CN113210381A

CN113210381A - A wash subassembly and biochemical analysis appearance for rinsing cell among biochemical analysis appearance

Info

Publication number: CN113210381A
Application number: CN202110399797.7A
Authority: CN
Inventors: 郭成哲; 吴海波; 王丹民
Original assignee: Neusoft Weiteman Biotechnology Shenyang Co ltd
Current assignee: Neusoft Weiteman Biotechnology Shenyang Co ltd
Priority date: 2021-04-14
Filing date: 2021-04-14
Publication date: 2021-08-06
Anticipated expiration: 2041-04-14
Also published as: CN113210381B

Abstract

The application provides a cleaning assembly for cleaning a cuvette in a biochemical analyzer and the biochemical analyzer, wherein a mounting plate is arranged; the cleaning needle module comprises a base and a cleaning needle, the base comprises a mounting hole, the cleaning needle extends in the vertical direction and is inserted into the mounting hole, the base is detachably assembled on the mounting plate, and the cleaning needle is used for cleaning the cuvette; the base includes limit structure, the washing needle includes spacing cooperation structure, limit structure with spacing cooperation structure is spacing cooperation, the restriction the washing needle is in the mounting hole rotates. Therefore, the cleaning needle assembly is suitable for biochemical analyzers of different models, and the cleaning needle module is an independent module, so that only the cleaning needle module with the problem is dismounted during maintenance, and the maintenance is convenient.

Description

A wash subassembly and biochemical analysis appearance for rinsing cell among biochemical analysis appearance

Technical Field

The application relates to the technical field of medical equipment, especially, relate to a wash subassembly and biochemical analyzer for rinsing cuvette among biochemical analyzer.

Background

The full-automatic biochemical analyzer is used for detecting and analyzing vital chemical substances, and is an important analyzer used in clinical examination. The full-automatic biochemical analyzer measures the analysis of samples such as blood or other body fluids according to the photoelectric colorimetric principle to determine various biochemical indexes so as to provide scientific data basis for diagnosis of doctors.

After the full-automatic biochemical analyzer tests the concentration of the substance, the full-automatic biochemical analyzer is cleaned as necessary. The method has the function of cleaning the cuvette filled with the sample after the test for a plurality of steps to prepare for the test of the next project. Therefore, the full-automatic biochemical analyzer is provided with a cleaning device for cleaning the cuvette.

Disclosure of Invention

The application provides a wash subassembly and biochemical analysis appearance for rinsing cuvette among biochemical analysis appearance can improve the suitability and the commonality of the biochemical analysis appearance of washing subassembly and different speed models.

The embodiment of this application provides a wash subassembly for rinsing cell among biochemical analyzer, wherein, includes:

mounting a plate; and

the cleaning needle module comprises a base and a cleaning needle, the base comprises a mounting hole, the cleaning needle extends in the vertical direction and is inserted into the mounting hole, the base is detachably assembled on the mounting plate, and the cleaning needle is used for cleaning the cuvette; the base includes limit structure, the washing needle includes spacing cooperation structure, limit structure with spacing cooperation structure is spacing cooperation, the restriction the washing needle is in the mounting hole rotates.

Optionally, the limiting structure comprises a limiting surface, the limiting surface is formed on the inner surface of the mounting hole, the limiting matching structure comprises a limiting matching surface, the limiting matching surface is formed on the outer surface of the cleaning needle, and the limiting surface is in limiting matching with the limiting matching surface to limit the cleaning needle to rotate in the mounting hole.

Optionally, the base includes a supporting surface, and the cleaning pin includes a supporting mating surface, and the supporting mating surface is supported on the supporting surface along a vertical direction, so that the cleaning pin is supported on the base.

Optionally, the cleaning assembly further comprises a guide plate connected with the base, the guide plate comprises a guide hole, the guide hole is coaxial with the mounting hole and is arranged at intervals along the vertical direction, and the cleaning needle is inserted into the mounting hole and the guide hole.

Optionally, the guide plate includes: the guide plate is provided with a first position and a second position, the first position is used for fixing the guide plate on the base, the second position is used for fixing the guide plate on the base, and the guide plate is positioned on a connecting line of the first position and the second position.

Optionally, the base includes a bottom plate and a protruding portion protruding from a middle position of the bottom plate, the guide plate is supported on the protruding portion, one end of the guide plate is fixedly connected with the protruding portion, and the other end of the guide plate is provided with the guide hole and is opposite to the mounting hole in the vertical direction; and/or

In an orthographic projection in the vertical direction, the outer contour of the base surrounds the outer contour of the guide plate.

Optionally, the guide plate includes a positioning structure, the base includes a positioning fitting structure, and the positioning structure is fitted with the positioning fitting structure to enable the mounting hole to be coaxial with the guide hole.

