CN113267889B - Design method of secondary phase off-axis Fresnel zone plate - Google Patents
Design method of secondary phase off-axis Fresnel zone plate Download PDFInfo
- Publication number
- CN113267889B CN113267889B CN202110638324.8A CN202110638324A CN113267889B CN 113267889 B CN113267889 B CN 113267889B CN 202110638324 A CN202110638324 A CN 202110638324A CN 113267889 B CN113267889 B CN 113267889B
- Authority
- CN
- China
- Prior art keywords
- zone plate
- fresnel zone
- axis
- secondary phase
- axis fresnel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000000034 method Methods 0.000 title claims abstract description 15
- 238000013461 design Methods 0.000 title claims abstract description 9
- 230000004075 alteration Effects 0.000 claims abstract description 34
- 238000003384 imaging method Methods 0.000 claims abstract description 23
- 230000003287 optical effect Effects 0.000 claims abstract description 15
- 238000004587 chromatography analysis Methods 0.000 claims abstract description 12
- 238000009826 distribution Methods 0.000 claims abstract description 12
- 230000014509 gene expression Effects 0.000 claims description 8
- 238000000386 microscopy Methods 0.000 claims description 7
- 238000005457 optimization Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 238000012937 correction Methods 0.000 abstract description 6
- 238000005516 engineering process Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000011160 research Methods 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 238000003325 tomography Methods 0.000 description 3
- 206010010071 Coma Diseases 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000012472 biological sample Substances 0.000 description 1
- 230000009087 cell motility Effects 0.000 description 1
- 238000000701 chemical imaging Methods 0.000 description 1
- 238000004624 confocal microscopy Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012634 optical imaging Methods 0.000 description 1
- 230000008832 photodamage Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Holo Graphy (AREA)
- Microscoopes, Condenser (AREA)
Abstract
The invention provides a design method of a secondary phase off-axis Fresnel zone plate, which comprises the following steps: s1, determining aberration to be corrected in a chromatography microscopic optical path system; s2, determining grid line distribution of the secondary phase off-axis Fresnel zone plate by utilizing coordinates of the first exposure point and the second exposure point according to distribution of aberration to be corrected. The secondary phase off-axis Fresnel zone plate provided by the invention can realize chromatography and system aberration correction at the same time, improves the imaging quality of a system and reduces the complexity of the system.
Description
Technical Field
The invention belongs to the technical field of optical imaging, and particularly relates to a method for designing a difference tomography secondary phase off-axis Fresnel zone plate for eliminating an image.
Background
In research in the biomedical field, imaging analysis testing equipment is an important tool for observing structural morphology and life state of cells and biological tissues, wherein microscopic imaging instruments are the most commonly used imaging tools in life science research. The traditional optical microscope can only acquire a two-dimensional distribution diagram of the light wave intensity of the measured object, can not give out three-dimensional space information of the measured object, and is difficult to meet the requirements of increasingly developed biomedical research. The optical microscopic tomography technology is a technical means capable of realizing the measurement of the three-dimensional structure inside the sample. Typical techniques at present comprise optical projection chromatography, laser scanning confocal microscopy and the like which are based on measured light intensity, have low imaging contrast for phase biological samples and low scattering samples, and are subjected to point-by-point scanning by utilizing the confocal technology, so that the restriction of low imaging speed exists. The three-dimensional microscopic imaging technology based on the secondary phase off-axis Fresnel zone plate breaks the limit of most of the existing three-dimensional microscopic imaging technology on the coherence of a light source, and radically weakens the problems of sample photobleaching, photodamage and the like caused by strong incident light. And the real-time property of the captured image is particularly suitable for living biological cell imaging, so that the problem of image acquisition error at different moments caused by too fast cell movement is avoided. Meanwhile, the secondary phase off-axis Fresnel zone plate is simple to manufacture and low in cost, and the cost of the whole chromatographic microscope system is much lower than that of a confocal microscope.
