CN113025210A - Quartz glass grinding fluid and preparation method thereof - Google Patents
Quartz glass grinding fluid and preparation method thereof Download PDFInfo
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- CN113025210A CN113025210A CN202110315836.0A CN202110315836A CN113025210A CN 113025210 A CN113025210 A CN 113025210A CN 202110315836 A CN202110315836 A CN 202110315836A CN 113025210 A CN113025210 A CN 113025210A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
The invention provides a quartz glass grinding fluid and a preparation method thereof, wherein the quartz glass grinding fluid comprises the following components in parts by weight: 20-40% of grinding particles; 40-80 parts of water; 5-20% of suspension; the grinding particles comprise the following components in parts by weight: 2-50% of diamond; 1 part of aluminum oxide; the suspension comprises the following components in parts by weight: 5-20 parts of a dispersing agent; 50-90 parts of a suspending agent; 3-10 parts of surfactant. The grinding particles made of two different materials are added into the quartz glass grinding fluid provided by the scheme, the hardness of the grinding particles is different, the diamond particles with high hardness are beneficial to effectively removing the quartz glass material, the alumina particles with slightly low hardness can repair cracks caused by diamond processing, and the ideal grinding effect of high quartz glass grinding removal rate and small roughness can be met simultaneously.
Description
Technical Field
The invention relates to the technical field of grinding materials, in particular to a quartz glass grinding fluid and a preparation method thereof.
Background
In modern optical manufacturing, laser optical element manufacturing is different from traditional optical manufacturing, and only the surface shape precision, the surface quality and the ultra-smooth surface roughness index of the element are concerned. In Laser systems where the optical element is subjected to high energy or high power Laser irradiation, Laser Damage (Laser Damage) threshold becomes an important indicator. Because the optical element has a low laser damage resistance threshold, the continuous working capacity and reliability of the laser device cannot meet the requirements of practical application.
Quartz glass is the preferred material for the core elements such as windows, focusing lenses, diffraction gratings, etc. in most intense laser systems today due to its wide band gap. The processing process flow of the quartz glass comprises crystal growth, slicing, grinding and polishing processes, wherein the grinding process is to thin the quartz glass, and flatten the surface of the quartz glass by grinding to remove damage layers such as cutting marks, cracks and the like remained on the surface. The grinding of quartz glass in the related art usually requires the aid of a grinding liquid. The grinding mode of the quartz glass is that grinding fluid containing large-particle-size abrasive grains is added between the quartz glass and a grinding disc, and the large-particle-size abrasive grains in the grinding fluid act on the surface of the quartz glass through mechanical friction between the grinding fluid and the quartz glass to remove scratches and uneven parts on the surface of the quartz glass so as to obtain a surface with uniform thickness. The ideal grinding effect of the quartz glass is high removal rate and small roughness, and the prior quartz glass grinding fluid is difficult to achieve the two effects simultaneously.
Therefore, in order to overcome the disadvantages of the prior art, it is necessary to design a silica glass polishing slurry and a method for preparing the same to solve the above problems.
Disclosure of Invention
The invention provides a grinding fluid for grinding quartz glass, aiming at the problems in the prior art in the grinding and processing process of quartz glass, and the grinding fluid can be used for effectively removing the quartz glass material and simultaneously reducing the roughness of the ground quartz glass material.
In order to achieve the above objects and other related objects, the present invention provides the following technical solutions: the quartz glass grinding fluid is characterized by comprising the following components in parts by weight:
grinding particles 20-40 water 40-80 suspension 5-20;
the grinding particles comprise the following components in parts by weight:
2-50% of diamond and 1 of alumina;
the suspension comprises the following components in parts by weight:
dispersant 5-20 suspending agent 50-90 surfactant 3-10.
The preferable technical scheme is as follows: the particle size of the diamond is 2-5 times of that of the aluminum oxide.
The preferable technical scheme is as follows: the dispersant is polyethylene glycol.
The preferable technical scheme is as follows: the suspending agent is oleic acid.
The preferable technical scheme is as follows: the surfactant is sodium dodecyl benzene sulfonate.
In addition, the application also relates to a preparation method of the quartz glass grinding fluid, which comprises the following steps:
a. primary mixing: uniformly mixing diamond and alumina according to a ratio to obtain grinding particles; mixing a dispersing agent, a suspending agent and a surfactant according to a ratio, and uniformly stirring to obtain a suspension;
b. and (3) compound mixing: and mixing the grinding particles, the suspension and water according to the proportion and uniformly stirring to obtain the grinding fluid.
Due to the application of the technical scheme, the invention has the beneficial effects that:
1. according to the scheme, the two grinding particles made of different materials are added into the quartz glass grinding fluid simultaneously, the hardness of the two grinding particles is different, the diamond particles with high hardness are beneficial to effectively removing the quartz glass material, and the alumina particles with slightly low hardness can repair cracks caused by diamond processing.
2. In the quartz glass grinding fluid provided by the scheme, polyethylene glycol is used as a dispersing agent, oleic acid is used as a suspending agent, and effective dispersion of grinding particles in the grinding fluid can be ensured by proper proportion, so that the increase of the surface roughness of ground quartz caused by the aggregation of the grinding particles is avoided.
3. In the quartz glass grinding fluid provided by the scheme, sodium dodecyl benzene sulfonate is used as a surfactant, so that the potential of the surface of grinding particles can be effectively adjusted, the grinding particles are prevented from being aggregated, excessive crystallization growth of inclusions in cracks caused in the grinding process is inhibited, and the surface roughness of the ground quartz glass is reduced.
Detailed Description
The following description of the embodiments of the present invention is provided for illustrative purposes, and other advantages and effects of the present invention will become apparent to those skilled in the art from the present disclosure.
Example (b):
the invention provides a grinding fluid for grinding quartz glass, aiming at the problems in the prior art in the grinding and processing process of quartz glass, and the grinding fluid can be used for effectively removing the quartz glass material and simultaneously reducing the roughness of the ground quartz glass material.
The technical solution of the invention is as follows:
the quartz glass grinding fluid comprises the following components in parts by weight:
grinding particles 20-40 water 40-80 suspension 5-20;
wherein the grinding particles comprise the following components in parts by weight:
2-50% of diamond and 1 of alumina;
the suspension comprises the following components in parts by weight:
dispersant 5-20 suspending agent 50-90 surfactant 3-10.
The particle size of diamond is 2-5 times of that of alumina, two grinding particles made of different materials are added into quartz glass grinding fluid at the same time, the hardness of the two grinding particles is different, the diamond particles with high hardness are beneficial to effectively removing quartz glass materials, and the alumina particles with slightly low hardness can repair cracks caused by diamond processing.
Furthermore, the dispersing agent is polyethylene glycol, the suspending agent is oleic acid, and the grinding particles can be effectively dispersed in the grinding fluid by proper proportion, so that the increase of the roughness of the ground quartz surface caused by the aggregation of the grinding particles is avoided.
Furthermore, the surfactant is sodium dodecyl benzene sulfonate, so that the potential of the surface of the grinding particles can be effectively adjusted, the grinding particles are prevented from being aggregated, excessive crystal growth of inclusions in cracks caused in the grinding process is inhibited, and the surface roughness of the ground quartz glass is reduced.
The foregoing embodiments are merely illustrative of the principles and utilities of the present invention and are not intended to limit the invention. Any person skilled in the art can modify or change the above-mentioned embodiments without departing from the spirit and scope of the present invention. Accordingly, it is intended that all equivalent modifications or changes which can be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be covered by the claims of the present invention.
Claims (6)
1. The quartz glass grinding fluid is characterized by comprising the following components in parts by weight:
20-40 parts of grinding particles, 40-80 parts of water and 5-20 parts of suspension;
the grinding particles comprise the following components in parts by weight:
2-50% of diamond and 1% of alumina;
the suspension comprises the following components in parts by weight:
5-20 parts of dispersing agent, 50-90 parts of suspending agent and 3-10 parts of surfactant.
2. The silica glass polishing slurry according to claim 1, wherein: the particle size of the diamond is 2-5 times of that of the aluminum oxide.
3. The silica glass polishing slurry according to claim 1, wherein: the dispersant is polyethylene glycol.
4. The silica glass polishing slurry according to claim 1, wherein: the suspending agent is oleic acid.
5. The silica glass polishing slurry according to claim 1, wherein: the surfactant is sodium dodecyl benzene sulfonate.
6. A method for producing the silica glass polishing slurry according to any one of claims 1 to 5, comprising the steps of:
a. primary mixing: uniformly mixing diamond and alumina according to a ratio to obtain grinding particles; mixing a dispersing agent, a suspending agent and a surfactant according to a ratio, and uniformly stirring to obtain a suspension;
b. and (3) compound mixing: and mixing the grinding particles, the suspension and water according to the proportion and uniformly stirring to obtain the grinding fluid.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110315836.0A CN113025210A (en) | 2021-03-24 | 2021-03-24 | Quartz glass grinding fluid and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110315836.0A CN113025210A (en) | 2021-03-24 | 2021-03-24 | Quartz glass grinding fluid and preparation method thereof |
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| Publication Number | Publication Date |
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| CN113025210A true CN113025210A (en) | 2021-06-25 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN202110315836.0A Pending CN113025210A (en) | 2021-03-24 | 2021-03-24 | Quartz glass grinding fluid and preparation method thereof |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117921451A (en) * | 2024-03-25 | 2024-04-26 | 宁波云德半导体材料有限公司 | Quartz ring and processing technology thereof |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101186804A (en) * | 2007-11-21 | 2008-05-28 | 北京国瑞升科技有限公司 | Water diamond lapping liquid and its preparation method and use |
| CN102311717A (en) * | 2010-06-30 | 2012-01-11 | 中国科学院微电子研究所 | High-hardness micron grinding fluid and preparation method thereof |
| CN102337084A (en) * | 2011-07-25 | 2012-02-01 | 郑州磨料磨具磨削研究所 | Grinding fluid for processing LED (light-emitting diode) substrate and preparation method thereof |
| CN103254799A (en) * | 2013-05-29 | 2013-08-21 | 陈玉祥 | Hydrophilic diamond-suspended grinding and polishing solution and preparation method thereof |
| CN109825197A (en) * | 2019-01-02 | 2019-05-31 | 山东天岳先进材料科技有限公司 | A kind of SiC single crystal slice lapping water base lapping liquid and preparation method thereof |
| CN110699041A (en) * | 2019-10-28 | 2020-01-17 | 烟台胜道电子科技有限公司 | Particle composition for grinding |
-
2021
- 2021-03-24 CN CN202110315836.0A patent/CN113025210A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101186804A (en) * | 2007-11-21 | 2008-05-28 | 北京国瑞升科技有限公司 | Water diamond lapping liquid and its preparation method and use |
| CN102311717A (en) * | 2010-06-30 | 2012-01-11 | 中国科学院微电子研究所 | High-hardness micron grinding fluid and preparation method thereof |
| CN102337084A (en) * | 2011-07-25 | 2012-02-01 | 郑州磨料磨具磨削研究所 | Grinding fluid for processing LED (light-emitting diode) substrate and preparation method thereof |
| CN103254799A (en) * | 2013-05-29 | 2013-08-21 | 陈玉祥 | Hydrophilic diamond-suspended grinding and polishing solution and preparation method thereof |
| CN109825197A (en) * | 2019-01-02 | 2019-05-31 | 山东天岳先进材料科技有限公司 | A kind of SiC single crystal slice lapping water base lapping liquid and preparation method thereof |
| CN110699041A (en) * | 2019-10-28 | 2020-01-17 | 烟台胜道电子科技有限公司 | Particle composition for grinding |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN117921451A (en) * | 2024-03-25 | 2024-04-26 | 宁波云德半导体材料有限公司 | Quartz ring and processing technology thereof |
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Application publication date: 20210625 |
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