CN112947009A - Micro-LED photoetching system for improving sub-pixel light emitting balance - Google Patents
Micro-LED photoetching system for improving sub-pixel light emitting balance Download PDFInfo
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- 238000005286 illumination Methods 0.000 claims abstract description 37
- 239000003086 colorant Substances 0.000 claims abstract description 31
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- 238000004020 luminiscence type Methods 0.000 claims description 3
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- G03F7/70008—Production of exposure light, i.e. light sources
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- H01L27/153—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components having potential barriers, specially adapted for light emission in a repetitive configuration, e.g. LED bars
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Abstract
The invention relates to a Micro-LED photoetching system for improving sub-pixel light emitting balance, which comprises: the light source module is used for providing three groups of light sources with different incidence directions; the mask module comprises a mask, wherein the mask comprises a light-transmitting area and a non-light-transmitting area; the array substrate comprises display pixels arranged in an array, and each display pixel comprises red, green and blue sub-pixels; the loading platform is used for loading the array substrate; the developing machine is used for spraying developing solution to dissolve the photoresist on the array substrate; and the etching machine is used for etching the sub-pixels to form three liquid storage tanks with different depths. Under the condition of keeping the relative position of the mask and the array substrate unchanged, the three groups of light sources penetrate through the light-transmitting area at the same time to expose the sub-pixels with different colors, and the illumination intensity and the illumination time of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixels with the colors corresponding to the group of light sources. The system is beneficial to improving the balance of the luminance of the sub-pixels and improving the display effect.
Description
Technical Field
The invention belongs to the field of displays, and particularly relates to a Micro-LED photoetching system for improving sub-pixel light emitting balance.
Background
Micro-LEDs (Micro light emitting diodes) are a new generation of display technology, with higher brightness, better light emitting efficiency, but lower power consumption than existing OLED (organic light emitting diode) technologies. According to the Micro-LED technology, the LED structure is designed to be thin-film, Micro-miniature and arrayed, and the size of the Micro-LED is only about 1-10 mu m. The Micro-LED has the greatest advantages of micron-scale spacing, addressing control and single-point drive luminescence of each pixel (pixel), long service life and wide application range.
Quantum dots QDs are semiconductor nanoparticles composed of group II-VI or III-V elements, typically ranging in size from a few nanometers to tens of nanometers. Due to the existence of quantum confinement effect, the originally continuous energy band of the quantum dot material is changed into a discrete energy level structure, and the quantum dot material can emit visible light after being excited by the outside. The quantum dot material has a smaller full width at half maximum of a light-emitting peak, and the light-emitting color can be adjusted through the size, structure or components of the quantum dot material, so that the color saturation and color gamut can be improved when the quantum dot material is applied to the Micro-LED display field. Due to the characteristics of quantum dot materials, the quantum dot materials are often applied to Micro-LEDs as light-emitting crystal grains.
In a Micro-LED, liquid storage tanks (grooves) with the same size are generally used for encapsulating quantum dots corresponding to red, green and blue colors, but the amount of quantum dot colloid encapsulation corresponding to different colors is different, so that when the liquid storage tanks are encapsulated with glue, the thickness of the encapsulated glue is also different, further the light-emitting luminance of sub-pixels with different colors is unbalanced, and the display effect is poor.
Disclosure of Invention
The invention aims to provide a Micro-LED photoetching system for improving the light emitting balance of sub-pixels, which is beneficial to improving the light emitting balance of the sub-pixels and improving the display effect.
In order to achieve the purpose, the invention adopts the technical scheme that: a Micro-LED photoetching system for improving sub-pixel light emitting balance is disclosed, wherein a Micro-LED comprises a red sub-pixel, a green sub-pixel and a blue sub-pixel, each sub-pixel comprises a liquid storage tank, each liquid storage tank is filled with a sub-point colloid, and a UV-LED is arranged below each liquid storage tank; the system comprises:
the light source module is used for providing three groups of light sources with different incidence directions;
the mask module comprises a mask, wherein the mask comprises a light-transmitting area and a non-light-transmitting area;
the array substrate comprises display pixels arranged in an array, each display pixel comprises a red sub-pixel, a green sub-pixel and a blue sub-pixel, and the display pixels respectively correspond to the three groups of light sources with different incidence directions;
the loading platform is used for loading the array substrate;
the developing machine is used for spraying developing solution to dissolve the photoresist on the array substrate for the first time; and
the etching machine is used for etching the sub-pixels to form three liquid storage tanks with different depths;
the mask is arranged between the light source module and the loading platform, and a light-transmitting area of the mask corresponds to each display pixel; under the condition that the relative position of the mask and the array substrate is kept unchanged, the three groups of light sources provided by the light source module penetrate through the light-transmitting area of the mask at the same time to expose the sub-pixels with different colors, and the illumination intensity and the illumination time of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixels with the colors corresponding to the group of light sources.
Further, the incidence directions of the three groups of light sources are respectively at a first incidence angle theta1A second incident angle theta2And a third incident angle theta3Incident at the first incident angle theta1A second incident angle theta2And a third incident angle theta3Is an angle between the incident direction and the normal of the array substrate and has a value of theta2＝-θ1，θ3＝0；
The distance between the mask and the array substrate positioned on the loading platform is a first distance d;
the exposure width of each color sub-pixel is a first width p, and the gaps between two adjacent sub-pixels in the same display pixel are first gaps q;
the first incident angle theta1A second incident angle theta2A third incident angle theta3The first distance d, the first width p and the first gap q have d ═ p + q × | cot θ1The relationship of | is given.
Further, controlling the mask to keep the first distance d unchanged; controlling the light source module to adjust the first incident angle theta1And a second incident angle theta2And enabling the three groups of light sources to expose the sub-pixels with different colors.
Further, the light source module is controlled to enable the first incidence angle theta1And a second incident angle theta2Keeping the same; and controlling the mask plate, and adjusting the first distance d to expose the sub-pixels with different colors by the three groups of light sources.
Further, the three sub-pixels included in the display pixel are rectangles with equal size, and the sub-pixels and the light-transmitting area are the same in size.
Furthermore, a plurality of display pixels form a column of pixel groups, the column of pixel groups are divided into a red sub-pixel group, a green sub-pixel group and a blue sub-pixel group, and the red sub-pixel group, the green sub-pixel group, the blue sub-pixel group and the light-transmitting area are rectangles with equal width.
Further, the system also comprises a dryer used for drying the array substrate.
Furthermore, the system also comprises a quantum dot colloid encapsulation module which is used for adding quantum dot colloid with the volume corresponding to the depth of the liquid storage tank.
Furthermore, the system also comprises a sealing glue module which is used for sealing the liquid storage tank to form a sealing glue layer with consistent thickness.
Further, the photoresist is a positive photoresist.
Compared with the prior art, the invention has the following beneficial effects: 1. under the condition of keeping the relative position of the mask and the array substrate unchanged, the three groups of light sources provided by the light source module expose the sub-pixels with different colors through the light-transmitting area of the mask at the same time. The invention can complete the exposure of all sub-pixels without contraposition by maintaining the relative positions of the mask and the array substrate, thereby avoiding incomplete exposure caused by contraposition errors. 2. In the invention, each display pixel comprises a red sub-pixel, a green sub-pixel and a blue sub-pixel which respectively correspond to three groups of light sources with different incidence directions; and the illumination intensity and the illumination time of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixels of the color corresponding to the group of light sources. The photoresist has different solubility in the developing solution due to different illumination intensity and illumination time, and the characteristics can ensure that the depths formed by the liquid storage tanks corresponding to different groups of light sources during etching are different. In summary, the invention adopts the illumination module to generate three groups of light sources with different illumination intensities and illumination times to expose the three sub-pixels at the same time, and then adopts the developing machine and the etching machine to perform developing etching on the sub-pixels, thereby forming three liquid storage tanks with different depths, so that the liquid storage tanks of the sub-pixels with different colors can package quantum dot colloids with corresponding volumes, thereby ensuring the consistent sealing thickness of each liquid storage tank, improving the balance of the luminance of the sub-pixels and improving the display effect.
Drawings
Fig. 1 is a schematic system structure according to an embodiment of the present invention.
FIG. 2 is a schematic structural diagram of a Micro-LED in an embodiment of the present invention.
Fig. 3 is a schematic diagram of an exposure light path of a first specific case in the embodiment of the present invention.
Fig. 4 is a schematic diagram of an exposure light path of a second specific case in the embodiment of the present invention.
FIG. 5 is a schematic diagram of a relationship between a sub-pixel and a transparent region according to an embodiment of the present invention.
FIG. 6 is a schematic diagram illustrating a relationship between a display pixel group and a transparent region according to an embodiment of the present invention.
FIG. 7 is a schematic diagram of a prior art Micro-LED structure.
Detailed Description
The invention discloses a Micro-LED photoetching system for improving sub-pixel luminescence balance, and a person skilled in the art can appropriately improve technical details for realizing the Micro-LED photoetching system by referring to the content. It is expressly intended that all such similar substitutes and modifications which would be obvious to one skilled in the art are deemed to be included in the invention. While the methods and applications of this invention have been described in terms of preferred embodiments, it will be apparent to those of ordinary skill in the art that variations and modifications in the methods and applications described herein, as well as other suitable variations and combinations, may be made to implement and use the techniques of this invention without departing from the spirit and scope of the invention.
The quantum dots corresponding to the sub-pixels with different colors have different absorbed energies for generating light with the same brightness, so that quantum dot colloids with different shapes are required to be adopted for enabling the sub-pixels with different colors to emit light uniformly. However, the size of each liquid storage tank of the Micro-LED array substrate is generally consistent, which makes the thickness of the liquid storage tanks of the sub-pixels with different colors inconsistent when being sealed as shown in fig. 7. In fig. 7, 701 is a sealant layer, 702 is a liquid storage tank, and 703 is a UV-LED. The different sealing glue thickness leads to different brightness of quantum dots after the quantum dots emit light through the sealing glue layer, so that the luminance of the sub-pixels with different colors is not balanced, and the display effect is poor.
In view of this, as shown in fig. 1 to 6, an embodiment of the present invention provides a Micro-LED lithography system for improving sub-pixel light emission balance, where the Micro-LED includes a red sub-pixel, a green sub-pixel, and a blue sub-pixel, each sub-pixel includes a liquid storage tank, a UV-LED is disposed below each liquid storage tank, and a quantum dot colloid is filled in each liquid storage tank. As shown in fig. 1, the system includes: the light source module 101, the mask module 102, the loading platform 103, the array substrate 104, the developing machine 105 and the photolithography machine 106.
The light source module 101 is used for providing three groups of light sources with different incident directions.
It should be noted that the lamp used by the light source module 101 is a lamp capable of emitting ultraviolet light. The three sets of light sources are all ultraviolet light.
The mask module 102 includes a mask, which includes a transparent region and a non-transparent region.
It should be noted that the light-transmitting region is used for transmitting a light source to expose each sub-pixel in the display pixel, and the non-light-transmitting region is used for shielding the light source, so as to prevent the photoresist at other positions on the array substrate 104 from being exposed and subsequently dissolved in the developing solution.
The loading platform 103 is used for loading the array substrate 104.
The light receiving surface of the array substrate 104 is coated with a photoresist, the array substrate 104 includes display pixels arranged in an array, each display pixel includes a red sub-pixel, a green sub-pixel and a blue sub-pixel, and the display pixels respectively correspond to three groups of light sources with different incident directions. The mask is disposed between the light source module 101 and the loading platform 103, and the light-transmitting area of the mask corresponds to each display pixel.
It should be noted that the color presented by each sub-pixel is determined by the filled quantum dots. The quantum dots can emit colored light when being stimulated by light or electricity, the color of the light is determined by the composition material and the size and the shape of the quantum dots, the larger the general particle is, the longer the particle can absorb, and the smaller the particle is, the shorter the particle can absorb. The quantum dots with the size of 8 nanometers can absorb red of long wave and show blue, and the quantum dots with the size of 2 nanometers can absorb blue of short wave and show red. This property enables the quantum dots to change the color of light emitted by the light source. The quantum dots corresponding to the sub-pixels of different colors are also different in size. Photoresist is an organic compound that changes solubility in a developing solution after exposure to ultraviolet light. A positive photoresist is a type of photoresist in which, after exposure, exposed portions are soluble in a developing solution and unexposed portions are insoluble. The solubility of the positive photoresist adopted by the embodiment of the invention in the developing solution is improved along with the increase of the illumination intensity and the illumination time.
Under the condition that the relative position of the mask and the array substrate 104 is maintained unchanged, the three groups of light sources provided by the light source module 101 penetrate through the light-transmitting area of the mask at the same time to expose the sub-pixels with different colors, and the illumination intensity and the illumination time of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixels with the colors corresponding to the group of light sources.
It should be noted that, by maintaining the relative position between the mask and the array substrate 104 unchanged, the problem that the sub-pixel part region is repeatedly exposed or not exposed due to the alignment error of exposing the sub-pixels with different colors by moving the mask can be solved. And exposing the sub-pixels of different groups by adopting three groups of light sources with different incidence directions to simultaneously penetrate through the light transmission area of the mask. Therefore, the exposure of all the sub-pixels can be completed by only one-time irradiation, so that the exposure efficiency is improved, and the productivity is improved.
In addition, because the quantum dots of the sub-pixels with different colors are irradiated by the UV-LED with the same power to produce the same brightness, the quantum dots are required to be different, namely the quantum dots are different in volume. Therefore, under the condition that the volumes of the quantum dot colloids are different, the sealant layers of the sub-pixels with different colors are required to be the same, and the depths of the liquid storage tanks for loading the quantum dot colloids are required to be different. The solubility of the photoresist adopted by the embodiment of the invention in the developing solution is increased along with the increase of the illumination intensity and the illumination time, and the photoresist can be exposed by utilizing light sources with different illumination time and illumination intensity according to the characteristic, so that liquid storage tanks with different depths are etched. In summary, the invention determines how deep the liquid storage tank is used according to the volume of the quantum dot colloid corresponding to the sub-pixels with different colors, and then determines the irradiation intensity and the irradiation time of the light source according to the depth of the liquid storage tank.
And the developing machine 105 is used for spraying a developing solution to dissolve the photoresist on the array substrate 104 for a first time.
And the etching machine 106 is used for etching the sub-pixels to form three liquid storage tanks with different depths.
Alternatively, as shown in fig. 1, the exposed array substrate may pass through the developing machine 105 and the etching machine 106 at a time to complete the development etching by moving the loading platform 103.
Optionally, in a specific embodiment, the three groups of light sources with different incident directions respectively include: the first light source exposes the red sub-pixel, the second light source exposes the green sub-pixel, and the third light source exposes the blue sub-pixel.
Wherein, under the same illumination time of the first light source, the second light source and the third light source, the illumination intensity is as follows: first light source < second light source < third light source.
Under the condition that the illumination intensity of the first light source, the second light source and the third light source is the same, the illumination time is as follows: first light source < second light source < third light source.
Under the condition that the illumination time and the illumination intensity are different, after the illumination of three groups of light sources, the solubility of the photoresist on each color sub-pixel needs to be ensured: red subpixel < green subpixel < blue subpixel.
In general, the quantum dot colloids corresponding to the red, green and blue subpixels generate light with the same brightness, and the required volume of the quantum dot colloid is as follows: red subpixel < green subpixel < blue subpixel.
In a specific embodiment, as shown in fig. 2, 201 is an encapsulant layer, 202 is a reservoir for red sub-pixels, 203 is a reservoir for green sub-pixels, 204 is a reservoir for blue sub-pixels, 205 is a UV-LED, and 206 is the array substrate 104. The thicknesses of the sealant layers 201 are the same.
Optionally, the design parameters of the system include:
the incidence directions of the three groups of light sources are respectively at a first incidence angle theta1A second incident angle theta2And a third incident angle theta3Incident at a first angle of incidence theta1A second incident angle theta2And a third incident angle theta3Is the angle between the incident direction and the normal of the array substrate 104 and has a value of theta2＝-θ1，θ3＝0；
The distance between the mask and the array substrate 104 on the loading platform 103 is a first distance d;
the exposure width of each color sub-pixel is a first width p, and the gaps between two adjacent sub-pixels in the same display pixel are first gaps q;
first incident angle theta1A second incident angle theta2A third incident angle theta3The first distance d, the first width p and the first gap q have d ═ p + q × | cot θ1The relationship of | is given.
It should be noted that the exposure width of each sub-pixel is equal, and the exposure width is the projection length of the sub-pixel on the front viewing surface of the array substrate 104. The front view plane of the array substrate 104 is a plane perpendicular to the center line of the middle sub-pixel of the display pixel. Fig. 3 and 4 are optical path diagrams of the front view surface of the array substrate 104. The gap between two adjacent sub-pixels in the same display pixel may be an electrode. The distance between the mask and the array substrate 104 is kept to ensure that three groups of light sources in different directions expose three sub-pixels with different colors at the same time.
Optionally, in a specific embodiment, when a gap between two adjacent sub-pixels in the same display pixel is 0, that is, q is 0, optical paths during exposure are as shown in fig. 3, where 301 is a mask and 302 is three sub-pixels of the same display pixel. The distance d between the mask and the array substrate 104, the exposure width p of the sub-pixel, the gap q between two adjacent sub-pixels in the same display pixel, and the first incident angle θ1A second incident angle theta2And a third incident angle theta3Having d ═ p × | cotθ1The relationship of | is given.
Optionally, in a specific embodiment, when a gap between two adjacent sub-pixels in the same display pixel is greater than 0, that is, q is greater than 0, light paths during exposure are as shown in fig. 4, where 401 is a mask and 402 is three sub-pixels of the same display pixel. The distance d between the mask and the array substrate 104, the exposure width p of the sub-pixel, the gap q between two adjacent sub-pixels in the same display pixel, and the first incident angle θ1A second incident angle theta2And a third incident angle theta3Having d ═ p + q × | otθ1The relationship of | is given.
Optionally, controlling the mask to keep the first distance d unchanged; controlling the light source module 101 to adjust the first incident angle theta1And a second incident angle theta2Three sets of light sources are used to expose different color sub-pixels.
It should be noted that the first incident angle θ is adjusted1And a second incident angle theta2The three groups of light sources are used for exposing the sub-pixels of different groups, so that the problem that exposure effect is poor due to the fact that the light-transmitting area cannot correspond to each display pixel as a result of moving the mask module 102 is avoided.
Optionally, the light source module 101 is controlled to make the first incident angle θ1And a second incident angle theta2Keeping the same; and controlling the mask plate, and adjusting the first distance d to expose the sub-pixels with different colors by the three groups of light sources.
It should be noted that, when the array substrate 104 is loaded, the mask plate needs to be moved, and at that time, the mask plate is simultaneously adjusted, and the distance d between the mask plate and the array substrate 104 is changed to enable the three groups of light sources to expose different groups of sub-pixels. This may effectively save total manufacturing time.
Optionally, three sub-pixels included in the display pixel are rectangles with equal size, and the size of the sub-pixels is the same as that of the light-transmitting area.
As shown in fig. 5, the display pixel 501 includes three sub-pixels, and the light-transmitting region is a rectangle equal to the sub-pixels. The gaps between the sub-pixels are not shown in fig. 5, and do not limit the present invention.
Optionally, the plurality of display pixels form a column of pixel groups, the column of pixel groups are divided into a red sub-pixel group, a green sub-pixel group and a blue sub-pixel group, and the red sub-pixel group, the green sub-pixel group, the blue sub-pixel group and the light-transmitting region are rectangles with equal width.
As shown in fig. 6, a plurality of display pixels form a column of pixel groups 601, and the pixel groups 601 include a red sub-pixel group, a green sub-pixel group, and a blue sub-pixel group. And the red sub-pixel group, the green sub-pixel group, the blue sub-pixel group and the light-transmitting region 602 are rectangles with equal width. In fig. 6, the display pixels and the gaps between the display pixels are not shown, and the gaps between adjacent sub-pixels in the same display pixel are not shown, which does not limit the present invention.
Optionally, the system further includes a dryer for drying the array substrate 104.
It should be noted that the array substrate 104 is dried after the development to be etched. Because the etching is divided into dry etching and wet etching, liquid materials may be used for etching, and if the etching is not dried, the etching materials are easily polluted.
Optionally, the system further comprises a UV-LED setting module for setting the UV-LED at the bottom of the liquid storage tank.
Optionally, the system further comprises:
and the quantum dot colloid packaging module is used for adding quantum dot colloid with the volume corresponding to the depth of the liquid storage tank into the liquid storage tank.
Optionally, the system further includes a sealing module for sealing the liquid storage tank to form a sealing layer with a uniform thickness.
Optionally, the photoresist is a positive photoresist.
It should be noted that, since the present invention uses a positive photoresist, only the exposed photoresist can be dissolved in the developer, and the solubility of the photoresist increases with the increase of the illumination time and the illumination intensity. After the same time of dissolution, the depths of the grooves formed on the sub-pixels with different colors are different, and the depths of the liquid storage tanks formed by etching are different during the subsequent etching.
In the embodiment of the invention, under the condition that the relative position of the mask and the array substrate 104 is maintained unchanged, the three groups of light sources provided by the light source module 101 expose the sub-pixels with different colors through the light-transmitting area of the mask at the same time. The embodiment of the invention can complete the exposure of all the sub-pixels without carrying out alignment by maintaining the relative positions of the mask and the array substrate 104, thereby avoiding incomplete exposure caused by alignment errors. In the embodiment of the invention, each display pixel comprises a red sub-pixel, a green sub-pixel and a blue sub-pixel which respectively correspond to three groups of light sources with different incidence directions; and the illumination intensity and the illumination time of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixels of the color corresponding to the group of light sources. The photoresist has different solubility in the developing solution due to different illumination intensity and illumination time, and the characteristics can ensure that the depths formed by the liquid storage tanks corresponding to different groups of light sources during etching are different. In summary, in the embodiment of the invention, the illumination module is adopted to generate three groups of light sources with different illumination intensities and illumination times at the same time to expose the three sub-pixels, and then the developing machine 105 and the etching machine 106 are adopted to perform developing etching on the sub-pixels, so that three liquid storage tanks with different depths are formed, the liquid storage tanks of the sub-pixels with different colors can package quantum dot colloids with corresponding volumes, the sealing thickness of each liquid storage tank can be ensured to be consistent, the balance of the light-emitting brightness of the sub-pixels is improved, and the display effect is improved.
It is noted that, herein, relational terms such as first and second, and the like may be used solely to distinguish one entity or action from another entity or action without necessarily requiring or implying any actual such relationship or order between such entities or actions. Also, the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising an … …" does not exclude the presence of other identical elements in a process, method, article, or apparatus that comprises the element.
All the embodiments in the present specification are described in a related manner, and the same and similar parts among the embodiments may be referred to each other, and each embodiment focuses on the differences from the other embodiments. In particular, for the system embodiment, since it is substantially similar to the method embodiment, the description is simple, and for the relevant points, reference may be made to the partial description of the method embodiment.
The above description is only for the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention shall fall within the protection scope of the present invention.
Claims (10)
1. A Micro-LED photoetching system for improving sub-pixel light emitting balance is characterized in that a Micro-LED comprises a red sub-pixel, a green sub-pixel and a blue sub-pixel, each sub-pixel comprises a liquid storage tank, each liquid storage tank is filled with a sub-point colloid, and an UV-LED is arranged below each liquid storage tank; the system comprises:
the light source module is used for providing three groups of light sources with different incidence directions;
the mask module comprises a mask, wherein the mask comprises a light-transmitting area and a non-light-transmitting area;
the array substrate comprises display pixels arranged in an array, each display pixel comprises a red sub-pixel, a green sub-pixel and a blue sub-pixel, and the display pixels respectively correspond to the three groups of light sources with different incidence directions;
the loading platform is used for loading the array substrate;
the developing machine is used for spraying developing solution to dissolve the photoresist on the array substrate for the first time; and
the etching machine is used for etching the sub-pixels to form three liquid storage tanks with different depths;
the mask is arranged between the light source module and the loading platform, and a light-transmitting area of the mask corresponds to each display pixel; under the condition that the relative position of the mask and the array substrate is kept unchanged, the three groups of light sources provided by the light source module penetrate through the light-transmitting area of the mask at the same time to expose the sub-pixels with different colors, and the illumination intensity and the illumination time of each group of light sources are determined according to the volume of the quantum dot glue body to be filled in the sub-pixels with the colors corresponding to the group of light sources.
2. The Micro-LED lithography system for improving sub-pixel luminescence uniformity of claim 1, wherein the incident directions of said three groups of light sources are respectively at a first incident angle θ1A second incident angle theta2And a third incident angle theta3Incident at the first incident angle theta1A second incident angle theta2And a third incident angle theta3Is an angle between the incident direction and the normal of the array substrate and has a value of theta2＝-θ1，θ3＝0；
The distance between the mask and the array substrate positioned on the loading platform is a first distance d;
the exposure width of each color sub-pixel is a first width p, and the gaps between two adjacent sub-pixels in the same display pixel are first gaps q;
the first incident angle theta1A second incident angle theta2A third incident angle theta3The first distance d, the first width p and the first gap q have d ═ p + q × | cot θ1The relationship of | is given.
3. The Micro-LED lithography system according to claim 2, wherein said mask is controlled such that said first distance d remains constant; controlling the light source module to adjust the first incident angle theta1And a second angle of incidenceθ2And enabling the three groups of light sources to expose the sub-pixels with different colors.
4. The Micro-LED lithography system according to claim 2, wherein said light source module is controlled to make said first incident angle θ1And a second incident angle theta2Keeping the same; and controlling the mask plate, and adjusting the first distance d to expose the sub-pixels with different colors by the three groups of light sources.
5. The Micro-LED lithography system for improving sub-pixel light emission balance as claimed in claim 1, wherein said display pixel comprises three sub-pixels having rectangular shapes with equal size, and said sub-pixels and said light-transmissive region have the same size.
6. The Micro-LED lithography system according to claim 1, wherein a plurality of said display pixels form a column of pixel groups, said column of pixel groups are divided into a red sub-pixel group, a green sub-pixel group and a blue sub-pixel group, and said red sub-pixel group, said green sub-pixel group, said blue sub-pixel group and said light-transmitting region are rectangles of equal width.
7. The Micro-LED lithography system for improving sub-pixel luminance uniformity of claim 1, further comprising a dryer for drying said array substrate.
8. The Micro-LED lithography system according to claim 1, wherein the system further comprises a quantum dot colloid encapsulation module for adding quantum dot colloid of a volume corresponding to the depth of the liquid storage tank.
9. The Micro-LED lithography system of claim 1, wherein the system further comprises a molding die set for molding the liquid storage tank to form a molding compound layer with a uniform thickness.
10. The Micro-LED lithography system of claim 1, wherein said photoresist is a positive photoresist.
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