CN112853500A - Wafer rack positioning device in sensor monocrystalline silicon etching process - Google Patents

Wafer rack positioning device in sensor monocrystalline silicon etching process Download PDF

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Publication number
CN112853500A
CN112853500A CN202110022764.0A CN202110022764A CN112853500A CN 112853500 A CN112853500 A CN 112853500A CN 202110022764 A CN202110022764 A CN 202110022764A CN 112853500 A CN112853500 A CN 112853500A
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piece
groove
sealing
monocrystalline silicon
bin
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张利峰
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    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B33/00After-treatment of single crystals or homogeneous polycrystalline material with defined structure
    • C30B33/08Etching
    • C30B33/12Etching in gas atmosphere or plasma
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02Elements
    • C30B29/06Silicon

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Weting (AREA)

Abstract

The invention provides a wafer rack positioning device in a sensor monocrystalline silicon etching process, relates to the technical field of monocrystalline silicon processing, and aims to solve the problems that the conventional wafer rack positioning device in the monocrystalline silicon etching process is not stable enough in installation, has no buffering and supporting structure and is poor in sealing property, and the wafer rack positioning device comprises a main body and a buffering piece; the main body is of an annular structure, and the outer side of the main body is of an inclined structure; the bolster is the rubber material, and the bolster is installed in the inside of mounting. The sealed cabin is used for being used as the reaction chamber, make monocrystalline silicon when the etching, can be in the inside processing of sealed cabin, the sealed cabin can be embedded into the inside of mounting, and then make the bottom of closing plate can contact with the bolster, make the bolster can assist the sealed cabin to cushion the impact force, in with the bolster contact, the inside of draw-in groove is inserted and is installed the fixture block, and then make the sealed cabin firmly be connected with the main part, and then make the sealed cabin can be used by firm support.

Description

Wafer rack positioning device in sensor monocrystalline silicon etching process
Technical Field
The invention belongs to the technical field of monocrystalline silicon processing, and particularly relates to a wafer rack positioning device in a sensor monocrystalline silicon etching process.
Background
In the process of etching monocrystalline silicon for the sensor, the wafer frame is easy to displace and is unstable, so that the processing effect is influenced, and at the moment, a wafer frame positioning device is needed.
For example, application No.: CN202010783901.8 relates to a wafer holder positioning device in the process of etching sensor monocrystalline silicon, which comprises a reaction chamber, wherein the top of the reaction chamber is fixedly provided with an air inlet pipe in a penetrating way, one end part of the air inlet pipe is fixedly connected with an air source chamber in a penetrating way, the bottom of one side of the reaction chamber is fixedly provided with an air outlet pipe in a penetrating way, one end part of the air outlet pipe is fixedly connected with a vacuum pump, the bottom of the reaction chamber is fixedly provided with a driving motor, the driving motor can drive a driving belt pulley to rotate, the driving belt pulley can drive a driven belt pulley to rotate through a belt, the driven belt pulley can drive a convex turntable to rotate through a shaft lever, and further can drive a wafer holder to rotate, the contact uniformity of the monocrystalline silicon and plasma can be increased, a positioning ring can be supported and fixed by, the reaction chamber is suitable for reaction chambers with different diameters, and the sleeve is fixed on the outer side of the top of the sheet frame through the fixing bolt, so that the sleeve is convenient to disassemble and assemble.
Based on prior art discovery, the mount positioner among the current monocrystalline silicon etching process is when using, and the installation is firm enough, does not have buffering and bearing structure, and the leakproofness is relatively poor simultaneously, and the mount positioner among the current monocrystalline silicon etching process when using, after the mount is not hard up, can't adjust to step up, and it is comparatively inconvenient to use.
Disclosure of Invention
In order to solve the technical problems, the invention provides a wafer rack positioning device in a monocrystalline silicon etching process of a sensor, which aims to solve the problems that the conventional wafer rack positioning device in the monocrystalline silicon etching process is not firm enough in installation, has no buffering and supporting structure, is poor in sealing performance, cannot be adjusted and tightened after a wafer rack is loosened in the use of the conventional wafer rack positioning device in the monocrystalline silicon etching process, and is inconvenient to use.
The invention relates to a purpose and an effect of a sheet frame positioning device in a sensor monocrystalline silicon etching process, which are achieved by the following specific technical means:
a wafer rack positioning device in a sensor monocrystalline silicon etching process comprises a main body, a buffer piece, a sealing bin, a sealing plate, a rotating rack, a supporting piece and a collecting piece; the main body is of an annular structure, and the outer side of the main body is of an inclined structure; the buffer piece is made of rubber and is arranged inside the fixing piece; the sealing plate is arranged in the opening of the sealing bin through the rotating shaft, and the bottom of the inserted rod is inserted into the limiting hole of the sealing plate; the rotating frame is a sheet frame body and is arranged inside the sealed cabin, and a shaft lever of the rotating frame is connected with a transmission shaft of the motor; the collecting piece is arranged on the outer side of the bottom of the rotating frame, and the bottom of the stop block of the collecting piece is in contact with the outer side of the top end of the bottom piece;
the sealed bin comprises a clamping groove, a control groove and an inserting rod, the sealed bin is a reaction chamber body, a motor and a vacuum pump are installed at the bottom of the sealed bin, and an opening is formed in the front end of the sealed bin; clamping grooves are formed in the outer side of the sealed bin, are arranged in an annular mode and are of wedge-shaped structures; the top end of the inner wall of the sealed bin is provided with a control groove, and the section of the control groove is of a rectangular structure; the sealing bin is arranged inside the top end of the fixing piece, the bottom of the sealing bin is in contact with the top end of the buffer piece, and a clamping block is inserted into a clamping groove of the sealing bin;
the supporting piece comprises a guide groove, a top piece and a limiting piece, the supporting piece is of a hexagonal structure, and the outer end of the supporting piece is provided with the guide groove; the outer end of the guide groove is of a rectangular structure, the inner end of the guide groove is of a T-shaped structure, and the upper end and the lower end of the guide groove are provided with rectangular grooves which are uniformly arranged; the inner end of the top piece is of a T-shaped structure, and three universal balls are embedded in the outer end of the top piece; two T-shaped grooves are formed in the upper side and the lower side of the inner end of the top piece, and the inner end of the top piece is embedded into the guide groove; the inside and the swivel mount fixed connection of support piece, and the top member and the universal ball embedding of support piece outer end are in the inside of control slot.
Furthermore, the main body comprises support rods, a fixing piece and a clamping block, three support rods are arranged at the top end of the main body, and the support rods are of cylindrical structures; the top end of the supporting rod is provided with a fixing piece which is of an annular structure, and the top end of the fixing piece is provided with fixing plates which are arranged annularly; the fixture block is of a wedge-shaped structure and is arranged on the inner side of the top end of the fixing plate.
Furthermore, the buffer part comprises an inner groove and an inner rod, the buffer part is of an annular structure, and the outer side of the buffer part is of a gear-shaped structure; an inner groove is formed in the buffer piece, the inner groove is of a circular structure, and circular holes which are arranged in an annular mode are formed in the outer side of the inner groove; an inner rod with a cylindrical structure is arranged on the inner side of the inner groove, the inner rod is made of rubber, and the inner rods are arranged in a ring shape.
Further, the sealed cabin still includes the inserted bar, the inserted bar is the bellied cylindrical structure in both ends, and the bottom of inserted bar inserts and installs the opening side top at the sealed cabin.
Further, the sealing plate comprises sealing strips and limiting holes, the sealing plate is of an arc-shaped plate structure, the sealing strips are arranged at the upper end, the lower end and the right side of the sealing plate, and the sealing strips are made of rubber; the top right side of closing plate is equipped with the spacing hole of align to grid, and spacing hole is cylindrical structure.
Furthermore, the rotating frame comprises a bottom piece and a moving wheel, a shaft lever is arranged in the rotating frame, and the bottom piece is arranged at the bottom of the rotating frame; the bottom piece is horn-shaped structure, and the bottom of bottom piece is installed through the pivot embedding and is removed the wheel, and removes the wheel and arrange for cyclic annular.
Furthermore, the supporting piece also comprises a limiting piece, the limiting piece is of a T-shaped structure, and the outer end of the limiting piece is of a wedge-shaped structure; the inner of locating part passes through the spring mounting in the T-slot of top member, and the outer end embedding of locating part is in the rectangular channel of guide way inside.
Furthermore, the collecting piece comprises a stop block, the collecting piece is of an annular structure, a collecting groove is formed in the top end of the collecting piece, and the outer side of the collecting groove is of an inclined structure; the inside of collecting the piece is equipped with the dog, and the dog is cyclic annular range.
Compared with the prior art, the invention has the following beneficial effects:
1. in the device, the sealed bin is arranged and used as a reaction chamber, so that monocrystalline silicon can be processed in the sealed bin when being etched, the sealed bin can be embedded into the fixing part, the bottom of the sealing plate can be contacted with the buffer part, the buffer part can assist the sealed bin to buffer impact force, the clamping groove is internally inserted and provided with the clamping block while being contacted with the buffer part, so that the sealed bin can be stably connected with the main body, the sealed bin can be stably supported for use, the sealing plate can be embedded into the opening position when being used in a sealed manner, the inserting rod can be inserted into the limiting holes at different positions, the sealing plate can be in different sealing degrees, the sealing effect is better, the clamping groove plays a role of embedding the clamping block, so that the main body can be fixedly connected with the sealed bin, the control groove plays a role of being embedded into the outer end of the top piece and the universal ball, so that the top piece can be guided to move, the rotating frame is supported and positioned, the inserted rod is inserted into the limiting holes at different positions, the sealing plate can be positioned at a proper position for sealing and fixing, and the sealing effect is better when the sealing bin is used;
2. in the device, a supporting piece is arranged and is used for being installed on the outer side of a rotating frame, so that a top piece and a universal ball can be embedded into a control groove to move for use, when the rotating frame rotates, the top piece can always support the rotating frame, and further the rotating frame can be positioned for use, when the rotating frame is used, the rotating frame can be more stable, if the top piece loosens, the top piece can be directly controlled to move outwards through manpower, so that the universal ball can be attached to the inside of the control groove, the limiting piece can receive the power of a spring to move outwards, further the limiting piece can be inserted into a rectangular groove at the top end of a guide groove to limit, further the rotating frame can be always supported for use, the guide groove is used for embedding and installing the inner end of the top piece, so that the top piece can be guided to move for use, the rectangular grooves at the upper end and the lower end of the top piece are used for inserting and installing the limiting piece, make the locating part can be spacing fixed, the kicking part has played the effect that outside removal was supported for the outer end and the universal ball of kicking part can be embedded into the inside removal of control box, and then with the support that the swivel mount is firm, the locating part has then played the effect that the received spring power moved outward, makes the locating part can insert the inside spacing fixed of rectangular channel, makes the kicking part appear not hard up after, can adjust and step up.
Drawings
Fig. 1 is a schematic perspective view of the present invention.
Fig. 2 is a schematic bottom view of the present invention.
Fig. 3 is an exploded perspective view of the present invention.
Fig. 4 is an exploded bottom view of the present invention.
Fig. 5 is a partial cross-sectional perspective view of the buffer of the present invention.
Fig. 6 is a schematic view of the sealed cabin and a partial enlarged structure of the invention.
Fig. 7 is an exploded and partially enlarged view of the rotary frame of the present invention.
Fig. 8 is an exploded bottom view of the swivel mount of the present invention.
In the drawings, the corresponding relationship between the component names and the reference numbers is as follows:
1. a main body; 101. a support bar; 102. a fixing member; 103. a clamping block; 2. a buffer member; 201. an inner tank; 202. an inner rod; 3. sealing the bin; 301. a card slot; 302. a control slot; 303. inserting a rod; 4. a sealing plate; 401. a sealing strip; 402. a limiting hole; 5. a rotating frame; 501. a bottom piece; 502. a moving wheel; 6. a support member; 601. a guide groove; 602. a top piece; 603. a limiting member; 7. a collecting member; 701. and a stop block.
Detailed Description
The embodiments of the present invention will be described in further detail with reference to the drawings and examples. The following examples are intended to illustrate the invention but are not intended to limit the scope of the invention.
As shown in figures 1 to 8:
the invention provides a wafer rack positioning device in a sensor monocrystalline silicon etching process, which comprises a main body 1, a buffer part 2, a sealing bin 3, a sealing plate 4, a rotating rack 5, a supporting part 6 and a collecting part 7, wherein the main body is provided with a plurality of grooves; the main body 1 is of an annular structure, and the outer side of the main body 1 is of an inclined structure; the buffer 2 is made of rubber, and the buffer 2 is installed inside the fixing part 102; the sealing plate 4 is arranged in the opening of the sealing bin 3 through a rotating shaft, and the bottom of the inserted rod 303 is inserted into the limiting hole 402 of the sealing plate 4; the rotating frame 5 is a sheet frame body, the rotating frame 5 is arranged inside the sealed cabin 3, and a shaft lever of the rotating frame 5 is connected with a transmission shaft of a motor; the collecting piece 7 is arranged at the outer side of the bottom of the rotating frame 5, and the bottom of the stop block 701 of the collecting piece 7 is in contact with the outer side of the top end of the bottom piece 501;
the sealed bin 3 comprises a clamping groove 301, a control groove 302 and an inserting rod 303, the sealed bin 3 is a reaction chamber body, a motor and a vacuum pump are installed at the bottom of the sealed bin 3, and an opening is formed in the front end of the sealed bin 3; the clamping grooves 301 are formed in the outer side of the sealing bin 3, the clamping grooves 301 are arranged in an annular mode, and the clamping grooves 301 are of wedge-shaped structures; a control groove 302 is arranged at the top end of the inner wall of the sealed bin 3, and the section of the control groove 302 is of a rectangular structure; the sealed bin 3 is arranged inside the top end of the fixing part 102, the bottom of the sealed bin 3 is contacted with the top end of the buffer part 2, the clamping groove 301 of the sealed bin 3 is internally provided with the clamping block 103 in an inserting way, the sealed bin 3 is used as a reaction chamber, monocrystalline silicon can be processed inside the sealed bin 3 during etching, the sealed bin 3 can be embedded into the fixing part 102, the bottom of the sealing plate 4 can be contacted with the buffer part 2, the buffer part 2 can assist the sealed bin 3 to buffer impact force, the clamping block 103 is arranged inside the clamping groove 301 while being contacted with the buffer part 2, the sealed bin 3 can be stably connected with the main body 1, the sealed bin 3 can be stably supported for use, the sealing plate 4 can be embedded into an opening position during sealed use, and the inserting rod 303 can be inserted into the limiting holes 402 at different positions, the sealing plate 4 can be in different sealing degrees, so that the sealing effect is better, the clamping groove 301 plays a role of embedding the clamping block 103, the main body 1 can be fixedly connected with the sealing bin 3, the control groove 302 plays a role of embedding the outer end of the top piece 602 and the universal ball, so that the top piece 602 can be guided to move, and the rotating frame 5 is supported and positioned;
the supporting member 6 comprises a guide groove 601, a top member 602 and a limiting member 603, the supporting member 6 is of a hexagonal structure, and the outer end of the supporting member 6 is provided with the guide groove 601; the outer end of the guide groove 601 is of a rectangular structure, the inner end of the guide groove 601 is of a T-shaped structure, and rectangular grooves which are uniformly arranged are formed in the upper end and the lower end of the guide groove 601; the inner end of the top piece 602 is of a T-shaped structure, and three universal balls are embedded in the outer end of the top piece 602; two T-shaped grooves are formed in the upper side and the lower side of the inner end of the top piece 602, and the inner end of the top piece 602 is embedded in the guide groove 601; the inside of the supporting member 6 is fixedly connected with the rotating frame 5, and the top member 602 and the universal ball at the outer end of the supporting member 6 are embedded inside the control slot 302, the supporting member 6 is used to be installed outside the rotating frame 5, so that the top member 602 and the universal ball can be embedded inside the control slot 302 for moving, when the rotating frame 5 rotates, the top member 602 can always support the rotating frame 5, so that the rotating frame 5 can be positioned for use, so that the rotating frame 5 can be more stable when in use, if the top member 602 is loosened, the top member 602 can be directly controlled by manpower to move outwards, so that the universal ball can be attached to the inside of the control slot 302, so that the limiting member 603 can receive the spring power to move outwards, so that the limiting member 603 can be inserted into the rectangular slot at the top end of the guide slot 601 for limiting, and further the rotating frame 5 can be always supported for use, the guide groove 601 is used for embedding and installing the inner end of the top part 602, so that the top part 602 can be guided to move for use, the rectangular grooves at the upper end and the lower end of the top part 602 are used for inserting the outer end of the installation limiting part 603, so that the limiting part 603 can be limited and fixed, and the top part 602 plays a role of outwards moving and supporting, so that the outer end of the top part 602 and the universal ball can be embedded into the control groove 302 to move, and the rotating frame 5 is stably supported.
The main body 1 comprises a support rod 101, a fixing piece 102 and a fixture block 103, the top end of the main body 1 is provided with three support rods 101, and the support rods 101 are cylindrical structures; the top end of the support rod 101 is provided with a fixing member 102, the fixing member 102 is of a ring structure, and the top end of the fixing member 102 is provided with fixing plates arranged in a ring shape; the fixture block 103 is of a wedge-shaped structure, the fixture block 103 is arranged on the inner side of the top end of the fixing plate, the main body 1 is placed at a proper position, the sealing bin 3 is further fixed through the fixing piece 102, the sealing bin 3 can be stably installed and used, the supporting rod 101 plays a role of auxiliary support, the fixing piece 102 plays a role in limiting and installing the sealing bin 3, the fixture block 103 is used for being inserted into the clamping groove 301, and the sealing bin 3 cannot be loosened after being installed.
The buffer member 2 comprises an inner groove 201, an inner rod 202, the buffer member 2 is of an annular structure, and the outer side of the buffer member 2 is of a gear-shaped structure; an inner groove 201 is formed inside the buffer 2, the inner groove 201 is of a circular structure, and circular holes are formed in the outer side of the inner groove 201 in an annular arrangement; an inner rod 202 with a cylindrical structure is arranged on the inner side of the inner groove 201, the inner rod 202 is made of rubber, the inner rods 202 are arranged in a ring shape, and the buffer parts 2 are used for being installed inside the fixing parts 102 and further contacted with the bottom of the sealed cabin 3, so that when the sealed cabin 3 is used, if vibration is generated, the vibration can be filtered by the buffer parts 2, and further the vibration is reduced.
Wherein, sealed cabin 3 is still including inserted bar 303, and inserted bar 303 is the bellied cylindrical structure in both ends, and the bottom of inserted bar 303 inserts and installs the opening side top at sealed cabin 3, and inserted bar 303 is then used for inserting the spacing hole 402 inside of different positions, and then makes sealed board 4 can be in suitable position sealed fixed, and then when making sealed cabin 3 use, sealed effect is better.
The sealing plate 4 comprises a sealing strip 401 and a limiting hole 402, the sealing plate 4 is of an arc-shaped plate structure, the sealing strip 401 is arranged at the upper end, the lower end and the right side of the sealing plate 4, and the sealing strip 401 is made of rubber; the top right side of closing plate 4 is equipped with align to grid's spacing hole 402, and spacing hole 402 is cylindrical structure, and closing plate 4 has played the sealed effect of the opening with sealed storehouse 3, and sealing strip 401 has played by extrusion seal's effect, and spacing hole 402 then is used for making inserted bar 303 male, when making closing plate 4 can close different states, can be fixed by inserted bar 303.
The rotating frame 5 comprises a bottom piece 501 and a moving wheel 502, a shaft rod is arranged in the rotating frame 5, and the bottom piece 501 is arranged at the bottom of the rotating frame 5; bottom piece 501 is loudspeaker column structure, and bottom piece 501's bottom is installed through the pivot embedding and is removed wheel 502, and remove wheel 502 and arrange for cyclic annular, swivel mount 5 has played and has used as the sheet frame, bottom piece 501 has played the effect with sealed storehouse 3 bottom contacts, and then auxiliary stay, make swivel mount 5 when rotatory use, can be more stable, remove wheel 502 then play with the inside bottom contact's of sealed storehouse effect, and then make the rotatory more smooth of swivel mount 5.
The supporting member 6 further includes a limiting member 603, the limiting member 603 is a T-shaped structure, and the outer end of the limiting member 603 is a wedge-shaped structure; the inner end of the limiting member 603 is mounted inside the T-shaped groove of the top member 602 through a spring, the outer end of the limiting member 603 is embedded inside the rectangular groove of the guide groove 601, and the limiting member 603 plays a role of receiving the power of the spring to move outwards, so that the limiting member 603 can be inserted into the rectangular groove for limiting and fixing, and the top member 602 can be adjusted to be tightened after loosening.
The collecting part 7 comprises a stop block 701, the collecting part 7 is of an annular structure, a collecting groove is formed in the top end of the collecting part 7, and the outer side of the collecting groove is of an inclined structure; the inside of collecting 7 is equipped with dog 701, and dog 701 is cyclic annular range, collects 7 and has played the effect of installing in the inside bottom of sealed storehouse 3, makes collecting 7 can contact the installation with end piece 501, makes collecting 7 can collect the debris or other impurity that splash down, and then the centralized processing of being convenient for.
When in use: when the device is needed, the main body 1 can be controlled to be placed at a proper position in advance, so that the bottom of the main body 1 can be contacted with the ground, the buffer member 2 is laid in the fixing member 102, the sealed bin 3 is controlled to be installed, the bottom of the sealed bin 3 can be embedded into the fixing member 102 for fixing, so that the bottom of the sealed bin 3 can be contacted with the buffer member 2, so that the buffer member 2 can effectively buffer impact force when the device is operated and etched, meanwhile, after the sealed bin 3 is installed, the clamping block 103 is automatically stressed and inserted into the clamping groove 301, so that the sealed bin 3 can be pulled and fixed, then the collecting member 7 is controlled to be installed, so that the collecting member 7 can be installed in the sealed bin 3, the stop block 701 can be contacted with the outer side of the top end of the bottom member 501, so that the collecting member 7 is installed and used, and then monocrystalline silicon is installed and processed, then control closing plate 4 closes sealedly, make the inserted bar 303 can insert the inside in the spacing hole 402 of different positions, and then make the closing that closing plate 4 is firm sealed, then process monocrystalline silicon, after long-time the use, if the virtual position appears in swivel mount 5 or when the virtual position appears in top 602, can directly stimulate top 602 outwards to move, make locating part 603 can insert the rectangular channel of suitable position inside, make the universal ball can be again with the inside contact of control groove 302, and then make top 602 can bear the force again and withstand swivel mount 5, make swivel mount 5 can the relocating use.
The embodiments of the present invention have been presented for purposes of illustration and description, and are not intended to be exhaustive or limited to the invention in the form disclosed. Many modifications and variations will be apparent to those of ordinary skill in the art. The embodiment was chosen and described in order to best explain the principles of the invention and the practical application, and to enable others of ordinary skill in the art to understand the invention for various embodiments with various modifications as are suited to the particular use contemplated.

Claims (8)

1. The utility model provides a wafer frame positioner in sensor monocrystalline silicon etching process which characterized in that: comprises a main body (1), a buffer piece (2), a sealing bin (3), a sealing plate (4), a rotating frame (5), a supporting piece (6) and a collecting piece (7); the main body (1) is of an annular structure, and the outer side of the main body (1) is of an inclined structure; the buffer piece (2) is made of rubber, and the buffer piece (2) is arranged in the fixing piece (102); the sealing plate (4) is arranged in the opening of the sealing bin (3) through a rotating shaft, and the bottom of the inserted rod (303) is inserted into the limiting hole (402) of the sealing plate (4); the rotary frame (5) is a frame body, the rotary frame (5) is arranged in the sealed bin (3), and a shaft lever of the rotary frame (5) is connected with a transmission shaft of a motor; the collecting piece (7) is arranged on the outer side of the bottom of the rotating frame (5), and the bottom of the stop block (701) of the collecting piece (7) is in contact with the outer side of the top end of the bottom piece (501);
the sealing bin (3) comprises a clamping groove (301), a control groove (302) and an inserting rod (303), the sealing bin (3) is a reaction chamber body, a motor and a vacuum pump are installed at the bottom of the sealing bin (3), and an opening is formed in the front end of the sealing bin (3); clamping grooves (301) are formed in the outer side of the sealing bin (3), the clamping grooves (301) are arranged in an annular mode, and the clamping grooves (301) are of wedge-shaped structures; a control groove (302) is formed in the top end of the inner wall of the sealed bin (3), and the section of the control groove (302) is of a rectangular structure; the sealing bin (3) is arranged inside the top end of the fixing piece (102), the bottom of the sealing bin (3) is in contact with the top end of the buffer piece (2), and a clamping block (103) is inserted into a clamping groove (301) of the sealing bin (3);
the supporting piece (6) comprises a guide groove (601), a top piece (602) and a limiting piece (603), the supporting piece (6) is of a hexagonal structure, and the outer end of the supporting piece (6) is provided with the guide groove (601); the outer end of the guide groove (601) is of a rectangular structure, the inner end of the guide groove (601) is of a T-shaped structure, and rectangular grooves which are uniformly arranged are formed in the upper end and the lower end of the guide groove (601); the inner end of the top piece (602) is of a T-shaped structure, and three universal balls are embedded in the outer end of the top piece (602); two T-shaped grooves are formed in the upper side and the lower side of the inner end of the top piece (602), and the inner end of the top piece (602) is embedded in the guide groove (601); the inner part of the supporting part (6) is fixedly connected with the rotating frame (5), and the top part (602) at the outer end of the supporting part (6) and the universal ball are embedded in the control groove (302).
2. The wafer holder positioning device in the sensor monocrystalline silicon etching process as claimed in claim 1, wherein: the main body (1) comprises support rods (101), a fixing piece (102) and a fixture block (103), the top end of the main body (1) is provided with three support rods (101), and the support rods (101) are of cylindrical structures; the top end of the supporting rod (101) is provided with a fixing piece (102), the fixing piece (102) is of an annular structure, and the top end of the fixing piece (102) is provided with fixing plates which are arranged annularly; the fixture block (103) is of a wedge-shaped structure, and the fixture block (103) is arranged on the inner side of the top end of the fixing plate.
3. The wafer holder positioning device in the sensor monocrystalline silicon etching process as claimed in claim 1, wherein: the buffer part (2) comprises an inner groove (201) and an inner rod (202), the buffer part (2) is of an annular structure, and the outer side of the buffer part (2) is of a gear-shaped structure; an inner groove (201) is formed in the buffer piece (2), the inner groove (201) is of a circular structure, and circular holes which are annularly arranged are formed in the outer side of the inner groove (201); an inner rod (202) with a cylindrical structure is arranged on the inner side of the inner groove (201), the inner rod (202) is made of rubber, and the inner rods (202) are arranged in a ring shape.
4. The wafer holder positioning device in the sensor monocrystalline silicon etching process as claimed in claim 1, wherein: sealed storehouse (3) are still including inserted bar (303), inserted bar (303) are the bellied cylindrical structure in both ends, and the bottom of inserted bar (303) inserts and installs the opening side top in sealed storehouse (3).
5. The wafer holder positioning device in the sensor monocrystalline silicon etching process as claimed in claim 1, wherein: the sealing plate (4) comprises sealing strips (401) and limiting holes (402), the sealing plate (4) is of an arc-shaped plate structure, the sealing strips (401) are arranged at the upper end, the lower end and the right side of the sealing plate (4), and the sealing strips (401) are made of rubber; the top right side of closing plate (4) is equipped with evenly arranged's spacing hole (402), and spacing hole (402) are cylindrical structure.
6. The wafer holder positioning device in the sensor monocrystalline silicon etching process as claimed in claim 1, wherein: the rotating frame (5) comprises a bottom piece (501) and a moving wheel (502), a shaft rod is arranged in the rotating frame (5), and the bottom piece (501) is arranged at the bottom of the rotating frame (5); the bottom piece (501) is of a horn-shaped structure, the bottom of the bottom piece (501) is provided with moving wheels (502) in an embedded mode through a rotating shaft, and the moving wheels (502) are arranged in an annular mode.
7. The wafer holder positioning device in the sensor monocrystalline silicon etching process as claimed in claim 1, wherein: the supporting piece (6) further comprises a limiting piece (603), the limiting piece (603) is of a T-shaped structure, and the outer end of the limiting piece (603) is of a wedge-shaped structure; the inner end of the limiting piece (603) is installed in the T-shaped groove of the top piece (602) through a spring, and the outer end of the limiting piece (603) is embedded in the rectangular groove of the guide groove (601).
8. The wafer holder positioning device in the sensor monocrystalline silicon etching process as claimed in claim 1, wherein: the collecting piece (7) comprises a stop block (701), the collecting piece (7) is of an annular structure, a collecting groove is formed in the top end of the collecting piece (7), and the outer side of the collecting groove is of an inclined structure; the collecting piece (7) is internally provided with stop blocks (701), and the stop blocks (701) are arranged annularly.
CN202110022764.0A 2021-01-08 2021-01-08 Wafer rack positioning device in sensor monocrystalline silicon etching process Withdrawn CN112853500A (en)

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CN112188821A (en) * 2020-10-15 2021-01-05 李庆磊 A test shielded cell for 5G communication

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Application publication date: 20210528