In the prior art, although the tomography microscopic imaging technology based on the secondary phase off-axis Fresnel zone plate can realize real-time three-dimensional microscopic imaging of a sample to be detected, in order to improve the utilization rate of microscope output energy, the microscopic imaging system has a relatively simple structure, has no design about aberration reduction of the system, and is difficult to realize output with higher imaging quality. The introduction of new devices necessarily increases the complexity of the system and reduces the utilization of the output energy of the microscope.
Disclosure of Invention
The invention provides a design method of a secondary phase off-axis Fresnel zone plate, which aims to solve the problem that aberration influences imaging quality in the existing chromatography microscopic optical path, and can realize two functions of chromatography and reducing system aberration. In order to achieve the above purpose, the present invention adopts the following specific technical scheme:
the design of the secondary phase off-axis Fresnel zone plate comprises the following steps:
s1, determining aberration to be corrected existing in a chromatographic microscopy system light path;
s2, calculating and utilizing coordinates of the first exposure point and the second exposure point to determine grid line distribution of the secondary phase off-axis Fresnel zone plate according to distribution of aberration to be corrected.
Preferably, step S2 further comprises the steps of:
S21, calculating coordinates of a first exposure point A (x A,yA, 0) and a second exposure point B (x B,yB, 0), and designing grid line distribution of a secondary phase off-axis Fresnel zone plate by utilizing interference fringes of the coordinates on a holographic surface formed in a chromatographic microscopy system light path to correct aberration to be corrected;
S22, setting an optimization function to optimize the first exposure point and the second exposure point so as to limit the imaging position of zero-order diffraction of the secondary phase off-axis Fresnel zone plate, and further correcting the aberration to be corrected;
s23, setting multiple structures in diffraction order parameters of the holographic surface to realize layered chromatography.
Preferably, step S21 comprises the steps of:
S211, obtaining an expression F (i,j) corresponding to different aberrations by using a power expansion of an optical path function F (w, l):
wherein (w, l) is the y-axis and z-axis coordinates of any point P on the base of the quadratic phase off-axis Fresnel zone plate,
K is the aberration order;
S212, establishing an equation set of an expression F (i,j), and solving coordinates of a first exposure point and a second exposure point of r A、rB, alpha and beta:
xA＝rA×cosα,yA＝rA×sinα，
xB＝rB×cosβ,yB＝rB×sinβ， (2)
wherein r A is the distance from the first exposure point A to the center AO of the substrate,
R B is the distance from the second exposure point B to the substrate center BO,
Alpha is the included angle between AO and the x-axis,
Beta is the angle between BO and x-axis.
Preferably, k=4.
Preferably, the method further comprises step S3:
And S3, programming and calculating a mask of the secondary phase off-axis Fresnel zone plate according to the coordinates of the first exposure point and the second exposure point, and manufacturing the off-axis Fresnel zone plate.
The invention can obtain the following technical effects:
1. The imaging system has two functions of chromatography and system aberration correction, improves the imaging quality of the system and reduces the complexity of the system.
Drawings
FIG. 1 is a flow chart of a method of designing a secondary phase off-axis Fresnel zone plate in accordance with one embodiment of the present invention;
FIG. 2 is a schematic diagram of the optical path of a chromatographic microscopy system according to an embodiment of the invention;
FIG. 3 is a schematic view of spherical aberration detection according to an embodiment of the present invention;
FIG. 4 is a schematic diagram of ray tracing of one embodiment of the invention;
Fig. 5 is a schematic diagram of a secondary phase off-axis fresnel zone plate imaging of one embodiment of the present invention.
Reference numerals:
1. The secondary phase off-axis fresnel zone plate.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention will be further described in detail with reference to the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not to be construed as limiting the invention.
The invention aims to provide a design method of a secondary phase off-axis Fresnel zone plate, which optimizes the position of an exposure point to reduce the influence of spherical aberration of a microscopic system on imaging by writing an optimization function of the secondary phase off-axis Fresnel zone plate in optical design software, and then realizes the function of imaging by utilizing different diffraction orders by designing parameters of the secondary phase off-axis Fresnel zone plate. The method for designing the secondary phase off-axis Fresnel zone plate provided by the invention is described in detail through specific embodiments.
