CN113265634A - Rare earth alloy target material and preparation method and application thereof - Google Patents
Rare earth alloy target material and preparation method and application thereof Download PDFInfo
- Publication number
- CN113265634A CN113265634A CN202110468976.1A CN202110468976A CN113265634A CN 113265634 A CN113265634 A CN 113265634A CN 202110468976 A CN202110468976 A CN 202110468976A CN 113265634 A CN113265634 A CN 113265634A
- Authority
- CN
- China
- Prior art keywords
- rare earth
- alloy
- earth alloy
- alloy target
- target material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/02—Making non-ferrous alloys by melting
- C22C1/03—Making non-ferrous alloys by melting using master alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/02—Alloys based on gold
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/14—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of noble metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to the technical field of precious metals, and provides a rare earth alloy target material and a preparation method and application thereof. The rare earth alloy target provided by the invention comprises the following components in percentage by mass: 75-88% of Au, 1.5-3% of Cr, 3-7% of Ag, 0.05-1.5% of Y, 0.01-0.05% of Sb, 0.03-3% of Zn, 10-15% of Cu and 0.01-0.05% of Ce. According to the invention, by controlling the types and contents of the alloy elements, the novel champagne golden alloy target material with low color saturation and high brightness is obtained, and compared with the traditional champagne golden color, the champagne golden alloy target material has the advantages that the color of the alloy is light orange and pink, so that the champagne golden target material is more elegant and soft, the market requirements can be met, and the problem of single champagne golden color in the current market is solved. In addition, the alloy target material provided by the invention has good oxidation resistance and corrosion resistance, and the gold content is low, so that the preparation cost of the champagne gold jewelry can be reduced.
Description
Technical Field
The invention relates to the technical field of precious metals, in particular to a rare earth alloy target material and a preparation method and application thereof.
Background
The champagne golden color is a color between orange and yellow, is less than rose gold, is more beautiful and more elegant, and is favored in recent years. The champagne golden alloy is generally a gold-copper alloy, and various ornaments can be prepared by taking the alloy as a target material for magnetron sputtering.
However, the traditional champagne gold alloy has high gold content (generally more than 90%), low brightness, high color saturation and single color, so that the market application range is narrow, and after the current champagne gold is used as a target material for coating, the oxidation resistance and corrosion resistance of the obtained film layer need to be further improved.
Disclosure of Invention
In view of this, the present invention aims to provide a rare earth alloy target material, a preparation method thereof and an application thereof. The rare earth alloy target material provided by the invention has the advantages of low gold content, high brightness, low color saturation, and good oxidation resistance and corrosion resistance of the formed film.
In order to achieve the above object, the present invention provides the following technical solutions:
a rare earth alloy target comprises the following components in percentage by mass: 75-88% of Au, 1.5-3% of Cr, 3-7% of Ag, 0.05-1.5% of Y, 0.01-0.05% of Sb, 0.03-3% of Zn, 10-15% of Cu and 0.01-0.05% of Ce.
Preferably, the composition comprises the following components in percentage by mass: 78-85% of Au, 2-2.5% of Cr, 4-6% of Ag, 0.1-1% of Y, 0.02-0.04% of Sb, 0.05-2.5% of Zns, 12-14% of Cu and 0.02-0.04% of Ce.
Preferably, the thickness of the rare earth alloy target is 2.5-3 mm.
The invention also provides a preparation method of the rare earth alloy target material, which comprises the following steps:
(1) smelting copper, chromium and zinc to obtain a copper-based ternary intermediate alloy;
(2) smelting silver, yttrium, cerium and antimony to obtain a silver-based quaternary intermediate alloy;
(3) smelting the gold, the copper-based ternary intermediate alloy and the silver-based quaternary intermediate alloy to obtain a rare earth alloy ingot;
(4) carrying out homogenization heat treatment, rolling processing and surface treatment on the rare earth alloy cast ingot in sequence to obtain a rare earth alloy target material;
the step (1) and the step (2) have no requirement of time sequence.
Preferably, the step (1) is specifically: heating and melting copper, sequentially adding chromium and zinc for melting, and then casting the obtained alloy melt; the smelting in the step (1) is carried out in a medium-frequency vacuum induction smelting furnace; the copper-based ternary intermediate alloy comprises the following components in percentage by mass: 75-85% of Cu, 6-12% of Cr and 8-14% of Zn.
Preferably, the step (2) is specifically: heating and melting silver, sequentially adding yttrium, cerium and antimony for melting, refining the obtained alloy melt, and casting; the refining mode is standing, the refining temperature is 1500-1550 ℃, and the refining time is 10-15 min; the silver-based quaternary master alloy comprises the following components in percentage by mass: 70-80% of Ag, 20-25% of Y, 0.5-1.5% of Ce and 0.3-1.5% of Sb.
Preferably, the temperature of the homogenization heat treatment is 600-650 ℃, the time is 0.8-1 h, and the heating rate of the temperature rising to the homogenization heat treatment temperature is 8-12 ℃/min.
Preferably, the rolling processing method is cold rolling, the single-pass reduction of the cold rolling is 10-20%, and the total reduction is 60-80%.
The invention also provides the application of the rare earth alloy target material prepared by the scheme or the rare earth alloy target material prepared by the preparation method in magnetron sputtering coating and decoration processing.
Preferably, the brightness L value of the film obtained by coating is 84-86 under Lab chromaticity system, the yellowness a value is 3.8-5.8, and the redness b value is 14-16.
The invention provides a rare earth alloy target material which comprises the following components in percentage by mass: 75-88% of Au, 1.5-3% of Cr, 3-7% of Ag, 0.05-1.5% of Y, 0.01-0.05% of Sb, 0.03-3% of Zns, 10-15% of Cu and 0.01-0.05% of Ce. According to the invention, by controlling the types and contents of the alloy elements, the novel champagne golden alloy target material with low color saturation and high brightness is obtained, and compared with the traditional champagne golden color, the color of the alloy is light orange, elegant and fashionable, pink is added, the alloy looks sweet and soft, the market demand can be met, and the problem of single color of champagne in the current market is solved. In addition, the alloy target material provided by the invention has good oxidation resistance and corrosion resistance, and the gold content is low, so that the preparation cost of the champagne gold jewelry can be reduced.
The invention also provides a preparation method of the rare earth alloy target material in the scheme, the preparation method comprises the steps of firstly preparing the copper-based ternary intermediate alloy (copper-chromium-zinc ternary alloy) and the silver-based quaternary intermediate alloy (silver-yttrium-cerium-antimony quaternary alloy), and then smelting the gold, the copper-based ternary intermediate alloy and the silver-based quaternary intermediate alloy, so that the problem that too high smelted elements are not easy to be smelted in can be avoided, and meanwhile, the problem that elements with lower density float on the surface of a melt and cannot be uniformly mixed is avoided; in addition, the rare earth elements are easy to oxidize and are easy to become oxide inclusions or slag phases when being directly added. In addition, the preparation method provided by the invention has simple steps and is easy to operate.
Detailed Description
The invention provides a rare earth alloy target material which comprises the following components in percentage by mass: 75-88% of Au, 1.5-3% of Cr, 3-7% of Ag, 0.05-1.5% of Y, 0.01-0.05% of Sb, 0.03-3% of Zns, 10-15% of Cu and 0.01-0.05% of Ce.
The rare earth alloy target comprises, by mass, 75-88% of Au, preferably 78-85% of Au, and further preferably 80-82%. The content of the Au element in the traditional rose gold target material is more than 90%, and the content of Au is controlled to be 75-88%, so that the cost of the rose gold target material can be greatly reduced, and the preparation cost of the rose gold ornament can be further reduced.
The rare earth alloy target comprises, by mass, 1.5-3% of Cr, preferably 2-2.5% of Cr, and more preferably 2.1-2.3% of Cr. In the invention, Cr can reduce the b value (red value) of the alloy in a Lab color system, and can refine the crystal grains of the alloy and improve the oxidation resistance and the corrosion resistance of the alloy.
