CN113161506A - Perovskite light-emitting diode and preparation method thereof - Google Patents

Perovskite light-emitting diode and preparation method thereof Download PDF

Info

Publication number
CN113161506A
CN113161506A CN202110428625.8A CN202110428625A CN113161506A CN 113161506 A CN113161506 A CN 113161506A CN 202110428625 A CN202110428625 A CN 202110428625A CN 113161506 A CN113161506 A CN 113161506A
Authority
CN
China
Prior art keywords
perovskite
layer
emitting diode
perovskite light
mmol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN202110428625.8A
Other languages
Chinese (zh)
Other versions
CN113161506B (en
Inventor
秦川江
张德重
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changchun Institute of Applied Chemistry of CAS
Original Assignee
Changchun Institute of Applied Chemistry of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changchun Institute of Applied Chemistry of CAS filed Critical Changchun Institute of Applied Chemistry of CAS
Priority to CN202110428625.8A priority Critical patent/CN113161506B/en
Publication of CN113161506A publication Critical patent/CN113161506A/en
Application granted granted Critical
Publication of CN113161506B publication Critical patent/CN113161506B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • H10K71/15Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/649Aromatic compounds comprising a hetero atom
    • H10K85/657Polycyclic condensed heteroaromatic hydrocarbons
    • H10K85/6572Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/549Organic PV cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Electroluminescent Light Sources (AREA)

Abstract

The invention provides a perovskite light-emitting diode and a preparation method thereof, belonging to the technical field of light-emitting diodes. The perovskite light-emitting diode comprises the following components in sequence from bottom to top: a glass substrate having an ITO conductive film; a hole transport layer; a nanoparticle and/or crypt ether doped quasi-two-dimensional perovskite light emitting layer; an electron transport layer; a finishing layer; and an electrode. The invention also provides a preparation method of the perovskite light-emitting diode. The luminescent layer of the perovskite light-emitting diode is a quasi-two-dimensional perovskite thin film doped with nano particles and/or crypt ether, the structural order distribution in the quasi-two-dimensional perovskite thin film can be narrowed through doping, and the appearance of phases with lower or higher orders is reduced, so that the non-radiative recombination in the thin film is inhibited; based on this mechanism, a light emitting diode device having higher External Quantum Efficiency (EQE) is finally obtained.

