CN113193153A - OLED display panel and preparation method thereof - Google Patents

OLED display panel and preparation method thereof Download PDF

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Publication number
CN113193153A
CN113193153A CN202110478119.XA CN202110478119A CN113193153A CN 113193153 A CN113193153 A CN 113193153A CN 202110478119 A CN202110478119 A CN 202110478119A CN 113193153 A CN113193153 A CN 113193153A
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layer
hole
transport layer
injection layer
hole injection
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潘杰
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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Wuhan China Star Optoelectronics Semiconductor Display Technology Co Ltd
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/122—Pixel-defining structures or layers, e.g. banks
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H10K50/15—Hole transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/17—Carrier injection layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/84—Passivation; Containers; Encapsulations
    • H10K50/842—Containers
    • H10K50/8428—Vertical spacers, e.g. arranged between the sealing arrangement and the OLED
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/1201—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10—OLED displays
    • H10K59/12—Active-matrix OLED [AMOLED] displays
    • H10K59/121—Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass

Abstract

The invention provides an OLED display panel and a preparation method thereof, wherein a photoinduced deformation layer of the OLED display panel is formed on a pixel defining layer, the photoinduced deformation layer is made of an azobenzene polymer and can dynamically change in a form expansion and contraction manner under the irradiation of light with a specific wavelength range, so that the photoinduced deformation layer deforms when forming a hole injection layer and a hole transmission layer to lift the height of part of the hole injection layer and part of the hole transmission layer, the hole injection layer and the hole transmission layer are disconnected at the connection part of the photoinduced deformation layer and an anode layer, adjacent sub-pixels are not connected through the hole injection layer and the hole transmission layer, and further, when a certain sub-pixel is lightened, the adjacent sub-pixels are not connected with each other through the hole injection layer and the hole transmission layer, so that the light leakage phenomenon caused by the leakage of a hole is avoided, and the display uniformity of the OLED display panel is improved.

Description

OLED display panel and preparation method thereof
Technical Field
The invention relates to the technical field of display, in particular to an OLED display panel and a preparation method thereof.
Background
OLEDs have many advantages such as being thin and light, low in power consumption, and the like, and are gradually becoming the mainstream display technology at present. The core of the OLED display device is a display panel, fig. 1 is a film structure diagram of an OLED display panel 10, and the OLED display panel 10 includes an anode layer 11, a first common layer (hole injection layer) 12, a second common layer (hole transport layer) 13, a light emitting material layer 14, a third common layer (electron transport layer) 15, a fourth common layer (electron injection layer) 16, and a cathode layer 17.
The working principle of the OLED panel is that under the action of an electric field, holes are transmitted to the light-emitting material layer 14 through the hole injection layer 12 and the hole transport layer 13, electrons are transmitted to the light-emitting material layer 14 through the electron injection layer 16 and the electron transport layer 15, and the holes and the electrons are recombined in the light-emitting material layer 14 to emit light. The hole injection layer, the hole transport layer, the light emitting layer, the electron transport layer and the electron injection layer are formed by evaporation of a whole mask plate and cover the whole pixel region. Because the hole injection layer and the hole transport layer have good conductivity, when a certain light-emitting pixel is controlled to emit light, holes flow from the anode to the cathode and generate a transverse leakage current, and reach the adjacent light-emitting sub-pixels through the hole transport layer and the hole injection layer, so that the light-emitting pixels of other colors emit light, thereby causing impure light emission and reducing the display effect of the display panel, for example, the light-emitting material layer 14 is formed with R, G and B sub-pixels, the anode layer 11 includes an anode layer 11R, an anode layer 11G and an anode layer 11B, the anode layer 11R, the anode layer 11G and the anode layer 11B respectively provide holes with different voltages for the R, G and B sub-pixels, if the holes transversely flow under the corresponding sub-pixels under different voltage values, the original brightness and color of the light emitted by the R, G and B sub-pixels are affected, causing a color shift in the display.
In summary, the hole injection layer and the hole transport layer in the conventional OLED display panel have good conductivity, and when a certain light-emitting pixel is controlled to emit light, holes flow from the anode to the cathode, and meanwhile, a lateral leakage current is generated, and reaches the adjacent light-emitting pixel through the hole transport layer and the hole injection layer, so that the light-emitting pixels of other colors emit light, and thus, light emission impurities are caused, and the display effect of the display panel is reduced, and improvement is needed.
Disclosure of Invention
The invention provides an OLED display panel, which can solve the technical problems that a hole injection layer and a hole transport layer in the existing OLED display panel have good conductivity, when a certain light-emitting pixel is controlled to emit light, holes flow from an anode to a cathode, meanwhile, transverse leakage current is generated, and the holes reach adjacent light-emitting pixels through the hole transport layer and the hole injection layer, so that light-emitting pixels of other colors emit light, light emission is impure, and the display effect of the display panel is reduced.
The technical scheme provided by the invention is as follows:
the embodiment of the invention provides an OLED display panel, which at least comprises a pixel defining layer and a light-emitting device positioned in a pixel opening of the pixel defining layer, wherein the light-emitting device comprises an anode, a hole injection layer and a hole transport layer positioned on the anode, a light-emitting material layer positioned on the hole injection layer and the hole transport layer, an electron transport layer and an electron injection layer positioned on the light-emitting material layer, and a cathode layer positioned on the electron transport layer and the electron injection layer.
The pixel definition layer is further provided with a photoinduced deformation layer, the photoinduced deformation layer avoids the arrangement of the light-emitting device, and the photoinduced deformation layer deforms at least when the hole injection layer and the hole transport layer are formed so as to lift the heights of part of the hole injection layer and part of the hole transport layer, so that the hole injection layer and the hole transport layer are disconnected at the connection position of the photoinduced deformation layer and the anode layer.
According to a preferred embodiment of the invention, the material of the photo-deformable layer is an azo-phenyl polymer.
According to a preferred embodiment of the present invention, the hole injection layer and the hole transport layer are both prepared in the same layer, and both have a partition structure with a height difference, and the partition structure is located on both sides of the photo-induced deformation layer.
According to a preferred embodiment of the present invention, the hole transport layer on the photo-deformable layer is disposed adjacent to the electron transport layer.
According to a preferred embodiment of the present invention, the photo-deformable layer is further deformed when the electron transport layer and the electron injection layer are formed, so as to block continuity of the electron transport layer and the electron injection layer.
According to the OLED display panel, the present invention further provides a method for manufacturing an OLED display panel, the method including:
step S10, providing a substrate, preparing an anode layer on the substrate, preparing a pixel definition layer on the anode layer, and preparing a photo-deformable layer on the pixel definition layer, wherein the pixel definition layer is disposed at intervals to form a pixel region.
Step S20, forming a hole injection layer and a hole transport layer on the entire surface of the anode layer and the light-induced deformation layer by using the same mask, where the hole injection layer and the hole transport layer cover the pixel defining layer and the entire pixel region, and the hole injection layer and the hole transport layer are disconnected at a connection between the light-induced deformation layer and the anode layer.
Step S30, preparing a light emitting material layer on the hole transport layer, preparing an electron transport layer and an electron injection layer on the light emitting material layer, and preparing a cathode layer on the electron injection layer.
According to a preferred embodiment of the present invention, the light-induced deformation layer of step S10 is formed by chemical vapor deposition, followed by etching, evaporation or transfer.
According to a preferred embodiment of the present invention, step S20 specifically includes:
step S201, irradiating the photo-induced deformation layer by using an ultraviolet light source, and after the photo-induced deformation layer protrudes upwards to a preset height, forming a preset height difference between the photo-induced deformation layer and the anode layer, and continuously maintaining the irradiation of the ultraviolet light source.