The rare earth alloy target comprises, by mass, 3-7% of Ag, preferably 4-6% of Ag, and more preferably 4.5-5.5% of Ag. In the invention, the Ag can enhance the brightness of the rare earth alloy target.
The rare earth alloy target comprises, by mass, 0.05-1.5% of Y, preferably 0.1-1%, and more preferably 0.3-0.5%. In the present invention, the rare earth element Y can reduce the color saturation of the alloy.
The rare earth alloy target comprises, by mass, 0.01-0.05% of Sb, preferably 0.02-0.04%, and more preferably 0.03-0.035%. In the invention, the Sb can improve the oxidation resistance and the corrosion resistance of the alloy.
The rare earth alloy target comprises, by mass, 0.03-3% of Zns, preferably 0.05-2.5%, and more preferably 0.1-2%. In the present invention, the Zn can enhance the corrosion resistance of the alloy while lowering the b value (red value) of the alloy in the Lab color system.
The rare earth alloy target comprises, by mass, 10-15% of Cu, preferably 12-14% of Cu, and more preferably 12.5-13.5% of Cu. In the present invention, Cu can change the color of the alloy to increase the a value (yellowness) and can enhance the alloy hardness.
The rare earth alloy target comprises, by mass, 0.01-0.05% of Ce, preferably 0.02-0.04%, and more preferably 0.025-0.03%. In the present invention, the rare earth element Ce can improve the brightness of the alloy. In the field, rare earth elements are not added in the champagne gold target material in a precedent, and the invention can improve the brightness of the alloy and reduce the saturation thereof by adding the rare earth elements Y and Ce in the alloy target material, thereby obtaining a novel rare earth alloy target material.
According to the invention, by controlling the content of each element, the brightness of the target material is improved, the saturation of the target material is reduced, and compared with the traditional champagne gold target material, the rare earth alloy target material obtained finally is added with light orange and pink, so that the rare earth alloy target material is more elegant, fashionable, sweet and soft.
In the invention, the thickness of the rare earth alloy target is preferably 2.5-3 mm, and the grain size of the rare earth alloy target is 5-8 grades.
The invention also provides a preparation method of the rare earth alloy target material, which comprises the following steps:
(1) smelting copper, chromium and zinc to obtain a copper-based ternary intermediate alloy;
(2) smelting silver, yttrium, cerium and antimony to obtain a silver-based quaternary intermediate alloy;
(3) smelting the gold, the copper-based ternary intermediate alloy and the silver-based quaternary intermediate alloy to obtain a rare earth alloy ingot;
(4) carrying out homogenization heat treatment, rolling processing and surface treatment on the rare earth alloy cast ingot in sequence to obtain a rare earth alloy target material;
the step (1) and the step (2) have no requirement of time sequence.
The invention carries out smelting on copper, chromium and zinc to obtain the copper-based ternary intermediate alloy. In the invention, the copper-based ternary intermediate alloy comprises the following components in percentage by mass: 75-85% of Cu, preferably 78-82%, 6-12% of Cr, preferably 8-10%, 8-14% of Zn, preferably 10-12%.
In the present invention, the step (1) is preferably specifically: firstly melting copper, then adding chromium, adding zinc for melting after chromium is completely melted, and casting the obtained alloy melt after zinc is completely melted to obtain the copper-based ternary intermediate alloy. The invention has no special requirement on the melting temperature, and can completely melt each metal by adopting the temperature well known by the technical personnel in the field; the casting is specifically to add the melt into a copper mold preheated at 220 ℃ for 15-20 min, and then carry out water cooling. In the present invention, the melting in the step (1) is preferably performed in a medium frequency vacuum induction melting furnace.
The invention carries out smelting on silver, yttrium, cerium and antimony to obtain the silver-based quaternary intermediate alloy. In the invention, the silver-based quaternary master alloy comprises the following components in percentage by mass: 70-80% of Ag, 20-25% of Y, 0.5-1.5% of Ce and 0.3-1.5% of Sb, and preferably comprises 75-78% of Ag, 21-23% of Y, 0.8-1.2% of Ce and 0.5-1% of Sb. In the invention, the alloy elements are easy to volatilize in the smelting process, and the invention controls the element components of the copper-based quaternary intermediate alloy and the silver-based ternary intermediate alloy in the above range, thereby effectively controlling the chemical components of the finally obtained rare earth alloy target.
