CN112885677A - Automatic control method of automatic cathode preparation device - Google Patents
Automatic control method of automatic cathode preparation device Download PDFInfo
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- CN112885677A CN112885677A CN202110061928.0A CN202110061928A CN112885677A CN 112885677 A CN112885677 A CN 112885677A CN 202110061928 A CN202110061928 A CN 202110061928A CN 112885677 A CN112885677 A CN 112885677A
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- automatic
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- pump
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- 238000000034 method Methods 0.000 title claims abstract description 26
- 238000002360 preparation method Methods 0.000 title claims abstract description 21
- 238000010438 heat treatment Methods 0.000 claims abstract description 20
- 238000012545 processing Methods 0.000 claims abstract description 20
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 21
- 230000007246 mechanism Effects 0.000 claims description 21
- 238000000859 sublimation Methods 0.000 claims description 21
- 230000008022 sublimation Effects 0.000 claims description 21
- 229910052719 titanium Inorganic materials 0.000 claims description 21
- 239000010936 titanium Substances 0.000 claims description 21
- 108010083687 Ion Pumps Proteins 0.000 claims description 16
- 238000012544 monitoring process Methods 0.000 abstract description 7
- 238000005516 engineering process Methods 0.000 abstract description 3
- 238000006243 chemical reaction Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000004891 communication Methods 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000003028 elevating effect Effects 0.000 description 2
- 101000746134 Homo sapiens DNA endonuclease RBBP8 Proteins 0.000 description 1
- 101000969031 Homo sapiens Nuclear protein 1 Proteins 0.000 description 1
- 102000006391 Ion Pumps Human genes 0.000 description 1
- 102100021133 Nuclear protein 1 Human genes 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
Abstract
The invention discloses an automatic control method of a cathode preparation automatic device, which comprises the following steps: if an automatic start button on the console is pressed, heating is started, if the temperature reaches a set value, heating is stopped, and if the temperature is lower than the lower limit, heating is started; meanwhile, according to the requirements of the processing technology, the related electric valves and pumps are opened and closed in sequence, the automatic cathode preparation device has the functions of perfect monitoring and protection, and is simple and convenient to operate, complete in function and reliable in performance.
Description
Technical Field
The present invention relates to a method for controlling an automatic cathode preparation device, and more particularly, to a method for automatically controlling an automatic cathode preparation device.
Background
The automatic device for preparing the cathode comprises a cathode and an anode, wherein a tank body for forming vacuum is arranged, and the temperature in the tank can be set by a heating device.
As an automatic apparatus, an automatic control method of the automatic apparatus is particularly important. The automatic control method of the automatic device needs to correctly reflect the operation sequence and control process of relevant components of the operation and temperature of mechanical pumps, molecular pumps, ion pumps, titanium sublimation pumps, electric front-stage valves, electric high vacuum valves, electric bypass valves, electric deflation valves, electric ion pump valves, electric titanium sublimation pump valves, cathodes, anodes and cathode lifting mechanisms of various devices. The automatic processing process and related parameter control can be completed.
The automatic control method used by the automatic device is visual and clear, convenient to operate and complete in function, and how to well realize the functions is a problem which is urgently needed to be solved at present.
Disclosure of Invention
In order to realize the automatic control and the strict monitoring of the whole process of the cathode preparation, the invention provides an automatic control method of a cathode preparation automatic device by fully utilizing the characteristics of an industrial personal computer and a PLC (programmable logic controller), and the aim of operating and monitoring the whole process of the cathode preparation is fulfilled.
The control method comprises the following steps:
if an automatic start button on the console is pressed, heating is started, if the temperature reaches a set value, heating is stopped, and if the temperature is lower than the lower limit, heating is started;
if the automatic button on the control console is pressed, the cathode preparation device is heated and kept warm.
Meanwhile, if an automatic opening button on the console is pressed, the electric bypass valve is opened, then the mechanical pump is opened, if the vacuum degree is less than or equal to 10Pa, the electric high vacuum valve is opened, then the electric backing valve is opened, and then the molecular pump is opened;
firstly, primary pumping is carried out, a mechanical pump and a molecular pump are used, and the vacuum degree is less than or equal to 10-3Pa。
If the vacuum degree is less than or equal to 10-3Pa, opening the electric ion valve, and then opening the ion pump;
if the vacuum degree is less than or equal to 10-4Pa, opening an electric titanium sublimation pump valve, and then opening the titanium sublimation pump;
then further evacuating to make the vacuum degree meet the processing requirement.
If the vacuum degree meets the processing requirement and the temperature reaches a set value, if a lifting mechanism descending button is pressed, the lifting mechanism descends, if the lifting mechanism descends to a set processing interval, the lifting mechanism stops, and if the processing time is up, the lifting mechanism ascends;
when the vacuum degree and the temperature meet the processing requirements, a button for descending the lifting mechanism is pressed down, so that the distance between the cathode and the anode reaches a set processing interval, then processing is started, and after the processing time is up, the lifting mechanism is lifted.
If an automatic closing button on the console is pressed, the heating is stopped;
if the automatic closing button on the control console is pressed, the heating of the tank body is stopped.
Meanwhile, if an automatic closing button on the console is pressed, the titanium sublimation pump is closed, then the titanium sublimation pump valve is closed, if the time delay time is up, the ion pump is closed, the electric ion valve is closed, if the time delay time is up, the molecular pump is closed, then the electric pre-stage valve is closed, then the electric high vacuum valve is closed, if the time delay time is up, the mechanical pump is closed, then the electric bypass valve is closed, and the automatic processing is finished.
If the auto-close button on the console is pressed, the robot closes the associated pumps and electrically operated valves in sequence in reverse order to the auto-open.
The invention has the beneficial effects that: an automatic control method for an automatic cathode preparation device realizes the control of the processing technology and related parameters of the automatic cathode preparation device through the automatic control method. The heating of the automatic cathode preparation device, the opening and closing of each electric valve and each pump and related parameters are controlled in real time. The automatic cathode preparation device has the complete monitoring function, is simple and convenient to operate, has complete functions and is reliable in performance.
Drawings
The invention is further illustrated with reference to the following figures and examples.
FIG. 1 is a diagram of a control method of an automatic control method of a cathode preparation robot.
FIG. 2 is a general view of a control method of an automatic control method of a cathode preparation robot.
FIG. 3 is a diagram of a display control device of an automatic control method of a cathode preparation robot.
In the figure, 1, a mechanical pump, 2, a molecular pump, 3, an electric front-stage valve, 4, an electric high vacuum valve, 5, an electric bypass valve, 6, an electric ion pump valve, 7, a heating wire, 8, a vacuum tank, 9, a cathode lifting mechanism, 10, a digital displacement sensor, 11, a cathode, 12, an anode, 13, a digital vacuum degree sensor, 14, a digital temperature sensor, 15, an electric ion pump valve, 16, an ion pump, 17, a titanium sublimation pump, 18 and an electric titanium sublimation pump valve.
FIG. 4 is a main console diagram of an automatic control method of a cathode preparation robot.
FIG. 5 is an electrical schematic diagram of an automatic control method of a cathode preparation robot.
Detailed Description
The embodiment is an automatic YJZB-2 type cathode preparation device, the used industrial personal computer is a Hewlett packard industrial personal computer, configuration king general industrial automation monitoring configuration software produced by Beijing Asia-control science and technology development Limited company is adopted, the PLC is an S7-200 CN series CPU226 type PLC produced by Siemens, and an RS232 communication PORT of the industrial personal computer is connected with a PORT0 of the PLC through an RS 232-to-RS 485 conversion interface.
The industrial personal computer serial port COM1 sets the communication type as follows: RS232, Baud rate 9600, data bit 8, even check, stop bit 1.
The control method comprises the following steps: if an automatic start button on the console is pressed, heating is started, if the temperature reaches a set value, heating is stopped, and if the temperature is lower than the lower limit, heating is started;
meanwhile, if an automatic opening button on the console is pressed, the electric bypass valve is opened, then the mechanical pump is opened, if the vacuum degree is less than or equal to 10Pa, the electric high vacuum valve is opened, then the electric backing valve is opened, and then the molecular pump is opened;
if the vacuum degree is less than or equal to 10-3Pa, opening the electric ion valve, and then opening the ion pump;
if the vacuum degree is less than or equal to 10-4Pa, opening an electric titanium sublimation pump valve, and then opening the titanium sublimation pump;
if the vacuum degree meets the processing requirement and the temperature reaches a set value, if a lifting mechanism descending button is pressed, the lifting mechanism descends, if the lifting mechanism descends to a set processing interval, the lifting mechanism stops, and if the processing time is up, the lifting mechanism ascends;
if an automatic closing button on the console is pressed, the heating is stopped;
meanwhile, if an automatic closing button on the console is pressed, the titanium sublimation pump is closed, then the titanium sublimation pump valve is closed, if the time delay time is up, the ion pump is closed, the electric ion valve is closed, if the time delay time is up, the molecular pump is closed, then the electric pre-stage valve is closed, then the electric high vacuum valve is closed, if the time delay time is up, the mechanical pump is closed, then the electric bypass valve is closed, and the automatic processing is finished.
The automatic switch on, the automatic switch off, the electronic by-pass valve opening, the electronic by-pass valve switch, the electronic high vacuum valve opening, the electronic high vacuum valve switch, electronic backing valve opening, electronic backing valve switch, electronic ion pump valve opening, electronic ion pump valve switch, electronic titanium sublimation pump valve opening, electronic titanium sublimation pump valve switch, electronic exhaust valve opening, electronic exhaust valve switch, mechanical pump switch, molecular pump switch, ion pump switch, titanium sublimation pump switch, heat the button that the switch, heat the switch, the elevating system rises and the elevating system drops on the control cabinet of the monitoring system, connect I0.0 to I2.6 of the input of PLC;
a relay coil of the monitoring system for controlling the electric bypass valve, the electric high vacuum valve, the electric front valve, the electric ion pump valve, the electric titanium sublimation pump valve, the mechanical pump, the molecular pump, the ion pump, the titanium sublimation pump, the heating, the lifting mechanism lifting and the lifting mechanism lowering is connected with Q0.0 to Q1.3 of the output end of the PLC;
the digital temperature sensor, the digital displacement sensor and the digital vacuum degree sensor are connected with the analog-to-digital conversion module, and the analog-to-digital conversion module is connected with the PLC. The analog-to-digital conversion module used is the siemens EM 2314 AD module.
The above description is only an embodiment of the present invention, but the scope of the present invention is not limited thereto, and any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are included in the scope of the present invention. Therefore, the protection scope of the present invention shall be subject to the protection scope defined by the claims.
Claims (1)
1. An automatic control method of a cathode preparation automatic device is characterized in that:
the control method comprises the following steps:
if an automatic start button on the console is pressed, heating is started, if the temperature reaches a set value, heating is stopped, and if the temperature is lower than the lower limit, heating is started;
meanwhile, if an automatic opening button on the console is pressed, the electric bypass valve is opened, then the mechanical pump is opened, if the vacuum degree is less than or equal to 10Pa, the electric high vacuum valve is opened, then the electric backing valve is opened, and then the molecular pump is opened;
if the vacuum degree is less than or equal to 10-3Pa, opening the electric ion valve, and then opening the ion pump;
if the vacuum degree is less than or equal to 10-4Pa, opening an electric titanium sublimation pump valve, and then opening the titanium sublimation pump;
if the vacuum degree meets the processing requirement and the temperature reaches a set value, if a lifting mechanism descending button is pressed, the lifting mechanism descends, if the lifting mechanism descends to a set processing interval, the lifting mechanism stops, and if the processing time is up, the lifting mechanism ascends;
if an automatic closing button on the console is pressed, the heating is stopped;
meanwhile, if an automatic closing button on the console is pressed, the titanium sublimation pump is closed, then the titanium sublimation pump valve is closed, if the time delay time is up, the ion pump is closed, the electric ion valve is closed, if the time delay time is up, the molecular pump is closed, then the electric pre-stage valve is closed, then the electric high vacuum valve is closed, if the time delay time is up, the mechanical pump is closed, then the electric bypass valve is closed, and the automatic processing is finished.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110061928.0A CN112885677A (en) | 2021-01-18 | 2021-01-18 | Automatic control method of automatic cathode preparation device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110061928.0A CN112885677A (en) | 2021-01-18 | 2021-01-18 | Automatic control method of automatic cathode preparation device |
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| CN112885677A true CN112885677A (en) | 2021-06-01 |
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| CN202110061928.0A Pending CN112885677A (en) | 2021-01-18 | 2021-01-18 | Automatic control method of automatic cathode preparation device |
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Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101329581A (en) * | 2008-07-28 | 2008-12-24 | 河南中光学集团有限公司 | Automatic control system and control method of optical filming |
| CN101988487A (en) * | 2009-08-07 | 2011-03-23 | 中国科学院沈阳科学仪器研制中心有限公司 | Automatic pumping system of vacuum testing instrument and control method thereof |
| CN103940741A (en) * | 2014-04-17 | 2014-07-23 | 清华大学 | Aerospace material deep space environment ultraviolet irradiation experiment simulation device and method |
| CN105044196A (en) * | 2015-08-13 | 2015-11-11 | 南京三乐电子信息产业集团有限公司 | Detection device for traveling-wave tube cathode evaporation rate and measuring method for cathode evaporation rate |
-
2021
- 2021-01-18 CN CN202110061928.0A patent/CN112885677A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101329581A (en) * | 2008-07-28 | 2008-12-24 | 河南中光学集团有限公司 | Automatic control system and control method of optical filming |
| CN101988487A (en) * | 2009-08-07 | 2011-03-23 | 中国科学院沈阳科学仪器研制中心有限公司 | Automatic pumping system of vacuum testing instrument and control method thereof |
| CN103940741A (en) * | 2014-04-17 | 2014-07-23 | 清华大学 | Aerospace material deep space environment ultraviolet irradiation experiment simulation device and method |
| CN105044196A (en) * | 2015-08-13 | 2015-11-11 | 南京三乐电子信息产业集团有限公司 | Detection device for traveling-wave tube cathode evaporation rate and measuring method for cathode evaporation rate |
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