CN112904613A - Color film substrate, display panel and preparation method of color film substrate - Google Patents

Color film substrate, display panel and preparation method of color film substrate Download PDF

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Publication number
CN112904613A
CN112904613A CN202110115386.0A CN202110115386A CN112904613A CN 112904613 A CN112904613 A CN 112904613A CN 202110115386 A CN202110115386 A CN 202110115386A CN 112904613 A CN112904613 A CN 112904613A
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CN
China
Prior art keywords
color
layer
substrate
blocks
adhesion layer
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Pending
Application number
CN202110115386.0A
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Chinese (zh)
Inventor
聂晓辉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wuhan China Star Optoelectronics Technology Co Ltd
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Wuhan China Star Optoelectronics Technology Co Ltd
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Publication date
Application filed by Wuhan China Star Optoelectronics Technology Co Ltd filed Critical Wuhan China Star Optoelectronics Technology Co Ltd
Priority to CN202110115386.0A priority Critical patent/CN112904613A/en
Publication of CN112904613A publication Critical patent/CN112904613A/en
Pending legal-status Critical Current

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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133512Light shielding layers, e.g. black matrix
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

The application discloses a color film substrate, a display panel and a manufacturing method of the color film substrate. This application is through inciting somebody to action the colour hinders the piece with adhesion layer mosaic connects, in order to increase the colour hinder the piece with area of contact between the adhesion layer improves the adhesion layer with adhesion between the colour hinders the piece, overcomes to take place the colour to hinder the problem that the layer drops and the display that leads to shows badly and yields is low in the high pressure washing processing procedure.

Description

Color film substrate, display panel and preparation method of color film substrate
Technical Field
The application relates to the technical field of displays, in particular to a color film substrate, a display panel and a preparation method of the color film substrate.
Background
In the prior art, a liquid crystal display generally uses a pixel division method to realize color display, and a color resistance layer is formed on a color film substrate and includes a plurality of color resistance blocks of three primary colors, namely red, green and blue.
Referring to fig. 1, fig. 1 is a structural diagram of a color filter substrate 9 in the prior art, a color resist layer 91 and a black matrix layer 92 are formed on a glass substrate 90 of the color filter substrate 9, the color resist layer 91 includes a plurality of color resist blocks 911, the black matrix layer 92 includes a plurality of black matrix blocks 921, and the black matrix blocks 921 are located between every two adjacent color resist blocks 911, so that problems of color mixing and color difference caused by overlapping of adjacent color resist blocks 911 or uneven heights of adjacent color resist blocks are effectively avoided.
However, since the prior art, the color resist blocks 911 are generally arranged in a stripe or island shape. The color block 911 mainly comprises organic monomers, pigments, solvents, dispersants, and the like. Since the area of a single color resist block 911 is small due to the pixel division method, and the color resist blocks 911 are all made of organic materials, the compatibility and adhesion between the color resist block 911 and the glass substrate 90 are poor, and the film layer (especially the color resist layer 91) is often peeled off in the high-pressure washing process, thereby causing the problems of poor display and low yield of the display.
Therefore, a color filter substrate is needed to overcome the problems of poor display and low yield of the display due to the peeling of the color resist layer in the high-pressure washing process.
Disclosure of Invention
One of the objectives of the present application is to provide a color filter substrate, which is characterized in that an adhesion layer is disposed between a substrate and a color resistance layer, and the adhesion layer is connected to the color resistance layer in an embedded manner, so as to improve adhesion between the adhesion layer and the color resistance layer, and overcome the problems of poor display and low yield of a display due to the shedding of the color resistance layer in a high-pressure washing process.
Another objective of the present application is to provide a method for manufacturing a color filter substrate, in which an adhesion layer is formed on a substrate, a rough surface is formed on one side of the adhesion layer away from the substrate, and a color resist layer is formed on the rough surface, so as to improve adhesion between the adhesion layer and the color resist layer, and overcome the problems of poor display and low yield of a display due to the falling off of the color resist layer in a high pressure washing process.
Another objective of the present application is to provide a display panel, in which an adhesion layer of a color film substrate is connected to a color resist layer in an embedded manner, so as to improve adhesion between the adhesion layer and the color resist layer, and overcome the problems of poor display and low yield of a display due to the peeling of the color resist layer in a high-pressure washing process.
In order to achieve the above object, the present application provides a color filter substrate, including:
a substrate;
an adhesive layer formed on the substrate;
the color resistance layer is formed on one side, far away from the substrate, of the adhesion layer and comprises a plurality of color resistance blocks, and the color resistance blocks are connected with the adhesion layer in an embedded mode.
In one embodiment, a rough surface is formed on the side of the adhesion layer away from the substrate and is used for being connected with the color resistance layer in an embedded mode.
In one embodiment, a concave-convex pattern is formed on the rough surface of the adhesion layer, and the concave-convex pattern comprises a plurality of convex structures.
In one embodiment, the height of the raised structures is one third of the thickness of the adhesion layer.
In one embodiment, the cross-section of the protruding structure is one or more of triangular, rectangular, trapezoidal and semicircular.
In an embodiment, the color filter substrate further includes:
the black matrix layer is formed on one side, far away from the substrate, of the adhesion layer and comprises a plurality of black matrix blocks, and the black matrix blocks are located between every two adjacent color blocking blocks.
In one embodiment, the black matrix block is connected with the adhesion layer in a mosaic mode.
In one embodiment, the black matrix block and the color block are flush with each other at the side far away from the adhesive layer
In order to achieve the above object, the present application further provides a display panel, where the display panel includes the color film substrate in any of the above embodiments.
In order to achieve the above object, the present application further provides a method for manufacturing a color filter substrate, where the method for manufacturing a color filter substrate includes the following steps:
providing a substrate;
preparing an adhesion layer on the substrate and forming a rough surface on one side of the adhesion layer far away from the substrate;
preparing a black matrix layer and the rough surface, wherein the black matrix layer comprises a plurality of black matrix blocks; and
and manufacturing a color resistance layer on the rough surface, wherein the color resistance layer comprises a plurality of color resistance blocks, the color resistance blocks and the black matrix blocks are arranged at intervals, and the color resistance blocks are connected with the adhesion layer in an embedded manner.
The beneficial effect of this application: according to the color film substrate, the display panel and the preparation method of the color film substrate, the adhesion layer is additionally arranged between the substrate and the color resistance layer, a rough surface is formed on one side, away from the substrate, of the adhesion layer, and the color resistance layer comprises the plurality of color resistance blocks, so that an embedded structure is formed between the color resistance blocks and the rough surface of the adhesion layer. The contact area between the color blocking blocks and the adhesion layer is increased, the adhesion force between the adhesion layer and the color blocking blocks is improved, and the problems of poor display and low yield of a display caused by the falling of the color blocking layers in a high-pressure washing process are solved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the description of the embodiments are briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic structural diagram of a color film substrate in the prior art;
fig. 2 is a schematic structural diagram of a color filter substrate according to a first embodiment of the present disclosure;
fig. 3 is a schematic structural diagram of a color filter substrate according to a second embodiment of the present disclosure;
fig. 4 is a flowchart illustrating a manufacturing process of a color filter substrate according to the present application;
fig. 5 to fig. 7 and fig. 2 are schematic structural diagrams corresponding to steps in a method for manufacturing a color film substrate according to the present application.
The main reference numerals in the above figures are explained as follows:
substrate 10 adhesion layer 11 of color film substrate 1
Coarse surface 110 convex structure 111 color resistance layer 12
Color block 121 black matrix layer 13 black matrix block 131
Detailed Description
The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. It is to be understood that the embodiments described are only a few embodiments of the present application and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present application.
A first embodiment of the present application provides a color filter substrate 1, as shown in fig. 2, the present application provides a color filter substrate 1, where the color filter substrate 1 includes a substrate 10, an adhesion layer 11, and a color resist layer 12. Wherein the adhesion layer 11 is formed on the substrate 10; the color resistance layer 12 is formed on one side of the adhesion layer 11 far away from the substrate 10, the color resistance layer 12 includes a plurality of color resistance blocks 121, and the color resistance blocks 121 are connected with the adhesion layer 11 in an embedded manner.
In one embodiment, a rough surface 110 is formed on the side of the adhesion layer 11 away from the substrate 10 for embedded connection with the color resist layer 12. A concave-convex pattern is formed on the rough surface 110 of the adhesive layer 11, and the concave-convex pattern comprises a plurality of convex structures 111. Specifically, a concave-convex pattern is formed on one side of the adhesion layer 11 away from the substrate 10, the concave-convex pattern comprises a plurality of convex structures 111, the cross section of each convex structure 111 is triangular, and the concave-convex pattern forms a serrated rough surface 110. The color blocking blocks 121 are arranged at intervals, and because the color blocking layer 12 is deposited on the adhesion layer 11 during manufacturing, a plurality of triangular protruding structures 111 are formed on a surface of the color blocking blocks 121 facing the adhesion layer 11, so that the triangular protruding structures 111 of the color blocking blocks 121 are connected with the saw-tooth-shaped rough surface 110 of the adhesion layer 11 in an embedded manner. In this embodiment, the width of the triangular protrusion structure 111 is much smaller than the width of the color block 121, so that a stable mosaic connection effect can be achieved.
In this embodiment, the color filter substrate 1 further includes a black matrix layer 13, and the black matrix layer 13 includes a plurality of black matrix blocks 131. Similarly, since the black matrix layer 13 is deposited on the adhesive layer 11 during the manufacturing process, the surface of the black matrix block 131 facing the adhesive layer 11 can be connected with the jagged rough surface 110 of the adhesive layer 11 in a mosaic manner. The black matrix block 131 is located between every two adjacent color-resisting blocks 121, that is, every two adjacent color-resisting blocks 121 are separated by the black matrix block 131, so that the problems of color mixing, color difference and the like caused by overlapping of the adjacent color-resisting blocks 121 are avoided.
That is, the black matrix layer 13 and the color resist layer 12 are disposed on the substrate 10 at a distance from each other, and the black matrix blocks 131 and the color resist blocks 121 are flush with each other at a side away from the adhesive layer 11.
In one embodiment, the height of the protruding structure 111 is equal to 1/3 of the thickness of the adhesive layer 11.
A second embodiment of the present application provides a color filter substrate 1, as shown in fig. 3, which is different from the first embodiment in that a cross section of the protrusion structure 111 is rectangular. In detail, a concave-convex pattern is formed on the side of the adhesive layer 11 away from the substrate 10, and the concave-convex pattern constitutes the rough surface 110. During manufacturing, a plurality of rectangular protruding structures 111 are formed on a surface of the color block 121 facing the adhesion layer 11, and the rectangular protruding structures 111 of the color block 121 are connected to the rough surface 110 in this embodiment in an embedded manner.
In other embodiments, the protruding structure 111 may have other shapes, such as any one of a trapezoid or a semicircle.
The method for manufacturing the color filter substrate 1 will be described in detail below.
Referring to the flowchart shown in fig. 4, the method for manufacturing the color film substrate 1 includes the following steps:
providing a substrate 10, as shown in fig. 5;
preparing an adhesion layer 11 on the substrate 10 and forming a rough surface 110 on a side of the adhesion layer 11 away from the substrate 10, as shown in fig. 6;
preparing a black matrix layer 13 on the rough surface 110, wherein the black matrix layer 13 includes a plurality of black matrix blocks 131, as shown in fig. 7;
a color resist layer 12 is formed on the rough surface 110, the color resist layer 12 includes a plurality of color resist blocks 121, the color resist blocks 121 and the black matrix blocks 131 are arranged at intervals, and the color resist blocks 121 are connected with the adhesion layer 11 in an embedded manner, as shown in fig. 2.
After the step of providing a substrate 10, the substrate 10 is cleaned to remove organic and inorganic impurities on the surface. So as to improve the yield of the color film substrate 1 and the display quality of the finished product.
As shown in fig. 6, when the step of preparing an adhesive layer 11 on the substrate 10 and forming a rough surface 110 on a side of the adhesive layer 11 away from the substrate 10 is specifically performed, the adhesive layer 11 may be coated on the substrate 10, and then a halftone mask exposure and development process is used to form a concave-convex pattern of the adhesive layer 11 to form the rough surface 110.
As shown in fig. 7, in the step of specifically performing the step of preparing a black matrix layer 13 on the rough surface 110 of the adhesion layer 11, a black matrix material may be coated on the rough surface 110, and then the black matrix layer 13 including the black matrix blocks 131 may be formed by processes of photoresist coating, exposure, development, baking, and the like.
As shown in fig. 2, when the step of manufacturing the color resist layer 12 on the rough surface 110 of the adhesive layer 11 is specifically performed, a color resist material may be coated on the rough surface 110, and then the color resist layer 12 including the color resist blocks 121 may be formed through processes of resist coating, exposure, development, and the like.
A concave-convex pattern is formed on the rough surface 110 of the adhesive layer 11, and the concave-convex pattern comprises a plurality of convex structures 111. The concave-convex pattern of the adhesive layer 11 includes a plurality of the convex structures 111, and the formed convex structures 111 may be any one or more of a triangle, a rectangle, a trapezoid, and a semicircle, which may be determined according to actual conditions. In the step of forming a color resist layer 12 on the rough surface 110, the color resist block 121 is connected to the adhesion layer 11 in a mosaic manner. The mosaic connection structure is stable, the adhesion force of the material of the adhesion layer 11 and the color resistance material is strong, and the phenomenon that the color resistance layer 12 is usually separated in a high-pressure washing process is avoided. And the width of the protruding structure 111 is much smaller than that of the color block 121, so that the structural stability of the mosaic connection is further improved.
In one embodiment, the height of the protruding structure 111 is equal to 1/3 of the thickness of the adhesive layer 11. At this time, the damascene structure and the adhesion layer 11 are stable in structure.
The present application further provides a display panel, where the display panel includes the color film substrate 1 in any of the embodiments, and details are not repeated here.
As can be seen from the above description, in the color filter substrate, the display panel and the method for manufacturing the color filter substrate of the present application, the adhesion layer 11 is added between the substrate 10 and the color resist layer 12, and a rough surface 110 is formed on a side of the adhesion layer 11 away from the substrate 10, where the color resist layer 12 includes a plurality of color resist blocks 121, so that an embedded structure is formed between the color resist blocks 121 and the rough surface 110 of the adhesion layer 11. The contact area between the color resistance block 121 and the adhesion layer 11 is increased, the adhesion force between the adhesion layer 11 and the color resistance block 121 is improved, and the problems of poor display and low yield of a display caused by the falling-off of the color resistance layer 12 in a high-pressure water washing process are solved.
The present application has been described in relation to the above embodiments, which are only examples for implementing the present application. It must be noted that the disclosed embodiments do not limit the scope of the application. Rather, modifications and equivalent arrangements included within the spirit and scope of the claims are included within the scope of the present application.

Claims (10)

1. The color film substrate is characterized by comprising:
a substrate;
an adhesive layer formed on the substrate;
the color resistance layer is formed on one side, far away from the substrate, of the adhesion layer and comprises a plurality of color resistance blocks, and the color resistance blocks are connected with the adhesion layer in an embedded mode.
2. The color filter substrate of claim 1, wherein a rough surface is formed on the side of the adhesion layer away from the substrate for embedded connection with the color resist layer.
3. The color filter substrate of claim 2, wherein a concave-convex pattern is formed on the rough surface of the adhesion layer, and the concave-convex pattern comprises a plurality of convex structures.
4. The color filter substrate of claim 3, wherein the height of the protruding structures is one third of the thickness of the adhesion layer.
5. The color filter substrate of claim 3, wherein the cross section of the protrusion structure is one or more of a triangle, a rectangle, a trapezoid and a semicircle.
6. The color filter substrate of claim 1, further comprising:
the black matrix layer is formed on one side, far away from the substrate, of the adhesion layer and comprises a plurality of black matrix blocks, and the black matrix blocks are located between every two adjacent color blocking blocks.
7. The color filter substrate of claim 6, wherein the black matrix block is connected with the adhesion layer in a mosaic manner.
8. The color filter substrate of claim 6, wherein the black matrix blocks and the color resist blocks are flush with each other on a side away from the adhesion layer.
9. A display panel comprising the color filter substrate according to any one of claims 1 to 8.
10. The preparation method of the color film substrate is characterized by comprising the following steps of:
providing a substrate;
preparing an adhesion layer on the substrate and forming a rough surface on one side of the adhesion layer far away from the substrate;
preparing a black matrix layer on the rough surface, wherein the black matrix layer comprises a plurality of black matrix blocks; and
and manufacturing a color resistance layer on the rough surface, wherein the color resistance layer comprises a plurality of color resistance blocks, the color resistance blocks and the black matrix blocks are arranged at intervals, and the color resistance blocks are connected with the adhesion layer in an embedded manner.
CN202110115386.0A 2021-01-28 2021-01-28 Color film substrate, display panel and preparation method of color film substrate Pending CN112904613A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202110115386.0A CN112904613A (en) 2021-01-28 2021-01-28 Color film substrate, display panel and preparation method of color film substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202110115386.0A CN112904613A (en) 2021-01-28 2021-01-28 Color film substrate, display panel and preparation method of color film substrate

Publications (1)

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CN112904613A true CN112904613A (en) 2021-06-04

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101135847A (en) * 2004-12-14 2008-03-05 中华映管股份有限公司 Process for manufacturing Colorful filtering substrates
JP2015021983A (en) * 2013-07-16 2015-02-02 凸版印刷株式会社 Method for manufacturing color filter, and color filter
CN110071149A (en) * 2019-04-15 2019-07-30 昆山工研院新型平板显示技术中心有限公司 Display panel and display device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101135847A (en) * 2004-12-14 2008-03-05 中华映管股份有限公司 Process for manufacturing Colorful filtering substrates
JP2015021983A (en) * 2013-07-16 2015-02-02 凸版印刷株式会社 Method for manufacturing color filter, and color filter
CN110071149A (en) * 2019-04-15 2019-07-30 昆山工研院新型平板显示技术中心有限公司 Display panel and display device

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Application publication date: 20210604