In the present invention, the step (2) is preferably specifically: heating and melting silver, sequentially adding yttrium, cerium and antimony for melting, refining the obtained alloy melt, and casting; the refining mode is preferably standing, the refining temperature is preferably 1500-1550 ℃, and the refining time is preferably 10-15 min. The invention has no special requirement on the melting temperature of each metal, and the temperature which is well known by the technicians in the field can be adopted; the casting is specifically to add the melt into a copper mold preheated at 220 ℃ for 15-20 min, and then carry out water cooling. In the present invention, the melting in the step (2) is preferably performed in a medium frequency vacuum induction melting furnace.
After the copper-based ternary intermediate alloy and the silver-based quaternary intermediate alloy are obtained, the invention melts the gold, the copper-based ternary intermediate alloy and the silver-based quaternary intermediate alloy to obtain the rare earth alloy cast ingot. In the specific embodiment of the invention, preferably, the gold is heated and melted, then the copper-based ternary intermediate alloy and the silver-based quaternary intermediate alloy are added for melting, after the metal is completely melted, the mixture is uniformly stirred, and the obtained alloy melt is cast; the casting is specifically to add the melt into a copper mold preheated at 220 ℃ for 15-20 min, and then carry out water cooling.
After the rare earth alloy ingot is obtained, the rare earth alloy ingot is subjected to homogenization heat treatment, rolling processing and surface treatment in sequence to obtain the rare earth alloy target. In the invention, the temperature of the homogenization heat treatment is preferably 600-650 ℃, more preferably 610-630 ℃, the time of the homogenization heat treatment is preferably 0.8-1 h, more preferably 0.9h, and the heating rate of the temperature to the homogenization heat treatment temperature is preferably 8-12 ℃/min, more preferably 10 ℃/min. The invention reduces the grain size of the alloy target material through the homogenization heat treatment, eliminates the internal stress, improves the hardness, increases the ductility and the toughness of the material, and prevents the deformation and the cracking.
In the invention, the rolling method is preferably cold rolling, the single-pass reduction of the cold rolling is preferably 10-20%, more preferably 13-18%, and the total reduction is preferably 60-80%, more preferably 65-75%. According to the invention, the rare earth alloy target material with the thickness of 2.5-3 mm is obtained through cold rolling, and in the specific embodiment of the invention, the length and width of the rare earth alloy target material are preferably cut according to the requirements of a film plating machine.
In the present invention, the surface treatment preferably includes grinding and polishing.
The invention also provides the application of the rare earth alloy target material prepared by the scheme or the rare earth alloy target material prepared by the preparation method in magnetron sputtering coating and decoration processing. The method of the present invention is not particularly limited, and may be applied by methods known to those skilled in the art. In the invention, the brightness L value of the film layer obtained by coating is preferably 84-86, more preferably 84.5-85.5 under Lab chromaticity system, the yellowness a value is preferably 3.8-5.8, more preferably 4-5.5, and the redness b value is preferably 14-16, more preferably 14.5-15.5.
The technical solution of the present invention will be clearly and completely described below with reference to the embodiments of the present invention.
Example 1
The rare earth alloy target comprises the following components in percentage by mass: 75% of Au, 2.2% of Cr, 5.7% of Ag, 1.05% of Y, 0.02% of Sb, 2.5% of Zn, 13.5% of Cu and 0.03% of Ce.
