CN113026021A - PID-based etching solution regeneration device control system and method - Google Patents
PID-based etching solution regeneration device control system and method Download PDFInfo
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- 238000005530 etching Methods 0.000 title claims abstract description 71
- 230000008929 regeneration Effects 0.000 title claims abstract description 46
- 238000011069 regeneration method Methods 0.000 title claims abstract description 46
- 238000000034 method Methods 0.000 title claims abstract description 38
- 239000007788 liquid Substances 0.000 claims abstract description 45
- 238000001514 detection method Methods 0.000 claims abstract description 36
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 30
- 238000003860 storage Methods 0.000 claims abstract description 30
- 230000008569 process Effects 0.000 claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 claims abstract description 15
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052742 iron Inorganic materials 0.000 claims abstract description 12
- 238000004448 titration Methods 0.000 claims description 54
- 238000004140 cleaning Methods 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 7
- 230000008859 change Effects 0.000 claims description 5
- 238000004458 analytical method Methods 0.000 claims description 4
- 238000005070 sampling Methods 0.000 claims description 4
- -1 iron ions Chemical class 0.000 abstract description 9
- 239000002699 waste material Substances 0.000 abstract description 9
- 230000008901 benefit Effects 0.000 abstract description 5
- 239000002912 waste gas Substances 0.000 abstract description 4
- 239000002351 wastewater Substances 0.000 abstract description 4
- 238000005265 energy consumption Methods 0.000 abstract description 3
- 239000000463 material Substances 0.000 abstract description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 13
- 150000002500 ions Chemical class 0.000 description 12
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 8
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 7
- 229910001447 ferric ion Inorganic materials 0.000 description 7
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 6
- 229910001448 ferrous ion Inorganic materials 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- XOFYZVNMUHMLCC-ZPOLXVRWSA-N prednisone Chemical compound O=C1C=C[C@]2(C)[C@H]3C(=O)C[C@](C)([C@@](CC4)(O)C(=O)CO)[C@@H]4[C@@H]3CCC2=C1 XOFYZVNMUHMLCC-ZPOLXVRWSA-N 0.000 description 5
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229960002089 ferrous chloride Drugs 0.000 description 3
- NMCUIPGRVMDVDB-UHFFFAOYSA-L iron dichloride Chemical compound Cl[Fe]Cl NMCUIPGRVMDVDB-UHFFFAOYSA-L 0.000 description 3
- 229910001453 nickel ion Inorganic materials 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 2
- 238000003912 environmental pollution Methods 0.000 description 2
- 230000033116 oxidation-reduction process Effects 0.000 description 2
- 238000011084 recovery Methods 0.000 description 2
- 238000004064 recycling Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 230000001172 regenerating effect Effects 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910015400 FeC13 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 238000011897 real-time detection Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/28—Acidic compositions for etching iron group metals
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C1/00—Electrolytic production, recovery or refining of metals by electrolysis of solutions
- C25C1/06—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese
- C25C1/08—Electrolytic production, recovery or refining of metals by electrolysis of solutions or iron group metals, refractory metals or manganese of nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25C—PROCESSES FOR THE ELECTROLYTIC PRODUCTION, RECOVERY OR REFINING OF METALS; APPARATUS THEREFOR
- C25C7/00—Constructional parts, or assemblies thereof, of cells; Servicing or operating of cells
- C25C7/06—Operating or servicing
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B11/00—Automatic controllers
- G05B11/01—Automatic controllers electric
- G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
- G05B11/42—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential for obtaining a characteristic which is both proportional and time-dependent, e.g. P. I., P. I. D.
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Abstract
The invention belongs to the technical field of etching solution electrolysis control, and provides a PID-based etching solution regeneration device control system, which comprises: the device comprises an electrolysis module, a regenerated liquid storage tank, a detection module, a PID control module and a cathode circulating tank. The device comprises an electrolysis module, a regeneration liquid storage tank, a detection module and a PID control module, wherein the electrolysis module is used for electrolyzing the etching liquid used on an etching production line, the regeneration liquid storage tank is used for storing the regeneration liquid obtained by the electrolysis module, the detection module is used for obtaining the concentration of iron ions in the regeneration liquid storage tank through a preset algorithm, and the PID control module is used for adjusting the electrolysis rate of the electrolysis module according to the concentration of the iron ions detected by the detection module. The invention also provides a PID-based etching solution regeneration device control method, and the method has the advantages that no waste water and waste gas are newly added in the whole process of regeneration of the etching waste liquid, so that the etching process section is truly green and environment-friendly, the material consumption and the energy consumption of the device are reduced, and the method has great economic benefit and social efficiency.
Description
Technical Field
The invention relates to the technical field of etching solution electrolysis control, in particular to a PID-based etching solution regeneration control system and method.
Background
The etching method is widely applied to the fields of high-tech products such as various integrated circuit lead frames, Surface Mount Technology (SMT), encoder grating fluorescent display screen display, grids, precise filter screens, microelectrodes, mask plates, integrated circuit cover plates, kinescope shadow masks, solder paste screen printing plates and the like.
The ferric trichloride solution has certain oxidability and acidity, has good corrosion effect on iron and nickel, and is applied to metal etching in a large amount, FeCl3 is reduced into FeC12 by nickel stainless steel, and a small amount of metal nickel is oxidized to enter etching solution in a form of Ni2 +. In the etching process, along with the reduction of FeC13 concentration and the rising of Ni2+ concentration in the etching solution, the efficiency of etching is reduced, the etching surface of a product is too rough, the processing precision can not meet the process requirements of integrated circuit lead frames, Surface Mounting Technology (SMT) and encoder grating fluorescent display screens, therefore, a large amount of used FeCl3 etching solution is discharged in the form of waste liquid, and the waste liquid is discharged as dangerous waste without being treated, so that not only can the environment be polluted, but also the resource is greatly wasted, and the problem that how to efficiently recycle the nickel-containing ferric trichloride etching solution is generally concerned at home and abroad at present.
Disclosure of Invention
The invention aims to provide a PID-based etching solution regeneration control system and method, which are used for solving the problem of effective utilization of the etching solution;
in order to achieve the purpose, the invention adopts the technical scheme that:
a PID-based etching solution regeneration control system, comprising:
the electrolysis module is used for electrolyzing the etching solution used on the etching production line;
a regeneration liquid storage tank for storing the regeneration liquid obtained by the electrolysis module;
the detection module is used for acquiring the preset ion concentration in the regeneration liquid storage tank through a preset algorithm;
and the PID control module is used for adjusting the electrolysis rate of the electrolysis module according to the preset ion concentration detected by the detection module.
Further, the detection module comprises:
the sampling unit is used for obtaining a detection sample from the regeneration liquid storage tank;
the titration unit is used for titrating the obtained detection sample;
and the analysis unit is used for acquiring preset parameter information in the titration process according to a preset algorithm and processing the preset parameter information to obtain the preset ion concentration in the regenerated liquid storage tank.
Further, the preset parameter information includes a titration endpoint volume and a titration endpoint.
Further, the step of obtaining the preset parameter information in the titration process is to obtain the titration end point volume through the color change of the oxidation reduction electrode and obtain the titration end point by adopting the differential jump of a curve method of delta E/delta V-V.
Further, the formula for obtaining the concentration of iron ions in the regeneration liquid storage tank is as follows:
wherein, V is the value of the volume of the standard titration solution consumed by titration, namely the titration end point volume, and V1 is the volume of the taken detection sample; c is the concentration value of the standard titration solution, M is the mass of 1L of the titration solution and the titration indicator, and M is the molecular weight.
Further, the detection module further comprises a cleaning unit, and the cleaning unit is used for cleaning the titration unit.
The invention also aims to provide a PID-based etching solution regeneration control method, which comprises the following steps:
s1, acquiring a preset ion concentration in the regeneration liquid storage tank through a preset algorithm;
and S2, adjusting the electrolysis rate of the electrolysis module according to the detected preset ion concentration.
Further, the specific step of obtaining the preset ion concentration in step S1 includes:
s11, obtaining a detection sample from the regeneration liquid storage tank;
s12, titrating the obtained detection sample;
and S13, acquiring preset parameter information in the titration process according to a preset algorithm, and processing the preset parameter information to obtain the preset ion concentration in the regenerated liquid storage tank.
Compared with the prior art, the invention at least comprises the following beneficial effects:
(1) according to the invention, by adopting the electrolysis of the etching solution, part of ferric ions at the cathode are converted into ferrous ions, nickel ions are converted into metal nickel for recovery, and the ferrous ions at the anode are converted into ferric ions to be used as regenerated etching solution for recycling;
(2) the invention utilizes real-time detection and PID automatic control technology to ensure that the concentration of ferric ions in the etching solution is always kept in the optimal process range, thereby greatly improving the quality of products;
(3) the invention does not add waste water and waste gas in the whole process of regenerating the etching waste liquid, thereby realizing the real green and environmental protection of the etching process section, reducing the material consumption and the energy consumption of the device and having great economic benefit and social efficiency.
Drawings
FIG. 1 is a schematic diagram of the overall structure of the first embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a detection module according to a first embodiment of the present invention;
FIG. 3 is a schematic diagram of the curve method of Δ E/Δ V-V according to one embodiment of the present invention;
FIG. 4 is a general flow chart of a second embodiment of the present invention;
fig. 5 is a flowchart of step S1 in the second embodiment of the present invention.
