CN112915697A - Waste gas treatment equipment - Google Patents

Waste gas treatment equipment Download PDF

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Publication number
CN112915697A
CN112915697A CN201911243391.9A CN201911243391A CN112915697A CN 112915697 A CN112915697 A CN 112915697A CN 201911243391 A CN201911243391 A CN 201911243391A CN 112915697 A CN112915697 A CN 112915697A
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China
Prior art keywords
waste gas
shell
reactor
lamp tube
gas
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CN201911243391.9A
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Chinese (zh)
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洪俊
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Suzhou Shengxuan Environmental Engineering Co ltd
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Suzhou Shengxuan Environmental Engineering Co ltd
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Priority to CN201911243391.9A priority Critical patent/CN112915697A/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D50/00—Combinations of methods or devices for separating particles from gases or vapours
    • B01D50/10—Combinations of devices covered by groups B01D45/00, B01D46/00 and B01D47/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
    • B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8678—Removing components of undefined structure
    • B01D53/8687—Organic components
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
    • B01D2253/10—Inorganic adsorbents
    • B01D2253/102—Carbon
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/804—UV light
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2259/00—Type of treatment
    • B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
    • B01D2259/818—Employing electrical discharges or the generation of a plasma

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Toxicology (AREA)
  • Biomedical Technology (AREA)
  • Physical Water Treatments (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

The invention discloses waste gas treatment equipment which comprises a pretreatment reactor, a main reactor and a post-treatment reactor which are sequentially connected through a gas conveying pipe. The invention effectively removes dust particles or water carried in the waste gas through the pretreatment reactor, greatly reduces the blockage problem of the main reactor and the post-treatment reactor and the covering probability of the ultraviolet lamp tube A, improves the service life of the equipment, increases the area of the ultraviolet irradiation catalyst by the W-shaped nanometer photocatalyst porous plate in the main reactor, improves the utilization rate of the ultraviolet light, increases the disturbance of the waste gas entering the main reactor, prolongs the contact and reaction time of the waste gas and activated ions such as free radicals generated by the catalyst and the like, prolongs the residence time of waste gas molecules on a catalytic reaction bed layer, is convenient to clean the outer side wall of the ultraviolet lamp tube A by arranging a cleaning ring on the ultraviolet lamp tube A, and further avoids the problem that the dust covering influences the ultraviolet lamp tube A to carry out photocatalytic oxidation on the waste gas.

Description

Waste gas treatment equipment
Technical Field
The invention relates to the technical field of waste gas treatment devices, in particular to waste gas treatment equipment.
Background
A great deal of research at home and abroad shows that the ultraviolet photocatalysis method has strong oxidizing capability, and can effectively oxidize and degrade organic pollutants such as hydrocarbons, halogenated organic matters, surfactants, dyes, pesticides, phenols, aromatic hydrocarbons and the like, and finally mineralize the organic pollutants into carbon dioxide and water. In addition, the photocatalytic oxidation technology has the advantages of complete elimination of organic pollutants, no secondary pollution and the like when the photocatalytic oxidation technology is carried out at normal temperature and normal pressure. The ultraviolet catalytic oxidation method is used as a safe and efficient environment-friendly waste gas environment purification technology, has a good treatment effect on organic pollutants and malodorous gases, and is more and more popular in application. However, the waste gas treatment equipment based on the ultraviolet catalytic oxidation method in the prior art mainly has the following defects: 1. the defects of small illumination contact area, uneven gas distribution and the like cause slow chemical reaction and influence on the efficiency of photocatalytic reaction; 2. in the prior art, most industrial waste gas contains dust particles, but in the prior art, waste gas treatment equipment based on a photocatalytic oxidation technology cannot remove the dust particles, and after long-time operation, the dust can block and cover the treatment equipment, so that the service life of the equipment is influenced; 3. ultraviolet light source among the exhaust-gas treatment equipment based on ultraviolet catalytic oxidation method among the prior art usually needs to carry out direct contact with waste gas, and dust and particulate matter in the waste gas often still can be attached to and shelter from the ultraviolet ray on the ultraviolet light source to reduce ultraviolet irradiation intensity, influenced the treatment effect of waste gas.
