CN112786734A - Solar cell module production method and solar cell module - Google Patents
Solar cell module production method and solar cell module Download PDFInfo
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- CN112786734A CN112786734A CN201911090496.5A CN201911090496A CN112786734A CN 112786734 A CN112786734 A CN 112786734A CN 201911090496 A CN201911090496 A CN 201911090496A CN 112786734 A CN112786734 A CN 112786734A
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1868—Passivation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention provides a solar cell module and a production method thereof, and relates to the technical field of solar photovoltaics. Splitting the solar cell to obtain a plurality of slices; the slice comprises a fresh face; coating a passivation material on the fresh surface of the slice; heating the passivation material of the new surface by laser to generate a passivation film on the new surface; and manufacturing a solar cell module based on the slice containing the passivation film. In this application, hydrogen atoms or other ions are introduced into the new surface through the passivation film to form ionic bonds or hydrogen bonds to carry out chemical passivation on the dangling bonds of the new surface, or negative fixed charges are introduced into the new surface through the passivation film, and the negative fixed charges inhibit minority carriers from diffusing to the surface of the silicon substrate, so that the recombination of the minority carriers is prevented, the short-circuit current is increased, and the output power of the solar cell module is improved. The heating area is convenient to control through laser heating, and the output power of the solar cell module is favorably improved.
Description
Technical Field
The invention relates to the technical field of solar photovoltaics, in particular to a solar cell module and a production method thereof.
Background
Under the condition that the conversion efficiency of the solar cell is certain, the solar cell is split and then packaged in series and parallel to form the solar cell module, so that the power generation output power of the solar cell module can be improved, and the application prospect is wide.
At present, in the production process of a solar cell module, a laser beam is generally adopted to scribe a solar cell along a position to be scribed by a certain depth, then the solar cell is broken off along the scribing part by a mechanical force to obtain a plurality of slices, and the solar cell module is directly manufactured based on the slices.
In the above solar cell module production method: the new surface in the splitting process has defects due to the thermal influence and mechanical stress of laser scribing, and through irradiation of sunlight, photo-generated carriers in the solar cell module are easy to form short circuits along the new surface, so that the performance of the solar cell module is greatly influenced, and the output power of the solar cell module is reduced.
Disclosure of Invention
The invention provides a solar cell module production method and a solar cell module, and aims to solve the problem of low output power of the solar cell module.
According to a first aspect of the present invention, there is provided a solar cell module production method comprising:
splitting the solar cell to obtain a plurality of slices; the slice comprises a fresh face;
coating a passivation material on the fresh surface of the slice;
heating the passivation material of the new surface by laser to generate a passivation film on the new surface;
and manufacturing a solar cell module based on the slice containing the passivation film.
Optionally, before the applying a passivation material on the fresh surface of the slice, the method further includes:
the passivation material is made based on a passivating agent and a solvent, or the passivation material is made based on a passivating agent, a solvent and a binder.
Optionally, the passivating agent includes: at least one of alumina, (alumina) x (titanium oxide) 1-x alloy, passivated glass powder, dithiolene compound, silicon phthalocyanine, gallium oxide, tin dioxide, 2-bipyridine, 4-bipyridine, phenanthroline, perfluorosulfonic acid-polytetrafluoroethylene copolymer;
the solvent comprises: at least one of isopropyl alcohol, butyl carbitol acetate and terpineol;
the adhesive comprises: at least one of ethyl cellulose, hydroxyethyl cellulose, or cellulose acetate butyrate.
Optionally, the passivated glass powder is: lead oxide with the mass ratio of 50-80%, silicon dioxide with the mass ratio of 5-20% and aluminum oxide with the mass ratio of 2-20%; the average grain diameter of the passivated glass powder is less than 4 microns.
Optionally, the passivation material includes: under the conditions of passivating glass powder, butyl carbitol and ethyl cellulose, the mass portion of the passivating glass powder in the passivating material is 1-2.5, and the mass portion of the sum of the butyl carbitol and the ethyl cellulose is as follows: 1;
in the sum of both the butyl carbitol and the ethyl cellulose: the mass ratio of the butyl carbitol to the ethyl cellulose is as follows: 100: (1-3).
Optionally, the passivating agent comprises: in the case of an (alumina) x (titania) 1-x alloy, the fabrication of the passivation material based on a passivating agent and a solvent includes:
carrying out sol-gel method treatment on alumina to obtain a first colloid;
carrying out sol-gel method treatment on the titanium oxide to obtain a second colloid;
and mixing the first colloid, the second colloid and the solvent, and performing ultrasonic dispersion on the mixed colloid to form the passivation material.
