CN112746258A - Wear-resistant corrosion-resistant rubber material and preparation method thereof - Google Patents
Wear-resistant corrosion-resistant rubber material and preparation method thereof Download PDFInfo
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- 229920001971 elastomer Polymers 0.000 title claims abstract description 103
- 239000005060 rubber Substances 0.000 title claims abstract description 103
- 239000000463 material Substances 0.000 title claims abstract description 44
- 238000005260 corrosion Methods 0.000 title claims abstract description 29
- 230000007797 corrosion Effects 0.000 title claims abstract description 29
- 238000002360 preparation method Methods 0.000 title abstract description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 41
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 40
- 239000000758 substrate Substances 0.000 claims abstract description 39
- 238000000034 method Methods 0.000 claims abstract description 19
- 230000008569 process Effects 0.000 claims abstract description 5
- 238000000151 deposition Methods 0.000 claims description 67
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 60
- 230000008021 deposition Effects 0.000 claims description 56
- 239000010408 film Substances 0.000 claims description 40
- 229910052786 argon Inorganic materials 0.000 claims description 30
- 230000007704 transition Effects 0.000 claims description 18
- 238000005137 deposition process Methods 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 13
- 229910052710 silicon Inorganic materials 0.000 claims description 13
- 239000010703 silicon Substances 0.000 claims description 13
- 239000013077 target material Substances 0.000 claims description 13
- 238000004140 cleaning Methods 0.000 claims description 10
- 229920000459 Nitrile rubber Polymers 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 9
- 239000010936 titanium Substances 0.000 claims description 9
- 229910052719 titanium Inorganic materials 0.000 claims description 9
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 9
- 239000010937 tungsten Substances 0.000 claims description 9
- 229910052721 tungsten Inorganic materials 0.000 claims description 9
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 8
- 239000010409 thin film Substances 0.000 claims description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 7
- 230000003213 activating effect Effects 0.000 claims description 6
- 238000004544 sputter deposition Methods 0.000 claims description 6
- 229920001973 fluoroelastomer Polymers 0.000 claims description 5
- 239000012300 argon atmosphere Substances 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 claims 6
- 239000000126 substance Substances 0.000 abstract description 4
- 230000003139 buffering effect Effects 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000003921 oil Substances 0.000 description 7
- 238000007789 sealing Methods 0.000 description 6
- 238000009835 boiling Methods 0.000 description 5
- 238000004506 ultrasonic cleaning Methods 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
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- 238000009472 formulation Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000002113 nanodiamond Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- 239000004636 vulcanized rubber Substances 0.000 description 1
Images
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0635—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
- C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
Abstract
The invention relates to the technical field of rubber materials, and provides a wear-resistant corrosion-resistant rubber material and a preparation method thereof, aiming at solving the problem that the rubber elasticity and the buffering effect are deteriorated due to a process of improving the wear resistance of rubber by adjusting a formula in the prior art. The invention adopts the diamond-like carbon film to modify the rubber substrate, and effectively improves the wear resistance and corrosion resistance of the rubber substrate on the premise of ensuring the self elastic property of the rubber substrate. The DLC film has low friction coefficient, high hardness, excellent wear resistance and chemical stability, and the diamond-like carbon film deposited on the surface can improve the wear resistance and corrosion resistance of rubber material obviously and raise its service life and stability.
Description
Technical Field
The invention relates to the technical field of rubber materials, in particular to a wear-resistant and corrosion-resistant rubber material and a preparation method thereof.
Background
The rubber is widely applied to the fields of aerospace, transportation, medical appliances and the like as a common sealing material, wherein acrylate rubber (ACM), fluorine rubber (FKM), nitrile rubber (NBR) and the like are common. However, most of the rubber sealing products are in a dynamic sliding state, and the materials are worn and failed when the rubber sealing products work for a long time in a dynamic sealing environment, so that potential safety hazards are brought, for example, in an oil sealing environment, the oil leakage pollution is caused due to the failure of sealing materials. Therefore, the improvement of the tribological performance of the rubber sealing material and the reduction of the abrasion are of great significance to the prolonging of the service life of the rubber sealing material.
At present, in order to improve the wear resistance of rubber materials, the vulcanization degree of the rubber materials can be adjusted, fillers are added into a rubber formula to improve the tensile strength of the rubber, or materials such as graphite are added to reduce the friction coefficient of the surface.
Chinese patent literature discloses a thermoplastic vulcanized rubber with high wear resistance and low friction coefficient, and the application publication number is CN 109485992A; the Chinese patent literature discloses a method for reinforcing rubber by using nano diamond powder, and the application publication number of the method is CN 109957143A; the Chinese patent literature discloses a method for preparing a wear-resistant rubber sealing ring by using a rubber formula, and the application publication number of the method is CN 107652559A.
The technical solutions disclosed above for enhancing the wear resistance of rubber materials are all realized based on adjusting the formulation of the rubber materials, but the elasticity and the cushioning effect of the rubber are also affected while the formulation is adjusted to improve the wear resistance, and finally the actual use is affected. In addition, the additive added with the sulfur-containing substances has strong environmental pollution and can cause pollution to the atmosphere and water bodies.
Disclosure of Invention
The invention provides a diamond-like carbon film-based wear-resistant corrosion-resistant rubber material with low film cost, high film-substrate binding force and controllable film deposition rate, aiming at overcoming the problem that the rubber elasticity and the buffering effect are deteriorated due to the process of improving the wear resistance of rubber by adjusting the formula in the prior art.
The invention also provides a preparation method of the wear-resistant and corrosion-resistant rubber material, which can obviously improve the wear resistance and corrosion resistance of the rubber material, prolong the service life and improve the stability of the rubber material, and simultaneously does not influence the elasticity of the rubber.
In order to achieve the purpose, the invention adopts the following technical scheme:
the wear-resistant corrosion-resistant rubber material sequentially comprises a rubber base material, a SiC transition layer and a diamond-like carbon film (DLC film) from bottom to top.
The invention breaks through the traditional mode of improving the wear resistance of rubber by adjusting and modifying the formula filler, creatively adopts the diamond-like carbon film to modify the rubber substrate, and effectively improves the wear resistance and the corrosion resistance of the rubber substrate on the premise of ensuring the elastic property of the rubber substrate. The DLC film has low friction coefficient, high hardness, excellent wear resistance and chemical stability, and the diamond-like carbon film deposited on the surface can improve the wear resistance and corrosion resistance of rubber material obviously and raise its service life and stability. However, the DLC film is directly deposited on the surface of the rubber substrate, the film base binding force is small, and the DLC film is easy to fall off.
Preferably, the rubber substrate is selected from one of acrylate rubber (ACM), fluoro rubber (FKM) and nitrile rubber (NBR). The rubber substrate is preferably used in the present invention, but the present invention is not limited to the above substrate, and may be other rubber substrates requiring abrasion resistance and corrosion resistance modification.
Preferably, the diamond-like thin film is selected from one of a silicon-doped diamond-like thin film, a tungsten-doped diamond-like thin film and a titanium-doped diamond-like thin film. The DLC film doped with silicon, tungsten, titanium and the like can effectively release the residual stress of the DLC film and improve the tribological performance of the DLC film.
A preparation method of a wear-resistant corrosion-resistant rubber material comprises the following steps:
(1) decontaminating and plasma activating and cleaning the rubber base material; before deposition, the rubber substrate is sequentially subjected to soapy water ultrasonic cleaning and boiling water bath to remove surface oil stains, and then is dried by nitrogen;
(2) depositing a SiC transition layer on the rubber substrate treated in the step (1) by adopting a magnetron sputtering method;
(3) and depositing a diamond-like carbon film on the SiC transition layer by adopting a magnetron sputtering method in an argon atmosphere to obtain the wear-resistant and corrosion-resistant rubber material.
Preferably, in step (1): the plasma activating and cleaning process comprises the following steps: fixing the rubber substrate in a sputtering chamber, and vacuumizing to 4.0 × 10-4Pa～6.0×10-4And introducing argon after Pa, turning on a direct-current power supply, and activating and cleaning the surface of the rubber substrate for 20-30 min by using argon plasma.
Preferably, in step (2): silicon targets and carbon targets are used as target materials, the deposition bias is-40 to-100V, the vacuum degree in the deposition process is 0.1 to 0.3Pa, the target material power is 1 to 3kW, and the deposition temperature is 20 to 30 ℃.
Preferably, in step (3): introducing argon, taking a carbon target as a target material, setting the deposition bias voltage to be-20 to-140V, setting the vacuum degree to be 0.1 to 0.3Pa, setting the target material power to be 1 to 3kW and setting the deposition temperature to be 20 to 40 ℃.
Preferably, in the step (1), the rubber substrate is acrylate rubber;
in the step (3), the diamond-like film is a silicon-doped diamond-like film, and the deposition process comprises the following steps: the power of the carbon target is 150-200W, the power of the silicon target is 80-100W, the deposition bias is-60-50V, the flow of argon is 20-30 sccm, the deposition pressure is 0.2-0.3 Pa, and the deposition temperature is 30-35 ℃.
More preferably, the carbon target power is 200W, the silicon target power is 100W, the deposition bias is-60V, the argon flow is 20sccm, the deposition pressure is 0.2Pa, and the deposition temperature is 30 ℃.
Preferably, in the step (1), the rubber substrate is a fluororubber;
in the step (3), the diamond-like film is a tungsten doped diamond-like film, and the deposition process comprises the following steps: the carbon target power is 100-110W, the tungsten target power is 150-160W, the deposition bias is-80-70V, the argon flow is 30-35 sccm, the deposition pressure is 0.3-0.4 Pa, and the deposition temperature is 30-35 ℃.
More preferably, the carbon target power is 100W, the tungsten target power is 150W, the deposition bias is-80V, the argon flow is 30sccm, the deposition pressure is 0.3Pa, and the deposition temperature is 30 ℃.
Preferably, in the step (1), the rubber substrate is nitrile rubber;
in the step (3), the diamond-like film is a titanium doped diamond-like film, and the deposition process comprises the following steps: the carbon target power is 45-50W, the titanium target power is 80-100W, the deposition bias is-60-50V, the argon flow is 30-40 sccm, the deposition pressure is 0.3-0.4 Pa, and the deposition temperature is 30-35 ℃.
More preferably, the carbon target power is 50W, the titanium target power is 100W, the deposition bias is-60V, the argon flow is 30sccm, the deposition pressure is 0.3Pa, and the deposition temperature is 30 ℃.
Therefore, the invention has the following beneficial effects:
(1) the invention adopts the diamond-like carbon film to modify the rubber substrate, and effectively improves the wear resistance and corrosion resistance of the rubber substrate on the premise of ensuring the elasticity of the rubber substrate. The DLC film has low friction coefficient, high hardness, excellent wear resistance and chemical stability, and the diamond-like carbon film deposited on the surface can obviously improve the wear resistance and corrosion resistance of the rubber material and prolong the service life and stability of the rubber material;
(2) the preparation method is simple to operate, mild in reaction condition, low in energy consumption, free of special requirements for equipment and easy to industrialize, and the wear-resistant and corrosion-resistant rubber material can be widely applied to different application scenes, such as corrosive sealing environments.
Drawings
Fig. 1 is a schematic structural view of the wear-resistant and corrosion-resistant rubber material of example 1.
In the figure: a rubber substrate 1, a SiC transition layer 2 and a DLC film 3.
Detailed Description
The technical solution of the present invention is further specifically described below by using specific embodiments and with reference to the accompanying drawings.
In the present invention, all the equipment and materials are commercially available or commonly used in the art, and the methods in the following examples are conventional in the art unless otherwise specified.
Example 1
(1) As shown in fig. 1, a rubber substrate (acrylate rubber) 1 was subjected to ultrasonic cleaning with soap water and boiling water bath to remove oil stains on the surface; fixing the rubber substrate in a sputtering chamber, and vacuumizing to 4.0 × 10-4Introducing argon after Pa, turning on a direct-current power supply, and carrying out plasma activation cleaning on the surface of the rubber substrate for 20min by using argon plasma;
(2) depositing the SiC transition layer 2 by using a silicon target and a carbon target as target materials: the deposition bias is-40V, the vacuum degree in the deposition process is 0.1Pa, the target power is 1kW, and the deposition temperature is 30 ℃;
(3) argon is introduced, a carbon target is used as a target material, a magnetron sputtering method is adopted, a diamond-like carbon film (DLC film) 3 is deposited on the SiC transition layer, the deposition bias voltage is-20V, the vacuum degree in the deposition process is 0.1Pa, the carbon target power is 1kW, and the deposition temperature is 40 ℃, so that the wear-resistant and corrosion-resistant rubber material shown in the figure 1 is obtained, wherein the rubber substrate 1, the SiC transition layer 2 and the DLC film 3 are shown in the figure.
Example 2
(1) Carrying out ultrasonic cleaning of soap water and boiling water bath on the Fluororubber (FKM) to remove oil stains on the surface; fixing the rubber substrate in a sputtering chamber, and vacuumizing to 6.0 × 10-4Introducing argon after Pa, turning on a direct-current power supply, and carrying out plasma activation cleaning on the surface of the rubber substrate for 30min by using argon plasma;
(2) depositing a SiC transition layer by using a silicon target and a carbon target as target materials: the deposition bias is-100V, the vacuum degree in the deposition process is 0.3Pa, the target power is 3kW, and the deposition temperature is 20 ℃;
(3) and introducing argon, taking a carbon target and a tungsten target as targets, and depositing the tungsten-doped diamond-like carbon film on the SiC transition layer by adopting a magnetron sputtering method, wherein the deposition process comprises the steps of setting the carbon target power at 600W, setting the tungsten target power at 150W, setting the deposition bias voltage at-140V, setting the argon flow at 30sccm, setting the deposition pressure at 0.3Pa and setting the deposition temperature at 30 ℃ to obtain the wear-resistant and corrosion-resistant rubber material.
Example 3
(1) Carrying out soap water ultrasonic cleaning and boiling water bath on Nitrile Butadiene Rubber (NBR) to remove surface oil stains; fixing the rubber substrate in a sputtering chamber, and vacuumizing to 5.0 × 10-4Introducing argon after Pa, turning on a direct-current power supply, and carrying out plasma activation cleaning on the surface of the rubber substrate for 28min by using argon plasma;
(2) depositing a SiC transition layer by using a silicon target and a carbon target as target materials: the deposition bias is-60V, the vacuum degree in the deposition process is 0.2Pa, the target power is 2kW, and the deposition temperature is 25 ℃;
(3) and introducing argon, taking a carbon target and a titanium target as targets, and depositing the titanium-doped diamond-like carbon film on the SiC transition layer by adopting a magnetron sputtering method, wherein the power of the carbon target is 200W, the power of the titanium target is 100W, the deposition bias is-70V, the flow of the argon is 30sccm, the deposition pressure is 0.3Pa, and the deposition temperature is 30 ℃, so that the wear-resistant and corrosion-resistant rubber material is obtained.
Example 4
(1) Carrying out soap water ultrasonic cleaning and boiling water bath on acrylate rubber (ACM) to remove oil stains on the surface; fixing the rubber substrate in a sputtering chamber, and vacuumizing to 5.5 × 10-4Introducing argon after Pa, turning on a direct-current power supply, and carrying out plasma activation cleaning on the surface of the rubber substrate for 25min by using argon plasma;
(2) depositing a SiC transition layer by using a silicon target and a carbon target as target materials: the deposition bias is-50V, the vacuum degree in the deposition process is 0.25Pa, the target power is 2.5kW, and the deposition temperature is 24 ℃;
(3) and introducing argon, taking a carbon target and a silicon target as targets, and depositing a silicon-doped diamond-like carbon film on the SiC transition layer by adopting a magnetron sputtering method, wherein the power of the carbon target is 200W, the power of the silicon target is 100W, the deposition bias is-60V, the flow of the argon is 20sccm, the deposition pressure is 0.2Pa, and the deposition temperature is 30 ℃, so that the wear-resistant and corrosion-resistant rubber material is obtained.
Comparative example 1
Comparative example 1 differs from example 1 in that there is no SiC transition layer and the rest of the process is exactly the same.
The performance indexes of the rubber materials of examples 1 to 4 and comparative example 1 were measured, and the results are shown in table 1:
TABLE 1 test results
As can be seen from Table 1, the rubber material of the present invention effectively improves the wear resistance and corrosion resistance of the rubber substrate while ensuring the elastic properties of the rubber substrate. Comparative example 1 had no SiC transition layer, resulting in peeling off of the DLC film.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention in any way, and other variations and modifications may be made without departing from the spirit of the invention as set forth in the claims.
Claims (10)
1. The wear-resistant corrosion-resistant rubber material is characterized by sequentially comprising a rubber base material, a SiC transition layer and a diamond-like carbon film from bottom to top.
2. A wear and corrosion resistant rubber material according to claim 1, wherein said rubber substrate is selected from one of acrylate rubber, fluoro rubber and nitrile rubber.
3. A wear and corrosion resistant rubber material as claimed in claim 1, wherein the diamond-like thin film is selected from one of a silicon doped diamond-like thin film, a tungsten doped diamond-like thin film and a titanium doped diamond-like thin film.
4. A method for preparing a wear-resistant and corrosion-resistant rubber material according to any one of claims 1 to 3, comprising the steps of:
(1) decontaminating and plasma activating and cleaning the rubber base material;
(2) depositing a SiC transition layer on the rubber substrate treated in the step (1) by adopting a magnetron sputtering method;
(3) and depositing a diamond-like carbon film on the SiC transition layer by adopting a magnetron sputtering method in an argon atmosphere to obtain the wear-resistant and corrosion-resistant rubber material.
5. The production method according to claim 4, wherein in step (1): the plasma activating and cleaning process comprises the following steps: fixing the rubber substrate in a sputtering chamber, and vacuumizing to 4.0 × 10-4Pa～6.0×10-4And introducing argon after Pa, turning on a direct-current power supply, and activating and cleaning the surface of the rubber substrate for 20-30 min by using argon plasma.
6. The production method according to claim 4, wherein in the step (2): silicon targets and carbon targets are used as target materials, the deposition bias is-40 to-100V, the vacuum degree in the deposition process is 0.1 to 0.3Pa, the target material power is 1 to 3kW, and the deposition temperature is 20 to 30 ℃.
7. The production method according to claim 4, wherein in the step (3): introducing argon, taking a carbon target as a target material, setting the deposition bias voltage to be-20 to-140V, setting the vacuum degree to be 0.1 to 0.3Pa, setting the target material power to be 1 to 3kW and setting the deposition temperature to be 20 to 40 ℃.
8. The production method according to claim 4,
in the step (1), the rubber base material is acrylate rubber;
in the step (3), the diamond-like film is a silicon-doped diamond-like film, and the deposition process comprises the following steps: the power of the carbon target is 150-200W, the power of the silicon target is 80-100W, the deposition bias is-60-50V, the flow of argon is 20-30 sccm, the deposition pressure is 0.2-0.3 Pa, and the deposition temperature is 30-35 ℃.
9. The production method according to claim 4,
in the step (1), the rubber base material is fluororubber;
in the step (3), the diamond-like film is a tungsten doped diamond-like film, and the deposition process comprises the following steps: the carbon target power is 100-110W, the tungsten target power is 150-160W, the deposition bias is-80-70V, the argon flow is 30-35 sccm, the deposition pressure is 0.3-0.4 Pa, and the deposition temperature is 30-35 ℃.
10. The production method according to claim 4,
in the step (1), the rubber base material is nitrile rubber;
in the step (3), the diamond-like film is a titanium doped diamond-like film, and the deposition process comprises the following steps: the carbon target power is 45-50W, the titanium target power is 80-100W, the deposition bias is-60-50V, the argon flow is 30-40 sccm, the deposition pressure is 0.3-0.4 Pa, and the deposition temperature is 30-35 ℃.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
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| CN114000147B (en) * | 2021-11-03 | 2023-10-03 | 江苏徐工工程机械研究院有限公司 | Wear-resistant rubber material and preparation method thereof |
| CN114350003A (en) * | 2022-01-18 | 2022-04-15 | 库博标准投资有限公司 | Method for changing surface activity of rubber material |
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