CN113025971A - Tube target material and application thereof - Google Patents

Tube target material and application thereof Download PDF

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Publication number
CN113025971A
CN113025971A CN202110227697.6A CN202110227697A CN113025971A CN 113025971 A CN113025971 A CN 113025971A CN 202110227697 A CN202110227697 A CN 202110227697A CN 113025971 A CN113025971 A CN 113025971A
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China
Prior art keywords
screw hole
tube
section
chromium
tube target
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Pending
Application number
CN202110227697.6A
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Chinese (zh)
Inventor
姚力军
边逸军
潘杰
王学泽
侯娟华
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ningbo Jiangfeng Electronic Material Co Ltd
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Ningbo Jiangfeng Electronic Material Co Ltd
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Priority to CN202110227697.6A priority Critical patent/CN113025971A/en
Publication of CN113025971A publication Critical patent/CN113025971A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06Metallic material
    • C23C4/067Metallic material containing free particles of non-metal elements, e.g. carbon, silicon, boron, phosphorus or arsenic
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/14Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying for coating elongate material
    • C23C4/16Wires; Tubes

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention provides a tube target material and application thereof, wherein the tube target material comprises a tube body and an inner hole, wherein a first screw hole and a second screw hole are respectively arranged at two ends of the inner hole; the tube target is simple in structure and easy to process, and can meet the requirement of higher level and prolong the service life when being applied to sputtering coating.

Description

Tube target material and application thereof
Technical Field
The invention relates to the technical field of targets, in particular to a tube target and application thereof.
Background
The sputtering technique is a technique in which ions are used to bombard the surface of a target material, and the phenomenon in which atoms of the target material are knocked out is called sputtering. The atoms generated by sputtering deposit on the surface of the substrate to form a film called sputtering coating. Usually, gas ionization is generated by gas discharge, and positive ions bombard a cathode target body at a high speed under the action of an electric field to knock out atoms or molecules of the cathode target body, and fly to the surface of a plated substrate to be deposited into a thin film.
The sputtering target material is one of important raw materials in the preparation process of a semiconductor integrated circuit, mainly comprises Al, Ni, Cu, Ti, W, noble metal, alloy thereof and the like, and is mainly used for preparing physical vapor deposition films of contacts, through holes, interconnecting wires, barrier layers, packaging and the like in the integrated circuit. During sputtering, the target surface is bombarded with accelerated ions to deposit atoms on the substrate surface. In the use process of the target material, the service life of the target material is an important factor.
CN211443406U discloses a nozzle protection device for a rotary sputtering target, which includes a ring cover for covering the nozzle of the rotary sputtering target, a fastening structure is provided between the inner side wall of the ring cover and the outer side wall of the nozzle of the rotary sputtering target, the ring cover is fastened and connected to the nozzle of the rotary sputtering target through the fastening structure, a convex shoulder is formed on the outer side of the ring cover and protrudes towards the center, the inner side of the convex shoulder is in abutting fit with the nozzle surface of the rotary sputtering target, but the structure is more complex.
CN211388351U discloses a TFT planar sputtering target protection structure for sand blasting equipment, which includes a first protection layer tightly attached to the upper surface of a substrate of the TFT planar sputtering target, a second protection layer attached to the side surface of the substrate, and a third protection layer wrapped at two ends of a back plate of the TFT planar sputtering target. Wherein, the first protective layer completely covers the upper surface of the substrate; the second protective layer is arranged in a closed mode along the edge direction of the substrate, the bottom edge of the second protective layer is flush with the binding surface of the back plate, and the upper edge of the second protective layer covers the edge of the first protective layer; and on the binding surface of the back plate, the inner side edges of the two third protective layers and the bottom edge of the second protective layer surround to form a sand blasting area, but the structure is more complex.
CN211972432U discloses a planar sputtering target, which includes a main board, a fixing hole and a slideway, wherein an extension board is fixed below the main board, a limiting block is arranged above the fixing hole, a limiting block is fixed inside the slideway, a fixing mechanism is arranged inside the mounting board, a back board is fixed behind the main board, and a water tank is arranged on the surface of the back board, but the structure is complicated.
Therefore, there is a need to develop a target material with a simple structure, good use effect and wide application prospect, and the target material can be suitable for sputtering coating equipment.
Disclosure of Invention
In view of the problems in the prior art, the invention provides a tube target, which comprises a tube body and an inner hole, wherein a first screw hole and a second screw hole are respectively formed in two ends of the inner hole, a first thread is arranged in the first screw hole, a second thread is arranged in the second screw hole, a chromium-silicon alloy layer is arranged on the side surface of the tube body, the tube target is simple in structure and easy to machine, the tube target is applied to sputter coating, the use effect is good, the requirement of higher level can be met, and the service life is prolonged.
In order to achieve the purpose, the invention adopts the following technical scheme:
in a first aspect, the present invention provides a tube target, wherein the tube target comprises a tube body and an inner hole; a first screw hole and a second screw hole are respectively formed in two ends of the inner hole; a first thread is arranged in the first screw hole; a second thread is arranged in the second screw hole; the side surface of the pipe body is provided with a chromium-silicon alloy layer.
The pipe target material is applied to sputtering coating, the using effect is good, the inner hole is provided with the magnet and the cooling device, so that the sputtering function of a product is realized, the first screw hole and the second screw hole play a role in fixing, the side surface of the pipe body is provided with the chromium-silicon alloy layer, the function of sputtering coating is better realized, the pipe target material is not a plane, the surface cannot be welded or the welding process is difficult, and the chromium-silicon alloy layer is sprayed to replace welding due to the complex structure of the pipe target material.
Preferably, the material of the tube target includes SUS304 stainless steel.
Preferably, the outer diameter of the pipe body is 65-75 mm, for example, 65mm, 66mm, 67mm, 68mm, 69mm, 70mm, 71mm, 72mm, 73mm, 74mm or 75mm, etc.
Preferably, the length of the pipe body is 360-380 mm, for example, 360mm, 362mm, 364mm, 366mm, 368mm, 370mm, 372mm, 374mm, 376mm, 378mm or 380mm, etc.
Preferably, the chromium-silicon alloy layer is arranged in the middle of the side surface of the pipe body.
Preferably, the length of the chromium-silicon alloy layer is 305-315 mm, such as 305mm, 306mm, 307mm, 308mm, 309mm, 310mm, 311mm, 312mm, 313mm, 314mm or 315 mm.
Preferably, the thickness of the chromium-silicon alloy layer is 2.5-3.5 mm, for example, 2.5mm, 2.6mm, 2.7mm, 2.8mm, 2.9mm, 3.0mm, 3.1mm, 3.2mm, 3.3mm, 3.4mm, or 3.5 mm.
The thickness of the chromium-silicon alloy layer is set to be within the range of 2.5-3.5 mm, so that the progress of the sputtering coating process is facilitated.
Preferably, the mass ratio of chromium to silicon in the chromium-silicon alloy is (2-3.5): (4-8), and may be, for example, 2:8, 3:4 or 3.5: 6.5.
The mass ratio of chromium to silicon in the chromium-silicon alloy is (2-3.5) to (4-8), and welding is better replaced in sputtering coating, so that the progress of the sputtering coating process is facilitated.
Preferably, the first screw hole comprises a first screw hole section and a first screw hole section.
Preferably, the first screw hole section is arranged close to the inner hole.
Preferably, the first thread is arranged on the first screw hole section.
Preferably, the length of the first screw hole section is 1.5-2.5 mm, for example, 1.5mm, 1.6mm, 1.7mm, 1.8mm, 1.9mm, 2.0mm, 2.1mm, 2.2mm, 2.3mm, 2.4mm or 2.5mm, etc.
Preferably, the inner diameter of the first screw hole section is 66-68 mm, and may be 66mm, 66.2mm, 66.4mm, 66.6mm, 66.8mm, 67mm, 67.2mm, 67.4mm, 67.6mm, 67.8mm, or 68mm, for example.
Preferably, the length of the first screw hole section is 17.5-18.5 mm, such as 17.5mm, 17.6mm, 17.7mm, 17.8mm, 17.9mm, 18mm, 18.1mm, 18.2mm, 18.3mm, 18.4mm or 18.5 mm.
Preferably, the gauge of the first thread comprises M60 × 2.
Preferably, the inner diameter of the inner hole is 55-57 mm, such as 55mm, 55.2mm, 55.4mm, 55.6mm, 55.8mm, 56mm, 56.2mm, 56.4mm, 56.6mm, 56.8mm or 57 mm.
Preferably, the second screw hole comprises a second screw hole section and a second screw hole section.
Preferably, the second screw hole section is arranged close to the inner hole.
Preferably, the second thread is arranged at the second screw hole section.
Preferably, the length of the first screw hole section is 1.5-2.5 mm, for example, 1.5mm, 1.6mm, 1.7mm, 1.8mm, 1.9mm, 2.0mm, 2.1mm, 2.2mm, 2.3mm, 2.4mm or 2.5mm, etc.
Preferably, the inner diameter of the second screw hole section is 66-68 mm, and may be 66mm, 66.2mm, 66.4mm, 66.6mm, 66.8mm, 67mm, 67.2mm, 67.4mm, 67.6mm, 67.8mm, or 68mm, for example.
Preferably, the length of the second screw hole section is 17.5-18.5 mm, such as 17.5mm, 17.6mm, 17.7mm, 17.8mm, 17.9mm, 18mm, 18.1mm, 18.2mm, 18.3mm, 18.4mm or 18.5 mm.
Preferably, the gauge of the second thread comprises M60 × 2.
In a second aspect, the present invention provides use of the tube target of the first aspect in sputter coating.
The tube target material has the advantages of simple structure, easy processing, good use effect, capability of meeting the requirement of higher level and prolonged service life.
Compared with the prior art, the invention has at least the following beneficial effects:
(1) the tube target provided by the invention has the advantages that the structure is simple, and the tube target is easy to process;
(2) the tube target provided by the invention is applied to sputtering coating, has good use effect, can meet the requirement of higher level, prolongs the service life, and is more than or equal to 2085 kW.h.
Drawings
Fig. 1 is a cross-sectional view of a tube target in example 1 of the present invention.
Fig. 2 is a left side view of the tube target in example 1 of the present invention.
In the figure: 1-a pipe body; 2-inner hole; a 3-chromium-silicon alloy layer; 4-a section of the first screw hole; 5-a first screw hole section; 6-first thread; 7-a section of the second screw hole; 8-a second screw hole section; 9-second thread.
Detailed Description
The technical scheme of the invention is further explained by the specific implementation mode in combination with the attached drawings.
The present invention is described in further detail below. The following examples are merely illustrative of the present invention and do not represent or limit the scope of the claims, which are defined by the claims.
First, an embodiment
Example 1
The present embodiment provides a tube target material, as shown in fig. 1 and fig. 2, the tube target material includes a tube body 1 and an inner hole 2, the tube target material is an SUS304 stainless steel tube, the outer diameter of the tube body 1 is 70mm, the length is 370mm, the middle of the side surface of the tube body 1 is provided with a chromium-silicon alloy layer 3, the length of the chromium-silicon alloy layer 3 is 310mm, the thickness is 3mm, and the mass ratio of chromium to silicon in the chromium-silicon alloy is 3: 4;
the inner diameter of an inner hole 2 of the tube target material is 56mm, a first screw hole and a second screw hole are respectively arranged at two ends of the inner diameter 2, wherein the first screw hole comprises a first screw hole section 4 and a first screw hole section 5, the length of the first screw hole section 4 is 2mm, the inner diameter is 67mm, the length of the first screw hole section 5 is 18mm, and the first screw hole section 5 is provided with a first thread 6 with the specification of M60 multiplied by 2; the second screw includes one section 7 of second screw and second screw two-stage section 8, and the length of one section 7 of second screw is 2mm, and the internal diameter is 67mm, and the length of second screw two-stage section 8 is 18mm, and second screw two-stage section 8 is provided with the second screw 9 that the specification is M60 x 2.
Example 2
The embodiment provides a tube target material, which comprises a tube body and an inner hole, wherein the tube target material is an SUS304 stainless steel tube, the outer diameter of the tube body is 65mm, the length of the tube body is 360mm, a chromium-silicon alloy layer is arranged in the middle of the side surface of the tube body, the length of the chromium-silicon alloy layer is 305mm, the thickness of the chromium-silicon alloy layer is 2.5mm, and the mass ratio of chromium to silicon in the chromium-silicon alloy is 2: 8;
the inner diameter of an inner hole of the tube target material is 55mm, a first screw hole and a second screw hole are respectively arranged at two ends of the inner diameter, wherein the first screw hole comprises a first screw hole section and a first screw hole section, the length of the first screw hole section is 1.5mm, the inner diameter is 66mm, the length of the first screw hole section is 17.5mm, and the first screw hole section is provided with first threads with the specification of M60 multiplied by 2; the second screw includes that one section of second screw and second screw two-stage process, and one section length of second screw is 1.5mm, and the internal diameter is 66mm, and the length of second screw two-stage process is 17.5mm, and the second screw two-stage process is provided with the second screw thread that the specification is M60 x 2.
Example 3
The embodiment provides a tube target material, which comprises a tube body and an inner hole, wherein the tube target material is an SUS304 stainless steel tube, the outer diameter of the tube body is 75mm, the length of the tube body is 380mm, a chromium-silicon alloy layer is arranged in the middle of the side surface of the tube body, the length of the chromium-silicon alloy layer is 315mm, the thickness of the chromium-silicon alloy layer is 3.5mm, and the mass ratio of chromium to silicon in the chromium-silicon alloy is 3.5: 6.5;
the inner diameter of an inner hole of the tube target material is 57mm, a first screw hole and a second screw hole are respectively arranged at two ends of the inner diameter, wherein the first screw hole comprises a first screw hole section and a first screw hole section, the length of the first screw hole section is 2.5mm, the inner diameter is 68mm, the length of the first screw hole section is 18.5mm, and the first screw hole section is provided with first threads with the specification of M60 multiplied by 2; the second screw includes that one section of second screw and second screw two-stage process, and one section length of second screw is 2.5mm, and the internal diameter is 68mm, and the length of second screw two-stage process is 18.5mm, and the second screw two-stage process is provided with the second screw thread that the specification is M60 x 2.
Example 4
This example provides a tube target material, in which the thickness of the chromium-silicon alloy layer of the tube target material is controlled to be 2mm, and the rest is the same as example 1.
Example 5
This example provides a tube target material, in which the thickness of the chromium-silicon alloy layer was controlled to be 4mm, and the rest was the same as in example 1.
Second, comparative example
Comparative example 1
This comparative example provides a tube target, which was the same as in example 1 except that the chromium-silicon alloy layer was not provided.
Comparative example 2
The comparative example provides a tube target, in which the chromium-silicon alloy layer was replaced with a pure chromium layer, and the rest was the same as in example 1.
Third, test and results
The method for testing the service life of the tube target comprises the following steps: the tube target material is applied to sputtering coating, and the service life of the tube target material is recorded.
The test results of the above examples and comparative examples are shown in table 1.
TABLE 1
Service life (kW. h)
Example 1 2350
Example 2 2272
Example 3 2312
Example 4 2120
Example 5 2085
Comparative example 1 1750
Comparative example 2 1845
From table 1, the following points can be seen:
(1) the invention provides a tube target material, which comprises a tube body and an inner hole, wherein a first screw hole and a second screw hole are respectively arranged at two ends of the inner hole, a first thread is arranged in the first screw hole, a second thread is arranged in the second screw hole, and a chromium-silicon alloy layer is arranged on the side surface of the tube body;
(2) as can be seen from the combination of examples 1 and 4 to 5, the thickness of the chromium-silicon alloy layer in example 1 is set to 3mm, and the service life of the tube target in example 1 is 2350kW · h, while the service life of the tube target in examples 4 to 5 is 2120kW · h and 2085kW · h, respectively, compared with the thicknesses of the chromium-silicon alloy layers in examples 4 to 5, which indicates that the thickness of the chromium-silicon alloy layer of the tube target is set within a certain range, and the service life of the tube target in sputter film formation can be further prolonged;
(3) as can be seen by combining example 1 and comparative example 1, in example 1, the tube side surface of the tube target was provided with the chromium-silicon alloy layer, and compared to comparative example 1, in which the tube side surface of the tube target was not provided with the chromium-silicon alloy layer, the tube target in example 1 had a service life of 2350kW · h, and the tube target in comparative example 1 had a service life of 1750kW · h, which indicates that the tube target of the present invention, in which the chromium-silicon alloy layer was provided on the tube side surface of the tube target, could have a longer service life in sputter film formation;
(4) it can be seen from the combination of example 1 and comparative example 2 that, in example 1, when the chromium-silicon alloy is sprayed on the tube side surface of the tube target, the service life of the tube target in example 1 is 2350kW · h, and the service life of the tube target in comparative example 2 is 1845kW · h, compared to when pure chromium is sprayed on the tube side surface of the tube target in comparative example 2, and this indicates that, when the chromium-silicon alloy is sprayed on the tube side surface of the tube target, the service life of the tube target in sputter film formation can be prolonged.
The tube target provided by the invention is simple in structure and easy to process, has a good using effect when being applied to sputtering coating, can meet the requirement of higher level, and prolongs the service life, wherein the service life of the tube target in the embodiment 1-5 is more than or equal to 2085 kW.h.
The applicant declares that the present invention illustrates the detailed structural features of the present invention through the above embodiments, but the present invention is not limited to the above detailed structural features, that is, it does not mean that the present invention must be implemented depending on the above detailed structural features. It should be understood by those skilled in the art that any modifications of the present invention, equivalent substitutions of selected components of the present invention, additions of auxiliary components, selection of specific modes, etc., are within the scope and disclosure of the present invention.

Claims (10)

1. A tube target is characterized by comprising a tube body and an inner hole;
a first screw hole and a second screw hole are respectively formed in two ends of the inner hole;
a first thread is arranged in the first screw hole;
a second thread is arranged in the second screw hole;
the side surface of the pipe body is provided with a chromium-silicon alloy layer.
2. A tube target according to claim 1, wherein a material of the tube target comprises SUS304 stainless steel.
3. The tube target according to claim 1 or 2, wherein the outer diameter of the tube body is 65 to 75 mm;
preferably, the length of body is 360 ~ 380 mm.
4. The tube target according to any one of claims 1 to 3, wherein the chromium-silicon alloy layer is disposed in the middle of the side surface of the tube body;
preferably, the length of the chromium-silicon alloy layer is 305-315 mm;
preferably, the thickness of the chromium-silicon alloy layer is 2.5-3.5 mm;
preferably, the mass ratio of chromium to silicon in the chromium-silicon alloy is (2-3.5): 4-8.
5. The tube target according to any one of claims 1 to 4, wherein the first screw hole comprises a first screw hole section and a first screw hole section;
preferably, the first screw hole two-section is arranged close to the inner hole;
preferably, the first thread is arranged on the first screw hole section.
6. The tube target according to claim 5, wherein a length of a section of the first screw hole is 1.5 to 2.5 mm;
preferably, the inner diameter of one section of the first screw hole is 66-68 mm;
preferably, the length of the second section of the first screw hole is 17.5-18.5 mm;
preferably, the gauge of the first thread comprises M60 × 2.
7. The tube target according to any one of claims 1 to 6, wherein the inner diameter of the inner bore is 55 to 57 mm.
8. The tubular target according to any one of claims 1 to 7, wherein the second screw hole comprises a second screw hole section and a second screw hole section;
preferably, the second screw hole section is arranged close to the inner hole;
preferably, the second thread is arranged at the second screw hole section.
9. The tube target according to claim 8, wherein a length of a section of the second screw hole is 1.5 to 2.5 mm;
preferably, the inner diameter of one section of the second screw hole is 66-68 mm;
preferably, the length of the second screw hole section is 17.5-18.5 mm;
preferably, the gauge of the second thread comprises M60 × 2.
10. Use of a tube target according to any one of claims 1 to 9 in sputter coating.
CN202110227697.6A 2021-03-01 2021-03-01 Tube target material and application thereof Pending CN113025971A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110227697.6A CN113025971A (en) 2021-03-01 2021-03-01 Tube target material and application thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110227697.6A CN113025971A (en) 2021-03-01 2021-03-01 Tube target material and application thereof

Publications (1)

Publication Number Publication Date
CN113025971A true CN113025971A (en) 2021-06-25

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ID=76465718

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202110227697.6A Pending CN113025971A (en) 2021-03-01 2021-03-01 Tube target material and application thereof

Country Status (1)

Country Link
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102265376A (en) * 2008-10-24 2011-11-30 应用材料股份有限公司 Rotatable sputter target base, rotatable sputter target, coating installation, method of producing a rotatable sputter target, target base connection means, and method of connecting a rotatable target base device for sputtering installations to a tar
CN207904355U (en) * 2017-12-18 2018-09-25 江阴恩特莱特镀膜科技有限公司 A kind of rotation chrome-silicon target
CN111286704A (en) * 2020-04-13 2020-06-16 合肥江丰电子材料有限公司 Integrated rotary target material convenient to be connected with equipment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102265376A (en) * 2008-10-24 2011-11-30 应用材料股份有限公司 Rotatable sputter target base, rotatable sputter target, coating installation, method of producing a rotatable sputter target, target base connection means, and method of connecting a rotatable target base device for sputtering installations to a tar
CN207904355U (en) * 2017-12-18 2018-09-25 江阴恩特莱特镀膜科技有限公司 A kind of rotation chrome-silicon target
CN111286704A (en) * 2020-04-13 2020-06-16 合肥江丰电子材料有限公司 Integrated rotary target material convenient to be connected with equipment

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