Description

Perovskite light-emitting diode and preparation method thereof
Technical Field
The invention belongs to the technical field of light emitting diodes, and particularly relates to a perovskite light emitting diode with a nano particle and/or crypt ether doped quasi-two-dimensional perovskite layer and a preparation method thereof.
Background
The traditional organic-inorganic hybrid three-dimensional perovskite material has the advantages of high carrier mobility, low trap state density and the like, and is widely applied to the photovoltaic field at present. However, since the exciton binding energy is low and it is difficult to limit the free diffusion of carriers, high radiative recombination efficiency cannot be obtained, making it impossible to directly apply to a light emitting diode. The construction of the quasi-two-dimensional perovskite is an effective way for improving the exciton binding energy of the perovskite material and enhancing the quantum confinement, thereby improving the radiative recombination efficiency. The multiple quantum well structure in the quasi-two-dimensional perovskite has stronger dielectric shielding and quantum confinement characteristics, and the exciton binding energy of the material can reach hundreds of meV, so the material has great application potential in the fields of light-emitting diodes, lasers and the like. However, the quasi-two-dimensional perovskite thin film prepared in general still has strong defect-induced non-radiative recombination inside, so that the thin film has a certain loss of fluorescence quantum yield and has excitation light intensity dependence. This is because the phenomenon that the order of the quasi-two-dimensional perovskite thin film prepared by the conventional solution method is impure inevitably occurs. Because of the solubility difference of different precursor components of the perovskite and the difference of the cation steric hindrance, the gradient distribution of quasi-two-dimensional orders in the direction vertical to the film is finally caused, wherein the perovskite phase of low order is mainly concentrated at the bottom of the film, and the high order phase is concentrated near the surface of the film. The wider quasi-two-dimensional order distribution can cause the fluorescence quantum yield of the film to be reduced, because the grain size of the perovskite phase with lower order in the film is relatively smaller, more grain boundaries are formed to cause the defect state density to be increased, and the non-radiative recombination is intensified; meanwhile, the perovskite phase with a higher order number in the film has lower exciton binding energy and quantum confinement capacity, excitons are easy to dissociate, the radiative recombination rate is reduced due to free diffusion of carriers, and the probability of defect-induced non-radiative recombination is increased. Therefore, regulating and controlling the structural order distribution in the quasi-two-dimensional perovskite thin film to narrow the order distribution so as to avoid the occurrence of a perovskite phase with a lower order or a higher order, and the method is an effective strategy for improving the fluorescence quantum yield of the thin film and the luminous efficiency of a device.
Disclosure of Invention
The luminescent layer of the perovskite light-emitting diode is a quasi-two-dimensional perovskite thin film doped with the nanoparticles and/or the crypt ether, the structural order distribution in the quasi-two-dimensional perovskite thin film can be narrowed through doping, the appearance of phases with lower or higher orders can be reduced, and the non-radiative recombination in the thin film can be inhibited; based on this mechanism, a light emitting diode device having higher External Quantum Efficiency (EQE) is finally obtained.
In order to achieve the above purpose, the technical scheme of the invention is as follows:
the invention provides a perovskite light emitting diode, which sequentially comprises the following components from bottom to top:
a glass substrate having an ITO (indium tin oxide) conductive thin film (ITO as a device anode);
a hole transport layer;
a perovskite light emitting layer;
an electron transport layer;
a finishing layer;
an electrode (as the device cathode);
it is characterized in that the preparation method is characterized in that,
the perovskite luminescent layer is a quasi-two-dimensional perovskite thin film doped with nanoparticles and/or crypt ether.
In the above technical solution, it is preferable that: the perovskite luminescent layer is PEA2FAn-1PbnBr3n+1Wherein PEA is phenylethylamine, FA is formamidine, n is the order of the quasi-two-dimensional perovskite structure, and the value of n is 3-8; the doped nano particles are ZrO with the grain diameter of 10-50 nm2、TiO2、ZnO、SnO2NiO or SrTiO3(ii) a The cryptate is 4,7,13,16,21, 24-hexaoxy-1, 10-diazabicyclo [8.8.8]]Hexacosane or 4,7,13,16, 21-pentaoxy-1, 10-diazabicyclo [8.8.5]]And twenty three alkanes.
In the above technical solution, it is preferable that: the hole transport layer is PVK (polyvinylcarbazole).
In the above technical solution, it is preferable that: the electron transport layer is TPBi (1,3, 5-tri (1-phenyl-1H-benzimidazole-2-yl) benzene).
In the above technical solution, it is preferable that: the modification layer is LiF.
In the above technical solution, it is preferable that: the electrode is Al.
In the above technical solution, it is preferable that: the thickness of the ITO conductive film is 80-150 nm, the thickness of the hole transport layer is 20-40 nm, the thickness of the perovskite luminescent layer is 30-150 nm, the thickness of the electron transport layer is 30-60 nm, the thickness of the modification layer is 0.8-1.6 nm, and the thickness of the electrode is 80-120 nm.
The invention also provides a preparation method of the perovskite light-emitting diode, which comprises the following steps:
(1) cleaning a substrate
Sequentially placing the glass substrate with the ITO conductive film in deionized water, acetone and isopropanol, respectively ultrasonically cleaning for 15-30 minutes, and then drying;
(2) preparation of PVK hole transport layer by spin coating method
Preparing a PVK chlorobenzene solution with the concentration of 5-15 mg/mL, and spin-coating the PVK chlorobenzene solution on the surface of the ITO conductive film obtained in the step (1), wherein the spin-coating speed is 2000-4500 rpm, and the spin-coating time is 30-50 seconds; then annealing for 20-40 minutes at 100-150 ℃, and finally cooling to room temperature; obtaining a PVK hole transport layer with the thickness of 20-40 nm;
(3) preparation of nano-particle and/or crypt ether doped perovskite luminescent layer by spin coating method
(3-1) firstly dispersing the nanoparticles in Dimethylformamide (DMF), preparing 0.2-1.0 mg/mL of DMF dispersion liquid of the nanoparticles, and ultrasonically dispersing for 4-8 hours; 0.1-0.6 mmol of PbBr20.08-0.48 mmol of FABr, 0.04-0.24 mmol of PEABr and 0.01-0.06 mmol of CH3NH3Dissolving Cl in a mixed solution of 0.5mL of the DMF dispersion solution of the nano particles and 0.5mL of dimethyl sulfoxide (DMSO); then spin-coating the solution on the surface of the PVK hole transport layer obtained in the step (2), wherein the spin-coating rotation speed is 4000-8000 rpm, the spin-coating time is 30-50 seconds, and 0.1-0.5 mL of ethyl acetate, diethyl ether, toluene or chlorobenzene is dripped on the rotating surface in the 10-15 seconds from the beginning of spin-coating to serve as an anti-solvent; finally, annealing for 10-30 minutes at 80-120 ℃ to obtain a perovskite luminescent layer with the thickness of 30-150 nm;
