under the support of the nickel-tungsten alloy of the bottom plating layer.
After the second electrolytic solution process is finished, the second electrolytic solution process is washed by at least 3-7 times, and then the third electrolytic solution process shown in the figure 4 is performed, wherein the third electrolytic solution process adopts a gold-cobalt alloy electrolytic solution, the third electrolytic solution process is composed of a first electrolytic mother tank 100 and a second electrolytic mother tank 110 which are continuously independent, the two electrolytic mother tanks are respectively provided with a first rectification power supply 500 and a second rectification power supply 510, the two rectification power supplies are high-frequency rectification power supplies, the electrolytic tanks only electrolyze the functional area of the metal material in an electrolytic solution spraying mode, the wheel type electrolytic jig is provided with anodes corresponding to an electrolytic treatment area, the electrolytic efficiency and the quality of an electrolytic metal layer are improved, similarly, a blowing nozzle 20 and water washing are arranged between each electrolytic tank, and other operations are similar to those of the electrolytic tanks. The two rectifying power supplies only carry out electrolytic treatment on the functional area of the metal material 10 through the wheel type electrolytic jig to obtain a gold-cobalt alloy layer with good conductivity, and the gold-cobalt alloy layer has good hardness and plugging wear resistance under the lining of platinum and nickel-tungsten of the bottom plating layer.
Referring to fig. 5, example 1 shows a first electrolytic metal terminal 600 from a metal material 10, the first electrolytic metal terminal 600 having three metal layers, i.e., a first nickel tungsten layer, a second platinum layer, and a third gold cobalt layer. The film thickness of the first layer of nickel tungsten is 0.97 mu m, the film thickness of the second layer of platinum is 0.57 mu m, and the film thickness of the third layer of gold cobalt is 0.05-0.07 mu m.
Example 2
Referring to fig. 1 and 5, after a metal material 10 passes through a metal material emptying device and pretreatment, the metal material 10 is introduced into a first electrolytic solution process, the first electrolytic solution process adopts a nickel-gold-tungsten alloy electrolytic solution, the first electrolytic solution process is composed of four continuous independent first electrolytic mother tanks 100, second electrolytic mother tanks 110, third electrolytic mother tanks 120 and fourth electrolytic mother tanks 130, the four electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510, a third rectification power supply 520 and a fourth rectification power supply 530, the four rectification power supplies are pulse periodic reverse power supplies, each electrolytic mother tank is internally provided with a first electrolytic sub tank 200, a second electrolytic sub tank 210, a third electrolytic sub tank 220 and a fourth electrolytic sub tank 230, the metal material 10 runs in the middle of the electrolytic sub tanks through a guiding and conducting device at the inlet and outlet of each electrolytic tank, and the guiding and conducting device comprises a first conducting wheel 11, a second conducting wheel, a third conducting wheel and a fourth conducting wheel, a fourth conducting wheel and a fourth rectifying wheel and a rectifying wheel respectively connected with a rectifying power supply and a rectifying power supply respectively connected with a rectifying power supply and a rectifying power supply respectively connected with the connecting part and connected with the connecting the first rectifying power supply respectively connected with the first rectifying power supply respectively, wherein the first rectifying power supply and connected with the first rectifying power supply respectively, wherein the first rectifying power supply respectively, and a second rectifying power supply respectively, and connected with the first rectifying power supply respectively, and connected with the second rectifying power supply respectively, and a second rectifying power supply respectively, and connected with the first rectifying power supply, and connected with the second rectifying power supply, and a second rectifying power supply respectively, and a second rectifying power supply, and connected with the second rectifying power supply respectively, and connected with the second rectifying power supply, and connected with the first rectifying power supply, and a second rectifying power, A second conductive wheel 12, a third conductive wheel 13 and a fourth conductive wheel 14, wherein a first electrolytic anode 300 is arranged on two sides of the first electrolytic tank 200, a second electrolytic anode 310 is arranged on two sides of the second electrolytic tank 210, a third electrolytic anode 320 is arranged on two sides of the third electrolytic tank 220, a fourth electrolytic anode 330 is arranged on two sides of the fourth electrolytic tank 230, the first electrolytic anode 300 is connected with the anode output of the first rectifying power supply 500, the second electrolytic anode 310 is connected with the anode output of the second rectifying power supply 510, the third electrolytic anode 320 is connected with the anode output of the third rectifying power supply 520, the fourth electrolytic anode 330 is connected with the anode output of the fourth rectifying power supply 530, the cathode output of the first rectifying power supply 500 is connected with the first conductive wheel 11, the cathode output of the second rectifying power supply 510 is connected with the second conductive wheel 12, the cathode output of the third rectifying power supply 520 is connected with the third conductive wheel 13, the cathode output of the fourth rectifying power supply 530 is connected to the fourth conductive wheel 14, and a blowing nozzle 20 and water washing are provided between the electrolytic cells to prevent the metal material 10 from carrying out excessive electrolytic solution. The four rectification power supplies periodically perform electrolytic precipitation and electrolytic stripping treatment on the surface of the metal material 10 through positive and negative pulses, so that the electrolytically precipitated nickel-gold-tungsten alloy layer has the characteristics of high hardness, difficulty in bending and brittle fracture, high wear resistance and excellent corrosion resistance.
The operations of the second electrolytic solution process and the third electrolytic solution process are the same as in example 1.
Referring to fig. 7, example 2 shows a second electrolytic metal terminal 610 starting from a metal material 10, wherein the second electrolytic metal terminal 610 has three metal layers, i.e., a first metal layer of ni-au-w, a second metal layer of pt, and a third metal layer of au-co. The film thickness of the first layer of nickel-gold-tungsten is 1.05 mu m, the film thickness of the second layer of platinum is 0.62 mu m, and the film thickness of the third layer of gold-cobalt is 0.05-0.07 mu m.
Example 3
Referring to fig. 1 and 8, after a metal material 10 passes through a metal material discharging device and a pretreatment, the metal material 10 is introduced into a first electrolytic solution process, the first electrolytic solution process adopts a nickel electrolytic solution, the first electrolytic solution process is composed of four continuous and independent first electrolytic mother tank 100, a second electrolytic mother tank 110, a third electrolytic mother tank 120 and a fourth electrolytic mother tank 130, the four electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510, a third rectification power supply 520 and a fourth rectification power supply 530, the four rectification power supplies are high-frequency rectification power supplies, each electrolytic mother tank is internally provided with a first electrolytic sub-tank 200, a second electrolytic sub-tank 210, a third electrolytic sub-tank 220 and a fourth electrolytic sub-tank 230, the metal material 10 runs in the middle of the electrolytic sub-tanks through a guiding and conducting device at the inlet and outlet of each electrolytic tank, and the guiding and conducting device comprises a first conducting wheel 11, a second conducting wheel, a second rectifying wheel, a third rectifying wheel and a fourth rectifying wheel and a rectifying wheel respectively connected with a rectifying wheel respectively, A second conductive wheel 12, a third conductive wheel 13 and a fourth conductive wheel 14, wherein a first electrolytic anode 300 is arranged on two sides of the first electrolytic tank 200, a second electrolytic anode 310 is arranged on two sides of the second electrolytic tank 210, a third electrolytic anode 320 is arranged on two sides of the third electrolytic tank 220, a fourth electrolytic anode 330 is arranged on two sides of the fourth electrolytic tank 230, the first electrolytic anode 300 is connected with the anode output of the first rectifying power supply 500, the second electrolytic anode 310 is connected with the anode output of the second rectifying power supply 510, the third electrolytic anode 320 is connected with the anode output of the third rectifying power supply 520, the fourth electrolytic anode 330 is connected with the anode output of the fourth rectifying power supply 530, the cathode output of the first rectifying power supply 500 is connected with the first conductive wheel 11, the cathode output of the second rectifying power supply 510 is connected with the second conductive wheel 12, the cathode output of the third rectifying power supply 520 is connected with the third conductive wheel 13, the cathode output of the fourth rectifying power supply 530 is connected to the fourth conductive wheel 14, and a blowing nozzle 20 and water washing are provided between the electrolytic cells to prevent the metal material 10 from carrying out excessive electrolytic solution.
Referring to fig. 8, after the first electrolytic solution process is finished, the first electrolytic solution process is subjected to at least 3-7 water washes, and then enters a second electrolytic solution process shown in fig. 9, wherein the second electrolytic solution process adopts a nickel-phosphorus alloy electrolytic solution, the second electrolytic solution process consists of four continuous and independent first electrolytic mother tanks 100, second electrolytic mother tanks 110, third electrolytic mother tanks 120 and fourth electrolytic mother tanks 130, the four electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510, a third rectification power supply 520 and a fourth rectification power supply 530, the four rectification power supplies are all high-frequency rectification power supplies, the electrolytic tanks adopt an electrolytic solution local immersion mode to electrolyze only functional areas of the metal material 10, and local electrolytic jigs are provided with anodes corresponding to electrolytic treatment areas, so that the electrolytic efficiency and the quality of an electrolytic metal layer are improved; also, between each cell there is a blowing nozzle 20 and water wash, and the other operations are similar to the cells described above.
Referring to fig. 9, after the second electrolytic solution process is finished, the second electrolytic solution process is washed by at least 3 to 7 times, and then enters a third electrolytic solution process shown in fig. 10, wherein the third electrolytic solution process adopts palladium electrolytic solution, the third electrolytic solution process is composed of three continuous and independent first electrolytic mother tanks 100, second electrolytic mother tanks 110 and third electrolytic mother tanks 120, the three electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510 and a third rectification power supply 520, the three rectification power supplies are all high-frequency rectification power supplies, the electrolytic bath only electrolyzes the functional area of the metal material by adopting a local immersion mode of electrolytic solution, the local electrolytic jig is provided with an anode corresponding to an electrolytic treatment area, the electrolytic efficiency and the quality of an electrolytic metal layer are improved, similarly, a blowing nozzle 20 and water washing are arranged between every two electrolytic baths, and other operations are similar to those of the electrolytic baths.
Referring to fig. 10, after the third electrolytic solution process is finished, the third electrolytic solution process is performed with at least 3 to 7 water washes, and the fourth electrolytic solution process shown in fig. 11 is performed, wherein the third electrolytic solution process adopts rhodium ruthenium alloy electrolytic solution, the fourth electrolytic solution process is composed of four continuous and independent first electrolytic mother tanks 100, second electrolytic mother tanks 110, third electrolytic mother tanks 120 and fourth electrolytic mother tanks 130, the four electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510, a third rectification power supply 520 and a fourth rectification power supply 530, the four rectification power supplies are all high-frequency rectification power supplies, the electrolytic tanks adopt an electrolytic solution local immersion mode to electrolyze only the functional zones of the metal materials, the local electrolytic jig is provided with anodes corresponding to the electrolytic treatment zones, the electrolytic efficiency and the quality of the electrolytic metal layer are improved, similarly, air blowing nozzles 20 and water washes are arranged between each electrolytic tank, the other operations are similar to the above described electrolytic cell.
After the fourth electrolytic solution process is finished, at least 3-7 times of water washing is carried out, the electrolytic solution enters a fifth electrolytic solution process, the fifth electrolytic solution process adopts a gold-cobalt alloy electrolytic solution, the fifth electrolytic solution process is composed of a first electrolytic mother tank 100 and a second electrolytic mother tank 110 which are continuously independent, the two electrolytic mother tanks are respectively provided with a first rectification power supply 500 and a second rectification power supply 510, the two rectification power supplies are high-frequency rectification power supplies, the electrolytic tank only electrolyzes the functional area of the metal material in an electrolytic solution spraying mode, the wheel type electrolytic jig is provided with an anode corresponding to an electrolytic treatment area, the electrolytic efficiency and the quality of an electrolytic metal layer are improved, similarly, a blowing nozzle 20 and water washing are arranged between every two electrolytic tanks, and other operations are similar to those of the electrolytic tanks.
Example 3 provides a third electrolytic metal terminal 620 obtained from a metal material 10, wherein the third electrolytic metal terminal 620 has three metal layers, i.e., a first nickel layer, a second nickel-phosphorus layer, a third palladium layer, a fourth rhodium ruthenium layer, and a fifth gold cobalt layer, wherein the first nickel layer has a film thickness of 1.76 μm, the second nickel-phosphorus layer has a film thickness of 0.38 μm, the third palladium layer has a film thickness of 0.38 μm, the fourth rhodium ruthenium layer has a film thickness of 1.13 μm, and the fifth gold cobalt layer has a film thickness of 0.05 to 0.07 μm.
Example 4
Referring to fig. 1 and 8, after a metal material 10 passes through a metal material discharging device and a pretreatment, the metal material 10 is introduced into a first electrolytic solution process, the first electrolytic solution process adopts a nickel electrolytic solution, the first electrolytic solution process is composed of four continuous independent first electrolytic mother tank 100, a second electrolytic mother tank 110, a third electrolytic mother tank 120 and a fourth electrolytic mother tank 130, the four electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510, a third rectification power supply 520 and a fourth rectification power supply 530, the four rectification power supplies are pulse periodic reverse power supplies, each electrolytic mother tank is internally provided with a first electrolytic sub-tank 200, a second electrolytic sub-tank 210, a third electrolytic sub-tank 220 and a fourth electrolytic sub-tank 230, the metal material 10 runs in the middle of the electrolytic sub-tanks through a guide and conductive device at the inlet and outlet of each electrolytic tank, and the guide and conductive device comprises a first conductive wheel 11, a second conductive wheel 11, a third conductive wheel and a fourth conductive wheel 230, A second conductive wheel 12, a third conductive wheel 13 and a fourth conductive wheel 14, wherein a first electrolytic anode 300 is arranged on two sides of the first electrolytic tank 200, a second electrolytic anode 310 is arranged on two sides of the second electrolytic tank 210, a third electrolytic anode 320 is arranged on two sides of the third electrolytic tank 220, a fourth electrolytic anode 330 is arranged on two sides of the fourth electrolytic tank 230, the first electrolytic anode 300 is connected with the anode output of the first rectifying power supply 500, the second electrolytic anode 310 is connected with the anode output of the second rectifying power supply 510, the third electrolytic anode 320 is connected with the anode output of the third rectifying power supply 520, the fourth electrolytic anode 330 is connected with the anode output of the fourth rectifying power supply 530, the cathode output of the first rectifying power supply 500 is connected with the first conductive wheel 11, the cathode output of the second rectifying power supply 510 is connected with the second conductive wheel 12, the cathode output of the third rectifying power supply 520 is connected with the third conductive wheel 13, the cathode output of the fourth rectifying power supply 530 is connected to the fourth conductive wheel 14, and a blowing nozzle 20 and water washing are provided between the electrolytic cells to prevent the metal material 10 from carrying out excessive electrolytic solution.
Referring to fig. 8, after the first electrolytic solution process is finished, the first electrolytic solution process is subjected to at least 3-7 times of water washing, and then enters a second electrolytic solution process shown in fig. 3, wherein the second electrolytic solution process adopts palladium-nickel alloy electrolytic solution, the second electrolytic solution process consists of four continuous and independent first electrolytic mother tanks 100, second electrolytic mother tanks 110, third electrolytic mother tanks 120 and fourth electrolytic mother tanks 130, the four electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510, a third rectification power supply 520 and a fourth rectification power supply 530, the four rectification power supplies are all high-frequency rectification power supplies, the electrolytic tanks adopt a local immersion mode of electrolytic solution to electrolyze only functional areas of metal materials 10, and local electrolytic jigs are provided with anodes corresponding to electrolytic treatment areas, so that the electrolytic efficiency and the electrolytic metal quality are improved; also, between each cell there is a blowing nozzle 20 and water wash, and the other operations are similar to the cells described above.
After the second electrolytic solution process is finished, at least 3-7 times of water washing is carried out, the second electrolytic solution process enters a third electrolytic solution process, the third electrolytic solution process adopts a gold-cobalt alloy electrolytic solution, the third electrolytic solution process is composed of a first electrolytic mother tank 100 and a second electrolytic mother tank 110 which are continuously independent, the two electrolytic mother tanks are respectively provided with a first rectification power supply 500 and a second rectification power supply 510, the two rectification power supplies are high-frequency rectification power supplies, the electrolytic tanks only electrolyze the functional area of the metal material in an electrolytic solution spraying mode, the wheel type electrolytic jig is provided with anodes corresponding to an electrolytic treatment area, the electrolytic efficiency and the quality of an electrolytic metal layer are improved, similarly, a blowing nozzle 20 and water washing are arranged between every two electrolytic tanks, and other operations are similar to those of the electrolytic tanks.
Referring to fig. 14, example 4 shows a fourth electrolytic metal terminal 630 from the metal material 10, wherein the fourth electrolytic metal terminal 630 has three metal layers, i.e., a first nickel layer, a second nickel layer, and a third gold cobalt layer. The film thickness of the first layer nickel is 1.78 μm, the film thickness of the second layer palladium nickel is 0.45 μm, and the film thickness of the third layer gold cobalt is 0.15-0.23 μm.
Example 5
Referring to fig. 1 and 2, after a metal material 10 passes through a metal material discharging device and a pretreatment, the metal material 10 is introduced into a first electrolytic solution process, the first electrolytic solution process adopts a nickel electrolytic solution, the first electrolytic solution process is composed of four continuous independent first electrolytic mother tank 100, a second electrolytic mother tank 110, a third electrolytic mother tank 120 and a fourth electrolytic mother tank 130, the four electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510, a third rectification power supply 520 and a fourth rectification power supply 530, the four rectification power supplies are pulse periodic reverse power supplies, each electrolytic mother tank is internally provided with a first electrolytic sub-tank 200, a second electrolytic sub-tank 210, a third electrolytic sub-tank 220 and a fourth electrolytic sub-tank 230, the metal material 10 runs in the middle of the electrolytic sub-tanks through a guide and conductive device at the inlet and outlet of each electrolytic tank, and the guide and conductive device comprises a first conductive wheel 11, a second conductive wheel 11, a third conductive wheel and a fourth conductive wheel 230, A second conductive wheel 12, a third conductive wheel 13 and a fourth conductive wheel 14, wherein a first electrolytic anode 300 is arranged on two sides of the first electrolytic tank 200, a second electrolytic anode 310 is arranged on two sides of the second electrolytic tank 210, a third electrolytic anode 320 is arranged on two sides of the third electrolytic tank 220, a fourth electrolytic anode 330 is arranged on two sides of the fourth electrolytic tank 230, the first electrolytic anode 300 is connected with the anode output of the first rectifying power supply 500, the second electrolytic anode 310 is connected with the anode output of the second rectifying power supply 510, the third electrolytic anode 320 is connected with the anode output of the third rectifying power supply 520, the fourth electrolytic anode 330 is connected with the anode output of the fourth rectifying power supply 530, the cathode output of the first rectifying power supply 500 is connected with the first conductive wheel 11, the cathode output of the second rectifying power supply 510 is connected with the second conductive wheel 12, the cathode output of the third rectifying power supply 520 is connected with the third conductive wheel 13, the cathode output of the fourth rectifying power supply 530 is connected to the fourth conductive wheel 14, and a blowing nozzle 20 and water washing are provided between the electrolytic cells to prevent the metal material 10 from carrying out excessive electrolytic solution.
Referring to fig. 8, after the first electrolytic solution process is finished, the first electrolytic solution process is washed by at least 3-7 times of water and enters a second electrolytic solution process shown in fig. 2, the second electrolytic solution process adopts nickel-tungsten alloy electrolytic solution, the second electrolytic solution process is composed of four continuous independent first electrolytic mother tanks 100, second electrolytic mother tanks 110, third electrolytic mother tanks 120 and fourth electrolytic mother tanks 130, the four electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510, a third rectification power supply 520 and a fourth rectification power supply 530, the four rectification power supplies are pulse periodic reverse power supplies, each electrolytic mother tank is internally provided with a first electrolytic sub tank 200, a second electrolytic sub tank 210, a third electrolytic sub tank 220 and a fourth electrolytic sub tank 230, a metal material 10 runs in the middle of the electrolytic sub tanks through a guiding and conducting device at the inlet and outlet of each electrolytic tank, and the guiding and conducting device comprises a first conducting wheel 11, a second conducting wheel and a third conducting wheel, a fourth conducting wheel and a fourth rectifying wheel respectively connected with a fourth rectifying wheel and a fourth rectifying wheel respectively connected with a fourth rectifying wheel and a fourth rectifying power supply respectively connected with a fourth rectifying power supply and a fourth rectifying power supply respectively connected with a fourth rectifying power supply and a fourth rectifying power supply, A second conductive wheel 12, a third conductive wheel 13 and a fourth conductive wheel 14, wherein a first electrolytic anode 300 is arranged on two sides of the first electrolytic tank 200, a second electrolytic anode 310 is arranged on two sides of the second electrolytic tank 210, a third electrolytic anode 320 is arranged on two sides of the third electrolytic tank 220, a fourth electrolytic anode 330 is arranged on two sides of the fourth electrolytic tank 230, the first electrolytic anode 300 is connected with the anode output of the first rectifying power supply 500, the second electrolytic anode 310 is connected with the anode output of the second rectifying power supply 510, the third electrolytic anode 320 is connected with the anode output of the third rectifying power supply 520, the fourth electrolytic anode 330 is connected with the anode output of the fourth rectifying power supply 530, the cathode output of the first rectifying power supply 500 is connected with the first conductive wheel 11, the cathode output of the second rectifying power supply 510 is connected with the second conductive wheel 12, the cathode output of the third rectifying power supply 520 is connected with the third conductive wheel 13, the cathode output of the fourth rectifying power supply 530 is connected to the fourth conductive wheel 14, and a blowing nozzle 20 and water washing are provided between the electrolytic cells to prevent the metal material 10 from carrying out excessive electrolytic solution.
Referring to fig. 2, after the second electrolytic solution process is finished, the second electrolytic solution process is washed by at least 3-7 times of water and enters a third electrolytic solution process shown in fig. 4, the third electrolytic solution process adopts rhodium-platinum alloy electrolytic solution, the third electrolytic solution process is composed of four continuous and independent first electrolytic mother tanks 100, second electrolytic mother tanks 110, third electrolytic mother tanks 120 and fourth electrolytic mother tanks 130, the four electrolytic mother tanks are respectively provided with a first rectification power supply 500, a second rectification power supply 510, a third rectification power supply 520 and a fourth rectification power supply 530, the four rectification power supplies are high-frequency rectification power supplies, each electrolytic mother tank is internally provided with a first electrolytic sub tank 200, a second electrolytic sub tank 210, a third electrolytic sub tank 220 and a fourth electrolytic sub tank 230, a metal material 10 runs in the middle of the electrolytic sub tanks through a guiding and conducting device at the inlet and outlet of each electrolytic tank, and the guiding and conducting device comprises a first conducting wheel 11, a second conducting wheel, a second rectifying wheel, a third rectifying wheel and a fourth rectifying wheel respectively arranged in a fourth rectifying wheel and a fourth rectifying wheel arranged in a fourth rectifying wheel and rectifying wheel arranged in a fourth rectifying wheel and arranged in each electrolytic tank respectively arranged in each electrolytic tank and running way, wherein the middle of each electrolytic tank and running way, and running in each electrolytic tank, and running direction running in each electrolytic tank, and running in each of each electrolytic tank, and running direction running, A second conductive wheel 12, a third conductive wheel 13 and a fourth conductive wheel 14, wherein a first electrolytic anode 300 is arranged on two sides of the first electrolytic tank 200, a second electrolytic anode 310 is arranged on two sides of the second electrolytic tank 210, a third electrolytic anode 320 is arranged on two sides of the third electrolytic tank 220, a fourth electrolytic anode 330 is arranged on two sides of the fourth electrolytic tank 230, the first electrolytic anode 300 is connected with the anode output of the first rectifying power supply 500, the second electrolytic anode 310 is connected with the anode output of the second rectifying power supply 510, the third electrolytic anode 320 is connected with the anode output of the third rectifying power supply 520, the fourth electrolytic anode 330 is connected with the anode output of the fourth rectifying power supply 530, the cathode output of the first rectifying power supply 500 is connected with the first conductive wheel 11, the cathode output of the second rectifying power supply 510 is connected with the second conductive wheel 12, the cathode output of the third rectifying power supply 520 is connected with the third conductive wheel 13, the cathode output of the fourth rectifying power supply 530 is connected to the fourth conductive wheel 14, and the metal material 10 is entirely electrolyzed while immersed in the electrolytic solution to obtain a film-thick product having a desired product specification, and the air blowing nozzle 20 and water washing are provided between each two electrolytic tanks to prevent the metal material 10 from carrying out excessive electrolytic solution.
Referring to fig. 15, after the third electrolytic solution process is finished, the third electrolytic solution process is subjected to at least 3-7 times of water washing, and then the fourth electrolytic solution process shown in fig. 4 is performed, wherein the fourth electrolytic solution process adopts a gold-cobalt alloy electrolytic solution, the fourth electrolytic solution process is composed of a first electrolytic mother tank 100 and a second electrolytic mother tank 110 which are continuously independent, the first and second electrolytic mother tanks are respectively provided with a first rectification power supply 500 and a second rectification power supply 510, the two rectification power supplies are both high-frequency rectification power supplies, the electrolytic tank only electrolyzes the functional area a of the metal material in an electrolytic solution spraying mode, the wheel type electrolytic jig is provided with an anode corresponding to an electrolytic treatment area, the electrolytic efficiency and the quality of an electrolytic metal layer are improved, similarly, a blowing nozzle 20 and water washing are arranged between each electrolytic tank, and other operations are similar to those of the electrolytic tanks.
After the fourth electrolytic solution process is finished, at least 3-7 times of water washing are carried out, the process enters a fifth electrolytic solution process shown in the figure 16, the fifth electrolytic solution process adopts platinum-silver alloy electrolytic solution, the fifth electrolytic solution process is composed of a first electrolytic mother tank 100 and a second electrolytic mother tank 110 which are continuously independent, the two electrolytic mother tanks are respectively provided with a first rectification power supply 500 and a second rectification power supply 510, the two rectification power supplies are high-frequency rectification power supplies, the electrolytic tanks only electrolyze the functional area B of the metal material in an electrolytic solution spraying mode, the wheel type electrolytic jig is provided with anodes corresponding to an electrolytic treatment area, the electrolytic efficiency and the quality of an electrolytic metal layer are improved, similarly, a blowing nozzle 20 and water washing are arranged between every two electrolytic tanks, and other operations are similar to those of the electrolytic tanks.
In example 5, the fifth electrolytic metal terminal 640 was obtained from the metal material 10, and the fifth electrolytic metal terminal 640 had five metal layers, i.e., a first layer of nickel, a second layer of nickel-tungsten, a third layer of rhodium-platinum, a fourth layer of gold-cobalt, and a fifth layer of platinum-silver.
The mixed gas corrosion test of a multilayer electrolytic metal terminal sample 1-4 using the same metal material 10 as a raw material comprises the following test conditions: the environmental corrosion test of the functional area of the electrolytic metal terminal product, the concentration of the mixed gas, sulfur dioxide (10ppm) and hydrogen sulfide (2 ppm); the temperature and the humidity are 35 degrees and 75 percent, and the test time is 48 hours.
The test sample conditions are as follows:
referring to FIG. 5, sample 1 was prepared from example 1, 0.97 μm nickel tungsten (first layer), 0.57 μm platinum (second layer), and 0.05-0.07 μm gold cobalt (third layer).
Referring to FIG. 7, sample 2 was prepared from example 2, 1.05 μm nickel-gold-tungsten (first layer), 0.62 μm platinum (second layer), and 0.05-0.07 μm gold-cobalt (third layer).
Referring to FIG. 12, sample 3 was prepared from example 3, 1.76 μm nickel (first layer), 0.38 μm nickel-phosphorus (second layer), 0.38 μm palladium (third layer), 1.13 μm rhodium ruthenium (fourth layer), 0.05-0.07 μm gold cobalt (fifth layer).
Sample 4 was prepared from example 4, 1.78 μm nickel (first layer), 0.45 μm palladium nickel (second layer), 0.15-0.23 μm gold cobalt (third layer).
The mixed gas corrosion test results are shown in fig. 18-21, the corrosion areas of the sample 1 and the sample 2 are small, the corrosion degree is very low, the corrosion resistance is very excellent, and the nickel-tungsten alloy and the nickel-gold-tungsten alloy play very important roles.
As shown in fig. 22 and 23, the percentage of the corroded area after the test is counted by a small grid test method, and the corrosion rate sequence results of the test samples are as follows: sample 2 (corrosion rate 0.2%) < sample 1 (0.5%) < sample 3 (2.1%) < sample 4 (9.8%); namely, the nickel-gold-tungsten (first layer), platinum (second layer) and gold-cobalt (third layer) of sample 2, and the nickel-tungsten (first layer), platinum (second layer) and gold-cobalt (third layer) of sample 1 have very excellent corrosion resistance, and can be preferably used as important raw materials for producing and manufacturing precise and high-end electronic products. The electrolytic metal electronic products of nickel (first layer), nickel phosphorus (second layer), palladium (third layer), rhodium ruthenium (fourth layer) and gold cobalt (fifth layer) of the sample 3 have corrosion to a certain extent, and compared with the samples 1 and 2, the electrolytic metal electronic products only have generally good corrosion resistance and can only be used as raw materials of middle and low-end electronic products. Comparing the poor corrosion resistance of the electrolytic metal electronic products of nickel (first layer), palladium nickel (second layer) and gold cobalt (third layer) of sample 4, sample 4 has severe corrosion, which indicates that the corrosion resistance of palladium nickel alloy is very different from that of rhodium ruthenium alloy, and sample 4 can only be used as a raw material for low-end electrolytic metal electronic products that have low requirements on corrosion resistance.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.

Claims (10)

1. A continuous production method for preparing a multilayer electrolytic metal terminal by electrolytic treatment production equipment comprises a universal metal material discharging device, a pre-treatment process, a post-treatment process and a multilayer metal electronic product receiving device, and is characterized in that: the electrolytic solution process module comprises six sets of independent electrolytic solution processes, namely a first electrolytic solution process, a second electrolytic solution process, a third electrolytic solution process, a fourth electrolytic solution process, a fifth electrolytic solution process and a sixth electrolytic solution process; each electrolytic solution process is selected from a plurality of electrolytic modules according to the requirements of product specification and performance, each electrolytic module is composed of 2-4 identical electrolytic devices, and a multilayer electrolytic metal terminal with 2-6 layers of metal films on the surface of the metal terminal is prepared by continuous surface electrolytic treatment production equipment formed by combining 2-6 different electrolytic solution processes.
2. The continuous production method of producing a multilayer electrolytic metal terminal by the electrolytic processing production apparatus according to claim 1, characterized in that: the electrolytic solutions of the six sets of independent electrolytic solution processes are different, namely the six sets of independent electrolytic solution processes comprise six electrolytic solutions; each independent electrolytic solution process consists of 2-4 independent electrolytic tanks, and each electrolytic tank is provided with an independent rectification power supply for electrolysis; six sets of independent electrolytic solution processes are randomly arranged and combined to form continuous surface treatment production equipment capable of manufacturing and processing various multilayer electrolytic metal terminals; when electrolytic solutions other than the six electrolytic solutions are required, a seventh set of electrolytic solution processes may be added to the required locations; or when there is an unnecessary electrolytic solution process among the six independent electrolytic solution processes, a seventh electrolytic solution process may be substituted.
3. The continuous production method of producing a multilayer electrolytic metal terminal by the electrolytic processing production apparatus according to claim 1, characterized in that: the metal films comprise a first electrolytic metal film, a second electrolytic metal film, a third electrolytic metal film, a fourth electrolytic metal film, a fifth electrolytic metal film and a sixth electrolytic metal film, and the first electrolytic metal film is a unit metal, a binary alloy and a ternary alloy of nickel, tungsten and gold; the second electrolytic metal film is unit metal, binary alloy and ternary alloy of palladium, silver and platinum; the third electrolytic metal film is a binary alloy formed by gold, nickel and cobalt; the fourth electrolytic metal film is unit metal, binary alloy and ternary alloy of gold, silver and tin; the fifth electrolytic metal film is a unit metal and a binary alloy formed by silver, platinum and palladium; the sixth electrolytic metal film is a unit metal and a binary alloy formed by gold, antimony and nickel.
4. The continuous production method of producing a multilayer electrolytic metal terminal by the electrolytic processing production apparatus according to claim 3, characterized in that: the thickness range of the first electrolytic metal film is 0.38-2.54 mu m; the thickness range of the second electrolytic metal film is 0.38-1.13 mu m; the thickness range of the third electrolytic metal film is 0.05-0.76 mu m; the thickness of the fourth electrolytic metal film is in a range of 0.76 to 3.81 mu m; the thickness range of the fifth electrolytic metal film is 0.25-0.54 mu m; the thickness of the sixth electrolytic metal thin film is in the range of 0.07 to 0.37 μm.
5. The continuous production method of producing a multilayer electrolytic metal terminal by the electrolytic processing production apparatus according to claim 1, characterized in that: the surface electrolysis mode of the metal material comprises an electrolytic solution immersion mode and an electrolytic solution spraying mode; the immersion mode of the electrolytic solution is to immerse the metal material into the electrolytic solution completely, or to immerse the metal material into the electrolytic solution partially, or to immerse the metal material into the electrolytic solution after masking the metal material partially by a masking jig; the electrolytic solution spraying mode is to shield the part of the metal material which does not need to be subjected to electrolytic treatment by using an electrolytic jig, and to spray the surface of the metal material by using the electrolytic solution.
6. The continuous production method of producing a multilayer electrolytic metal terminal by the electrolytic processing production apparatus according to claim 2, characterized in that: the rectifying power supply of the electrolysis device comprises a high-frequency rectifying power supply, a pulse rectifying power supply and a pulse periodic reverse power supply, and the three power supplies have different functions to obtain multilayer electrolysis metal terminals with different performances.
7. The continuous production method of producing a multilayer electrolytic metal terminal by the electrolytic processing production apparatus according to claim 6, characterized in that: the electrolytic anode of the electrolytic cell changes depending on the shape of the metal material, the change of the electrolytic processing region, the shape of the electrolytic processing region and the size of the area of the electrolytic processing region.
8. The continuous production method of producing a multilayer electrolytic metal terminal by the electrolytic processing production apparatus according to claim 7, characterized in that: the different combinations of the rectification power supply and the electrolytic anode lead the metal films separated out by electrolysis to have different performances.
9. The continuous production method of producing a multilayer electrolytic metal terminal by the electrolytic processing production apparatus according to claim 8, characterized in that: the unit metals separated out by electrolysis comprise gold, silver, platinum, palladium, nickel, cobalt, rhodium, indium, iron, ruthenium, tin, manganese, zinc, iridium, antimony, chromium and copper; the binary alloy separated out by electrolysis comprises gold cobalt, gold nickel, palladium nickel, zinc tin, nickel phosphorus, gold tin, gold antimony, iron nickel, nickel tin, nickel tungsten, rhodium ruthenium, nickel cobalt, gold and silver, platinum and silver, silver and copper, silver and tungsten, copper and tungsten, zinc and copper and zinc tin; the ternary alloy separated out by electrolysis comprises nickel-gold-tungsten, gold-cobalt-tungsten, gold-palladium-nickel, gold-iron-nickel, nickel-phosphorus-tungsten, cobalt-nickel-phosphorus, palladium-nickel-phosphorus, copper-nickel-tungsten, nickel-tin-copper, iron-rhodium-ruthenium, cobalt-rhodium-ruthenium, gold-tin-copper, gold-silver-tin, nickel-cobalt-palladium and iron-nickel-tin.
10. The continuous production method of producing a multilayer electrolytic metal terminal by the electrolytic processing production apparatus according to claim 9, characterized in that: the electrolytically precipitated unit metal, binary alloy and ternary alloy are arranged and combined in various ways, and meanwhile, various electrolysis conditions are set on a plurality of electrolysis devices of each electrolytic solution process, so that the performance of the multilayer electrolytic metal terminal material is controlled, and the specification requirements of various products are met.
CN202110459381.XA 2021-04-27 2021-04-27 Continuous production method for preparing multilayer electrolytic metal terminal by electrolytic treatment production equipment Pending CN113322499A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110459381.XA CN113322499A (en) 2021-04-27 2021-04-27 Continuous production method for preparing multilayer electrolytic metal terminal by electrolytic treatment production equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110459381.XA CN113322499A (en) 2021-04-27 2021-04-27 Continuous production method for preparing multilayer electrolytic metal terminal by electrolytic treatment production equipment

Publications (1)

Publication Number Publication Date
CN113322499A true CN113322499A (en) 2021-08-31

Family

ID=77413817

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110459381.XA Pending CN113322499A (en) 2021-04-27 2021-04-27 Continuous production method for preparing multilayer electrolytic metal terminal by electrolytic treatment production equipment

Country Status (1)

Country Link
CN (1) CN113322499A (en)

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1445268A (en) * 1974-06-19 1976-08-11 Uralsky Politekhn Inst Multilayer electric circuit structures and methods of fabricating the same
US3984290A (en) * 1973-10-01 1976-10-05 Georgy Avenirovich Kitaev Method of forming intralayer junctions in a multilayer structure
ATA503974A (en) * 1974-06-18 1979-02-15 Uralsky Politekhn Inst MULTI-LAYER PCB AND METHOD OF MANUFACTURING IT
DE3583142D1 (en) * 1984-11-22 1991-07-11 Kawasaki Steel Co METHOD FOR PRODUCING COLORED STAINLESS STEEL MATERIALS AND DEVICE FOR THEIR CONTINUOUS PRODUCTION.
JP2006016647A (en) * 2004-06-30 2006-01-19 Sugimura Kagaku Kogyo Kk Electrolytic oxidation treatment method and electrolytic oxidation-treated metallic material
JP2009097069A (en) * 2007-10-19 2009-05-07 Mitsubishi Alum Co Ltd Method for producing surface treated aluminum material
CN109652850A (en) * 2018-11-23 2019-04-19 铜陵蓝盾丰山微电子有限公司 Multichannel chip electroplanting device
CN111394716A (en) * 2019-01-03 2020-07-10 泰科电子(上海)有限公司 Multi-coating stacked structure, preparation method and application thereof
CN112323111A (en) * 2020-11-02 2021-02-05 昆山一鼎工业科技有限公司 Method for electrolyzing continuous terminal
CN112652907A (en) * 2019-10-12 2021-04-13 富士康(昆山)电脑接插件有限公司 Conductive terminal and manufacturing method thereof

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3984290A (en) * 1973-10-01 1976-10-05 Georgy Avenirovich Kitaev Method of forming intralayer junctions in a multilayer structure
ATA503974A (en) * 1974-06-18 1979-02-15 Uralsky Politekhn Inst MULTI-LAYER PCB AND METHOD OF MANUFACTURING IT
GB1445268A (en) * 1974-06-19 1976-08-11 Uralsky Politekhn Inst Multilayer electric circuit structures and methods of fabricating the same
DE3583142D1 (en) * 1984-11-22 1991-07-11 Kawasaki Steel Co METHOD FOR PRODUCING COLORED STAINLESS STEEL MATERIALS AND DEVICE FOR THEIR CONTINUOUS PRODUCTION.
JP2006016647A (en) * 2004-06-30 2006-01-19 Sugimura Kagaku Kogyo Kk Electrolytic oxidation treatment method and electrolytic oxidation-treated metallic material
JP2009097069A (en) * 2007-10-19 2009-05-07 Mitsubishi Alum Co Ltd Method for producing surface treated aluminum material
CN109652850A (en) * 2018-11-23 2019-04-19 铜陵蓝盾丰山微电子有限公司 Multichannel chip electroplanting device
CN111394716A (en) * 2019-01-03 2020-07-10 泰科电子(上海)有限公司 Multi-coating stacked structure, preparation method and application thereof
CN112652907A (en) * 2019-10-12 2021-04-13 富士康(昆山)电脑接插件有限公司 Conductive terminal and manufacturing method thereof
CN112323111A (en) * 2020-11-02 2021-02-05 昆山一鼎工业科技有限公司 Method for electrolyzing continuous terminal

Similar Documents

Publication Publication Date Title
Sasaki et al. Electrodeposition of Binary Iron‐Group Alloys
KR20090127405A (en) Silver-coated material for movable contact component and method for manufacturing such silver-coated material
JP4846740B2 (en) Plating product manufacturing method and electroplating method
CN109957822B (en) Copper alloy electroplating process
CN111525314B (en) Conductive terminal
WO2010075998A2 (en) Coated product for use in an electrochemical device and a method for producing such a product
KR890000179B1 (en) Cathode having high durability and iow hydrogen overvoltage and process for the production thereof
CN113122845A (en) Preparation method of aluminum alloy metal plated part
CN100576377C (en) Termination electrode of a kind of sheet type ferrite inductor and preparation method thereof
CN1165639C (en) Sn-In alloy electroplating liquid and its preparing method
CN113322499A (en) Continuous production method for preparing multilayer electrolytic metal terminal by electrolytic treatment production equipment
US3503799A (en) Method of preparing an electrode coated with a platinum metal
CN113699566B (en) Palladium-nickel combined plating layer resistant to anodic electrolytic corrosion and electroplating method thereof
CN114182315B (en) Corrosion-resistant combined electroplated layer and electroplating method
CN210576587U (en) Electroplated layer for terminal surface, terminal and electronic interface
KR102075469B1 (en) Connector and Manufacturing Method of it
Baumgärtner et al. Palladium-iron alloy electrodeposition. Part II alloy plating systems
CN1293237C (en) Production method for electrical contact material
CN201678756U (en) Insoluble anode structure
JP2011208175A (en) Method for producing plated article, and plated article
JP2009099550A (en) Silver-clad composite material for movable contact and its manufacturing method
JP4558823B2 (en) Silver-coated composite material for movable contact and method for producing the same
CN215869877U (en) High corrosion-resistant nickel-based composite coating and terminal
CN216087117U (en) Cost-reduced nickel alloy multilayer gold-plating for printed circuit board
JP7068899B2 (en) Rhodium phosphorus plating film and laminate material

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20210831

RJ01 Rejection of invention patent application after publication