Optionally, the cleaning assembly comprises a cleaning needle fixing ring and an elastic piece, the cleaning needle fixing ring is assembled in the guide hole and the mounting hole are arranged in a space at intervals in the vertical direction, the elastic piece is deformed in a telescopic mode in the vertical direction, one end of the elastic piece is abutted to the cleaning needle fixing ring, the other end of the elastic piece is abutted to the guide plate, the cleaning needle fixing ring comprises an annular ring surrounding the periphery of the cleaning needle and a jack post mounted on the annular ring and along the radial movable setting of the annular ring, the annular ring is coaxial with the mounting hole, the cleaning needle is inserted into the annular ring, the jack post is arranged along the radial direction, the annular ring can be abutted to the cleaning needle when stretching into the annular ring, and the cleaning needle fixing ring are kept relatively fixed.

Optionally, the base includes a limiting buckle arranged on a bottom surface, and the limiting buckle is clamped with the mounting plate and is relatively fixed with the mounting plate in a vertical direction; and/or

One of the base and the mounting plate comprises a positioning pin, and the other one of the base and the mounting plate comprises a positioning hole, wherein the positioning pin is in positioning fit with the positioning hole; and/or

The base includes first fixed orifices, the mounting panel includes the second fixed orifices, first fixed orifices with the second fixed orifices is coaxial, first fixed orifices with the second fixed orifices supplies the fastener to pass, and is fixed the base with the mounting panel.

Optionally, wash the needle including dry washing needle, dry washing needle includes that needle body and cover are located the dry piece of the bottom of needle body, the needle body extends along vertical direction, includes along the inspiratory channel that vertical direction link up, the inspiratory channel is used for with the negative pressure air supply intercommunication, dry piece is equipped with the inlet port that extends along vertical direction, the inlet port with the inspiratory channel intercommunication, the inlet port including set up in the air inlet of dry piece bottom, dry piece is including locating the surface and being used for the guide raffinate gets into in the cuvette the first water conservancy diversion face and the second water conservancy diversion face of inlet port, along vertical direction, first water conservancy diversion face is compared the second water conservancy diversion face is more close to the air inlet, along the horizontal direction, first water conservancy diversion face is compared the second water conservancy diversion face is more close to the center of inlet port.

The embodiment of the present application provides a biochemical analyzer, including:

a rotatable reaction disk;

a plurality of cuvettes supported on the reaction tray and arranged around a rotation center of the reaction tray;

cleaning the arm; and

the cleaning assembly is characterized in that the mounting plate is connected with the cleaning arm to drive the cleaning assembly to move so as to clean the cuvette.

According to the technical scheme that this application embodiment provided, through independent parts such as mounting panel and washing needle module to and wash independent parts such as base in the needle module and washing needle and assemble, can obtain the washing subassembly that can wash biochemical analyzer's cell. Because the cleaning needle module is detachably arranged on the mounting plate and belongs to an independent module, the cleaning needle module can be conveniently detached on the mounting plate. For example, wash needle module demountable installation on different mounting panels to the biochemical analysis appearance of the different models of adaptation, and then use and wash the washing of subassembly completion cell among the biochemical analysis appearance. Therefore, the cleaning needle assembly is suitable for biochemical analyzers of different models, and the cleaning needle module is an independent module, so that only the cleaning needle module with the problem is dismounted during maintenance, and the maintenance is convenient.

Drawings

FIG. 1 is a schematic view of one embodiment of a biochemical analyzer of the present application;

FIG. 2 is a schematic view of one embodiment of a cleaning assembly of the present application for cleaning cuvettes in a biochemical analyzer;

FIG. 3 is a schematic view of the cleaning pin module shown in FIG. 2;

FIG. 4 is a schematic view of the base shown in FIG. 2;

FIG. 5 is a schematic view of the assembled cleaning needle module;

FIG. 6 is a schematic view of the structure of the guide plate;

FIG. 7 is a schematic view of the retaining ring;

FIG. 8 is a schematic view of the cleaning pin module of FIG. 2 with different functions;

FIG. 9 is a schematic view of the dry cleaning needle of FIGS. 2 and 8;

FIG. 10 is a schematic view of the dry cleaning needle of FIG. 9;

FIG. 11 is a schematic view of the drying section of FIG. 9 drying the cleaning needle.

Detailed Description

Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, like numbers in different drawings represent the same or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present application. Rather, they are merely examples of apparatus consistent with certain aspects of the present application, as detailed in the appended claims.

The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the application. Unless otherwise defined, technical or scientific terms used herein shall have the ordinary meaning as understood by one of ordinary skill in the art to which this application belongs. The use of the terms "a" or "an" and the like in the description and in the claims of this application do not denote a limitation of quantity, but rather denote the presence of at least one. "plurality" includes two, and is equivalent to at least two. The word "comprising" or "comprises", and the like, means that the element or item listed as preceding "comprising" or "includes" covers the element or item listed as following "comprising" or "includes" and its equivalents, and does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect. As used in this specification and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used herein refers to and encompasses any and all possible combinations of one or more of the associated listed items.

The embodiment of the application provides a cleaning assembly and a biochemical analyzer 10 for cleaning a cuvette in a biochemical analyzer. In one embodiment, the biochemical analyzer 10 may be, but is not limited to, a fully automated biochemical analyzer. Hereinafter, a fully automatic biochemical analyzer will be described as an example.

FIG. 1 is a schematic view of one embodiment of a biochemical analyzer 10 of the present application. The biochemical analyzer comprises a sample sampling arm 11, a sample tray 12, a plurality of cuvettes 13, a first reagent sampling arm 14, a first reagent tray 15, a first stirring arm 17, a second stirring arm 18, a photometer (not shown), a second reagent sampling arm 19, a second reagent tray 20 and a reaction tray 21.

Wherein a plurality of cuvettes 13 are used for the reaction of the reagent with the sample. The plurality of cuvettes 13 are supported by the reaction disk 21 and arranged around the rotation center of the reaction disk 21. In some embodiments, the plurality of cuvettes 13 are uniformly arranged around the circumference of the reaction tray 21.

Wherein the sample tray 12 carries a sample. The first reagent disk 15 and the second reagent disk 20 each carry a reagent. The sample sampling arm 11 takes the sample from the sample plate 12 and applies it to the cuvette 13. The first reagent sampling arm 14 takes out the reagent from the first reagent disk 15 and adds the reagent to the cuvette 13, and the reagent is stirred uniformly by the first stirring arm 17 to obtain the cuvette 13 with uniform stirring. In some embodiments, the second reagent sampling arm 19 removes reagent from the second reagent disk 20 and applies the reagent to the cuvette 13, and the reagent is stirred by the second stirring arm 18 to obtain a stirred cuvette 13. The absorbance of the cuvette 13, which has been stirred uniformly, is read by a photometer (not shown), and the concentration of the substance to be tested in the sample is calculated.

In some embodiments, the biochemical analyzer further includes a cleaning assembly 30. The cleaning assembly 30 is used to clean the cuvette 13 after the biochemical analyzer 10 tests the concentration of the substance for several steps, and prepare the cuvette for the next test.

Referring to figures 1 and 2, figure 2 is a schematic diagram of one embodiment of a cleaning assembly 30 of the present application for cleaning a cuvette 13 in a biochemical analyzer. In some embodiments, the cleaning assembly 30 includes a mounting plate 31 and a cleaning pin module 32, the cleaning pin module 32 including a base 33 and a cleaning pin 34. The mounting plate 31 of the cleaning assembly 30 is connected to the cleaning arm 16 to move the cleaning needle module 32 of the cleaning assembly 30 to clean the cuvette 13. The washing assembly 30 may include: at least one cleaning needle module 32. The cuvette 13 is cleaned by the cleaning assembly 30 carried by the cleaning arm 16. This facilitates the use of the cleaning assembly 30 on the biochemical analyzer 10 to complete the cleaning of the cuvette 13.

Continuing with fig. 2, in some embodiments, base 33 includes mounting holes 331 (shown in fig. 4), cleaning pins 34 extend in a vertical direction and are inserted into mounting holes 331, base 33 is removably assembled to mounting plate 31, and cleaning pins 34 are used to clean cuvette 13. Since the wash pin module 32 is detachably mounted to the mounting plate 31 and the wash pin module 32 is a separate module, the wash pin module 32 can be easily detachably mounted to the mounting plate 31. For example, the cleaning needle module 32 is detachably mounted on different mounting plates 31 so as to adapt to biochemical analyzers of different models, improve the adaptability and the universality, and further use the cleaning component 30 to clean the cuvette 13 in the biochemical analyzer. Therefore, the cleaning needle 34 assembly is suitable for biochemical analyzers of different models, and the cleaning needle module 32 is an independent module, so that only the cleaning needle module 32 with a problem is dismounted during maintenance, and the maintenance is convenient.

In one embodiment, the base 33 includes a limit structure 332 (shown in fig. 3), the cleaning pin 34 includes a limit engagement structure 341, and the limit structure 332 engages the limit engagement structure 341 to limit rotation of the cleaning pin 34 within the mounting hole 331. This ensures the relative positional relationship of the wash pin 34 and the base 33, and thus the relative positional relationship of the wash pin 34 and the cuvette 13.

FIG. 3 is a schematic view of the wash pin module 32 shown in FIG. 2. In some embodiments, the cleaning pin 34 may be inserted into the base 33 along a vertical direction, and the limit structure 332 of the base 33 may be engaged with the cleaning pin 34, such as being opened along the vertical direction. This retains the cleaning needle 34 within the retention structure 332 of the base 33 from rotating along the inner surface 334 (shown in FIG. 4) of the retention structure 332.

Fig. 4 is a schematic view of the base 33 shown in fig. 2. In some embodiments, the position-limiting structure 332 of the base 33 includes a position-limiting surface 333, the position-limiting surface 333 is formed on an inner surface of the mounting hole 331, the position-limiting engagement structure 341 includes a position-limiting engagement surface 342, the position-limiting engagement surface 342 is formed on an outer surface 343 of the cleaning pin 34, and the position-limiting surface 333 is in position-limiting engagement with the position-limiting engagement surface 342 to limit the rotation of the cleaning pin 34 in the mounting hole 331. In the scheme, the limiting mode is simple and reliable. In addition, the limit can be directly realized on the base 33, and the cleaning needle 34 is prevented from rotating along the inner surface 334 of the limit structure 332 without additionally arranging other additional components. In some embodiments, the stop mating surface 342 may include two stop surfaces 333 arranged symmetrically. For example, the stop mating surfaces 342 may be symmetrically arranged at 180 °. The forces borne by the two limiting surfaces 333 are relatively balanced, and the cleaning needle 34 is prevented from deviating.