Disclosure of Invention
The invention aims to overcome the defects and provides the waste gas treatment equipment, dust particles or water carried in the waste gas is effectively removed through the pretreatment reactor, the blocking problem of a main reactor and a post-treatment reactor and the covering probability of an ultraviolet lamp tube A are greatly reduced, the service life of the equipment is prolonged, the W-shaped nanometer photocatalyst porous plate in the main reactor not only increases the area of an ultraviolet light irradiation catalyst and improves the utilization rate of ultraviolet light, but also increases the disturbance of the waste gas entering the main reactor, forms strong waste gas turbulence, prolongs the contact and reaction time of the waste gas and activated ions such as free radicals generated by the catalyst and the like, prolongs the retention time of waste gas molecules on a catalytic reaction bed layer, further improves the reaction efficiency of the ultraviolet light and the catalyst, and in addition, the cleaning ring is arranged on the ultraviolet lamp tube A, so that the outer side wall of the ultraviolet lamp tube A can be conveniently cleaned, the problem that the ultraviolet tube A carries out photocatalytic oxidation on the waste gas due to the influence of dust coverage is avoided.
In order to achieve the above object, the present invention provides a waste gas treatment apparatus, including a pretreatment reactor, a main reactor and a post-treatment reactor which are connected in sequence through a gas pipe, wherein the pretreatment reactor is used for pretreating waste gas, the main reactor is used for carrying out photocatalytic treatment on the waste gas pretreated by the pretreatment reactor, and the post-treatment reactor is used for carrying out low-temperature plasma treatment and adsorption treatment on the waste gas treated by the main reactor and then discharging the waste gas;
the main reactor comprises a shell A, and an air inlet A and an air outlet A which are respectively arranged at two ends of the shell A, wherein a W-shaped nano photocatalyst porous plate is arranged between the air inlet A and the air outlet A along the air flowing direction, the closed end of the W-shaped nano photocatalyst porous plate is contacted with the inner side wall of the shell A, an ultraviolet light source component corresponding to the open end of the W-shaped nano photocatalyst porous plate is arranged on the inner side wall of the shell A, and the inner side wall of the shell A is coated with a reflecting layer;
the ultraviolet light source component comprises an ultraviolet lamp tube A, a cleaning ring, an ultraviolet intensity sensor and a microprocessor, wherein two ends of the ultraviolet lamp tube A are fixedly connected with the inner side wall of the shell A through fixing rods respectively, the ultraviolet intensity sensor and the microprocessor are both fixed on the fixing rods, a sliding groove corresponding to the position of the ultraviolet lamp tube A is formed in the inner side wall of the shell A, the length direction of the ultraviolet lamp tube A is consistent with the length direction of the sliding groove and the air flow direction, a sliding block is arranged in the sliding groove in a sliding mode, bristles are arranged on the inner side of the cleaning ring, the cleaning ring is sleeved outside the ultraviolet lamp tube A in a sliding mode, and the sliding block is fixedly connected with the cleaning ring; the ultraviolet light source assembly further comprises a driving mechanism for driving the sliding block to slide in the sliding groove, and the microprocessor is respectively in control connection with the driving mechanism and the ultraviolet intensity sensor.
The dust particle impurities and water in the waste gas are removed through the pretreatment reactor, the influence of the dust and other solid particle impurities and water on the main reactor is effectively reduced, the effect of subsequent photocatalysis, low-temperature plasma and adsorption treatment can be ensured to be optimal, the blockage problem of the main reactor and the post-treatment reactor and the probability of covering the ultraviolet lamp tube A are greatly reduced, and the service life of the equipment is prolonged.
The main reactor generates hydroxyl free radicals, ozone and photoinduced cavities by combining a nano catalyst technology and an ultraviolet light technology, further quickly and effectively kills bacteria, viruses and molds in waste gas, effectively oxidizes and degrades organic pollutants such as hydrocarbons, halogenated organic matters, surfactants, dyes, pesticides, phenols, aromatic hydrocarbons and the like in the waste gas, and finally mineralizes the organic pollutants into carbon dioxide and water, so that the organic pollutants are thoroughly eliminated without secondary pollution.
The W-shaped nanometer photocatalyst porous plate not only increases the area of the ultraviolet light irradiating catalyst and improves the utilization rate of the ultraviolet light, but also increases the disturbance of the waste gas entering the main reactor, forms strong waste gas turbulence, prolongs the contact and reaction time of the waste gas and the free radical and other activated ions generated by the catalyst, prolongs the retention time of waste gas molecules on a catalytic reaction bed layer, and further improves the reaction efficiency of the ultraviolet light and the catalyst.
The cleaning ring is arranged on the ultraviolet lamp tube A, and the driving mechanism drives the sliding block to move in the sliding groove and simultaneously drives the cleaning ring to move on the ultraviolet lamp tube A in a sliding manner, so that the outer side wall of the ultraviolet lamp tube A is conveniently cleaned, and the problem that the ultraviolet lamp tube A is influenced by dust coverage to perform photocatalytic oxidation on waste gas is avoided; the microprocessor judges whether the outer side wall of the ultraviolet lamp tube A needs to be cleaned or not according to ultraviolet intensity data sent by the ultraviolet intensity sensor, the ultraviolet intensity value is preset in the microprocessor to be X, and when the ultraviolet intensity data value detected by the ultraviolet intensity sensor is smaller than X, the microprocessor controls the driving mechanism to move, so that the cleaning ring moves on the ultraviolet lamp tube A to clean the outer side wall of the ultraviolet lamp tube A.
Ultraviolet light that ultraviolet tube A produced can be reflected better through set up the reflector layer at casing A inside wall, has improved the utilization ratio of illumination density under same ultraviolet light illuminance condition to the work efficiency of main reactor has been improved, thereby reaches efficient photocatalysis effect.
The waste gas treated by the main reactor enters a post-treatment reactor for further low-temperature plasma and adsorption treatment to obtain clean air reaching the standard, and the clean air can be directly discharged into the atmosphere; the high-energy electrons generated by low-temperature plasma high pressure destroy the molecular structure, such as a polymerization state, oxygen, water molecules and the like in the air pass through a high-energy region and are excited into strong oxidation groups, ozone ions, hydroxyl groups and the like to participate in deep oxidation reaction, and a UV ultraviolet dual-spectrum lamp tube irradiates molecular bonds of waste gas to break large pi bonds and the like in benzene rings in the molecular bonds; the removal of the odor is ensured by the adsorption treatment.
The waste gas treatment equipment comprises a shell B, a gas inlet B and a gas outlet B, wherein the gas inlet B is arranged at the lower end of the side wall of the shell B, the gas outlet B is arranged at the top of the shell B, the top of the shell is conical, the bottom of the shell is inverted conical, a draught fan used for introducing waste gas to be treated into the shell B is arranged at the gas inlet B, and the gas outlet B is communicated with the gas inlet A through a gas conveying pipe; the bottom is provided with the circulation pond in the casing B, supreme baffle subassembly, filter screen, catch water have set gradually down in the casing B, evenly be provided with a plurality of sprinkler bead on the spray pipe, casing B lateral wall is provided with circulating pump and filter, the feed liquor end of filter pass through the transfer line with circulation pond intercommunication, the play liquid end of filter pass through the transfer line in proper order with the circulating pump the spray pipe is connected.
After gas containing dust particles enters the shell B through the gas inlet B, water is sprayed to waste gas entering the shell B through the water spray head, droplets of the dust particles carried by gas flow are thrown to the wall surface of the baffle under the centrifugal action, the droplets are attached to the wall surface of the baffle through the wall effect, the droplets containing the dust particles flow down along the wall surface of the baffle under the action of gravity after being gathered, the gas from which the liquid and the dust particles are separated further removes the water and the dust particles carried by the gas through the filter screen and the steam-water separator in sequence, and finally the gas enters the main reactor through the gas outlet B for further purification treatment, so that the dust particles and the water carried by the waste gas are prevented from influencing the main reactor and the post-treatment reactor, and the service life of equipment is prolonged.