Referring to the design method flow of the secondary phase off-axis fresnel zone plate shown in fig. 1, S1: determining the system aberration to be corrected existing in the chromatographic microscopy system optical path, and S2: and selecting two exposure points for existing system aberration, determining and optimizing grid line distribution of the secondary phase off-axis Fresnel zone plate by utilizing interference fringes formed by the two exposure points on the holographic surface, and setting multiple structures in diffraction order parameters of the holographic surface to realize layered chromatography.
In a preferred embodiment of the present invention, in the chromatographic microscope system optical path based on the secondary phase off-axis fresnel zone plate as shown in fig. 2, the Zemax software is used to perform a chromatographic optical path simulation analysis to determine the aberration distribution as shown in fig. 3 existing in the whole system, thus determining that the chromatographic microscope system contains spherical aberration.
And selecting two exposure points, and correcting spherical aberration existing in the system by utilizing interference fringes formed on a holographic surface in a light path of the chromatographic microscopy system.
As shown in fig. 5, a rectangular coordinate system xoy with the center point O of the secondary phase off-axis fresnel zone plate 1 as the origin is established, the normal direction of the surface of the secondary phase off-axis fresnel zone plate 1 is the x-axis, the grid line direction perpendicular to the secondary phase off-axis fresnel zone plate is the y-axis, and the grid line direction parallel to the secondary phase off-axis fresnel zone plate is the z-axis.
A is an object point, the m-th diffraction light after the light emitted by the object point is diffracted by the secondary phase off-axis Fresnel zone plate 1 is imaged on an image point B, P is any point on the substrate of the secondary phase off-axis Fresnel zone plate 1, and the optical path function of the light APB can be expressed as follows:
wherein n is the grating density of the quadratic phase off-axis fresnel zone plate 1.
Performing power series expansion:
wherein F (i,j) corresponds to different aberrations, the higher the aberration order, the less the effect on the spectral imaging of the secondary phase off-axis fresnel zone plate 1.
In a preferred embodiment of the present invention, let k=4, the expression corresponding to defocus can be obtained:
Expression corresponding to meridian coma:
expression corresponding to sagittal coma:
An expression corresponding to spherical aberration:
Wherein lambda is the wavelength used by the off-axis Fresnel zone plate, lambda 0 is the recording wavelength of the off-axis Fresnel zone plate,
N 10、n20、n12、n30、n40、n22 and n 04 are coefficients of the grid line distribution function of the quadratic phase off-axis fresnel zone plate 1, i.e. aberration correction coefficients.
The parameters r A、rB, alpha and beta of the off-axis Fresnel zone plate which is required to be manufactured for correcting the spherical aberration can be obtained by establishing an equation set through formulas (7), (8) and (9), and the coordinates of the point A and the point B obtained at the moment are the coordinates of the first exposure point and the second exposure point:
xA＝rA×cosα,yA＝rA×sinα，
xB＝rB×cosβ,yB＝rB×sinβ， (2)
wherein r A is the distance from the first exposure point A to the center AO of the substrate,
R B is the distance from the second exposure point B to the substrate center BO,
Alpha is the angle between AO and the x-axis.
At this time, the grating distribution of the secondary phase off-axis fresnel zone plate 1 is designed using interference fringes formed at the hologram surface by the first exposure point a (x A,yA, 0) and the second exposure point B (x B,yB, 0).
In a preferred embodiment of the present invention, the optimization of the first exposure point a (x A,yA, 0) and the second exposure point B (x B,yB, 0) is continued by setting an optimization function to limit the imaging position of the zero-order diffraction of the secondary phase off-axis fresnel zone plate 1.
Meanwhile, by arranging multiple structures in the diffraction order parameters of the holographic surface (the step is the prior art and is not repeated), the aim of realizing layering chromatography while correcting the spherical aberration is fulfilled.
And finally, calculating an off-axis Fresnel zone plate mask by Matlab software programming, and manufacturing the off-axis Fresnel zone plate by wet etching.
