CN112799167B - Mould pattern processing device for light guide plate production - Google Patents
Mould pattern processing device for light guide plate production Download PDFInfo
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- CN112799167B CN112799167B CN202011266578.3A CN202011266578A CN112799167B CN 112799167 B CN112799167 B CN 112799167B CN 202011266578 A CN202011266578 A CN 202011266578A CN 112799167 B CN112799167 B CN 112799167B
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- pattern
- mold
- laser light
- light source
- guide plate
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0013—Means for improving the coupling-in of light from the light source into the light guide
- G02B6/0015—Means for improving the coupling-in of light from the light source into the light guide provided on the surface of the light guide or in the bulk of it
- G02B6/0016—Grooves, prisms, gratings, scattering particles or rough surfaces
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/359—Working by laser beam, e.g. welding, cutting or boring for surface treatment by providing a line or line pattern, e.g. a dotted break initiation line
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0033—Means for improving the coupling-out of light from the light guide
- G02B6/0035—Means for improving the coupling-out of light from the light guide provided on the surface of the light guide or in the bulk of it
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0065—Manufacturing aspects; Material aspects
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133524—Light-guides, e.g. fibre-optic bundles, louvered or jalousie light-guides
Abstract
The invention relates to a mold pattern processing device for producing a light guide plate, which is characterized by comprising the following components: a stage supporting a mold on an upper portion of which a pattern is to be processed; a laser light source for generating laser to process a pattern composed of dots on the mold; a scanner into which laser light generated by the laser light source is incident and which irradiates a mold to process a pattern on the mold; and a control unit for controlling the laser light source and the mold pattern processing device for producing the light guide plate including the scanner, wherein the control unit forms an area smaller than the irradiation limit of the scanner into an irradiation area, adjusts the characteristics of the laser light generated by the laser light source, and changes the dot size of the pattern processed in the mold. The method can smoothly change the size of the lattice point of the pattern processed by the mould for producing the light guide plate to form a uniform surface light source, thereby improving the brightness of the light guide plate and shortening the manufacturing time of the mould.
Description
Technical Field
The present invention relates to an apparatus for processing a pattern on a mold used in the production of a light guide plate. The present invention relates to a mold pattern processing device for producing a light guide plate, which is a structure for converting light from a side light source into a uniform surface light source in a backlight unit having a necessary structure for an LED TV, and which is configured such that a predetermined pattern is formed on the light guide plate for the uniform surface light source.
Background
An LCD (liquid crystal display; liquid Crystal Display) is a flat panel display which is commonly used for a TV, a display panel, or the like, and displays an image by injecting liquid crystal between substrates, forming an electric field in the liquid crystal, and adjusting the transmittance of light passing through each pixel.
Since the LCD is not a self-luminous display, a backlight unit is required as an additional light source device in order to display image information. The backlight unit is provided with a point light source or a linear light source at one side or the rear side, uniformly disperses light emitted from the light source to form a uniform surface light source, and forms a pattern of a negative/positive engraving on one side of a light-transmitting acrylic plate called a light guide plate (Light Guide Plate) in order to form such a uniform surface light source.
In order to form the pattern of the negative/positive etching on the light guide plate in this way, the pattern is directly processed on the light guide plate by a laser, but generally, after the pattern is processed by a mold for producing the light guide plate, the pattern is formed on the light guide plate by injection molding using the mold or by a roll press.
In the prior art, in order to process a pattern in a mold for producing a light guide plate, overetching is used, however, laser light is generally used due to a reduction in precision.
In the case of processing a pattern in a mold by using a laser, a plurality of conditions concerning the size of the dots are found by testing according to the material of the mold and the type of the laser, and in the light guide plate, in order to obtain a uniform surface light source, it is necessary to process the pattern of the light incident portion adjacent to the light source portion so as to have a small density or a small pattern size, and process the pattern of the light source portion so as to have a high density or a large pattern size.
However, in the related art, as a pattern is processed in a mold with a plurality of dot sizes, a problem of streaks generated by differences in light amounts occurs in portions where the dot sizes are changed, or it is necessary to set the dot sizes to be processed very closely and find out laser conditions, so that there is a problem that the mold fabrication time is very long. In addition, even if the dot size is set very close, if the dot size is changed, uniformity is not smooth and there is a problem that appearance defects occur.
