CN112947014A - Extreme ultraviolet light generating method and device - Google Patents

Extreme ultraviolet light generating method and device Download PDF

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Publication number
CN112947014A
CN112947014A CN202110129885.5A CN202110129885A CN112947014A CN 112947014 A CN112947014 A CN 112947014A CN 202110129885 A CN202110129885 A CN 202110129885A CN 112947014 A CN112947014 A CN 112947014A
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China
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target
liquid drop
target material
material liquid
droplet
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CN202110129885.5A
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CN112947014B (en
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吴寒
夏心宇
王俊康
马修泉
王新兵
左都罗
陆培祥
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Guangdong Intelligent Robotics Institute
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Guangdong Intelligent Robotics Institute
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70033Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources

Abstract

The application relates to an extreme ultraviolet light generating method and device, wherein the method comprises the following steps: generating target material liquid drops with preset specifications along the direction of preset speed, and enabling the target material liquid drops to move to reach a target shooting position under the action of external force; the target material liquid drop has a preset speed and an initial rotation angular speed; the preset speed is vertical to the rotation plane of the target material liquid drop; the connecting line of the target hitting position and the liquid drop outlet is not coincident with the direction of the preset speed; emitting pulse laser, focusing the pulse laser on a target hitting position, hitting target material liquid drops, enabling the target material liquid drops to be subjected to laser acting force perpendicular to a rotating plane and to be converted into plasma, and generating extreme ultraviolet light; and treating residual waste liquid of the hit target material liquid drops. The extreme ultraviolet light generation method is beneficial to improving the energy conversion efficiency of the targeting laser.

Description

Extreme ultraviolet light generating method and device
Technical Field
The present disclosure relates to the field of Extreme Ultraviolet (EUV) light source technology, and more particularly, to a method and an apparatus for generating EUV light.
Background
With the continuous updating and upgrading of electronic products, the complexity of the internal circuit of the electronic product is continuously improved, and the integration level is higher and higher. The conventional Near Ultraviolet (NUV) light source and Deep ultraviolet (Deep Ultra-Violet, DUV) light source cannot meet the updating speed of electronic products. At present, the extreme ultraviolet light source is considered as the most promising lithography light source in the next generation of high-capacity integrated circuit manufacturing industry.
However, the traditional extreme ultraviolet light generation method hits liquid drops from the side surface, is limited by the drop falling time of the liquid drops, has the problem of short laser action time, and is not beneficial to improving the energy conversion efficiency of the targeting laser. Therefore, the conventional extreme ultraviolet light generation method has a problem of low energy conversion efficiency of the targeting laser.
Disclosure of Invention
Therefore, the method and the device for generating the extreme ultraviolet light with high target laser energy conversion efficiency are provided to overcome the defects of the prior art.
A method of extreme ultraviolet light generation, the method comprising:
generating target material liquid drops with preset specifications along the direction of preset speed, and enabling the target material liquid drops to move to reach a target shooting position under the action of external force; the target material liquid drop has a preset speed and an initial rotation angular speed; the preset speed is vertical to the rotation plane of the target material liquid drop; the connecting line of the target hitting position and the liquid drop outlet is not coincident with the direction of the preset speed;
emitting pulse laser, focusing the pulse laser on the target hitting position, hitting the target material liquid drop, enabling the target material liquid drop to be subjected to laser acting force perpendicular to the rotating plane and to be converted into plasma, and generating extreme ultraviolet light;
and treating residual waste liquid of the hit target material liquid drops.
In one embodiment, the generating of the target material droplet along the direction of the preset speed to make the target material droplet move to the target position under the action of the external force includes:
generating target material liquid drops with preset specifications along the direction of a preset speed;
determining a first deviation distance between the target position and the droplet outlet in the direction of the preset speed and a second deviation distance between the target position and the droplet outlet in the vertical direction of the preset speed according to the position relation between the target position and the droplet outlet;
determining movement time according to the first deviation distance and the preset speed;
determining a preset acceleration according to the movement time and the second deviation distance; the preset acceleration is perpendicular to the preset speed;
and applying an external force to enable the target material liquid drop to have the preset acceleration, and adjusting the motion direction of the target material liquid drop to enable the target material liquid drop to reach the target hitting position.
In one embodiment, the external force comprises an electric force, and the target droplet carries a charge amount.
In one embodiment, the external force is gravity.
In one embodiment, after the processing the residual substance of the hit droplet target, the method further includes:
acquiring feedback information sent by a waste liquid collector;
and adjusting the working parameters of the laser light source device according to the feedback information.
In one embodiment, an alternating electric field is disposed in the waste liquid collector, and the processing of the residual waste liquid of the hit target material droplets includes dissipating the residual waste liquid of the hit target material droplets; the feedback information comprises liquid drop dissipation efficiency, and after the feedback information sent by the waste liquid collector is obtained, the method further comprises the following steps:
adjusting a parameter of the alternating electric field according to the droplet dissipation efficiency.
An extreme ultraviolet light generating device comprises a liquid drop generating device, a laser light source device and a waste liquid collector;
the droplet generating device is used for generating target droplets with preset specifications along the direction of preset speed so that the target droplets move to a target shooting position under the action of external force; the target liquid drop has a preset speed and an initial rotation angular speed; the preset speed is perpendicular to the rotation plane of the target liquid drop; the connecting line of the target hitting position and the liquid drop outlet is not coincident with the direction of the preset speed;
the laser light source device is used for emitting pulse laser, focusing the pulse laser at the target hitting position, hitting the target liquid drop, enabling the target liquid drop to be subjected to laser acting force perpendicular to the rotating plane and to be converted into plasma, and generating extreme ultraviolet light;
the waste liquid collector is used for treating residual waste liquid of the hit target liquid drops.