or (3-2) adding 0.1-0.6 mmol of PbBr20.08-0.48 mmol of FABr, 0.04-0.24 mmol of PEABr and 0.01-0.06 mmol of CH3NH3Cl was dissolved in a mixed solution of 0.5mL of DMF dispersion and 0.5mL of DMSO,adding 0.001-0.012 mmol of cryptand ether, and stirring at room temperature for 1-3 hours; then spin-coating the solution on the surface of the PVK hole transport layer obtained in the step (2), wherein the spin-coating rotation speed is 4000-8000 rpm, the spin-coating time is 30-50 seconds, and 0.1-0.5 mL of ethyl acetate, diethyl ether, toluene or chlorobenzene is dripped on the rotating surface in the 10-15 seconds from the beginning of spin-coating to serve as an anti-solvent; finally, annealing for 10-30 minutes at 80-120 ℃ to obtain a perovskite luminescent layer with the thickness of 30-150 nm;
or (3-3) firstly dispersing the nanoparticles in Dimethylformamide (DMF), preparing 0.2-1.0 mg/mL of DMF dispersion liquid of the nanoparticles, and ultrasonically dispersing for 4-8 hours; 0.1-0.6 mmol of PbBr20.08-0.48 mmol of FABr, 0.04-0.24 mmol of PEABr and 0.01-0.06 mmol of CH3NH3Dissolving Cl into a mixed solution of 0.5mL of nano particle DMF dispersion liquid and 0.5mL of dimethyl sulfoxide, adding 0.001-0.012 mmol of cryptand, and stirring at room temperature for 1-3 hours; then spin-coating the solution on the surface of the PVK hole transport layer obtained in the step (2), wherein the spin-coating rotation speed is 4000-8000 rpm, the spin-coating time is 30-50 seconds, and 0.1-0.5 mL of ethyl acetate, diethyl ether, toluene or chlorobenzene is dripped on the rotating surface in the 10-15 seconds from the beginning of spin-coating to serve as an anti-solvent; finally, annealing for 10-30 minutes at 80-120 ℃ to obtain a perovskite luminescent layer with the thickness of 30-150 nm;
(4) preparation of TPBi electron transport layer, LiF modification layer and Al electrode by vacuum evaporation method
At 1X 10-4~5×10-4And (3) sequentially evaporating a TPBi electron transport layer with the thickness of 30-60 nm, a LiF modification layer with the thickness of 0.8-1.6 nm and an Al electrode with the thickness of 80-120 nm on the surface of the perovskite luminescent layer obtained in the step (3) under the vacuum condition of Pa, so that the perovskite luminescent diode based on the doping of the nano particles and/or the cryptate is obtained.
In the technical scheme, the nano particles in the step (3) are ZrO with grain diameter of 10-50 nm2、TiO2、ZnO、SnO2NiO or SrTiO3
In the technical scheme, the cryptate in the step (3) is 4,7,13,16,21, 24-hexaoxy-1, 10-diazabicyclo [8.8.8] hexacosane or 4,7,13,16, 21-pentaoxy-1, 10-diazabicyclo [8.8.5] tricosane.
The invention has the beneficial effects that:
the luminescent layer of the perovskite light-emitting diode is a quasi-two-dimensional perovskite thin film doped with nano particles and/or crypt ether, the structural order distribution in the quasi-two-dimensional perovskite thin film can be narrowed through doping, and the appearance of phases with lower or higher orders is reduced, so that the non-radiative recombination in the thin film is inhibited; based on this mechanism, a light emitting diode device having higher External Quantum Efficiency (EQE) is finally obtained.
Drawings
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
Fig. 1 is a schematic structural view of a perovskite light emitting diode of the present invention.
FIG. 2 is a normalized fluorescence spectrum curve of the perovskite luminescent layer prepared in embodiments 1-4 of the present invention.
FIG. 3 is a graph comparing the fluorescence quantum yields of perovskite light-emitting layers prepared in examples 1 to 4 of the present invention.
FIG. 4 is an EQE-current density curve of perovskite light emitting diodes prepared in embodiments 1-4 of the present invention.
The reference numerals in fig. 1 are denoted as:
the solar cell comprises a 1-glass substrate, a 2-ITO conductive film, a 3-hole transport layer, a 4-perovskite luminescent layer, a 5-electron transport layer, a 6-modification layer and a 7-electrode.
Detailed Description
The invention firstly provides a quasi-two-dimensional perovskite light-emitting diode based on nano-particle and/or crypt ether doping, which sequentially comprises the following components from bottom to top: a glass substrate 1 having an ITO (indium tin oxide) conductive film 2 (ITO as a device anode); a hole transport layer 3; a nanoparticle and/or crypt ether doped quasi-two-dimensional perovskite light emitting layer 4; an electron transport layer 5; a finishing layer 6; electrode 7 (as the device cathode). The schematic structure of the device is shown in fig. 1.
The luminescent layer of the perovskite light-emitting diode device is a quasi-two-dimensional perovskite thin film doped with nano particles and/or crypt ether, the structural order distribution in the quasi-two-dimensional perovskite thin film can be narrowed through doping, the appearance of phases with lower or higher orders is reduced, and accordingly non-radiative recombination in the thin film is inhibited. Based on this mechanism, a light emitting diode device having higher External Quantum Efficiency (EQE) is finally obtained.
More specifically, the perovskite light emitting diode of the invention is sequentially composed of a glass substrate 1(ITO is used as a device anode) with an ITO (indium tin oxide) conductive film 2, a PVK (polyvinylcarbazole) hole transport layer 3, a nano particle and/or hole ether doped quasi-two-dimensional perovskite light emitting layer 4, a TPBi (1,3, 5-tri (1-phenyl-1H-benzimidazole-2-yl) benzene) electron transport layer 5, a LiF modification layer 6 and an Al electrode 7 (used as a device cathode) from bottom to top; the thickness of the ITO conductive film 2 is 80-150 nm, the thickness of the PVK hole transport layer 3 is 20-40 nm, the thickness of the nano particle and/or hole ether doped quasi-two-dimensional perovskite light emitting layer 4 is 30-150 nm, the thickness of the TPBi electron transport layer 5 is 30-60 nm, the thickness of the LiF modification layer 6 is 0.8-1.6 nm, and the thickness of the Al electrode 7 is 80-120 nm; the schematic structure of the device is shown in fig. 1.
In the device structure, the quasi-two-dimensional perovskite light-emitting layer 4 doped with the nano-particles and/or the crypt ether is PEA2FAn- 1PbnBr3n+1Wherein PEA: phenethylamine, FA: formamidine, n: the order of the quasi-two-dimensional perovskite structure is 3-8; the doped nano particles are ZrO with the grain diameter of 10-50 nm2、TiO2、ZnO、SnO2NiO or SrTiO3(ii) a The cryptate is 4,7,13,16,21, 24-hexaoxy-1, 10-diazabicyclo [8.8.8]]Hexacosane or 4,7,13,16, 21-pentaoxy-1, 10-diazabicyclo [8.8.5]]And twenty three alkanes.
The perovskite light emitting diode device of the invention based on the quasi two-dimensional perovskite light emitting layer 4 doped by nano particles and/or hole ether can obtain narrower quasi two-dimensional structure order distribution, and the main mechanism is as follows: the nano particles can improve the permeability of a perovskite layer, and promote the extraction of an anti-solvent to the solvent in the spin-coating film-anti-solvent cleaning process so as to inhibit the segregation of organic cations; the cryptate can selectively complex lead ions to slow down the crystallization speed, so that the integral crystallization of the film is more uniform. By utilizing the synergistic action mechanism of the two, narrower order distribution in the quasi-two-dimensional perovskite thin film can be further obtained, and the occurrence of perovskite phases with lower or higher orders is avoided.
The perovskite light-emitting diode of the invention has the main working principle that: under the external bias, electrons and holes are respectively injected from the cathode and the anode of the device and respectively flow through the electron transport layer 5 and the hole transport layer 3, and finally recombination and light emission are carried out on the perovskite light emitting layer 4. The quasi-two-dimensional perovskite light-emitting layer 4 based on nano-particles and/or crypt ether doping has a narrower structural order distribution, so that non-radiative recombination is effectively inhibited, and the device can obtain higher EQE.