Disclosure of Invention
Technical problem
The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to provide a mold pattern processing apparatus for producing a light guide plate, which can smoothly change the dot size of a pattern processed in a mold for producing a light guide plate, form a uniform surface light source, find out a plurality of processing conditions related to the dot size, and combine them to realize a plurality of dot sizes, thereby not only improving the brightness of the light guide plate, but also shortening the manufacturing time of the mold.
Technical proposal
In order to achieve the above object, a mold pattern processing device for producing a light guide plate according to the present invention comprises: a stage supporting a mold on an upper portion of which a pattern is to be processed; a laser light source for generating laser to process a pattern composed of dots on the mold; a scanner into which laser light generated by the laser light source is incident and which irradiates a mold to process a pattern on the mold; and a control unit for controlling the laser light source and the mold pattern processing device for producing the light guide plate including the scanner, wherein the control unit forms an area smaller than the irradiation limit of the scanner into an irradiation area, adjusts the characteristics of the laser light generated by the laser light source, and changes the dot size of the pattern processed in the mold.
In the present invention, the control unit may adjust one or more of a repetition frequency of the laser beam generated by the laser light source, a pulse, and an average power of the laser light source, and change a spot size in the mold process.
In addition, the present invention is characterized in that the control section controls the movement of the scanner after processing all patterns in one irradiation region, and controls the movement of the scanner so that a part of the regions overlap between the irradiation regions adjacent to each other.
In the present invention, the control unit adjusts the screen dot size of the processed pattern to be the same when the scanner processes the pattern in one irradiation area.
In the present invention, the control unit may be configured to set two or more halftone dot sizes in advance when changing the halftone dot size of the pattern processed by the mold, and the processing of the halftone dot sizes other than the preset halftone dot size in the irradiation region may be configured to change the halftone dot size of the pattern by adjusting a ratio at which the preset halftone dot size is processed.
In the present invention, the ratio to be processed is determined by adjusting a probability of processing a screen dot size set in advance in the irradiation region.
Effects of the invention
The present invention constructed as described above can adjust the pattern processed in the mold for light guide plate production by changing the dot size.
In addition, even if processing conditions are found in advance only for the dot sizes of more than two patterns, various dot sizes can be effectively realized.
In addition, the size of the mold for producing the light guide plate is effectively changed, so that the brightness of the light guide plate produced by the mold can be improved, and the reject ratio is reduced.
In addition, the manufacturing time of the mold for producing the light guide plate can be remarkably reduced.
Drawings
FIG. 1 is a schematic block diagram of a mold pattern processing apparatus for producing a light guide plate according to an embodiment of the present invention,
FIG. 2 is a schematic view of the process (overlapping process) of the irradiation region of the mold pattern processing apparatus for producing a light guide plate of the present invention,
FIG. 3 is a schematic view showing the effect of varying the size of the overlapping process according to the irradiation region in the mold pattern processing apparatus for producing a light guide plate according to the present invention,
FIG. 4 is a view showing the effect of varying the size by adjusting the ratio of the dot sizes set in advance in the mold pattern processing apparatus for producing a light guide plate of the present invention,
fig. 5 is a diagram showing a pattern boundary portion generated when a dot size is changed in the related art.
(description of the reference numerals)
100: station 200: laser light source
300: scanner 400: control unit
Detailed Description
Hereinafter, a mold pattern processing apparatus for producing a light guide plate according to the present invention will be described in detail with reference to the accompanying drawings.
Fig. 1 is a schematic block diagram of a mold pattern processing apparatus for producing a light guide plate according to an embodiment of the present invention, fig. 2 is a schematic diagram (overlapping process) of a processing process of an irradiation region of the mold pattern processing apparatus for producing a light guide plate according to the present invention, fig. 3 is a schematic diagram of a size variable effect according to overlapping processing of the irradiation region in the mold pattern processing apparatus for producing a light guide plate according to the present invention, and fig. 4 is a diagram showing a size variable effect by adjusting a ratio of a mesh point size set in advance of the mold pattern processing apparatus for producing a light guide plate according to the present invention.