The preparation steps are as follows:
(1) heating copper to 1100 ℃ to melt the copper, adding chromium to melt the copper, adding zinc to melt the chromium, casting the alloy melt in a copper mold preheated to 220 ℃ after the zinc is completely melted, and performing water cooling to obtain a copper-based ternary intermediate alloy; the copper-based ternary intermediate alloy comprises the following components in percentage by mass: 76.5 percent of Cu, 10 percent of Cr and 13.5 percent of Zn;
(2) heating silver to 950 ℃ to melt the silver, sequentially adding yttrium, cerium and antimony to melt the silver, standing the silver at 1500 ℃ for 15min to refine the silver, casting the obtained alloy melt in a copper mold preheated to 220 ℃ after the refining is finished, and performing water cooling on the alloy melt to obtain a silver-based quaternary intermediate alloy; the silver-based quaternary intermediate alloy comprises the following components in percentage by mass: 75% of Ag, 23.5% of Y, 0.5% of Ce and 1% of Sb;
(3) heating gold to 1050 ℃ to melt the gold, then adding a copper-based ternary intermediate alloy and a silver-based quaternary intermediate alloy, heating to melt, uniformly stirring after all metals are melted, casting the melt into a copper mold preheated to 220 ℃, and performing water cooling to obtain a rare earth alloy ingot;
(4) and (2) carrying out homogenization heat treatment on the rare earth alloy cast ingot at the temperature of 600 ℃, wherein the time of the homogenization heat treatment is 1h, the temperature rise speed is 10 ℃/min, cold rolling is carried out on the cast ingot after the homogenization heat treatment, the single-pass reduction is 10%, the total reduction is 60%, and the obtained cold rolling blank is ground and polished to obtain the rare earth alloy target.
And (3) carrying out vacuum magnetron sputtering coating on the obtained rare earth alloy target, wherein the colorimetric value of the film layer in the Lab color system is as follows: l-84, a-4, b-16;
the obtained membrane layer is subjected to an artificial sweat test according to the method in ISO3160, and the obtained membrane layer is subjected to a salt spray resistance test according to the method in ISO9227, and the results show that the artificial sweat test 148h does not change color, and the salt spray test 148h does not change color.
Example 2
The rare earth alloy target comprises the following components in percentage by mass: 80% of Au, 1.87% of Cr, 5% of Ag, 0.08% of Y, 0.03% of Sb, 1% of Zn, 12% of Cu and 0.02% of Ce.
The procedure was as in example 1, wherein: the components of the obtained copper-based ternary intermediate alloy are as follows: 80% of Cu, 11.5% of Cr and 8.5% of Zns, wherein the obtained silver-based quaternary master alloy comprises the following components: 75.52 percent of Ag, 23.48 percent of Y, 0.6 percent of Ce and 0.4 percent of Sb.
And (3) carrying out vacuum magnetron sputtering coating on the obtained rare earth alloy target, wherein the colorimetric value of the film layer in the Lab color system is as follows: l85.5, a 4.6, b 15;
the obtained membrane layer is subjected to an artificial sweat test according to the method in ISO3160, and the obtained membrane layer is subjected to a salt spray resistance test according to the method in ISO9227, and the results show that the artificial sweat test 148h does not change color, and the salt spray test 148h does not change color.
Example 3
The rare earth alloy target comprises the following components in percentage by mass: au 83%, Cr 1.65%, Ag 4.2%, Y0.1%, Sb 0.03%, Zn 1%, Cu 10%, Ce 0.02%.
The procedure was as in example 1, wherein: the components of the obtained copper-based ternary intermediate alloy are as follows: cu 83.5%, Cr 7.5% and Zn 9%, wherein the obtained silver-based quaternary master alloy comprises the following components: 76.5 percent of Ag, 22.12 percent of Y, 0.79 percent of Ce and 0.59 percent of Sb.
And (3) carrying out vacuum magnetron sputtering coating on the obtained rare earth alloy target, wherein the colorimetric value of the film layer in the Lab color system is as follows: l86, a 5.5, b 14.5;
the obtained membrane layer is subjected to an artificial sweat test according to the method in ISO3160, and the obtained membrane layer is subjected to a salt spray resistance test according to the method in ISO9227, and the results show that the artificial sweat test 148h does not change color, and the salt spray test 148h does not change color.
In addition, the rare earth alloy target materials prepared in the embodiments 1 to 3 are subjected to a high temperature resistance test, and the result shows that the obtained rare earth alloy target materials do not change color at 100 ℃ for 110 min.