The invention also provides a preparation method of the perovskite light-emitting diode, which comprises the following steps:
(1) cleaning a substrate
Sequentially placing the glass substrate 1 with the ITO conductive film 2 in deionized water, acetone and isopropanol, respectively ultrasonically cleaning for 15-30 minutes, and then drying;
(2) preparation of PVK hole transport layer 3 by spin coating
Preparing a PVK chlorobenzene solution with the concentration of 5-15 mg/mL, and spin-coating the PVK chlorobenzene solution on the surface of the ITO conductive film 2 obtained in the step (1), wherein the spin-coating speed is 2000-4500 rpm, and the spin-coating time is 30-50 seconds; then annealing for 20-40 minutes at 100-150 ℃, and finally cooling to room temperature; obtaining a PVK hole transport layer 3 with the thickness of 20-40 nm;
(3) preparation of nano-particle and/or crypt ether doped perovskite luminescent layer 4 by spin coating method
(3-1) firstly dispersing the nanoparticles in Dimethylformamide (DMF), preparing 0.2-1.0 mg/mL of DMF dispersion liquid of the nanoparticles, and ultrasonically dispersing for 4-8 hours; 0.1-0.6 mmol of PbBr20.08-0.48 mmol of FABr, 0.04-0.24 mmol of PEABr and 0.01-0.06 mmol of CH3NH3Dissolving Cl in a mixed solution of 0.5mL of the DMF dispersion solution of the nano particles and 0.5mL of dimethyl sulfoxide (DMSO); then spin-coating the solution on the surface of the PVK hole transport layer 3 obtained in the step (2), wherein the spin-coating speed is 4000-8000 rpm, and the spin-coating time is 30-EDripping 0.1-0.5 mL of ethyl acetate, ether, toluene or chlorobenzene serving as an anti-solvent on the rotating surface at the 10 th-15 th second from the beginning of spin coating for 50 seconds; finally, annealing for 10-30 minutes at 80-120 ℃ to obtain a perovskite luminescent layer 4 with the thickness of 30-150 nm;
or (3-2) adding 0.1-0.6 mmol of PbBr20.08-0.48 mmol of FABr, 0.04-0.24 mmol of PEABr and 0.01-0.06 mmol of CH3NH3Dissolving Cl in a mixed solution of 0.5mL of DMF dispersion liquid and 0.5mL of DMSO, adding 0.001-0.012 mmol of cryptand, and stirring at room temperature for 1-3 hours; then spin-coating the solution on the surface of the PVK hole transport layer 3 obtained in the step (2), wherein the spin-coating speed is 4000-8000 rpm, the spin-coating time is 30-50 seconds, and 0.1-0.5 mL of ethyl acetate, ether, toluene or chlorobenzene is dripped on the rotating surface in the 10-15 seconds from the beginning of spin-coating to serve as an anti-solvent; finally, annealing for 10-30 minutes at 80-120 ℃ to obtain a perovskite luminescent layer 4 with the thickness of 30-150 nm;
or (3-3) firstly dispersing the nanoparticles in Dimethylformamide (DMF), preparing 0.2-1.0 mg/mL of DMF dispersion liquid of the nanoparticles, and ultrasonically dispersing for 4-8 hours; 0.1-0.6 mmol of PbBr20.08-0.48 mmol of FABr, 0.04-0.24 mmol of PEABr and 0.01-0.06 mmol of CH3NH3Dissolving Cl into a mixed solution of 0.5mL of nano particle DMF dispersion liquid and 0.5mL of dimethyl sulfoxide, adding 0.001-0.012 mmol of cryptand, and stirring at room temperature for 1-3 hours; then spin-coating the solution on the surface of the PVK hole transport layer 3 obtained in the step (2), wherein the spin-coating speed is 4000-8000 rpm, the spin-coating time is 30-50 seconds, and 0.1-0.5 mL of ethyl acetate, ether, toluene or chlorobenzene is dripped on the rotating surface in the 10-15 seconds from the beginning of spin-coating to serve as an anti-solvent; finally, annealing for 10-30 minutes at 80-120 ℃ to obtain a perovskite luminescent layer 4 with the thickness of 30-150 nm;
(4) TPBi electron transport layer 5, LiF modification layer 6 and Al electrode 7 prepared by vacuum evaporation method
At 1X 10-4~5×10-4Sequentially evaporating TPBi electron transport layers 5 with the thickness of 30-60 nm on the surfaces of the perovskite light emitting layers obtained in the step (3) under the vacuum condition of Pa, wherein the thickness of the TPBi electron transport layers is 08-1.6 nm of LiF modification layer 6 and 80-120 nm of Al electrode 7, thereby obtaining the perovskite light-emitting diode based on nano particles and/or crypt ether doping.
Example 1:
sequentially placing a glass substrate 1 with an ITO conductive film 2 (the thickness is 100nm) in deionized water, acetone and isopropanol, respectively carrying out ultrasonic cleaning for 20 minutes, and then drying;
preparing a PVK chlorobenzene solution with the concentration of 10mg/mL, and then spin-coating the solution on the surface of the ITO conductive film 2 at the spin-coating speed of 4000 revolutions per minute for 40 seconds; then annealing for 30 minutes at 120 ℃, and finally cooling to room temperature; the thickness of the obtained PVK hole transport layer 3 is 25 nm;
0.2mmol of PbBr20.16mmol of FABr, 0.08mmol of PEABr and 0.02mmol of CH3NH3Dissolving Cl in a mixture of 0.5mL of DMF and 0.5mL of DMSO, and stirring at room temperature for 2 hours; then spin-coating the obtained solution on the surface of the PVK hole transport layer 3, wherein the spin-coating rotation speed is 7000 revolutions per minute, the spin-coating time is 40 seconds, and 0.15mL of ethyl acetate is dripped on the rotating surface at the 12 th second from the start of spin-coating to serve as an anti-solvent; finally annealing for 20 minutes at 80 ℃ to obtain a perovskite luminescent layer 4 with the thickness of 50 nm;
at 3X 10-4And (3) under the vacuum condition of Pa, sequentially evaporating a TPBi electron transport layer 5 with the thickness of 50nm, a LiF modification layer 6 with the thickness of 1nm and an Al electrode 7 with the thickness of 100nm on the surface of the perovskite luminous layer 4, and finishing the preparation of the device. The EQE-current density characteristic curve test was performed on the device, and the EQE peak value of the undoped device was 16.2%.
Example 2:
sequentially placing a glass substrate 1 with an ITO conductive film 2 (the thickness is 100nm) in deionized water, acetone and isopropanol, respectively carrying out ultrasonic cleaning for 20 minutes, and then drying;
preparing a PVK chlorobenzene solution with the concentration of 10mg/mL, and then spin-coating the solution on the surface of the ITO conductive film 2 at the spin-coating speed of 4000 revolutions per minute for 40 seconds; then annealing for 30 minutes at 120 ℃, and finally cooling to room temperature; the thickness of the obtained PVK hole transport layer 3 is 25 nm;
ZrO of grain diameter of 20nm2The nano particles are dispersed in DMF to prepare ZrO with 0.4mg/mL2Carrying out ultrasonic dispersion on the nano particle DMF dispersion liquid for 5 hours; 0.2mmol of PbBr20.16mmol of FABr, 0.08mmol of PEABr and 0.02mmol of CH3NH3Dissolving Cl in a mixture of 0.5mL of the DMF dispersion solution of the nanoparticles and 0.5mL of DMSO, and stirring at room temperature for 2 hours; then spin-coating the obtained solution on the surface of the PVK hole transport layer 3, wherein the spin-coating rotation speed is 7000 revolutions per minute, the spin-coating time is 40 seconds, and 0.15mL of ethyl acetate is dripped on the rotating surface at the 12 th second from the start of spin-coating to serve as an anti-solvent; finally annealing for 20 minutes at 80 ℃ to obtain a perovskite luminescent layer 4 with the thickness of 50 nm;