The above exhaust gas treatment device, wherein the baffle plate assembly is a multilayer concentric circular baffle plate, and the multilayer concentric circular baffle plate is partially broken at the gas inlet B.
Preferably, the filter screen in the pretreatment reactor is an activated carbon filter screen with the diameter of 10-15 cm.
The post-treatment reactor comprises a shell C and an air inlet C and an air outlet C which are arranged at two ends of the shell C respectively, wherein the interior of the shell C is provided with a flow equalizing plate, a low-temperature plasma electric field, an ultraviolet lamp tube B and an active carbon adsorption plate assembly in sequence along the direction from the air inlet C to the air outlet C.
The waste gas treatment equipment comprises an active carbon adsorption plate assembly, wherein the active carbon adsorption plate assembly comprises an upper active carbon adsorption plate and a lower active carbon adsorption plate, and the upper active carbon adsorption plate and the lower active carbon adsorption plate are arranged alternately to form a serpentine channel.
The gas enters the snake-shaped channel formed by alternately arranging the upper active carbon adsorption plate and the lower active carbon adsorption plate, so that the smelly and smelly gas in the snake-shaped channel is effectively adsorbed, and the adsorption efficiency is improved.
The above exhaust gas treatment equipment, wherein the driving mechanism is an electric telescopic rod, and the electric telescopic rod is in control connection with the microprocessor.
An exhaust treatment device as above, wherein said microprocessor is of the type CC 2640.
Compared with the prior art, the invention has the beneficial effects that:
1. according to the waste gas treatment equipment, after dust particles and water in waste gas are treated by the pretreatment reactor, the main reactor and the post-treatment reactor carry out cooperative decomposition, oxidation and adsorption reaction on organic pollutants and malodorous gas by utilizing the synergistic effect of ultraviolet light catalysis, low-temperature plasma and activated carbon adsorption, so that the organic pollutants and the malodorous gas are degraded and converted into low-molecular compounds, water and carbon dioxide, harmless emission is achieved, and secondary pollution to the atmosphere is avoided.
2. The waste gas treatment equipment can effectively remove dust particles or water carried in the waste gas through the pretreatment reactor, has high separation efficiency, ensures that the effects of subsequent photocatalysis, low-temperature plasma and adsorption treatment can reach the best, greatly reduces the blockage problem of the main reactor and the post-treatment reactor and the coverage probability of the ultraviolet lamp tube A, and prolongs the service life of the equipment.
3. The W-shaped nano photocatalyst porous plate is arranged in the main reactor in the waste gas treatment equipment, the W-shaped nano photocatalyst porous plate not only increases the area of the ultraviolet light irradiation catalyst and improves the utilization rate of the ultraviolet light, but also increases the disturbance of the waste gas entering the main reactor, forms strong waste gas turbulence, prolongs the contact and reaction time of the waste gas and activated ions such as free radicals generated by the catalyst, prolongs the retention time of waste gas molecules on a catalytic reaction bed layer, and further improves the reaction efficiency of the ultraviolet light and the catalyst.
4. According to the waste gas treatment equipment, the ultraviolet light source component is arranged in the main reactor and comprises the ultraviolet lamp tube A, the cleaning ring, the ultraviolet intensity sensor and the microprocessor, the cleaning ring is arranged on the ultraviolet lamp tube A, and the cleaning ring is driven to move on the ultraviolet lamp tube A in a sliding way through the driving mechanism, so that the outer side wall of the ultraviolet lamp tube A can be cleaned conveniently, and the problem that the ultraviolet lamp tube A carries out photocatalytic oxidation on waste gas due to the influence of dust coverage is avoided.
5. According to the waste gas treatment equipment, the reflecting layer is arranged on the inner side wall of the shell A, so that ultraviolet light generated by the ultraviolet lamp tube A can be better reflected, the utilization rate of the illumination density under the same ultraviolet illumination condition is improved, the working efficiency of the main reactor is improved, and the high-efficiency photocatalysis effect is achieved.
Drawings
FIG. 1 is a schematic view of a structure of an exhaust gas treatment apparatus according to the present invention.
FIG. 2 is a schematic view of the internal structure of the pretreatment reactor of the present invention.
FIG. 3 is a schematic top view of the baffle assembly of the present invention.
FIG. 4 is a schematic view of the internal structure of the main reactor in the present invention.
Fig. 5 is an enlarged view of the structure of the portion a in fig. 4.
FIG. 6 is a schematic view showing the inner structure of the cleaning ring of the present invention.
FIG. 7 is a schematic view showing the internal structure of the post-treatment reactor of the present invention.
The correspondence between each mark and the part name is as follows:
the device comprises a pretreatment reactor 1, a shell B101, a gas inlet B102, a gas outlet B103, a circulating water tank 104, a filter screen 105, a steam-water separator 106, a water spray head 107, a circulating pump 108, a filter 109, a multilayer concentric circular baffle 110, a water spray pipe 111, a main reactor 2, a shell A201, a gas inlet A202, a gas outlet A203, a W-shaped nano photocatalyst porous plate 204, a chute 205, a sliding block 206, bristles 207, a connecting rod 208, a post-treatment reactor 3, a shell C301, a gas inlet C302, a gas outlet C303, a flow equalizing plate 304, a low-temperature plasma electric field 305, an ultraviolet lamp tube B306, an upper activated carbon adsorption plate 307, a lower activated carbon adsorption plate 308, an ultraviolet light source component 4, an ultraviolet lamp tube A401, a cleaning ring 402, an ultraviolet light intensity sensor 403, a microprocessor 404, a fixing.
Detailed Description
In order to make the technical means, the characteristics, the purposes and the functions of the invention easy to understand, the invention is further described with reference to the specific drawings.
Examples
As shown in fig. 1, an exhaust gas treatment device comprises a pretreatment reactor 1, a main reactor 2 and a post-treatment reactor 3 which are sequentially connected through a gas pipe, wherein the pretreatment reactor 1 is used for pretreating exhaust gas, the main reactor 2 is used for carrying out photocatalytic treatment on the exhaust gas pretreated by the pretreatment reactor 1, and the post-treatment reactor 3 is used for carrying out low-temperature plasma treatment and adsorption treatment on the exhaust gas treated by the main reactor 2 and then discharging the exhaust gas.
As shown in fig. 4, 5 and 6, the main reactor 2 includes a casing a201, and a gas inlet a202 and a gas outlet a203 respectively disposed at two ends of the casing a201, a W-shaped nano-photocatalyst porous plate 204 is disposed between the gas inlet a202 and the gas outlet a203 along a gas flow direction, a closed end of the W-shaped nano-photocatalyst porous plate 204 contacts with an inner sidewall of the casing a201, an ultraviolet light source assembly 4 corresponding to an open end of the W-shaped nano-photocatalyst porous plate 204 is mounted on the inner sidewall of the casing a201, and a reflective layer (not shown in the figure) is coated on the inner sidewall of the casing a 201.
The ultraviolet light source component 4 comprises an ultraviolet lamp tube A401, a cleaning ring 402, an ultraviolet intensity sensor 403 and a microprocessor 404, two ends of the ultraviolet lamp tube A401 are respectively and fixedly connected with the inner side wall of the shell A201 through a fixing rod 405, the ultraviolet intensity sensor 403 and the microprocessor 404 are both fixed on the fixing rod 405, a sliding groove 205 corresponding to the position of the ultraviolet lamp tube A401 is arranged on the inner side wall of the shell A201, the length direction of the ultraviolet lamp tube A401 is consistent with the length direction and the air flow direction of the sliding groove 205, a sliding block 206 is arranged in the sliding groove 205 in a sliding mode, bristles 207 are arranged on the inner side of the cleaning ring 402, the cleaning ring 402 is sleeved outside the ultraviolet lamp tube A401 in; the uv light source assembly 4 further comprises a driving mechanism for driving the slider 206 to slide in the sliding slot 205, and the microprocessor 404 is respectively connected with the driving mechanism and the uv intensity sensor 403 in a control manner.
