CN113001847A - Preparation method of butyronitrile gloves - Google Patents

Abstract

The invention relates to a preparation method of butyronitrile gloves, which comprises the steps of I, injecting colloid; step two, a hand membrane gluing process; step three, cleaning the side wall of the tank body of the gum dipping tank; step four, cleaning the bottom of the tank body of the gum dipping tank; step five, an impurity gathering process; sixthly, impurity discharging; step seven, a cleaning surface switching procedure; the invention solves the technical problems that when the glue is applied to the body of the dipping tank, the glue is attached to the inner wall of the body of the dipping tank, the machine needs to be stopped for cleaning, and the purity of the glue in the body of the dipping tank is influenced.

Description

Preparation method of butyronitrile gloves

Technical Field

The invention relates to the technical field of butyronitrile gloves, in particular to a preparation method of butyronitrile gloves.

Background

The nitrile rubber is prepared from butadiene and acrylonitrile by an emulsion polymerization method, and the product has excellent oil resistance, higher wear resistance and better heat resistance. The high-quality nitrile rubber is matched with other additives and is refined and processed; the butyronitrile gloves are free of protein, free of anaphylactic reaction to human skin, non-toxic, harmless, durable, good in adhesion, and widely used in industries such as housework, electronics, chemical industry, water industry, glass, food and the like, protection of factories, hospitals, scientific research and the like.

Each independent processing part for processing the existing butyronitrile gloves is provided with an independent power source, so that a large amount of electric power is wasted.

Patent document CN202011086360X discloses a butyronitrile glove demoulding and conveying mechanism with a cleaning bin, which is used for a chain conveying belt horizontally arranged for conveying a glove mould, and the chain conveying belt sequentially passes through the cleaning bin for cleaning gloves and a demoulding part for demoulding the gloves, wherein: the chain conveyer belt moves to respectively drive the cleaning rollers in the cleaning bin to rotate to clean the gloves and the demolding rollers in the demolding part to rotationally demold the gloves; according to the invention, the conveying part of the butyronitrile gloves is set as the horizontal chain conveying belt, so that the cleaning rollers in the cleaning bin and the demoulding rollers in the demoulding part which pass through the conveying part are driven to rotate automatically by the movement of the chain conveying belt, the cleaning bin and the demoulding part are prevented from being provided with power parts independently, and the whole butyronitrile gloves demoulding conveying mechanism is optimized.

However, in the actual use process, the inventor finds that when the glue is applied to the body of the dipping tank, the glue adheres to the inner wall of the body of the dipping tank, and needs to be stopped for cleaning, and the purity of the glue in the body of the dipping tank is affected.

Disclosure of Invention

Aiming at the defects of the prior art, the invention aims to complete the automatic cleaning work of the side wall and the bottom of the impregnation tank body in the process of enabling the colloid to flow for one circle along the impregnation tank body by setting the cleaning process of the bottom of the impregnation tank body and the cleaning process of the side wall of the impregnation tank body, thereby ensuring that the impregnation tank body keeps a clean state all the time in the gluing work process.

Aiming at the technical problems, the technical scheme is as follows: a method for preparing a nitrile glove comprises the following steps:

the method comprises the following steps that firstly, a colloid injection procedure is carried out, wherein colloid is injected into the lower end of a groove body of a glue dipping groove from a glue storage box, the colloid injected into the groove body of the glue dipping groove enters a gluing space from an impurity discharge space under the driving of a transmission mechanism, and circularly flows between the gluing space and the impurity discharge space;

step two, a hand membrane gluing process, in which a transmission unit drives a glove mold to fall into a groove body of a glue dipping groove to finish automatic gluing;

step three, cleaning the side wall of the impregnation tank body, wherein the first cleaning mechanism is driven by the chain mechanism to transmit, so that the first cleaning mechanism finishes the automatic cleaning work on the side wall of the impregnation tank body in the process that the colloid flows along the impregnation tank body for a circle;

step four, a step of cleaning the bottom of the tank body of the impregnation tank, wherein the step three is synchronous, and the chain mechanism drives the second cleaning mechanism to transmit, so that the second cleaning mechanism finishes the automatic cleaning work on the bottom of the tank body of the impregnation tank in the process that the colloid flows along the tank body of the impregnation tank for a circle;

step five, in an impurity gathering process, when the brush roll moves to the first discharging assembly, the chain moving mechanism stops working at the moment, the distance sensor drives the horizontal pushing cylinder to automatically start, the limiting plate moves to the bottom of the groove body of the gum dipping groove, impurities are blocked by the limiting plate, the colloid moves along the vertical direction through the lifting piece to complete scraping work of the scraper unit, and the impurities automatically fall under the action of gravity; meanwhile, the telescopic unit a acts on the telescopic unit a through the translation piece, the push-out cylinder discharges sediment in front of the brush roller, and the flat push plate discharges the sediment in front of the scraper unit which is scraped by the scraper unit and falls;

step six, impurity discharging, wherein after the pushing barrel and the flat push plate enter the protruding platform together, the control door is automatically opened, the colloid and the impurities enter the first collecting box together, the glue below the filter plate is collected, and the impurities on the filter plate are collected;

step seven, a cleaning surface switching process step, which is synchronous with the step six, wherein in the downward moving process of a driven rack of a switching assembly, the driven rack drives a driving gear to rotate, the rotating driving gear drives a rotating rod to rotate, after the rotating rod rotates to an impurity removing plate, the brush roll and the brush finish scraping the cleaning bottom surface under the action of the impurity removing plate, and then impurities drop into a second collecting box under the shaking of a tension spring to be collected; after the brush roll on the rotating rod moves to the friction roll, the friction roll drives the brush roll to rotate circumferentially by a distance between an elastic stop block a and a pressing block b, then switching work is completed, and finally the rotating rod resets to a glue dipping groove body to wait for next cleaning work.

Preferably, in the first step, the transmission mechanism 0 transmits clockwise.

Preferably, in the first step, the stirring speed of the transmission mechanism is 89 rpm.

Preferably, in the first step, the temperature of the latex in the dip tank body is 20-24 ℃.

Preferably, the latex temperature in the dip tank body is 22 ℃.

Preferably, the latex temperature detection mode in the dipping tank body adopts a temperature sensor.

Preferably, in the first step, the pH value of the latex in the dipping tank is 7.6-8.2.

Preferably, in the fifth step, the scraper unit and the brush roll are arranged in a staggered mode along the vertical direction.

Preferably, in the seventh step, the brush roller is switched and rotated by 10-15 degrees each time.

Preferably, in step seven, the brush roller is rotated by 15 ° in each switching operation.

The invention has the beneficial effects that:

(1) according to the glue dipping tank, the bottom cleaning process of the body of the glue dipping tank and the side wall cleaning process of the body of the glue dipping tank are arranged, so that the side wall and the bottom of the body of the glue dipping tank are automatically cleaned in the process that glue flows for one circle along the body of the glue dipping tank, the body of the glue dipping tank is kept clean all the time in the gluing process, the traditional machine halt is replaced to discharge the glue, the automatic cleaning work of the body of the glue dipping tank is manually carried out, the timeliness is high, the extra labor force output is replaced, and the production cost is reduced;

(2) according to the invention, the dip tank body is obliquely and upwards arranged and is of a single-layer structure, on one hand, the single-layer opening is upwards arranged to replace the traditional upper and lower rail type connection, so that the dip tank is not required to be disassembled for cleaning, the dip tank is simple and rapid, and meanwhile, the colloid can be ensured to always keep a flowing state in the inclination process of the dip tank body, the colloid is not easy to precipitate, the uniformity of gluing is further facilitated, and the product quality is improved; on the other hand, the processing is convenient, and the production cost is reduced;

(3) according to the invention, through the first impurity collecting mechanism and the second impurity collecting mechanism, after the first cleaning mechanism and the second cleaning mechanism complete a circle of cleaning work on the slot body of the gum dipping slot, the first impurity collecting mechanism automatically discharges and collects precipitated colloid, then the first impurity collecting mechanism is utilized to carry out slag removal work, the second impurity collecting mechanism drives the second cleaning mechanism to carry out slag removal work on the cleaning surface, and meanwhile, the cleaning surface is switched to be a new cleaning surface, so that the cleaning effect is improved, and the service life of the cleaning surface is prolonged.

In conclusion, the equipment has the advantages of simple structure and self-cleaning, and is particularly suitable for the technical field of the butyronitrile gloves.

Drawings

In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings described below are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to the drawings without creative efforts.

Fig. 1 is a schematic structural diagram of a preparation method of a butyronitrile glove.

Fig. 2 is a schematic structural diagram of a self-cleaning device for sizing nitrile gloves.

Fig. 3 is a schematic structural diagram of the glove conveying mechanism.

FIG. 4 is a schematic structural diagram of the body of the dip tank.

FIG. 5 is a schematic cross-sectional view of the body of the dip tank.

Fig. 6 is a schematic structural view of the first cleaning mechanism and the second cleaning mechanism.

Fig. 7 is a schematic transmission operation diagram of the first cleaning mechanism.

Fig. 8 is a schematic structural view of the first cleaning mechanism.

Fig. 9 is a schematic structural view of the second cleaning mechanism.

Fig. 10 is a first schematic sectional view of the second cleaning mechanism.

Fig. 11 is a second schematic cross-sectional view of the second cleaning mechanism.

Fig. 12 is a third schematic sectional view of the second cleaning mechanism.

Fig. 13 is a schematic transmission operation diagram of the second cleaning mechanism.

Fig. 14 is a first transmission working diagram of the second impurity collecting mechanism.

Fig. 15 is a second driving operation diagram of the second impurity collecting mechanism.

Fig. 16 is a schematic view showing the operation of the first impurity collecting mechanism.

Fig. 17 is a first schematic diagram of the transmission operation of the first discharging assembly.

Fig. 18 is a second schematic transmission operation diagram of the first discharging assembly.

Fig. 19 is a third schematic diagram of the transmission operation of the first discharging assembly.

Fig. 20 is a fourth schematic view of the transmission operation of the first discharging assembly.

Fig. 21 is a fifth schematic transmission operation diagram of the first discharging assembly.

Detailed Description

The technical scheme in the embodiment of the invention is clearly and completely explained by combining the attached drawings.

Example one

As shown in fig. 1, a method for preparing a butyronitrile glove comprises the following steps:

step one, injecting colloid, namely, injecting the colloid into the lower end of a steeping vat body 2 from a colloid storage box, and enabling the colloid injected into the steeping vat body 2 to enter a gluing space 202 from an impurity discharge space 203 under the driving of a transmission mechanism 204 and to circularly flow between the gluing space 202 and the impurity discharge space 203;

step two, in the hand membrane gluing process, the transmission unit 11 drives the glove mold 12 to fall into the glue dipping groove body 2 to finish automatic gluing;

step three, in the step of cleaning the side wall of the impregnation tank body, the chain mechanism 205 drives the first cleaning mechanism 3 to transmit, so that the first cleaning mechanism 3 finishes the automatic cleaning work on the side wall of the impregnation tank body 2 in the process that the colloid flows along the impregnation tank body 2 for a circle;

step four, a step of cleaning the bottom of the body of the dip tank, which is synchronous with the step three, wherein the linkage mechanism 205 drives the second cleaning mechanism 4 to transmit, so that the second cleaning mechanism 4 finishes the automatic cleaning work on the bottom of the body 2 of the dip tank in the process that the colloid flows along the body 2 of the dip tank for a circle;

step five, in the impurity gathering process, when the brush roll 48 moves to the first discharging assembly 51, the chain moving mechanism 205 stops working at the moment, the distance sensor drives the horizontal pushing cylinder 511 to automatically start, the limiting plate 513 moves to the bottom of the glue dipping groove body 2, the impurities are blocked by the limiting plate 513, the colloid moves along the vertical direction through the lifting piece 518 to complete the scraping work of the scraper unit 33, and the impurities automatically fall under the action of gravity; meanwhile, the telescopic unit a512 acts on the telescopic unit a512 through a translation member 517, the push-out cylinder 514 discharges the sediment in front of the brush roller 48 and the flat push plate 515 discharges the sediment scraped by the scraper unit 33 in front of the scraper unit 33;

step six, in the impurity discharging process, after the pushing cylinder 514 and the flat push plate 515 enter the protruding platform 521 together, the control door 522 is automatically opened, the colloid and the impurities enter the first collecting box 523 together, the glue below the filter plate 524 is collected, and the impurities on the filter plate 524 are collected;

step seven, a cleaning surface switching process step, which is synchronous with the step six, in the downward moving process of the driven rack 612 of the switching assembly 61, the driven rack 612 drives the driving gear 611 to rotate, the rotating driving gear 611 drives the rotating rod 42 to rotate, after the rotating rod 42 rotates to the impurity removing plate 621, the brush roller 48 and the brush 47 complete scraping the cleaning bottom surface under the action of the impurity removing plate 621, and then the impurities fall into the second collecting box 624 to be collected under the shaking of the tension spring 622; after the brush roller 48 on the rotating rod 42 moves to the friction roller 613, the friction roller 613 drives the brush roller 48 to rotate circumferentially by a distance between the elastic stop 49a and the pressing block 49b, so that the switching operation is completed, and finally the rotating rod 42 is reset to the glue dipping tank body 2 to wait for the next cleaning operation.

In this embodiment, through setting up the clean process of steeping vat cell body bottom and the clean process of steeping vat cell body lateral wall, make the colloid flow the in-process of a week along steeping vat cell body 2, accomplish the self-cleaning work to the lateral wall of steeping vat cell body 2 and bottom, thereby guarantee that steeping vat cell body 2 keeps clean state constantly in the course of the working of rubberizing, on the other hand, replace the tradition to need to shut down and discharge the colloid, and the manual work is to the self-cleaning work of steeping vat cell body 2, the high just extra labour output of replacement of timeliness, reduction in production cost.

Further, in the first step, the transmission mechanism 204 transmits clockwise.

Further, in the first step, the stirring speed of the transmission mechanism 204 is 89 rpm.

Further, in the first step, the temperature of the latex in the dip tank body 2 is 20-24 ℃.

Further, the temperature of the latex in the dip tank body 2 is 22 ℃.

Further, a temperature sensor is adopted in a latex temperature detection mode in the dip tank body 2.

Further, in the first step, the pH value of the latex in the dipping tank body 2 is 7.6-8.2.

Further, in the fifth step, the scraper unit 33 and the brush roll 48 are arranged in a staggered manner in the vertical direction.

Further, in the seventh step, the brush roller 48 is switched to rotate by 10-15 degrees each time.

Further, in the seventh step, the brush roller 48 is switched and rotated by 15 ° each time.

Example two

As shown in fig. 2, a self-cleaning device for sizing nitrile gloves comprises:

the glove conveying mechanism 1 comprises a conveying unit 11 and a plurality of groups of glove molds 12 which are uniformly arranged on the conveying unit 11 at equal intervals;

the glue dipping tank body 2 is obliquely and downwards arranged and is positioned below the transmission unit 11, the glue dipping tank body 2 is of an oval structure, a partition plate 201 is arranged along the middle of the glue dipping tank body 2 and along the length direction of the glue dipping tank body 2, and a glue applying space 202 and an impurity discharging space 203 are formed between the glue dipping tank body 2 and the partition plate 201;

the transmission mechanism 204 is arranged at the lower end part of the impregnation tank body 2 and is positioned in the impurity discharge space 203;

the chain-driven mechanism 205 is arranged right above the partition plate 201 and synchronously carries out conveying work along the transmission direction of water in the dip tank body 2, and the chain-driven mechanism 205 is intermittently started;

the first cleaning mechanism 3 is arranged along the transmission direction of the chain mechanism 205, and the first cleaning mechanism 3 is used for cleaning the side wall of the glue dipping tank body 2;

the second cleaning mechanism 4 is arranged along the transmission direction of the chain mechanism 205, the second cleaning mechanism 4 is used for cleaning the bottom of the glue dipping tank body 2, and the first cleaning mechanism 3 and the second cleaning mechanism 4 are arranged at intervals;

the first impurity collecting mechanism 5, the first impurity collecting mechanism 5 includes a first discharging component 51 arranged in the partition plate 201 and a first collecting component 52 for collecting the impurities discharged from the first discharging component 51; and

and the second impurity collecting mechanism 6 is arranged above the dip tank body 2, and comprises a switching component 61 for driving the second cleaning mechanism 4 to automatically switch the decontamination surface and a second collecting component 62 for cleaning the second cleaning mechanism 4 in the switching process for the second time.

In this embodiment, through setting up first clean mechanism 3 of chain 205 drive and second clean mechanism 4, make the colloid flow the in-process of a week along steeping vat cell body 2, first clean mechanism 3 and second clean mechanism 4 accomplish the self-cleaning work to the lateral wall and the bottom of steeping vat cell body 2, thereby guarantee that steeping vat cell body 2 keeps clean state constantly in the course of the working of rubberizing, on the other hand, replace the tradition to need to shut down and discharge the colloid, and artifical self-cleaning work to steeping vat cell body 2, the timeliness is high and replace extra labour to export, reduction in production cost.

Secondly, the glue dipping tank body 2 is obliquely and upwards arranged and is arranged in a single-layer structure, on one hand, the single-layer opening is upwards arranged to replace the traditional upper and lower rail type connection, so that the glue dipping tank is not required to be disassembled for cleaning, the operation is simple and rapid, and meanwhile, the glue can be ensured to always keep a flowing state in the inclination process of the glue dipping tank body 2, the glue is not easy to precipitate, the uniform degree of gluing is facilitated, and the product quality is improved; on the other hand, the processing is convenient, and the production cost is reduced.

Thirdly, through setting up first impurity collection mechanism 5 and second impurity collection mechanism 6, after first clean mechanism 3 and the clean work of second clean mechanism 4 completion to 2 a week of steeping vat cell body, first impurity collection mechanism 5 carries out automatic discharge collection with the colloid that deposits, recycle first impurity collection mechanism 5 and carry out row sediment work in, second impurity collection mechanism 6 drive second clean mechanism 4 clears away row sediment work to the cleaning surface, switch simultaneously and clean the surface and adjust into a new cleaning surface, improve the life of clean effect and cleaning surface.

Further, as shown in fig. 3, when the transmission unit 11 is transmitted to the upper side of the dip tank body 2, the glove mold 12 moves downward into the dip tank body 2 to complete the gluing operation, and resets after the gluing operation to complete the operation of separating from the dip tank body 2.

Further, as shown in fig. 3 to 5, the transmission mechanism 204 includes a bracket 21 disposed on the dip tank body 2, a driving shaft a22 rotatably disposed on the bracket 21, and a turbine 23 coaxially and fixedly connected with a lower end of the driving shaft a22, the turbine 23 is configured to drive water at the lower end of the dip tank body 2 to flow back into the glue applying space 202 from the impurity discharging space 203, and the driving shaft a22 is driven by a first motor to rotate continuously.

In this embodiment, through setting up drive mechanism 204 for turbine 23 is rotating the in-process, can be with the colloid transmission that is located the steeping vat cell body 2 bottom to the upper end of steeping vat cell body 2, and the colloid that is located the upper end flows to from in impurity discharge space 203 under the action of gravity, and then accomplishes the backward flow work of whole colloid at steeping vat cell body 2.

Further, as shown in fig. 6 to 8, the first cleaning mechanism 3 includes:

a base b31, the base b31 being disposed on any link of the linkage 205;

the supporting rod 32 is fixedly connected with the base b31 and vertically faces downwards; and

and the scraper unit 33 is arranged at the lower end of the support rod 32 and is in a concave frame structure, and the outer wall of the scraper unit 33 is in contact with the inner wall of the glue dipping groove body 2.

In the present embodiment, the first cleaning mechanism 3 is provided so that the scraper unit 33 finishes scraping off the inner wall of the dip tank body 2 under the driving of the chain mechanism 205.

It should be noted that the transmission speed of the linkage mechanism 205 is not less than the flow rate of the colloid in the dip tank body 2.

Further, as shown in fig. 9 to 12, the second cleaning mechanism 4 includes:

a base a41, the base a41 being disposed on any link of the linkage 205;

the rotating rod 42 is rotatably arranged in a guide groove 44 which is arranged on the base a41 and is in an L-shaped structure through a circular ring 43;

the limiting ring 45 is fixedly arranged at the lower end of the rotating rod 42;

the one-way bearing 46 is arranged in the limiting ring 45 in a matching and rotating mode;

the hairbrush 47 is arranged at the lower end of the limiting ring 45;

the brush roller 48 is sleeved outside the one-way bearing 46; and

the clamping piece 49 comprises a plurality of groups of elastic stoppers 49a arranged on the inner wall of the limit ring 45 and pressing blocks 49b arranged on the outer wall of the one-way bearing 46 and matched with the elastic stoppers 49a and correspondingly arranged.

In the present embodiment, the second cleaning mechanism 4 is arranged such that the brush roller 48 and the brush 47 complete the cleaning of the bottom of the dip tank body 2 under the driving of the chain mechanism 205.

It should be noted that the one-way bearing 46 is arranged to prevent the one-way bearing 46 from rotating clockwise during the process of flowing the colloid and the process of rubbing the bottom of the dip tank body 2, whereas when the brush roller 48 switches the brushing work surface, the brush roller 48 can rotate in the opposite direction by a certain angle to ensure the cleanness of the brush roller 48.

In addition, the limiting operation of the brush roller 48 for each rotation is completed by arranging the clamping piece 49, so that the rotation angle is switched to be fixed for each rotation.

Further, as shown in fig. 13, the squeegee unit 33 and the brush roller 48 are disposed to be vertically displaced.

In this embodiment, the cleaning of the sidewall of the dip tank body 2 by the scraper unit 33 is completed first, and then the cleaning of the bottom of the dip tank body 2 by the brush roller 48 is completed; on the other hand, the scraper unit 33 and the brush roller 48 are arranged in a staggered manner in the vertical direction, and the scraper unit and the brush roller are matched with the limiting plate 513, so that the normal flow rate circulation of the colloid in the impregnation tank body 2 is not affected even if the slag discharging operation is performed.

Further, as shown in fig. 15 to 14, the switching member 61 includes:

a driving gear 611, the driving gear 611 being coaxial with the horizontal portion of the rotating lever 42 and being synchronously driven;

a driven rack 612, wherein the driven rack 612 is fixedly connected with the telescopic unit a512 and is meshed with the driving gear 611; and

a friction roller 613, wherein the friction roller 613 is driven by a transmission member to rotate clockwise synchronously with the transmission mechanism 204, and the friction roller 613 is arranged in intermittent contact with the brush roller 48.

Further, as shown in fig. 15, the second collecting unit 62 includes:

a impurity removing plate 621, wherein the impurity removing plate 621 is positioned below the friction roller 613, a contact end part of the impurity removing plate 621 is provided with a chamfer, and the impurity removing plate 621 is installed on a frame 623 through an obliquely arranged tension spring 622; and

a second collection box 624, wherein the second collection box 624 is disposed below the impurity removing plate 621 and is used for collecting impurities on the impurity removing plate 621.

In this embodiment, through setting up 4 cooperation switching components 61 of second cleaning mechanism, make 4 every completion of second cleaning mechanism wash the work after, arrange the material in-process at first ejection of compact subassembly 51 automation, switching components 61 and the automatic switch-over work to its face of wasing after clean, make the brush roll 48 that carries out the work of wasing at every turn keep the face of wasing all the time, improve clean effect, utilize simultaneously and utilize second collection subassembly 62, accomplish the self-cleaning work to the face of wasing of brush roll 48, and then guarantee the cleanness all the time of brush roll 48, improve the life and the high-usage of brush roll 48, brush roll 48 need not change often.

In detail, in the downward moving process of the driven rack 612, the driven rack 612 drives the driving gear 611 to rotate, the rotating driving gear 611 drives the rotating rod 42 to rotate, after the rotating rod 42 rotates to the impurity removing plate 621, the brush roller 48 and the brush 47 complete scraping of the cleaned bottom surface under the action of the impurity removing plate 621, and then the impurities drop into the second collection box 624 to be collected under the shaking of the tension spring 622; after the brush roller 48 on the rotating rod 42 moves to the friction roller 613, the friction roller 613 drives the brush roller 48 to rotate circumferentially by a distance between the elastic stop 49a and the pressing block 49b, so that the switching operation is completed, and finally the rotating rod 42 is reset to the glue dipping tank body 2 to wait for the next cleaning operation.

EXAMPLE III

As shown in fig. 16 to 21, in which the same or corresponding components as those in embodiment two are denoted by the same reference numerals as those in embodiment two, only the points different from embodiment two will be described below for the sake of convenience. The third embodiment is different from the second embodiment in that:

further, as shown in fig. 16 to 21, the first discharging assembly 51 includes:

the horizontal pushing cylinder 511 is provided with a telescopic end which is vertically arranged downwards, and a telescopic unit a512 is fixedly arranged at the lower end of the horizontal pushing cylinder 511;

a limiting plate 513, wherein the limiting plate 513 is fixedly connected with the lower end of the telescopic unit a512 and is arranged in a manner of being matched with the width of the impurity discharging space 203, and the limiting plate 513 is of a filter screen structure;

the pushing cylinder 514 is made of elastic rubber materials, the pushing cylinder 514 is arranged on an outlet a510 formed in the partition plate 201 in a matching sliding mode and is horizontally arranged in the partition plate 201 through a telescopic unit b516, a flat push plate 515 is arranged on one side of the pushing cylinder 514 and is in contact with the bottom of the glue dipping groove body 2, the other end of the flat push plate is in contact with the limiting plate 513, the pushing cylinder 514 is used for discharging sediments in front of the brush roller 48, and the flat push plate 515 is used for discharging sediments in front of the scraper unit 33;

a translation member 517, wherein the translation member 517 comprises a driving rack a5171 fixedly connected with the telescopic unit b516, a driving gear a5172 meshed with the driving rack a5171, a driving gear b5173 coaxial and synchronously driven with the driving gear a5172, and a driving rack b5174 meshed with the driving gear b5173 and vertically arranged on the telescopic unit a 512; and

the lifting piece 518 comprises a connecting rod 5181 vertically arranged on the telescopic unit a512 and a removing brush 5182 fixedly connected with the connecting rod 5181 and matched with the scraper unit 33.

Further, as shown in fig. 16, the first collecting unit 52 includes:

the protruding platform 521 is arranged in the dip tank body 2 and protrudes outwards, and the protruding platform 521 is matched with the push-out cylinder 514 in structure;

a control gate 522, wherein the control gate 522 is driven by an electric signal to be automatically opened and closed; and

the first collecting box 523 is provided with a filter plate 524 inside, and liquid below the filter plate 524 is circularly pumped to the upper end of the glue dipping tank body 2 for recycling through the pump body.

In this embodiment, through setting up first collection subassembly 52 cooperation first ejection of compact subassembly 51 for accomplish a week impurity discharge during operation, accomplish earlier the regional restriction to arranging sediment work by limiting plate 513, reuse piece 518 accomplishes the automatically cleaning work to scraper blade unit 33, treat impurity fall behind, translation piece 517 redrives and pushes out a section of thick bamboo 514 and flat push pedal 515 and accomplishes the complete discharge work to impurity, and the waste material is automatic to be discharged when clean thorough.

In detail, when the brush roll 48 moves to the first discharging assembly 51, at this time, the chain moving mechanism 205 stops working, the distance sensor drives the horizontal pushing cylinder 511 to automatically start, the limiting plate 513 moves to the bottom of the gum dipping tank body 2, impurities are blocked by the limiting plate 513, colloid is output through the filter screen part of the limiting plate 513, then the telescopic unit a512 continues to extrude, the telescopic unit a512 acts on the removing brush 5182 through the connecting rod 5181, the removing brush 5182 moves in the vertical direction to complete the scraping work of the scraper unit 33, and the impurities automatically fall under the action of gravity;

meanwhile, the telescopic unit a512 drives the driving gear a5172 to rotate through the driving rack a5171, the rotating driving gear a5172 drives the driving rack b5174 to act on the telescopic unit a512, the pushing cylinder 514 discharges sediments in front of the brush roller 48, the flat push plate 515 scrapes the sediments in front of the scraper unit 33 and falls off from the scraper unit 33, after the pushing cylinder 514 and the flat push plate 515 enter the protruding platform 521 together, the control door 522 is automatically opened, the colloid and impurities enter the first collecting box 523 together, the colloid under the filter plate 524 is collected, and the impurities on the filter plate 524 are collected.

The working process is as follows:

the chain mechanism 205 drives the first cleaning mechanism 3 and the second cleaning mechanism 4, so that the first cleaning mechanism 3 and the second cleaning mechanism 4 finish automatic cleaning of the side wall and the bottom of the impregnation tank body 2 in the process that the colloid flows along the impregnation tank body 2 for a circle;

when the brush roll 48 moves to the first discharging assembly 51, the chain moving mechanism 205 stops working at the moment, the distance sensor drives the horizontal pushing cylinder 511 to automatically start, the limiting plate 513 moves to the bottom of the gum dipping groove body 2, impurities are blocked by the limiting plate 513, colloid is output through a filter screen part of the limiting plate 513, then the telescopic unit a512 continues to extrude, the telescopic unit a512 acts on the removing brush 5182 through the connecting rod 5181, the removing brush 5182 moves in the vertical direction to complete scraping work on the scraper unit 33, and the impurities automatically fall under the action of gravity;

meanwhile, the telescopic unit a512 drives the driving gear a5172 to rotate through the driving rack a5171, the rotating driving gear a5172 drives the driving rack b5174 to act on the telescopic unit a512, the pushing cylinder 514 discharges sediments in front of the brush roller 48, the flat push plate 515 scrapes the sediments in front of the scraper unit 33 and falls off from the scraper unit 33, after the pushing cylinder 514 and the flat push plate 515 enter the protruding platform 521 together, the control door 522 is automatically opened, the colloid and impurities enter the first collecting box 523 together, the colloid under the filter plate 524 is collected, and the impurities on the filter plate 524 are collected.

In the description of the present invention, it is to be understood that the terms "front-back", "left-right", and the like indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience in describing the present invention and simplifying the description, but do not indicate or imply that the referred device or component must have a specific orientation, be constructed in a specific orientation, and be operated, and thus should not be construed as limiting the invention.

Of course, in this disclosure, those skilled in the art will understand that the terms "a" and "an" should be interpreted as "at least one" or "one or more," i.e., in one embodiment, a number of an element may be one, and in another embodiment, a number of the element may be plural, and the terms "a" and "an" should not be interpreted as limiting the number.

The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily made by those skilled in the art in light of the technical teaching of the present invention should be included within the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.

Claims (10)

1. A preparation method of butyronitrile gloves is characterized by comprising the following steps:

the method comprises the steps that firstly, a colloid injection procedure is carried out, colloid is injected into the lower end of a steeping vat body (2) from a colloid storage box, the colloid injected into the steeping vat body (2) enters a gluing space (202) from an impurity discharge space (203) under the driving of a transmission mechanism (204), and circularly flows between the gluing space (202) and the impurity discharge space (203);

step two, in the hand membrane gluing process, the transmission unit (11) drives the glove mold (12) to fall into the dipping groove body (2) to finish automatic gluing;

step three, cleaning the side wall of the impregnation tank body, wherein the first cleaning mechanism (3) is driven to transmit by the chain mechanism (205), so that the first cleaning mechanism (3) finishes the automatic cleaning work on the side wall of the impregnation tank body (2) in the process that the colloid flows along the impregnation tank body (2) for a circle;

step four, a step of cleaning the bottom of the impregnation tank body, wherein the step three is synchronous, the chain mechanism (205) drives the second cleaning mechanism (4) to transmit, so that the second cleaning mechanism (4) finishes the automatic cleaning work on the bottom of the impregnation tank body (2) in the process that the colloid flows along the impregnation tank body (2) for one circle;

step five, an impurity gathering procedure, wherein when the brush roll (48) moves to the first discharging assembly (51), the chain moving mechanism (205) stops working, the distance sensor drives the horizontal pushing cylinder (511) to automatically start, the limiting plate (513) moves to the bottom of the glue dipping groove body (2), impurities are blocked by the limiting plate (513), the colloid moves along the vertical direction through the lifting piece (518) to complete scraping work on the scraper unit (33), and the impurities automatically fall under the action of gravity; meanwhile, the telescopic unit a (512) acts on the telescopic unit a (512) through a translation piece (517), the push-out cylinder (514) discharges sediment in front of the brush roller (48), and the flat push plate (515) discharges the sediment scraped and fallen by the scraper unit (33) in front of the scraper unit (33);

sixthly, impurity discharging, wherein after the push-out barrel (514) and the flat push plate (515) enter the protruding platform (521) together, the control door (522) is automatically opened, the colloid and the impurities enter the first collecting box (523) together, the colloid below the filter plate (524) is collected, and the impurities above the filter plate (524) are collected;

step seven, a cleaning surface switching process step, which is synchronous with the step six, wherein in the downward moving process of the driven rack (612) of the switching assembly (61), the driven rack (612) drives the driving gear (611) to rotate, the rotating driving gear (611) drives the rotating rod (42) to rotate, after the rotating rod (42) rotates to the impurity removing plate (621), the brush roller (48) and the brush (47) complete scraping of the cleaning bottom surface under the action of the impurity removing plate (621), and then impurities fall into the second collecting box (624) to be collected under the shaking of the tension spring (622); after the brush roller (48) on the rotating rod (42) moves to the friction roller (613), the friction roller (613) drives the brush roller (48) to rotate circumferentially for a distance between an elastic stop block (49a) and a pressing block (49b), switching work is further completed, and finally the rotating rod (42) is reset to the glue dipping groove body (2) to wait for next cleaning work.

2. A method for preparing nitrile gloves according to claim 1, wherein in the first step, the driving mechanism (204) drives clockwise.

3. A method for preparing nitrile gloves according to claim 1, wherein in the first step, the stirring speed of the transmission mechanism (204) is 89 rpm.

4. The method for preparing nitrile gloves according to claim 1, wherein in the first step, the temperature of the latex in the dipping tank body (2) is 20-24 ℃.

5. A process for the preparation of nitrile gloves according to claim 1, wherein the latex temperature in the dipping bath body (2) is 22 ℃.

6. The method for preparing nitrile gloves according to claim 1, wherein a temperature sensor is adopted as a latex temperature detection mode in the dipping groove body (2).

7. The method for preparing nitrile gloves according to claim 1, wherein in the first step, the pH value of the latex in the dipping groove body (2) is 7.6-8.2.

8. The method for preparing nitrile gloves according to claim 1, wherein in the fifth step, the scraper unit (33) and the brush roll (48) are vertically arranged in a staggered manner.

9. A method for preparing nitrile gloves as recited in claim 1, wherein in step seven, the brush roller (48) is rotated 10-15 ° for each switching.

10. A method for preparing nitrile gloves as recited in claim 1, wherein in step seven, the brush roller (48) is rotated 15 ° for each switching.

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