at 3X 10-4And (3) under the vacuum condition of Pa, sequentially evaporating a TPBi electron transport layer 5 with the thickness of 50nm, a LiF modification layer 6 with the thickness of 1nm and an Al electrode 7 with the thickness of 100nm on the surface of the perovskite luminous layer 4, and finishing the preparation of the device. The EQE-current density characteristic curve test is carried out on the device, the EQE peak value of the device doped with the nano particles in the perovskite layer reaches 18.4%, and compared with an undoped device, the EQE peak value is improved to a certain extent.
Example 3:
sequentially placing a glass substrate 1 with an ITO conductive film 2 (the thickness is 100nm) in deionized water, acetone and isopropanol, respectively carrying out ultrasonic cleaning for 20 minutes, and then drying;
preparing a PVK chlorobenzene solution with the concentration of 10mg/mL, and then spin-coating the solution on the surface of the ITO conductive film 2 at the spin-coating speed of 4000 revolutions per minute for 40 seconds; then annealing for 30 minutes at 120 ℃, and finally cooling to room temperature; the thickness of the obtained PVK hole transport layer 3 is 25 nm;
0.2mmol of PbBr20.16mmol of FABr, 0.08mmol of PEABr and 0.02mmol of CH3NH3Cl was dissolved in a mixture of 0.5mL DMF and 0.5mL DMSO and 0.003 mmol cryptand 4,7,13,16,21, 24-hexaoxy-1, 10-diazabicyclo [8.8.8] was added]The hexacosane is stirred for 2 hours at room temperature; the obtained solution was then spin-coated on the surface of the PVK hole transport layer 3 at 7000 rpm for 40 seconds in the direction of 12 seconds from the start of the spin-coating0.15mL of ethyl acetate is dripped on the surface of the substrate as an anti-solvent; finally annealing for 20 minutes at 80 ℃ to obtain a perovskite luminescent layer 4 with the thickness of 50 nm;
at 3X 10-4And (3) under the vacuum condition of Pa, sequentially evaporating a TPBi electron transport layer 5 with the thickness of 50nm, a LiF modification layer 6 with the thickness of 1nm and an Al electrode 7 with the thickness of 100nm on the surface of the perovskite luminous layer 4, and finishing the preparation of the device. The EQE-current density characteristic curve test is carried out on the device, the EQE peak value of the device with the perovskite layer doped with the cave ether reaches 19.3%, and the device is improved to a certain extent compared with an undoped device.
Example 4:
sequentially placing a glass substrate 1 with an ITO conductive film 2 (the thickness is 100nm) in deionized water, acetone and isopropanol, respectively carrying out ultrasonic cleaning for 20 minutes, and then drying;
preparing a PVK chlorobenzene solution with the concentration of 10mg/mL, and then spin-coating the solution on the surface of the ITO conductive film 2 at the spin-coating speed of 4000 revolutions per minute for 40 seconds; then annealing for 30 minutes at 120 ℃, and finally cooling to room temperature; the thickness of the obtained PVK hole transport layer 3 is 25 nm;
ZrO of grain diameter of 20nm2The nano particles are dispersed in DMF to prepare ZrO with 0.4mg/mL2Carrying out ultrasonic dispersion on the nano particle DMF dispersion liquid for 5 hours; 0.2mmol of PbBr20.16mmol of FABr, 0.08mmol of PEABr and 0.02mmol of CH3NH3Cl was dissolved in 0.5mL of the mixture of the nanoparticle DMF dispersion and 0.5mL of DMSO, and 0.003mmol of cryptand 4,7,13,16,21, 24-hexaoxy-1, 10-diazabicyclo [8.8.8]]The hexacosane is stirred for 2 hours at room temperature; then spin-coating the obtained solution on the surface of the PVK hole transport layer 3, wherein the spin-coating rotation speed is 7000 revolutions per minute, the spin-coating time is 40 seconds, and 0.15mL of ethyl acetate is dripped on the rotating surface at the 12 th second from the start of spin-coating to serve as an anti-solvent; finally annealing for 20 minutes at 80 ℃ to obtain a perovskite luminescent layer 4 with the thickness of 50 nm;
at 3X 10-4And (3) under the vacuum condition of Pa, sequentially evaporating a TPBi electron transport layer 5 with the thickness of 50nm, a LiF modification layer 6 with the thickness of 1nm and an Al electrode 7 with the thickness of 100nm on the surface of the perovskite luminous layer 4, and finishing the preparation of the device. To the deviceAccording to an EQE-current density characteristic curve test, the EQE peak value of the device with the perovskite layer doped with the nano particles and the crypt ether simultaneously reaches 21.2%, and compared with the device with the nano particles or the crypt ether doped independently, the EQE peak value is further improved.
FIG. 2 is a normalized fluorescence spectrum curve of the perovskite luminescent layer prepared in embodiments 1-4 of the present invention, wherein: curve 1 represents the normalized fluorescence spectrum of the perovskite luminescent layer prepared in example 1, the perovskite layer being undoped with nanoparticles or cryptates; curve 2 represents the normalized fluorescence spectrum of the perovskite luminescent layer prepared in example 2, the perovskite layer being doped with nanoparticles and not with cryptates; curve 3 represents the normalized fluorescence spectrum of the perovskite luminescent layer prepared in example 3, the perovskite layer being undoped with nanoparticles and doped with cryptate; curve 4 represents the normalized fluorescence spectrum of the perovskite luminescent layer prepared in example 4, the perovskite layer being doped with both nanoparticles and cryptates;
as shown in the figure, compared with the perovskite layer which is not doped, the single doping of the nano particles or the cryptate can generate blue shift of the luminous peak of the film, and the half-peak width is reduced, namely the phenomenon that the order distribution in the quasi-two-dimensional perovskite film is narrowed; when the nano particles and the cryptate ether are doped at the same time, the peak value of the fluorescence spectrum continues to carry out blue shift, which shows that the action mechanisms of the nano particles and the cryptate ether can be mutually superposed, and the order distribution is further narrowed;
FIG. 3 is a comparison of fluorescence quantum yields of perovskite luminescent layers prepared in examples 1 to 4 of the present invention;
as shown, the fluorescence quantum yield of undoped perovskite layer in example 1 was 77.2%; the nano-particles are doped in the example 2, and the fluorescence quantum yield of the perovskite layer of the undoped cryptate is 84.5 percent; the fluorescence quantum yield of the perovskite layer doped with the cryptate is 86.2 percent when the nano particles are not doped in the embodiment 3; the fluorescence quantum yield of the perovskite layer doped with the nanoparticles and the cryptate in example 4 is 90.2%;
fig. 4 is an EQE-current density curve of the perovskite light emitting diode prepared in embodiments 1 to 4 of the present invention, wherein: curve 1 represents the EQE-current density curve for the perovskite light emitting diode prepared in example 1; curve 2 represents the EQE-current density curve for the perovskite light emitting diode prepared in example 2; curve 3 represents the EQE-current density curve for the perovskite light emitting diode prepared in example 3; curve 4 represents the EQE-current density curve for the perovskite light emitting diode prepared in example 4;
as shown in the figure, in the device in which the perovskite layer is not doped, the EQE curve is the lowest, and the peak value is 16.3%; after the nano particles or the cryptate ether are respectively doped, the EQE is improved, and the peak values respectively reach 18.4 percent and 19.3 percent; after the nano particles and the cryptate ether are doped at the same time, the EQE can be continuously improved, and the peak value reaches 21.2%.
It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications therefrom are within the scope of the invention.