In some embodiments, the positive engagement surface 342 of the cleaning pin 34 includes: a first surface 3431 and a second surface 3432 disposed on the outer surface of the cleaning needle 34, wherein the second surface 3432 is connected to the first surface 3431, and the joint of the first surface 3431 and the second surface 3432 forms a limit-fit edge 3433 (as shown in fig. 3); the mounting hole 331 of the base 33 includes a shaped slot 3331 that fits over the edge 3433 to limit the rotation of the cleaning pin 34 within the mounting hole 331. Thus, because the edge 3433 is arranged in the limiting matching surface 342 of the cleaning needle 34, the edge 3433 can be assembled with the special-shaped groove 3331 in the base 33 and mutually clamped, and the limiting is completed. In some embodiments, the cleaning needle 34 may have a cylindrical structure, and the cleaning needle 34 is limited in the limiting structure 332 of the base 33, so as to prevent the cleaning needle 34 from rotating along the circumferential direction of the cleaning needle 34. In some embodiments, the cleaning pin 34 can be a cylinder, the first surface 3431 can be a cylindrical surface on the cylinder, the second surface 3432 can be a flat surface on the cylinder, and the shaped slot 3331 can be a shaped hole. Further, the special-shaped hole can be a waist-shaped hole. The circular arc surface in the waist-shaped hole of the base 33 is matched with the cylindrical surface of the cylinder of the cleaning needle 34, and the two planes in the waist-shaped hole are matched with the two planes of the cleaning needle 34, so that the vertical direction of the cleaning needle 34 in the base 33 is guided, the cleaning needle 34 can be limited in the base 33, and the cleaning needle 34 is prevented from rotating along the circumferential direction.

In some embodiments, the base 33 has a shaped slot 3331 with a process hole 3332 at the corner. For example, four process holes 3332 are formed at four corners of the kidney-shaped hole of the base 33 to prevent the inner surface of the kidney-shaped hole of the base 33 from interfering with the outer surface of the cleaning pin 34.

Continuing with FIG. 4, in some embodiments, the base 33 includes a support surface 335, the cleaning pin 34 includes a support engagement surface 344, and the support engagement surface 344 is supported on the support surface 335 in a vertical orientation such that the cleaning pin 34 is supported on the base 33 to prevent the cleaning pin 34 from falling out of the base 33. In one embodiment, the supporting surface 335 may be an upper end surface of the base 33 where the opening of the mounting hole 331 is located, and the supporting mating surface 344 may be a snap-fit surface formed between the limiting mating surface 342 of the cleaning pin 34 and an outer surface of the cleaning pin 34.

Continuing with FIG. 4, in some embodiments, base 33 includes a retention clip 336 disposed on a bottom surface, and retention clip 336 is configured to clip onto mounting plate 31 and remain vertically fixed relative to mounting plate 31. Spacing buckle 336 and the base 33 bottom surface form the space that holds the device like this between, and mounting panel 31 can extend and withstand spacing buckle 336, and the joint makes base 33 and mounting panel 31 installation fixed in the space in vertical direction. In one embodiment, the thickness of the mounting plate 31 is the same as the height of the gap, so that the mounting plate 31 is supported in the limiting buckle 336 and is prevented from being displaced to one side of the cleaning needle 34, thereby ensuring the safety of the operation of the cleaning needle 34.

Referring to FIG. 4, FIG. 5 is a schematic view of the assembly of the purge pin module 32. In some embodiments, one of the base 33 and the mounting plate 31 includes a positioning pin 337, and the other includes a positioning hole 311, and the positioning pin 337 is in positioning engagement with the positioning hole 311. This makes it possible to position the base 33 and the mounting plate 31 in the extending direction of the connection line between the position of the positioning pin 337 and the position of the positioning hole 311. In some embodiments, the positioning pin 337 may be a prism, such as a hexagonal prism, a rectangular parallelepiped, or a cube. This can be limited by the prism body, and displacement in the horizontal direction between the mounting plate 31 and the base 33 can be avoided. The number of the positioning pins 337 is not limited, and may be one or more. In some embodiments, the positioning pin 337 may be a cylindrical pin, and the outer surface of the cylindrical pin is a circular arc surface, so that two cylindrical pins can be used to complete the positioning of the mounting plate 31 and the base 33, and the base 33 and the mounting plate 31 can be connected more stably.

In some embodiments, the base 33 includes a first securing hole 338, the mounting plate 31 includes a second securing hole 312, the first securing hole 338 is coaxial with the second securing hole 312, the first securing hole 338 and the second securing hole 312 are configured to receive a fastener therethrough, and the base 33 and the mounting plate 31 are secured. Thus, the base 33 and the mounting plate 31 can be fixed by the first fixing hole 338 of the base 33 and the second fixing hole 312 of the mounting plate 31. Moreover, the fixing member is disposed through the first fixing hole 338 and the second fixing hole 312, and the first fixing hole 338 and the second fixing hole 312 are coaxial and can serve as a positioning point. In some embodiments, the fastener may be a set screw 35. In combination with the above embodiment, the positioning pin 337 and the positioning hole 311 are used as another positioning point. By these two positioning points, positioning of the base 33 and the mounting plate 31 in the extending direction of the connecting line between the positions of these two positioning points is achieved. Therefore, the requirement of non-high-precision limit of the cleaning needle 34 can be met, and the manufacturing difficulty of the die can be reduced.