The driving mechanism in this embodiment is an electric telescopic rod 406, and the electric telescopic rod 406 is connected to the microprocessor 404.
The microprocessor 404 in this embodiment is model number CC 2640.
As shown in fig. 2 and 3, the pretreatment reactor 1 in this embodiment includes a shell B101, an air inlet B102 disposed at a lower end of a side wall of the shell B101, and an air outlet B103 disposed at a top of the shell B101, where the top of the shell is conical and the bottom of the shell is inverted conical, an induced draft fan for introducing the waste gas to be treated into the shell B101 is disposed at the air inlet B102, and the air outlet B103 is communicated with an air inlet a202 through an air pipe; the bottom in the shell B101 is provided with a circulating water tank 104, the shell B101 is internally provided with a baffle plate assembly, a filter screen 105 and a steam-water separator 106 from top to bottom in sequence, a plurality of water spray heads 107 are uniformly arranged on a water spray pipe 111, the outer side wall of the shell B101 is provided with a circulating pump 108 and a filter 109, the liquid inlet end of the filter 109 is communicated with the circulating water tank 104 through a liquid conveying pipe, and the liquid outlet end of the filter 109 is sequentially connected with the circulating pump 108 and the water spray pipe 111 through liquid conveying.
Preferably, the filter screen 105 in the pretreatment reactor 1 in the embodiment is selected from an activated carbon filter screen with a diameter of 10-15 cm.
After the gas containing the dust particles enters the shell B101 through the gas inlet B102, water is sprayed to the waste gas entering the shell B101 through the water spraying head 107, droplets of the dust particles carried by the gas flow are thrown to the wall surface of the baffle plate under the centrifugal action, the droplets are attached to the wall surface of the baffle plate through the wall effect, the droplets containing the dust particles flow down along the wall surface of the baffle plate under the action of gravity after being gathered, the gas from which the liquid and the dust particles are separated further removes the water and the dust particles carried by the gas through the filter screen 105 and the steam-water separator 106, and finally the gas enters the main reactor 2 through the gas outlet B103 for further purification treatment, so that the dust particles and the water carried by the waste gas are prevented from influencing the main reactor 2 and the post-treatment reactor 3, and the service life of equipment is prolonged.
The baffle assembly is a multilayer concentric baffle 110, and the multilayer concentric baffle 110 is partially broken at the air inlet B102.
As shown in fig. 7, the post-treatment reactor 3 in this embodiment includes a casing C301, and an air inlet C302 and an air outlet C303 respectively disposed at two ends of the casing C301, wherein a flow equalizing plate 304, a low-temperature plasma electric field 305, an ultraviolet lamp tube B306, and an activated carbon adsorption plate assembly are sequentially disposed inside the casing C301 along a direction from the air inlet C302 to the air outlet C303.
The active carbon adsorption plate assembly comprises an upper active carbon adsorption plate 307 and a lower active carbon adsorption plate 308, wherein the upper active carbon adsorption plate 307 and the lower active carbon adsorption plate 308 are arranged at intervals to form a serpentine channel. The gas enters a serpentine channel formed between the upper active carbon adsorption plate 307 and the lower active carbon adsorption plate 308, so that the smelly and smelly gas in the serpentine channel is effectively adsorbed, and the adsorption efficiency is improved.
When the waste gas treatment equipment works, dust particle impurities and water in waste gas are removed through the pretreatment reactor 1, the influence of solid particle impurities such as dust and the like and the influence of water on the main reactor 2 are effectively reduced, the effect of subsequent photocatalysis, low-temperature plasma and adsorption treatment can be ensured to be optimal, the blockage problem of the main reactor 2 and the aftertreatment reactor 3 and the probability of covering the ultraviolet lamp tube A401 are greatly reduced, and the service life of the equipment is prolonged.
The main reactor 2 generates hydroxyl radicals, ozone and photoinduced cavities by combining a nano catalyst technology and an ultraviolet light technology, further quickly and effectively kills bacteria, viruses and molds in the waste gas, effectively oxidizes and degrades organic pollutants such as hydrocarbons, halogenated organic matters, surfactants, dyes, pesticides, phenols, aromatic hydrocarbons and the like in the waste gas, and finally mineralizes the organic pollutants into carbon dioxide and water, so that the organic pollutants are thoroughly eliminated without secondary pollution.
The W-shaped nanometer photocatalyst porous plate 204 not only increases the area of the ultraviolet light irradiating catalyst and improves the utilization rate of the ultraviolet light, but also increases the disturbance of the waste gas entering the main reactor 2, forms strong waste gas turbulence, prolongs the contact and reaction time of the waste gas and the activated ions such as free radicals generated by the catalyst, prolongs the residence time of waste gas molecules on the catalytic reaction bed layer, and further improves the reaction efficiency of the ultraviolet light and the catalyst.
The cleaning ring 402 is arranged on the ultraviolet lamp tube A401, and the driving mechanism drives the sliding block 206 to move in the sliding groove 205 and simultaneously drives the cleaning ring 402 to move on the ultraviolet lamp tube A401 in a sliding manner, so that the outer side wall of the ultraviolet lamp tube A401 can be conveniently cleaned, and the problem that the ultraviolet lamp tube A401 carries out photocatalytic oxidation on waste gas due to dust coverage is avoided; the microprocessor 404 judges whether the outer side wall of the ultraviolet lamp tube a401 needs to be cleaned according to the ultraviolet intensity data sent by the ultraviolet intensity sensor 403, the ultraviolet intensity value is preset in the microprocessor 404 to be X, and when the ultraviolet intensity data value detected by the ultraviolet intensity sensor 403 is smaller than X, the microprocessor 404 controls the driving mechanism to move, so that the cleaning ring 402 moves on the ultraviolet lamp tube a401 to clean the outer side wall of the ultraviolet lamp tube a 401.
Further, the ultraviolet lamp a401 in this embodiment may also be an ultraviolet lamp with adjustable ultraviolet intensity, if the ultraviolet lamp a401 in this embodiment is an ultraviolet lamp with adjustable ultraviolet intensity, the ultraviolet lamp is in control connection with the microprocessor 404, and the microprocessor 404 controls the ultraviolet lamp with adjustable ultraviolet intensity and the movement of the cleaning ring 402 on the ultraviolet lamp a401, so that the ultraviolet intensity in the main reactor 2 meets the requirement of photocatalytic oxidation.
Ultraviolet light that ultraviolet tube A401 produced can be reflected better through set up the reflector layer at casing A201 inside wall, has improved the utilization ratio of illumination density under same ultraviolet light illuminance condition to the work efficiency of main reactor 2 has been improved, thereby reaches efficient photocatalysis effect.
The waste gas treated by the main reactor 2 enters a post-treatment reactor 3 for further low-temperature plasma and adsorption treatment to obtain clean air reaching the standard, and the clean air can be directly discharged into the atmosphere; the high-energy electrons generated by low-temperature plasma high pressure destroy the molecular structure, such as a polymerization state, oxygen, water molecules and the like in the air pass through a high-energy region and are excited into strong oxidation groups, ozone ions, hydroxyl groups and the like to participate in deep oxidation reaction, and a UV ultraviolet dual-spectrum lamp tube irradiates molecular bonds of waste gas to break large pi bonds and the like in benzene rings in the molecular bonds; the removal of the odor is ensured by the adsorption treatment.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.

Claims (7)

1. The waste gas treatment equipment is characterized by comprising a pretreatment reactor, a main reactor and a post-treatment reactor which are sequentially connected through a gas conveying pipe, wherein the pretreatment reactor is used for pretreating waste gas, the main reactor is used for carrying out photocatalytic treatment on the waste gas pretreated by the pretreatment reactor, and the post-treatment reactor is used for carrying out low-temperature plasma treatment and adsorption treatment on the waste gas treated by the main reactor and then discharging the waste gas;
the main reactor comprises a shell A, and an air inlet A and an air outlet A which are respectively arranged at two ends of the shell A, wherein a W-shaped nano photocatalyst porous plate is arranged between the air inlet A and the air outlet A along the air flowing direction, the closed end of the W-shaped nano photocatalyst porous plate is contacted with the inner side wall of the shell A, an ultraviolet light source component corresponding to the open end of the W-shaped nano photocatalyst porous plate is arranged on the inner side wall of the shell A, and the inner side wall of the shell A is coated with a reflecting layer;
the ultraviolet light source component comprises an ultraviolet lamp tube A, a cleaning ring, an ultraviolet intensity sensor and a microprocessor, wherein two ends of the ultraviolet lamp tube A are fixedly connected with the inner side wall of the shell A through fixing rods respectively, the ultraviolet intensity sensor and the microprocessor are both fixed on the fixing rods, a sliding groove corresponding to the position of the ultraviolet lamp tube A is formed in the inner side wall of the shell A, the length direction of the ultraviolet lamp tube A is consistent with the length direction of the sliding groove and the air flow direction, a sliding block is arranged in the sliding groove in a sliding mode, bristles are arranged on the inner side of the cleaning ring, the cleaning ring is sleeved outside the ultraviolet lamp tube A in a sliding mode, and the sliding block is fixedly connected with the cleaning ring; the ultraviolet light source assembly further comprises a driving mechanism for driving the sliding block to slide in the sliding groove, and the microprocessor is respectively in control connection with the driving mechanism and the ultraviolet intensity sensor.
2. The waste gas treatment equipment as claimed in claim 1, wherein the pretreatment reactor comprises a shell B, a gas inlet B and a gas outlet B, wherein the gas inlet B is arranged at the lower end of the side wall of the shell B, the gas outlet B is arranged at the top of the shell B, the top of the shell is conical, the bottom of the shell is inverted conical, a draught fan used for introducing waste gas to be treated into the shell B is arranged at the gas inlet B, and the gas outlet B is communicated with the gas inlet A through a gas conveying pipe; the bottom is provided with the circulation pond in the casing B, supreme baffle subassembly, filter screen, catch water have set gradually down in the casing B, evenly be provided with a plurality of sprinkler bead on the spray pipe, casing B lateral wall is provided with circulating pump and filter, the feed liquor end of filter pass through the transfer line with circulation pond intercommunication, the play liquid end of filter pass through the transfer line in proper order with the circulating pump the spray pipe is connected.
3. The exhaust gas treatment device according to claim 2, wherein the baffle plate assembly is a multi-layer concentric circular baffle plate which is partially broken at the gas inlet B.
4. The exhaust gas treatment device according to claim 1, wherein the post-treatment reactor comprises a housing C, and an air inlet C and an air outlet C respectively disposed at two ends of the housing C, and a flow equalizing plate, a low-temperature plasma electric field, an ultraviolet lamp tube B and an activated carbon adsorption plate assembly are sequentially disposed inside the housing C along a direction from the air inlet C to the air outlet C.
5. The exhaust gas treatment device according to claim 4, wherein the activated carbon adsorption plate assembly comprises an upper activated carbon adsorption plate and a lower activated carbon adsorption plate, and the upper activated carbon adsorption plate and the lower activated carbon adsorption plate are arranged at intervals to form a serpentine channel.
6. The exhaust treatment device of claim 1, wherein the drive mechanism is an electric telescopic rod, and the electric telescopic rod is in control connection with the microprocessor.
7. An exhaust gas treatment device according to any of claims 1 to 6, wherein the microprocessor is of the type CC 2640.
CN201911243391.9A 2019-12-06 2019-12-06 Waste gas treatment equipment Pending CN112915697A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201911243391.9A CN112915697A (en) 2019-12-06 2019-12-06 Waste gas treatment equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201911243391.9A CN112915697A (en) 2019-12-06 2019-12-06 Waste gas treatment equipment

Publications (1)

Publication Number Publication Date
CN112915697A true CN112915697A (en) 2021-06-08

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201911243391.9A Pending CN112915697A (en) 2019-12-06 2019-12-06 Waste gas treatment equipment

Country Status (1)

Country Link
CN (1) CN112915697A (en)

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Application publication date: 20210608