CN112965339B - Use method and detection system of photoresist material - Google Patents
Use method and detection system of photoresist material Download PDFInfo
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- CN112965339B CN112965339B CN202110153468.4A CN202110153468A CN112965339B CN 112965339 B CN112965339 B CN 112965339B CN 202110153468 A CN202110153468 A CN 202110153468A CN 112965339 B CN112965339 B CN 112965339B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G47/00—Article or material-handling devices associated with conveyors; Methods employing such devices
- B65G47/74—Feeding, transfer, or discharging devices of particular kinds or types
Abstract
The application discloses a method for using a photoresist material and a detection system, comprising the following steps: the freezing chamber receives the photoresist material, and the photoresist material enters a freezing state; when a photoresist material unfreezing instruction is received, the photoresist material is sent out of the freezing chamber and sent into the unfreezing chamber, and the photoresist material enters an unfreezing state; when an on-machine instruction is received, the photoresist material is sent out of the unfreezing chamber and sent to the machine table; when the machine receives the light resistance material, detecting the light resistance material, if the detection is qualified, sending the light resistance material to the machine, and enabling the light resistance material to enter a machine-on state; when the preset condition is monitored, detecting material information of the photoresist material, and sending the photoresist material back to the unfreezing chamber or the processing chamber according to the material information; by means of the system detection automation mode, the condition that a worker possibly makes mistakes is avoided, working hours are reduced, and cost is saved.
Description
Technical Field
The application relates to the technical field of display, in particular to a using method and a detection system of a light resistance material.
Background
The photolithography process is a common process in semiconductor manufacturing processes, and a Photoresist (PR), also called photoresist or photoresist, refers to a resist film material whose solubility is changed by various lights or radiations, is a key material in photolithography processes, and is mainly applied to integrated circuits and display panels.
At present, the process that the photoresistance material removed the board from the freezer still mainly relies on the manual work to judge and instruct that transport equipment carries to the board on, for example: the staff takes out the photoresistance material from freezing indoor, then uses transport means such as shallow to transport the photoresistance material to the room of thawing, and the photoresistance material that will thaw is transported to the board, can freeze the used repeatedly that thaws many times under the circumstances of not rotting, but after the repetition many times, the photoresistance material probably produces rotten, uses rotten photoresistance material to make the board processing procedure bad, needs the manual number of times of controlling, makes mistakes easily through manual control moreover.
Disclosure of Invention
The application aims to provide a using method and a detection system of a light resistance material, and systematic control of the light resistance material is achieved.
The application discloses a method for using a photoresist material, which comprises the following steps:
step A: the freezing chamber receives the photoresist material, and the photoresist material enters a freezing state;
and B: when a photoresist material thawing command is received, the photoresist material is sent out of the freezing chamber,
and sending the photoresist material into a thawing chamber, and making the photoresist material enter a thawing state;
and C: when an on-machine instruction is received, the photoresist material is sent out of the unfreezing chamber and sent to the machine table;
step D: when the machine receives the light resistance material, detecting the light resistance material, if the detection is qualified, sending the light resistance material to the machine, and enabling the light resistance material to enter a machine-on state; and
step E: and when the preset condition is monitored, detecting material information of the photoresist material, and sending the photoresist material back to the thawing chamber or the processing chamber according to the material information.
Optionally, in step a:
when the photoresist material enters the frozen state, starting to time the freezing time of the photoresist material entering the frozen state; when the freezing time reaches a first preset time, the photoresist material enters a freezing completion state;
in the step B:
step B1: when a photoresist material unfreezing instruction is received, detecting whether the photoresist material is in a freezing completion state, and if so, sending the photoresist material into a unfreezing chamber from a freezing chamber;
step B2: when the photoresist material enters the unfreezing state, starting to time the unfreezing time of the photoresist material entering the unfreezing state; when the unfreezing time reaches a second preset time, the photoresist material enters an unfreezing completion state, and the unfreezing completion times are recorded;
in the step D:
when the machine receives the light resistance material, whether the thawing completion times of the light resistance material accord with the preset thawing times is detected, and if so, the detection is qualified.
Optionally, in step B:
when the photoresist material is detected to be sent out of the freezing chamber, timing the freezing sending-out time of the photoresist material leaving the freezing chamber;
in the step C:
when the photoresist material is detected to be sent out of the unfreezing chamber, timing the unfreezing sending-out time leaving the unfreezing chamber;
in the step D:
when the machine receives the light resistance material, whether the thawing completion times of the light resistance material accord with the preset thawing completion times or not is detected, whether the freezing sending-out time of the light resistance material accords with the preset freezing sending-out time or not is detected, whether the thawing sending-out time of the light resistance material accords with the preset thawing sending-out time or not is detected, and if the thawing sending-out time of the light resistance material accords with the preset thawing sending-out time, the detection is judged to be qualified.
