CN113059290A - Method for processing mask plate through displacement control - Google Patents
Method for processing mask plate through displacement control Download PDFInfo
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- CN113059290A CN113059290A CN202110195099.5A CN202110195099A CN113059290A CN 113059290 A CN113059290 A CN 113059290A CN 202110195099 A CN202110195099 A CN 202110195099A CN 113059290 A CN113059290 A CN 113059290A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K31/00—Processes relevant to this subclass, specially adapted for particular articles or purposes, but not covered by only one of the preceding main groups
- B23K31/02—Processes relevant to this subclass, specially adapted for particular articles or purposes, but not covered by only one of the preceding main groups relating to soldering or welding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K37/00—Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
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Abstract
The invention relates to the technical field of mask plate processing, in particular to a method for processing a mask plate through displacement control, which comprises the following steps of; respectively stretching each mask sheet, and respectively abutting displacement force application mechanisms positioned at two sides of the mask frame against the mask frame and then moving the mask frame for a preset distance along a direction opposite to the stretching direction of the mask sheet; and welding each mask sheet and the mask frame in sequence, and removing all the displacement force application mechanisms after all the mask sheets are welded on the mask frame, so that the mask plate is processed. The invention has the beneficial effects that: the deformation amount of the mask frame is controlled through the displacement amount of the displacement force application mechanism, each displacement force application mechanism only needs to move the corresponding displacement amount, after the mask sheet is welded, the deformation stress of the mask frame can be balanced with the contraction force of the mask sheet, the displacement force application mechanism only moves to the corresponding position and does not continuously apply force, and therefore the corresponding displacement force application mechanism can keep the original state and does not need to move.
Description
Technical Field
The invention relates to the technical field of mask plate processing, in particular to a method for processing a mask plate through displacement control.
Background
The OLED display panel has advantages of thin thickness, low power consumption, flexibility, flexible display, etc., and has become a development trend of the next-generation panel display in recent years.
In the existing OLED panel, an evaporation source is used for heating and evaporating an organic material in a vacuum environment, the organic material penetrates through an opening position on a Mask plate (Mask) to define a position where a thin film is formed on glass, the film forming position needs to be a specified light emitting position on a substrate, and current of the substrate can be effectively transmitted to an OLED device to emit light, so that the accuracy of the opening position of the metal Mask plate is very important. The accuracy of the position of the opening on the metal mask (the position accuracy of a common mobile phone screen is +/-3 microns) mainly depends on the assembly accuracy of the mask and the opening accuracy of the mask (one mask is composed of 6-8 mask plates). When the mask plate is assembled, repeated actions of 'upper mask plate frame/upper mask sheet/stretching diaphragm/alignment/welding mask sheet on the mask plate frame' are needed, and the mask sheets (tack) are stretched and assembled one by using a clamping arm of a net stretching device; however, when the stretched mask sheet is welded to the mask Frame, a situation that the tensile force is transferred to the mask Frame (as shown in fig. 1) may occur, and the mask Frame (Frame) may be deformed due to the stress, so that the position of the opening hole in the metal mask sheet may be shifted to the center of the mask Frame. Therefore, the mesh tensioning device for assembling the mask plate with high position precision requirement needs to have a group of mechanisms to apply force on the metal mask plate frame in advance, and the force originally pre-applied on the mask frame is withdrawn after the mask sheet to be welded on the mask frame, so that the deviation of the position of the opening on the mask plate to the center position of the mask frame can be avoided. However, the mask plate is assembled by a plurality of mask plates, and the precise amount of force pre-applied to the mask frame when each mask plate is welded is difficult to control.
At present, the mainstream net-opening process generally presets a numerical value of a force application mechanism for applying force to a mask frame in advance, then a first mask sheet is welded, after the first mask sheet is welded, the force application mechanism is controlled to reduce partial force application, the method is analogized by respectively welding each mask sheet and calculating and reducing the force application of the force application mechanism at the same time until the last mask sheet is welded, and net-opening is finished when all the force application mechanisms are loosened. The difficulty of the process lies in that the force application mechanism needs to continuously release part of applied force in the welding process, so that the contraction force of the welded mask sheet is balanced with the stress of the mask frame, and the precise amount of the force pre-applied to the mask frame when each mask sheet is welded is controlled.