And S202, sequentially forming a hole injection layer and a hole transport layer on the whole surface of the anode layer and the photoinduced deformation layer by using the same mask plate.
And step S203, removing the illumination of the ultraviolet light source, replacing the green light source illumination light induced deformation layer, and restoring the green light source illumination light induced deformation layer to the original state to finish the preparation of the hole injection layer and the hole transport layer.
According to a preferred embodiment of the present invention, the wavelength of the green light source is in the range of 380nm to 460nm, and the wavelength of the ultraviolet light source is in the range of 172nm to 190 nm.
According to a preferred embodiment of the present invention, the hole injection layer is made of copper phthalocyanine (CuPc), and the hole transport layer is made of binaphthyl diphenyl phosphate (C)44H32N2) And the material of the electron injection layer and the electron transport layer is lithium fluoride (LiF).
The invention has the beneficial effects that: an embodiment of the present invention provides an OLED display panel, including: a substrate; an anode layer formed on the substrate, the anode layer having a plurality of anode electrodes; pixel definition layers formed on the anode layer, the pixel definition layers being arranged at intervals to form pixel regions; the deformation layer is formed on the pixel definition layer, the material of the deformation layer is an azobenzene polymer, and the deformation layer can generate dynamic change of form expansion and contraction under the irradiation of light in a specific wavelength range; a hole injection layer, a hole transport layer, a luminescent material layer, an electron transport layer, an electron injection layer and a cathode layer which are sequentially formed on the surface of the anode layer, which is far away from the substrate; the light-emitting material layer is arranged corresponding to the pixel region, the hole injection layer and the hole transport layer both cover the pixel defining layer and the whole pixel region, and the hole injection layer and the hole transport layer are disconnected at the connection part of the light-induced deformation layer and the anode layer. According to the invention, the deformation layer dynamically changes in expansion and contraction under the irradiation of light with specific wavelength, so that the continuity of the hole injection layer and the hole transport layer is blocked in the process of preparing the hole injection layer and the hole transport layer, and therefore, adjacent pixels are not connected through the hole injection layer and the hole transport layer, and further, when a certain sub-pixel is lightened, the phenomenon of light leakage caused by hole leakage of the adjacent sub-pixel is avoided, so that the display uniformity of the OLED display panel is improved.
Drawings
In order to illustrate the embodiments or the technical solutions in the prior art more clearly, the drawings needed to be used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the invention, and it is obvious for a person skilled in the art that other drawings can be obtained according to these drawings without creative efforts.
Fig. 1 is a schematic diagram of a film structure of an OLED display panel in the prior art.
Fig. 2 is a schematic diagram of a film layer structure of an OLED display panel according to the present invention.
Fig. 3 is a schematic view of another film structure of an OLED display panel according to the present invention.
Fig. 4 is a schematic diagram of another film structure of an OLED display panel according to the present invention.
Fig. 5 is a schematic view of a manufacturing process of an OLED display panel according to the present invention.
Fig. 6 to 10 are schematic structural diagrams in a manufacturing process of an OLED display panel according to the present invention.
Detailed Description
The following description of the various embodiments refers to the accompanying drawings that illustrate specific embodiments in which the invention may be practiced. The directional terms mentioned in the present invention, such as [ upper ], [ lower ], [ front ], [ rear ], [ left ], [ right ], [ inner ], [ outer ], [ side ], are only referring to the directions of the attached drawings. Accordingly, the directional terms used are used for explanation and understanding of the present invention, and are not used for limiting the present invention. In the drawings, elements having similar structures are denoted by the same reference numerals, and broken lines in the drawings indicate that the elements do not exist in the structures, and only the shapes and positions of the structures are explained.
The invention aims at the technical problems that a hole injection layer and a hole transport layer in the existing OLED display panel have good conductivity, when a certain light-emitting pixel is controlled to emit light, holes flow from an anode to a cathode and generate transverse leakage current, and reach adjacent light-emitting pixels through the hole transport layer and the hole injection layer, so that other light-emitting pixels emit light, light emission impurities are caused, and the display effect of the display panel is reduced.
As shown in fig. 2, an embodiment of the invention provides a film layer structure of an OLED display panel. The OLED display panel 100 includes a substrate 101 and a pixel defining layer 103 on the substrate 101, the pixel defining layer 103 is disposed at intervals to form a pixel opening, and a light emitting device in the pixel opening includes an anode 102, a hole injection layer 105 and a hole transport layer 106 on the anode 102, a light emitting material layer 107 on the hole injection layer 105 and the hole transport layer 106, an electron transport layer 108 and an electron injection layer 109 on the light emitting material layer 107, and a cathode layer 201 on the electron transport layer 108 and the electron injection layer 109. The light emitting device of the present embodiment is preferably a top light emitting device, and the anode 102 is preferably a light shielding metal such as copper and molybdenum; the cathode 201 is preferably a transparent metal, such as an ITO electrode.
The pixel defining layer 103 is further provided with a photo-deformable layer 104, the photo-deformable layer 104 is arranged to avoid the light emitting device, and the photo-deformable layer 104 is deformed at least when forming the hole injection layer 105 and the hole transport layer 106 and is used for lifting the heights of the hole injection layer 105 and the hole transport layer 106 on the photo-deformable layer 104 so as to disconnect the hole injection layer 105 and the hole transport layer 106 at the connection position of the photo-deformable layer 104 and the anode layer 102. The material of the photo-deformable layer 104 is preferably an azophenyl polymer, and in other embodiments, the material of the photo-deformable layer 104 may also be one or more of triphenylmethane derivatives, cinnamic acid-propylene ester copolymers and azobenzol compounds.
The pixel defining layer 103 of the present embodiment is formed on the anode layer 102, the pixel defining layers 103 are disposed at intervals to form a plurality of pixel regions, the light emitting device is disposed in the pixel region, and two adjacent pixel regions are spaced apart by the pixel defining layer 103. The anode layer 102 includes a plurality of anode electrodes, for example, a first anode electrode 1021 and a second anode electrode 1022. The pixel defining layer 103 includes a first pixel defining layer 1031, a second pixel defining layer 1032 and a third pixel defining layer 1033, a first pixel region (not labeled) is formed between the first pixel defining layer 1031 and the second pixel defining layer 1032, a second pixel region (not labeled) is formed between the second pixel defining layer 1032 and the third pixel defining layer 1033, the first anode electrode 1021 is located in the first pixel region, and the second anode electrode 1022 is located in the second pixel region. The cross-sectional shape of the photo-deformable layer 104 is preferably quadrilateral. The photo-deformable layer 104 includes a first sub-deformation layer 1041, a second sub-deformation layer 1042 and a third sub-deformation layer 1043. The first sub-deformation layer 1041 is located on the surface of the first pixel definition layer 1031, the second sub-deformation layer 1042 is located on the surface of the second pixel definition layer 1032, and the third sub-deformation layer 1043 is located on the surface of the third pixel definition layer 1033.
The hole injection layer 105 and the hole transport layer 106 of the embodiment are both prepared in the same layer, and are prepared by using the same mask plate and the same photomask, so that the manufacturing cost of the OLED display panel 100 can be saved. Because the segment difference is formed between the light-induced deformation layer 104 and the anode layer 102, after the hole injection layer 105 and the hole transport layer 106 are prepared, the partition structure with the height difference is formed, and the partition structure is positioned on two sides of the light-induced deformation layer 104, so that the continuity of the hole injection layer 105 and the hole transport layer 106 is blocked in the process of preparing the hole injection layer 105 and the hole transport layer 106, the phenomenon that the holes of adjacent pixels with different colors transversely flow through the hole injection layer and the hole transport layer is prevented, and further, when a certain sub-pixel is lightened, the phenomenon that the adjacent sub-pixel generates light leakage due to the leakage of the holes is avoided, and the display uniformity of the OLED display panel 100 is improved.