Claims (10)

1.一种钙钛矿发光二极管,从下至上依次包括:1. A perovskite light-emitting diode, comprising in order from bottom to top: 具有ITO导电薄膜(2)的玻璃衬底(1);a glass substrate (1) with an ITO conductive film (2); 空穴传输层(3);hole transport layer (3); 钙钛矿发光层(4);perovskite light-emitting layer (4); 电子传输层(5);an electron transport layer (5); 修饰层(6);trim layer (6); 电极(7);electrode (7); 其特征在于,It is characterized in that, 所述钙钛矿发光层(4)为纳米粒子和/或穴醚掺杂的准二维钙钛矿薄膜。The perovskite light-emitting layer (4) is a quasi-two-dimensional perovskite thin film doped with nanoparticles and/or hole ethers. 2.根据权利要求1所述的钙钛矿发光二极管,其特征在于,所述钙钛矿发光层(4)为PEA2FAn-1PbnBr3n+1,其中PEA为苯乙胺,FA为甲脒,n为准二维钙钛矿结构阶数,n值为3~8;掺入的纳米粒子为晶粒直径为10~50nm的ZrO2、TiO2、ZnO、SnO2、NiO或SrTiO3;穴醚为4,7,13,16,21,24-六氧-1,10-二氮双环[8.8.8]二十六烷或4,7,13,16,21-五氧-1,10-二氮二环[8.8.5]二十三烷。2. The perovskite light-emitting diode according to claim 1, wherein the perovskite light-emitting layer (4) is PEA 2 FA n-1 Pbn Br 3n+1 , wherein PEA is phenethylamine, FA is formamidine, n is the order of quasi-two-dimensional perovskite structure, and n is 3-8; the doped nanoparticles are ZrO 2 , TiO 2 , ZnO, SnO 2 , NiO with a grain diameter of 10-50 nm or SrTiO 3 ; the cave ether is 4,7,13,16,21,24-hexaoxy-1,10-diazabicyclo[8.8.8]hexadecane or 4,7,13,16,21-pentane Oxy-1,10-diazabicyclo[8.8.5]tricosane. 3.根据权利要求1所述的钙钛矿发光二极管,其特征在于,所述空穴传输层(3)为PVK。3. The perovskite light-emitting diode according to claim 1, wherein the hole transport layer (3) is PVK. 4.根据权利要求1所述的钙钛矿发光二极管,其特征在于,所述电子传输层(5)为TPBi。4. The perovskite light-emitting diode according to claim 1, wherein the electron transport layer (5) is TPBi. 5.根据权利要求1所述的钙钛矿发光二极管,其特征在于,所述修饰层(6)为LiF。5. The perovskite light-emitting diode according to claim 1, wherein the modification layer (6) is LiF. 6.根据权利要求1所述的钙钛矿发光二极管,其特征在于,所述电极(7)为Al。6. The perovskite light-emitting diode according to claim 1, wherein the electrode (7) is Al. 7.根据权利要求1所述的钙钛矿发光二极管,其特征在于,所述ITO导电薄膜(2)的厚度为80~150nm,空穴传输层(3)的厚度为20~40nm,钙钛矿发光层(4)的厚度为30~150nm,电子传输层(5)的厚度为30~60nm,修饰层(6)的厚度为0.8~1.6nm,电极(7)的厚度为80~120nm。7. The perovskite light-emitting diode according to claim 1, wherein the ITO conductive film (2) has a thickness of 80-150 nm, the hole transport layer (3) has a thickness of 20-40 nm, and the perovskite The thickness of the mineral light-emitting layer (4) is 30-150 nm, the thickness of the electron transport layer (5) is 30-60 nm, the thickness of the modification layer (6) is 0.8-1.6 nm, and the thickness of the electrode (7) is 80-120 nm. 8.一种钙钛矿发光二极管的制备方法,其特征在于,包括以下步骤:8. a preparation method of perovskite light-emitting diode, is characterized in that, comprises the following steps: (1)清洗衬底(1) Cleaning the substrate 将具有ITO导电薄膜(2)的玻璃衬底(1)依次置于去离子水、丙酮和异丙醇中,分别超声清洗15~30分钟,然后烘干;The glass substrate (1) with the ITO conductive film (2) is placed in deionized water, acetone and isopropanol in sequence, ultrasonically cleaned for 15-30 minutes respectively, and then dried; (2)旋涂法制备PVK空穴传输层(3)(2) Preparation of PVK hole transport layer by spin coating (3) 配制浓度为5~15mg/mL的PVK氯苯溶液,然后将该溶液旋涂于步骤(1)得到的ITO导电薄膜(2)表面,旋涂转速为2000~4500转/分钟,旋涂时间为30~50秒;然后于100~150℃条件下退火20~40分钟,最后冷却至室温;得到厚度为20~40nm的PVK空穴传输层(3);A PVK chlorobenzene solution with a concentration of 5 to 15 mg/mL is prepared, and then the solution is spin-coated on the surface of the ITO conductive film (2) obtained in step (1). 30 to 50 seconds; then annealed at 100 to 150° C. for 20 to 40 minutes, and finally cooled to room temperature; to obtain a PVK hole transport layer (3) with a thickness of 20 to 40 nm; (3)旋涂法制备纳米粒子和/或穴醚掺杂的钙钛矿发光层(4)(3) Preparation of nanoparticles and/or cave ether-doped perovskite light-emitting layer by spin coating (4) (3-1)首先将纳米粒子分散于二甲基甲酰胺(DMF)中,配制0.2~1.0mg/mL的纳米粒子DMF分散液,超声分散4~8小时;将0.1~0.6mmol的PbBr2、0.08~0.48mmol的FABr、0.04~0.24mmol的PEABr和0.01~0.06mmol的CH3NH3Cl溶解于0.5mL纳米粒子DMF分散液和0.5mL二甲基亚砜(DMSO)混合溶液中;然后将该溶液旋涂于步骤(2)得到的PVK空穴传输层(3)表面,旋涂转速为4000~8000转/分钟,旋涂时间为30~50秒,在旋涂开始的第10~15秒向旋转的表面滴加0.1~0.5mL的乙酸乙酯、乙醚、甲苯或氯苯作为反溶剂;最后在80~120℃条件下退火10~30分钟,得到厚度为30~150nm的钙钛矿发光层(4);(3-1) First, disperse the nanoparticles in dimethylformamide (DMF), prepare a nanoparticle DMF dispersion of 0.2-1.0 mg/mL, and disperse them ultrasonically for 4-8 hours; disperse 0.1-0.6 mmol of PbBr 2 , 0.08-0.48 mmol of FABr, 0.04-0.24 mmol of PEABr and 0.01-0.06 mmol of CH 3 NH 3 Cl were dissolved in 0.5 mL of nanoparticle DMF dispersion and 0.5 mL of dimethyl sulfoxide (DMSO) mixed solution; then The solution