Optionally, in step B:
when the photoresist material is detected to be sent out of the freezing chamber, recording the number of times of one-time freezing sending out;
in the step D:
when the machine receives the light resistance material, whether the freezing sending times of the light resistance material accord with the preset freezing sending times or not is detected, and if so, the detection is qualified.
Optionally, in step B2:
and when the photoresist material enters the thawing completion state, timing the thawing completion time, when the thawing completion time exceeds a third preset time, sending the photoresist material out of the thawing chamber, detecting the thawing completion times, and if the thawing completion times are less than the preset thawing completion times, sending the photoresist material back to the freezing chamber.
Optionally, when an emergency occurs, detecting the light resistance material in a unfreezing state; if the thawing time of the photoresist material does not reach the second preset time, determining that the photoresist material is not thawed, not recording the thawing times, and sending the photoresist material back to the freezing chamber;
and if the thawing time of the photoresist material reaches the second preset time, determining that the photoresist material is thawed, recording the thawing times once, and sending the photoresist material back to the freezing chamber.
Optionally, the preset condition includes a shutdown operation and a machine station material changing operation; the emergency situation includes a shutdown operation.
Optionally, the material information includes a material stock and a thawing completion time, and when the material stock is not zero and the thawing completion time is less than a preset thawing completion time, the material information is returned to the freezing chamber.
The application also discloses a using method of the light resistance material, the using method is automatically controlled according to a setting table, and the using method comprises the following steps:
the freezing chamber receives the light resistance material, the light resistance material enters a freezing state, and the freezing time of the light resistance material entering the freezing state is started to be counted; when the freezing time reaches a first preset time, the photoresist material enters a freezing completion state;
when a photoresist material unfreezing instruction is received, detecting whether the photoresist material is in a freezing completion state, if so, recording the number of times of one-time freezing sending and timing the time of the freezing sending out leaving the freezing chamber, sending the photoresist material out of the freezing chamber and into an unfreezing chamber, and enabling the photoresist material to enter the unfreezing state;
when the photoresist material enters the unfreezing state, starting to time the unfreezing time of the photoresist material entering the unfreezing state; when the unfreezing time reaches a second preset time, the photoresist material enters an unfreezing completion state, and the unfreezing completion times are recorded;
when the photoresist material enters a thawing completion state, timing thawing completion time, when the thawing completion time exceeds a third preset time, sending the photoresist material out of the thawing chamber, detecting the thawing completion times, and if the thawing completion times are less than the preset thawing completion times, sending the photoresist material back to the freezing chamber;
when an on-machine instruction is received, sending the light resistance material in a unfreezing finished state out of the unfreezing chamber, timing the unfreezing sending-out time leaving the unfreezing chamber, and sending the light resistance material to the machine;
when the machine receives the light resistance material, detecting whether the thawing completion times of the light resistance material accord with the preset thawing times, detecting whether the freezing sending times of the light resistance material accord with the preset freezing sending times, detecting whether the freezing sending time of the light resistance material accords with the preset freezing sending time, and detecting whether the thawing sending time of the light resistance material accords with the preset thawing sending time; if the photoresist materials are all in accordance with the standard, judging that the detection is qualified, sending the photoresist materials to a machine table, and enabling the photoresist materials to enter a machine-loading state; and
when the preset condition is monitored, detecting the material stock and the thawing completion times of the photoresistance material in the on-machine state, and when the material stock is not zero and the thawing completion times are less than the preset thawing completion times, returning the photoresistance material to the freezing chamber;
if the photoresist material is detected to be in accordance with the reset regulation of the reset overtime use table, immediately closing the subsequent flow, and resetting the state of the photoresist material according to a reset method;
wherein the setting table includes: a photoresistance material state control table, a set super time use time table, a reset super time use table and a card number setting table;
the photoresist material state control table is set with all states of the photoresist material and conversion relations among different states, and the preset states comprise: freezing state, freezing completion time, unfreezing state, unfreezing completion state and computer-on state;
the set overtime use time table is set with a first preset time, a second preset time, a third preset time, a freezing sending-out time and a thawing sending-out time; the first preset time, the second preset time and the third preset time, and the freezing sending-out time and the unfreezing sending-out time are respectively 1 hour, 2 hours, 2.5 hours, 3.5 hours and 1 hour;
the reset timeout use table is set with all reset conditions and corresponding reset methods;
the card number setting table is set with a preset thawing completion number and a preset freezing delivery number, wherein the preset thawing completion number and the preset freezing delivery number are respectively 2 times and 4 times.
The application also discloses a detection system of the light resistance material, which uses the use method of the light resistance material, and the detection system comprises: the system comprises a freezing chamber, a thawing chamber, a machine table, conveying equipment and monitoring equipment; the freezing chamber freezes the photoresist material; the unfreezing chamber unfreezes the frozen photoresistance material; the machine uses photoresist materials to carry out the manufacturing process; the conveying equipment conveys the photoresist materials among the freezing chamber, the unfreezing chamber and the machine platform; the monitoring equipment identifies the light-resistant material.
In the application, before the photoresist material enters the manufacturing process, whether the photoresist material is qualified or not is detected, so that the unqualified photoresist material is prevented from being sent to a machine; when preset conditions (such as shutdown operation, worker shift and photoresist material replacement operation in a manufacturing process) occur, material information of photoresist materials on a machine table is detected, and if the materials are judged to be capable of being frozen according to the material information and then used again, the materials are sent back to a freezing chamber for refrigeration, so that the photoresist materials which are not used temporarily can be recycled for next use, and waste is not caused; on the contrary, if the photoresist material is judged to be incapable of being frozen and then used again according to the material information, the photoresist material is sent to the processing chamber for processing, so that the problem of subsequent processing caused by the fact that photoresist materials which are not suitable for being used again are sent back to the freezing chamber is solved; according to the method and the system, the condition that the manual work possibly makes mistakes is avoided through the system detection automation mode, the working hours are reduced, and the cost is saved.
Drawings
The accompanying drawings, which are included to provide a further understanding of the embodiments of the application, are incorporated in and constitute a part of this specification, illustrate embodiments of the application and together with the description serve to explain the principles of the application. It is obvious that the drawings in the following description are only some embodiments of the application, and that for a person skilled in the art, other drawings can be derived from them without inventive effort. In the drawings:
FIG. 1 is a schematic diagram illustrating steps of a method of using a photoresist material according to one embodiment of the present disclosure;
FIG. 2 is a schematic diagram illustrating steps of a method of using a photoresist material according to another embodiment of the present application;
FIG. 3 is a schematic diagram illustrating a method of using a photoresist material according to another embodiment of the present application;
FIG. 4 is a schematic diagram illustrating a method of using a photoresist material according to another embodiment of the present application;
FIG. 5 is a schematic diagram illustrating a method of using a photoresist material according to another embodiment of the present application;
FIG. 6 is a schematic diagram of a system for inspecting photoresist material according to an embodiment of the present disclosure.
Wherein, 1, detecting system; 10. a freezing chamber; 20. a thawing chamber; 30. a machine platform; 40. a handling device; 50. and (5) monitoring equipment.
Detailed Description
It is to be understood that the terminology, the specific structural and functional details disclosed herein are for the purpose of describing particular embodiments only, and are representative, but that the present application may be embodied in many alternate forms and should not be construed as limited to only the embodiments set forth herein.
In the description of the present application, the terms "first", "second" are used for descriptive purposes only and are not to be construed as indicating relative importance or as implicitly indicating the number of technical features indicated. Thus, unless otherwise specified, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature; "plurality" means two or more. The terms "comprises" and "comprising," and any variations thereof, are intended to cover a non-exclusive inclusion, such that one or more other features, integers, steps, operations, elements, components, and/or combinations thereof may be present or added.
Further, terms of orientation or positional relationship indicated by "center", "lateral", "upper", "lower", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", and the like, are described based on the orientation or relative positional relationship shown in the drawings, are simply for convenience of description of the present application, and do not indicate that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present application.
Furthermore, unless expressly stated or limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly and may include, for example, fixed connections, removable connections, and integral connections; can be mechanically or electrically connected; either directly or indirectly through intervening media, or through both elements. The specific meaning of the above terms in the present application can be understood by those of ordinary skill in the art as appropriate.
The present application is described in detail below with reference to the figures and alternative embodiments.
As shown in fig. 1, the present application discloses a method for using a photoresist material, comprising the steps of:
a: the freezing chamber receives the photoresist material, and the photoresist material enters a freezing state;
b: when a photoresist material unfreezing instruction is received, delivering the photoresist material out of the freezing chamber and into the unfreezing chamber, and allowing the photoresist material to enter an unfreezing state;
c: when an on-machine instruction is received, the photoresist material is sent out of the unfreezing chamber and sent to the machine table;
d: when the machine receives the light resistance material, detecting the light resistance material, if the detection is qualified, sending the light resistance material to the machine, and enabling the light resistance material to enter a machine-on state;
e: and when the preset condition is monitored, detecting material information of the photoresist material, and sending the photoresist material back to the thawing chamber or the processing chamber according to the material information.
The preset information of the application can be preset information (such as unfreezing information, freezing information and the like) comparison of whether the photoresist material meets the computer-installing rule, and the photoresist material is not sent to a machine table under the condition of being unqualified through monitoring the unfreezing information and the freezing information; when preset conditions (such as shutdown operation, worker shift and photoresist material replacement operation in a manufacturing process) occur, material information of photoresist materials on a machine table is detected, and if the materials are judged to be capable of being frozen according to the material information and then used again, the materials are sent back to a freezing chamber for refrigeration, so that the photoresist materials which are not used temporarily can be recycled for next use, and waste is not caused; on the contrary, if the photoresist material is judged to be incapable of being frozen and then used again according to the physical information, the photoresist material is sent to the processing chamber for processing, so that the problem of subsequent processing caused by the fact that photoresist materials which are not suitable for being used again are sent back to the freezing chamber is solved; according to the method and the system, the condition that the manual work possibly makes mistakes is avoided through the system detection automation mode, the working hours are reduced, and the cost is saved.
The material information comprises material stock and thawing completion times, when the material stock is not zero, the thawing completion times are less than the preset thawing completion times, the materials are returned to the freezing chamber, the times of thawing completion are further analyzed in detail in the following embodiments, the preset conditions of the application include shutdown operation, machine station material changing operation and the like, the photoresist materials are divided into different types of materials for manufacturing color resists or photoresists and the like, different photoresist materials are needed to be used in different processes, so that the photoresist materials on the machine table need to be replaced when the machine table is changed or stopped, if the amount of the photoresist material is detected to be not zero, that is, the photoresist material is remained, the photoresist material is generally required to be returned to the freezing chamber for storage for the next use, however, if the photoresist material is used repeatedly, it is not needed to be returned to the freezing chamber for protection, and it is needed to be sent to the processing chamber for processing.
It should be noted that, taking the photoresist material as an example, other materials, like Anisotropic Conductive Film (ACF), also have the same characteristics as the photoresist material, and can also be applied to the present application, and the photoresist material of the present application mainly has the following characteristics: firstly, the photoresist material needs to be frozen, needs to be frozen for a certain period of time, can be prevented from deteriorating in a frozen state, needs a certain period of time for unfreezing the photoresist material, cannot be used for a long time after unfreezing is finished, and can deteriorate; the control of the freezing and thawing times and times of the photoresist material according to the present application thus includes the following steps as shown in fig. 2:
in step a:
a': when the photoresist material enters the frozen state, starting to time the freezing time of the photoresist material entering the frozen state; when the freezing time reaches a first preset time, the photoresist material enters a freezing completion state;
in the step of B:
b1: when a photoresist material unfreezing instruction is received, detecting whether the photoresist material is in a freezing completion state, and if so, sending the photoresist material into a unfreezing chamber from a freezing chamber;
b2: when the photoresist material enters the unfreezing state, starting to time the unfreezing time of the photoresist material entering the unfreezing state; when the unfreezing time reaches a second preset time, the photoresist material enters an unfreezing completion state, and the unfreezing completion times are recorded;
in step D:
d': when the machine receives the light resistance material, whether the thawing completion times of the light resistance material accord with the preset thawing times is detected, and if so, the detection is qualified.
In the step A, the photoresist material is not converted to the next state under the condition that the freezing time is unqualified through recording the freezing time, the system can be prevented from sending the photoresist material which is not frozen to the next step, so that the unqualified photoresist material is converted to the next state, when the system detects that the photoresist material needs unfreezing operation and is in the frozen state, the photoresist material is sent out from a freezing chamber, and the state of the photoresist material is converted to the unfreezing state from the frozen state; b, timing the unfreezing time by the system, and when the timing reaches a second preset time, indicating that the photoresist material is unfrozen, converting the unfreezing state into an unfreezing completion state, so that the photoresist material which is not unfrozen cannot be sent out, and the photoresist material which is in the unfreezing completion state can be sent out; in the D step, the repeated unfreezing times of the photoresist material of this application has certain restriction, and the photoresist material that surpasss the number of times unfreezes the back very likely quality and can not reach the requirement again, consequently need screen this type of photoresist material, detects the completion number of times of unfreezing, can prevent that bad photoresist material from using and producing bad display panel.
When the system is not operated on the computer at the latest and the corresponding photoresistance material is already in a unfreezing completion state, the method further comprises the following steps:
in step B2:
b2': and when the photoresist material enters the thawing completion state, timing the thawing completion time, when the thawing completion time exceeds a third preset time, sending the photoresist material out of the thawing chamber, detecting the thawing completion times, and if the thawing completion times are less than the preset thawing completion times, sending the photoresist material back to the freezing chamber.
The photoresistance material thawing time in this application also is limited, when not using this photoresistance material unfreezing for a long time, the long-time photoresistance material that is in the completion state that unfreezes takes place rotten problem easily, consequently still need set for the third and predetermine the time, be in the completion state that unfreezes at the photoresistance material, carry out the operation of waiting for a period of time on the computer, if do not wait for the operation on the computer, then need to send this photoresistance material back to the freezer and preserve, but if the number of times of unfreezing of this photoresistance material has equaled the number of times of predetermineeing and unfreezing, then should send this photoresistance material back to the process chamber, prevent this photoresistance material from getting back to the freezer again and carrying out the processing procedure.
As shown in fig. 3, unlike the previous embodiment, in the present application, the number of times of freezing and delivering is limited to prevent the photoresist material from being frozen and thawed many times, and in the step B:
b': when the photoresist material is detected to be sent out of the freezing chamber, recording the number of times of one-time freezing sending out;
in the step D:
d': when the machine receives the light resistance material, whether the freezing sending times of the light resistance material accord with the preset freezing sending times or not is detected, and if so, the detection is qualified.
The repeated use times of the materials can be limited by the thawing completion times or the freezing delivery times, and the photoresist materials frozen for multiple times are screened, so that the photoresist materials are not changed to enter the machine again for use.
As shown in fig. 4: in another embodiment, the time from the time of delivering the freezing chamber to the machine to the time of delivering the unfreezing chamber to the machine is also monitored, as follows, in the step B:
b': when the photoresist material is detected to be sent out of the freezing chamber, timing the freezing sending-out time of the photoresist material leaving the freezing chamber;
in the step C:
c': when the photoresist material is detected to be sent out of the unfreezing chamber, timing the unfreezing sending-out time leaving the unfreezing chamber;
in the step D:
d': when the machine receives the light resistance materials, detecting whether the thawing completion times of the light resistance materials accord with the preset thawing completion times, detecting whether the freezing sending-out time of the light resistance materials accords with the preset freezing sending-out time, detecting whether the thawing sending-out time of the light resistance materials accords with the preset thawing sending-out time, and judging that the detection is qualified if the thawing sending-out time of the light resistance materials accords with the preset thawing sending-out time; if not, the detection is determined to be unqualified, and the photoresist is sent to a processing chamber for processing, so that unqualified photoresist materials are prevented from being used for the manufacturing process to produce unqualified products.
After the photoresist material is sent out of the freezing chamber and the unfreezing chamber, the photoresist material needs to be loaded to a machine table within a certain time, and the photoresist material which is unfrozen for too long time is not suitable for the machine table to use, so the time for sending out the photoresist material from the unfreezing chamber to the machine table needs to be detected.
When emergent emergency situations, such as machine halt operation and machine abnormity occur, detecting the light resistance material in a unfreezing state; if the thawing time of the photoresist material does not reach the second preset time, determining that the photoresist material is not thawed, not recording the thawing times, and returning to the freezing chamber; and if the thawing time of the photoresist material reaches the second preset time, determining that the photoresist material is thawed, recording the thawing times once, and sending the photoresist material back to the freezing chamber. The unfrozen photoresist materials can be recycled to the freezing chamber to be stored continuously, the unfrozen photoresist materials are returned to the freezing chamber for protection, the unfrozen times are recorded, the unfrozen times can be detected before being returned to the freezing chamber, when the unfrozen times are exceeded, the photoresist materials are not returned to the freezing chamber for storage, and are conveyed to the processing chamber for processing, and invalid freezing of the freezing chamber is reduced; the emergency situation comprises a shutdown operation; the preset conditions include shutdown operation, shift change of workers and operation of replacing photoresist materials for the process. When such a situation occurs, the machine process is affected, so that the state of the photoresist material cannot be converted to the next state, and the thawing time and the machine-on time of the photoresist material are overtime, so that the unused photoresist material needs to be preserved by setting the above measures.
As shown in fig. 5, as another embodiment of the present application, the present application further discloses a method for using a photoresist material, wherein the method for using the photoresist material is automatically controlled according to a setting table, and the method for using the photoresist material includes:
s1: the freezing chamber receives the light resistance material, the light resistance material enters a freezing state, and the freezing time of the light resistance material entering the freezing state is started to be counted; when the freezing time reaches a first preset time, the photoresist material enters a freezing completion state;
s2: when a photoresist material unfreezing instruction is received, detecting whether the photoresist material is in a freezing completion state, if so, recording the number of times of one-time freezing sending and timing the time of the freezing sending out leaving the freezing chamber, sending the photoresist material out of the freezing chamber and into an unfreezing chamber, and enabling the photoresist material to enter the unfreezing state;
s3: when the photoresist material enters the unfreezing state, starting to time the unfreezing time of the photoresist material entering the unfreezing state; when the unfreezing time reaches a second preset time, the photoresist material enters an unfreezing completion state, and the unfreezing completion times are recorded;
s4: when the photoresist material enters a thawing completion state, timing thawing completion time, when the thawing completion time exceeds a third preset time, sending the photoresist material out of the thawing chamber, detecting the thawing completion times, and if the thawing completion times are less than the preset thawing completion times, sending the photoresist material back to the freezing chamber;
s5: when an on-machine instruction is received, sending the light resistance material in a unfreezing finished state out of the unfreezing chamber, timing the unfreezing sending-out time leaving the unfreezing chamber, and sending the light resistance material to the machine;
s6: when the machine receives the light resistance material, detecting whether the thawing completion times of the light resistance material accord with the preset thawing times, detecting whether the freezing sending times of the light resistance material accord with the preset freezing sending times, detecting whether the freezing sending time of the light resistance material accords with the preset freezing sending time, and detecting whether the thawing sending time of the light resistance material accords with the preset thawing sending time; if the photoresist materials are all in accordance with the standard, judging that the detection is qualified, sending the photoresist materials to a machine table, and enabling the photoresist materials to enter a machine-loading state; and
s7: when the preset condition is monitored, detecting the material stock and the thawing completion times of the photoresistance material in the on-machine state, and when the material stock is not zero and the thawing completion times are less than the preset thawing completion times, returning the photoresistance material to the freezing chamber;
if the photoresist material is detected to be in accordance with the reset regulation of the reset overtime use table, immediately closing the subsequent flow, and resetting the state of the photoresist material according to a reset method;
wherein the setting table includes: a photoresistance material state control table, a set super time use time table, a reset super time use table and a card number setting table; the first preset time, the second preset time and the third preset time, and the freezing sending-out time and the unfreezing sending-out time are respectively 1 hour, 2 hours, 2.5 hours, 3.5 hours and 1 hour; the number of times of thawing completion and the number of times of freezing delivery are preset to 2 and 4, respectively.
The photoresist material state control table is set with all states of the photoresist material and conversion relations among different states, and the preset states comprise: freezing state, freezing completion state, unfreezing completion state and on-machine state; the material state control table is as follows:
material state control table
| Photoresistance material numbering | Current | Next state | |
| 1 | Frozen state | State of completion of freezing | |
| 1 | State of completion of freezing | |
|
| 1 | Unfrozen state | |
|
| 1 | Thawing completion status | On- |
|
| 1 | On-machine state | Frozen state |
The set overtime use time table is set with a first preset time, a second preset time, a third preset time, a freezing sending-out time and a thawing sending-out time; the set timeout using schedule is as follows:
setting an overtime usage schedule
The reset timeout use table is set with all reset conditions and corresponding reset methods;
reset time-out usage table
| Photoresistance material numbering | Current state | Next state | Resetting the |
|
| 1 | Unfrozen state | Thawing completion | Frozen state | |
| 1 | Thawing completion status | On-machine state | Frozen state |
The reset condition in the present application is the reset step performed when the above emergency occurs; if the thawing time of the photoresist material does not reach the second preset time, determining that the photoresist material is not thawed, not recording the thawing times, and returning to the freezing chamber; if the thawing time of the photoresist material reaches a second preset time, determining that the photoresist material is thawed, recording the number of times of thawing once, and sending the photoresist material back to the freezing chamber;
the card frequency setting table records: the number of thawing completion times and the number of freezing delivery times are preset.
Card number setting table
As shown in fig. 6, as another embodiment of the present application, a system for detecting a photoresist material is disclosed, and a method for using the photoresist material is disclosed, where the detecting system 1 includes a freezing chamber 10, a thawing chamber 20, a machine table 30, a conveying device 40, and a monitoring device 50; the freezing chamber 10 freezes the photoresist material; the thawing chamber 20 is used for thawing the frozen photoresistance materials; the machine 30 uses photoresist material to perform the manufacturing process; the carrying equipment 40 carries the photoresist material from the freezing chamber 10, the thawing chamber 20 and the machine table 30; the monitoring device 50 recognizes the photoresist material and collects and records the above-mentioned state information, time information and frequency information of the photoresist material.
It should be noted that the time and times in the above setting table are adjustable according to the actual situation; the definition of each step related in the present disclosure is not considered to limit the order of the steps on the premise of not affecting the implementation of the specific embodiment, and the steps written in the foregoing may be executed first, or executed later, or even executed simultaneously, and as long as the present disclosure can be implemented, all the steps should be regarded as belonging to the protection scope of the present application.
The technical solution of the present application can be widely applied to various display panels, such as TN (Twisted Nematic) display panel, IPS (In-Plane Switching) display panel, VA (Vertical Alignment) display panel, MVA (Multi-Domain Vertical Alignment) display panel, and of course, other types of display panels, such as OLED (Organic Light-Emitting Diode) display panel, and the above solution can be applied thereto.
The foregoing is a more detailed description of the present application in connection with specific alternative embodiments, and the specific implementations of the present application are not to be considered limited to these descriptions. For those skilled in the art to which the present application pertains, several simple deductions or substitutions may be made without departing from the concept of the present application, and all should be considered as belonging to the protection scope of the present application.
Claims (9)
1. A method for using a photoresist material is characterized by comprising the following steps:
step A: the freezing chamber receives the photoresist material, and the photoresist material enters a freezing state;
and B: when a photoresist material unfreezing instruction is received, delivering the photoresist material out of the freezing chamber and into the unfreezing chamber, and allowing the photoresist material to enter an unfreezing state;
and C: when an on-machine instruction is received, the photoresist material is sent out of the unfreezing chamber and sent to the machine table;
step D: when the machine receives the light resistance material, detecting the light resistance material, if the detection is qualified, sending the light resistance material to the machine, and enabling the light resistance material to enter a machine-on state; and
step E: when the preset condition is monitored, detecting material information of the photoresistance material in the on-machine state, and sending the photoresistance material back to the freezing chamber or the processing chamber according to the material information;
in the step A:
when the photoresist material enters the frozen state, starting to time the freezing time of the photoresist material entering the frozen state; when the freezing time reaches a first preset time, the photoresist material enters a freezing completion state;
in the step B:
step B1: when a photoresist material unfreezing instruction is received, detecting whether the photoresist material is in a freezing completion state, and if so, sending the photoresist material into a unfreezing chamber from a freezing chamber;
step B2: when the photoresist material enters the unfreezing state, starting to time the unfreezing time of the photoresist material entering the unfreezing state; when the unfreezing time reaches a second preset time, the photoresist material enters an unfreezing completion state, and the unfreezing completion times are recorded;
in the step D:
when the machine receives the light resistance material, detecting whether the thawing completion times of the light resistance material accord with the preset thawing times, if so, judging that the detection is qualified;
the material information comprises unfreezing completion times, and the preset condition comprises shutdown operation and machine station material changing operation.
2. The method of using a photoresist composition of claim 1, wherein in step B:
when the photoresist material is detected to be sent out of the freezing chamber, timing the freezing sending-out time of the photoresist material leaving the freezing chamber;
in the step C:
when the photoresist material is detected to be sent out of the unfreezing chamber, timing the unfreezing sending-out time leaving the unfreezing chamber;
in the step D:
when the machine receives the light resistance material, whether the thawing completion times of the light resistance material accord with the preset thawing completion times or not is detected, whether the freezing sending-out time of the light resistance material accords with the preset freezing sending-out time or not is detected, whether the thawing sending-out time of the light resistance material accords with the preset thawing sending-out time or not is detected, and if the thawing sending-out time of the light resistance material accords with the preset thawing sending-out time, the detection is judged to be qualified.
3. The method of using a photoresist composition of claim 1,
in the step B:
when the photoresist material is detected to be sent out of the freezing chamber, recording the number of times of one-time freezing sending out;
in the step D:
when the machine receives the light resistance material, whether the freezing sending times of the light resistance material accord with the preset freezing sending times or not is detected, and if so, the detection is qualified.
4. The method of using a photoresist composition of claim 1,
in the step B2:
and when the photoresist material enters the thawing completion state, timing the thawing completion time, when the thawing completion time exceeds a third preset time, sending the photoresist material out of the thawing chamber, detecting the thawing completion times, and if the thawing completion times are less than the preset thawing completion times, sending the photoresist material back to the freezing chamber.
5. The method of using a photoresist composition of claim 1,
when an emergency occurs, detecting a photoresist material in a unfreezing state; if the thawing time of the photoresist material does not reach the second preset time, determining that the photoresist material is not thawed, not recording the thawing times, and sending the photoresist material back to the freezing chamber;
and if the thawing time of the photoresist material reaches the second preset time, determining that the photoresist material is thawed, recording the thawing times once, and sending the photoresist material back to the freezing chamber.
6. The method of using a photoresist composition of claim 5,
the emergency situation includes a shutdown operation.
7. The method of claim 1, wherein the material information further comprises a material amount, and when the material amount is not zero and the thawing completion time is less than a predetermined thawing completion time, the material is returned to the freezing chamber.
8. The use method of the photoresist material is characterized in that the use method is automatically controlled according to a setting table, and comprises the following steps:
the freezing chamber receives the light resistance material, the light resistance material enters a freezing state, and the freezing time of the light resistance material entering the freezing state is started to be counted; when the freezing time reaches a first preset time, the photoresist material enters a freezing completion state;
when a photoresist material unfreezing instruction is received, detecting whether the photoresist material is in a freezing completion state, if so, recording the number of times of one-time freezing sending and timing the time of the freezing sending out leaving the freezing chamber, sending the photoresist material out of the freezing chamber and into an unfreezing chamber, and enabling the photoresist material to enter the unfreezing state;
when the photoresist material enters the unfreezing state, starting to time the unfreezing time of the photoresist material entering the unfreezing state; when the unfreezing time reaches a second preset time, the photoresist material enters an unfreezing completion state, and the unfreezing completion times are recorded;
when the photoresist material enters a thawing completion state, timing thawing completion time, when the thawing completion time exceeds a third preset time, sending the photoresist material out of the thawing chamber, detecting the thawing completion times, and if the thawing completion times are less than the preset thawing completion times, sending the photoresist material back to the freezing chamber;
when an on-machine instruction is received, sending the light resistance material in a unfreezing finished state out of the unfreezing chamber, timing the unfreezing sending-out time leaving the unfreezing chamber, and sending the light resistance material to the machine;
when the machine receives the light resistance material, detecting whether the thawing completion times of the light resistance material accord with the preset thawing times, detecting whether the freezing sending times of the light resistance material accord with the preset freezing sending times, detecting whether the freezing sending time of the light resistance material accords with the preset freezing sending time, and detecting whether the thawing sending time of the light resistance material accords with the preset thawing sending time; if the photoresist materials are all in accordance with the standard, judging that the detection is qualified, sending the photoresist materials to a machine table, and enabling the photoresist materials to enter a machine-loading state; and
when the preset condition is monitored, detecting the material stock and the thawing completion times of the photoresistance material in the on-machine state, and when the material stock is not zero and the thawing completion times are less than the preset thawing completion times, returning the photoresistance material to the freezing chamber;
if the photoresist material is detected to be in accordance with the reset regulation of the reset overtime use table, immediately closing the subsequent flow, and resetting the state of the photoresist material according to a reset method;
wherein the setting table includes: a photoresistance material state control table, a set super time use time table, a reset super time use table and a card number setting table;
the photoresistance material state control table is set with all states of photoresistance materials and conversion relations among different states, and the preset states comprise: freezing state, freezing completion state, unfreezing completion state and on-machine state;
the set overtime use time table is set with a first preset time, a second preset time, a third preset time, a freezing sending-out time and a thawing sending-out time; the first preset time, the second preset time and the third preset time, and the freezing sending-out time and the unfreezing sending-out time are respectively 1 hour, 2 hours, 2.5 hours, 3.5 hours and 1 hour;
the reset timeout use table is set with all reset conditions and corresponding reset methods;
the card number setting table is set with a preset thawing completion number and a preset freezing delivery number, wherein the preset thawing completion number and the preset freezing delivery number are respectively 2 times and 4 times.
9. A system for testing a photoresist material, wherein the method of any one of claims 1 to 8 is used, the system comprising:
a freezing chamber for freezing the photoresist material;
a thawing chamber, which is used for thawing the frozen photoresistance material;
a machine station for performing a process using a photoresist material;
the conveying equipment conveys the photoresist materials among the freezing chamber, the thawing chamber and the machine platform; and
and the monitoring equipment is used for identifying the light-resistant material.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110153468.4A CN112965339B (en) | 2021-02-04 | 2021-02-04 | Use method and detection system of photoresist material |
| PCT/CN2021/142899 WO2022166489A1 (en) | 2021-02-04 | 2021-12-30 | Use method and detection system for photoresist material |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202110153468.4A CN112965339B (en) | 2021-02-04 | 2021-02-04 | Use method and detection system of photoresist material |
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| CN112965339A CN112965339A (en) | 2021-06-15 |
| CN112965339B true CN112965339B (en) | 2021-11-09 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US7008749B2 (en) * | 2001-03-12 | 2006-03-07 | The University Of North Carolina At Charlotte | High resolution resists for next generation lithographies |
| JP2009064726A (en) * | 2007-09-07 | 2009-03-26 | Tokyo Electron Ltd | Substrate inspection device, substrate inspection method, and storage medium |
| CN102005072A (en) * | 2009-09-01 | 2011-04-06 | 中芯国际集成电路制造(上海)有限公司 | Photoresist monitoring method and client |
| CN201997441U (en) * | 2011-01-04 | 2011-10-05 | 京东方科技集团股份有限公司 | Supply box |
| TWI612108B (en) * | 2015-10-31 | 2018-01-21 | Rohm And Haas Electronic Materials Llc | Block copolymers and pattern treatment compositions and methods |
| CN105352629A (en) * | 2015-11-03 | 2016-02-24 | 刘幸 | Photoresist barrel with temperature monitoring function |
| KR101837508B1 (en) * | 2017-09-18 | 2018-03-13 | 김정화 | Photoresist supply apparatus |
| JP7055061B2 (en) * | 2018-05-01 | 2022-04-15 | 東京エレクトロン株式会社 | Temperature control mechanism and liquid treatment equipment |
| CN210015326U (en) * | 2019-07-10 | 2020-02-04 | 德淮半导体有限公司 | Photoresist liquid supply system |
| CN112965339B (en) * | 2021-02-04 | 2021-11-09 | 惠科股份有限公司 | Use method and detection system of photoresist material |
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