Fig. 6 is a schematic structural view of the guide plate 36, which is shown in fig. 2, 3 and 4. The cleaning assembly 30 further comprises a guide plate 36 connected with the base 33, the guide plate 36 comprises a guide hole 361, the guide hole 361 and the installation hole 331 are coaxial and are arranged at intervals along the vertical direction, and the cleaning needle 34 is inserted into the installation hole 331 and the guide hole 361. In this way, the cleaning needle 34 can be positioned in the vertical direction by the base 33 and the guide plate 36, respectively, so that the cleaning needle 34 can be better kept in the vertical state, and the state in the vertical direction is more stable.

With continued reference to fig. 6, in some embodiments, the guide plate 36 includes a locating structure 363, and the base 33 includes a locating engagement structure 339, wherein the locating structure 363 engages the locating engagement structure 339 to maintain the mounting aperture 331 coaxial with the guide aperture 361. When the guide plate 36 is assembled on the base 33, the positioning structure 363 and the positioning matching structure 339 can be used for positioning, so that the installation hole 331 and the guide hole 361 are kept coaxial, the cleaning needle 34 is convenient to install on the base 33, and the cleaning needle 34 is reliably kept in a vertical state.

In some embodiments, the positioning structure 363 of the guide plate 36 includes a mounting hole 3631, the positioning engagement structure 339 includes a positioning post 3391, and the positioning post 3391 is inserted into the mounting hole 3631 to achieve the positioning engagement between the guide plate 36 and the base 33. The positioning structure is simple and convenient to match. The specific structure of the fitting hole 3631 and the positioning post 3391 is not limited. The fitting hole 3631 and the positioning post 3391 may have a polygonal structure, such as a quadrangle, a hexagon or an octagon. In this embodiment, the positioning post 3391 is a cylinder, and the assembling hole 3631 is a circular hole. The positioning columns 3391 and the assembling holes 3631 can be arranged in a plurality, the positioning columns 3391 and the assembling holes 3631 are arranged in a one-to-one correspondence manner, and the circle centers of the positioning columns 3391 and the circle centers of the guide holes 361 are located on the same straight line.

In one embodiment, the guide plate 36 is formed with a recess 3632, and the mounting hole 3631 is formed in a bottom wall of the recess 3632. The groove 3632 is used as a fabrication hole, so that the assembly hole 3631 and the positioning column 3391 are conveniently positioned and matched, the positioning column 3391 is prevented from extending out of the guide plate 36 to interfere with other parts, and materials are saved.

At least one fitting hole 3631 is formed in the recess 3632. For example, two fitting holes are formed in the recess 3632. In some embodiments, the two mounting holes may be two circular through holes. Therefore, the stability of positioning connection can be improved through the two assembling holes.

As shown in connection with fig. 4, in some embodiments, guide plate 36 includes: a first fastening hole 362 opened in the guide plate 36 for a fastener to pass through, and fixes the guide plate 36 to the base 33. The base 33 includes: a second fastening hole 38 opened in the base 33 for a fastener to pass through, the first fastening hole 362 being coaxial with the second fastening hole 38. The first fastening hole 362 and the guide hole 361 are positioned on the same straight line, and the second fastening hole 38 and the mounting hole 331 are positioned on the same straight line. In some embodiments, the first fastening hole 362 may be coaxial with the second fastening hole 38 via the fitting hole 3631. In some embodiments, referring to fig. 3, the fastener 364 may be a screw and the first and second fastener holes 362, 38 may be threaded holes. With such an arrangement, the guide plate 36 and the base 33 can be fastened more stably by the fastening member penetrating through the first fastening hole 362 on the guide plate 36 and the second fastening hole 38 on the base 33, so that both are more stable, and further, the cleaning needle 34 can be more stably positioned in the vertical direction, so that the cleaning needle 34 can be operated more reliably.

In some embodiments, two positioning columns 3391 are provided, and an upper and a lower limiting buckle 336 are reserved between the two positioning columns 3391 to form the process opening, wherein one positioning column 3391 is of a full-circle structure, and the other positioning column 3391 is of a non-full-circle structure, and the two positioning columns still have a limiting effect because the two positioning columns still maintain 180-degree symmetrically-arranged arc surfaces.

In some embodiments, the mounting hole 331 and the first fixing hole 338 are respectively provided in an extending direction of a line between positions of two positioning pins of the base 33 to fix the cleaning pin 34 and the fixing guide plate 36.