The results of the above examples show that the rare earth alloy target provided by the invention has high brightness, low saturation, strong oxidation resistance and corrosion resistance, and can meet the market requirements.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (10)
1. The rare earth alloy target is characterized by comprising the following components in percentage by mass: 75-88% of Au, 1.5-3% of Cr, 3-7% of Ag, 0.05-1.5% of Y, 0.01-0.05% of Sb, 0.03-3% of Zn, 10-15% of Cu and 0.01-0.05% of Ce.
2. The rare earth alloy target according to claim 1, comprising the following components in mass fraction: 78-85% of Au, 2-2.5% of Cr, 4-6% of Ag, 0.1-1% of Y, 0.02-0.04% of Sb, 0.05-2.5% of Zns, 12-14% of Cu and 0.02-0.04% of Ce.
3. The rare earth alloy target according to claim 1 or 2, wherein the thickness of the rare earth alloy target is 2.5 to 3 mm.
4. The preparation method of the rare earth alloy target material according to any one of claims 1 to 3, characterized by comprising the following steps:
(1) smelting copper, chromium and zinc to obtain a copper-based ternary intermediate alloy;
(2) smelting silver, yttrium, cerium and antimony to obtain a silver-based quaternary intermediate alloy;
(3) smelting the gold, the copper-based ternary intermediate alloy and the silver-based quaternary intermediate alloy to obtain a rare earth alloy ingot;
(4) carrying out homogenization heat treatment, rolling processing and surface treatment on the rare earth alloy cast ingot in sequence to obtain a rare earth alloy target material;
the step (1) and the step (2) have no requirement of time sequence.
5. The preparation method according to claim 4, wherein the step (1) is specifically: heating and melting copper, sequentially adding chromium and zinc for melting, and then casting the obtained alloy melt; the smelting in the step (1) is carried out in a medium-frequency vacuum induction smelting furnace; the copper-based ternary intermediate alloy comprises the following components in percentage by mass: 75-85% of Cu, 6-12% of Cr and 8-14% of Zn.
6. The preparation method according to claim 4, wherein the step (2) is specifically: heating and melting silver, sequentially adding yttrium, cerium and antimony for melting, refining the obtained alloy melt, and casting; the refining mode is standing, the refining temperature is 1500-1550 ℃, and the refining time is 10-15 min; the silver-based quaternary master alloy comprises the following components in percentage by mass: 70-80% of Ag, 20-25% of Y, 0.5-1.5% of Ce and 0.3-1.5% of Sb.
7. The method according to claim 4, wherein the temperature of the homogenization heat treatment is 600 to 650 ℃, the time is 0.8 to 1 hour, and the rate of temperature increase to the temperature of the homogenization heat treatment is 8 to 12 ℃/min.
8. The production method according to claim 4, wherein the rolling process is cold rolling, and the cold rolling has a single-pass reduction of 10 to 20% and a total reduction of 60 to 80%.
9. Use of the rare earth alloy target according to any one of claims 1 to 3 or the rare earth alloy target prepared by the preparation method according to any one of claims 4 to 8 in magnetron sputtering coating and decoration processing.