is spin-coated on the surface of the PVK hole transport layer (3) obtained in step (2). Add 0.1-0.5 mL of ethyl acetate, ether, toluene or chlorobenzene to the rotating surface dropwise for 15 seconds as an anti-solvent; finally, anneal at 80-120 °C for 10-30 minutes to obtain perovskite with a thickness of 30-150 nm Mineral luminescent layer (4); 或者(3-2)将0.1~0.6mmol的PbBr2、0.08~0.48mmol的FABr、0.04~0.24mmol的PEABr和0.01~0.06mmol的CH3NH3Cl溶解于0.5mL DMF分散液和0.5mL DMSO混合溶液中,并加入0.001~0.012mmol穴醚室温搅拌1~3小时;然后将该溶液旋涂于步骤(2)得到的PVK空穴传输层(3)表面,旋涂转速为4000~8000转/分钟,旋涂时间为30~50秒,在旋涂开始的第10~15秒向旋转的表面滴加0.1~0.5mL的乙酸乙酯、乙醚、甲苯或氯苯作为反溶剂;最后在80~120℃条件下退火10~30分钟,得到厚度为30~150nm的钙钛矿发光层(4);Or (3-2) Dissolve 0.1-0.6 mmol of PbBr 2 , 0.08-0.48 mmol of FABr, 0.04-0.24 mmol of PEABr and 0.01-0.06 mmol of CH 3 NH 3 Cl in 0.5 mL of DMF dispersion and 0.5 mL of DMSO In the mixed solution, add 0.001-0.012 mmol of cave ether and stir at room temperature for 1-3 hours; then spin-coat the solution on the surface of the PVK hole transport layer (3) obtained in step (2), and the spin-coating speed is 4000-8000 rpm /min, the spin coating time is 30 to 50 seconds, and 0.1 to 0.5 mL of ethyl acetate, ether, toluene or chlorobenzene is added dropwise to the rotating surface in the first 10 to 15 seconds of the spin coating as an anti-solvent; finally, at 80 Annealing at ~120°C for 10-30 minutes to obtain a perovskite light-emitting layer (4) with a thickness of 30-150 nm; 或者(3-3)首先将纳米粒子分散于二甲基甲酰胺(DMF)中,配制0.2~1.0mg/mL的纳米粒子DMF分散液,超声分散4~8小时;将0.1~0.6mmol的PbBr2、0.08~0.48mmol的FABr、0.04~0.24mmol的PEABr和0.01~0.06mmol的CH3NH3Cl溶解于0.5mL纳米粒子DMF分散液和0.5mL二甲基亚砜混合溶液中,并加入0.001~0.012mmol穴醚室温搅拌1~3小时;然后将该溶液旋涂于步骤(2)得到的PVK空穴传输层(3)表面,旋涂转速为4000~8000转/分钟,旋涂时间为30~50秒,在旋涂开始的第10~15秒向旋转的表面滴加0.1~0.5mL的乙酸乙酯、乙醚、甲苯或氯苯作为反溶剂;最后在80~120℃条件下退火10~30分钟,得到厚度为30~150nm的钙钛矿发光层(4);Or (3-3) First, disperse the nanoparticles in dimethylformamide (DMF), prepare a nanoparticle DMF dispersion of 0.2-1.0 mg/mL, and disperse them ultrasonically for 4-8 hours; disperse 0.1-0.6 mmol of PbBr 2. 0.08-0.48 mmol of FABr, 0.04-0.24 mmol of PEABr and 0.01-0.06 mmol of CH 3 NH 3 Cl are dissolved in 0.5 mL of nanoparticle DMF dispersion and 0.5 mL of dimethyl sulfoxide mixed solution, and 0.001 ~0.012 mmol of hole ether was stirred at room temperature for 1 to 3 hours; then the solution was spin-coated on the surface of the PVK hole transport layer (3) obtained in step (2). For 30 to 50 seconds, 0.1 to 0.5 mL of ethyl acetate, ether, toluene or chlorobenzene was added dropwise to the rotating surface in the first 10 to 15 seconds of spin coating as an anti-solvent; finally, annealed at 80 to 120 °C for 10 seconds. ~30 minutes to obtain a perovskite light-emitting layer (4) with a thickness of 30 to 150 nm; (4)真空蒸镀法制备TPBi电子传输层(5)、LiF修饰层(6)和Al电极(7)(4) Preparation of TPBi electron transport layer (5), LiF modified layer (6) and Al electrode (7) by vacuum evaporation 在1×10-4~5×10-4Pa的真空条件下,在步骤(3)得到的钙钛矿发光层(4)的表面依次蒸镀厚度为30~60nm的TPBi电子传输层(5),厚度为0.8~1.6nm的LiF修饰层(6)和厚度为80~120nm的Al电极(7),从而得到所述的钙钛矿发光二极管。Under the vacuum condition of 1 × 10 -4 -5 × 10 -4 Pa, a TPBi electron transport layer (5 ), a LiF modified layer (6) with a thickness of 0.8-1.6 nm and an Al electrode (7) with a thickness of 80-120 nm, thereby obtaining the perovskite light-emitting diode. 9.根据权利要求8所述的钙钛矿发光二极管的制备方法,其特征在于,步骤(3)中所述的纳米粒子为晶粒直径为10~50nm的ZrO2、TiO2、ZnO、SnO2、NiO或SrTiO39 . The method for preparing a perovskite light-emitting diode according to claim 8 , wherein the nanoparticles described in step (3) are ZrO 2 , TiO 2 , ZnO, SnO with a grain diameter of 10-50 nm. 10 . 2. NiO or SrTiO 3 . 10.根据权利要求8所述的钙钛矿发光二极管的制备方法,其特征在于,步骤(3)中所述的穴醚为4,7,13,16,21,24-六氧-1,10-二氮双环[8.8.8]二十六烷或4,7,13,16,21-五氧-1,10-二氮二环[8.8.5]二十三烷。10. The method for preparing a perovskite light-emitting diode according to claim 8, wherein the cave ether described in step (3) is 4,7,13,16,21,24-hexaoxy-1, 10-Diazabicyclo[8.8.8]hexadecane or 4,7,13,16,21-pentaoxo-1,10-diazabicyclo[8.8.5]hexacosane.
CN202110428625.8A 2021-04-21 2021-04-21 Perovskite light-emitting diode and preparation method thereof Active CN113161506B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110428625.8A CN113161506B (en) 2021-04-21 2021-04-21 Perovskite light-emitting diode and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110428625.8A CN113161506B (en) 2021-04-21 2021-04-21 Perovskite light-emitting diode and preparation method thereof