In another embodiment of the invention, according to the Fermat principle, ideal imaging theorem and the like, the Matlab software is used for carrying out ray tracing on the chromatographic microscopic optical path system subjected to spherical aberration correction, and the verification result is shown in fig. 4, namely, an object point A and an object point C on an optical axis are subjected to secondary phase off-axis Fresnel zone plate correction and chromatography designed by the invention and then imaged at the point A 'and the point C', so that functions of chromatography and system aberration correction are realized.
In the description of the present specification, a description referring to terms "one embodiment," "some embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms are not necessarily directed to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples. Furthermore, the different embodiments or examples described in this specification and the features of the different embodiments or examples may be combined and combined by those skilled in the art without contradiction.
While embodiments of the present invention have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the invention, and that variations, modifications, alternatives and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the invention.
The above embodiments of the present invention do not limit the scope of the present invention. Any of various other corresponding changes and modifications made according to the technical idea of the present invention should be included in the scope of the claims of the present invention.
Claims (4)
1. The design method of the secondary phase off-axis Fresnel zone plate is characterized by comprising the following steps of:
s1, determining aberration to be corrected existing in a chromatographic microscopy system light path;
S2, calculating and utilizing coordinates of a first exposure point and a second exposure point to determine grid line distribution of a secondary phase off-axis Fresnel zone plate according to the distribution of the aberration to be corrected;
Step S2 further comprises the steps of:
S21, calculating the first exposure point And the second exposure spot/>The grid line distribution of the secondary phase off-axis Fresnel zone plate is designed by utilizing interference fringes on a holographic surface formed in a chromatographic microscopy system light path, the aberration to be corrected is corrected, A is an object point, the m-th diffraction light is imaged on an image point B after the light emitted by the lens is diffracted by the secondary phase off-axis Fresnel zone plate, a rectangular coordinate system xoy taking the center point O of the secondary phase off-axis Fresnel zone plate as an original point is established, the surface normal direction of the secondary phase off-axis Fresnel zone plate is an x-axis, the grid line direction of the vertical secondary phase off-axis Fresnel zone plate is a y-axis, and the grid line direction of the parallel secondary phase off-axis Fresnel zone plate is a z-axis;
s22, setting an optimization function to optimize the first exposure point and the second exposure point so as to limit the imaging position of zero-order diffraction of the secondary phase off-axis Fresnel zone plate, and further correcting the aberration to be corrected;
S23, setting multiple structures in diffraction order parameters of the holographic surface to realize layered chromatography.
2. The method of designing a secondary phase off-axis fresnel zone plate according to claim 1, wherein step S21 comprises the steps of:
s211, utilizing an optical path function The power-level expansion of (2) to obtain the expressions/>, corresponding to different said aberrations:
（1）
Wherein,For y-axis and z-axis coordinates of any point P on the base of the secondary phase off-axis fresnel zone plate,
K is the aberration order;
s212, establishing the expression Solving the equation set concerning/>Coordinates of the first exposure point and the second exposure point:
，
（2）
wherein, For the distance of the first exposure spot a to the substrate center AO,
For the distance of the second exposure point B to the substrate center BO,
Is the included angle between AO and the x-axis,
Is the angle between BO and x-axis.