Fig. 7 is a schematic structural view of the fixing ring 41, which is shown in fig. 2 and 3. In some embodiments, the cleaning assembly 30 includes a cleaning needle fixing ring 41 and an elastic member 42, the cleaning needle fixing ring 41 is assembled in a space between the guide hole 361 and the mounting hole 331 in the vertical direction, the elastic member 42 is deformed in a telescopic manner in the vertical direction, one end of the elastic member is abutted against the cleaning needle fixing ring 41, the other end of the elastic member is abutted against the guide plate 36, the cleaning needle fixing ring 41 includes an annular ring 411 surrounding the periphery of the cleaning needle 34 and a support pillar 43 mounted on the annular ring 411 and movably arranged in the radial direction of the annular ring 411, the annular ring 411 is coaxial with the mounting hole 331, the cleaning needle 34 is inserted into the annular ring 411, and the support pillar 43 can abut against the cleaning needle 34 when extending into the annular ring 411 in the radial direction, so that the cleaning needle 34 and the cleaning needle fixing ring 41 are kept relatively fixed. In some embodiments, a top pillar hole for fixing the cleaning needle 34 is formed on the cylindrical surface of the cleaning needle fixing ring 41, and the top pillar 43 is screwed into the top pillar hole and then pressed against the cleaning needle 34 to fix the cleaning needle 34. In this embodiment, the cleaning needle fixing ring 41 is assembled between the guide plate 36 and the base 33 by the elastic member 42, so that the cleaning needle 34 forms an elastic coupling structure capable of buffering vibration in the mounting hole 331 of the base 33. For example, when cleaning subassembly 30 washs cell 13, wash needle 34 moves down and stretches into cell 13, can take place to contact with the bottom of cell 13, and at this moment, under the effect of contact force, elastic component 42 shrinkage deformation can turn into the flexible impact with hard impact, reduces cell 13 and wash needle 34 and takes place the risk of destruction, protection cell 13 and wash needle 34.

In some embodiments, the elastic member 42 may be a spring, but is not limited thereto. The elastic member 42 may also be an elastic rubber member. In order to increase the stability of the elastic member 42 at the installation position, the lower portion of the guide plate 36 is provided with a counter bore 369 for limiting the elastic member 42, i.e., an elastic limiting groove, for limiting the upward and circumferential limits of the elastic member 42.

In some embodiments, in conjunction with FIG. 3, the purge pin module 32 includes: the mounting ring 345 is arranged on the cleaning needle 34, the mounting ring 345 is sleeved on the cleaning needle 34, a top pillar fixing surface 3451 is arranged on the mounting ring 345, the top pillar fixing surface 3451 can be arranged to be a plane, the top surface of the top pillar 43 can also be arranged to be a plane, thus the top pillar 43 is tightly pressed on the top pillar fixing surface 3451, the top pillar fixing surface 3451 can be matched with the top pillar 43 to avoid the displacement of the top pillar, and therefore the cleaning needle 34 is fixed with the cleaning needle fixing ring 41. In some embodiments, the mounting ring 345 may be a circular ring that may be welded to the cleaning pin 34. The mounting ring 345 may be a circular structure and the mounting ring 345 may be resin molded.

In some embodiments, the retaining engagement surface 342 of the cleaning pin 34 may also be disposed on the mounting ring 345. The positive stop engagement feature 341 on the mounting ring is the same as the positive stop engagement feature 341 of the cleaning pin 34, above. The position-limiting engagement structure 341 of the cleaning needle 34 is described in detail, and will not be described herein.

As shown in fig. 4, in some embodiments, the base 33 includes a bottom plate 44 and a protruding portion 45 protruding from a middle position of the bottom plate 44, the guide plate 36 is supported by the protruding portion 45, one end of the guide plate 36 is fixedly connected to the protruding portion 45, and the other end of the guide plate 36 is provided with a guide hole 361, and the guide hole 361 is vertically opposite to the mounting hole 331. Thus, the guide hole 361 provided in the guide plate 36 may be spaced apart from the mounting hole 331 in the vertical direction by the distance that the projection 45 is higher than the bottom plate 44, thereby allowing the cleaning needle 34 to be positioned in the vertical direction with respect to the base 33 by the guide plate 36.

In some embodiments, the outer contour of the base 33 surrounds the outer contour of the guide plate 36 in an orthographic projection in the vertical direction. With such an arrangement, the outer dimension of the guide plate 36 can be made smaller than the outer dimension of the base 33, so that the overall structure of the guide plate 36 mounted on the base 33 is more compact, and the guide plate 36 is prevented from interfering with external components.

In some embodiments, the guide plate 36 may be an elongated circular structure. The guide plate 36 may be resin molded. In some embodiments, the floor 44 of the base 33 may be an elongated circular structure. The base 33 may be resin molded.

In some embodiments, the cleaning assembly 30 for cleaning the cuvette 13 of the biochemical analyzer may be formed by assembling separate components such as the mounting plate 31 and the cleaning needle module 32, and separate components such as the base 33, the cleaning needles 34, and the guide plate 36 in the cleaning needle module 32. In this way, the elastic member 42 is interposed between the guide plate 36 and the base 33, so that the elastic member 42 absorbs the reaction force of the cleaning needle 34, thereby improving the reliability of the use of the cleaning unit 30. Moreover, when each independent component has a problem, the cleaning assembly 30 can be detached independently, so that the maintenance of the independent component is facilitated.