Optionally, the mass ratio of the aluminum element to the titanium element in the passivating agent is greater than 3: 1.
Optionally, the step of coating a passivation material on the fresh surface of the slice includes at least one of the following steps:
atomizing and coating the passivation material on the newly generated surface of the slice;
brushing the fresh surface of the slice with the passivation material;
coating the fresh noodle rods of the slices with the passivation material;
and ink-jetting and coating the passivation material on the new surface of the slice.
9. The method as claimed in claim 3, wherein in the case where the passivating agent comprises a passivating glass frit, the temperature of the laser heating is 600-900 ℃;
in the case where the passivating agent does not include a passivating glass frit, the temperature of the laser heating is 200-250 ℃.
Optionally, the laser heating the passivation material on the new surface to generate a passivation film on the new surface includes:
and vertically irradiating the passivation material of the new surface by using laser beams to generate a passivation film on the new surface.
Optionally, the splitting of the solar cell to obtain a plurality of slices includes:
scribing grooves are respectively arranged at two ends of the solar cell; the two opposite scribing grooves are collinear to a straight line;
heating a connecting part between the two scribing grooves on the straight line;
and cooling the heated connecting part, and breaking the connecting part along the straight line to obtain a plurality of slices by splitting.
Optionally, the heating temperature is 200-300 ℃; the depth of the scribing groove is less than or equal to half of the thickness of the solar cell.
Optionally, the laser heating the passivation material on the new surface to generate a passivation film on the new surface includes:
and in an oxygen environment, laser heating is carried out on the passivation material of the new surface, and a passivation film is generated on the new surface.
Optionally, the wavelength of the laser is 300nm to 1100nm, and the output power of a laser emitting the laser is 5-25 w; the pulse frequency of the laser emitted by the laser is 1-20 times per second.
According to a second aspect of the invention, there is also provided a solar cell module produced by the method of any one of the preceding claims.
According to a third aspect of the present invention, there is also provided a solar cell module production apparatus comprising: an interface, a bus, a memory and a processor, wherein the interface, the memory and the processor are connected through the bus, the memory is used for storing an executable program, and the processor is configured to run the executable program to realize the steps of the solar cell module production method according to any one of the preceding claims.
According to a fourth aspect of the present invention, there is also provided a computer readable storage medium having stored thereon an executable program, the executable program being executed by a processor to implement the steps of the solar module production method according to any one of the preceding claims.
In the embodiment of the invention, the solar cell is split to obtain a plurality of slices; the slice comprises a fresh face; coating a passivation material on the fresh surface of the slice; heating the passivation material of the new surface by laser to generate a passivation film on the new surface; and manufacturing a solar cell module based on the slice containing the passivation film. In the prior art, the new surface in the splitting process has defects due to the thermal influence and mechanical stress of laser scribing, and the reason that the photogenerated carriers in the solar cell module are easy to form short circuit along the new surface after being irradiated by sunlight is mainly as follows: the new surface generates dangling bonds, or has surface damage or adsorbs impurities, and the like, so that the new surface is easy to become a recombination center of minority carriers. In the application, a passivation material is coated on the newly generated surface of the slice, the passivation material on the newly generated surface is subjected to laser heating, a passivation film is generated on the newly generated surface, hydrogen atoms or other ions are introduced into the newly generated surface through the passivation film to form ionic bonds or hydrogen bonds to carry out chemical passivation on dangling bonds of the newly generated surface, or negative fixed charges are introduced into the newly generated surface through the passivation film, and the negative fixed charges inhibit minority carriers from diffusing to the surface of the silicon substrate, so that the recombination of the minority carriers is prevented, and the short-circuit current is increased, so that the output power of the solar cell module is improved. And the heating area is convenient to control through laser heating, other areas except a new surface can be prevented from being heated, a heat affected area is reduced, and the output power of the solar cell module is favorably improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments of the present invention will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art that other drawings can be obtained according to these drawings without inventive labor.
Fig. 1 shows a flow chart of the steps of a method for producing a solar cell module according to an embodiment of the invention;
FIG. 2 is a flow chart illustrating steps of solar cell splitting in an embodiment of the present invention;
FIG. 3 illustrates a schematic view of a scribe line groove in an embodiment of the present invention;
FIG. 4 shows a cross-sectional view of a solar cell in an embodiment of the invention;
FIG. 5 is a flow chart illustrating steps of another method for producing a solar cell module in an embodiment of the present invention;
FIG. 6 shows a flow chart of steps for fabricating a passivation material in an embodiment of the invention;
fig. 7 is a schematic structural view showing a solar cell module production apparatus in an embodiment of the present invention.
Description of the figure numbering:
1-solar cell, 11-scribe line groove, 12-connecting part between two opposite scribe line grooves, 70-back cover plate material, 71-interface, 72-processor, 73-memory, 74-bus.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1, fig. 1 shows a flow chart of steps of a method for producing a solar cell module according to an embodiment of the present invention.
In the embodiment of the invention, the solar cell can be split by mechanical stress or laser to obtain a plurality of slices. The specific number of the slices obtained by splitting is not particularly limited. Each section obtained by splitting comprises a new face. The new surface is a fracture surface in the slicing process of the solar cell. The newly formed surface is liable to generate dangling bonds, surface damage, adsorption of impurities, or the like. In the embodiment of the present invention, this is not particularly limited.
In an embodiment of the present invention, optionally, referring to fig. 2, fig. 2 is a flowchart illustrating a step of splitting a solar cell in an embodiment of the present invention. The specific step 101 may include:
And 1013, cooling the heated connecting part, wherein the connecting part is broken along the straight line, and the connecting part is split into a plurality of slices.
Specifically, the scribing grooves may be disposed only at two ends of the solar cell, and two opposite scribing grooves may be collinear on a straight line. Heating the connecting part between the two scribing grooves on the straight line, cooling the heated connecting part, and automatically cracking the connecting part along the straight line due to the stress generated by the cold and hot change of temperature to obtain a plurality of slices. Namely, the scribing grooves are only arranged at the two ends of the solar cell, and the scribing grooves are not arranged at the part between the two opposite scribing grooves, so that the damage to the solar cell is smaller, and the low-loss splinter is realized.
In the embodiment of the present invention, the length of the scribe line groove is not particularly limited. For example, the length of the scribe line groove may be one tenth of the length of the solar cell, or the like. The connecting part between the two scribing grooves on the heating straight line can adopt the connecting part between the two scribing grooves on the laser reciprocating heating straight line, and the laser heating is adopted, so that the heating of other parts except the connecting part is reduced by controlling the laser, and the influence of thermal stress is reduced. Optionally, the heating temperature of the connecting portion between the two scribe line grooves on the heating line may be controlled to be 200-.
In the embodiment of the present invention, optionally, the depth of the scribe line groove is less than or equal to half of the thickness of the solar cell, that is, the scribe line groove does not completely cut through the solar cell, only cuts half of the thickness of the solar cell or less, has less damage to the solar cell, and is beneficial to splitting.
Referring to fig. 3, fig. 3 shows a schematic view of a scribe line groove in an embodiment of the present invention. The scribe line grooves 11 are provided only at both ends of the solar cell 1, and the two opposing scribe line grooves 11 are collinear on a straight line L1. The connecting portion 12 between the two scribe lines 11 on the heating straight line L1 is shown as a broken line in fig. 3, and the heated connecting portion 12 is cooled, and the connecting portion 12 is automatically split along the straight line L1 by stress generated by cold and hot temperature changes, and a plurality of slices are obtained.
Referring to fig. 4, fig. 4 is a cross-sectional view of a solar cell in an embodiment of the present invention. In fig. 4, the depth h1 of the scribe line groove 11 is less than or equal to half the thickness h2 of the solar cell 1.
And 102, coating a passivation material on the new surface of the slice.
In an embodiment of the present invention, a passivation material may be applied to the fresh face of the slice. The passivation material can generate a passivation film at a certain temperature.
In the embodiment of the invention, a passivation material is coated on the newly generated surface of the slice, and then the passivation material on the newly generated surface is heated, the passivation material can generate a passivation film on the newly generated surface, hydrogen atoms or other ions are introduced into the newly generated surface through the passivation film to form ionic bonds or hydrogen bonds to chemically passivate dangling bonds of the newly generated surface, or negative fixed charges are introduced into the newly generated surface through the passivation film, and the negative fixed charges inhibit minority carriers from diffusing to the surface of the silicon substrate, so that the recombination of the minority carriers is prevented, and the short-circuit current is increased, so that the output power of the solar cell module is improved.
In an embodiment of the present invention, the step 102 may include at least one of the following steps: atomizing and coating the passivation material on the newly generated surface of the slice; brushing the fresh surface of the slice with the passivation material; coating the fresh noodle rods of the slices with the passivation material; and ink-jetting and coating the passivation material on the new surface of the slice.
Specifically, the passivation material can be coated on the new surface of the slice by means of atomization coating. The passivation material is heated and atomized and sprayed on the fresh surface of the slices. The amount of passivating material sprayed onto the nascent face can be controlled by controlling the concentration of atomization, the distance between the nascent face and the atomized spray, the spray time, etc. The passivation material can also be manually or mechanically coated on the new surface of the slice in a brushing way. The passivating material can also be coated on the new surface of the slice in a bar coating mode. The passivation material can be coated on the new surface of the slice by adopting an ink-jet coating mode. In the embodiment of the present invention, this is not particularly limited. The above-mentioned route of paining the passivation material can realize automatic brush basically, can realize serialization production, and production efficiency is high, and above-mentioned mode of paining is like, and atomizing is paintd, stick is scribbled, the inkjet is paintd etc. can realize accurate paining moreover, can not paint passivation material to other regions except that the new face, can avoid extravagant.
In the embodiment of the present invention, the amount of passivation material applied to the fresh side can be controlled by controlling the speed of application, the time of application, and the like. In the embodiment of the present invention, this is not particularly limited.
And 103, carrying out laser heating on the passivation material of the new surface to generate a passivation film on the new surface.
In the embodiment of the invention, the passivation material on the new surface can be heated by laser to generate the passivation film on the new surface. The heating area is convenient to control through laser heating, other areas except a new surface can be prevented from being heated, a heat affected area is reduced, and the output power of the solar cell module is favorably improved. The new surface of the sliced piece is directed to a laser beam, and the laser beam is directly irradiated to the new surface, thereby reducing the heat affected zone as much as possible.
In the embodiment of the present invention, the heating temperature, the heating wavelength, and the like may be specifically set according to the passivation material, and this is not particularly limited in the embodiment of the present invention.
Optionally, in the laser heating process, the laser wavelength may be 300nm to 1100nm, the output power of the laser emitting laser may be 5 to 25w, and the pulse frequency of the laser emitted by the laser is 1 to 20 times per second. The laser can quickly heat the passivation material, does not bring more heat influence to the slice, and is favorable for improving the output power of the solar cell module. In the embodiment of the invention, the passivation material can be heated by adopting elliptical laser spots or linear laser spots and the like, so that laser is focused on a region needing to be heated, and other regions are influenced by heat as little as possible.
For example, laser light is emitted using a laser combination including green and infrared wavelengths, and for example, laser light of 532nm and laser light of 800nm may be emitted using a laser combination.
In the embodiment of the present invention, optionally, the passivation material of the new surface may be vertically irradiated with a laser beam to form a passivation film on the new surface. That is, the passivation material on the new surface is irradiated with a laser beam perpendicularly, and the laser beam is focused on the region to be heated, and the other regions are affected by heat as little as possible.
And 104, manufacturing a solar cell module based on the slice containing the passivation film.
In the embodiment of the invention, the solar cell module can be manufactured by using the slice containing the passivation film and performing the procedures of typesetting, laminating and the like. The type and the like of the solar cell module are not particularly limited.
In the embodiment of the invention, a passivation material is coated on the newly generated surface of the slice, the passivation material on the newly generated surface is subjected to laser heating, a passivation film is generated on the newly generated surface, hydrogen atoms or other ions are introduced into the newly generated surface through the passivation film to form ionic bonds or hydrogen bonds to carry out chemical passivation on dangling bonds of the newly generated surface, or negative fixed charges are introduced into the newly generated surface through the passivation film, and the negative fixed charges inhibit minority carriers from diffusing to the surface of the silicon substrate, so that the recombination of the minority carriers is prevented, the short-circuit current is increased, and the output power of the solar cell module is improved. And the heating area is convenient to control through laser heating, other areas except a new surface can be prevented from being heated, a heat affected area is reduced, and the output power of the solar cell module is favorably improved.
In an embodiment of the present invention, referring to fig. 5, fig. 5 is a flow chart illustrating steps of a method for manufacturing another solar cell module in an embodiment of the present invention.
In the embodiment of the present invention, the step 201 may refer to the step 101, and is not described herein again to avoid repetition.
In step 202, a passivation material is made based on a passivation agent and a solvent, or a passivation material is made based on a passivation agent, a solvent and a binder.
In the embodiment of the invention, the passivating agent can be heated in the solvent to prepare the passivating material. Or adding a passivating agent, an adhesive and the like into the solvent to prepare the passivating material.
Optionally, the passivating agent may include: at least one of alumina, (alumina) x (titanium oxide) 1-x alloy, passivated glass powder, dithiolene compound, silicon phthalocyanine, gallium oxide, tin dioxide, 2-bipyridine, 4-bipyridine, phenanthroline, perfluorosulfonic acid-polytetrafluoroethylene copolymer. The above x may be an integer of 1 or more.
Alternatively, the solvent may include: at least one of isopropanol, butyl carbitol acetate and terpineol.
Optionally, the adhesive may include: at least one of ethyl cellulose, hydroxyethyl cellulose, or cellulose acetate butyrate.
The passivation material formed by the materials generates a passivation film after being heated by laser, hydrogen atoms or other ions are introduced into the new surface of the passivation film to form ionic bonds or hydrogen bonds to carry out chemical passivation on the dangling bonds of the new surface, or negative fixed charges are introduced into the new surface of the passivation film, and the negative fixed charges inhibit minority carriers from diffusing to the surface of the silicon substrate, so that the minority carriers are prevented from being compounded, the short-circuit current is increased, and the output power of the solar cell module is improved.
Optionally, the passivated glass powder is: lead oxide with the mass ratio of 50-80%, silicon dioxide with the mass ratio of 5-20% and aluminum oxide with the mass ratio of 2-20%; the average particle size of the passivated glass frit is less than 4 microns. The passivated glass powder made of the materials has good chemical stability and the like, and the passivated glass powder with the particle size is simple and convenient to manufacture, is beneficial to uniform subsequent coating, and is easy to form a uniform, smooth and pinhole-free passivated film.
For example, the passivating glass frit may be: lead oxide with the mass ratio of 70 percent, silicon dioxide with the mass ratio of 15 percent and aluminum oxide with the mass ratio of 15 percent.
In particular, SiO in the glass passivation powder2Can improve the chemical stability of the glass. PbO in the glass passivation powder also has good chemical stability. Al in glass passivation powder2O3Has high dielectric constant and better chemical corrosion resistance. Al in glass passivation powder2O3And B2O3Similar negative charge effects have excellent Na + migration blocking capability, so that the Na + mobility ratio in the passivated glass powder is higher than that of the glass powder with SiO as the main component2About six orders of magnitude lower in glass. Al in glass passivation powder2O3Has negative fixed charges, and the field effect generated by the fixed charges produces a passivation effect.For example, by forming Al having a negative fixed charge on the surface of a P-type silicon substrate2O3The passivation film is formed of a film that suppresses diffusion of electrons, which are minority carriers, to the surface of the silicon substrate, prevents recombination of carriers, and increases short-circuit current.
At the same time, Al in the glass passivation powder2O3And B2O3Similar negative charge effect has excellent ability of blocking Na + migration, and can greatly block Na + in cover plate glass used in the subsequent lamination process from migrating towards the direction of the silicon substrate, thereby inhibiting the diffusion of electrons serving as minority carriers to the surface of the silicon substrate, preventing the recombination of the carriers, increasing the short-circuit current, and being beneficial to improving the stability of the solar cell module.
The passivation material comprises: in the case of the passivation glass powder, butyl carbitol and ethyl cellulose, the mass part of the passivation glass powder in the passivation material can be 1-2.5, and the mass part corresponding to the sum of the butyl carbitol and the ethyl cellulose can be: 1. in the sum of both butyl carbitol and ethyl cellulose: the mass ratio of the butyl carbitol to the ethyl cellulose can be as follows: 100: (1-3). The viscosity of the passivation material with the proportion and the material is beneficial to smearing, and the passivation film is well passivated.
For example, passivation materials include: in the case of the passivation glass powder, butyl carbitol and ethyl cellulose, the passivation glass powder may be present in the passivation material in an amount of 100 parts by mass, and the sum of butyl carbitol and ethyl cellulose may correspond to 50 parts by mass. At 50 parts of the sum of both butyl carbitol and ethyl cellulose: the mass fraction of the butyl carbitol can be 49 parts, and the mass fraction of the ethyl cellulose can be 1 part.
In an embodiment of the present invention, referring to fig. 6, fig. 6 shows a flowchart of steps of fabricating a passivation material in an embodiment of the present invention. The passivating agent comprises: in the case of an (alumina) x (titania) 1-x alloy, the above step 202 may include:
Specifically, the alumina may be treated by a sol-gel method to obtain a first colloid, and the titania may be treated by a sol-gel method to obtain a second colloid. And mixing the first colloid, the second colloid and the solvent, and performing ultrasonic dispersion on the mixed colloid to form a uniform and consistent passivation material.
In the embodiment of the present invention, optionally, the passivating agent includes: under the condition of (aluminum oxide) x (titanium oxide) 1-x alloy, the mass ratio of aluminum element to titanium element in the passivating agent is more than 3:1, so that a uniform, smooth and pinhole-free passivating film is easily prepared, and the passivating effect is good.
Step 203 may refer to step 102, and is not described herein again to avoid repetition.
And 204, in an oxygen environment, carrying out laser heating on the passivation material of the new surface to generate a passivation film on the new surface.
In the embodiment of the present invention, in the step 204, reference may be made to the step 103, and it should be noted that, in an oxygen environment, laser heating is performed on the passivation material of the new surface, so that dangling bonds of the new surface can be reduced to a greater extent, and thus, the leakage current is reduced. The fixed negative charge density in the passive film after sintering is between +7 x 1011/cm2To + 15X 1011/cm2When negative charges exist in the passivation film, positive charges with corresponding quantity can be induced in the new surface, so that the depletion layer of the new surface is expanded continuously to the n region, the width of the depletion layer in the p + region is narrowed to the n region, the doping concentration difference of the p + region and the n region is large, the expanded width of the n region is far larger than the narrowed width of the p region, the width of the whole depletion layer is larger than the width of the new surface without the charges, the surface electric field is reduced, and the passivation film can effectively block external impurities and gasesStable chemical performance and strong acid and alkali resistance.
In the embodiment of the present invention, optionally, in the case that the passivating agent includes the passivated glass powder, the temperature of the laser heating is 600-. In the case where the passivating agent does not include a passivating glass frit, the temperature of the laser heating is 200 ℃ and 250 ℃. In the case where the passivating agent comprises a passivating glass frit, the passivating glass frit is due to the SiO therein2Has a higher molding temperature and thus requires a higher heating temperature. However, since laser heating is used, only the new surface is heated, and other areas are not heated, the heating effect can be limited to a small range as much as possible. Under the condition that the passivating agent does not comprise passivating glass powder, the laser heating temperature is 200-250 ℃, the heating temperature is low, and the heating influence is small.
And step 205, manufacturing a solar cell module based on the slice containing the passivation film.
Step 205 may refer to step 104, and is not described herein again to avoid repetition.
In the embodiment of the invention, a passivation material is coated on the newly generated surface of the slice, the passivation material on the newly generated surface is subjected to laser heating, a passivation film is generated on the newly generated surface, hydrogen atoms or other ions are introduced into the newly generated surface through the passivation film to form ionic bonds or hydrogen bonds to carry out chemical passivation on dangling bonds of the newly generated surface, or negative fixed charges are introduced into the newly generated surface through the passivation film, and the negative fixed charges inhibit minority carriers from diffusing to the surface of the silicon substrate, so that the recombination of the minority carriers is prevented, the short-circuit current is increased, and the output power of the solar cell module is improved. And the heating area is convenient to control through laser heating, other areas except a new surface can be prevented from being heated, a heat affected area is reduced, and the output power of the solar cell module is favorably improved.
It should be noted that, for simplicity of description, the method embodiments are described as a series of acts or combination of acts, but those skilled in the art will recognize that the embodiments are not limited by the order of acts described, as some steps may occur in other orders or concurrently depending on the embodiments. Further, those skilled in the art will appreciate that the embodiments described in the specification are presently preferred and that no particular act is required to implement the embodiments of the application.
In an embodiment of the present invention, a solar cell module is further provided, and the solar cell module is produced by the production method of the solar cell module, and can achieve the same technical effect, and therefore, for avoiding repetition, the details are not repeated herein.
Fig. 7 is a schematic structural view showing a solar cell module production apparatus according to an embodiment of the present invention.
As shown in fig. 7, the solar cell module production apparatus provided by the embodiment of the present invention may include: an interface 71, a processor 72, a memory 73, and a bus 74; wherein, the bus 74 is used for realizing the connection communication among the interface 71, the processor 72 and the memory 73; the memory 73 stores executable programs, and the processor 72 is configured to execute the executable programs stored in the memory 73 to implement the steps of fig. 1, fig. 2, fig. 5, and fig. 6, or the solar cell module production, and can achieve the same or similar effects, which is not described herein again to avoid repetition.
The present invention further provides a computer-readable storage medium, where one or more executable programs are stored, and the one or more executable programs can be executed by one or more processors to implement the steps of fig. 1, fig. 2, fig. 5, and fig. 6, or the steps of solar cell module production, and achieve the same or similar effects, and therefore, the description thereof is omitted here for avoiding repetition.
While the present invention has been described with reference to the embodiments shown in the drawings, the present invention is not limited to the embodiments, which are illustrative and not restrictive, and it will be apparent to those skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (15)
1. A method of producing a solar cell module, comprising:
splitting the solar cell to obtain a plurality of slices; the slice comprises a fresh face;
coating a passivation material on the fresh surface of the slice;
heating the passivation material of the new surface by laser to generate a passivation film on the new surface;
and manufacturing a solar cell module based on the slice containing the passivation film.
2. The method of claim 1, wherein before applying passivation material to the fresh side of the slice, further comprising:
the passivation material is made based on a passivating agent and a solvent, or the passivation material is made based on a passivating agent, a solvent and a binder.
3. The method of claim 2, wherein the passivating agent comprises: at least one of alumina, (alumina) x (titanium oxide) 1-x alloy, passivated glass powder, dithiolene compound, silicon phthalocyanine, gallium oxide, tin dioxide, 2-bipyridine, 4-bipyridine, phenanthroline, perfluorosulfonic acid-polytetrafluoroethylene copolymer;
the solvent comprises: at least one of isopropyl alcohol, butyl carbitol acetate and terpineol;
the adhesive comprises: at least one of ethyl cellulose, hydroxyethyl cellulose, or cellulose acetate butyrate.
4. The method according to claim 3 to claim, wherein the passivating glass frit is: lead oxide with the mass ratio of 50-80%, silicon dioxide with the mass ratio of 5-20% and aluminum oxide with the mass ratio of 2-20%; the average grain diameter of the passivated glass powder is less than 4 microns.
5. The method of claim 3, wherein the passivation material comprises: under the conditions of passivating glass powder, butyl carbitol and ethyl cellulose, the mass portion of the passivating glass powder in the passivating material is 1-2.5, and the mass portion of the sum of the butyl carbitol and the ethyl cellulose is as follows: 1;
in the sum of both the butyl carbitol and the ethyl cellulose: the mass ratio of the butyl carbitol to the ethyl cellulose is as follows: 100: (1-3).
6. A method according to claim 3, characterised in that the passivating agent comprises: in the case of an (alumina) x (titania) 1-x alloy, the fabrication of the passivation material based on a passivating agent and a solvent includes:
carrying out sol-gel method treatment on alumina to obtain a first colloid;
carrying out sol-gel method treatment on the titanium oxide to obtain a second colloid;
and mixing the first colloid, the second colloid and the solvent, and performing ultrasonic dispersion on the mixed colloid to form the passivation material.
7. The method according to claim 6, wherein the mass ratio of the aluminum element to the titanium element in the passivating agent is greater than 3: 1.
8. The method of claim 1, wherein the applying a passivating material to the fresh side of the slice comprises at least one of:
atomizing and coating the passivation material on the newly generated surface of the slice;
brushing the fresh surface of the slice with the passivation material;
coating the fresh noodle rods of the slices with the passivation material;
and ink-jetting and coating the passivation material on the new surface of the slice.
9. The method as claimed in claim 3, wherein in the case where the passivating agent comprises a passivating glass frit, the temperature of the laser heating is 600-900 ℃;
in the case where the passivating agent does not include a passivating glass frit, the temperature of the laser heating is 200-250 ℃.
10. The method of claim 1, wherein the laser heating of the passivation material of the new facet generates a passivation film on the new facet, comprising:
and vertically irradiating the passivation material of the new surface by using laser beams to generate a passivation film on the new surface.
11. The method of claim 1, wherein the splitting of the solar cell to obtain a plurality of slices comprises:
scribing grooves are respectively arranged at two ends of the solar cell; the two opposite scribing grooves are collinear to a straight line;
heating a connecting part between the two scribing grooves on the straight line;
and cooling the heated connecting part, and breaking the connecting part along the straight line to obtain a plurality of slices by splitting.
12. The method as claimed in claim 11, wherein the heating temperature is 200-300 ℃; the depth of the scribing groove is less than or equal to half of the thickness of the solar cell.
13. The method of claim 1, wherein the laser heating of the passivation material of the new facet generates a passivation film on the new facet, comprising:
and in an oxygen environment, laser heating is carried out on the passivation material of the new surface, and a passivation film is generated on the new surface.
14. The method according to claim 1, wherein the laser has a wavelength of 300nm to 1100nm, and the output power of the laser emitting the laser is 5-25 w; the pulse frequency of the laser emitted by the laser is 1-20 times per second.
15. A solar cell module produced by the method of any one of claims 1 to 14.
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| PCT/CN2020/106785 WO2021088443A1 (en) | 2019-11-08 | 2020-08-04 | Method for producing solar cell module and solar cell module |
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Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101421851A (en) * | 2006-04-12 | 2009-04-29 | 可再生能源公司 | Solar cell and manufacture method thereof |
| CN102281982A (en) * | 2009-01-16 | 2011-12-14 | 弗劳恩霍弗应用技术研究院 | Method and device for simultaneous microstructuring and passivating |
| CN104332530A (en) * | 2014-11-05 | 2015-02-04 | 四川钟顺太阳能开发有限公司 | Method for reducing efficiency loss of cut solar cell and solar cell produced thereby |
| KR101575967B1 (en) * | 2014-07-08 | 2015-12-08 | 현대중공업 주식회사 | Fabrication method of PERL solar cell deposited in both sides of AlOx and solar cell thereby |
| CN106489211A (en) * | 2014-05-27 | 2017-03-08 | 太阳能公司 | Imbrication formula solar module |
| CN108461577A (en) * | 2018-04-08 | 2018-08-28 | 浙江晶科能源有限公司 | A kind of production method of photovoltaic module |
| CN108511107A (en) * | 2018-02-28 | 2018-09-07 | 江苏国瓷泓源光电科技有限公司 | A kind of back of the body passivation aluminium paste and preparation method thereof containing porous structure powder |
| CN109449252A (en) * | 2018-11-15 | 2019-03-08 | 浙江艾能聚光伏科技股份有限公司 | The manufacture craft of half multicrystalline solar cells |
| US20190259887A1 (en) * | 2017-03-03 | 2019-08-22 | Guangdong Aiko Solar Energy Technology Co., Ltd. | Bifacial p-type perc solar cell and module, system, and preparation method thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG191045A1 (en) * | 2010-12-06 | 2013-08-30 | Shinetsu Chemical Co | Solar cell and solar-cell module |
| WO2013126927A2 (en) * | 2012-02-26 | 2013-08-29 | Solexel, Inc. | Systems and methods for laser splitting and device layer transfer |
-
2019
- 2019-11-08 CN CN201911090496.5A patent/CN112786734A/en active Pending
-
2020
- 2020-08-04 WO PCT/CN2020/106785 patent/WO2021088443A1/en active Application Filing
Patent Citations (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101421851A (en) * | 2006-04-12 | 2009-04-29 | 可再生能源公司 | Solar cell and manufacture method thereof |
| CN102281982A (en) * | 2009-01-16 | 2011-12-14 | 弗劳恩霍弗应用技术研究院 | Method and device for simultaneous microstructuring and passivating |
| CN106489211A (en) * | 2014-05-27 | 2017-03-08 | 太阳能公司 | Imbrication formula solar module |
| KR101575967B1 (en) * | 2014-07-08 | 2015-12-08 | 현대중공업 주식회사 | Fabrication method of PERL solar cell deposited in both sides of AlOx and solar cell thereby |
| CN104332530A (en) * | 2014-11-05 | 2015-02-04 | 四川钟顺太阳能开发有限公司 | Method for reducing efficiency loss of cut solar cell and solar cell produced thereby |
| US20190259887A1 (en) * | 2017-03-03 | 2019-08-22 | Guangdong Aiko Solar Energy Technology Co., Ltd. | Bifacial p-type perc solar cell and module, system, and preparation method thereof |
| CN108511107A (en) * | 2018-02-28 | 2018-09-07 | 江苏国瓷泓源光电科技有限公司 | A kind of back of the body passivation aluminium paste and preparation method thereof containing porous structure powder |
| CN108461577A (en) * | 2018-04-08 | 2018-08-28 | 浙江晶科能源有限公司 | A kind of production method of photovoltaic module |
| CN109449252A (en) * | 2018-11-15 | 2019-03-08 | 浙江艾能聚光伏科技股份有限公司 | The manufacture craft of half multicrystalline solar cells |
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