3. The method of designing a secondary phase off-axis fresnel zone plate of claim 2, wherein k = 4.
4. The method of designing a secondary phase off-axis fresnel zone plate of claim 1, further comprising step S3:
And S3, programming and calculating the mask of the secondary phase off-axis Fresnel zone plate according to the coordinates of the first exposure point and the second exposure point, and manufacturing the off-axis Fresnel zone plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110638324.8A CN113267889B (en) | 2021-06-08 | 2021-06-08 | Design method of secondary phase off-axis Fresnel zone plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110638324.8A CN113267889B (en) | 2021-06-08 | 2021-06-08 | Design method of secondary phase off-axis Fresnel zone plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113267889A CN113267889A (en) | 2021-08-17 |
| CN113267889B true CN113267889B (en) | 2024-05-24 |
Family
ID=77234577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110638324.8A Active CN113267889B (en) | 2021-06-08 | 2021-06-08 | Design method of secondary phase off-axis Fresnel zone plate |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113267889B (en) |
Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4378142A (en) * | 1979-06-21 | 1983-03-29 | Nippon Electric Co., Ltd | Hologram made by using a plurality of spherical waves and a device for laser beam scanning by using the hologram |
| JPS6031101A (en) * | 1983-07-29 | 1985-02-16 | Shimadzu Corp | Fresnel zone plate |
| US4690506A (en) * | 1984-10-03 | 1987-09-01 | Hitachi, Ltd. | Method of producing varied line-space diffraction gratings |
| US4824193A (en) * | 1985-07-26 | 1989-04-25 | Matsushita Electric Industrial Co., Ltd. | Holographic multiplexer/demultiplexer and its manufacturing method |
| CN1967293A (en) * | 2006-03-03 | 2007-05-23 | 长春市恒宇光电科技有限公司 | Manufacturing method of eliminating aberration concave holographic grating |
| CN102116885A (en) * | 2009-12-31 | 2011-07-06 | 上海科学院 | Super-resolution Fresnel wave zone plate |
| CN103091753A (en) * | 2013-01-11 | 2013-05-08 | 中国科学院长春光学精密机械与物理研究所 | Method for adjusting perpendicularity between grating line and beam current in blazed grating ion beam etching device |
| CN104880753A (en) * | 2015-05-05 | 2015-09-02 | 清华大学深圳研究生院 | Optimum design method for manufacturing Fresnel grating |
| CN106909047A (en) * | 2017-04-20 | 2017-06-30 | 北京理工大学 | Multilayer calculates holographic chromatic aberation and eliminates and diopter correction waveguide display methods and system |
| CN111190246A (en) * | 2013-05-22 | 2020-05-22 | 菲尼萨公司 | System and method for aberration correction in optical systems |
| CN212410846U (en) * | 2019-12-25 | 2021-01-26 | 青岛克莱玛物联技术有限公司 | Fresnel zone plate device for enhancing detection precision of microwave radar |
-
2021
- 2021-06-08 CN CN202110638324.8A patent/CN113267889B/en active Active
Patent Citations (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4378142A (en) * | 1979-06-21 | 1983-03-29 | Nippon Electric Co., Ltd | Hologram made by using a plurality of spherical waves and a device for laser beam scanning by using the hologram |
| JPS6031101A (en) * | 1983-07-29 | 1985-02-16 | Shimadzu Corp | Fresnel zone plate |
| US4690506A (en) * | 1984-10-03 | 1987-09-01 | Hitachi, Ltd. | Method of producing varied line-space diffraction gratings |
| US4824193A (en) * | 1985-07-26 | 1989-04-25 | Matsushita Electric Industrial Co., Ltd. | Holographic multiplexer/demultiplexer and its manufacturing method |
| CN1967293A (en) * | 2006-03-03 | 2007-05-23 | 长春市恒宇光电科技有限公司 | Manufacturing method of eliminating aberration concave holographic grating |
| CN102116885A (en) * | 2009-12-31 | 2011-07-06 | 上海科学院 | Super-resolution Fresnel wave zone plate |
| CN103091753A (en) * | 2013-01-11 | 2013-05-08 | 中国科学院长春光学精密机械与物理研究所 | Method for adjusting perpendicularity between grating line and beam current in blazed grating ion beam etching device |
| CN111190246A (en) * | 2013-05-22 | 2020-05-22 | 菲尼萨公司 | System and method for aberration correction in optical systems |
| CN104880753A (en) * | 2015-05-05 | 2015-09-02 | 清华大学深圳研究生院 | Optimum design method for manufacturing Fresnel grating |