Publications (2)

Publication Number Publication Date
CN113161506A true CN113161506A (en) 2021-07-23
CN113161506B CN113161506B (en) 2022-11-01

Family

ID=76867489

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110428625.8A Active CN113161506B (en) 2021-04-21 2021-04-21 Perovskite light-emitting diode and preparation method thereof

Country Status (1)

Country Link
CN (1) CN113161506B (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114497431A (en) * 2022-01-21 2022-05-13 吉林大学 A kind of preparation method of quasi-two-dimensional thin film
CN114530753A (en) * 2022-02-18 2022-05-24 中国科学院长春应用化学研究所 Perovskite gain medium, preparation method thereof and application thereof in continuous optical pumping laser at room temperature

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006124670A2 (en) * 2005-05-12 2006-11-23 Georgia Tech Research Corporation Coated metal oxide nanoparticles and methods for producing same
WO2008060534A1 (en) * 2006-11-10 2008-05-22 Georgia Tech Research Corporation Printable thin-film transistors with high dielectric constant gate insulators and methods for producing same
US20170358759A1 (en) * 2014-11-06 2017-12-14 Postech Academy-Industry Foundation Light-emitting layer for perovskite light-emitting device, method for manufacturing same, and perovskite light-emitting device using same
CN207009483U (en) * 2017-08-01 2018-02-13 苏州协鑫纳米科技有限公司 Perovskite solar cell and component
CN108987596A (en) * 2018-07-17 2018-12-11 嘉兴纳鼎光电科技有限公司 Electron transfer layer, preparation method and semiconductor photoelectric device
CN109390476A (en) * 2017-08-02 2019-02-26 Tcl集团股份有限公司 A kind of QLED device and preparation method thereof with graphene oxide boundary layer
CN111171329A (en) * 2020-01-21 2020-05-19 翁秋梅 Plastic dilatancy polymer and method for realizing dilatancy thereof
CN111192971A (en) * 2020-01-10 2020-05-22 上海大学 Low roll-off quasi-two-dimensional perovskite light-emitting diode and preparation method thereof
CN111276623A (en) * 2020-01-19 2020-06-12 中国工程物理研究院流体物理研究所 Modified hole transport layer and blue-light perovskite light-emitting diode based on same
CN111952473A (en) * 2020-08-18 2020-11-17 福州大学 A kind of perovskite film doped with amphiphilic silica ions and preparation method of light-emitting diode
CN111952475A (en) * 2020-08-18 2020-11-17 福州大学 A kind of preparation method of perovskite light-emitting diode device containing silver nanoparticles

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006124670A2 (en) * 2005-05-12 2006-11-23 Georgia Tech Research Corporation Coated metal oxide nanoparticles and methods for producing same
WO2008060534A1 (en) * 2006-11-10 2008-05-22 Georgia Tech Research Corporation Printable thin-film transistors with high dielectric constant gate insulators and methods for producing same
US20170358759A1 (en) * 2014-11-06 2017-12-14 Postech Academy-Industry Foundation Light-emitting layer for perovskite light-emitting device, method for manufacturing same, and perovskite light-emitting device using same
CN207009483U (en) * 2017-08-01 2018-02-13 苏州协鑫纳米科技有限公司 Perovskite solar cell and component
CN109390476A (en) * 2017-08-02 2019-02-26 Tcl集团股份有限公司 A kind of QLED device and preparation method thereof with graphene oxide boundary layer
CN108987596A (en) * 2018-07-17 2018-12-11 嘉兴纳鼎光电科技有限公司 Electron transfer layer, preparation method and semiconductor photoelectric device
CN111192971A (en) * 2020-01-10 2020-05-22 上海大学 Low roll-off quasi-two-dimensional perovskite light-emitting diode and preparation method thereof
CN111276623A (en) * 2020-01-19 2020-06-12 中国工程物理研究院流体物理研究所 Modified hole transport layer and blue-light perovskite light-emitting diode based on same
CN111171329A (en) * 2020-01-21 2020-05-19 翁秋梅 Plastic dilatancy polymer and method for realizing dilatancy thereof
CN111952473A (en) * 2020-08-18 2020-11-17 福州大学 A kind of perovskite film doped with amphiphilic silica ions and preparation method of light-emitting diode
CN111952475A (en) * 2020-08-18 2020-11-17 福州大学 A kind of preparation method of perovskite light-emitting diode device containing silver nanoparticles

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114497431A (en) * 2022-01-21 2022-05-13 吉林大学 A kind of preparation method of quasi-two-dimensional thin film
CN114530753A (en) * 2022-02-18 2022-05-24 中国科学院长春应用化学研究所 Perovskite gain medium, preparation method thereof and application thereof in continuous optical pumping laser at room temperature

Also Published As

Publication number Publication date
CN113161506B (en) 2022-11-01

Similar Documents

Publication Publication Date Title
US11690240B2 (en) Electroluminescent device, manufacturing method thereof, and display apparatus
WO2021103471A1 (en) Self-assembling multi-dimensional quantum well cspbx3 perovskite nanocrystalline light-emitting diode
WO2017128987A1 (en) Perovskite optoelectronic device, preparation method therefor and perovskite material
Zhu et al. Room temperature precipitated dual phase CsPbBr 3–CsPb 2 Br 5 nanocrystals for stable perovskite light emitting diodes
Chen et al. Nanostructure and device architecture engineering for high-performance quantum-dot light-emitting diodes
CN107369774B (en) A kind of compound multiple quantum wells LED of perovskite and preparation method thereof
CN108183173A (en) It is a kind of based on light emitting diode with quantum dots for mixing yttrium zinc oxide electron transfer layer and preparation method thereof
KR20190028460A (en) Thin film of nickel oxide and its manufacturing method, functional material, manufacturing method of thin film structure and electroluminescent element
Lin et al. High-efficiency deep-red quantum-dot light-emitting diodes with type-II CdSe/CdTe core/shell quantum dots as emissive layers
CN109004091A (en) A kind of light emitting diode with quantum dots and preparation method thereof based on room temperature perovskite material
WO2018103747A1 (en) Polymer and electroluminescent device
CN107032392A (en) A kind of full-inorganic perovskite nanometer sheet and its preparation method and application
CN113161506A (en) Perovskite light-emitting diode and preparation method thereof
CN114864835A (en) Blue light perovskite quantum dot film, electroluminescent diode and preparation
Lu et al. Tuning hole transport layers and optimizing perovskite films thickness for high efficiency CsPbBr3 nanocrystals electroluminescence light-emitting diodes
Xue et al. Advances in electrically driven light-emitting diodes based on lead-free metal halides
KR100913610B1 (en) Multicomponent Light Emitting Nanoparticles Containing Metal Complexes and Organic Photoelectric Devices Using The Same
Ma et al. 30-Fold efficiency enhancement achieved in the perovskite light-emitting diodes
Liu et al. Enhanced performance of perovskite light-emitting devices with improved perovskite crystallization
CN116769479B (en) Preparation method of luminescent material based on blue perovskite quantum dots and electroluminescent device thereof
CN115148940B (en) Electroluminescent LED based on surface passivation cesium lead iodine perovskite quantum dots and preparation method thereof
Basha et al. Preparation and characterization of ruthenium based organic composites for optoelectronic device application
CN112103396A (en) Electro-blue light thin film device and preparation method thereof
CN113054119B (en) Composite material, preparation method and application thereof, light-emitting diode and preparation method thereof
CN111326660A (en) Highly discrete nanocrystalline light-emitting layer applied to electroluminescent devices and electroluminescent devices based thereon

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
GR01 Patent grant
GR01 Patent grant