In one embodiment, the device further comprises an electric field driving device for generating an electric field force so that the target liquid drop moves to the target position under the action of the electric field force.
In one embodiment, the device further comprises an electric quantity adjusting device for enabling the target liquid drop to carry the electric charge quantity before the target liquid drop leaves the liquid drop generating device.
In one embodiment, the power adjusting device comprises a capacitor plate and a power supply, wherein the power supply is connected with the capacitor plate;
the power supply is used for supplying voltage to the capacitor plate;
the capacitor plate is arranged in the liquid drop generating device and used for enabling the target liquid drop entering the action area of the capacitor plate to carry electric charge before the target liquid drop is separated from the liquid drop generating device.
According to the extreme ultraviolet light generation method, firstly, the target material liquid drop has a preset speed and an initial rotation angular speed, and the target material liquid drop is converted into a cake shape while moving to a target hitting position. The pulsed laser strikes the target material liquid drop, so that the target material liquid drop is subjected to the laser acting force along the rotating plane vertical to the target material liquid drop, the action area of the pulsed laser is increased, and the energy of the pulsed laser is fully absorbed by the target material liquid drop. And secondly, because the acting force and the preset speed of the pulse laser are perpendicular to the rotation plane of the target material liquid drop, the connecting line of the target shooting position and the target material liquid drop outlet is not overlapped with the preset speed direction, and the energy loss of the pulse laser caused by the fact that the residual waste liquid of the previous target material liquid drop blocks a laser light path on a pulse laser transmission path can be avoided. And thirdly, adjusting the movement direction of the target material liquid drop according to the position relation between the target hitting position and the target material liquid drop outlet, so that the target material liquid drop can reach the target hitting position and be hit by the pulse laser. The repeatability of the movement path of the target material liquid drop can be ensured because the preset specification of the target material liquid drop is not changed. And finally, the residual waste liquid of the target material liquid drop after being hit by the pulse laser is treated, so that the pollution of the residual waste liquid to each element can be reduced, the extreme ultraviolet radiation efficiency can be improved, and the service life of each element can be prolonged. The methods are mutually matched, and the energy conversion rate of the target laser is favorably improved.
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In order to more clearly illustrate the technical solutions in the embodiments or the conventional technologies of the present application, the drawings used in the descriptions of the embodiments or the conventional technologies will be briefly introduced below, it is obvious that the drawings in the following descriptions are only some embodiments of the present application, and for those skilled in the art, other drawings can be obtained according to the drawings without creative efforts.
FIG. 1 is a flow diagram of a method for extreme ultraviolet light generation in one embodiment;
FIG. 2 is a flow chart illustrating the process of generating target droplets of a predetermined size along a predetermined speed direction to move the target droplets to a target position under an external force according to an embodiment;
FIG. 3 is a schematic diagram of the relative positions of a target location and a droplet outlet in one embodiment;
FIG. 4 is a flow chart of a method for extreme ultraviolet light generation in another embodiment;
fig. 5 is a schematic view of an extreme ultraviolet light generating device in another embodiment.
Detailed Description
To facilitate an understanding of the present application, the present application will now be described more fully with reference to the accompanying drawings. Embodiments of the present application are set forth in the accompanying drawings. This application may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs. The terminology used herein in the description of the present application is for the purpose of describing particular embodiments only and is not intended to be limiting of the application.
It will be understood that, as used herein, the terms "first," "second," and the like may be used herein to describe various elements, but these elements are not limited by these terms. These terms are only used to distinguish one element from another.
It will be understood that when an element is referred to as being "connected" to another element, it can be directly connected to the other element or be connected to the other element through intervening elements. In addition, "connection" in the following embodiments is understood as "optical connection" if there is transmission of an optical signal between connected objects.
Referring to fig. 1, a method for generating extreme ultraviolet light includes steps S10 to S30.
Step S10: target material liquid drops with preset specifications are generated along the direction of the preset speed, so that the target material liquid drops move to reach the target shooting position under the action of external force.
The material of the target material drop is metal, such as tin. The preset specification of the target material liquid drop refers to that the size and the shape of the target material liquid drop fluctuate within a certain range, although the fluctuation can cause the change of the motion track of the target material liquid drop, the caused change amount is extremely small and is not enough to make the target material liquid drop deviate from the target position, namely, the target material liquid drop with the preset specification can move to the target position under the action of external force. Taking a sphere as an example, the target droplets with the predetermined specification may mean that the radius of the target droplets is within a predetermined radius threshold range, and the sphericity of the target droplets is within a predetermined sphericity range. The environment of the target material liquid drop can be atmospheric environment or vacuum environment with thin air. Furthermore, the vacuum environment can be a vacuum cavity, and a vacuum pump is used for pumping air out of the cavity to ensure the vacuum degree of the cavity and reduce the influence of the air on the target shooting process. Specifically, the target material liquid drop with a preset specification is generated along the direction of a preset speed by controlling the liquid drop generating device, the target material liquid drop has the preset speed and an initial rotation angular speed, and the preset speed is perpendicular to the rotation plane of the target material liquid drop. The line connecting the target position and the droplet outlet is not coincident with the direction of the preset speed. Furthermore, the generation frequency of the target material liquid drops can be controlled by adjusting the parameters of the liquid drop generating device. For example, the generation frequency of the target material droplets can be matched with the frequency of the pulse laser, and the energy utilization rate of the target laser is improved on the premise that the adjacent target material droplets are not influenced mutually.
The process of generating target droplets by the droplet generation device may be: the solid target is heated to make the temperature reach above the melting point, and then the target droplets are sprayed out from a nozzle through a filter by applying pressure, so that the target droplets with uniform size and stable frequency are generated. The process of generating target droplets by the droplet generation device may also be: the method comprises the steps that a solid target with a preset specification moves along a preset path under the driving of an external force field, a limiting device is adopted to limit the passing frequency of the solid target in the moving process of the solid target, a non-contact heating mode such as electromagnetic heating is adopted to enable the solid target to be melted to generate target material liquid drops, and then the target material liquid drops are driven to move to a target-hitting laser focusing point along the preset path under the premise that the target material liquid drops are not in contact with any part of a liquid drop generating device through the external force field.
The droplet generating apparatus may be a mechanical force, a magnetic force, or an optical force, which provides the target droplet with a driving force of rotational angular velocity. For example, a rotating mechanism may be provided at the end of the droplet generator, and the rotating mechanism may rotate the target droplet to have a rotational angular velocity before the target droplet is separated from the droplet generator. For another example, a magnetic field may be applied to magnetize the target droplet, and then the magnetic field may be twisted to generate a rotational angular velocity of the target droplet. In addition, two beams of laser with the same wavelength, the same light intensity and the opposite transmission direction and symmetrically distributed along the gravity center of the target material liquid drop can be focused on the target material liquid drop, so that the target material liquid drop generates autorotation angular momentum under the action of the two beams of laser and then autorotation occurs. Further, the laser energy driving the target droplet to generate the initial rotational angular velocity must be insufficient to cause plasma transformation of the target droplet. In short, the present embodiment does not limit the specific operation of the droplet generator. It can be understood that the initial rotational angular velocity of the target droplet is determined by the parameter corresponding to the driving force, that is, the target droplet can have the preset initial rotational angular velocity by controlling the parameter of the driving force.
Further, the external force that causes the movement direction of the target material droplet to deviate from the preset speed forms an angle with the preset speed that is greater than 0 ° and less than 180 °, for example, the angle may be 90 °. The external force may be one or more of gravity, an electric field force, a magnetic field force, and an optical force. In one embodiment, the external force comprises an electric force, and the target droplets carry a charge before exiting the droplet generator. For example, the droplet generating device may be provided with an electric charge adjusting device for adjusting the electric charge amount of the target droplet so that the target droplet carries the target electric charge amount.
When the direction of the preset speed is the gravity direction, an external force deviating from the vertical direction is applied to enable the target material liquid drop to obtain an acceleration deviating from the direction of the preset speed, and then the target material liquid drop moves to the target shooting position deviating from the direction of the preset speed.
When the direction of the preset speed is not coincident with the direction of gravity, the gravity will make the target material liquid drop move in the direction deviating from the preset speed. In one embodiment, the external force is gravity, and the target material liquid drop can be ensured to move away from the direction of the preset speed under the action of gravity to reach the target hitting position by adjusting the preset speed according to the spatial relationship between the target hitting position and the liquid drop outlet. In another embodiment, the external force includes gravity and other forces other than gravity, and the target material droplet can be ensured to move away from the direction of the preset speed under the action of gravity and other external forces to reach the target position by adjusting the magnitude of the other forces according to the spatial relationship between the target position and the droplet outlet.
Step S20: and emitting pulse laser, focusing the pulse laser at a target shooting position, and striking the target material liquid drop to enable the target material liquid drop to be subjected to laser acting force vertical to a rotating plane and to be converted into plasma so as to generate extreme ultraviolet light.
As mentioned above, the target droplet has a predetermined initial rotational angular velocity. Under the action of inertia, the target material liquid drop keeps rotating while moving to the target hitting position. In the autorotation process of the target material liquid drop, the size of the target material liquid drop on the rotation plane is enlarged under the action of centrifugal force, the size of the target material liquid drop vertical to the rotation plane is reduced along with the size of the target material liquid drop, the target material liquid drop is gradually changed into a cake shape from a spherical shape, and the target material liquid drop meets pulse laser at a target shooting position in the cake shape and is shot by the pulse laser. The impact is not an impact action in the conventional sense, but the whole process of the pulsed laser acting on the target material droplet to change it.
The number of the pulse lasers for striking the target material liquid drop can be one path of pulse laser or formed by converging multiple paths of pulse lasers. When the pulse laser is formed by converging multiple paths of pulse lasers, the light beam transmission devices corresponding to the multiple paths of pulse lasers focus the multiple paths of pulse lasers at the target shooting positions respectively, and the transmission directions of the multiple paths of pulse lasers are distributed in an array mode by taking the autorotation direction of the target material liquid drops as a symmetry axis. By carrying out time sequence control on each laser, each path of pulse laser can reach a target shooting position at the same time and act on the target material liquid drop, so that the target material liquid drop is subjected to the action force of the laser vertical to the direction of the rotating plane and is converted into plasma to generate extreme ultraviolet light.
The environment of the pulse laser is the same as the environment of the target material liquid drop. Similarly, the environment may be an atmospheric environment or a vacuum environment in which air is thin. Further, the vacuum environment may be a vacuum chamber, and a vacuum pump is used to pump air out of the chamber to ensure the vacuum degree.
Step S30: and treating residual waste liquid of the hit target material liquid drops.
After being hit, the residual waste liquid of the target material liquid drops continues to move under the action of inertia and reaches a waste liquid collector, and the residual waste liquid is collected and treated by the waste liquid collector. The waste liquid collector is arranged along the motion track of the target material liquid drop, not only can be used for collecting and treating residual waste liquid of the target material liquid drop, but also can be used for collecting target material liquid drop missed by the pulse laser, reduces pollution of a system, and prolongs the service life.
According to the extreme ultraviolet light generation method, firstly, the target material liquid drop has a preset speed and an initial rotation angular speed, and the target material liquid drop is converted into a cake shape while moving to a target hitting position. The pulsed laser strikes the target material liquid drop, so that the target material liquid drop is subjected to the laser acting force along the rotating plane vertical to the target material liquid drop, the action area of the pulsed laser is increased, and the energy of the pulsed laser is fully absorbed by the target material liquid drop. And secondly, because the acting force and the preset speed of the pulse laser are perpendicular to the rotation plane of the target material liquid drop, the connecting line of the target shooting position and the liquid drop outlet is not overlapped with the direction of the preset speed, and the energy loss of the pulse laser caused by the fact that the residual waste liquid of the previous target material liquid drop blocks a laser light path on a pulse laser transmission path can be avoided. And thirdly, adjusting the movement direction of the target material liquid drop according to the position relation between the target hitting position and the liquid drop outlet, so as to ensure that the target material liquid drop reaches the target hitting position and is hit by the pulse laser. The repeatability of the movement path of the target material liquid drop can be ensured because the preset specification of the target material liquid drop is not changed. And finally, the residual waste liquid of the target material liquid drop after being hit by the pulse laser is treated, so that the pollution of the residual waste liquid to each element can be reduced, the extreme ultraviolet radiation efficiency can be improved, and the service life of each element can be prolonged. The methods are mutually matched, and the energy conversion rate of the target laser is favorably improved.
In one embodiment, referring to fig. 2, step S10 includes steps S11 to S15.
Step S11: and generating target material liquid drops with preset specifications along the direction of the preset speed.
Step S12: and determining a first deviation distance between the target position and the droplet outlet in the direction of the preset speed and a second deviation distance between the target position and the droplet outlet in the vertical direction of the preset speed according to the position relation between the target position and the droplet outlet.
Step S13: and determining the movement time according to the first deviation distance and the preset speed.
Step S14: determining a preset acceleration according to the movement time and the second deviation distance; the predetermined acceleration is perpendicular to the predetermined velocity.
Step S15: and applying external force to enable the target material liquid drop to have preset acceleration, and adjusting the motion direction of the target material liquid drop to enable the target material liquid drop to reach a target shooting position.
As described above, the direction of the preset speed may be a gravity direction, or may deviate from the gravity direction, and in each case, by applying an external force deviating from the preset speed direction, through reasonable design, the target material droplet may obtain an acceleration deviating from the preset speed direction, and then move to the target hitting position deviating from the preset speed direction. For convenience of understanding, in the present embodiment, a case where the direction of the preset speed is the gravity direction is taken as an example for explanation.
Specifically, referring to fig. 3, the droplet generator 10 is driven at a predetermined speed V1Generates a target droplet 11 of a preset specification, and can determine a first deviation distance S according to the position relation between the target hitting position B and the droplet outlet A1And a second offset distance S2. Neglecting air resistance, at a preset speed V1According to the first deviation distance S without other external force action in the direction of1And a preset speed V1According to S1=V1t+(g*t2) And/2, the movement time t can be determined. Where g is the acceleration of gravity. At the point of the droplet outlet a, the target droplet 11 is perpendicular to the predetermined velocity V1The component velocity of (1) is zero, and then according to S2=a*t2And/2, calculating to obtain a preset acceleration a. Then, according to the preset specification of the target droplet 11, the mass m of the target droplet 11 is obtained, and then, according to F ═ m × a, an external force F is applied to make the target droplet 11 have a preset acceleration a, so that the moving direction of the target droplet 11 can be adjusted, and the target droplet 11 reaches the target hitting position B. Wherein, the external force F is in the same direction as the preset acceleration a.
In another embodiment, the preset speed V1Is perpendicular to the direction of gravity, and the first deviation distance S can be determined according to the position relation between the target-hitting position B and the droplet outlet A1And a second offset distance S2. Neglecting air resistance, at a preset speed V1According to the first deviation distance S without other external force action in the direction of1And a preset speed V1According to S1=V1t, a movement time t may be determined. At the point A of the droplet outlet, the target droplet is perpendicular to the preset velocity V1The component velocity of the direction of (1) is zero. According to S2=(a+g)*t2And/2, calculating to obtain a preset acceleration a. Where g is the acceleration of gravity. And then, according to the preset specification of the target material liquid drop, obtaining the mass m of the target material liquid drop, and applying an external force F to enable the target material liquid drop to have a preset acceleration a according to the F-m-a, namely, the external force F and gravity can jointly adjust the motion direction of the target material liquid drop to enable the target material liquid drop to reach the target hitting position B. The external force F is in the same direction as the preset acceleration a, and the direction of the external force a is the same as or opposite to that of the external force g. When a is calculated to be 0, the explanation is only dependent on gravity, and no additional external force is required.
In the above embodiment, the velocity is applied perpendicular to the predetermined velocity V1The movement direction of the target material liquid drop 11 is adjusted by the external force F in the direction of (1) to enable the target material liquid drop 11 to reach the point B of the target hitting position, so that the calculation and control processes can be simplified, and the efficiency is improved.
In one embodiment, referring to fig. 4, after the step S30, the method further includes a step S40 and a step S50.
Step S40: and acquiring feedback information sent by the waste liquid collector.
Specifically, the waste liquid collector can send feedback information while collecting and processing the residual waste liquid of the target material droplets. This feedback information includes, but is not limited to, the amount and spatial distribution of remaining waste.
Step S50: and adjusting the working parameters of the laser light source device according to the feedback information.
The operating parameter of the laser light source device may refer to the energy or the trigger time of the pulse laser. Specifically, according to the feedback information, the condition of the remaining waste liquid after the previous impact can be determined, and when the remaining waste liquid is large, it indicates that the action between the pulsed laser and the target droplet is incomplete, and the reason for such a result may be that the target droplet and the pulsed laser reach a target position at a time node which is not matched, or the energy of the pulsed laser is insufficient. At this time, the trigger time or energy of the pulse laser is adjusted, which is beneficial to improving the extreme ultraviolet radiation efficiency. It can be understood that the above control process can be automatically completed by the controller, and can also be manually intervened.
In the above embodiment, the feedback information sent by the waste liquid collector is obtained, and the working parameters of the laser light source device are adjusted according to the feedback information, which is equivalent to increasing a feedback adjustment mode, so that the parameters of the targeting laser can be adjusted according to the current actual state, and the utilization rate of the energy of the targeting laser can be further improved.
In one embodiment, an alternating electric field is provided in the waste liquid collector, and the step S30 includes: and dissipating residual waste liquid of the hit target material droplets. The feedback information includes the droplet dissipation efficiency, and with continued reference to fig. 4, after step S40, the method further includes step S60: and adjusting the working parameters of the waste liquid collector according to the liquid drop dissipation efficiency. Step S60 may be performed before or after step S50, or simultaneously with step S50.
Wherein, the liquid drop dissipation efficiency refers to the ratio of the amount of liquid drops dissipated in the waste liquid collector to the amount of liquid drops entering the waste liquid collector. The target material liquid drop is changed into a plasma state after being hit at a target hitting position, and the residual waste liquid of the target material liquid drop is composed of different plasma groups with random charge-to-mass ratios. All the plasma clusters reciprocate within a certain range under the action of an alternating electric field in the waste liquid collector. The charge-to-mass ratio distribution of the plasma clusters is irregular, so that the reciprocating motion track is also irregular, and the plasma clusters with positive and negative charges collide with each other, so that the plasma dissipation phenomenon can occur.
Specifically, an efficiency threshold may be set for the droplet dissipation efficiency, and the efficiency threshold may be a single value or a range of values. When the efficiency threshold is a single value, if the droplet dissipation efficiency is lower than the efficiency threshold, the parameters of the alternating electric field are adjusted to improve the droplet dissipation efficiency. When the efficiency threshold is a numerical range: if the droplet dissipation efficiency is lower than the minimum value of the efficiency threshold, adjusting the parameters of the alternating electric field to improve the droplet dissipation efficiency; if the droplet dissipation efficiency is above the maximum of the efficiency threshold, the parameters of the alternating electric field are adjusted to reduce the droplet dissipation efficiency to reduce energy waste.
Further, in one embodiment, adjusting a parameter of the alternating electric field comprises: the frequency and/or voltage of the alternating electric field is adjusted. Specifically, the higher the frequency of the alternating electric field is, the more frequent the plasma groups reciprocate, the higher the probability of collision is, and the better the dissipation effect is; the larger the voltage of the alternating electric field is, the faster the moving speed of each plasmoid is, and the better the dissipation effect after collision is. That is, by increasing the frequency and/or voltage of the alternating electric field, the efficiency and effectiveness of plasma dissipation can be increased; by reducing the frequency and/or voltage of the alternating electric field, the efficiency and effectiveness of plasma dissipation may be reduced. Similarly, the control process can be automatically completed by the controller or manually intervened.
In the above embodiment, the parameter adjustment of the alternating electric field is performed according to the liquid drop dissipation efficiency fed back by the waste liquid collector, so that the plasma cluster can be dissipated under the action of the alternating electric field, the pollution can be further reduced, and the stability of the system can be maintained.
It should be understood that, although the steps in the flowcharts shown in the above embodiments are shown in sequence as indicated by the arrows, the steps are not necessarily executed in sequence as indicated by the arrows. The steps are not performed in the exact order shown and described, and may be performed in other orders, unless explicitly stated otherwise. Moreover, at least a part of the steps in each flowchart involved in the above embodiments may include multiple steps or multiple stages, which are not necessarily performed at the same time, but may be performed at different times, and the order of performing the steps or stages is not necessarily sequential, but may be performed alternately or alternately with other steps or at least a part of the steps or stages in other steps.
An extreme ultraviolet light generating device comprises a liquid drop generating device, a laser light source device and a waste liquid collector. The droplet generating device is used for generating target droplets with preset specifications along the direction of preset speed so that the target droplets move to a target hitting position under the action of external force; the target material liquid drop has a preset speed and an initial rotation angular speed; the preset speed is vertical to the rotation plane of the target material liquid drop; the line connecting the target position and the droplet outlet is not coincident with the direction of the preset speed. The laser light source device is used for emitting pulse laser, focusing the pulse laser on a target hitting position, hitting the target material liquid drop, enabling the target material liquid drop to be subjected to laser acting force perpendicular to a rotating plane and to be converted into plasma, and generating extreme ultraviolet light. The waste liquid collector is used for treating residual waste liquid of the hit target material liquid drops.
Specifically, referring to fig. 5, the droplet generating device 10 is arranged along a predetermined speed V1To produce target droplets 11 of a predetermined size. The material of the target droplets 11 is a metal, such as tin. The preset specification of the target material droplet 11 means that the size and the shape of the target material droplet 11 fluctuate within a certain range, and although the fluctuation may cause a change in the movement track of the target material droplet 11, the amount of the change caused by the fluctuation is very small, which is not enough to make the target material droplet 11 deviate from the target position B, that is, the target material droplet 11 with the preset specification can move to the target position B under the action of external force. Taking a sphere as an example, the target droplet 11 with a predetermined specification may mean that the radius of the target droplet 11 is within a predetermined radius threshold range, and the sphericity of the target droplet 11 is within a predetermined sphericity range. The environment in which the target droplets 11 and the pulsed laser 21 are located may be an atmospheric environment or a vacuum environment in which air is thin. Furthermore, the vacuum environment can be a vacuum cavity, and a vacuum pump is used for pumping air out of the cavity to ensure the vacuum degree of the cavity and reduce the influence of the air on the target shooting process.
The droplet generating apparatus 10 includes a driving device for generating a driving force to generate an initial rotational angular velocity of the target droplet 11. As described above, the driving force may be a mechanical force, a magnetic force, or an optical force. For example, a rotating mechanism may be provided at the end of the droplet generator 10, and the mechanism may rotate the target droplet 11 to have a rotational angular velocity before the target droplet 11 is separated from the droplet generator 10. For another example, a magnetic field may be applied to magnetize the target droplet 11, and then the magnetic field may be twisted to generate a rotational angular velocity of the target droplet 11. In addition, two laser beams with the same wavelength, the same light intensity, the same transmission direction and symmetrically distributed along the gravity center of the target droplet 11 can be focused on the target droplet 11, so that the target droplet 11 generates rotation angular momentum under the action of the two laser beams and rotates.
The laser light source device 20 includes a laser for generating the pulse laser 21 and a beam delivery device for determining the transmission direction of the pulse laser 21 and focusing it on the target position B. The light beam transmission device comprises an optical assembly and a focusing assembly, wherein the optical assembly comprises a lens and a reflector, and the focusing assembly comprises a focusing lens.
Further, the external force that causes the movement direction of the target material droplet to deviate from the preset speed forms an angle with the preset speed that is greater than 0 ° and less than 180 °, for example, the angle may be 90 °. The external force may be one or more of gravity, an electric field force, a magnetic field force, and an optical force. When the direction of the preset speed is the gravity direction, an external force deviating from the vertical direction is applied to enable the target material liquid drop to obtain an acceleration deviating from the direction of the preset speed, and then the target material liquid drop moves to the target shooting position deviating from the direction of the preset speed.
When the direction of the predetermined velocity is not coincident with the direction of gravity, gravity will cause the target droplets 11 to deviate from the predetermined velocity V1Is moved in the direction of (1). In one embodiment, the external force is gravity, and the external force is obtained by matching a preset speed V according to the spatial relationship between the point B of the target-hitting position and the point A of the liquid drop outlet1The adjustment is carried out to ensure that the target material liquid drop 11 can deviate from the preset speed V under the action of gravity1To reach the target position B. In another embodiment, the external force includes gravity and other forces other than gravity, depending on the spatial relationship of the target location B and the droplet outlet AThe adjustment of the other forces can ensure that the target material liquid drop 11 can deviate from the preset speed V under the action of gravity and other external forces1To reach the target position B.
After being detached from the droplet generator 10, the target droplets 11 are kept rotating while moving to the target position B by inertia. In the process of autorotation, the size of the target material liquid drop 11 on the rotation plane is enlarged due to the action of centrifugal force, the size of the target material liquid drop 11 in the direction vertical to the rotation plane is reduced due to unchanged volume, the target material liquid drop is gradually changed from a spherical shape to a cake shape, and the target material liquid drop interacts with the pulse laser 21 at a target-hitting position B point in the cake shape to generate plasma extreme ultraviolet radiation.
The number of the pulse lasers 21 for striking the target droplet 11 may be one pulse laser or may be a combination of a plurality of pulse lasers. When the pulse laser 21 is formed by converging multiple paths of pulse lasers, the beam delivery devices corresponding to the multiple paths of pulse lasers focus the multiple paths of pulse lasers on the target-hitting position B point respectively, and the transmission directions of the multiple paths of pulse lasers are distributed in an array mode by taking the rotation direction of the target material droplet 11 as a symmetry axis. By controlling the time sequence of each laser, each path of pulse laser can reach the point B of the target position at the same time and act on the target liquid drop 11, so that the target liquid drop 11 is subjected to the action force of the laser vertical to the direction of the rotating plane and is converted into plasma to generate extreme ultraviolet light.
The droplet receiving device 30 is disposed below the target hitting position B along the droplet moving path, so that on one hand, residual waste liquid of the target droplets 11 after being hit can be collected, and on the other hand, target droplets 11 which are missed by the target hitting laser 21 can also be collected, so that the system is prevented from being polluted, and the service life is prolonged.
In the extreme ultraviolet light generating device, first, the target droplet generator 10 is configured to generate the target droplets 11 having a preset speed and an initial rotation angular speed, and the target droplets are transformed into a cake shape while moving to the target hitting position. The pulsed laser 21 hits the target droplet 11, so that the target droplet 11 is subjected to a laser force along a plane perpendicular to the rotation plane of the target droplet 11, which is beneficial for increasing the size of the pulsed laser 21The active area is such that the energy of the pulse laser 21 is sufficiently absorbed by the target droplet 11. Secondly, the acting force and the preset speed V of the pulse laser 211Are all perpendicular to the rotation plane of the target material liquid drop 11, and the connecting line of the target hitting position B point and the liquid drop outlet A point is connected with the preset speed V1The directions of the target droplets do not coincide, and the energy loss of the pulse laser 21 caused by the fact that the residual waste liquid of the previous target droplet blocks the laser light path on the transmission path of the pulse laser 21 can be avoided. Then, the moving direction of the target droplet 11 is adjusted according to the positional relationship between the target position B and the droplet outlet a, so that the target droplet 11 can be ensured to reach the target position B and be hit by the pulse laser. Since the preset specification of the target material liquid droplet 11 is not changed, the repeatability of the motion path of the target material liquid droplet 11 can be ensured. Finally, the waste liquid collector 30 is arranged to treat the residual waste liquid of the target material droplets 11 after being hit by the pulse laser 21, so that pollution of the residual waste liquid to each element can be reduced, the extreme ultraviolet radiation efficiency can be improved, and the service life of each element can be prolonged. The methods are mutually matched, and the energy conversion rate of the target laser is favorably improved.
In one embodiment, the extreme ultraviolet light generating device further comprises an electric field driving device for generating an electric field force, so that the target material liquid drop moves to the target position under the action of the electric field force.
The direction and the size of the electric field force generated by the electric field driving device are determined according to the spatial relationship between the target shooting position and the liquid drop outlet and the size and the direction of the gravity field. For convenience of understanding, in the present embodiment, a case where the direction of the preset speed is the gravity direction and the direction of the electric field force is perpendicular to the gravity direction is taken as an example for explanation.
Specifically, referring to fig. 5, the droplet generating device 10 is arranged along a predetermined speed V1Generates a target droplet 11 of a preset specification, and can determine a first deviation distance S according to the position relation between the target hitting position B and the droplet outlet A1And a second offset distance S2The moving process of the target droplet 11 is analyzed to determine the magnitude of the electric field force F that needs to be provided by the electric field driving device 40. For the specific analysis process, see above, and are not described herein again. According to the band of target droplets 11The electric quantity, adjusting the parameters of the electric field driving device 40, can provide the electric field force F required by the trajectory deflection, so as to make the target material droplet 11 deviate from the preset speed V1To reach the target position B.
In one embodiment, the extreme ultraviolet light generating device further comprises an electric quantity adjusting device for enabling the target liquid drop to carry the electric charge quantity before the target liquid drop is separated from the liquid drop generating device. Specifically, the electric quantity adjusting device may adjust the electric quantity of the solid target before the solid target liquefies, or may adjust the electric quantity of the target droplet after the solid target liquefies to generate the target droplet.
In one embodiment, the power regulating device comprises a capacitor plate and a power source, wherein the power source is connected with the capacitor plate. The power supply is used for supplying voltage to the capacitor plate; the capacitor plate is arranged in the liquid drop generating device and used for enabling the target liquid drops entering the action area of the capacitor plate to carry electric charge before the target liquid drops are separated from the liquid drop generating device.
Specifically, the power supply supplies power to the capacitor plate to enable the capacitor plate to be electrified, when the target material liquid drops enter the action area of the capacitor plate, the charge quantity on the capacitor plate is transferred to the target material liquid drops, the adjustment of the charge quantity can be completed by adjusting the voltage of the capacitor plate, the charge quantity of the target material liquid drops is kept consistent, and the subsequent deflection control is facilitated.
In the above embodiment, the target droplets are moved in the direction deviating from the preset speed by applying the electric field, so that the target droplets reach the target hitting position, the calculation and control processes can be simplified, and the efficiency can be improved.
The technical features of the above embodiments can be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the above embodiments are not described, but should be considered as the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present application, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the concept of the present application, which falls within the scope of protection of the present application. Therefore, the protection scope of the present patent shall be subject to the appended claims.

Claims (10)

1. A method of generating extreme ultraviolet light, the method comprising:
generating target material liquid drops with preset specifications along the direction of preset speed, and enabling the target material liquid drops to move to reach a target shooting position under the action of external force; the target material liquid drop has a preset speed and an initial rotation angular speed; the preset speed is vertical to the rotation plane of the target material liquid drop; the connecting line of the target hitting position and the liquid drop outlet is not coincident with the direction of the preset speed;
emitting pulse laser, focusing the pulse laser on the target hitting position, hitting the target material liquid drop, enabling the target material liquid drop to be subjected to laser acting force perpendicular to the rotating plane and to be converted into plasma, and generating extreme ultraviolet light;
and treating residual waste liquid of the hit target material liquid drops.
2. The method of claim 1, wherein the generating of the target droplets with a predetermined size along a predetermined speed direction to make the target droplets move to a target position under an external force comprises:
generating target material liquid drops with preset specifications along the direction of a preset speed;
determining a first deviation distance between the target position and the droplet outlet in the direction of the preset speed and a second deviation distance between the target position and the droplet outlet in the vertical direction of the preset speed according to the position relation between the target position and the droplet outlet;
determining movement time according to the first deviation distance and the preset speed;
determining a preset acceleration according to the movement time and the second deviation distance; the preset acceleration is perpendicular to the preset speed;
and applying an external force to enable the target material liquid drop to have the preset acceleration, and adjusting the motion direction of the target material liquid drop to enable the target material liquid drop to reach the target hitting position.
3. The extreme ultraviolet light generating method as recited in claim 2 wherein the external force comprises an electric force and the target droplets carry a charge.
4. The extreme ultraviolet light generating method as recited in claim 2, wherein the external force is gravity.
5. The extreme ultraviolet light generating method as claimed in claim 1, further comprising, after processing the residual substance of the droplet target after being hit:
acquiring feedback information sent by a waste liquid collector;
and adjusting the working parameters of the laser light source device according to the feedback information.
6. The extreme ultraviolet light generating method as claimed in claim 5, wherein an alternating electric field is provided in the waste liquid collector, and the processing of the residual waste liquid of the target material droplets after being hit comprises dissipating the residual waste liquid of the target material droplets after being hit; the feedback information comprises liquid drop dissipation efficiency, and after the feedback information sent by the waste liquid collector is obtained, the method further comprises the following steps:
adjusting a parameter of the alternating electric field according to the droplet dissipation efficiency.
7. An extreme ultraviolet light generating device is characterized by comprising a liquid drop generating device, a laser light source device and a waste liquid collector;
the droplet generating device is used for generating target droplets with preset specifications along the direction of preset speed so that the target droplets move to a target shooting position under the action of external force; the target liquid drop has a preset speed and an initial rotation angular speed; the preset speed is perpendicular to the rotation plane of the target liquid drop; the connecting line of the target hitting position and the liquid drop outlet is not coincident with the direction of the preset speed;
the laser light source device is used for emitting pulse laser, focusing the pulse laser at the target hitting position, hitting the target liquid drop, enabling the target liquid drop to be subjected to laser acting force perpendicular to the rotating plane and to be converted into plasma, and generating extreme ultraviolet light;
the waste liquid collector is used for treating residual waste liquid of the hit target liquid drops.
8. The extreme ultraviolet light generating device as claimed in claim 7, further comprising an electric field driving device for generating an electric field force to move the target droplet to the target position under the electric field force.
9. The extreme ultraviolet light generating device as claimed in claim 8, further comprising an electric quantity adjusting device for making the target droplet carry an electric charge quantity before the target droplet is separated from the droplet generating device.
10. The euv light generating device according to claim 9, wherein the charge adjusting device comprises a capacitor plate and a power supply, the power supply is connected to the capacitor plate;
the power supply is used for supplying voltage to the capacitor plate;
the capacitor plate is arranged in the liquid drop generating device and used for enabling the target liquid drop entering the action area of the capacitor plate to carry electric charge before the target liquid drop is separated from the liquid drop generating device.
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113433804A (en) * 2021-07-26 2021-09-24 广东省智能机器人研究院 Extreme ultraviolet lithography method and system

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012146682A (en) * 2012-04-18 2012-08-02 Komatsu Ltd Extreme ultraviolet light source device
CN105307371A (en) * 2015-11-06 2016-02-03 华中科技大学 Device for generating liquid drop target and plasma through rotating disc
US20160377848A1 (en) * 2015-06-26 2016-12-29 Semiconductor Manufacturing International (Shanghai) Corporation Extreme ultraviolet light source, exposure apparatus, and integrated rotary structure fabricating method
CN108803246A (en) * 2017-04-28 2018-11-13 台湾积体电路制造股份有限公司 Method for generating extreme ultraviolet light
CN109581822A (en) * 2017-09-28 2019-04-05 台湾积体电路制造股份有限公司 The light source and its production method, extreme ultraviolet microlithography system of extreme ultraviolet radiation
CN110551982A (en) * 2019-09-12 2019-12-10 天津师范大学 Manufacturing method and equipment of target and thin film for pulse laser film forming
CN111913370A (en) * 2020-08-27 2020-11-10 广东省智能机器人研究院 Extreme ultraviolet light generating method and device

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012146682A (en) * 2012-04-18 2012-08-02 Komatsu Ltd Extreme ultraviolet light source device
US20160377848A1 (en) * 2015-06-26 2016-12-29 Semiconductor Manufacturing International (Shanghai) Corporation Extreme ultraviolet light source, exposure apparatus, and integrated rotary structure fabricating method
CN105307371A (en) * 2015-11-06 2016-02-03 华中科技大学 Device for generating liquid drop target and plasma through rotating disc
CN108803246A (en) * 2017-04-28 2018-11-13 台湾积体电路制造股份有限公司 Method for generating extreme ultraviolet light
CN109581822A (en) * 2017-09-28 2019-04-05 台湾积体电路制造股份有限公司 The light source and its production method, extreme ultraviolet microlithography system of extreme ultraviolet radiation
CN110551982A (en) * 2019-09-12 2019-12-10 天津师范大学 Manufacturing method and equipment of target and thin film for pulse laser film forming
CN111913370A (en) * 2020-08-27 2020-11-10 广东省智能机器人研究院 Extreme ultraviolet light generating method and device

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
VERMA, D ET AL.: "Shapes of rotating normal fluid 3He versus superfluid 4He droplets in molecular beams", PHYSICAL REVIEW B, vol. 102, no. 1 *
周泽宇等: "旋转液滴法测界面张力的模型分析与应用", 当代化工, vol. 46, no. 7 *
赵红军等: "气体放电等离子体(DPP)极紫外光源研究进展", 微型机与应用, no. 09 *
陈鸿等: "脉冲激光辐照液滴锡靶等离子体极紫外辐射的实验研究", 物理学报, no. 07 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113433804A (en) * 2021-07-26 2021-09-24 广东省智能机器人研究院 Extreme ultraviolet lithography method and system
CN113433804B (en) * 2021-07-26 2023-04-14 广东省智能机器人研究院 Extreme ultraviolet lithography method and system

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