CN113188473A - Surface topography measuring device and method - Google Patents
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0608—Height gauges
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Abstract
The invention relates to the technical field of chip surface measurement, and discloses a surface topography measuring device and a method, wherein the surface topography measuring device comprises a light source unit, a beam splitting device, a detecting device and a motion platform, wherein a detecting platform is also arranged between the motion platform and the detecting device, a sample to be detected is placed on the detecting platform, and the motion platform drives the detecting device or the detecting platform to enable the detecting device or the detecting platform to generate relative motion; an included angle theta is formed between the optical axis of the reflected light beam of the sample to be detected and the normal of the moving platform, the defocusing amount of the shot picture is evaluated according to the definition degree of the overlapped area existing before and after the shot picture, the three-dimensional height information of the surface of the sample is calculated according to the defocusing amount, and a combined image which greatly exceeds the actual depth of field of the beam splitting device is obtained and used for detecting the surface appearance of the sample in detail. By the inclined configuration and the cooperation of the beam splitting device and the moving table, the 3D measurement and the detection of the surface appearance of the sample to be detected with large size and large height change range can be realized, and the detection efficiency is improved.
Description
Technical Field
The invention relates to the technical field of surface detection, in particular to a surface topography measuring device and a surface topography measuring method.
Background
In the field of semiconductor technology, Wafer Level Packaging (WLP) has significant advantages over conventional Packaging in terms of reducing package size and saving process cost, and WLP will be one of the major technologies supporting the continuous development of the IC industry in the future. WLP mainly designs various Bump process technologies, including Pillar/Gold/Solder Bump, RDL, TSV and the like. In order to improve the yield of chip manufacturing, the appearance defect detection of the chip is required in the whole packaging process. Commonly used appearance tests typically include 2D and 3D tests, where 2D defect testing can detect defects such as contamination, scratches, particles, etc. As process control requirements increase, there is an increasing need to detect surface 3D features such as Bump height, RDL thickness, via depth of TSVs, etc.
The method for realizing surface 3D measurement in the industry at present mainly comprises Laser triangulation, Laser confocal measurement, an interferometer and the like, wherein the Laser triangulation can adopt Laser Line for scanning, the structure is simple, and the speed and the precision are relatively low; although the laser confocal and interferometric measuring instrument can obtain higher vertical resolution, vertical scanning is required, the detection efficiency is lower, and the requirement of wafer full-wafer scanning detection is difficult to meet. Meanwhile, the current 2D detection method generally adopts a large NA microscope, the depth of field is limited, the bump inspection of the WLP process generally requires multiple scans to complete the full-surface detection of the chip, and the detection efficiency also has a problem.
Disclosure of Invention
Technical problem to be solved
The embodiment of the invention provides a surface topography measuring device and a surface topography measuring method, which are used for solving the problems of low precision, incapability of realizing wafer full-wafer detection, limited depth of field, low detection efficiency and the like in the conventional chip surface detection.
Disclosure of the invention
The embodiment of the invention provides a surface appearance measuring device, which comprises a light source unit, a beam splitting device, a detecting device and a moving table, wherein a detecting table is arranged between the moving table and the detecting device; an included angle theta is formed between the optical axis of the reflected light beam of the sample to be detected received by the beam splitting device and the normal of the moving platform.
Preferably, the light source unit includes a light source body and a lens assembly including a first lens and a second lens, and the lens assembly faces the beam splitting device.
Preferably, the beam splitting means comprises a beam splitter, a third lens disposed below the beam splitter, and a fourth lens disposed above the beam splitter.
Preferably, the detector is arranged above the fourth lens, and the motion platform is arranged below the third lens.
Preferably, a polarizer is further disposed between the second lens and the beam splitting device.
Preferably, an analyzer is further disposed between the fourth lens and the beam splitter.
Preferably, the third lens is further provided with an annular light source.
A surface topography measuring method using the surface topography measuring apparatus according to any one of claims 1 to 7, comprising the steps of:
the method comprises the following steps: collecting an image; the motion platform drives the detection device or the detection platform to generate relative motion between the detection device and the detection platform, and during the relative motion, the motion platform triggers an imaging system formed by the light source unit, the beam splitting device and the detection device to take a picture through an encoding scale or a controller in the motion platform, triggers photographing positions X1, X2, X3, … and Xn and triggers a field of view FOV of the imaging system along a scanning directionXThe focal depth is DOF, the range is set as gamma focal depth ranges, M (M is more than or equal to 3) images are required to be overlapped in the same region in the acquisition process, namely the operation requirement of the topography measurement system meets the following relation:
(Xi+M-Xi)·Sin(θ)≤γ·DOF;
step two: the same ROI area between images is obtained by image translation. The finite transformation method comprises the following steps:
Reigon(j)=Reigon[i-(Xj-Xi)/PX];
wherein is the equivalent size of the pixel in physical space;
step three: determining a sharpness measure for the image by calculating sharpness with an energy method using the laplacian, the formula being:
step four: calculating the nominal defocus amount, and obtaining the nominal defocus amount of the corresponding ROI from the ith picture to the I + M picture by converting the ROI among different images as follows:
step five: and (3) performing binomial fitting to obtain the position of a focal plane, wherein the deviation of the corresponding ROI relative to an ideal focal plane is as follows:
step six: calculating the focus distance, calculating the focus distance through a parabolic model, setting the coefficients of binomial equations as a, b and c, obtaining the best focus plane-b/2 a through a least square method, and further obtaining the defocus amount of each pixel in the ith ROI:
step seven: calculate height data for the sample:
step eight: calculating to obtain a super depth-of-field image of the jth ROI:
Image_C(x,y)=Image(Reigon[MAX(Si(x,y),Si+1(x,y),....,Si+M(x,y))]
preferably, the Brenner gradient function is also used in step three to evaluate the sharpness of the image.
Preferably, in the sixth step, the best focus position may be measured by using a standard point spread function, and the defocus amount of each pixel in the ith ROI may be obtained.
(III) advantageous effects
The surface appearance measuring device provided by the embodiment of the invention comprises a light source unit, a beam splitting device, a detecting device and a moving table, wherein a detecting table is arranged between the moving table and the detecting device; the beam splitting device receives an included angle theta between the optical axis of a reflected beam of a sample to be detected and the normal of the motion platform, the defocusing amount of a shot picture is evaluated according to the definition degree of an overlapping area existing before and after a shot image, and the three-dimensional height information of the surface of the sample is calculated according to the defocusing amount; further, the definition of the overlapping area is further compared and processed, so that the image areas with the highest definition are spliced with each other, and a combined image which greatly exceeds the actual depth of field of the beam splitting device is obtained and is used for detecting the surface appearance of the sample in detail. By the inclined configuration and the matching of the beam splitting device and the moving table, the surface appearance measurement of a sample to be measured with large size and large height change range can be realized, and the detection efficiency is improved.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and those skilled in the art can also obtain other drawings according to the drawings without creative efforts.
FIG. 1 is a schematic configuration diagram of a surface texture measuring apparatus according to embodiment 1 of the present invention;
fig. 2 is a schematic horizontal image capture diagram of embodiment 1 in the embodiment of the present invention;
FIG. 3 is a correspondence relationship for identifying different image sequences ROI in example 1;
FIG. 4 is the relationship between defocus and image sharpness in example 1;
FIG. 5 is a schematic structural view of a surface texture measuring apparatus according to embodiment 2 of the present invention;
FIG. 6 is a schematic view of ROI distribution in example 3 of embodiment 3 of the present invention.
Description of reference numerals:
1: a light source unit; 11: a light source body; 12: a first lens;
13: a second lens; 14: a polarizer; 15: an annular light source;
2: a beam splitting device; 21: a beam splitter; 22: a third lens;
23: an analyzer; 24: a fourth lens; 3: a detector;
4: a sample to be detected; 5: a motion platform.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In the description of the embodiments of the present invention, it should be noted that the terms "first", "second" and "third" are used for the sake of clarity in describing the numbering of the components of the product and do not represent any substantial difference, unless explicitly stated or limited otherwise. The directions of "up", "down", "left" and "right" are all based on the directions shown in the attached drawings. Specific meanings of the above terms in the embodiments of the present invention can be understood by those of ordinary skill in the art according to specific situations.
It is to be understood that, unless otherwise expressly specified or limited, the term "coupled" is used broadly, and may, for example, refer to directly coupled devices or indirectly coupled devices through intervening media. Specific meanings of the above terms in the embodiments of the invention will be understood to those of ordinary skill in the art in specific cases.
Example 1.
The surface topography measuring apparatus provided in this embodiment, as shown in fig. 1 and fig. 2, includes a light source unit 1, a beam splitting device 2, a detecting device, and a motion stage. The light source unit 1 comprises a light source body 11 and a lens group consisting of a first lens 12 and a second lens 13, wherein the lens group is opposite to the beam splitting device 2; the light source unit 1 comprises a light source body 11 and a lens group consisting of a first lens 12 and a second lens 13, wherein the lens group is opposite to the beam splitting device 2; the beam splitting device 2 comprises a beam splitter 21, a third lens 2 arranged below the beam splitter 21 and a fourth lens 24 arranged above the beam splitter 21; a detection table is arranged between the motion table and the detection device, a sample to be detected is placed on the detection table, and the motion table drives the detection device or the detection table to generate relative motion between the detection device and the detection table; an included angle theta is formed between the optical axis of the beam splitting device 2 for receiving the reflected beam of the sample to be detected and the normal of the motion platform, and the working principle is as follows: the method comprises the steps of using a fixed-focus imaging system with an obliquely-placed optical axis, triggering the imaging system to shoot through a horizontal motion table to obtain images with a plurality of repeated ROI areas and high-precision position information, converting the ROI of each image to form a plurality of images at different shooting distances, estimating the defocusing amount of the corresponding ROI through image definition, and obtaining high-precision 3D (three-dimensional) morphology information through defocusing amount data. Meanwhile, a super-depth-of-field high-definition 2D photo is synthesized by selecting the optimal image definition image pixel.
The specific detection method comprises the following steps: with the surface topography measuring device, the detection is completed through the following steps:
the moving stage 50 moves at a certain speed, and an imaging system formed by the illumination unit 10, the beam splitting unit 20 and the detector 330 is triggered to take a picture by an internal encoder scale or a controller, the shooting positions X1, X2, X3, …, Xn are triggered, the field of view FOVX of the imaging system is taken along the scanning direction, the focal depth is DOF, and a related parameter diagram is shown in fig. 2. In order to obtain the focal plane reference position by using the focus variation model, the defocus amount needs to be controlled within a certain range, which is set as gamma focal depth ranges, and M (M is more than or equal to 3) images need to be overlapped in the same region in the acquisition process, so that the operation of the topography measurement system needs to satisfy the following relations:
Xi+M-Xi≤FOVX·cos(θ)
(Xi+M-Xi)·sin(θ)≤γ·DOF
fig. 3 shows the image capturing ROI correspondence of the image sequence. The same ROI area transformation between the images is obtained by image translation, and the corresponding transformation relation is as follows:
Reigon(j)Reigon[i(XjXi)/PX]]
wherein P isXIs the equivalent size of the pixel in physical space.
The sharpness metric of the image may be determined using a variety of methods, such as may be computed using the laplacian energy method,
in this step, the sharpness of the image can also be evaluated by using a Brenner gradient function or the like.
After the definition information is obtained, obtaining the nominal defocus amount S of the corresponding ROI from the ith picture to the I + M picture by ROI conversion among different imagesJThen, the focal plane position is obtained by binomial fitting, and the deviation FocusVari (x, y) of the corresponding ROI from the ideal focal plane:
FIG. 4 plots defocus versus image sharpness, and a standard point spread function or parabolic approximation can be used to determine the best focus position. For ease of description, a parabolic model is presented here. The model comprises binomial coefficients a, b and c, the values can be obtained through a least square method to be solved, an optimal focusing plane-b/2 a is obtained, and the defocusing amount of each pixel in the ith ROI can be obtained:
a standard point spread function may also be used to determine the best focus position at this step,
height data of the samples were further obtained:
the height measurement range of the sample is:
d=FOVX-2·MAX(Xi+1-Xi)·Sin(θ);
and performing region extraction and smoothing on the height data of the bumps on the sample to obtain height side face data and volume measurement data of the bumps.
Where μ represents a compensation factor for the projected height to the actual height, and the projected height represents the bump volume to projected distance ratio.
Aiming at the definition measurement of the image, synthesizing the I th to the I + M th pictures with the optimal definition to obtain the super depth-of-field image of the jth ROI:
Image_C(x,y)=Image(Reigon[MAX(Si(x,y),Si+1(x,y),...,Si+M(x,y)
preferably, the illumination unit can be provided with a polarizer 14, an analyzer 23 and an annular light source 15 for special topography detection conditions such as highly reflective surfaces, particle scratches and the like. Specifically, the detector 3 is arranged above the fourth lens 24, the motion stage is arranged below the third lens 2, and the polarizer 14 is further arranged between the second lens 13 and the beam splitter 21. An analyzer 23 is further arranged between the fourth lens 24 and the beam splitter 21, and an annular light source 15 is further arranged at the third lens 2.
Example 2.
The present embodiment is different from embodiment 1 only in that the imaging device is mounted on a moving stage, the sample is stationary, and the measurement principle adopted is the same as that of embodiment 1.
Example 3.
The difference between this embodiment and embodiment 1 is only that the motion stage carries the sample to move rotationally, the imaging system is stationary, or the imaging system is located on the motion stage to rotate or make rotational motion, but the sample is stationary, and the adopted measurement principle is different from embodiment 1 mainly in that the transformation of the image ROI follows the rotational transformation, as shown in detail in fig. 6.
Finally, it should be noted that: the above examples are only intended to illustrate the technical solution of the present invention, but not to limit it; although the present invention has been described in detail with reference to the foregoing embodiments, it will be understood by those of ordinary skill in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some technical features may be equivalently replaced; and such modifications or substitutions do not depart from the spirit and scope of the corresponding technical solutions of the embodiments of the present invention.
Claims (10)
1. A surface appearance measuring device is characterized by comprising a light source unit, a beam splitting device, a detecting device and a moving table, wherein a detecting table is arranged between the moving table and the detecting device, a sample to be detected is placed on the detecting table, and the moving table drives the detecting device or the detecting table to enable the detecting device or the detecting table to generate relative motion; and an included angle theta is formed between the optical axis of the beam splitting device for receiving the reflected beam of the sample to be detected and the normal of the motion platform.
2. The surface topography measuring device according to claim 1, wherein said light source unit comprises a light source body and a lens group consisting of a first lens and a second lens, said lens group facing said beam splitting means.
3. The surface topography measurement device according to claim 1, wherein said beam splitting means comprises a beam splitter, a third lens arranged below said beam splitter and a fourth lens arranged above said beam splitter.
4. A surface texture measuring device as claimed in claim 3 wherein a detector is provided above the fourth lens and the motion stage is provided below the third lens.
5. A surface topography measuring device as claimed in claim 2, characterized in that a polarizer is further arranged between said second lens and said beam splitting means.
6. A surface texture measuring device as claimed in claim 3 wherein an analyzer is further provided between the fourth lens and the beam splitter.
7. A surface texture measuring device as claimed in claim 3 wherein an annular light source is further provided at the third lens.
8. A surface topography measuring method using the surface topography measuring apparatus according to any one of claims 1 to 7, comprising the steps of:
the method comprises the following steps: collecting an image; the motion platform drives the detection device or the detection platform to generate relative motion between the detection device and the detection platform, and during the relative motion, the motion platform triggers an imaging system formed by the light source unit, the beam splitting device and the detection device to take a picture through an encoding scale or a controller in the motion platform, triggers photographing positions X1, X2, X3, … and Xn and triggers a field of view FOV of the imaging system along a scanning directionXThe focal depth is DOF, the range is set as gamma focal depth ranges, M (M is more than or equal to 3) images are required to be overlapped in the same region in the acquisition process, namely the operation requirement of the topography measurement system meets the following relation:
(Xi+M-Xi)·sin(θ)≤γ·DOF;
step two: the same ROI area between images is obtained by image translation. The finite transformation method comprises the following steps:
Reigon(j)=Reigon[i-(Xj-Xi)/PX];
wherein is the equivalent size of the pixel in physical space;
step three: determining a sharpness measure for the image by calculating sharpness with an energy method using the laplacian, the formula being:
step four: calculating the nominal defocus amount, and obtaining the nominal defocus amount of the corresponding ROI from the ith picture to the I + M picture by converting the ROI among different images as follows:
step five: and (3) performing binomial fitting to obtain the position of a focal plane, wherein the deviation of the corresponding ROI relative to an ideal focal plane is as follows:
step six: calculating the focus distance, calculating the focus distance through a parabolic model, setting the coefficients of binomial equations as a, b and c, obtaining the best focus plane-b/2 a through a least square method, and further obtaining the defocus amount of each pixel in the ith ROI:
step seven: calculate height data for the sample:
step eight: calculating to obtain a super depth-of-field image of the jth ROI:
Image_C(x,y)=Image(Reigon[MAX(Si(x,y),Si+1(x,y),...,Si+M(x,y))]
9. a surface topography measuring method according to claim 8, characterized in that in step three, the Brenner gradient function can also be used to evaluate the sharpness of the image.
10. The method as claimed in claim 8, wherein in the sixth step, a standard point spread function is used to measure the best focus position, so as to obtain the defocus of each pixel in the ith ROI.
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