Specifically, the hole injection layer 105 includes a first hole injection layer 1051, a second hole injection layer 1052, a third hole injection layer 1053, a fourth hole injection layer 1054, and a fifth hole injection layer 1055, the hole transport layer 106 includes a first hole transport layer 1061, a second hole transport layer 1062, a third hole transport layer 1063, a fourth hole transport layer 1064, and a fifth hole transport layer 1065, the first hole injection layer 1051 is located on the first anode electrode 1021, the first hole transport layer 1061 is located on the first hole injection layer 1051, the second hole injection layer 1052 is located on the second anode electrode 1022, the second hole transport layer 1062 is located on the second hole injection layer 1052, the third hole injection layer 1053 is located on the first sub-deformation layer 1041, the third hole transport layer 1063 is located on the third hole injection layer 1053, the fourth hole injection layer 1054 is located on the second sub-deformation layer 1042, and the fourth hole transport layer 1064 is located on the fourth hole injection layer 1054, the fifth hole injection layer 1055 is located on the third sub-deformation layer 1043, the fifth hole transport layer 1065 is located on the fifth hole injection layer 1055, the third hole injection layer 1053 and the third hole transport layer 1063 are disconnected from the first hole injection layer 1051 and the first hole transport layer 1061 at the side of the first sub-deformation layer 1041 and the first anode electrode 1021, and the overlapping and disconnecting relationship of other film layers can be clearly seen in fig. 2, which is similar to the above-mentioned disconnected cross section and is not repeated here.
A first light emitting layer 1071 is provided on the first hole transport layer 1061, a second light emitting layer 1072 is provided on the second hole transport layer 1062, an electron transport layer 108, an electron injection layer 109, and a cathode layer 201 are sequentially laid on the first light emitting layer 1071 and the second light emitting layer 1072 in a full layer, and an encapsulation layer 202 is prepared on the cathode layer 201. The hole transport layer on the photo-deformable layer 104 is disposed to be attached to the electron transport layer 108, for example, the third hole transport layer 1063, the fourth hole transport layer 1064, and the fifth hole transport layer 1065 are respectively disposed to be attached to the electron transport layer 108. The encapsulation layer 202 is a laminated film of an inorganic layer and an organic layer.
The substrate 101 in this embodiment is preferably a thin film transistor substrate, and other embodiments may also be a driving circuit layer without a thin film transistor, the thin film transistor array substrate of this embodiment includes a substrate, a buffer layer located on the substrate, a plurality of driving thin film transistors disposed on the buffer layer, and a planarization layer disposed on the plurality of driving thin film transistors, a via hole is disposed on the planarization layer, the substrate is preferably a yellow and transparent polyimide stacked film layer, and a source of the driving thin film transistor is connected to an anode of an external power supply. The anode layer 102 is disposed on the surface of the substrate 101, the anode layer 102 has a first anode electrode 1021 and a second anode electrode 1022, the first anode electrode 1021 and the second anode electrode 1022 are respectively electrically connected to a drain of one of the driving tfts, and due to the subpixels of different colors corresponding to the first anode electrode 1021 and the second anode electrode 1022, the drains of the two driving tfts have different voltage values with respect to the first anode electrode 1021 and the second anode electrode 1022. The flexible printed circuit board is attached with a corresponding driving chip, the negative pole of the external power supply transmits a corresponding electrical signal to the power supply wiring layer through the binding area, finally, the power supply wiring layer transmits the corresponding electrical signal to the cathode layer 201, and the external power supply provides required voltage for the cathode layer 201 and the anode layer 102 to generate holes and electrons under the required voltage of the corresponding light-emitting material layer.