Detailed Description
The following are specific embodiments of the present invention, and the technical solutions of the present invention will be further described with reference to the drawings, but the present invention is not limited to these embodiments.
Example one
As shown in fig. 1, the etching solution regeneration control system based on PID of the present invention comprises: the device comprises an electrolysis module, a regenerated liquid storage tank, a detection module, a PID control module and a cathode circulating tank.
The device comprises an electrolysis module, a regeneration liquid storage tank, a detection module and a PID control module, wherein the electrolysis module is used for electrolyzing the etching liquid used on an etching production line, the regeneration liquid storage tank is used for storing the regeneration liquid obtained by the electrolysis module, the detection module is used for obtaining the concentration of iron ions in the regeneration liquid storage tank through a preset algorithm, and the PID control module is used for adjusting the electrolysis rate of the electrolysis module according to the concentration of the iron ions detected by the detection module.
In the etching production process, along with the reduction of the concentration of ferric trichloride in an etching solution and the increase of the concentration of ferrous ions, the etching efficiency is reduced, the quality of a product is seriously influenced, the result that the etching surface of the product is too rough and is accompanied is caused, inferior-quality products are formed, the requirements on precision equipment and instruments such as an integrated circuit lead frame, a fluorescent display screen display, a grid mesh, a precision filter screen, an encoder grating, a microelectrode, a mask plate, an integrated circuit cover plate, a picture tube shadow mask, a Surface Mount Technology (SMT) tin paste screen printing plate and the like cannot be met, and the survival and the development of enterprises are seriously influenced. Therefore, the requirement on the concentration of the ferric trichloride etching solution is very high, and according to the quality requirement of the etching process, the component content of the etching solution can meet the following requirements: the content of ferric trichloride is 45 +/-0.5 percent, and the content of ferrous chloride is less than 0.3 percent.
In order to always keep the production requirements of 45 +/-0.5 percent of ferric chloride and less than 0.3 percent of ferrous chloride in the production process and ensure the precision and quality of products, the system adopts the electrolysis of the etching solution to convert partial ferric ions of a cathode into ferrous ions and nickel ions into metallic nickel for recovery, converts the ferrous ions of an anode into the ferric ions for recycling as regenerated etching solution, and utilizes a detection module and a PID automatic control technology to ensure that the concentration of the ferric ions in the etching solution is always kept in an optimal process range, thereby greatly improving the quality of the products, lightening the labor intensity of workers, and achieving the aim of regenerating the etching waste liquid without newly added waste water and waste gas in the whole production process, thereby realizing the real green and environmental protection of the etching process section and having great economic benefit and social efficiency.
Preferably, the detection module comprises: the device comprises a sampling unit, a titration unit, a cleaning unit and an analysis unit. The sampling unit is used for obtaining a detection sample from the regenerated liquid storage tank, the titration unit is used for titrating the obtained detection sample, and the analysis unit is used for obtaining preset parameter information in the titration process according to a preset algorithm and processing the preset parameter information to obtain the iron ion concentration in the regenerated liquid storage tank. The preset parameter information comprises a titration end point volume and a titration end point.
The step of obtaining the preset parameter information in the titration process is to obtain the titration end point volume through the color change of the oxidation reduction electrode and obtain the titration end point through the differential jump of a curve method of delta E/delta V-V.
As shown in FIG. 3, the curve method of Δ E/Δ V-V is to calculate the titration end point from the ratio of the potential change amount to the titration solution volume increment, and there is an extreme point on the curve of Δ E/Δ V-V, which corresponds to the inflection point in the curve of E-V, and this point is the titration end point.
Further, the formula for obtaining the concentration of iron ions in the regeneration liquid storage tank through the titration end point volume and the titration end point is as follows:
wherein, V is the value of the volume of the standard titration solution consumed by titration, namely the titration end point volume, and V1 is the volume of the taken detection sample; c is the concentration value of the standard titration solution, M is the mass of 1L of the titration solution and the titration indicator, and M is the molecular weight of ferrous chloride.
The cleaning unit is used for washing the titration unit, the cleaning unit can wash the titration unit before titration detection each time, reduces the error of titration, makes this system can be more accurate detect out the iron ion concentration in the regeneration liquid.
Further, the cathode circulating tank is used for recovering preset metal deposited by the cathode in the etching solution.
The etching solution on the etching production line is directly sent into the anode chamber of the electrolytic cell, ferrous ions in the etching solution are oxidized into ferric ions on the anode of the electrolytic cell and are circularly sent into the etching production line, the whole production process is in closed-loop circulation on line, and meanwhile, partial iron ions, nickel ions and the like in the etching waste solution in the anode chamber penetrate through the ionic membrane and diffuse to the cathode chamber from the anode chamber under the action of concentration difference and are deposited on the cathode, so that the aim of recovering iron and nickel in the etching solution is fulfilled.
No waste water and waste gas are added in the whole production process, so that the etching process is truly automatic, green and environment-friendly, and has great economic benefit and social efficiency.
Example two
As shown in fig. 4, the etching solution regeneration control method based on PID of the present invention includes the steps of:
s1, acquiring a preset ion concentration in the regeneration liquid storage tank through a preset algorithm;
and S2, adjusting the electrolysis rate of the electrolysis module according to the detected preset ion concentration.
As shown in fig. 5, the specific step of obtaining the preset ion concentration in step S1 includes:
s11, obtaining a detection sample from the regeneration liquid storage tank;
s12, titrating the obtained detection sample;
and S13, acquiring preset parameter information in the titration process according to a preset algorithm, and processing the preset parameter information to obtain the preset ion concentration in the regenerated liquid storage tank.
The etching solution contains a large amount of noble metals, so the profit is considerable, and therefore, after illegal vendors purchase and transfer the etching solution and extract copper, residual liquid is discharged into rivers, lakes and seas without any treatment, thereby causing pollution to soil and water quality and extremely damaging the ecology. Under the drive of profit, the behavior is often prohibited, which is also the main reason for environmental pollution in the circuit board industry.
The invention can effectively overcome the problems of impurity, much demand, large change of etching ion concentration and influence on quality precision by adopting the online detection and PID automatic control technology, further realizes the optimized operation of the production process by improving the stability of process parameters, improves the cyclic utilization of the etching solution, lightens the environmental pollution and reduces the material consumption and the energy consumption of the device on the premise of ensuring the high quality requirement of the product, thereby improving the economic efficiency and the social efficiency.
The invention adopts a totally-enclosed and zero-emission production flow, does not produce waste liquid medicine and does not need to treat three wastes, and after the production method is adopted, redundant etching solution can not be produced, no pollution source is produced, and the pollution is effectively avoided.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications or additions may be made to the described embodiments or alternatives may be employed by those skilled in the art without departing from the spirit or ambit of the invention as defined in the appended claims.
Claims (8)
1. A PID-based etching solution regeneration control system, comprising:
the electrolysis module is used for electrolyzing the etching solution used on the etching production line;
a regeneration liquid storage tank for storing the regeneration liquid obtained by the electrolysis module;
the detection module is used for acquiring the preset ion concentration in the regeneration liquid storage tank through a preset algorithm;
and the PID control module is used for adjusting the electrolysis rate of the electrolysis module according to the preset ion concentration detected by the detection module.
2. The PID-based etching solution regeneration control system according to claim 1, wherein the detection module comprises:
the sampling unit is used for obtaining a detection sample from the regeneration liquid storage tank;
the titration unit is used for titrating the obtained detection sample;
and the analysis unit is used for acquiring preset parameter information in the titration process according to a preset algorithm and processing the preset parameter information to obtain the preset ion concentration in the regenerated liquid storage tank.
3. The PID-based etching solution regeneration control system as claimed in claim 2, wherein the preset parameter information includes titration end point volume and titration end point.
4. The PID-based etching solution regeneration control system according to claim 3, wherein the step of obtaining the preset parameter information during the titration process comprises obtaining a titration end point volume through a color change of the redox electrode and obtaining the titration end point through a differential jump of a Δ E/. DELTA.V-V curve method.
5. The PID-based etching liquid regeneration control system according to claim 3, wherein the formula for obtaining the iron ion concentration in the regeneration liquid storage tank is as follows:
wherein, V is the value of the volume of the standard titration solution consumed by titration, namely the titration end point volume, and V1 is the volume of the taken detection sample; c is the concentration value of the standard titration solution, M is the mass of 1L of the titration solution and the titration indicator, and M is the molecular weight.
6. The PID-based etching solution regeneration control system according to claim 2,
the detection module further comprises a cleaning unit, and the cleaning unit is used for cleaning the titration unit.
7. A PID-based etching solution regeneration control method, the PID-based etching solution regeneration control system according to any one of claims 1 to 6, comprising the steps of:
s1, acquiring a preset ion concentration in the regeneration liquid storage tank through a preset algorithm;
and S2, adjusting the electrolysis rate of the electrolysis module according to the detected preset ion concentration.
8. The PID-based etching solution regeneration control method according to claim 8, wherein the step of obtaining the predetermined ion concentration in step S1 comprises:
s11, obtaining a detection sample from the regeneration liquid storage tank;
s12, titrating the obtained detection sample;
and S13, acquiring preset parameter information in the titration process according to a preset algorithm, and processing the preset parameter information to obtain the preset ion concentration in the regenerated liquid storage tank.
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