The cleaning pin module 32 is configured to insert the cleaning pin 34 into the guide plate 36, the cleaning pin fixing ring 41, and the base 33 in this order, screw the plunger into the cleaning pin fixing ring 41, align the plunger fixing surface of the cleaning pin 34, and then screw the plunger. Then, the mounting hole 3631 of the guide plate 36 is fitted into the base 33 in cooperation with the positioning post 3391 of the base 33, and then the fixing screw is inserted into the first fastening hole 362 of the guide plate 36 and fixed in the second fastening hole 38 of the base 33. The cleaning needle modules 32 of different functions are assembled identically. After the cleaning needle modules 32 are assembled, the cleaning heads for cleaning can be formed only by mounting the cleaning needle modules into the mounting plates 31 one by one.

When the models with different test speeds result in different indexing of the cuvette 13 on the reaction plate. Only different mounting plates 31 need to be manufactured correspondingly, the universality of the cleaning needle module 32 is greatly improved, and later-stage maintenance is facilitated.

FIG. 8 is a schematic view of the cleaning pin module 32 of FIG. 2 with different functions. In some embodiments, the cleaning assembly 30 may perform any one or more of the following functions: injecting cleaning liquid, injecting water, sucking and drying. The cleaning needle 34 of the cleaning assembly 30 includes any one or more of the following, corresponding to each function: a cleaning liquid injection cleaning needle 51, a water injection cleaning needle 52, a dry suction cleaning needle 53, and a dry cleaning needle 54. This allows for the selection of different cleaning needles 34 depending on the actual cleaning requirements. In some embodiments, the final step of cleaning is drying, which may be accomplished by drying the cleaning pins 54, as described below with respect to drying the cleaning pins 54.

Fig. 9 is a schematic view of the dry cleaning needle 54 of fig. 2 and 8. Cleaning needle 34 includes dry cleaning needle 54, dry cleaning needle 54 includes needle body 541 and the dry piece 542 of the bottom of needle body 541 is located to the cover, needle body 541 extends along vertical direction, including along the suction channel 544 that vertical direction link up, suction channel 544 is used for communicating with the negative pressure air supply, dry piece 542 is equipped with the inlet port 543 that extends along vertical direction, inlet port 543 communicates with suction channel 544, inlet port 543 includes the air inlet 5421 that sets up in dry piece 542 bottom, dry piece 542 is including locating the surface and being used for guiding the interior raffinate of cell 13 to get into the first water conservancy diversion face 5431 and the second water conservancy diversion face 5432 of inlet port 543, along vertical direction, first water conservancy diversion face 5431 is more close to than the second water conservancy diversion face 5432 air inlet 5421, along the horizontal direction, first water conservancy diversion face 5431 is more close to than the second water conservancy diversion face 5432 the central point of inlet port 543. When the cuvette 13 is cleaned by the dry cleaning needle 54, an air flow gap exists between the dry cleaning needle 54 and the cuvette 13, so that the air flow is communicated with the air inlet hole 543, and the air flow can be buffered.

In some embodiments, the needle body 541 may include: a needle cannula. The needle body 541 may be made of stainless steel. The drying block 542 is used for drying the cuvette 13, so that the drying block 542 can be sleeved on the needle body 541, and the drying of the cuvette 13 is completed through the drying block 542.

Fig. 10 is a schematic diagram of the dry cleaning needle 54 of fig. 9. In some embodiments, the first flow guide surface 5431 and the second flow guide surface 5432 can be planar. The first guide surface 5431 and the second guide surface 5432 may be provided in plurality and distributed on the outer wall of the drying block 542. The distance between the first guide surface 5431 and the air inlet 5421 is smaller than the distance between the second guide surface 5432 and the air inlet 5421, and the distance between the first guide surface 5431 and the center position of the air inlet hole 543 is smaller than the distance between the second guide surface 5432 and the center position of the air inlet hole 543 in the horizontal direction. Therefore, the distance between the first flow guide surface 5431 and the center position of the air inlet hole 543 is smaller than the distance between the second flow guide surface 5432 and the center position of the air inlet hole 543, after the residual liquid erodes the first flow guide surface 5431, the residual liquid enters the second flow guide surface 5432, and when entering the air inlet hole 543 through negative pressure, a buffer area is formed between the outer surface of the first flow guide surface 5431 and the cuvette 13, so that the effect of buffering the pressure of the residual liquid is realized, and the damage to the needle body 541 is reduced.

In some embodiments, the first flow guiding surface 5431 and the second flow guiding surface 5432 may be curved surfaces, such as cylindrical surfaces, a distance between the first flow guiding surface 5431 and the air inlet 5421 is smaller than a distance between the second flow guiding surface 5432 and the air inlet 5421 in a vertical direction, and an axial cross section of the first flow guiding surface 5431 is smaller than an axial cross section of the second flow guiding surface 5432 in a radial direction of the air inlet hole 543. Therefore, the aperture of the first guiding surface 5431 is smaller than that of the second guiding surface 5432, and when negative pressure enters the air inlet hole 543, the suction speed of the residual liquid is buffered, so that the damage to the needle body 541 caused by too large suction force of the residual liquid is reduced. This can form a buffer area between the outer surface of the first guiding surface 5431 and the cuvette 13, thereby better buffering the airflow.

FIG. 11 is a schematic view of the drying section of FIG. 9 drying the cleaning needle. In some embodiments, the drying block 542 may include: the air inlet piece that is used for the bottom of needle body 541 is embedded, is provided with inlet port 543 in the air inlet piece, can set up inlet port 543 through solitary part like this, conveniently maintains inlet port 543. In some embodiments, the air inlet may be a cylinder embedded inside the needle body 541, and have an inner diameter smaller than the inner diameter of the needle body 541, and may also buffer the air flow to prevent damage to the dry cleaning needle 54.

In some embodiments, the air inlet 5421 is provided with a chamfer 5434, and the surface formed by the chamfer 5434 can better buffer the air flow when the negative pressure enters the air inlet hole 543. In some embodiments, the four corners of the intake opening 5421 may be chamfered.

In some embodiments, the drying block 542 may be resin molded.

With reference to fig. 10 and 11, when the drying block 542 is inserted into the cuvette 13 to be dried, an air flow is sucked into the air inlet, after the air flow entering from the chamfer 5434 reaches the air flow buffer zone, the residual liquid attached to the wall of the cuvette 13 is brought into the air inlet 5421 and then enters the air inlet 543, and then the residual liquid is sucked away through the air suction channel 544, and finally the cuvette 13 is dried, so that the purpose of drying the cuvette 13 is achieved, and the contamination carrying rate of the cuvette 13 is effectively reduced.

The present invention is not intended to be limited to the particular embodiments shown and described, but is to be accorded the widest scope consistent with the principles and novel features herein disclosed.

Claims

1. A wash subassembly for rinsing cell in biochemical analyzer, its characterized in that includes:

mounting a plate; and

2. The cleaning assembly of claim 1, wherein the limiting structure comprises a limiting surface formed on an inner surface of the mounting hole, and the limiting engagement structure comprises a limiting engagement surface formed on an outer surface of the cleaning needle, the limiting surface engaging with the limiting engagement surface to limit rotation of the cleaning needle within the mounting hole.

3. The cleaning assembly of claim 1 or 2, wherein the base includes a support surface and the cleaning pin includes a support mating surface that is vertically supported on the support surface such that the cleaning pin is supported on the base.

4. The cleaning assembly of claim 1 or 2, further comprising a guide plate coupled to the base, the guide plate including guide holes coaxial with the mounting holes and spaced apart vertically, the cleaning pins being inserted into the mounting holes and the guide holes.

5. The cleaning assembly of claim 4, wherein the base includes a base plate and a projection projecting from a middle position of the base plate, the guide plate being supported by the projection, one end of the guide plate being fixedly connected to the projection, and the other end of the guide plate being provided with the guide hole to be vertically opposite to the mounting hole; and/or

6. The cleaning assembly of claim 4, wherein the guide plate includes a locating structure and the base includes a locating engagement structure, the locating structure engaging the locating engagement structure to maintain the mounting aperture coaxial with the guide aperture.

7. The cleaning assembly according to claim 4, wherein the cleaning assembly includes a cleaning needle fixing ring and an elastic member, the cleaning needle fixing ring is assembled in a space between the guide hole and the mounting hole in the vertical direction, the elastic member is elastically deformed in the vertical direction, one end of the elastic member abuts against the cleaning needle fixing ring, the other end of the elastic member abuts against the guide plate, the cleaning needle fixing ring includes an annular ring surrounding the periphery of the cleaning needle and a support pillar movably arranged in the radial direction of the annular ring and mounted on the annular ring, the annular ring is coaxial with the mounting hole, the cleaning needle is inserted into the annular ring, and the support pillar can abut against the cleaning needle when extending into the annular ring in the radial direction, so that the cleaning needle and the cleaning needle fixing ring are relatively fixed.

8. The cleaning assembly of claim 1 or 2, wherein the base comprises a limiting buckle arranged on the bottom surface, the limiting buckle is clamped with the mounting plate and is kept relatively fixed with the mounting plate in the vertical direction; and/or

9. The cleaning assembly of claim 1 or 2, wherein the cleaning needle comprises a dry cleaning needle, the dry cleaning needle comprises a needle body and a dry block sleeved on the bottom of the needle body, the needle body extends along a vertical direction and is inserted into the mounting hole, the needle body comprises an air suction channel penetrating along the vertical direction, the air suction channel is used for being communicated with a negative pressure air source, the dry block is provided with an air inlet hole extending along the vertical direction, the air inlet hole is communicated with the air suction channel, the air inlet hole comprises an air inlet arranged at the bottom end of the dry block, the dry block comprises a first flow guide surface and a second flow guide surface which are arranged on the outer surface and are used for guiding the residual liquid in the cuvette to enter the air inlet hole, and the first flow guide surface is closer to the air inlet hole than the second flow guide surface along the vertical direction, in the horizontal direction, the first flow guide surface is closer to the center of the air inlet hole than the second flow guide surface.

10. A biochemical analyzer, comprising:

a rotatable reaction disk;

cleaning the arm; and

the cleaning assembly of any one of claims 1 to 9, wherein the cleaning arm is connected to the mounting plate to move the cleaning pin module to clean the cuvette.