As shown in fig. 3, another film structure of an OLED display panel is provided in the embodiments of the present invention. The light induced deformation layer 104 in this embodiment includes a first sub deformation layer 1041, a second sub deformation layer 1042 and a third sub deformation layer 1043, no hole layer is disposed on the first sub deformation layer 1041, the second sub deformation layer 1042 and the third sub deformation layer 1043, the hole layer includes a hole injection layer 105 and a hole transport layer 106, the hole injection layer 105 only includes a first sub hole injection layer 1051 of the first pixel region and a second sub hole injection layer 1052 of the second pixel region, the hole transport layer 106 only includes a first sub hole transport layer 1061 of the first pixel region and a second sub hole transport layer 1062 of the second pixel region, the hole injection layer 105 and the hole transport layer 106 are directly isolated on the light induced deformation layer 104, and other structures are similar to those in fig. 2 and will not be described herein again.
As shown in fig. 4, an embodiment of the invention provides a schematic view of another film structure of an OLED display panel. Fig. 4 further extends the photo-deformable layer 104 on the basis of fig. 3, so that the photo-deformable layer 104 penetrates the electron transport layer 108 and the electron injection layer 109, i.e. the photo-deformable layer 104 is also deformed when the electron transport layer 108 and the electron injection layer 109 are formed, so as to block the continuity of the electron transport layer 108 and the electron injection layer 109. The light-induced deformation layer 104 in this embodiment includes a first sub-deformation layer 1041, a second sub-deformation layer 1042 and a third sub-deformation layer 1043, the hole layer includes a hole injection layer 105 and a hole transport layer 106, the hole injection layer 105 includes only a first sub-hole injection layer 1051 of the first pixel region and a second sub-hole injection layer 1052 of the second pixel region, the hole transport layer 106 includes only a first sub-hole transport layer 1061 of the first pixel region and a second sub-hole transport layer 1062 of the second pixel region, the electron transport layer 108 includes a first sub-electron transport layer 1081 of the first pixel region and a second sub-electron transport layer 1082 of the second pixel region, the electron injection layer 109 includes a first sub-electron injection layer 1091 of the first pixel region and a second sub-electron injection layer 1092 of the second pixel region, the light-induced deformation layer 104 penetrates the hole injection layer 105, the transport layer 106, the electron transport layer 108 and the electron injection layer 109, details of which can be seen clearly in fig. 4, the other structure is similar to that of fig. 2, and is not described in detail here. In this embodiment, the adjacent sub-pixels are not connected through hole injection and hole transport layer, and are not connected through electron injection and electron transport layer, so that the independence of the sub-pixels is further improved, and the uniformity of the light emitted from the OLED display panel 100 is improved.
As shown in fig. 5, according to the OLED display panel structure shown in fig. 2, the present invention further provides a method for manufacturing an OLED display panel, the method comprising:
step S10, providing a substrate, preparing an anode layer on the substrate, preparing a pixel definition layer on the anode layer, and preparing a photo-deformable layer on the pixel definition layer, wherein the pixel definition layer is disposed at intervals to form a pixel region.
Step S20, a hole injection layer and a hole transport layer are formed on the entire surface of the anode and the light-induced deformation layer by using the same mask, the hole injection layer and the hole transport layer cover the pixel defining layer and the entire pixel region, and the hole injection layer and the hole transport layer are disconnected at a connection between the light-induced deformation layer and the anode layer.
Step S30, preparing a light emitting material layer on the hole transport layer, preparing an electron transport layer and an electron injection layer on the light emitting material layer, and preparing a cathode layer on the electron injection layer.
Preferably, the light-induced deformation layer of step S10 is formed by chemical vapor deposition, followed by etching, evaporation or transfer.
Preferably, step S20 specifically includes: step S201, irradiating the photo-induced deformation layer by using an ultraviolet light source, and after the photo-induced deformation layer protrudes upwards to a preset height, forming a preset height difference between the photo-induced deformation layer and the anode layer, and continuously maintaining the irradiation of the ultraviolet light source. And S202, sequentially forming a hole injection layer and a hole transport layer on the whole surface of the anode layer and the photoinduced deformation layer by using the same mask plate. And step S203, removing the illumination of the ultraviolet light source, replacing the illumination deformation layer irradiated by the green light source, and restoring the illumination deformation layer to the original state to finish the preparation of the cavity layer.
Preferably, the wavelength of the green light source is in the range of 380nm to 460nm, and the wavelength of the ultraviolet light source is in the range of 172nm to 190 nm. Preferably, the material of the hole injection layer is copper phthalocyanine (CuPc), and the material of the hole transport layer is binaphthyl diphenyl phosphate (C)44H32N2) And the material of the electron injection layer and the electron transport layer is lithium fluoride (LiF).
Specifically, fig. 6 to 9 and fig. 2 are schematic structural diagrams in a flow of a method for manufacturing an OLED display panel according to the present invention. As shown in fig. 6, a substrate 101 is provided, an anode layer 102 is formed on the substrate 101, a pixel defining layer 103 is formed on the anode layer 102, the substrate 101 is preferably a thin film transistor substrate, the anode layer 102 includes a first anode electrode 1021 and a second anode electrode 1022, the pixel defining layer 103 includes a first pixel defining layer 1031, a second pixel defining layer 1032, and a third pixel defining layer 1033, a first pixel region 10211 is formed between the first pixel defining layer 1031 and the second pixel defining layer 1032, and a second pixel region 10221 is formed between the second pixel defining layer 1032 and the third pixel defining layer 1033.
As shown in fig. 7, the photo-induced deformation layer 104 is formed by chemical vapor deposition, etching, and evaporation or transfer, where the photo-induced deformation layer 104 includes a first sub-deformation layer 1041, a second sub-deformation layer 1042, and a third sub-deformation layer 1043, and the first sub-deformation layer 1041, the second sub-deformation layer 1042, and the third sub-deformation layer 1043 are respectively located on the first pixel definition layer 1031, the second pixel definition layer 1032, and the third pixel definition layer 1033. As shown in fig. 8 and 9, after the photo-deformable layer 104 is irradiated by the ultraviolet light source S1 and protrudes upward to a predetermined height, a predetermined height difference is formed between the photo-deformable layer 104 and the anode layer 102, and the ultraviolet light source S1 is continuously kept to irradiate, so that the hole injection layer 105 and the hole transport layer 106 are sequentially formed on the entire surfaces of the anode layer 102 and the photo-deformable layer 104 by using the same mask. As shown in fig. 10, the ultraviolet light source S1 was removed from the light, and the light-deformable layer was irradiated with the green light source S2, so that it was restored to the original state, thereby completing the production of the hole injection layer 105 and the hole transport layer 106. As shown in fig. 2, the light emitting material layer 107 is prepared on the hole layer, the electron transport layer 108 and the electron injection layer 109 are prepared on the light emitting material layer 107, the cathode layer 201 is prepared on the electron injection layer 109, and the encapsulation layer 202 is prepared on the cathode layer 201.
The embodiment of the invention provides an OLED display panel and a preparation method thereof, wherein the OLED display panel comprises a substrate, an anode layer positioned on the substrate, a pixel defining layer positioned on the anode layer, a light-induced deformation layer positioned on the pixel defining layer, a hole injection layer and a hole transmission layer positioned on the anode layer and the light-induced deformation layer, a light-emitting material layer positioned on the hole injection layer and the hole transmission layer, an electron transmission layer and an electron injection layer positioned on the light-emitting material layer, and a cathode layer positioned on the electron transmission layer and the electron injection layer; wherein the hole layer is disconnected at the junction of the photo-deformable layer and the anode layer. Therefore, adjacent pixels can not be connected through hole injection and a hole transport layer, and when a certain sub-pixel is lightened, the adjacent sub-pixel can not generate the phenomenon of light leakage due to hole leakage, so that the display uniformity of the OLED display panel is improved.
In summary, although the present invention has been described with reference to the preferred embodiments, the above-described preferred embodiments are not intended to limit the present invention, and those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, therefore, the scope of the present invention shall be determined by the appended claims.

Claims (10)

1. An OLED display panel comprising at least a pixel defining layer and a light emitting device disposed within a pixel opening of the pixel defining layer, the light emitting device comprising an anode, a hole injection layer and a hole transport layer disposed over the anode, a light emitting material layer disposed over the hole injection layer and the hole transport layer, an electron transport layer and an electron injection layer disposed over the light emitting material layer, and a cathode layer disposed over the electron transport layer and the electron injection layer;
the pixel definition layer is further provided with a photoinduced deformation layer, the photoinduced deformation layer avoids the arrangement of the light-emitting device, and the photoinduced deformation layer deforms at least when the hole injection layer and the hole transport layer are formed so as to lift the heights of part of the hole injection layer and part of the hole transport layer, so that the hole injection layer and the hole transport layer are disconnected at the connection position of the photoinduced deformation layer and the anode layer.
2. The OLED display panel of claim 1, wherein the material of the photo-deformable layer is an azophenyl polymer.
3. The OLED display panel according to claim 1, wherein the hole injection layer and the hole transport layer are both prepared in the same layer, and both have a partition structure with a height difference, and the partition structure is located on both sides of the photo-induced deformation layer.
4. The OLED display panel of claim 3, wherein the hole transport layer on the photo-deformable layer is disposed adjacent to the electron transport layer.
5. The OLED display panel of claim 1, wherein the photo-deformable layer is further deformed when the electron transport layer and the electron injection layer are formed to interrupt the continuity of the electron transport layer and the electron injection layer.
6. A preparation method of an OLED display panel is characterized by comprising the following steps:
step S10, providing a substrate, preparing an anode layer on the substrate, preparing a pixel definition layer on the anode layer, and preparing a photo-deformable layer on the pixel definition layer, wherein the pixel definition layers are arranged at intervals to form pixel regions;
step S20, forming a hole injection layer and a hole transport layer on the entire surface of the anode layer and the photo-deformable layer by using the same mask, where the hole injection layer and the hole transport layer cover the pixel defining layer and the entire pixel region, and the hole injection layer and the hole transport layer are disconnected at a connection point between the photo-deformable layer and the anode layer;
step S30, preparing a light emitting material layer on the hole transport layer, preparing an electron transport layer and an electron injection layer on the light emitting material layer, and preparing a cathode layer on the electron injection layer.
7. The method for manufacturing the OLED display panel according to claim 6, wherein the photo-induced deformation layer of the step S10 is formed by chemical vapor deposition, and then is etched, evaporated or transferred.
8. The method for manufacturing the OLED display panel according to claim 6, wherein the step S20 specifically comprises:
step S201, irradiating a photo-induced deformation layer by using an ultraviolet light source, and after the photo-induced deformation layer protrudes upwards to a preset height, forming a preset height difference between the photo-induced deformation layer and an anode layer, and continuously keeping the irradiation of the ultraviolet light source;
step S202, sequentially forming a hole injection layer and a hole transport layer on the whole surface of the anode layer and the photoinduced deformation layer by using the same mask plate;
and step S203, removing the illumination of the ultraviolet light source, replacing the green light source illumination light induced deformation layer, and restoring the green light source illumination light induced deformation layer to the original state to finish the preparation of the hole injection layer and the hole transport layer.
9. The method of claim 8, wherein the green light source has a wavelength in a range of 380nm to 460nm, and the ultraviolet light source has a wavelength in a range of 172nm to 190 nm.
10. The method of claim 8, wherein the hole injection layer is made of copper phthalocyanine (CuPc), and the hole transport layer is made of binaphthyl diphenyl phosphate (C)44H32N2) The material of the electron injection layer and the electron transport layer is lithium fluoride(LiF)。
CN202110478119.XA 2021-04-30 2021-04-30 OLED display panel and preparation method thereof Pending CN113193153A (en)

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