10. The use of claim 9, wherein the brightness L value of the film obtained by coating is 84-86, the yellowness a value is 3.8-5.8, and the redness b value is 14-16 under Lab chromaticity system.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110468976.1A CN113265634B (en) | 2021-04-28 | 2021-04-28 | Rare earth alloy target material and preparation method and application thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110468976.1A CN113265634B (en) | 2021-04-28 | 2021-04-28 | Rare earth alloy target material and preparation method and application thereof |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN113265634A true CN113265634A (en) | 2021-08-17 |
| CN113265634B CN113265634B (en) | 2022-06-10 |
Family
ID=77229636
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110468976.1A Active CN113265634B (en) | 2021-04-28 | 2021-04-28 | Rare earth alloy target material and preparation method and application thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN113265634B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63169346A (en) * | 1986-12-29 | 1988-07-13 | Tokuriki Honten Co Ltd | Ornamental au alloy |
| JPH08311581A (en) * | 1995-05-18 | 1996-11-26 | Tokuriki Honten Co Ltd | Gold alloy for ornament |
| JP2002053917A (en) * | 2000-08-07 | 2002-02-19 | Sato Kinginten:Kk | Au ALLOY FOR ORNAMENT |
| CN101255508A (en) * | 2008-02-29 | 2008-09-03 | 深圳大学 | Rear-earth-containing polybasic yellow gold alloy and preparation method thereof |
| CN104357703A (en) * | 2014-10-28 | 2015-02-18 | 北海鑫利坤金属材料科技开发有限公司 | Rose-bengal 18 K gold and preparation method thereof |
-
2021
- 2021-04-28 CN CN202110468976.1A patent/CN113265634B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63169346A (en) * | 1986-12-29 | 1988-07-13 | Tokuriki Honten Co Ltd | Ornamental au alloy |
| JPH08311581A (en) * | 1995-05-18 | 1996-11-26 | Tokuriki Honten Co Ltd | Gold alloy for ornament |
| JP2002053917A (en) * | 2000-08-07 | 2002-02-19 | Sato Kinginten:Kk | Au ALLOY FOR ORNAMENT |
| CN101255508A (en) * | 2008-02-29 | 2008-09-03 | 深圳大学 | Rear-earth-containing polybasic yellow gold alloy and preparation method thereof |
| CN104357703A (en) * | 2014-10-28 | 2015-02-18 | 北海鑫利坤金属材料科技开发有限公司 | Rose-bengal 18 K gold and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 柳泉 等: "装饰用铜锌仿金合金的研究进展", 《中国资源综合利用》, vol. 36, no. 11, 30 November 2018 (2018-11-30), pages 123 - 125 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113265634B (en) | 2022-06-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN105369048B (en) | V-N steel hard pure gold and preparation method thereof | |
| CN108425029A (en) | A kind of not the argentiferous 18K of resistance to brittle failure rose golds and its processing technology | |
| CN102549179A (en) | White gold alloy free of nickel and copper | |
| CN101949005B (en) | Champagne gold target for vacuum magnetron sputtering and preparation method thereof | |
| CN108754211A (en) | One kind is for vacuum magnetic-control sputtering class proof gold coloured gold alloy target material and preparation method thereof | |
| CN101775567A (en) | Tombarthite zinc nickel magnesium alloy ingot for hot dip coating and preparation method thereof | |
| CN113265634B (en) | Rare earth alloy target material and preparation method and application thereof | |
| CN107164651B (en) | A kind of jewellery pink colour silver alloy and preparation method thereof | |
| CN115747562B (en) | Ornament copper alloy and preparation method thereof | |
| CN108624777A (en) | One kind having saturation rosiness and corrosion resistant cheap rose copper alloy | |
| CN111020294A (en) | Zinc-nickel alloy and preparation method thereof | |
| CN102392152B (en) | Lemon 18K gold and manufacturing method thereof | |
| CN108796293A (en) | The resistance to wear-resistant low cost of brittle failure has roseate rose copper alloy | |
| CN102358929B (en) | Heatproof magnesium sannum silver alloy and preparation method thereof | |
| CN115679149B (en) | High-brightness high-corrosion-resistance antibacterial decorative tin bronze alloy and preparation method thereof | |
| CN111188010B (en) | Gold-copper alloy target material for vacuum magnetron sputtering and preparation method thereof | |
| CN105420531B (en) | Nickel-free white gold alloy for high-temperature enameled jewelry and preparation method for nickel-free white gold alloy | |
| CN108531765A (en) | A kind of corrosion-resistant resistance to brittle failure high intensity 10K billons of brown and its technique | |
| CN108913935A (en) | A kind of jewellery fade resistant high tenacity 18K Zijin and its processing technology | |
| CN115044877A (en) | Preparation method of silver-based ternary alloy target | |
| CN115679152B (en) | Decorative brass alloy with excellent casting performance and preparation method thereof | |
| CN108467963A (en) | With big variable ability yellow jewellery palldium alloy and its processing technology | |
| CN111593228B (en) | Champagne golden copper alloy material and preparation method thereof | |
| CN110699586B (en) | Hard pure silver joint coating material and preparation method thereof | |
| CN108728682A (en) | A kind of rose porpezite and its processing technology with rose color and luster and resistance to brittle failure |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |