CN113109993A - Typesetting method and typesetting system of display panel and electronic equipment - Google Patents
Typesetting method and typesetting system of display panel and electronic equipment Download PDFInfo
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- CN113109993A CN113109993A CN202110372018.4A CN202110372018A CN113109993A CN 113109993 A CN113109993 A CN 113109993A CN 202110372018 A CN202110372018 A CN 202110372018A CN 113109993 A CN113109993 A CN 113109993A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/76—Patterning of masks by imaging
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
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- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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Abstract
The application discloses a typesetting method and a typesetting system of a display panel and electronic equipment, wherein the typesetting method of the display panel comprises the following steps: acquiring product information of a display panel, wherein the product information comprises the size of the display panel and process information of each film layer in the display panel; determining a mask plate required by each film layer according to the product information; typesetting the mask plates, setting at least one mask plate position according to the process information of each film layer, wherein each mask plate is used for at least one film layer process; designing an optimized typesetting scheme, and typesetting at least one display panel on one manufacturing board; the optimized typesetting scheme comprises the position of each display panel, and in the process of each film layer, the manufacturing plate can be moved to a mask plate for the process, so that the position of a display panel to be patterned is arranged opposite to the mask plate.
Description
Technical Field
The present disclosure relates to the field of semiconductor manufacturing, and in particular, to a method, a system, and an electronic device for typesetting a display panel.
Background
With the development of Display technology, various flat panel Display devices such as Liquid Crystal Displays (LCDs) and Organic Light Emitting Diodes (OLEDs) have the advantages of high image quality, power saving, thin body, and wide application range, and thus are widely used in various consumer electronics products such as mobile phones, televisions, personal digital assistants, digital cameras, notebook computers, and desktop computers, and become the mainstream of Display devices.
Photolithography, which is a process of transferring a pattern on a mask plate (mask) to a wafer by exposure, is a very important process in a semiconductor manufacturing process and is considered as a core step in the manufacture of large-scale integrated circuits. A series of complex and time-consuming photolithography processes in semiconductor manufacturing are mainly performed by corresponding exposure machines. The development of photolithography or the advancement of exposure machine technology has been mainly developed around three major indexes of line width, overlay accuracy and yield.
At present, in the etching process, since the Array substrate (Array) or the Color Filter substrate (CF) is composed of a plurality of film layers, for example, the Array substrate (Array) has a plurality of thin film transistors, each of which includes a light-shielding layer, a buffer layer, an active layer, a gate insulating layer, a gate layer, a passivation layer, a source drain layer, and other film layers. The patterns of the film layers are different, and even some film layers are electrically connected with each other, so that different mask plates are needed in the process of preparing the film layers.
In order to obtain films with different patterns, the arrangement of the mask plates needs to take more factors into consideration, and if different exposure machine tables are selected, the types of the used mask plates are different. Therefore, the models of the selected mask plate and the exposure device of each film layer need to be manually selected, various design rules need to be considered in the process of mask plate typesetting and display panel typesetting on the manufacturing plate, and the utilization rate of the manufacturing plate can be completed only if the design rules are met, so that the required layout is obtained.
The typesetting process also needs to consider the feasibility that the design rule (design rule) of the mask needs the actual process, such as the limitation of a film forming guarantee area, the travel limit during film forming exposure and the like, and meanwhile, when different mask (mask) designs and actual manufacture are involved, the relation of rotation/mirror image and the like exists according to the difference of the optical system and the imaging of the mask when the mask is matched with the actual process, so that a beginner is easy to make mistakes, the experience dependence is high, more detailed items are considered, and the typesetting is time-consuming and labor-consuming.
Disclosure of Invention
The invention aims to provide a typesetting method, a typesetting system and electronic equipment for a display panel, and aims to solve the technical problems that various design rules need to be considered in typesetting of a mask plate and typesetting of the display panel on a manufacturing plate, the dependency on the design experience of designers is high, and the typesetting is time-consuming and labor-consuming.
In order to achieve the above object, the present invention provides a typesetting method for a display panel, comprising the steps of:
acquiring product information of a display panel, wherein the product information comprises the size of the display panel and process information of each film layer in the display panel;
determining a mask plate required by each film layer according to the product information; typesetting the mask plates, setting at least one mask plate position according to the process information of each film layer, wherein each mask plate is used for at least one film layer process; and
designing an optimized typesetting scheme, and typesetting at least one display panel on one manufacturing board; the optimized typesetting scheme comprises the position of each display panel, and in the process of each film layer, the manufacturing plate can be moved to a mask plate for the process, so that the position of a display panel to be patterned is arranged opposite to the mask plate.
Further, the step of setting the optimized typesetting scheme comprises the following steps:
presetting a distance value between two adjacent display panels;
formulating a typesetting scheme according to the position of the film forming effective area of the manufacturing plate, the size of the display panel and the spacing value;
calculating the area ratio of all display panels positioned on the same manufacturing plate to the manufacturing plate;
judging whether the area ratio is smaller than 0.8, if so, returning to the step of presetting the distance value between two adjacent display panels, and if not, executing the next step; and
and outputting the current typesetting scheme as an optimized typesetting scheme.
Further, the distance value between two adjacent display panels is preset according to the limiting conditions of the mask position, the position of the film forming effective area, the exposure and development position, the routing arrangement position, the cutting position and the like.
Further, the step of determining the mask plate required by each film layer according to the product information further includes:
and acquiring an exposure device matched with the mask plate, wherein the mask plate comprises models, sizes and mask patterns corresponding to all the film layers.
Further, the process information includes a number, a process site name, and a process time.
Further, the formulating a typesetting scheme comprises:
sequentially carrying out alignment treatment on a mask plate required by each film layer and the manufacturing plate in an exposure device, wherein the exposure device comprises a manufacturing plate base station for placing the manufacturing plate and a mask plate base station for placing the mask plate, a first alignment mark group is arranged on the manufacturing plate, a second alignment mark group is arranged on the mask plate base station, and the exposure device further comprises a first objective lens group and a second objective lens group; the first objective lens group is used for capturing the first alignment mark group, and the second objective lens group is used for capturing the second alignment mark group.
Further, the exposure apparatus further includes: and the monitoring device is used for aligning the first alignment mark group captured by the first objective lens group and the second alignment mark group captured by the second objective lens group, judging the alignment condition of the manufacturing plate and the mask plate and determining the position relation of the manufacturing plate and the mask plate.
Further, the first objective lens group comprises two objective lenses which are symmetrical about the central axis of the manufacturing plate; the second objective lens group comprises two objective lenses which are symmetrical about the central axis of the mask plate; the objective lens included in the first objective lens group and the objective lens included in the second objective lens group are both perpendicular to the plane where the mask plate base station is located.
In order to achieve the above object, the present invention further provides a typesetting system for a display panel, comprising: the product information acquisition module is used for acquiring product information of the display panel, wherein the product information comprises the size of the display panel and the process information of each film layer in the display panel; the mask plate determining module is used for determining mask plates required by all film layers according to the product information; the mask typesetting module is used for typesetting the masks, setting at least one mask position according to the process information of each film layer, and using each mask for at least one film layer process; the layout optimization module is used for designing an optimized layout scheme and performing layout on at least one display panel on one manufacturing board; the optimized typesetting scheme comprises the position of each display panel, and in the process of each film layer, the manufacturing plate can be moved to a mask plate for the process, so that the position of a display panel to be patterned is arranged opposite to the mask plate.
To achieve the above object, the present invention also provides an electronic device, including: a memory for storing executable program code; and a processor, which executes an executable program corresponding to the executable program code by reading the executable program code, so as to execute the steps in the typesetting method of the display panel.
The technical effects of the invention lie in that, the invention provides a typesetting method, a system and an electronic device for a display panel, based on the display panel of user's demand, according to the design need, in a display panel design parameter database, the size of the display panel and the process information of each film layer in the display panel are determined, the typesetting design of the mask plate and the display panel on the same manufacturing plate are rapidly realized, various design rules are met, the design drawing of the display panel on the manufacturing plate is automatically drawn, the dependency of the design experience on designers is reduced, the manual calculation of design parameters by the designers is not needed, the design time and the evaluation time of the display panel are shortened, the display panel design meeting the demand is rapidly produced, the optimal utilization rate of the manufacturing plate is ensured, the research and development efficiency is improved, and the human resources and the cost are saved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of an exposure apparatus according to an embodiment of the present disclosure;
FIG. 2 is a schematic diagram of an alignment pattern formed by a first alignment mark set and a second alignment mark set of an exposure apparatus according to an embodiment of the present disclosure;
FIG. 3 is a schematic structural diagram of a typesetting system for a display panel provided in an embodiment of the present application;
fig. 4 is a schematic structural diagram of an electronic device provided in an embodiment of the present application.
Description of reference numerals:
an exposure device 100; a mask plate 10;
manufacturing a plate 20; a monitoring device 30;
a mask plate base station 1; manufacturing a plate base table 2;
a product information acquisition module 501; a mask determination module 502;
a mask layout module 503; a layout optimization module 504;
a processor 601; a memory 602;
a power supply 603; an input unit 604.
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all of the embodiments. It should be understood that the detailed description and specific examples, while indicating the present application, are given by way of illustration and explanation only, and are not intended to limit the present application. As used herein, the terms of orientation, such as "upper" and "lower," generally refer to the upper and lower positions of an apparatus in actual use or operation, particularly the orientation of the figures in the drawings; while "inner" and "outer" are with respect to the outline of the device.
The embodiment of the application provides a typesetting method of a display panel, wherein the display panel comprises any one of a liquid crystal display panel, an OLED display panel, a miniLED display panel, a MicroLED display panel, an electrochromic display panel and a PDLC display panel.
The layout method includes the following steps S1) -S4).
S1) obtaining product information of the display panel in the display panel design parameter database, wherein the product information comprises the size of the display panel and the process information of each film layer in the display panel.
In this embodiment, the size of the display panel may be 32 inches, 55 inches, 85 inches, etc., which is not limited herein, and a designer (user) may set the size according to actual needs. Specifically, the display panel size further includes a plurality of design dimensions such as a pixel (pixel) architecture, a data line (data line) width, a Gate line (Gate line) width, capacitance (Cst, Cgs) sizes, a Black Matrix (BM) position and width, a support column (PS) size, an aperture ratio, a transmittance ratio, and the like. The process information includes a serial number, a process site name, and a process time.
When a designer (user) needs to design an array substrate of a display panel, the film layers of the array substrate can be numbered in a display panel design parameter database in advance, a process required by each film layer is obtained, and then the name of each process manufacturing station and the manufacturing time are obtained.
For example, the array substrate includes a flexible substrate, a buffer layer, an active layer, an insulating layer, a gate insulating layer, and a source drain layer, and the layers are numbered 1,2,3. When a designer (user) needs to prepare a gate layer, firstly, design parameters of the gate layer to be prepared are obtained, wherein the design parameters comprise size, thickness, aperture ratio, pattern and used materials; secondly, numbering the gate layer by 3, and finally numbering the process steps required by the gate layer, such as numbering sputtering or evaporation process, mask process and photoetching process by 3.1, 3.2 and 3.3 in sequence, and acquiring the process time of the corresponding process.
S2) determining the mask plates required by the film layers according to the product information.
In this embodiment, a corresponding mask plate and an exposure device matched with the mask plate are selected according to the property of the film layer, and the mask plate and the exposure device are in one-to-one correspondence. The film is generally classified as metal or nonmetal. If the property of the film layer to be prepared is a metal film layer, the types of the exposure device and the mask plate to be selected are Nikon, Canon and the like. If the attribute of the film layer required to be prepared is a non-metal film layer, the types of the exposure device and the mask plate which are selected are HHT, NSK and the like.
S3), typesetting the mask plates, and setting at least one mask plate position according to the process information of each film layer, wherein each mask plate is used for at least one film layer process.
In this embodiment, according to the design parameters of the film layer that needs to be prepared currently, a mask plate that matches with the current film layer is called, where the mask plate includes a model, a size, and a mask pattern that correspond to the film layer.
S4), designing an optimized typesetting scheme, and typesetting at least one display panel on one manufacturing board; the optimized typesetting scheme comprises the position of each display panel, and in the process of each film layer, the manufacturing plate can be moved to a mask plate for the process, so that the position of a display panel to be patterned is arranged opposite to the mask plate.
The step of setting the optimized composition scheme includes the following steps S41) -S45).
S41) presetting a distance value between two adjacent display panels.
S42) formulating a typesetting scheme according to the position of the film forming effective area of the manufacturing board, the size of the display panel and the spacing value.
S43) calculating the area ratio of all display panels on the same production board to the production board.
S44) judging whether the area ratio is less than 0.8, if so, returning to the step of presetting the distance value between two adjacent display panels, and if not, executing the next step.
S45) outputting the current layout scheme as the optimized layout scheme.
In this embodiment, a designer (user) presets a distance value between two adjacent display panels and a distance value between the display panel and the edge of the manufacturing board in the system according to the limiting conditions such as the mask position, the position of the film forming effective area, the exposure and development position, and the cutting position of each film layer. And acquiring a distance value between two adjacent display panels or acquiring a distance value between the display panel closest to the edge of the production plate and the edge of the production plate according to the typesetting mode of the display panels on the production plate. In the typesetting process of the display panel, the optical system and the imaging rule (such as the relation of rotation, mirror image and the like) of the adopted mask plate of each film layer need to be met, so that the film forming effectiveness of each film layer of the display panel is ensured.
In this embodiment, the mask position refers to a placement position of the mask plate on the manufacturing plate. The placing position needs to meet the design rule of the opening area and the shielding area of the mask plate; and the mask plate is in the film forming rule of the manufacturing plate, such as the alignment mode of the mask plate and the manufacturing plate.
The position of the film forming effective area refers to an effective area for preparing a plurality of display panels on one manufacturing plate, each display panel meets the design rule of the distance between the display area and the edge of the manufacturing plate, and each display panel can be formed in the designated area of the manufacturing plate.
The exposure and development position refers to a region where a film layer pattern is formed on each film layer in each display panel on the manufacturing plate according to the pattern of the mask plate.
The routing arrangement position refers to the situation that on one manufacturing board, the routing of two adjacent display panels are not affected mutually, and the design rule of High Vertical Alignment (HVA) routing is met.
The cutting position refers to an area where a distance between adjacent display panels is located. After a plurality of display panels are prepared on a manufacturing board, the positions of cutting lines need to be judged at first, and then adjacent display panels are cut, so that all the display panels on the manufacturing board are divided into a plurality of independent display panels.
As shown in fig. 1, fig. 1 is a schematic structural diagram of an exposure apparatus provided in an embodiment of the present application.
In the step S42), a typesetting scheme is formulated according to the position of the effective film forming area of the manufacturing plate, the size of the display panel and the distance value, specifically, in an exposure device 100, the mask plate 10 required by each film layer and the manufacturing plate 20 are sequentially aligned, wherein the exposure device 100 comprises a mask plate base 1 for placing the mask plate 10 and a manufacturing plate base 2 for placing the manufacturing plate 20, the manufacturing plate 20 is provided with a first alignment mark group, the mask plate base 2 is provided with a second alignment mark group, and the exposure device 100 further comprises a first objective lens group and a second objective lens group; the first objective lens group is used for capturing the first alignment mark group, and the second objective lens group is used for capturing the second alignment mark group.
The first objective lens group includes two objective lenses 31a and 31b symmetrical about the central axis of the production plate 20, wherein the objective lens 31a is used for capturing the first alignment mark 101a, and the objective lens 31b is used for capturing the first alignment mark 101 b.
The second objective group comprises two objective lenses 41a and 41b which are symmetrical about the central axis of the mask plate 10, wherein the objective lens 41a is used for capturing the second alignment mark 102a, and the objective lens 41b is used for capturing the second alignment mark 102 b.
The objective lenses 31a and 31b included in the first objective lens group and the objective lenses 41a and 41b included in the second objective lens group are perpendicular to the plane where the mask plate base station 1 is located, so that the alignment mark can be more accurately detected, and the accuracy and precision of alignment can be improved.
The exposure apparatus further includes an adjusting system (not shown) for adjusting the objective lenses 31a and 31b included in the first objective lens group and the objective lenses 41a and 41b included in the second objective lens group to move in-plane or vertical directions, so that the objective lenses can be accurately aligned with the alignment marks.
It should be noted that the first objective lens group actually captures a projection of the first alignment mark group provided on the fabrication board 20 through an optical path (not shown), and the position information of the first alignment mark group is finally obtained by calculating the projection. Of course, it will be understood by those skilled in the art that the first objective lens group can analyze the position information of the substrate through the captured first alignment mark group.
The exposure apparatus further includes a monitoring device 30, configured to align the first alignment mark group captured by the first objective lens group and the second alignment mark group captured by the second objective lens group, determine an alignment condition between the manufacturing plate and the mask plate, and determine a positional relationship between the manufacturing plate and the mask plate.
The alignment condition formed by the first alignment mark set and the second alignment mark set is further explained.
As shown in fig. 2, fig. 2 is a schematic diagram of an alignment pattern formed by a first alignment mark set and a second alignment mark set of an exposure apparatus according to an embodiment of the present disclosure.
Taking the alignment of the first alignment marks 101a, 101b and the second alignment marks 102a, 102b as an example, the first alignment marks 101a, 101b include two horizontal bar patterns and two vertical bar patterns, and the second alignment marks 102a, 102b include one horizontal bar pattern and one vertical bar pattern. For the alignment patterns formed by the first alignment marks 101a, 101b and the second alignment marks 102a, 102b, when one vertical bar pattern included in the second alignment marks 102a, 102b is located between two vertical bar patterns included in the first alignment marks 101a, 101b, and one horizontal bar pattern included in the second alignment marks 102a, 102b is located between two horizontal bar patterns included in the first alignment marks 101a, 101b, that is, when the alignment pattern shown in fig. 4 is formed, it is described that the first alignment marks 101a, 101b and the second alignment marks 102a, 102b are aligned accurately. When the alignment patterns formed by the first alignment marks 101a and 101b and the second alignment marks 102a and 102b are patterns with other shapes, it is described that the alignment of the first alignment marks 101a and 101b and the second alignment marks 102a and 102b is not accurate, and a designer (user) can adjust the alignment according to the position of the mask, which is not described herein again.
In this embodiment, according to the above method, a designer (user) can automatically select horizontal exposure or vertical exposure in a display panel design parameter database by automatically selecting a mask plate and an exposure device corresponding to each film layer and satisfying the design rule of each film layer, and draw the pattern of each film layer through the mask plate and the exposure device, so that each film layer can be effectively formed on the fabrication plate.
In a display panel design parameter database, simulating each film layer to sequentially form a film on the same manufacturing board, determining the film forming rule of each film layer on the manufacturing board, and obtaining the design drawing of the display panel on the manufacturing board. The film forming rule comprises the models of the mask plate and the exposure device adopted by each film layer, and the sizes, the alignment marks and the like of the mask plate base station and the manufacturing plate base station are obtained.
In this embodiment, the following conditions need to be satisfied in the process of forming each film layer on the production board:
1. and determining the placement position of the mask plate according to the exposure and development positions of the film layers, and ensuring that the film layers fall into the film forming effective area of the manufacturing plate. In general, in order to ensure that each film layer can be formed efficiently on the production board, a designer (user) generally defines a distance between the display panel near the outermost edge of the production board and the edge of the production board as a boundary region, which is generally 18 to 22 mm. Wherein the position within the boundary region is a film formation effective region of the production plate. Therefore, in the preparation process, each film layer falls into the position of the film forming effective area of the manufacturing board, and the design rules of film layer patterns and routing (such as HVA routing) are met. Briefly, the mask plate can intelligent typesetting in the film forming effective area of preparation board to satisfy the rationality of walking the line, ensure promptly the preparation board with the accuracy of counterpoint of mask plate can not lead to display panel's the phenomenon of walking the line and appearing interfering.
2. The design rule that each film layer is repeatedly exposed and developed on the same manufacturing plate respectively means how to ensure that each film layer is effectively formed on the manufacturing plate (namely, the design rule of the mask plate and the exposure device is met), and meanwhile, the narrow-frame design of the finished display panel is ensured, and the display panel has a good display effect.
3. And in the process of exposure and development of each film layer on the same manufacturing plate, the design rule of the stroke range of the mask plate is ensured, and the stroke range of the mask plate is the range that each film layer corresponds to the mask plate, such as the movable and walkable ranges. Of course, the display panel further comprises a plurality of mask plates arranged in order to reduce the preparation time of the display panel.
4. When the display panels are typeset on the same manufacturing board, the cutting rules of the manufacturing board need to be met by each display panel so as to ensure the yield of the display panels. The cutting rule may include a two-division type, a three-division type, a pure-cutting type, etc., where the cutting manner indicates that when the display panels are arranged on the same fabrication board, the distances between two adjacent display panels are different, and similarly, the distances between the mask positions, the exposure and development positions, etc. of the film layers are also different.
5. After the typesetting is finished, the utilization rate of the manufacturing board is automatically calculated, namely the area ratio of all the display panels on the same manufacturing board to the manufacturing board is calculated. And when the area ratio is greater than or equal to 0.8, outputting the current typesetting scheme as an optimized typesetting scheme. The optimized typesetting scheme output comprises the arrangement mode of the display panels on the same manufacturing plate, the distance between two adjacent display panels, a mask plate adopted by each film layer, an exposure device, parameters and patterns of each film layer and the like. It should be noted that the arrangement of the display panels on the same manufacturing board may be matrix arrangement or irregular arrangement, as long as the optimal utilization rate of the manufacturing board can be obtained.
The embodiment provides a typesetting method for a display panel, according to design requirements, in a display panel design parameter database, quickly realizing typesetting of a mask plate and typesetting design of the display panel on the same manufacturing plate, meeting various design rules, automatically drawing a design drawing of the display panel on the manufacturing plate, reducing the dependency on the design experience of designers, avoiding manually calculating design parameters by the designers, shortening the design time of the display panel, shortening the evaluation time, quickly outputting the display panel design meeting the requirements, and ensuring the optimal utilization rate of the manufacturing plate, improving the research and development efficiency, and saving manpower resources and cost.
As shown in fig. 3, fig. 3 is a schematic structural diagram of a typesetting system of a display panel provided in the embodiment of the present application.
The embodiment of the present application further provides an electronic device, preferably a computer, in which application software, that is, a typesetting system 500 of a display panel, is installed, and the electronic device includes a plurality of software execution modules, including a product information obtaining module 501, a mask determining module 502, a mask typesetting module 503, and a typesetting optimizing module 504. The product information obtaining module 501 is configured to obtain product information of a display panel, where the product information includes a size of the display panel and process information of each film layer in the display panel.
The mask determining module 502 is configured to determine a mask required by each film layer according to the product information.
The mask layout module 503 is configured to layout the masks, and set a position of at least one mask according to the process information of each film, where each mask is used for at least one film process.
The layout optimization module 504 is configured to design an optimized layout scheme, and layout at least one display panel on one manufacturing board; the optimized typesetting scheme comprises the position of each display panel, and in the process of each film layer, the manufacturing plate can be moved to a mask plate for the process, so that the position of a display panel to be patterned is arranged opposite to the mask plate.
The display panel composition module 504 is configured to: presetting a distance value between two adjacent display panels; formulating a typesetting scheme according to the position of the film forming effective area of the manufacturing plate, the size of the display panel and the spacing value; calculating the area ratio of all display panels positioned on the same manufacturing plate to the manufacturing plate; judging whether the area ratio is smaller than 0.8, if so, returning to the step of presetting the distance value between two adjacent display panels, and if not, executing the next step; and outputting the current typesetting scheme as an optimized typesetting scheme.
Can be based on user's demand's display panel in this embodiment, according to the design needs, in display panel design parameter database, confirm the process information of required display panel size and each rete in the display panel, realize mask plate typesetting and display panel typesetting design on same preparation board fast, accord with multiple design rule, draw the design drawing of display panel on the preparation board automatically, reduce the design experience dependency to the designer, need not the manual calculation design parameter of designer, shorten the display panel design time length and evaluation time, the display panel design that the demand was accorded with is produced fast, and guarantee the utilization ratio of preparation board is optimum, promote research and development efficiency, save manpower resources and cost.
As shown in fig. 4, fig. 4 is a schematic structural diagram of the electronic device according to the embodiment.
Specifically, the method comprises the following steps: the electronic device may include at least one processor 601, at least one memory 602 having a computer-readable storage medium disposed therein, a power supply 603, and an input unit 604. The processor 601 executes the executable program corresponding to the executable program code by reading the executable program code, so as to execute at least one step of the composition method of the display panel. Those skilled in the art will appreciate that the electronic device configuration shown in fig. 4 does not constitute a limitation of the electronic device and may include more or fewer components than those shown, or some components may be combined, or a different arrangement of components. Wherein:
the processor 601 is a control center of the electronic device, connects various parts of the entire electronic device using various interfaces and lines, and performs various functions of the electronic device and processes data by operating or executing software programs and/or modules stored in the memory 602 and calling data stored in the memory 602. Optionally, processor 601 may include one or more processing cores; preferably, the processor 601 may integrate an application processor and a modem processor, wherein the application processor is mainly used for processing an operating system, a user interface, an application program and the like, and the modem processor is mainly used for realizing wireless communication. Alternatively, the modem processor may not be integrated into the processor 601.
The memory 602 may be used to store software programs and modules, and the processor 601 executes various functional applications and data processing by operating the software programs and modules stored in the memory 602. The memory 602 may mainly include a program storage area and a data storage area, wherein the program storage area may store an operating system, an application program required by at least one function (such as a sound playing function, an image playing function, etc.), and the like; the storage data area may store data created according to use of the electronic device, and the like. Further, the memory 602 may include high speed random access memory, and may also include non-volatile memory, such as at least one magnetic disk storage device, flash memory device, or other volatile solid state storage device. Accordingly, the memory 602 may also include a memory controller to provide the processor 601 with access to the memory 602.
The electronic device further comprises a power supply 603 for supplying power to the various components, and preferably, the power supply 603 is logically connected to the processor 601 through a power management system, so that functions of managing charging, discharging, power consumption, and the like are realized through the power management system. The power supply 603 may also include any component of one or more dc or ac power sources, recharging systems, power failure detection circuitry, power converters or inverters, power status indicators, and the like.
The electronic device may further include an input unit 604, and the input unit 604 may be used to receive input numeric or character information and generate keyboard, mouse, joystick, optical or trackball signal inputs related to user settings and function control.
Although not shown, the electronic device may further include a display unit and the like, which are not described in detail herein. Specifically, in this embodiment, the processor 601 in the electronic device loads the executable file corresponding to the process of at least one application program into the memory 602 according to the following instructions, and the processor 601 runs the application program stored in the memory 602, thereby implementing various functions as follows: acquiring product information of a display panel, wherein the product information comprises the size of the display panel and process information of each film layer in the display panel; determining a mask plate required by each film layer according to the product information; typesetting the mask plates, setting at least one mask plate position according to the process information of each film layer, wherein each mask plate is used for at least one film layer process; designing an optimized typesetting scheme, and typesetting at least one display panel on one manufacturing board; the optimized typesetting scheme comprises the position of each display panel, and in the process of each film layer, the manufacturing plate can be moved to a mask plate for the process, so that the position of a display panel to be patterned is arranged opposite to the mask plate.
It will be understood by those skilled in the art that all or part of the steps of the methods of the above embodiments may be performed by instructions or by associated hardware controlled by the instructions, which may be stored in a computer readable storage medium and loaded and executed by a processor.
To this end, an embodiment of the present application provides a computer-readable storage medium, which may include: read Only Memory (ROM), Random Access Memory (RAM), magnetic or optical disks, and the like. The computer program is loaded by the processor to execute at least one step of the typesetting method for the display panel described in the foregoing embodiments of the present application.
The above detailed description is given to a method, an apparatus, and an electronic device for typesetting a display panel provided in an embodiment of the present application, and a specific example is applied in the description to explain the principle and the implementation of the present application, and the description of the above embodiment is only used to help understanding the method and the core idea of the present application; meanwhile, for those skilled in the art, according to the idea of the present application, there may be variations in the specific embodiments and the application scope, and in summary, the content of the present specification should not be construed as a limitation to the present application.
Claims (10)
1. A typesetting method of a display panel is characterized by comprising the following steps:
acquiring product information of a display panel, wherein the product information comprises the size of the display panel and process information of each film layer in the display panel;
determining a mask plate required by each film layer according to the product information; typesetting the mask plates, setting at least one mask plate position according to the process information of each film layer, wherein each mask plate is used for at least one film layer process; and
designing an optimized typesetting scheme, and typesetting at least one display panel on one manufacturing board; the optimized typesetting scheme comprises the position of each display panel, and in the process of each film layer, the manufacturing plate can be moved to a mask plate for the process, so that the position of a display panel to be patterned is arranged opposite to the mask plate.
2. The layout method of display panels according to claim 1,
the step of setting the optimized typesetting scheme comprises the following steps:
presetting a distance value between two adjacent display panels;
formulating a typesetting scheme according to the position of the film forming effective area of the manufacturing plate, the size of the display panel and the spacing value;
calculating the area ratio of all display panels positioned on the same manufacturing plate to the manufacturing plate;
judging whether the area ratio is smaller than 0.8, if so, returning to the step of presetting the distance value between two adjacent display panels, and if not, executing the next step; and
and outputting the current typesetting scheme as an optimized typesetting scheme.
3. The layout method of display panels according to claim 2,
and presetting the distance value of two adjacent display panels according to the limiting conditions such as the mask position, the position of the film forming effective area, the exposure and development position, the wiring arrangement position, the cutting position and the like.
4. The layout method of display panels according to claim 1,
the step of determining the mask plate required by each film layer according to the product information further comprises the following steps:
and acquiring an exposure device matched with the mask plate, wherein the mask plate comprises models, sizes and mask patterns corresponding to all the film layers.
5. The layout method of display panels according to claim 1,
the process information includes a serial number, a process site name, and a process time.
6. The layout method of display panels according to claim 2,
the formulating of the typesetting scheme comprises the following steps:
sequentially carrying out alignment treatment on a mask plate required by each film layer and the manufacturing plate in an exposure device, wherein the exposure device comprises a manufacturing plate base station for placing the manufacturing plate and a mask plate base station for placing the mask plate, a first alignment mark group is arranged on the manufacturing plate, a second alignment mark group is arranged on the mask plate base station, and the exposure device further comprises a first objective lens group and a second objective lens group; the first objective lens group is used for capturing the first alignment mark group, and the second objective lens group is used for capturing the second alignment mark group.
7. The layout method of display panels according to claim 6,
the exposure apparatus further includes:
and the monitoring device is used for aligning the first alignment mark group captured by the first objective lens group and the second alignment mark group captured by the second objective lens group, judging the alignment condition of the manufacturing plate and the mask plate and determining the position relation of the manufacturing plate and the mask plate.
8. The layout method of display panels according to claim 6,
the first objective lens group comprises two objective lenses which are symmetrical about the central axis of the manufacturing plate;
the second objective lens group comprises two objective lenses which are symmetrical about the central axis of the mask plate;
the objective lens included in the first objective lens group and the objective lens included in the second objective lens group are both perpendicular to the plane where the mask plate base station is located.
9. A composition system for a display panel, comprising:
the product information acquisition module is used for acquiring product information of the display panel, wherein the product information comprises the size of the display panel and the process information of each film layer in the display panel;
the mask plate determining module is used for determining mask plates required by all film layers according to the product information;
the mask typesetting module is used for typesetting the masks, setting at least one mask position according to the process information of each film layer, and using each mask for at least one film layer process; and
the layout optimization module is used for designing an optimized layout scheme and performing layout on at least one display panel on one manufacturing board; the optimized typesetting scheme comprises the position of each display panel, and in the process of each film layer, the manufacturing plate can be moved to a mask plate for the process, so that the position of a display panel to be patterned is arranged opposite to the mask plate.
10. An electronic device, comprising:
a memory for storing executable program code; and
a processor for executing an executable program corresponding to the executable program code by reading the executable program code to perform the steps in the composition method of the display panel according to any one of claims 1 to 8.
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