The mold pattern processing device for producing a light guide plate of the present invention is not a method of directly processing a light guide plate by using a laser as described above, but a method of processing a pattern to be engraved on a light guide plate in advance in a mold and forming a pattern on a light guide plate by using a mold processed with a pattern. When the mold is used to form a pattern on the light guide plate, the mold is a core block if injection molding is used, and is a thin stainless steel (sus) stamper if rolling is used, however, the mold is not limited to the core block or the stainless steel stamper, and any structure may be used as long as the pattern is formed on the light guide plate.
The present invention relates to a mold pattern processing device for producing a light guide plate, comprising: a stage 100 supporting a mold 10 on an upper portion thereof, in which a pattern to be formed on the light guide plate is to be processed; a laser light source 200 for generating laser light to process a pattern composed of a plurality of dot shapes to the mold 10 fixed on the upper portion of the stage 100; a scanner 300, into which the laser light generated from the laser light source 200 is incident, for changing the path of the incident laser light to irradiate the mold 10 to process a pattern on the mold 10; and a control unit 400 for controlling the mold pattern processing device for producing a light guide plate including the stage 100, the laser light source 200, and the scanner 300, wherein the control unit 400 sets a region smaller than the irradiation limit of the scanner 300 as an irradiation region, and changes the dot size of the pattern to be processed in the mold 10 by adjusting the characteristics of the laser light generated from the laser light source 200.
The stage 100 of the present invention is a structure in which a mold 10 to be patterned is supported at an upper portion thereof. When the mold 10 is a core block, a jig for fixing the core block may be further included, and when the mold 10 is a stamper, a suction device for forming a negative pressure may be further included for fixing while maintaining flatness of the stamper. Regardless of the structure involved, the station 100 of the present invention performs the function of stabilizing the stationary mold 10 during the processing of the desired pattern into the mold 10. Of course, a structure for transferring the mold 10 may be added.
The laser light source 200 of the present invention is configured to generate laser light for processing a pattern on the die 10 provided on the upper portion of the stage 100. The laser light source 200 of the present invention is configured to generate a pulse type laser, and if the laser light source is configured to directly process on the light guide plate as described above, a CW laser is used, but the present invention is configured to effectively change the size, and thus generate a pulse type laser. The laser light generated by the laser light source 200 of the present invention has various characteristics, however, in the present invention, three characteristics, which are the average power of the laser light, the number of pulses processed at the dots, and the repetition frequency, are approximately adjusted from among the various characteristics of the laser light, and the dot size of the pattern processed at the mold 10 is changed.
The average power of the laser, as energy released per second, is a value obtained by adding the energy of all pulses released in 1 second, and the repetition frequency is a number of pulses released per second in hertz (Hz). Thus, the energy of one pulse is the same as the average power divided by the repetition frequency, and the energy of one pulse can be adjusted by adjusting the average power and the repetition frequency. In addition, the shape of the dots varies with the energy of one pulse and the number of pulses processed at one dot. The amount of energy that a pulse has is related to the thermal influence applied to the mold during processing by a pulse, and therefore the amount of energy that a pulse has is proportional to the area and depth of the processed dots. Typically a fixed average power, the energy of one pulse is changed and the ratio between the area and depth of the dots is increased or decreased while substantially maintaining the average power. For example, when processing at 10Hz, the area and depth are all increased compared to when processing with pulses having an average power of 1mW, but generally have the characteristic of increasing the area when processing with pulses having an average power of 10 mW. Further, the fixed average power has a characteristic that the area is substantially maintained and the depth is increased or decreased when the repetition frequency is increased or decreased. For example, when using pulses with an average power of 1mW, the depth increases without a large change in area when processed with 20Hz compared to processing with 10 Hz. In the present invention, the dot size is changed using the laser characteristics as described above.
The scanner 300 of the present invention is configured to irradiate the mold 10 by changing the path of laser light by adjusting a galvanometer (not shown) after the laser light generated from the laser light source 200 is incident. In order to form a uniform surface light source into a light guide plate, it is necessary to form a dot pattern of an appropriate size at a previously set position, and the scanner 300 is a structure for rapidly converting a path of laser light to form the dot pattern at the appropriate position. The scanner 300 typically adjusts the path by adjusting a galvanometer, and a flat field focusing lens (f-theta) is arranged at the lower part to maintain the uniformity of the processing. In order to maintain process uniformity as above, a flat field focusing lens of appropriate curvature and size is used, so that the scanner 300 has an illumination limit in order to maintain process uniformity. The control unit 400 sets an area smaller than the irradiation limit of the scanner 300 as an irradiation area, and controls the scanner 300 to process all patterns in the irradiation area and then to move to the next irradiation area.
The control unit 400 of the present invention is a structure for controlling the mold pattern processing device for producing a light guide plate of the present invention including the stage 100, the laser light source 200, and the scanner 300. The control unit 400 changes the size of the processed halftone dot by adjusting three characteristics of the laser light generated from the laser light source 200 as described above.
In the light guide plate, in order to form a uniform surface light source, it is necessary that the density of the pattern of the portion adjacent to the light source located on one side (i.e., the light incident portion) is small and the density of the pattern of the light portion located on the side away from the light source is large. In the prior art, when one dot size is processed, the density of the pattern is adjusted by setting the number of dots processed in the light entrance section and the light exit section to be different, but there are many cases where external defects such as mottled appearance are present. Since the minimum density limit for preventing the visibility of the dots of the light entrance portion is set, large dots cannot be used, and there is a problem in that the brightness is low. In the present invention, therefore, the uniform surface light source is formed by making the dots of the light-entering portion small and making the dots of the light-exiting portion large, wherein the adjustment of the dot size is performed by adjusting the characteristics of the laser light. Therefore, compared with the prior art, the method has the advantages that the appearance is clean, the number of integrally processed net points is increased, and the brightness is improved.
However, the size-variable system of the present invention is most preferable if the dot size is increased linearly from the light entrance to the light exit, but there is no laser light source 200 capable of adjusting the characteristics of the laser in real time, and the laser light that matches such a reference change is very expensive, although it is not entirely linear, and the time required for preparation may be long. Therefore, as described above, the method of changing the size of the processed halftone dot for each halftone dot is most preferable by adjusting the characteristics of the laser light in real time, but the method of changing the size of the processed halftone dot for each halftone dot in real time is not effective, and therefore, in consideration of the material of the mold 10 and the individual characteristics of the laser light, the method of combining a plurality of steps of setting the characteristics of the laser light related to the halftone dot size of a predetermined size to achieve the size-variable effect is advantageous in terms of cost performance.
That is, the larger the size of the processed dots, the closer to ideal, but since the test time increases in geometric progression, it is preferable to set a certain number of dot sizes and set the condition of the laser light in relation to this. However, when the pattern is processed in the mold 10 in order after a predetermined number of dot sizes are set as described above, as shown in fig. 5, a portion where a difference in brightness occurs in a band shape (pattern boundary portion) is generated at a portion where the dot size is changed, and if the pattern boundary portion is generated, the mold 10 has a problem that it cannot be used for producing a light guide plate due to a defect.
In order to prevent the defects of the pattern boundary part, it is important to appropriately combine a certain number of dot sizes of the condition of the laser set in advance so as to process the dot sizes as linearly increasing, the method of the present invention is to change the sizes by overlapping two processing areas having different dot sizes from each other, and by adjusting the probability of the two dot sizes being processed, the effect as if the size is variable can be obtained.
First, fig. 2 shows a process in which the control unit 400 moves and processes the scanner 300, and the left side M1 shows a pattern in which the scanner 300 moves and processes. The pattern M1 processed at the mold 10 is processed by moving the scanner 300 toward the processing areas 1 to 3 (A1 to A3), wherein if moving and processing is performed such that the right side of A1 and the left side of A2 overlap each other and such that the right side of A2 and the left side of A3 overlap each other, a pattern like M1 is formed at the mold 10.
The first method is shown in fig. 3, for example, if a dot is processed at A4 with a size of 10 micrometers, a 20 micrometer at A5, and a 30 micrometer at A6, the dot size of the portion where the three processing regions overlap each other is 15, 25 micrometers, and thus can have a size-variable effect, and a pattern such as M2 can be formed. By adjusting the overlapping area, the variable-size range can be adjusted more accurately.
A second method is shown in fig. 4, for example, processing at three dot sizes of 10 microns, 20 microns, 30 microns, adjusting the probability that the three dots are processed, thereby displaying a variable size effect. Two combinations of 41 10 micron dots and 23 20 micron dots are shown in P1, with a size of about 13.6 micron, a combination of 4 10 micron dots, 55 20 micron dots and 5 30 micron dots are shown in P2, a size of about 20.2 micron, and a size of about 18 20 micron dots, 46 30 micron dots and 27.2 micron are shown in P3. As described above, the combination of dots under the preset conditions can naturally display the size-variable effect. In addition, the combination ratio is set with probability, so that there is an advantage that it is possible to prevent a situation where dots of the same size are gathered at one place to generate a pattern boundary portion in principle.
Claims (3)
1. A mold pattern processing device for producing a light guide plate, comprising:
a stage supporting a mold on an upper portion of which a pattern is to be processed;
a laser light source for generating laser to process a pattern composed of dots on the mold;
a scanner into which laser light generated by the laser light source is incident and which irradiates a mold to process a pattern on the mold; and
a control part for controlling the mold pattern processing device for producing the light guide plate comprising the laser light source and the scanner,
the control unit forms an irradiation region smaller than an irradiation limit of the scanner, adjusts a characteristic of laser light generated from the laser light source, changes a dot size of a pattern processed in the mold,
the control section controls the movement of the scanner after processing all patterns in one irradiation region, and controls the movement of the scanner so that a part of the regions overlap between irradiation regions adjacent to each other,
the control part adjusts the size of the mesh point of the processed pattern to be the same when the scanner processes the pattern in one irradiation area,
the control part sets more than two mesh point sizes in advance when changing the mesh point size of the pattern processed by the mould,
the processing of the dot size other than the predetermined dot size in the irradiation region is to change the dot size of the pattern by adjusting the ratio at which the predetermined dot size is processed.
2. The apparatus according to claim 1, wherein the control unit adjusts a repetition rate of the laser beam generated from the laser light source, a pulse, or an average power of the laser light source, to thereby change a spot size in the mold process.
3. The mold pattern processing apparatus for producing a light guide plate according to claim 1, wherein the processed ratio is determined by adjusting a probability of being processed for a dot size set in advance in the irradiation region.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020190145441A KR102196062B1 (en) | 2019-11-13 | 2019-11-13 | Apparatus for engraving pattern on master for manufacturing light guide plate |
| KR10-2019-0145441 | 2019-11-13 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112799167A CN112799167A (en) | 2021-05-14 |
| CN112799167B true CN112799167B (en) | 2023-05-23 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202011266578.3A Active CN112799167B (en) | 2019-11-13 | 2020-11-13 | Mould pattern processing device for light guide plate production |
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| KR (1) | KR102196062B1 (en) |
| CN (1) | CN112799167B (en) |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005035040A (en) * | 2003-07-16 | 2005-02-10 | Dainippon Printing Co Ltd | Printing halftone dot, printing plate, printed matter and method for forming halftone dot |
| KR101051823B1 (en) * | 2009-10-19 | 2011-07-25 | 윤태중 | Laser generator for light guide plate processing |
| KR101083432B1 (en) * | 2010-01-20 | 2011-11-14 | (주)하드램 | Appratus for forming pattern for light guide plate using co2 laser |
| KR101011321B1 (en) * | 2010-03-22 | 2011-01-28 | 윤태중 | Apparatus for machining a light guide plate using a laser and method thereof |
| CN104553313B (en) * | 2013-10-23 | 2017-02-08 | 北大方正集团有限公司 | Printing image data processing method and device |
| CN104880756B (en) * | 2014-02-27 | 2018-04-27 | 苏州璨宇光学有限公司 | Light guide plate and backlight module |
| KR20180022197A (en) * | 2016-08-23 | 2018-03-06 | 케이투레이저시스템 (주) | Method for Forming Pattern and Laser Manufacturing Apparatus for using same |
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- 2019-11-13 KR KR1020190145441A patent/KR102196062B1/en active IP Right Grant
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| CN112799167A (en) | 2021-05-14 |
| KR102196062B1 (en) | 2020-12-29 |
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