Therefore, the existing processing method for simulating the deformation of the mask frame by controlling the force application size of the force application mechanism can cause larger errors of the simulated deformation and the actual deformation of the mask frame, and all force application mechanisms need to be controlled to reduce partial force application and waste time every time when a mask sheet is welded, so that the existing processing efficiency of the mask plate is low.
Disclosure of Invention
The technical problem to be solved by the invention is as follows: how to reduce the error between the simulated deformation and the actual deformation of the mask frame and improve the processing efficiency of the mask plate.
In order to solve the technical problems, the technical scheme of the invention is as follows: a method for processing a mask plate through displacement control is disclosed, wherein the mask plate comprises a mask frame and a plurality of mask sheets;
the method for processing the mask plate through displacement control comprises the following steps;
s1, placing the mask frame on a screen stretching device, and arranging a plurality of mask sheets on the mask frame in sequence;
s2, respectively arranging displacement force application mechanisms on two sides of the mask frame;
s3, stretching the mask sheets respectively, and moving displacement force application mechanisms positioned at two sides of the mask frame in a preset distance along a direction opposite to the stretching direction of the mask sheets after respectively abutting against the mask frame;
and S4, sequentially welding the mask sheets and the mask frame, and removing all the displacement force application mechanisms after all the mask sheets are welded on the mask frame, so that the mask plate is processed.
Specifically, the S2 specifically is: and respectively arranging displacement force application mechanisms with the same number as the mask sheets on two sides of the mask frame, and aligning the positions of the displacement force application mechanisms with the positions of the mask sheets one by one.
Specifically, in S2, at least three displacement force application mechanisms are respectively disposed on two sides of the mask frame, and in S3, the moving distance of the displacement force application mechanisms is sequentially decreased from the displacement force application mechanism located at the center to the displacement force application mechanisms located at two ends.
Specifically, in S4, the order of welding each mask sheet and each mask frame is as follows: starting with the mask sheet located at the center and diffusing sequentially towards both ends.
Specifically, the S1 specifically is: the square mask frame is placed on a screen stretching device, and the plurality of mask sheets are sequentially arranged on the mask frame along the length direction of the mask frame.
Specifically, the S3 specifically is: and stretching each mask sheet along the width direction of the mask frame, and moving displacement force application mechanisms positioned on two sides of the mask frame in a preset distance along a direction opposite to the stretching direction of the mask sheet after respectively abutting against the mask frame.
Specifically, the screen stretching device in S1 includes a device body and a displacement force application mechanism disposed on the device body, where the displacement force application mechanism is located on both sides of the mask frame and moves on the device body along a direction parallel to the mask sheet.
The invention has the beneficial effects that: the deformation amount of the mask frame is controlled through the displacement amount of the displacement force application mechanism, each displacement force application mechanism only needs to move the corresponding displacement amount, after welding of the mask is completed, the deformation stress of the mask frame can be balanced with the contraction force of the mask, the displacement force application mechanism only moves to the corresponding position and does not continuously apply force, so that the corresponding displacement force application mechanism can keep the original state without action, the rest displacement force application mechanisms also keep the original state, and the original point is returned uniformly by the displacement force application mechanisms after welding of all the mask pieces is completed, so that errors between the simulation deformation amount and the actual deformation amount of the mask frame can be reduced, and meanwhile, the machining efficiency of the mask plate can be improved.
Drawings
FIG. 1 is a diagram showing a comparison of deformation conditions of a mask frame after natural welding in the prior art;
FIG. 2 is a schematic diagram of the force application mechanism of a tension-controlled net-stretching device in the prior art illustrating the change of force application before and after welding;
FIG. 3 is a schematic view of the working state of the displacement force application mechanism before and after welding of the mesh stretching device controlled by displacement according to the present invention;
FIG. 4 is a comparison diagram of simulated deformation of a mask frame according to an embodiment of the present invention;
description of reference numerals:
1. a mask frame; 2. a mask sheet; 3. and a displacement force application mechanism.
Detailed Description
In order to explain technical contents, achieved objects, and effects of the present invention in detail, the following description is made with reference to the accompanying drawings in combination with the embodiments.
The invention relates to a method for processing a mask plate through displacement control, wherein the mask plate comprises a mask frame and a plurality of mask sheets;
the method for processing the mask plate through displacement control comprises the following steps;
s1, placing the mask frame on a screen stretching device, and arranging a plurality of mask sheets on the mask frame in sequence;
s2, respectively arranging displacement force application mechanisms on two sides of the mask frame;
s3, stretching the mask sheets respectively, and moving displacement force application mechanisms positioned at two sides of the mask frame in a preset distance along a direction opposite to the stretching direction of the mask sheets after respectively abutting against the mask frame;
and S4, sequentially welding the mask sheets and the mask frame, and removing all the displacement force application mechanisms after all the mask sheets are welded on the mask frame, so that the mask plate is processed.
As can be seen from the above description, the beneficial effects of the present invention are: the deformation amount of the mask frame is controlled through the displacement amount of the displacement force application mechanism, each displacement force application mechanism only needs to move the corresponding displacement amount, after welding of the mask is completed, the deformation stress of the mask frame can be balanced with the contraction force of the mask, the displacement force application mechanism only moves to the corresponding position and does not continuously apply force, so that the corresponding displacement force application mechanism can keep the original state without action, the rest displacement force application mechanisms also keep the original state, and the original point is returned uniformly by the displacement force application mechanisms after welding of all the mask pieces is completed, so that errors between the simulation deformation amount and the actual deformation amount of the mask frame can be reduced, and meanwhile, the machining efficiency of the mask plate can be improved.
Further, the S2 specifically includes: and respectively arranging displacement force application mechanisms with the same number as the mask sheets on two sides of the mask frame, and aligning the positions of the displacement force application mechanisms with the positions of the mask sheets one by one.
According to the description, the displacement force application mechanisms correspond to the mask sheets one to one, so that the influence of the contraction force of the mask sheets on the deformation of the mask frame can be accurately simulated, the mesh yield and the mesh tensioning precision are improved, the error of the positions of the holes on the mask sheets is reduced, and the problems of color mixing and the like of evaporation possibly occurring in the subsequent OLED panel production process are avoided.
Further, in S2, at least three displacement force application mechanisms are respectively disposed on two sides of the mask frame, and in S3, the moving distance of the displacement force application mechanisms is sequentially decreased from the displacement force application mechanism located at the center to the displacement force application mechanisms located at two ends.
Further, in S4, the welding sequence of each mask sheet and the mask frame is as follows: starting with the mask sheet located at the center and diffusing sequentially towards both ends.
It can be known from the above description that the contraction force of the mask sheet to the mask frame can be kept balanced by welding the mask sheets in the order of starting from the mask sheet located at the center and sequentially diffusing to both sides, so as to avoid uneven stress on the mask frame.
Further, the S1 specifically includes: the square mask frame is placed on a screen stretching device, and the plurality of mask sheets are sequentially arranged on the mask frame along the length direction of the mask frame.
Example one
A method for processing a mask plate through displacement control is disclosed, wherein the mask plate comprises a mask frame and a plurality of mask sheets;
the method for processing the mask plate through displacement control comprises the following steps;
s1, placing the square mask frame on a screen stretching device, and arranging a plurality of mask sheets on the mask frame in sequence along the length direction of the mask frame;
s2, respectively arranging at least three displacement force application mechanisms on two sides of the mask frame, preferably, the number of the displacement force application mechanisms on any side of the displacement mask frame is 2N +1, wherein N is a positive integer;
s3, stretching each mask sheet respectively, and moving displacement force application mechanisms positioned at two sides of the mask frame in a direction opposite to the stretching direction of the mask sheet for a preset distance after respectively abutting against the mask frame, wherein the moving distance of the displacement force application mechanisms is gradually decreased from the displacement force application mechanism positioned at the center to the displacement force application mechanisms positioned at two ends;
and S4, sequentially welding the mask sheets and the mask frame according to the sequence of sequentially diffusing from the mask sheet positioned at the center to the two ends, and removing all the displacement force application mechanisms after all the mask sheets are welded on the mask frame, so that the processing of the mask plate is finished.
The screen stretching device in S1 includes a device body and a displacement force application mechanism disposed on the device body, where the displacement force application mechanism is located on two sides of the mask frame and moves on the device body along a direction parallel to the mask sheet.
Example two
A method for processing a mask plate through displacement control is disclosed, wherein the mask plate comprises a mask frame and a plurality of mask sheets;
the method for processing the mask plate through displacement control comprises the following steps;
s1, placing the square mask frame on a screen stretching device, and arranging a plurality of mask sheets on the mask frame in sequence along the length direction of the mask frame;
s2, respectively arranging displacement force application mechanisms with the same number as the mask sheets on two sides of the mask frame, and aligning the positions of the displacement force application mechanisms with the positions of the mask sheets one by one;
s3, stretching each mask sheet respectively, and moving displacement force application mechanisms positioned at two sides of the mask frame in a direction opposite to the stretching direction of the mask sheet for a preset distance after respectively abutting against the mask frame, wherein the moving distance of the displacement force application mechanisms is gradually decreased from the displacement force application mechanism positioned at the center to the displacement force application mechanisms positioned at two ends;
and S4, sequentially welding the mask sheets and the mask frame according to the sequence of sequentially diffusing from the mask sheet positioned at the center to the two ends, and removing all the displacement force application mechanisms after all the mask sheets are welded on the mask frame, so that the processing of the mask plate is finished.
The screen stretching device in S1 includes a device body and a displacement force application mechanism disposed on the device body, where the displacement force application mechanism is located on two sides of the mask frame and moves on the device body along a direction parallel to the mask sheet.
EXAMPLE III
As shown in fig. 3, a net-opening apparatus includes an apparatus body and a displacement force-applying mechanism 3 provided on the apparatus body;
the device body is provided with a mask frame 1 to be welded and a plurality of mask sheets 2, and the displacement force application mechanisms 3 are positioned on two sides of the mask frame 1 and move on the device body along a direction parallel to the mask sheets 2;
the two sides of the mask frame 1 are respectively provided with displacement force application mechanisms 3 with the same number as the mask pieces 2, and the positions of the displacement force application mechanisms 3 are aligned with the positions of the mask pieces 2 one by one.
The displacement force application mechanisms can control the deformation amount of the mask frame through the displacement amount, the deformation amount is controlled in the mode, the stress distribution of each displacement force application mechanism does not need to be calculated, the error is effectively reduced, the deformation condition of a product can be controlled to be accurate, and the net opening yield can be greatly improved.
The displacement force application mechanism and the mask sheet can meet one-to-one simulation or the mask frame deformation which is easier to approach the shrinkage force of the mask sheet after welding is completed, so the stress simulation of the stretched net can be greatly improved, the deformation quantity of a product can be controlled to be very accurate, namely, the error of the position of the opening on the mask sheet can be controlled, and the yield of the stretched net can be greatly improved.
As shown in fig. 1 to 4, taking mask processing with 7 mask sheets 2 as an example, when performing tension simulation, the difference between the current screen-stretching device using the force-applying mechanism controlled by force-applying numerical value and the screen-stretching device using the displacement force-applying mechanism 3 controlled by displacement amount is compared:
fig. 1 shows the deformation of the mask frame due to the tension of the mask strips under the condition of natural welding of the mask frame and the mask strips.
As shown in fig. 2, when the first mask sheet 2 is completed, the urging mechanism releases a part of the pressure. The difficulty is that after each mask sheet 2 is welded, the stress condition of the mask sheet 2 needs to be analyzed, and how to distribute the release value of each force application mechanism is simulated. Since the number of the force application mechanisms is too small, even after the force application is distributed, the amount of deformation of the analog data and the mask frame 1 is different.
As shown in fig. 3, when the displacement of the displacement force application mechanisms 3 is controlled by using the displacement amount, so that the mask frame 1 is deformed, each displacement force application mechanism 3 only needs to move by the corresponding displacement amount, after the mask strip is welded, the deformation stress of the mask frame 1 is balanced with the shrinkage force of the mask strip, and the displacement force application mechanisms 3 only move to the corresponding positions and do not apply force continuously, so that the corresponding displacement force application mechanisms 3 can keep the original state without action, and the rest displacement force application mechanisms 3 also keep the original state until the displacement force application mechanisms 3 uniformly return to the original point after all the mask strips are welded. If the deformation quantity is controlled in such a way, the stress distribution of each displacement force application mechanism 3 does not need to be calculated, and the error is effectively reduced.
As shown in fig. 4, comparing the two conditions after pre-applying force, microscopically, there is a large difference between the deformation of the mask frame 1 obtained by applying force by the force applying mechanism controlled by the force applying value and the actual deformation of the mask frame 1. And because the number of the force application mechanisms is limited, the prior equipment can not reach a more ideal state after force application.
In conclusion, the beneficial effects provided by the invention are as follows: the deformation amount of the mask frame is controlled through the displacement amount of the displacement force application mechanism, each displacement force application mechanism only needs to move the corresponding displacement amount, after welding of the mask is completed, the deformation stress of the mask frame can be balanced with the contraction force of the mask, the displacement force application mechanism only moves to the corresponding position and does not continuously apply force, so that the corresponding displacement force application mechanism can keep the original state without action, the rest displacement force application mechanisms also keep the original state, and the original point is returned uniformly by the displacement force application mechanisms after welding of all the mask pieces is completed, so that errors between the simulation deformation amount and the actual deformation amount of the mask frame can be reduced, and meanwhile, the machining efficiency of the mask plate can be improved. The displacement force application mechanisms correspond to the mask sheets one to one, the influence of the contraction force of the mask sheets on the deformation of the mask frame can be accurately simulated, the mesh yield and the mesh tensioning precision are improved, the error of the positions of the holes on the mask sheets is reduced, and therefore the problems of color mixing and the like of evaporation possibly occurring in the subsequent OLED panel production process are avoided. The mask sheets are welded according to the sequence of starting from the mask sheet positioned at the center and diffusing towards the two sides in sequence, so that the contraction force of the mask sheets on the mask frame can be kept balanced, and the mask frame is prevented from being stressed unevenly.
The displacement force application mechanisms can control the deformation amount of the mask frame through the displacement amount, the deformation amount is controlled in the mode, the stress distribution of each displacement force application mechanism does not need to be calculated, the error is effectively reduced, the deformation condition of a product can be controlled to be accurate, and the net opening yield can be greatly improved. The displacement force application mechanism and the mask sheet can meet one-to-one simulation or the mask frame deformation which is easier to approach the shrinkage force of the mask sheet after welding is completed, so the stress simulation of the stretched net can be greatly improved, the deformation quantity of a product can be controlled to be very accurate, namely, the error of the position of the opening on the mask sheet can be controlled, and the yield of the stretched net can be greatly improved.
The above description is only an embodiment of the present invention, and not intended to limit the scope of the present invention, and all equivalent changes made by using the contents of the present specification and the drawings, or applied directly or indirectly to the related technical fields, are included in the scope of the present invention.
Claims (7)
1. A method for processing a mask plate through displacement control is characterized in that the mask plate comprises a mask frame and a plurality of mask sheets;
the method for processing the mask plate through displacement control comprises the following steps;
s1, placing the mask frame on a screen stretching device, and arranging a plurality of mask sheets on the mask frame in sequence;
s2, respectively arranging displacement force application mechanisms on two sides of the mask frame;
s3, stretching the mask sheets respectively, and moving displacement force application mechanisms positioned at two sides of the mask frame in a preset distance along a direction opposite to the stretching direction of the mask sheets after respectively abutting against the mask frame;
and S4, sequentially welding the mask sheets and the mask frame, and removing all the displacement force application mechanisms after all the mask sheets are welded on the mask frame, so that the mask plate is processed.
2. The method for processing a mask through displacement control according to claim 1, wherein the step S2 specifically comprises: and respectively arranging displacement force application mechanisms with the same number as the mask sheets on two sides of the mask frame, and aligning the positions of the displacement force application mechanisms with the positions of the mask sheets one by one.
3. A method for processing a mask by displacement control according to claim 1, wherein at least three displacement force application mechanisms are respectively disposed at both sides of the mask frame in S2, and the moving distance of the displacement force application mechanisms is sequentially decreased from the displacement force application mechanism located at the center to the displacement force application mechanisms located at both ends in S3.
4. A method for processing a mask by displacement control according to claim 1, wherein in S4, the order of welding each mask slice and the mask frame is: starting with the mask sheet located at the center and diffusing sequentially towards both ends.
5. The method for processing a mask through displacement control according to claim 1, wherein the step S1 specifically comprises: the square mask frame is placed on a screen stretching device, and the plurality of mask sheets are sequentially arranged on the mask frame along the length direction of the mask frame.
6. The method for processing a mask through displacement control according to claim 5, wherein the step S3 specifically comprises: and stretching each mask sheet along the width direction of the mask frame, and moving displacement force application mechanisms positioned on two sides of the mask frame in a preset distance along a direction opposite to the stretching direction of the mask sheet after respectively abutting against the mask frame.
7. A method for processing a mask by displacement control according to claim 1, wherein the tension device in S1 includes a device body and displacement force applying mechanisms provided on the device body, the displacement force applying mechanisms are located at both sides of the mask frame and move on the device body in a direction parallel to the mask sheet.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113478131A (en) * | 2021-07-27 | 2021-10-08 | 福建华佳彩有限公司 | Net tensioning device and net tensioning method thereof |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010065281A (en) * | 2008-09-11 | 2010-03-25 | Canon Inc | Apparatus for imparting tension to vapor-deposition mask |
CN102347456A (en) * | 2010-08-03 | 2012-02-08 | 汉松有限公司 | Divided mask frame assembly and manufacturing method of divided mask frame assembly |
CN103695840A (en) * | 2013-11-25 | 2014-04-02 | 昆山允升吉光电科技有限公司 | Mask assembly assembling method |
CN204198840U (en) * | 2014-10-27 | 2015-03-11 | 四川虹视显示技术有限公司 | A kind of mask plate stationary installation |
CN108251791A (en) * | 2017-12-29 | 2018-07-06 | 信利(惠州)智能显示有限公司 | A kind of fine metal mask board manufacturing method and its platform for making |
CN109540668A (en) * | 2018-11-22 | 2019-03-29 | 京东方科技集团股份有限公司 | The resistance of tension application device and mask strip determines method |
CN110699638A (en) * | 2019-11-28 | 2020-01-17 | 云谷(固安)科技有限公司 | Screen stretching device and method for mask |
JP2020098871A (en) * | 2018-12-18 | 2020-06-25 | キヤノントッキ株式会社 | Substrate placing method, film deposition method, film deposition apparatus, and manufacturing system of organic el panel |
CN211403117U (en) * | 2019-11-13 | 2020-09-01 | 上海灏谷集成电路技术有限公司 | Mask plate frame and mask plate card assembly |
-
2021
- 2021-02-19 CN CN202110195099.5A patent/CN113059290B/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010065281A (en) * | 2008-09-11 | 2010-03-25 | Canon Inc | Apparatus for imparting tension to vapor-deposition mask |
CN102347456A (en) * | 2010-08-03 | 2012-02-08 | 汉松有限公司 | Divided mask frame assembly and manufacturing method of divided mask frame assembly |
CN103695840A (en) * | 2013-11-25 | 2014-04-02 | 昆山允升吉光电科技有限公司 | Mask assembly assembling method |
CN204198840U (en) * | 2014-10-27 | 2015-03-11 | 四川虹视显示技术有限公司 | A kind of mask plate stationary installation |
CN108251791A (en) * | 2017-12-29 | 2018-07-06 | 信利(惠州)智能显示有限公司 | A kind of fine metal mask board manufacturing method and its platform for making |
CN109540668A (en) * | 2018-11-22 | 2019-03-29 | 京东方科技集团股份有限公司 | The resistance of tension application device and mask strip determines method |
JP2020098871A (en) * | 2018-12-18 | 2020-06-25 | キヤノントッキ株式会社 | Substrate placing method, film deposition method, film deposition apparatus, and manufacturing system of organic el panel |
CN211403117U (en) * | 2019-11-13 | 2020-09-01 | 上海灏谷集成电路技术有限公司 | Mask plate frame and mask plate card assembly |
CN110699638A (en) * | 2019-11-28 | 2020-01-17 | 云谷(固安)科技有限公司 | Screen stretching device and method for mask |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113478131A (en) * | 2021-07-27 | 2021-10-08 | 福建华佳彩有限公司 | Net tensioning device and net tensioning method thereof |
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