| CN106909047A (en) * | 2017-04-20 | 2017-06-30 | 北京理工大学 | Multilayer calculates holographic chromatic aberation and eliminates and diopter correction waveguide display methods and system |
| CN212410846U (en) * | 2019-12-25 | 2021-01-26 | 青岛克莱玛物联技术有限公司 | Fresnel zone plate device for enhancing detection precision of microwave radar |
Non-Patent Citations (7)
| Title |
|---|
| Holographic correction of both chromatic and spherical aberrations of single glass lenses;H. Madjidi-Zolbanine，C. Froehly;Applied Optics;19791231;第18卷(第14期);全文 * |
| Tomographic diffractive microscopy and multiview profilometry with flexible aberration correction;H. Liu, J. Bailleul;Applied Optics;20141231;第53卷(第4期);全文 * |
| 制作平面全息光栅的离轴抛物镜/洛埃镜干涉系统;巴音贺希格;邵先秀;崔继承;李文昊;齐向东;;光学精密工程;20110115(01);全文 * |
| 双光栅平场全息凹面光栅光谱仪的优化设计;孔鹏;巴音贺希格;李文昊;唐玉国;崔锦江;;光学学报;20110215(第02期);全文 * |
| 平面变栅距全息光栅设计方法与制作技术研究;姜岩秀;中国博士学位论文全文数据库 工程科技Ⅱ辑;20150915(第9期);1-132 * |
| 扫描平场全息凹面光栅;刘虎, 沈为民;光学学报;19910605(第06期);全文 * |
| 消像差Offner成像光谱仪的研究进展;韩姗;黄元申;李柏承;张大伟;倪争技;;激光技术;20150125(第01期);全文 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113267889A (en) | 2021-08-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11781966B2 (en) | 3D diffraction tomography microscopy imaging method based on LED array coded illumination | |
| CN104034279B (en) | A kind of detection device and method utilizing stitching measure face, pinhole difiration corrugated shape | |
| CN108917651B (en) | Super-resolution three-dimensional shape measurement method based on optical tweezers medium microspheres | |
| CN111650203B (en) | Method for measuring defects on inner surface of microsphere | |
| US20220262087A1 (en) | Method and apparatus for super-resolution optical imaging | |
| CN114690404B (en) | Multi-diffraction-order independent light wave field regulation and control method based on super surface | |
| WO2020045589A1 (en) | Surface shape measurement device and surface shape measurement method | |
| CN108918465A (en) | Optical 3-dimensional imaging system and optical 3-dimensional imaging method | |
| CN113267889B (en) | Design method of secondary phase off-axis Fresnel zone plate | |
| JP2019078635A (en) | Measuring apparatus, data processor, method for processing data, and program | |
| KR101166961B1 (en) | Wavefront aberration retrieval method by 3D beam measurement | |
| CN110619680A (en) | Three-dimensional fault phase microscope reconstruction method based on figure variation | |
| CN113418470B (en) | Spectrum scanning confocal single-exposure digital holographic measurement system and measurement method | |
| Fu et al. | A general phase retrieval algorithm based on a ptychographical iterative engine for coherent diffractive imaging | |
| CN114371549B (en) | Quantitative phase imaging method and system based on multi-focus multiplexing lens | |
| Gabryś‐Mizera | Model considerations of the light conditions in noncylindrical plant cells | |
| CN112666172B (en) | Method and device for detecting outer surface defects of differential confocal fixed-surface interference target pill | |
| CN112630232B (en) | Method and device for detecting defects of inner surface and outer surface of differential confocal fixed-surface interference target pill | |
| CN112683918B (en) | Method and device for detecting inner surface defects of differential confocal fixed-surface interference target pellet | |
| CN112067532B (en) | Combined digital holographic microscopy method for measuring three-dimensional displacement optical axial position of particle | |
| JP2022162306A (en) | Surface shape measurement device and surface shape measurement method | |
| WO2021155378A1 (en) | Systems and methods for performing multiple-wavelength quantitative phase imaging (qpi) | |
| Xie et al. | Deep learning for estimation of Kirkpatrick–Baez mirror alignment errors | |
| CN112097681A (en) | Complex optical curved surface shape error detection method based on speckle field phase recovery | |
| CN112862682B (en) | Multi-constraint coaxial digital holographic resolution enhancement method and system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |