CN112839420A - Discharge device and method for generating single spheromak plasma - Google Patents
Discharge device and method for generating single spheromak plasma Download PDFInfo
- Publication number
- CN112839420A CN112839420A CN202011593273.3A CN202011593273A CN112839420A CN 112839420 A CN112839420 A CN 112839420A CN 202011593273 A CN202011593273 A CN 202011593273A CN 112839420 A CN112839420 A CN 112839420A
- Authority
- CN
- China
- Prior art keywords
- power supply
- spheromak
- magnetic field
- discharge
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 28
- 239000003990 capacitor Substances 0.000 claims abstract description 31
- 230000015572 biosynthetic process Effects 0.000 claims abstract description 8
- SBYXRAKIOMOBFF-UHFFFAOYSA-N copper tungsten Chemical compound [Cu].[W] SBYXRAKIOMOBFF-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000007599 discharging Methods 0.000 claims abstract description 8
- 229910000881 Cu alloy Inorganic materials 0.000 claims abstract description 6
- 230000008569 process Effects 0.000 claims description 17
- 230000001133 acceleration Effects 0.000 claims description 7
- 230000004907 flux Effects 0.000 claims description 7
- 239000000523 sample Substances 0.000 claims description 3
- 230000004927 fusion Effects 0.000 abstract description 8
- 238000011160 research Methods 0.000 abstract description 6
- 230000001276 controlling effect Effects 0.000 abstract description 4
- 230000005658 nuclear physics Effects 0.000 abstract description 3
- 230000001105 regulatory effect Effects 0.000 abstract description 3
- 210000002381 plasma Anatomy 0.000 description 76
- 208000028659 discharge Diseases 0.000 description 46
- 239000007789 gas Substances 0.000 description 24
- 238000002347 injection Methods 0.000 description 6
- 239000007924 injection Substances 0.000 description 6
- 238000005516 engineering process Methods 0.000 description 4
- 230000001960 triggered effect Effects 0.000 description 4
- 238000013461 design Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 230000008859 change Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 238000007750 plasma spraying Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 238000003466 welding Methods 0.000 description 2
- 238000002679 ablation Methods 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000013016 damping Methods 0.000 description 1
- 238000012938 design process Methods 0.000 description 1
- 235000012489 doughnuts Nutrition 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000012772 sequence design Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
Abstract
A discharge device and a method for generating single spheromak plasma belong to the technical field of magnetic confinement fusion plasma. The discharge device comprises a capacitor bank power supply, a coaxial plasma gun, a bias magnetic field system, a delay trigger system, a pulse gas supply system and a vacuum system. The coaxial plasma gun comprises an inner electrode, an outer electrode and a hemispherical tungsten-copper alloy block; a pulse gas supply hole is tangentially formed in an outer electrode of the coaxial plasma gun, and an electromagnetic valve of a pulse gas supply system is correspondingly arranged at the position of the pulse gas supply hole; the end part of the inner electrode is welded with a hemispherical tungsten copper alloy block. The solenoids of the bias magnetic field system are embedded in the inner electrode of the coaxial plasma gun to provide the radial magnetic field required for spheromak formation. The method obtains the single spheromak by regulating and controlling the time delay among gas filling, the bias magnetic field and discharging, has simple and flexible operation and high stability, and provides a simple, convenient and new way for obtaining the single spheromak plasma in nuclear physics research and practical application.
Description
Technical Field
The invention belongs to the technical field of magnetic confinement fusion plasma, and relates to a single spheromak plasma generating discharge device and method with high speed and good confinement performance.
Background
The spheromak or (compact ring) produced with a magnetized coaxial plasma gun is an axisymmetrically magnetized plasma structure in which both the toroidal magnetic field and the poloidal magnetic field are generated and sustained by plasma current. The spheromak is used as a self-organizing carrier of various forms of energy such as kinetic energy, heat energy, electromagnetic energy and the like, has the characteristics of super high speed, high energy density, high temperature and the like, and has wide application in the research fields of celestial body physics, nuclear physics and the like. In the practical application of the spheromak, (including that the field inversion type plasma generated by collision fusion of the anti-spiral spheromak plasma is used as a magnetic target for magnetic inertia confinement nuclear fusion, the spheromak plasma is adopted for fusion and charging of the magnetic confinement nuclear fusion and the magnetic target, and the magnetic reconnection research under the drive of the plasma and the like) how to realize the injection of the single spheromak plasma is also a key technology except that the characteristics of plasma speed, electron density, temperature, confinement magnetic field and the like need to be improved.
The coaxial plasma gun has the characteristics of ultrahigh speed, high density, high temperature and the like, and is characterized in that a capacitor bank is applied between coaxial electrodes at high voltage, working medium gas is completely ionized, and plasma is ejected out of a gun opening under the action of self-magnetic force. During the discharge period, the plasma current sheet in the gun is connected with the inner electrode and the outer electrode, and the whole discharge loop is represented as an RLC oscillation loop and has the phenomenon of multiple discharges. The introduction of multiple clusters of plasma jets can have many adverse effects on spheromak-related experimental research and applications. On one hand, the accelerated particle number of other discharge processes except one-time discharge is small, the plasma jet speed is high, and the characteristics of the spheromak, such as appearance, magnetic field and the like, are influenced due to the tailing of the spheromak. Similarly, the presence of multiple clusters of plasma in the spheromak injection device can affect the current distribution in the gun during the secondary acceleration phase, reducing injection efficiency. On the other hand, in the research of the reverse spiral spheromak fusion experiment and the magnetic reconnection phenomenon, the injection of multiple groups of plasmas can influence the establishment and maintenance process of a new equilibrium state, and the plasma fusion and magnetic reconnection process is directly damaged in serious cases. Therefore, the technology for generating the single spheromak plasma is very important in relevant experiments and applications.
In the current experiment, the phenomenon of multiple discharges is avoided by commonly using a current cutoff and loop changing mode, and although the two modes can realize the generation of a single spheromak plasma, a more complex circuit matching needs to be designed. The current is cut off by additionally adding a grounding switch to control the discharge time, so that the current is cut off at the end of the first pulse. The change loop is that the outer loop is set to be a 'prying discharge' loop through matching resistance, inductance, capacitance and the like, so that the circuit is in a critical damping state and only has one current pulse.
Compared with the two technical means, the method avoids a complex circuit design process, has simple requirements on the circuit, is easy to operate and adjust, and can obtain the single spheromak plasma with good spraying performance only by reasonable pulse air supply and bias magnetic field parameter setting and time sequence design.
Disclosure of Invention
The invention aims to provide a discharge device and a method for obtaining single spheromak plasma by regulating and controlling air supply and discharge time sequence on the basis of not changing loop hardware.
In order to achieve the above purpose, the invention provides the following technical scheme:
a discharge device for generating single spheromak plasma comprises a capacitor bank power supply, a coaxial plasma gun, a bias magnetic field system, a time delay triggering system, a pulse gas supply system and a vacuum system.
The capacitor bank power supply comprises a capacitor bank and a spark switch which are connected in parallel, the capacitor bank connected in parallel is connected with an inner electrode and an outer electrode of the coaxial plasma gun after passing through the spark switch, the high-voltage end of the capacitor bank is connected with the inner electrode, the low-voltage end of the capacitor bank is connected with the outer electrode, the inner electrode is connected with negative high voltage, and the outer electrode is grounded.
The coaxial plasma gun comprises an inner electrode, an outer electrode and a hemispherical tungsten-copper alloy block; the pulse air supply system comprises an electromagnetic valve and a driving power supply, and the driving power supply supplies power to the electromagnetic valve; a pulse gas supply hole is tangentially formed in an outer electrode of the coaxial plasma gun to provide working medium gas required by discharge, and an electromagnetic valve of a pulse gas supply system is correspondingly arranged at the position of the pulse gas supply hole; the end part of the inner electrode is welded with a hemispherical tungsten copper alloy block. The bias magnetic field system comprises a solenoid and a driving power supply, wherein the driving power supply supplies power to the solenoid, and the solenoid is embedded into an inner electrode of the coaxial plasma gun to provide a radial magnetic field required by the formation of the spheromak.
Timing trigger signals required in the process of generating the spheromak by the discharge of the coaxial plasma gun are provided by the time-adjustable delay trigger system.
Further, a photodiode, a magnetic probe array and a high-speed camera are arranged and used for characterizing the characteristics of single spherical Marek injection.
A discharge method for generating a single spheromak plasma, comprising the steps of:
firstly, a mechanical pump and a molecular pump set are adopted to maintain the air pressure of a vacuum chamber in a vacuum system to be 10-3Pa or less. Then the capacitor bank power supply, the bias magnetic field driving power supply and the pulse air supply driving power supply are charged. The charging voltage of the capacitor bank power supply is continuously adjustable from 0kV to 20kV, and the peak current corresponds to 0kA to 300 kA. The magnitude of the bias magnetic field is determined by measuring the magnitude of its loop current, maximum bias flux 3 mWb.
Furthermore, the power supply capacitance of the capacitor bank is 150 muF, and the discharge current pulse width is 23.5 mus.
And secondly, adopting three paths of outputs of a delay triggering system to respectively control discharge. Firstly, triggering a driving power supply of a bias magnetic field system to discharge, then triggering a driving power supply of a pulse gas supply system to discharge, rapidly opening an electromagnetic valve, injecting working gas into a coaxial plasma gun through a pulse gas supply hole, triggering a capacitor group power supply of the coaxial plasma gun to discharge after a certain time interval, and generating plasma jet. The working gas is filled in the whole acceleration area by controlling the gas supply time, and the bias magnetic field current is ensured to be close to the maximum value in the whole acceleration time.
Compared with the prior art, the invention has the beneficial effects that:
the coaxial plasma gun discharge mode is a strong current pulse discharge, and the operations such as an additional cutoff circuit and complex circuit change are relatively difficult. The technology for obtaining the single spheromak by regulating and controlling the time delay among gas filling, the bias magnetic field and discharging is simple and flexible to operate and high in stability, and a simple, convenient and new way is provided for obtaining the single spheromak plasma in nuclear physics research and practical application.
Drawings
FIG. 1 is a schematic view of a magnetized coaxial plasma gun discharge device;
FIG. 2 is a structural design of a coaxial plasma gun;
FIG. 3 is a schematic diagram of a delay flip-flop with three different delay trigger signals;
fig. 4 sequence of operations for magnetizing a coaxial plasma gun to form a spheromak: (a) bias magnetic field drive current, (b) pulsed gas pressure, (c) discharge current and voltage;
FIG. 5 discharge voltage, current and photocurrent signals;
FIG. 6 is a radial distribution plot of the spheromak toroidal magnetic field and the poloidal magnetic field;
FIG. 7 is an end-face evolution image of a magnetized coaxial plasma gun to form a spheromak;
FIG. 8 is an end-face evolution diagram of a secondary discharge plasma.
Detailed Description
The invention is further described below with reference to the accompanying drawings.
A discharge device (shown in figure 1) for generating single spheromak plasma comprises a capacitor bank power supply, a coaxial plasma gun, a bias magnetic field system, a time delay trigger system, a pulse gas supply system and a vacuum system.
The capacitor group power supply is a capacitor group formed by connecting 6 capacitors with the capacitance of 25 muF in parallel, the capacitor group power supply is connected with the inner electrode and the outer electrode of the coaxial gun through a coaxial cable after passing through a spark gap switch, the inner electrode is connected with negative high voltage, and the outer electrode is grounded. The charging voltage of the capacitor is 20kV at most, and the current pulse width is 23.5 mu s. The material of the outer electrode of the coaxial gun is stainless steel, the length is 388mm, and the inner diameter is phi-83.1 mm. The inner electrode is formed by welding a hollow copper bar and hemispherical tungsten copper, and has a length of 343mm and an outer diameter of phi-54.0 mm. The acceleration length of the plasma loop within the gun is 328 mm.
The coaxial plasma gun is designed as shown in fig. 2, the outer electrode of the coaxial plasma gun is a stainless steel cylinder, the inner electrode is formed by welding a hollow copper rod and hemispherical tungsten copper, and the purpose is to avoid the influence of ablation on the plasma purity caused by current concentration at the electrode head. A solenoid to bias the magnetic field is embedded in the inner electrode to provide the radial magnetic field required for spheromak formation. Two symmetrical pulse air supply holes are tangentially arranged on the middle plane of the outer electrode, and pulse air supply valves are correspondingly arranged at the positions of the pulse air supply holes, so that the injected neutral gas is uniformly diffused in the electrode gap along the azimuth direction. To obtain a spheromak plasma with strong magnetic field confinement, the bias flux was fixed at 2.7mWb, the solenoid center field was 3.1T. However, for the formation of the spheromak, the formation threshold needs to be satisfied, so the discharge voltage is controlled to be 11-15 kV, and the corresponding discharge current is 183-253 kA. The two pulse air supply valves are powered by the same driving power supply, so that the simultaneity of two paths of air supply is ensured. The pulse gas-feeding pressure is measured from the valve port, and the gas-feeding quality of the argon is adjusted to be 0.46-0.61 mg. The chamber vacuum is maintained at 10-3Pa. The timing trigger signal required in the process of generating the spheromak by the discharge of the whole coaxial gun is provided by the time-adjustable optical fiber coupling delay trigger system, and the resolution is 1 mu s.
The method for generating the single spheromak plasma by adopting the device comprises the following steps:
firstly, after the discharging condition is determined, respectively charging a capacitor bank power supply with the voltage of 15 kV; the bias magnetic field drives the power supply voltage 650V, corresponding to magnetic flux 2.7 mWb; the pulse air supply driving power voltage is 2.1kV, and the corresponding air input is 0.46 mg.
And secondly, adjusting the time delay of the bias magnetic field, the pulse gas supply and the discharge by using a time delay trigger. The pulse air supply is measured by a fast-response air pressure sensor, and the air supply quality is controlled by the driving current and the background air pressure. The bias magnetic field power supply is triggered first and then both bleed valve power supplies are triggered when the bias current rises to 2.3 ms. After 200 mus, the bias field and the fill gas pressure reach maximum values as shown in fig. 3 and 4. Finally, the spark gap switches connected to the charging capacitor bank are triggered to discharge simultaneously. At this time, the gas filled the acceleration region, the drive current reached a peak, and the bias flux was 2.7 mWb. The time interval from triggering to gas breakdown of the spark gap switch is less than 1 mus, and has no influence on the whole delay adjustment. After the gas breaks down, the current flowing through the plasma is connected with the inner electrode and the outer electrode to form an RLC circuit. The plasma appears as a mainly reactive load during the discharge, so the circuit shows an underdamped oscillation. The corresponding current and voltage waveforms are shown in fig. 4 (c). Considering that the duration of the magnetic field power supply current is 10ms, the bias magnetic field during the discharge pulse (100 μ s) is considered to be stable.
Thirdly, in the discharging process, a high-speed camera is used for shooting the formation and evolution images of the plasma in the gun, plasma photocurrent signals are measured at positions 2cm and 12cm away from the nozzle, the single spheromak plasma spraying and magnetic field characteristics are diagnosed, and the plasma spraying characteristics are measured by two photodiodes 2cm and 12cm away from the nozzle, as shown in fig. 5. The spheromak plasma is generated during only one discharge in the whole discharge process. The plasma generated by the multiple discharges is not sprayed out of the muzzle, wherein the spheromak plasma is not generated in the secondary discharge process and is related to the discharge mode conversion.
The radial distribution of the plasma magnetic field is measured by using a two-dimensional magnetic probe array 7cm away from the nozzle, and whether the ejected plasma is spheromak is further verified, as shown in fig. 6. The spheromak has a structure in which a circumferential magnetic field and a polar magnetic field are nested.
The high-speed camera is triggered to shoot the plasma forming and evolution process in the magnetized coaxial plasma gun at the discharge starting time, and the multiple discharge current after the secondary discharge is smaller than the spheromak forming threshold, so that the plasma forming and evolution process is limited in the gun and is not considered. The plasma evolution patterns of two discharges during the first period of current are shown in fig. 7 and 8. It can be seen from the image that: the spheromak sprayed in the primary discharge process is a hollow plasma ring, and plasmas are dispersed and distributed in the gun in the secondary discharge process and are not sprayed out.
And fourthly, under the condition of not changing the discharge time delay, changing different discharge parameters (discharge voltage and gas supply quantity), wherein the discharge voltage is 11-15 kV, the gas supply quantity is 0.46-0.61 mg, the gas filling time is 200 mu s, and the fixed bias magnetic flux is 2.7 mWb. The above steps are repeated, and a single spheromak plasma is generated.
The single spheromak plasma generated is ejected in a spiral motion and is a hollow annular structure, resembling the shape of a "donut". The toroidal magnetic field and the polar magnetic field are mutually nested, the maximum magnetic field reaches 0.2T, and the maximum plasma jet speed is 90 km/s.
The above examples demonstrate that: the coaxial plasma gun structure with the design and the proposed technical scheme realize the generation and the injection of single spheromak plasma in the whole discharging process. The experimental process does not need other equipment or complex circuit design, and only needs to control the bias magnetic field, the time delay between gas filling and discharging to obtain the single spheromak plasma jet. The technology is simple and flexible to operate and high in stability, and under the condition that the forming threshold of the spheromak is met, the spheromak plasmas with different qualities and different jet speeds can be obtained according to different actual requirements.
On the basis, if a higher-speed spheromak plasma with good confinement performance is to be obtained, the bias magnetic flux needs to be increased, and the discharge voltage is increased under the condition that the spheromak formation threshold is met. This also does not affect the entire discharge process and the generation of a single spheromak plasma. Therefore, the invention can realize that single spheromak plasma body with high speed and good constraint performance is generated in the whole discharging process, and the plasma performance can be adjusted according to the actual requirement.
Claims (4)
1. A discharge device for generating single spheromak plasma is characterized in that the discharge device comprises a capacitor bank power supply, a coaxial plasma gun, a bias magnetic field system, a time delay triggering system, a pulse gas supply system and a vacuum system;
the capacitor bank power supply comprises a capacitor bank and a spark switch which are connected in parallel, the capacitor bank connected in parallel is connected with an inner electrode and an outer electrode of the coaxial plasma gun after passing through the spark switch, the high-voltage end of the capacitor bank is connected with the inner electrode, the low-voltage end of the capacitor bank is connected with the outer electrode, the inner electrode is connected with negative high voltage, and the outer electrode is grounded;
the coaxial plasma gun comprises an inner electrode, an outer electrode and a hemispherical tungsten-copper alloy block; the pulse air supply system comprises an electromagnetic valve and a driving power supply, and the driving power supply supplies power to the electromagnetic valve; a pulse gas supply hole is tangentially formed in an outer electrode of the coaxial plasma gun to provide working medium gas required by discharge, and an electromagnetic valve of a pulse gas supply system is correspondingly arranged at the position of the pulse gas supply hole; the end part of the inner electrode is welded with a hemispherical tungsten-copper alloy block; the bias magnetic field system comprises a solenoid and a driving power supply, wherein the driving power supply supplies power to the solenoid, and the solenoid is embedded into an inner electrode of the coaxial plasma gun to provide a radial magnetic field required by the formation of a spherical Mark;
timing trigger signals required in the process of generating the spheromak by the discharge of the coaxial plasma gun are provided by the time-adjustable delay trigger system.
2. The discharge device for generating a single spheromak plasma of claim 1, wherein a photodiode, a magnetic probe array, a high speed camera are provided for characterizing the single spheromak ejection characteristics.
3. A discharge method using a discharge apparatus for generating a single spheromak plasma as claimed in claim 1 or 2, comprising the steps of:
firstly, a mechanical pump and a molecular pump set are adopted to maintain the air pressure of a vacuum chamber in a vacuum system to be 10-3Pa below; then charging a capacitor bank power supply, a bias magnetic field driving power supply and a pulse gas supply driving power supply; the charging voltage of the capacitor bank power supply is continuously adjustable from 0kV to 20kV, and the peak current is 0kA to 300 kA; the magnitude of the bias magnetic field is determined by measuring the magnitude of the loop current of the bias magnetic field, and the maximum bias magnetic flux is 3 mWb;
secondly, three paths of outputs of a delay triggering system are adopted to respectively control discharging; firstly, triggering a driving power supply of a bias magnetic field system to discharge, then triggering a driving power supply of a pulse gas supply system to discharge, quickly opening an electromagnetic valve, injecting working gas into a coaxial plasma gun through a pulse gas supply hole, and triggering a power supply of a capacitor group of the coaxial plasma gun to discharge at intervals to generate plasma jet; the working gas is filled in the whole acceleration area by controlling the gas supply time, and the bias magnetic field current is ensured to be close to the maximum value in the whole acceleration time.
4. The discharge method of claim 3, wherein said capacitor bank power supply capacitor is 150 μ F and discharge current pulse width is 23.5 μ s.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011593273.3A CN112839420A (en) | 2020-12-29 | 2020-12-29 | Discharge device and method for generating single spheromak plasma |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202011593273.3A CN112839420A (en) | 2020-12-29 | 2020-12-29 | Discharge device and method for generating single spheromak plasma |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112839420A true CN112839420A (en) | 2021-05-25 |
Family
ID=75925178
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011593273.3A Pending CN112839420A (en) | 2020-12-29 | 2020-12-29 | Discharge device and method for generating single spheromak plasma |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112839420A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4363776A (en) * | 1980-07-30 | 1982-12-14 | The United States Of America As Represented By The United States Department Of Energy | Method and apparatus for the formation of a spheromak plasma |
| CN103247869A (en) * | 2013-05-03 | 2013-08-14 | 中国舰船研究设计中心 | IRA (impulse radiation antenna) ultra-wide band radiation array based on semiconductor switches and ferrite transmission lines |
| US20140023170A1 (en) * | 2011-11-07 | 2014-01-23 | Msnw Llc | Apparatus, systems and methods for fusion based power generation and engine thrust generation |
| CN111510124A (en) * | 2020-03-20 | 2020-08-07 | 中国工程物理研究院流体物理研究所 | Magnetic bias weak light triggering high-power photoconductive switch |
| CN213880370U (en) * | 2020-12-29 | 2021-08-03 | 大连理工大学 | Discharge device for generating single spheromak plasma |
-
2020
- 2020-12-29 CN CN202011593273.3A patent/CN112839420A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4363776A (en) * | 1980-07-30 | 1982-12-14 | The United States Of America As Represented By The United States Department Of Energy | Method and apparatus for the formation of a spheromak plasma |
| US20140023170A1 (en) * | 2011-11-07 | 2014-01-23 | Msnw Llc | Apparatus, systems and methods for fusion based power generation and engine thrust generation |
| CN103247869A (en) * | 2013-05-03 | 2013-08-14 | 中国舰船研究设计中心 | IRA (impulse radiation antenna) ultra-wide band radiation array based on semiconductor switches and ferrite transmission lines |
| CN111510124A (en) * | 2020-03-20 | 2020-08-07 | 中国工程物理研究院流体物理研究所 | Magnetic bias weak light triggering high-power photoconductive switch |
| CN213880370U (en) * | 2020-12-29 | 2021-08-03 | 大连理工大学 | Discharge device for generating single spheromak plasma |
Non-Patent Citations (2)
| Title |
|---|
| LIANGWEN QI: "Research on an unconfined spheromak and its current path in a magnetized coaxial plasma gun", 《PHYSICS OF PLASMAS》, 8 December 2020 (2020-12-08), pages 2 - 9 * |
| 赵崇霄;漆亮文;闫慧杰;王婷婷;任春生;: "放电参数对爆燃模式下同轴枪强流脉冲放电等离子体的影响", 物理学报, no. 10, 23 May 2019 (2019-05-23) * |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7679025B1 (en) | Dense plasma focus apparatus | |
| CN107091210B (en) | A kind of pulsed plasma thruster based on capillary discharging | |
| WO1997012372A9 (en) | A compound plasma configuration, and method and apparatus for generating a compound plasma configuration | |
| CN102523675B (en) | Plasma ejection device for igniting long air spark gap and circuit thereof | |
| CN213880370U (en) | Discharge device for generating single spheromak plasma | |
| CN110430655B (en) | Enclosed discharge gap triggered by plasma jet and application thereof | |
| US3579028A (en) | Converging-barrel plasma accelerator | |
| US11933282B2 (en) | Inductive plasma acceleration apparatus and method | |
| CN107061210B (en) | A kind of pulsed plasma thruster accelerated based on electrothermal and electromagnetic mixing | |
| CN112839420A (en) | Discharge device and method for generating single spheromak plasma | |
| CN110131120B (en) | Solid ablation type magnetic plasma thruster | |
| CN111755138A (en) | Lorentz force driven high-speed plasma injection device | |
| CN114221569B (en) | Parallel discharge device and method for plasma high-energy synthetic jet exciter | |
| Manzon | Acceleration of macroparticles for controlled thermonuclear fusion | |
| Sun et al. | Study on the conduction characteristics of SF 6 gas gap under capillary pulse plasma injection | |
| CN110486244B (en) | Electromagnetic induction type plasma accelerating device | |
| CN108934119B (en) | Metal vapor Z-pinch load device based on wire array and regulation and control method | |
| US8324809B2 (en) | Strong power compact microwave tube | |
| CN213635396U (en) | Lorentz force driven high-speed plasma injection device | |
| CN110671288B (en) | Tower section of thick bamboo induction type plasma accelerating device | |
| Akiyama et al. | Repetitively operated plasma opening switch using laser produced plasma | |
| Ueda et al. | Inductively driven gas‐breakdown plasma source for intense ion beam production | |
| US20230377762A1 (en) | Methods and systems for increasing energy output in z-pinch plasma confinement system | |
| CN116658391A (en) | Dual-mode solid working medium miniature electric heating thruster device | |
| CN114109692B (en) | Fast pulse multipoint discharge system and engine combustion control method |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |