CN113069931A - Novel reverse osmosis membrane cleaning process - Google Patents
Novel reverse osmosis membrane cleaning process Download PDFInfo
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- CN113069931A CN113069931A CN202110490054.0A CN202110490054A CN113069931A CN 113069931 A CN113069931 A CN 113069931A CN 202110490054 A CN202110490054 A CN 202110490054A CN 113069931 A CN113069931 A CN 113069931A
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- cleaning
- reverse osmosis
- osmosis membrane
- cleaning solution
- water
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D65/00—Accessories or auxiliary operations, in general, for separation processes or apparatus using semi-permeable membranes
- B01D65/02—Membrane cleaning or sterilisation ; Membrane regeneration
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- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/44—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis
- C02F1/441—Treatment of water, waste water, or sewage by dialysis, osmosis or reverse osmosis by reverse osmosis
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
- B01D2321/12—Use of permeate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
- B01D2321/16—Use of chemical agents
- B01D2321/162—Use of acids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
- B01D2321/16—Use of chemical agents
- B01D2321/164—Use of bases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2321/00—Details relating to membrane cleaning, regeneration, sterilization or to the prevention of fouling
- B01D2321/20—By influencing the flow
- B01D2321/2066—Pulsated flow
- B01D2321/2075—Ultrasonic treatment
Abstract
The invention relates to a cleaning process of a novel reverse osmosis membrane, which comprises the following steps: s1, preparing a cleaning solution; s2, cleaning, S21, security filter inspection; s22, placing the reverse osmosis membrane device to be cleaned in a first section ultrasonic device cleaning tank or a second section ultrasonic device cleaning tank, and opening the ultrasonic device cleaning tank; s23, washing before cleaning; washing the reverse osmosis system with reverse osmosis product water, opening the valve, and allowing the flow rate not to exceed 100m3The conduction of a concentrated water discharge port is lower than 2 times of the water inlet conduction value; s24, confirming the state of the valve; s25, injecting a cleaning solution into the system; s26, repeatedly and circularly cleaning, and S27 soaking; and S28, flushing. The invention has obvious cleaning effect and can shorten the cleaning time.
Description
Technical Field
The invention relates to the technical field of water treatment by a reverse osmosis membrane method, in particular to a novel cleaning process of a reverse osmosis membrane.
Background
At present, a reverse osmosis membrane water treatment process is recognized as one of the most effective desalination technologies. The reverse osmosis device is widely applied to the water purification and desalination of raw water in the water treatment of a thermal power plant due to the characteristics of simple equipment operation, strong reliability, no secondary pollution and the like. In operation, however, reverse osmosis membranes are inevitably contaminated or clogged with some minor amounts of inorganic fouling, colloids, microorganisms, metal oxides, and the like. These substances are deposited on the membrane surface and will accumulate more and more, thereby causing the reverse osmosis membrane to decrease in permeability and decrease in salt rejection. The reverse osmosis membrane is chemically cleaned in time, so that the performance of the membrane can be effectively recovered, and the service life of the reverse osmosis membrane is prolonged. The reverse osmosis system is decreased in desalination rate, decreased in water production flux, increased in system pressure difference and increased in energy consumption due to dirt blockage, and if the reverse osmosis system is not cleaned in time, the membrane is irrecoverable and damaged, the service life of the membrane is shortened, and the operation cost of the system is increased. The cleaning method adopted at present is generally to disassemble a device provided with reverse osmosis, and needs to be soaked for 12-24 hours, then acid cleaned for 1-3 hours, then alkali cleaned for 1-3 hours, and also needs to try to adjust the pH value by using acid and alkali to stabilize the pH value to 7. Because the customer groups are basically large-scale equipment such as a generating set of a thermal power plant, a pure water system of a pharmaceutical factory and the like, the cleaning mode is time-consuming, causes huge economic loss and is labor-consuming.
Disclosure of Invention
The invention aims to provide a novel reverse osmosis membrane cleaning process.
The invention realizes the purpose through the following technical scheme: a novel reverse osmosis membrane cleaning process, S1, preparing a cleaning solution;
the acid cleaning solution is 2-10% hydrochloric acid, 1-5% nitric acid or 5-15% acetic acid, or the concentration of the mixed solution of two or three of hydrochloric acid, nitric acid and acetic acid is not more than 15%;
the alkali cleaning solution is 20-30% sodium hydroxide, 20-30% potassium hydroxide or 1-5% sodium bisulfite, or the mixed solution of two or three of sodium hydroxide, potassium hydroxide and sodium bisulfite, with concentration not more than 30%;
s2, a cleaning step, which specifically comprises the following steps:
s21, checking a security filter;
s22, placing the reverse osmosis membrane device to be cleaned in a first section ultrasonic device cleaning tank or a second section ultrasonic device cleaning tank, and opening the ultrasonic device cleaning tank;
s23, washing before cleaning; flushing with reverse osmosis product waterWashing reverse osmosis system, opening valve, and controlling flow rate not more than 100m3The conduction of a concentrated water discharge port is lower than 2 times of the water inlet conduction value;
s24, confirming the state of the valve;
s25, injecting a cleaning solution into the system;
s26, repeatedly and circularly cleaning; controlling pH to be 2-3 by acid washing, and controlling pH to be 11-12 by alkali washing;
s27, soaking;
and S28, flushing.
Further, the vibration frequency was set at 100-.
Further, S25 shows opening the front and rear manual gates of the cleaning cartridge filter slowly to inject the cleaning solution into the reverse osmosis, controlling the pressure of the incoming cleaning solution to be less than 0.25MPa, and closing the gate to return the cleaning solution to the cleaning tank after the discharge gate of the produced water of the failed reverse osmosis discharges the cleaning solution.
Further, the cycle cleaning was continued after 1 hour of soaking as shown in S27.
Further, in S28, when the pH of the cleaning solution is not changed or the variation amount is small, the cleaning solution is discharged, the system is flushed with demineralized water until the pH of the drain water is recovered to neutral, and then the system is flushed with reverse osmosis produced water about 3 times to discharge the residue on the water inlet side.
Compared with the prior art, the novel reverse osmosis membrane cleaning process has the beneficial effects that: the cleaning effect is obvious, and the cleaning time can be shortened.
Drawings
Fig. 1 is a schematic view of a cleaning system.
Fig. 2 is a schematic illustration of the cleaning effect.
Detailed Description
The cleaning system comprises a cleaning water tank, a cleaning water pump 10, a protective filter 11, an acid cartridge filter 3, an alkali cartridge filter 4, a first section ultrasonic device cleaning tank 1, a second section ultrasonic device cleaning tank 2, a pipeline system, a valve, a waste liquid confluence tank 5, an acid cleaning liquid flowmeter 6, an alkali cleaning liquid flowmeter 7, an acid cleaning liquid 8 and an alkali cleaning liquid 9.
A novel reverse osmosis membrane cleaning process comprises the following steps:
s1, preparing a cleaning solution;
the acid cleaning solution is 2-10% hydrochloric acid, 1-5% nitric acid or 5-15% acetic acid, or the concentration of the mixture of two or three of hydrochloric acid, nitric acid and acetic acid is not more than 15%.
The alkali cleaning solution is 20-30% sodium hydroxide, 20-30% potassium hydroxide or 1-5% sodium bisulfite, or the mixed solution of two or three of sodium hydroxide, potassium hydroxide and sodium bisulfite, with concentration not more than 30%.
High cleaning temperatures can improve cleaning performance but cannot exceed 40 ℃, which can accelerate film damage.
S2, cleaning:
firstly carrying out acid cleaning or firstly carrying out alkali cleaning, and according to the actual situation, firstly carrying out alkali cleaning if the reverse osmosis membrane device has more organic matters, and firstly carrying out acid cleaning if the reverse osmosis membrane device has more inorganic salts and calcium blocks. The method specifically comprises the following steps:
s21, checking a security filter;
the cartridge filter can prevent the membrane cylinder from being blocked or damaged due to impure cleaning medicament or large-particle solid impurities in the dispensing process. The reverse osmosis cleaning cycle is typically long and the condition of the cartridge filter in the cleaning system is easily overlooked. However, the filter element is fiber-wound, the molecular structure of the filter element is damaged by acidic, alkaline and oxidative reagents in the cleaning process, a large amount of dirt cleaned off is deposited on the filter element, and the filter element becomes moldy due to moisture during the period of non-use of the security filter. All of the above causes the filter element to fail, and the filter element cannot perform the filtering and dirt-blocking function, so that it is necessary to open the security filter before cleaning to check the filter element.
S22, placing the reverse osmosis membrane device to be cleaned in the first section ultrasonic device cleaning tank 1 or the second section ultrasonic device cleaning tank 2, opening the ultrasonic device cleaning tank, setting the vibration frequency at 100 and 200 ten thousand times/S, and lasting for 30 minutes.
S23, before cleaningAnd (4) flushing. Flushing the reverse osmosis system with reverse osmosis product water, opening the flush inlet valve, discharge valve and product water discharge valve, the flow rate being dependent on the cleaning pump, but not exceeding 100m3And h, until the conductance of a concentrated water discharge port is lower than 2 times of the conductance value of the water inlet.
And S24, confirming the valve state. And (4) correctly opening and closing related valves of the cleaning system according to the operating instructions.
And S25, injecting a cleaning solution into the system. And slowly opening front and rear manual doors of the cleaning cartridge filter to inject the cleaning solution into reverse osmosis, controlling the pressure of the cleaning solution to be less than 0.25MPa, and closing the doors to return the cleaning solution to the cleaning tank after the cleaning solution is discharged from the discharge door of the unqualified reverse osmosis water production.
And S26, repeatedly and circularly cleaning. The pH value of the cleaning solution must be maintained in the whole process of circular cleaning, when the pH value is increased or decreased (the change is more than 0.3-0.5), a proper amount of hydrochloric acid or sodium hydroxide must be supplemented into the cleaning solution, the pH value is controlled to be 2-3 by acid cleaning, and the pH value is controlled to be 11-12 by alkali cleaning.
And S27, soaking. Stopping the pump, closing the water inlet valve and the water outlet valve, soaking for 1 hour, and then continuously and circularly cleaning.
And S28, flushing. And when the pH value of the cleaning solution is not changed or the change amount is small, discharging the cleaning solution, and flushing the system by using desalted water until the pH value of the drained water is recovered to be neutral. The system was then flushed 3 times or so with reverse osmosis product water to remove the residue on the inlet side.
The cleaning effect of the invention is shown in fig. 2, and under the condition of almost the same cleaning effect, the cleaning time is obviously shortened by 70 percent after the ultrasonic device is opened.
The invention can see that the pressure difference of the first stage and the second stage, the pressure difference between the second stage and the concentrated water are obviously reduced, and the inlet flow and the water production flow are obviously improved by comparing the operation data of the reverse osmosis device before and after cleaning. The cleaning effect is obvious. The novel reverse osmosis membrane cleaning process can complete the whole cleaning process within 3-6 hours.
While there have been shown and described what are at present considered the fundamental principles and essential features of the invention and its advantages, it will be apparent to those skilled in the art that the invention is not limited to the details of the foregoing exemplary embodiments, but is capable of other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (5)
1. A novel reverse osmosis membrane cleaning process is characterized by comprising the following steps:
s1, preparing a cleaning solution;
the acid cleaning solution is 2-10% hydrochloric acid, 1-5% nitric acid or 5-15% acetic acid, or the concentration of the mixed solution of two or three of hydrochloric acid, nitric acid and acetic acid is not more than 15%;
the alkali cleaning solution is 20-30% sodium hydroxide, 20-30% potassium hydroxide or 1-5% sodium bisulfite, or the mixed solution of two or three of sodium hydroxide, potassium hydroxide and sodium bisulfite, with concentration not more than 30%;
s2, a cleaning step, which specifically comprises the following steps:
s21, checking a security filter;
s22, placing the reverse osmosis membrane device to be cleaned in a first section ultrasonic device cleaning tank or a second section ultrasonic device cleaning tank, and opening the ultrasonic device cleaning tank;
s23, washing before cleaning; washing the reverse osmosis system with reverse osmosis product water, opening the valve, and allowing the flow rate not to exceed 100m3H, up toThe conductance of the concentrated water discharge port is lower than 2 times of the water inlet conductance value;
s24, confirming the state of the valve;
s25, injecting a cleaning solution into the system;
s26, repeatedly and circularly cleaning; controlling pH to be 2-3 by acid washing, and controlling pH to be 11-12 by alkali washing;
s27, soaking;
and S28, flushing.
2. The cleaning process of a novel reverse osmosis membrane according to claim 1, characterized in that: the vibration frequency was set at 100-200 ten thousand times/S for 30 minutes in S22 as shown.
3. The cleaning process of a novel reverse osmosis membrane according to claim 1, characterized in that: s25, the front and rear manual doors of the cleaning cartridge filter are opened slowly to inject the cleaning solution into the reverse osmosis, the pressure of the cleaning solution is controlled to be less than 0.25MPa, and when the cleaning solution is discharged from the discharge door of the unqualified reverse osmosis water production, the door is closed to return the cleaning solution to the cleaning tank.
4. The cleaning process of a novel reverse osmosis membrane according to claim 1, characterized in that: the cycle cleaning was continued after 1 hour of soaking as shown in S27.
5. The cleaning process of a novel reverse osmosis membrane according to claim 1, characterized in that: and S28, when the pH value of the cleaning solution is not changed or the variation amount is small, discharging the cleaning solution, flushing the system by using desalted water until the pH value of the discharged water is recovered to be neutral, and then flushing the system by using reverse osmosis produced water for about 3 times to discharge residues on the water inlet side.
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| CN202110490054.0A CN113069931A (en) | 2021-05-06 | 2021-05-06 | Novel reverse osmosis membrane cleaning process |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114307399A (en) * | 2021-12-31 | 2022-04-12 | 福建泉州闽光钢铁有限责任公司 | Method for cleaning filter element |
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| CN114307399A (en) * | 2021-12-31 | 2022-04-12 | 福建泉州闽光钢铁有限责任公司 | Method for cleaning filter element |
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