CN112740001B - Capacitance detection device capable of calculating shearing force - Google Patents

Abstract

The subject of the invention is: the conventional capacitive detection device has a problem that it is difficult to measure a pressure distribution with high accuracy. Further, stress in the plane direction (X and Y directions) parallel to the plane, that is, shear force cannot be detected. The solution of the invention is as follows: the shear force applied from above the second electrode can be calculated by a capacitance detection device in which the first electrode is formed, the insulating layer is formed on the first electrode, and the second electrode is formed on the insulating layer. Further, by improving the material and structure of the insulating layer, or by improving the patterns of the first and second electrodes, or by passing the first electrode through an independent AC drive circuit, the shearing force can be measured with higher accuracy. Further, by providing a temperature sensor, correction based on temperature can be performed. Further, the frame portion is not present in any of two directions orthogonal to the periphery of the sensing portion of the electrode, and thus the electrode can be elongated.

Description

Capacitance detection device capable of calculating shearing force

Technical Field

The present invention relates to a capacitance detection device used in a device for measuring a ground contact state of a tire, a shoe sole, a track point (track point), or the like.

Background

Conventionally, as a method for measuring a ground contact state of a tire or the like, an invention disclosed in the following patent document 1 is known. The invention is the invention with the following structure: the tire pressure measuring device is composed of a base body having a surface for grounding a tire, a capacitance detecting device arranged on the surface of the base body and having a plurality of pressure measuring points, a protective sheet covering the surface of the capacitance detecting device, and the like, wherein the capacitance detecting device is filled with a resin having a reduced resistance according to a deformation amount when compressed between a first linear electrode and a second linear electrode.

Further, the electrical resistance of the resin decreases when the force pressing the outer surface of the sheet increases. Therefore, at the intersection point of the first and second linear electrodes in a plan view, the sheet is pressed, so that the resistance of the first and second linear electrodes is reduced. Therefore, by measuring the resistance, the force acting on the resin at the intersection point can be measured, and the ground contact surface shape and the ground contact pressure distribution of the tire can be obtained.

Documents of the prior art

Patent document

Patent document 1: japanese patent laid-open publication No. 2018-72041

Disclosure of Invention

Problems to be solved by the invention

However, only the component in the Z-axis direction (the direction perpendicular to the linear electrodes) can be detected from the force acting on the resin at the intersection, and the component in the XY-axis direction (the direction in which the tire moves is defined as the X-axis, and the direction perpendicular thereto is defined as the Y-axis) cannot be detected. That is, in the capacitance detection device having such a configuration, only the ground contact pressure distribution in the Z-axis direction can be obtained, and for example, the ground contact pressure distribution of the stress in the XY-axis direction (hereinafter, referred to as "shear force") applied from an oblique direction to the ground by the tire cannot be measured. Therefore, a true ground contact state between the tire and the ground contact surface cannot be measured, and there is a problem that the measurement device is insufficient as a test device for measuring the performance of the tire and the like.

The present invention has been made in view of the above circumstances, and relates to a capacitance detection device which can calculate not only stress of a component in a Z-axis direction but also a shear force applied obliquely from above a second electrode, and which is used in a device for measuring a true ground contact state of a tire, a shoe sole, a pointing stick, or the like, in which the second electrode or the like is deformed or moved laterally in accordance with the magnitude of the shear force, a change in capacitance value generated between the deformed or moved laterally second electrode and the first electrode is detected, and the magnitude of the original shear force is calculated in accordance with the magnitude of the change in capacitance value.

Means for solving the problems

That is, the first embodiment of the present invention is a capacitance detection device in which a first electrode is formed, an insulating layer is formed on the first electrode, and a second electrode is formed on the insulating layer, and the capacitance detection device can calculate a shear force applied from above the second electrode.

In addition, a second embodiment of the present invention is a capacitance detection device, wherein the insulating layer is formed of a plurality of layers having different physical properties or chemical properties. In addition, a third embodiment of the present invention is a capacitance detection device, wherein the insulating layer has a gradation. A fourth embodiment of the present invention is a capacitance detection device, wherein the insulating layer has a poisson's ratio of 0 to 0.48.

A fifth embodiment of the present invention is a capacitance detecting device, wherein the first electrode and the second electrode are formed of a line pattern, and the line pattern are patterns extending in the same direction in a plan view. A sixth aspect of the present invention is a capacitance detection device, wherein the first electrode is formed of an island-like pattern, the second electrode is formed of two layers of an upper second electrode and a lower second electrode, the upper second electrode and the lower second electrode are formed of a plurality of line-like patterns intersecting with each other in a plan view, and a part of the island-like pattern of the first electrode overlaps with a part of the pattern of the upper second electrode and a part of the pattern of the lower second electrode in the plan view. In addition, a seventh aspect of the present invention is a capacitance detecting device, wherein a region where a part of the island-like pattern of the first electrode and a part of the pattern of the upper second electrode overlap in a plan view is larger than a region where a part of the island-like pattern of the first electrode and a part of the pattern of the lower second electrode overlap in a plan view.

In addition, an eighth embodiment of the present invention is a capacitance detection device, wherein the first electrode is connected to a processing unit via an independent AC drive circuit, and the second electrode is connected to the processing unit via a signal conversion unit. A ninth aspect of the present invention is a capacitance detecting device, wherein a temperature sensor for measuring heat generated by a pressure body applied from the second electrode is provided in any one of the layers. A tenth aspect of the present invention is a capacitance detection device, wherein a frame portion is not present in any one of two directions orthogonal to the periphery of the sensor portion of the first electrode or the second electrode.

Effects of the invention

The capacitance detection device of the present invention is a capacitance detection device in which a first electrode is formed, an insulating layer is formed on the first electrode, and a second electrode is formed on the insulating layer, and is characterized in that a shear force applied from above the second electrode can be calculated. Therefore, not only the distribution of the ground contact pressure in the conventional Z-axis direction but also the distribution of the ground contact pressure of the shear force applied from an oblique direction can be measured, and therefore, the following effects are obtained: the true ground contact state between a ground contact object such as a tire or a shoe sole and a ground contact surface can be measured, and the true performance of the ground contact object can be measured.

In the capacitance detection device according to the present invention, the insulating layer is formed of a plurality of layers having different physical properties or chemical properties. In the capacitance detection device according to the present invention, the insulating layer has a layer. Therefore, the measured value of the shear force can be accurately measured, and the durability of the insulating layer can be improved. In the capacitance detection device according to the present invention, the insulating layer has a poisson's ratio of 0 to 0.48. Therefore, the following effects are provided: noise at the edge of the stress contact point due to deflection of the shearing force can be reduced, detection of the pressure in the Z-axis direction and detection of the shearing force in the XY-axis direction can be easily distinguished, and accuracy of detection data can be improved.

In the capacitance detection device according to the present invention, the first electrode and the second electrode are formed of a line pattern, and the line pattern are patterns extending in the same direction in a plan view. Therefore, when a shearing force is applied in a direction of an angle intersecting one direction in which the line pattern of the second electrode extends, the second electrode deforms according to the magnitude of the shearing force, and the distance from the first electrode changes. Since the capacitance between the second electrode and the first electrode changes with a change in the distance from the first electrode, the magnitude of the shear force can be detected by detecting the electric signal.

In the capacitance detection device according to the present invention, the first electrode is formed of an island-like pattern, the second electrode is formed of two layers of an upper second electrode and a lower second electrode, the upper second electrode and the lower second electrode are formed of a plurality of line-like patterns intersecting with each other in a plan view, and a part of the island-like pattern of the first electrode overlaps with a part of the pattern of the upper second electrode and a part of the pattern of the lower second electrode in the plan view. Therefore, when a shearing force is applied in a direction of an angle intersecting with a direction of either the upper second electrode or the lower second electrode of the second electrodes, the upper second electrode or the lower second electrode of the second electrodes deforms or moves according to the magnitude of the shearing force, and the distance from the first electrode changes. Since the capacitance value between the upper second electrode or the lower second electrode of the second electrode and the first electrode changes as the distance from the first electrode changes, the magnitude of the shear force in each direction (the magnitude of the component force in the X-axis direction and the magnitude of the component force in the Y-axis direction of the shear force) can be detected by detecting the electric signal.

In the capacitance detection device according to the present invention, a region in which a part of the island-like pattern of the first electrode and a part of the pattern of the upper second electrode overlap each other in a plan view is larger than a region in which a part of the island-like pattern of the first electrode and a part of the pattern of the lower second electrode overlap each other in a plan view. Therefore, although the detection sensitivity of the capacitance value between the first electrode formed of the island-like pattern is generally lower in the upper second electrode than in the lower second electrode, the detection sensitivity can be corrected to be substantially the same. As a result, the shear force applied to the upper portion of the second electrode can be measured without variation in the X direction and the Y direction.

In the capacitance detection device according to the present invention, the first electrode is connected to a processing unit via an independent AC drive circuit, and the second electrode is connected to the processing unit via a signal conversion unit. Therefore, since each first electrode of the complicated and fine pattern is electrically connected to the processing unit via an independent AC drive circuit of the same complicated and fine pattern, capacitance values can be detected for each extremely fine range, and measurement with extremely high accuracy can be performed.

In the capacitance detection device according to the present invention, a temperature sensor for measuring heat generated by the shear force is provided in any one of the layers. Therefore, the following effects are provided: the temperature sensor can correct an error in the measured distribution of the shearing force due to the temperature dependency, and calculate the true distribution of the shearing force. Further, since the amount of energy loss due to heat can be estimated, the state of the ground plane with a small amount of loss can be measured, and development of a product with high energy efficiency can be promoted.

In the capacitance detection device according to the present invention, the frame portion is not present in any of two directions orthogonal to the periphery of the sensor portion of the first electrode or the second electrode. Therefore, when a plurality of capacitance detection devices are arranged and joined to form a long shape, there is an effect that the measurement range of the shear force in the long direction can be extended indefinitely.

In the capacitance detection device according to the present invention, the substrate on which the first electrode or the second electrode is formed, the insulating layer, or the protective layer for protecting the substrate or the insulating layer are detachable. Therefore, even when the protective layer or the like on the surface is worn, the measurement can be continued only by replacing the protective layer. Even when the electrode is broken and becomes unusable, the measurement can be continued only by replacing the substrate on which the electrode is formed. Therefore, a new other capacitance detection device does not need to be purchased, and the effect of greatly reducing the cost is achieved. Further, since the period in which one capacitance detection device can be continuously used is long, there is an effect that an error in the measurement value due to variation between products of the capacitance detection device is small, and as a result, the accuracy of the measurement value itself is improved.

Drawings

FIG. 1 is a sectional view of the entire capacitance detection device according to one embodiment of the present invention.

FIG. 2 is a cross-sectional view showing an embodiment of the present invention in which a shearing force is applied obliquely from above to a main detection unit of a capacitance detection device, and a part of the main detection unit of the capacitance detection device is deformed.

Fig. 3 is a cross-sectional view showing an embodiment of the capacitance detection device according to the embodiment of the present invention when two insulating layers are formed in a stacked manner on an insulating layer.

Fig. 4 is a cross-sectional view showing an embodiment in which an insulating layer is formed of a plurality of foam layers and a layer is provided on the insulating layer in the capacitance detection device according to the embodiment of the present invention.

Fig. 5 is a cross-sectional view showing an embodiment in which a layer is provided on an insulating layer of a capacitance detection device according to an embodiment of the present invention by forming spot-faced unevenness on the insulating layer.

Fig. 6 is a schematic view showing an embodiment in which the patterns of the first electrode and the second electrode of the capacitance detection device according to the embodiment of the present invention are linear patterns extending in the same direction in a plan view.

Fig. 7 is a detailed view showing one embodiment in the case where the patterns of the first electrode and the second electrode are line patterns extending in the same direction in a plan view among the first electrode and the second electrode of the capacitance detection device according to the embodiment of the present invention, and is a detailed view showing a case where the first electrode is 3 line patterns and the second electrode is 2 line patterns.

Fig. 8 is a schematic plan view showing a specific example of line patterns of the first electrode and the second electrode in the capacitance detection device according to the embodiment of the present invention, (a) is a schematic plan view showing a case where the first electrode and the second electrode are line patterns having different widths and lengths, (b) is a schematic plan view showing a case where the first electrode and the second electrode are partially widened and narrowed, (c) is a schematic plan view showing a case where the first electrode and the second electrode are polygonal or arc-shaped, and (d) is a schematic plan view showing a case where the first electrode and the second electrode are combined into a shape or a wave shape.

Fig. 9-1 is a cross-sectional view showing a capacitance detection device in a case where a first electrode and a second electrode of the capacitance detection device according to an embodiment of the present invention are each composed of two layers.

Fig. 9-2 is a plan view showing a pattern of each layer of the second electrode, and (b) is a plan view showing a pattern of each layer of the first electrode, in a case where the first electrode and the second electrode of the capacitance detection device according to the embodiment of the present invention are each composed of two layers.

Fig. 10 is a schematic diagram showing an example in which a plurality of capacitance detection devices according to an embodiment of the present invention are arranged in a vertical-horizontal matrix to form a capacitance detection device group.

Fig. 11 is a schematic diagram showing an example in which a plurality of capacitance detection devices according to an embodiment of the present invention, each having a plurality of second electrodes and a plurality of first electrodes formed thereon, are arranged in a matrix shape in the vertical and horizontal directions to form a capacitance detection device group.

Fig. 12-1 is a cross-sectional view showing a capacitance detection device according to an embodiment of the present invention, in which a first electrode is formed of a rectangular island-like pattern, a second electrode is formed of two layers of an upper second electrode and a lower second electrode, and the two layers are formed of a plurality of crossing line-like patterns.

Fig. 12-2 is a plan view showing patterns of upper and lower second electrodes of the second electrode, when the first electrode is formed of a rectangular island-like pattern, the second electrode is formed of two layers of the upper and lower second electrodes, and the two layers are formed of a plurality of crossing line-like patterns in the capacitance detection device according to the embodiment of the present invention.

Fig. 12 to 3 are plan views showing patterns and positional relationships of upper second electrodes and lower second electrodes of the first electrodes and the second electrodes, when the first electrodes of the capacitance detection device according to the embodiment of the present invention are formed of rectangular island-like patterns, and the second electrodes are formed of two layers of the upper second electrodes and the lower second electrodes, which are formed of a plurality of crossing line-like patterns.

Fig. 12 to 4 are plan views showing regions where the patterns of the upper second electrode and the lower second electrode of the first electrode and the second electrode overlap when the first electrode of the capacitance detection device according to the embodiment of the present invention is formed of a rectangular island-like pattern, the second electrode is formed of two layers of the upper second electrode and the lower second electrode, and the two layers are formed of a plurality of intersecting line-like patterns.

Fig. 12 to 5 are plan views showing a state in which, when the first electrode of the capacitance detection device according to the embodiment of the present invention is formed of a rectangular island-like pattern, the second electrode is formed of two layers of an upper second electrode and a lower second electrode, and these are formed of a plurality of intersecting line-like patterns, the overlapping area of the patterns of the upper second electrodes of the first electrode and the second electrode changes when a shear force is applied thereto.

Fig. 12 to 6 are plan views showing a state in which, when the first electrode of the capacitance detection device according to the embodiment of the present invention is formed of a rectangular island-like pattern and the second electrode is formed of two layers of an upper second electrode and a lower second electrode and formed of a plurality of line-like patterns intersecting with each other, the overlapping area of the patterns of the first electrode and the lower second electrode of the second electrode changes when a shear force is applied.

Fig. 13 is a plan view showing a case where the first electrode of the capacitance detection device according to the embodiment of the present invention is formed of an island-like pattern having a parallelogram shape, the second electrode is formed of two layers of an upper second electrode and a lower second electrode, and the two layers are formed of a plurality of intersecting line-like patterns.

Fig. 14 is a plan view showing a case where the first electrode of the capacitance detection device according to the embodiment of the present invention is formed of an island-like pattern having a shape in which four corners of a rectangle are rounded and four vertices are not formed, and the second electrode is formed of two layers of an upper second electrode and a lower second electrode, which are formed of a plurality of intersecting line-like patterns.

Fig. 15-1 is a plan view showing a case where the first electrode of the capacitance detection device according to the embodiment of the present invention is formed of an island-like pattern having a vertically long elliptical shape, and the second electrode is formed of two layers of an upper second electrode and a lower second electrode, which are formed of a plurality of intersecting line-like patterns.

Fig. 15-2 is a plan view showing a state in which the first electrode of the capacitance detection device according to the embodiment of the present invention is formed of an island-like pattern having a vertically long elliptical shape, and an overlapping region of the first electrode and the upper second electrode pattern of the second electrode is changed by a shear force.

Fig. 16 is a schematic diagram showing a schematic diagram of the electrodes of the first electrode, the independent AC drive circuits, and the connection wiring of the drive circuit in the case where the first electrode is connected to the processing unit via the independent AC drive circuit and the second electrode is connected to the processing unit via the signal conversion unit in the capacitance detection device according to the embodiment of the present invention.

Fig. 17 is a schematic diagram showing a configuration when the first electrode is connected to the processing unit via the independent AC driving circuit and the second electrode is connected to the processing unit via the signal conversion unit, and a schematic diagram showing an example of signals in operation when the independent AC driving circuit is formed by a logic circuit, in the first electrode and the second electrode of the capacitance detection device according to the embodiment of the present invention.

Fig. 18 is a schematic diagram showing an example of signals of 9 signal lines in a case where, of the first electrode and the second electrode of the capacitance detection device according to the embodiment of the present invention, the first electrode is connected to the processing unit via an independent AC drive circuit, and the second electrode is connected to the processing unit via the signal conversion unit, and AC signals are independently output to 3 of the first electrodes.

Fig. 19 is a schematic diagram showing an example in which a temperature sensor is provided in a capacitance detection device according to an embodiment of the present invention.

Fig. 20 is a schematic diagram showing an example in which temperature detection electrodes are provided in the vicinity of a first electrode and a second electrode in a capacitance detection device according to an embodiment of the present invention.

Fig. 21 is a schematic plan view showing an example in which, in the capacitance detection device according to the embodiment of the present invention, the positions of the first electrode and the second electrode and the position of the routing wire are slightly shifted and patterned in parallel, and thus a frame portion does not exist in any of two directions orthogonal to the peripheries of the sensor portions of the first electrode and the second electrode.

Fig. 22 is a schematic plan view showing an example in which, when a plurality of capacitance detection devices according to an embodiment of the present invention are arranged in a row and joined, a convex portion and a concave portion are provided in a part of the capacitance detection devices so as to avoid displacement due to movement of the capacitance detection devices, and the convex portion and the concave portion are in a relationship between a key and a keyhole.

FIG. 23 is a schematic cross-sectional view showing an example in which a part of a protective layer is to be removed in a capacitance detecting device according to an embodiment of the present invention.

Detailed Description

Hereinafter, one embodiment of the present invention will be described with reference to the drawings. The capacitance detection device 1 of the present invention is a capacitance detection device as follows: the shear force 60 applied obliquely from above the second electrode 40 can be calculated by forming the first electrode 20 on the substrate 10, forming the insulating layer 30 on the first electrode 20, and forming the second electrode 40 on the insulating layer 30. Further, the capacitance detection device 1 may be configured such that the protective layer 50 is formed on the second electrode 40 and the shearing force 60 is applied from the protective layer 50. The first electrode 20 and the second electrode 40 of the capacitance detection device 1 are electrically connected to the processing unit 120 via different electric wirings, and a change in capacitance value occurring between the first electrode 20 and the second electrode 40 can be detected by the processing unit 120 (see fig. 1).

When a shearing force 60 is applied obliquely from above the second electrode 40 or the protective layer 50 of the capacitance detection device 1, the second electrode 40 or the like, which is a main detection portion of the capacitance detection device 1, deforms or moves according to the strength of the shearing force 60, and the capacitance value generated between the first electrode 20 and the second electrode 40 changes. This is a structure capable of calculating the strength of the shear force 60 applied from the change in the capacitance value. For example, in the case where the first electrode 20 includes the electrodes 25 and 26 formed of a plurality of line patterns, and the second electrode 40 includes the electrodes 41 and 42 formed of a plurality of line patterns, when the shearing force 60 is applied from the direction obliquely above the second electrode 40, one electrode 41 of the second electrode 40 is deformed or moved by the applied shearing force 60, and the distance between the electrode 21 and the adjacent electrode 22 changes in addition to the one electrode 21 of the first electrode 20 located just obliquely below the one electrode, depending on the strength of the shearing force 60. Therefore, by measuring the change in the capacitance between the electrode 41 and the electrode 21 and the change in the capacitance between the electrode 41 and the electrode 22, the strength of the shear force 60 in the oblique direction can be measured (see fig. 2).

Next, the insulating layer 30 will be explained. The insulating layer 30 is preferably composed of multiple layers having different physical or chemical properties. The physical properties include properties inherent to a material such as density, hardness, specific gravity, melting point, boiling point, specific heat capacity, dielectric constant, magnetic permeability, magnetic susceptibility, electric conductivity, refractive index, odor, color, and the like, and properties inherent to an external load such as elastic modulus, shear strength, tensile failure nominal strain, tensile strength, impact resistance, abrasion resistance, compression ratio, compression strength, bending strength, yield stress, tensile strength, and the like. Chemical properties are properties of a new substance that reacts with another substance in the presence of the substance and is to be converted into different properties.

Taking the elastic modulus as an example, if the insulating layer 30 is configured by laminating two layers of the insulating layer 32 having a low elastic modulus on the insulating layer 31 having a high elastic modulus (see fig. 3), the following effects are obtained: the insulating layer 32 having a low elastic modulus deforms with good sensitivity in accordance with the deflection of the applied shear force, and the insulating layer 31 having a high elastic modulus suppresses excessive deformation and protects the first electrode 20 therebelow from damage and deterioration. In addition, since the offset which causes the error in the measurement value of the shear force 60 in the oblique direction is reduced, the measurement value of the shear force 60 can be accurately measured. Further, if the measurement accuracy is improved, the sampling rate is increased as a result.

The elastic modulus in the present invention means: the insulating layer 31 and the insulating layer 32 were cut into a dumbbell No. 1 test piece shape, and the tensile stress applied to the insulating layer 31 and the insulating layer 32 was divided by the strain generated in the insulating layer 31 and the insulating layer 32 by the method of the tensile test according to JISK7127 and JISK7161 using a non-contact type elongation width meter capable of measuring a minute displacement. The insulating layer 30 formed of a plurality of layers may be formed of not only two layers as described above, but also three or more layers. The elastic modulus of each layer of the insulating layer 30 is relatively low, and only the elastic modulus of the insulating layer 32 is lower than that of the insulating layer 31, and the absolute value of the elastic modulus of each layer is not high or low.

That is, when the insulating layer is formed by laminating two layers, the elastic modulus of the insulating layer 31 may be 2GPa and the elastic modulus of the insulating layer 32 may be 1GPa, for example. The elastic modulus of the insulating layer 31 may be 0.3GPa and the elastic modulus of the insulating layer 32 may be 0.01GPa. The ratio of the elastic modulus of the insulating layer 31 to the elastic modulus of the insulating layer 32 may be set in the range of 1.1 to 200. If the ratio of the elastic modulus of the insulating layer 31 to the elastic modulus of the insulating layer 32 is less than 1.1, the deformation caused by the shear force 60 passes through the insulating layer 30 and reaches the first electrode 20, and the first electrode 20 is easily deteriorated or broken. On the other hand, if it exceeds 200, the following problems occur: the deformation caused by the shear force 60 is absorbed only by the insulating layer 32, and the mechanical strength is reduced due to the accumulated load, and the durability of the insulating layer 32 is reduced.

In the case where the insulating layer has three or more layers, the ratio of the elastic modulus of the insulating layer 31 in contact with the first electrode 20 and the insulating layer 32 in contact with the second electrode 40 may be set to a range of 2 to 2000, as in the case of the two layers, and the elastic modulus of the insulating layer formed between the insulating layer 31 and the insulating layer 32 may be set to an intermediate value between the elastic modulus of the insulating layer 31 and the elastic modulus of the insulating layer 32. Even if the insulating layer 31 and the insulating layer 32 are made of the same material and have the same thickness, the insulating layer 32 can have a lower elastic modulus than the insulating layer 31 by forming spot-faced irregularities on the surface of the insulating layer 30 as described later.

In addition, the insulating layer 30 may have a gradation. For example, if the insulating layer 30 is formed in a layered structure having numerical values of physical properties or chemical properties such as elastic modulus, material density, hardness, and shear strength, the internal stress strain generated in the insulating layer can be appropriately reduced, and therefore, the load of the shear force applied to the insulating layer can be reduced, and the durability of the insulating layer and other layers can be improved. In addition, since the internal stress strain that becomes noise is reduced, the detection sensitivity is also improved, and as a result, the shearing force can be measured more accurately. This effect is applicable not only to the conventional ground pressure distribution in the Z-axis direction but also to the ground pressure distribution of the shear force, and as a result, the effect of distinguishing between the pressure detection and the shear force detection is also obtained. The insulating layer 30 has a gradation means that the insulating layer 30 is not a uniform one-layer film, and may be a film having a structure in which physical properties or chemical properties change stepwise in a certain direction (particularly, the Z-axis direction), and the number of steps and the degree of gradation of the gradation are not particularly limited.

As a method of providing a gradation to the insulating layer 30 with the material density, there is a method of constituting the insulating layer 30 with a plurality of foam layers and changing the foam density and the foam size 300 in stages. That is, the insulating layer 30 is formed into a three-layer structure of, for example, foam layers, and a foaming agent is mixed with the main material of the insulating layer 30 at a different ratio for each layer, or foaming agents having different foaming sizes are mixed with each layer of the insulating layer 30, dispersed, and subjected to heat molding, thereby obtaining the insulating layer 30 composed of three-layer foams each including a different foam concentration or cell size 300 (see fig. 4).

In this case, the elastic modulus of each layer in the insulating layer 30 is different, and the effect of protecting the first electrode 20 from damage and deterioration and the effect of accurately measuring the measured value of the shear force can be obtained, while the main materials of each layer in the insulating layer 30 are completely the same, and therefore, the effects of high interlayer adhesion in the insulating layer 30 and improvement in durability of the insulating layer 30 can be obtained. As another method of providing a layer to the insulating layer 30, there is a method of forming the spot-faced unevenness 70 in the insulating layer 30 to control the density, hardness, elastic modulus, and shear strength of the material of the insulating layer (see fig. 5). When the insulating layer 30 is formed of a foam or the dimple 70 is formed in advance, the following effects are obtained: even if the second electrode 40 and the protective layer 50 are excessively swelled by the reaction of the applied shear force 60, bubbles in the insulating layer 30 and the spot-facing concavities and convexities 70 absorb the swelling and reduce the swelling.

The insulating layer 30 is preferably configured to have a poisson's ratio in the range of 0 to 0.48. The poisson's ratio in the present invention means: the insulation layer 30 was cut into a dumbbell No. 1 test piece shape, and the longitudinal strain (amount of change in the axial direction/original length in the axial direction) and the transverse strain (amount of change in the width direction/original length in the width direction) were measured by the tensile test method according to JISK7127 and JISK7161 using a non-contact type elongation width meter capable of measuring a minute displacement, and the value obtained by dividing the value of the transverse strain by the value of the longitudinal strain.

In the case where a tensile test alone of the insulating layer 30 cannot be performed, such as when the insulating layer 30 is a very thin film or when the insulating layer 30 is integrated with the substrate 10 and the second electrode 40 and cannot be completely separated, the value measured in the same manner as described above is set as the value of the poisson's ratio of the present invention, on the condition that the insulating layer 30 occupies 90% or more of the volume of the entire laminate of the insulating layer 30 and the substrate 10 and the second electrode 40 in a state where they are placed.

If the poisson's ratio is less than 0, even a portion that is not pressed when the insulating layer 30 is pressed through the protective layer 50 is depressed, and thus a significant detection error is likely to occur. On the other hand, if the poisson's ratio exceeds 0.48, the portion not pressed bulges, and a significant detection error is likely to occur. Examples of the method for reducing the poisson's ratio include the following methods: the insulation layer 30 is formed with spot-faced irregularities 70 on the surface thereof, and the projection of the protective layer 50 during pressing enters the recess of the insulation layer 30, so that the insulation layer 30 does not excessively project (see fig. 5). The shape of the spot-facing concavities and convexities can be appropriately selected depending on the material and thickness of the insulating layer 30.

Examples of the material of the insulating layer 30 include elastic synthetic resin sheets such as silicone, fluorine, urethane, epoxy, ethylene-vinyl acetate copolymer, polyethylene, polypropylene, polystyrene, and butadiene rubber, and elastic nonwoven fabric sheets. In particular, silicone resin elastomer sheets such as silicone rubber and silicone elastomer are more preferable because they are excellent in durability and elasticity in a wide temperature range from low temperature to high temperature. The insulating layer 30 is not limited to being formed into a sheet by a general sheet molding method such as extrusion molding, and may be a coating layer formed by printing, a coater, or the like. The thickness may be appropriately selected within the range of 20 μm to 5 mm.

Silica gel is a material that becomes gel-like after curing, and has properties peculiar to silicone such as durability and high safety and hygiene, and properties resulting from low crosslinking density (density of a mesh structure formed by chemically bonding chain polymers to each other) such as flexibility, impact absorbability, and moisture resistance. There are mainly room temperature curing type and heat curing type, and the curing speed differs depending on the type of curing agent, increase and decrease of the amount added, temperature adjustment, and the like. A silicone hydrogel obtained by blending silicone with a hydrophilic gel such as polyvinylpyrrolidone or a polyvinyl chloride-based thermoplastic elastomer is also one of the silica gels of the present invention. Examples of a method for producing the insulating layer 30 from a silicone gel include: a method in which a catalyst having a curing acceleration action and a silicone rubber material are added to a silicone rubber material to prepare a compounding raw material, and sheeting is performed by using various coaters such as a lip coater, a comma coater, a reverse coater, and a blade coater; a method of integrally molding a silicone rubber sheet by applying a silicone material to the silicone rubber sheet by the above-mentioned various coating machines.

Silicone elastomers include thermosetting silicone elastomers obtained by crosslinking a linear silicone rubber compound or liquid silicone rubber with a vulcanizing agent or a catalyst, and thermoplastic silicone-modified elastomers obtained by blending silicone oil with another elastomer such as urethane or by copolymerization with reactive silicone oil. As a method for producing the insulating layer 30 from the silicone elastomer, there is a roll molding in which a reinforcing agent and a vulcanizing agent are added to the silicone raw material, the mixture is stirred and mixed, and a sheet is formed by a roll mill having a predetermined thickness. Further, there may be mentioned: pressure molding in which the resin composition is injected into a predetermined mold and vulcanized by applying heat and pressure, extrusion molding in which the resin composition is formed into a sheet by an extruder, calender molding in which the resin composition is formed into a wide long sheet by using a calender roll, coating molding in which the resin composition is coated on a base material such as glass cloth by using a coating apparatus, injection molding, winding molding, and the like. In addition to the catalyst, a stabilizer may be added to these silicone-based elastomer sheets. Examples of the catalyst include nitrogen-containing compounds such as triethylamine and triethylenediamine, metal salts such as potassium acetate, zinc stearate and tin octylate, and organic metal compounds such as dibutyltin dilaurate. Examples of the stabilizer include stabilizers against ultraviolet rays such as substituted benzotriazoles, stabilizers against thermal oxidation such as phenol derivatives, and the like.

In addition, as an example of the insulating layer 30 made of a foam, there is an insulating layer molded into a foamed or porous shape by finely dispersing a gas in the synthetic resin of the insulating layer 30. In particular, polyethylene, polypropylene, polystyrene, and the like are preferably preliminarily foamed when these synthetic resins are selected as the material of the insulating layer 30, because they are weak in elasticity when they are merely sheets themselves and give rise to elasticity when they are foamed. The method for producing the foam includes: the thermoplastic resin is dispersed with a thermally decomposable blowing agent such as azodicarbonamide and bicarbonate, and a thermally expandable microcapsule blowing agent obtained by freon, hydrocarbon, or the like, encapsulated with a thermoplastic resin, and the resulting mixture is subjected to molding methods such as bead foaming, batch foaming, pressure foaming, secondary foaming under normal pressure, injection foaming, extrusion foaming, and expansion blow molding by applying heat.

The foam preferably has a cell size of 300. Mu.m to 100. Mu.m. As a method for producing a foam having such a cell size, it is preferable to control the atmospheric pressure (external air pressure) to be reduced or increased to a certain pressure in the vulcanization foaming reaction process. This is because, by controlling the amount within this range, the growth of cells during vulcanization foaming can be promoted or inhibited, and a foam having a certain desired expansion ratio and a certain cell size can be obtained. Further, the range of the expansion ratio can be greatly expanded, and a product having a desired expansion ratio can be obtained. Among the foams, silicone foams made of silicone resins are preferred. The measurement device has the advantages of being capable of being applied to measurement at low temperature with little elastic change caused by temperature, and having high durability, so that even if the measurement device is repeatedly subjected to strain and stress caused by large displacement, the measurement device can be prevented from being broken and deformed. As a result, the present invention can be used in devices for measuring a ground contact state in various fields, such as when measuring an object having a large load such as a tire, or when measuring an object having a small load such as a shoe sole.

The silicone foam is a foam obtained by independently foaming or semi-independently foaming silicone rubber, and includes, in addition to a type in which a foaming agent is added to silicone rubber and heated to foam as described above, a self-foaming reaction type composed of a two-component liquid silicone, and the like. Examples of the method for producing the insulating layer 30 by using the self-foaming reaction type silicone foam include: a calendering method in which a liquid silicone rubber material is sandwiched between two carrier sheets and passed between calendering rolls to form a sheet, and vulcanization foaming is performed; a free foaming method in which a liquid silicone rubber raw material is charged onto a sheet in an unrestricted manner and vulcanization foaming is performed; injection molding in which a silicone liquid material is injected into a mold and vulcanization and foaming are performed.

In addition, the insulating layer 30 may be formed of an electrically viscous fluid. The viscous fluid is a fluid whose viscoelastic properties are reversibly changed by application or removal of an electric field, and examples thereof include a uniform viscous fluid composed of a single substance such as a liquid crystal, and a dispersion-type viscous fluid in which particles are dispersed in an insulating liquid or the like. In particular, in the case of a dispersion-type electrically viscous fluid, a solid-liquid phase change can be performed depending on the presence or absence of an electric field, and therefore, this is more preferable. Examples of the particles used in the dispersion-type electrically viscous fluid include porous fine particles made of carbonaceous or insulating materials. The average particle diameter of the fine particles is preferably 5 to 30 μm. Examples of the insulating liquid used for the dispersion type electrically viscous fluid include silicone oil and the like. Alternatively, the crosslinking agent, the platinum catalyst, or the like may be added to the insulating liquid and heat-treated to gel the viscous fluid. The gelled sheet of the electrically viscous fluid is immersed in the gel particles by applying an electric field, and the surface state changes. That is, the gel rises due to the electric power at the interface, and the surface is only in a smooth and flush state with the gel, and comes into contact with the entire surface of the other layer to exhibit adsorption. In such a state, the shear stress is easily transmitted to the insulating layer 30, and the detection sensitivity is improved. The method for producing the dispersion type electrically viscous fluid includes the following methods: the dried porous particles are added to the electrically insulating liquid while stirring while maintaining the state of being at least the decomposition temperature of the electrically insulating liquid, whereby the electrically insulating liquid present in the vicinity of the porous particles is decomposed to generate a low-molecular-weight organic compound, and the organic compound is uniformly adsorbed on the surfaces of the porous particles.

In the insulating layer 30, conductive particles 80 (see fig. 5) such as carbon black, gold, silver, and nickel may be added in a proportion within a range in which the insulating property can be maintained. This is because when the insulating layer 30 is pressed, the distance between the conductive particles included in the insulating layer approaches, and the capacitance value between the first electrode 20 and the second electrode 40 rapidly increases, which has the effect of improving the sensitivity to the pressure and the shear force by the method of calculating the shear force 60 described later. The average particle diameter of the conductive particles 80 is preferably not more than 1/10 of the thickness of the insulating layer 30.

Next, the first electrode 20 and the second electrode 40 will be described. The material of the first electrode 20 and the second electrode 40 is not particularly limited, and may be a metal film of gold, silver, copper, platinum, palladium, aluminum, rhodium, or the like, a conductive paste film in which these metal particles are dispersed in a resin binder, or an organic semiconductor such as polyhexylthiophene, polydioctylfluorene, pentacene, tetraphenylporphyrin, or the like. The formation method includes a method of forming a conductive film over the entire surface by a plating method, a sputtering method, a vacuum evaporation method, an ion plating method, or the like, and then patterning the conductive film by etching, and in the latter case, a method of directly forming a pattern by a printing method such as a screen printing method, a gravure printing method, an offset printing method, or the like.

The first electrode 20 is preferably formed on the substrate 10 (see fig. 1 to 5) below the insulating layer 30. Examples of the substrate 10 include a glass epoxy substrate, a polyimide substrate, and a polybutylene terephthalate resin substrate, but are not particularly limited thereto. The thickness may be appropriately selected from 0.1mm to 3 mm. The second electrode 40 is formed mainly on the insulating layer 30, and may be formed of only one layer, or may be formed of two or more layers 401 and 402 (see fig. 1). The pattern of the second electrode 40 may have any shape such as a circle, a square, or a line. The thickness of the second electrode 40 may be appropriately selected in the range of 0.1 μm to 100 μm.

As the pattern of the first electrode 20 and the second electrode 40, a pattern which is formed of a line pattern and extends in the same direction in a plan view can be cited (see fig. 6). By forming the second electrode 40 and the first electrode 20 with the line pattern extending in the same direction, when the shearing force 60 is applied in the direction of the angle intersecting the one direction in which the line pattern of the second electrode extends, the second electrode 40 deforms in accordance with the magnitude of the shearing force 60, and the distance from the first electrode 20 changes, so that the electric signal at the time of the change in the capacitance value between the second electrode 40 and the first electrode 20 can be detected, and the magnitude of the force can be measured.

For example, the first electrode 20 is formed of line patterns 25, 26, and 27 extending in one direction, and the second electrode 40 is also formed in the position of the gap between the pattern 25 and the pattern 26 and the gap between the pattern 26 and the pattern 27, as line patterns 45 and 46 extending in the same direction as the first electrode 20 (see fig. 6). When a shear force 60 is applied along the surface of the protective layer 50 on the uppermost surface of the capacitance detection device 1 from a direction at an angle intersecting one direction in which the line patterns 45 and 46 of the second electrode 40 extend, the line patterns 45 and 46 of the second electrode 40 are deformed (moved in parallel) in the direction in which the shear force 60 is applied in the right direction of the paper surface together with the protective layer 50 and the insulating layer 30 according to the magnitude of the shear force 60, and the distance from the line pattern 26 of the first electrode 20 is shorter for the line pattern 45 and longer for the line pattern 46. The line pattern 25 and the line pattern 45 of the first electrode 20 are farther away from each other, and the line pattern 27 and the line pattern 46 of the first electrode 20 are closer to each other (see fig. 7). The distance between the layers of these line patterns varies in proportion to the magnitude of the shear force 60. Therefore, by detecting a change in capacitance between the line patterns, which is caused by a change in the distance between the line patterns, the magnitude of the shear force 60 can be detected.

In this example, the first electrodes 20 are in the form of 3 line patterns, and the second electrodes 40 are in the form of 2 line patterns, but the number of the first electrodes may be 1, or 4 or more. The number of the line patterns of the first electrode 20 and the second electrode 40 may be the same. In this example, the line patterns of the first electrode 20 and the second electrode 40 are both long rectangles having substantially the same shape, but the widths and the lengths may be different from each other (see fig. 8 a), or the widths may be locally increased or locally decreased (see fig. 8 b). Further, the shape may be not only a rectangular shape but also a polygonal shape or a curved shape such as an arc shape (see fig. 8 c). Further, a composite shape or a wavy shape may be used (see fig. 8 d). The shapes of the square and the circle are not generally included in the scope of the line pattern, but in the present invention, the shape is regarded as one type of line pattern as long as the function and the function of the present invention are exhibited, and the scope of the present invention is included.

The first electrode 20 and the second electrode 40 may be formed in a plurality of layers. For example, the first electrode 20 may be two layers of the lower first electrode 21 and the upper first electrode 22 with an insulating film interposed therebetween, and the second electrode 40 may be two layers of the lower second electrode 41 and the upper second electrode 42 with an insulating film interposed therebetween (see fig. 9-1). In this case, it is preferable that the first electrodes 20 are lower first electrodes 21 having a line pattern extending in the X direction and upper first electrodes 22 having a line pattern extending in the Y direction (see fig. 9-2 (a)), and the second electrodes 40 are lower second electrodes 41 having a line pattern extending in the X direction similarly to the lower first electrodes 21 and upper second electrodes 42 having a line pattern extending in the Y direction similarly to the upper first electrodes 22 (see fig. 9-2 (b)).

In fig. 9-1, the example in which the two-layered second electrode 40 is formed on the two-layered first electrode 20 is described, but the layers of the first electrode and the second electrode may be alternately formed. That is, the lower second electrode 41 may be formed on the lower first electrode 21, the upper first electrode 22 may be formed thereon, and the upper second electrode 42 may be formed thereon. In either case, since the lower first electrode 21 can be covered and hidden by the lower second electrode 41 having a large cross-sectional area and the upper first electrode 22 can be covered and hidden by the upper second electrode 42 having a large cross-sectional area, there is an advantage that the circuit patterns of the inner lower first electrode 21 and the inner upper first electrode 22 can be made invisible from the external appearance. If the shielding cover is not necessary to be hidden, the cross-sectional area of each electrode may be made the same, or conversely, the cross-sectional area of the two inner electrodes may be increased.

Thus, a change in capacitance between the lower first electrode 21 and the lower second electrode 41 and a change in capacitance between the upper first electrode 22 and the upper second electrode 42 can be detected, respectively. Alternatively, a change in capacitance between the lower first electrode 21 and the upper second electrode 42 and a change in capacitance between the upper first electrode 22 and the lower second electrode 41 can be detected, respectively. As a result, the following advantages are obtained: even when the direction in which the shear force 60 is applied is oblique in a plan view, and the X-direction component force 65 and the Y-direction component force 66 are present in the shear force 60 (when the direction of the shear force 60 is not parallel to or perpendicular to the direction of the linear pattern of either the upper first electrode 41 or the upper second electrode 42), the X-direction and Y- direction component force 65, 66 of the shear force 60 can be measured separately. Although fig. 9-2 shows an example of a line pattern in which each electrode has the same direction as either the X direction or the Y direction, the present invention is not limited to a line pattern in the same direction as either the X direction or the Y direction, since the advantage can be enjoyed even if the line pattern is not in the same direction as either the X direction or the Y direction.

Further, when the capacitance detection device group 100 in which a plurality of capacitance detection devices 1 of the present invention are arranged in a vertical and horizontal matrix is configured, it is also possible to measure the planar distribution of the shearing force 60 in the direction of the angle intersecting one direction of each capacitance detection device 1 (see fig. 10). That is, since each capacitance detection device 1 can measure the force in the direction of the angle intersecting the capacitance detection device 1 at each position, even when the magnitude of the shear force 60 differs depending on the position, the magnitude of the shear force 60 at each position can be measured by arranging a plurality of capacitance detection devices 1 in a vertical and horizontal matrix.

Further, when the capacitance detection device group 100 is configured by arranging a plurality of the capacitance detection devices 1 of the present invention in which the plurality of layers of the second electrodes 40 and the first electrodes 20 are formed, respectively, in a vertical and horizontal matrix, it is possible to measure the respective component force components 65 and 66 in the X direction and the Y direction of the shear force 60 of each capacitance detection device 1, and also possible to measure the planar distributions of the respective component force components 65 and 66 in the X direction and the Y direction of the shear force 60 (see fig. 11). That is, since each capacitance detection device 1 can measure the component force of the force in the direction of the angle intersecting the capacitance detection device 1 (component force in the X direction and component force in the Y direction) at each position, even when the magnitude and direction of the shear force 60 differ depending on the position, the magnitude of the component force of the shear force 60 (component force 65 in the X direction and component force 66 in the Y direction) at each position can be measured by arranging a plurality of capacitance detection devices 1 in a vertical and horizontal matrix.

In the above example, the capacitance detection devices 1 are arranged in a vertical and horizontal matrix, but the capacitance detection devices 1 may be arranged in a vertical row or a horizontal row. The capacitance detection device group 100 may be configured such that, for example, only the second electrode 40 and the first electrode 20 are formed individually and independently to form each capacitance detection device 1 after the substrate 10 and the insulating layer 30 are all shared, or may be configured such that the capacitance detection devices 1 that have been manufactured are attached and arranged one by one on one large other substrate.

In addition, there is also the following: the first electrode 20 is formed of an island-like pattern, the second electrode 40 is formed of two layers of an upper second electrode 402 and a lower second electrode 401 (see fig. 12-1), the upper second electrode 402 and the lower second electrode 401 are formed of a plurality of line-like patterns intersecting with each other in a plan view (see fig. 12-2), and a part of the island-like pattern of the first electrode 20 is overlapped with a part of the pattern of the upper second electrode 402 and a part of the pattern of the lower second electrode 401 in a plan view (see fig. 12-3). In this plan view, the angle at which the upper second electrode 402 and the lower second electrode 401 intersect is not limited, and when they are orthogonal (that is, the angle at which they intersect is 90 °), the pattern of the first electrode 20 is rectangular in a checkered pattern (see fig. 12 to 3), and when they are not orthogonal, the pattern of the first electrode 20 is parallelogram in a checkered pattern (see fig. 13).

In any case, it is preferable that the area of a region (hereinafter, referred to as S1) where a part of the island-like pattern of the first electrode 20 overlaps with a part of the pattern of the upper second electrode 402 is larger than the area of a region (hereinafter, referred to as S2) where a part of the island-like pattern of the first electrode 20 overlaps with a part of the pattern of the lower second electrode 401 in a plan view. Since the capacitance value between the electrodes is inversely proportional to the distance between the electrodes, the distance between the first electrode 20 and the upper second electrode 402 is longer than the distance between the first electrode 20 and the lower second electrode 401, and thus the detection sensitivity of the capacitance value is reduced accordingly. Therefore, in order to compensate for this sensitivity reduction, by increasing S1 to be larger than S2 in a plan view, the sensitivities of the first electrode 20 and the upper second electrode 402 can be increased, the sensitivities of the first electrode 20 and the upper second electrode 402 can be made to be the same as the sensitivities of the first electrode 20 and the lower second electrode 401, and the detection sensitivity in the X direction of the shearing force 60 can be made to be the same as the detection sensitivity in the Y direction.

In addition, when the upper second electrode 402 and the lower second electrode 401 are orthogonal to each other in a plan view, the pattern of the first electrode 20 may be a shape in which the four corners of the rectangle are rounded without forming four vertices, instead of the rectangle (see fig. 14). Similarly, when the upper second electrode 402 and the lower second electrode 401 are not orthogonal in a plan view, the pattern of the first electrode 20 may be a shape in which the four corners of the parallelogram are rounded without forming a pattern of four vertices, instead of the parallelogram. In addition, when the upper second electrode 402 is orthogonal to the lower second electrode 401 in a plan view, the pattern of the first electrode 20 may be formed in a vertically long elliptical shape instead of a rectangular shape (see fig. 15-1 and 15-2). In this case, since the region of S1 is separated from the region of S2 as compared with the case of the rectangular shape, adverse effects due to noise or the like of the electric signals generated in the respective electrodes are also reduced. Further, the ratio of the region of increase of S1 (hereinafter referred to as "S1')/S1 ratio) caused by the parallel movement of the upper second electrode 402 from the right to the left of the paper surface due to the shearing force 60 applied from the right to the left of the paper surface is larger than in the case of the rectangular or parallelogram pattern, and therefore, the ellipse has an advantage over the rectangular or parallelogram pattern in that the detection sensitivity to noise is increased. Similarly, the proportion of the region of increase in S2 (hereinafter referred to as S2 ') due to the parallel movement of the lower second electrode 401 from above to below the paper surface caused by the shearing force 60 applied from above to below the paper surface (i.e., (S2 + S2)')/S2 ratio) is greater than in the case of the rectangular or parallelogram pattern, and therefore, the ellipse has a higher advantage than the rectangular or parallelogram pattern in terms of the increase in the detection sensitivity to noise.

The rectangle may have a shape in which four corners are rounded and no four vertices are located in the middle of the ellipse. The island-like patterns of the first electrode 20 may be formed by arranging a plurality of patterns all in the same pattern, or may be formed by arranging a plurality of patterns in a mixed manner. In any of the above figures, the line patterns of the upper second electrode 402 and the lower second electrode 401 are described as long rectangles having substantially the same shape, but the widths and lengths thereof may be different from each other (see fig. 8 a), or the widths may be partially widened or narrowed (see fig. 8 b). Further, a part or the whole may be a polygonal or circular pattern (see fig. 8 c), or a composite pattern thereof or a wavy pattern (see fig. 8 d). It is preferable that the island pattern of the first electrode 20 is appropriately changed according to the line pattern of the upper second electrode 402 and the lower second electrode 401.

While various examples of the island-like pattern of the first electrode 20 and the line-like patterns of the upper second electrode 402 and the lower second electrode 401 of the second electrode 40 have been described above, the following description will be made in detail focusing on an example in which the island-like pattern of the first electrode 20 is a slightly vertically long rectangle and the line-like patterns of the upper second electrode 402 and the lower second electrode 401 are linear rectangles (see fig. 12-4 to 12-6). In this case, it is preferable that a distance d40 between the intersection ends where the upper second electrode 402 and the lower second electrode 401 intersect each other in a plan view, in the pattern direction of the upper second electrode 402, be a distance between the intersection centers where the upper second electrode 402 and the lower second electrode 401 intersect each other in a plan view, and be equal to or greater than a distance d20 in the pattern direction of the lower second electrode 401. The first electrodes 20 of the island-like pattern preferably have the vertices of rectangles positioned in the region where the upper second electrode 402 and the lower second electrode 401 intersect in a plan view. (refer to FIGS. 12-4).

By measuring a change in capacitance between the first electrodes 20 of the island-like patterns and the upper second electrodes 402 and a change in capacitance between the first electrodes 20 of the island-like patterns and the lower second electrodes 401, a component 65 in the X-axis direction of the shear force 60 in the pattern direction of the upper second electrodes 402 and a component 66 in the Y-axis direction of the shear force 60 in the pattern direction of the lower second electrodes 401 can be measured. An area capable of detecting a capacitance value between the first electrode 20 of the island-like pattern and the upper second electrode 402 is S1, i.e., a white filled portion in fig. 12-4. On the other hand, a region capable of detecting a capacitance value between the first electrode 20 of the island-like pattern and the lower second electrode 401 is S2, i.e., a gray filled portion in fig. 12-4. Further, since the average distance t40 in the thickness direction between the first electrode 20 of the island-like pattern and the upper second electrode 402 is larger than the average distance t20 in the thickness direction between the first electrode 20 of the island-like pattern and the lower second electrode 401 (that is, the lower second electrode 401 is closer to the first electrode 20 of the island-like pattern than the upper second electrode 402), the function as S2 (gray filling portion) is more dominant in the region where the three electrodes of the first electrode 20, the upper second electrode 402, and the lower second electrode 401 overlap. (refer to FIGS. 12-4).

When the component force 65 in the X-axis direction is applied from the right to left direction of the paper surface in this state, the upper second electrode 402 in fig. 12-4 moves in parallel to the position of the upper second electrode 402 in fig. 12-5 (i.e., moves in parallel to the left direction of the paper surface) in proportion to the magnitude of the force, and as a result, the area S1 in which the capacitance value between the first electrode 20 and the upper second electrode 402 can be detected increases from the state in fig. 12-4 by the area amount of the black filled area S1' in the state in fig. 12-5. Therefore, by detecting the increased capacitance value of the black-filled region S1' in fig. 12 to 5, the component force 65 in the original X-axis direction can be measured. Similarly, when the component force 66 in the Y-axis direction is applied from above to below the paper surface in the state of fig. 12-4, the lower second electrode 401 of fig. 12-4 moves in parallel to the position of the lower second electrode 401 of fig. 12-6 (i.e., moves in parallel to below the paper surface) in proportion to the magnitude of the force, and as a result, the area S2 in which the capacitance value between the first electrode 20 and the lower second electrode 401 can be detected increases from the state of fig. 12-4 by the area of the black filled area S2' in the state of fig. 12-6. Therefore, if the increased capacitance value of the black-filled region S2' is detected, the component force component 66 in the original Y-axis direction can be measured.

Since the detection sensitivity of the change in capacitance value due to the X-axis direction component force 65 and the Y-axis direction component force 66 of the shear force 60 is preferably set to be substantially the same in the X-axis direction and the Y-axis direction, the area of the black filled region S1 'in fig. 12-5 is preferably set to be larger than the area of the black filled region S2' in fig. 12-6. That is, since the distance between the upper second electrode 402 and the first electrode 20 is longer than that between the lower second electrode 401 (see fig. 12-1), if the area of S1 'is the same as that of S2', the detection sensitivity of the upper second electrode 402 is generally lower than that of the lower second electrode 401. Specifically, the relationship of t20/t40 (the distance between the first electrode 20 and the lower second electrode 401/the distance between the first electrode 20 and the upper second electrode 402) may be designed to be approximately equal to S2'/S1' (the area of the black filled region in FIGS. 12-6/the area of the black filled region in FIGS. 12-5). Therefore, if it is a condition that the difference between t20 and t40 is so small as to be negligible that they can be regarded as identical, the area of S2 'and the area of S1' can also be set to be identical.

Next, the wiring of the first electrode 20, the second electrode 40, and the processing unit 120 will be described in detail. The wiring patterns may be connected from the respective first electrodes 20, and electrically connected to the processing section 120 via the independent AC drive circuit 5 and the drive circuit 110. On the other hand, the second electrode 40 may be electrically connected to the processing unit 120 via the signal conversion unit 130 (see fig. 1 and 16). In this way, if the first electrodes 20 having a complicated and fine pattern are electrically connected to the processing unit via the independent AC drive circuits 5 having the same complicated and fine pattern, it is possible to detect a change in capacitance value occurring between the first electrodes 20 and the second electrodes 40 for each very fine range with very high accuracy, and thus it is possible to measure the shear force 60 applied from the second electrodes 40 or the protective layer 50 with very high accuracy. In addition, the first electrode 20 and the second electrode 40 may be exchanged. That is, the second electrode 40 may be formed on the substrate 10, the first electrode 20 may be formed on the insulating layer 30, the first electrode 20 positioned on the upper portion may be connected to the independent AC driving circuit 5, and the first electrode 20 positioned on the lower portion may be connected to the signal converting part 130.

One independent AC drive circuit 5 is formed for each of the electrodes 21 of the first electrode 20, and the independent AC drive circuit 5 is connected to the processing unit 120 via the drive circuit 110 (see fig. 16). The processing unit 120 controls the independent AC drive circuit 5 via the drive circuit 110, and applies an alternating current signal (AC signal) to each of the electrodes 21 of the first electrode 20. Then, current is supplied to a certain independent AC drive circuit 5 in the switch-off state in which current is not supplied until saturation to change to the switch-on state, and current supplied to the other independent AC drive circuit 5 in the switch-on state in which current is saturated to cut off the current to change to the switch-off state, thereby switching the drive circuit 110. The current flowing through the drive circuit 110 is preferably small from the viewpoint of reducing power consumption, but if it is too small, it is likely to be affected by noise, and therefore, it is preferably about 10 μ a to several tens of m a. In the present invention, the driving circuit 110 is a circuit that drives the independent AC driving circuit 5, and switching the driving circuit 110 means changing the flow of the output signal from the processing portion to another circuit. That is, the drive circuit 110 is a circuit having a function of changing the flow direction of a current as an output signal or controlling the amount of flowing current within a controllable range.

The independent AC drive circuit 5 is a circuit having 2 or more inputs received from the respective electrodes 21 of the first electrode 20 and 1 output outputting an alternating current signal to the first electrode 20, and changing the alternating current signal according to the input signal pattern from the first electrode 20. The independent AC drive circuit 5 is preferably of a logic circuit type. This is because, in the case of the logic circuit type, a type (AND operation, OR operation, NAND operation, OR exclusive OR operation) in which 2 inputs are provided AND 1 output is provided can be used, AND there is an effect that the number of signal lines can be reduced. For example, when AND (or AND) operation is used, although a rectangular wave AC signal is always output to INA (input a), the signal is output from OUT (output) only when INB (input B) is HIGH (see fig. 17). In fig. 16, the independent AC drive electrodes 5 are disposed on the surface opposite to the first electrode 20 with respect to the substrate 10 and connected to the first electrode 20 through the through holes, but may be disposed in parallel on the same surface as the first electrode 20.

In addition, although the connection lines of the electrodes 21 of the first electrode 20, the independent AC drive circuit 5, and the drive circuit 110 are often formed with a larger number of lines, the first electrode 20 will be described with an example of 4 × 5=20 lines in fig. 16 for simplicity of description. The independent AC drive circuits 5 in the same row share the input terminals with each other, and the independent AC drive circuits 5 in the same column share the input terminals with each other. Therefore, from the first electrode 20, control is performed by 4+5=9 signal lines. Fig. 18 shows, as an example, an example of signals of 9 signal lines when an alternating current signal is independently output (AC drive) to 3 of the electrodes 21 of the first electrode 20 of fig. 16 ((col 1 (column 1), row 2) AND (col 1 (column 1), row3 (row 3)) AND (col 4 (column 4), row 3)).

When the independent AC drive circuit 5 is of a logic circuit type, the capacitance detection device 1 preferably sets the capacitance values and the resistance values so as to satisfy the condition that (the capacitance value generated between the second electrode 40 and the first electrode 20 + the parasitic capacitance of the first electrode 20) × the output resistance value of the logic circuit < 1 μ s (time constant: 1 μ s). This is because it is generally preferable to increase the time constant, but if the time constant is higher than 1 μ s, a problem of a decrease in switching speed may occur. The time constant is a product of a resistance value and a capacitance value in an RC circuit (i.e., a circuit which is formed of a resistor and a capacitor and driven by a voltage or a current). In addition, the parasitic capacitance refers to a capacitance value generated in the first electrode 20 due to a physical structure not intended by a designer. The electrode material of the independent AC drive circuit 5 and the drive circuit 110 is not particularly limited, and other than a metal film of copper, silver, gold, nickel, aluminum, or the like, a conductive ink containing them, indium tin oxide, zinc oxide, or the like may be used. The forming method includes: a method of forming a conductive film over the entire surface by a plating method, a sputtering method, a vacuum deposition method, an ion plating method, or the like, and then patterning the conductive film by etching. The pattern may have any shape such as a circle, a square, or a line. The thickness is preferably in the range of 0.1 μm to 5 mm.

In addition, the independent AC drive circuit 5 may be formed of a thin film transistor. This is because, although only a rectangular wave can be output in a simple logic circuit type, when the thin film transistor is used, a more complicated AC signal such as a sine wave can be output. The thin film transistor is preferably a transistor having a high switching speed of the selected switch and a large maximum collector current. This is because, when the switching speed is high, the capacitance value in each electrode 21 can be measured quickly almost simultaneously, and when the maximum collector current is large, the resulting signal can be transmitted accordingly faster. Therefore, if the electric charge accumulated in the thin film transistor is insufficient (the capacitance value is low), the switching speed may be reduced, and therefore, it is preferable to sufficiently reduce the resistance value when the transistor is electrically connected. This is because, by reducing the resistance value when the transistors are electrically connected, a current flowing between the transistors increases, and as a result, charging is promoted to sufficiently replenish the charge, and the capacitance value increases.

In order to avoid the accumulated charges from being lost when the thin film transistors are not electrically connected, it is generally preferable to sufficiently increase the time constant ((the capacitance value generated between the second electrode 40 and the first electrode 20 + the capacitance value between the gate and the drain of each thin film transistor + the capacitance value between the source and the drain when each thin film transistor is off + the parasitic capacitance value of the drain) × (the pull-down resistance value or the pull-up resistance value in the element)). On the other hand, if the time constant is higher than 10 μ s, the switching speed may be lowered. Therefore, the value of the time constant is preferably less than 10 μ s. The pull-down resistance value in the element is a resistor that functions to realize a low-level voltage (normally, a voltage that is a signal of a digital circuit is set to 0 volt) when no input (OFF state) is made. The pull-up resistance value in the element is a resistor that functions to realize a high-level voltage (for example, to make a voltage as a signal of a digital circuit 5 volts) when no input (OFF state) is made.

In addition, the resistance value when the thin film transistor is turned on is preferably sufficiently smaller than the pull-down resistance value and the pull-up resistance value in the element. On the other hand, the resistance value when the thin film transistor is turned off is preferably sufficiently larger than the pull-down resistance value and the pull-up resistance value in the element. This is because, if the pull-down resistance value and the pull-up resistance value in the element are set in this way, the signal is transmitted smoothly. In addition, the thin film transistor may be formed of an organic semiconductor. This is because if an organic semiconductor is used, it can be produced in a large amount by roll-to-roll production, for example, and can also be applied to a three-dimensional shape such as a curved surface. Examples of the material of such an organic semiconductor include: substituted thiophene oligomers such as poly-3-hexylthiophene, pentacene and acene, derivatives thereof, phthalocyanine and thiophene fused ring compounds, fluorene oligomer derivatives, and the like. Examples of the method of forming poly-3-hexylthiophene include a drop casting method and a spin coating method. The thickness is preferably in the range of 0.1 μm to 5 mm.

The second electrode 40 receives the ac signal emitted from the first electrode 20, and the received ac signal is converted into a voltage in the signal conversion unit 130 and further processed in the processing unit 120. The strength of the processed ac signal is proportional to the capacitance between the respective one of the first electrodes 20 and the second electrode 40. This enables the shear force 60 to be measured at the upper portion of the first electrode 20 at the location of each electrode 21, and also enables the planar distribution of the shear force 60 to be measured. The signal conversion unit 130 is a unit that converts the ac signal from the second electrode 40 into another signal. Examples of the device constituting the signal conversion unit 130 include a charge amplifier, an AD converter, a distributor, an isolator, and a transducer. In this case, the signal conversion unit 130 may be configured by only a single device, or the signal conversion unit 130 may be configured by a combination of a plurality of devices. Examples of a combination of the plurality of devices include a charge amplifier that amplifies the total amount of alternating current (electric charge) emitted from the first electrode 20 and outputs the amplified electric charge, an AD converter that converts an analog signal into a digital signal, and the like.

Next, the protective layer will be explained. The protective layer 50 is a layer for protecting the first electrode 20 and the second electrode 40 located below from the shear force 60 applied from above. The material of the protective layer 50 is not particularly limited, and examples thereof include thermoplastic or thermosetting resin sheets such as acrylic, urethane, fluorine, polyester, polycarbonate, polyacetal, polyamide, and olefin, and ultraviolet-curable resin sheets such as cyanoacrylate. However, since the protective layer 50 also functions to accurately transmit the shear force 60 to the insulating layer 30, it is necessary to have both the property as a protective film and the property as a pressure transmitter. Therefore, an acrylic resin, a urethane resin, a fluorine resin, a polyester resin such as polyethylene terephthalate, or the like containing 10% or more of an acrylic rubber component is preferable. The thickness of the protective layer 50 varies depending on the material, but is preferably selected to be within a range of 30 μm to 5 mm.

In the case where the second electrode 40 has a plurality of line patterns, a cut may be formed on the surface of the protective layer 50 in order to avoid the influence of noise caused by the interference of electric signals detected by the line patterns on the sensitivity of a capacitance value to be measured. Since the line patterns of the second electrode 40 are independently moved by the cuts, it is possible to reduce adverse effects on other electrodes. When the cut is formed, the thickness of the insulating layer 30 is preferably set to a slightly thick range of 500 μm to 5 mm. Examples of the form of the shear line include a dotted line, a dashed line, a long dashed line, a dashed line, and a two-dot long dashed line. The cuts may be one or more threads. The depth of the cut may be formed to reach the surface of the insulating layer 30 by penetrating the protective layer 50, or may be a half-cut shape up to halfway. Examples of the method of forming the cut include a thomson blade punching method.

Next, the temperature sensor will be explained. In the capacitance detection device 1 of the present invention, a temperature sensor 800 (see fig. 19) for measuring heat generated by stress of the shear force 60 may be provided in the substrate 10, the insulating layer 30, the layer of the protective layer 50, and the like. This is because, in the case of a device that detects an electrical signal such as a capacitance value, the ambient temperature may be affected by the ambient temperature, and therefore, in order to suppress the effect as much as possible, the ambient temperature is measured in real time, and the measurement value is appropriately corrected. In particular, when the pressure receiving body is a tire or the like, since there is considerable friction or the like with the ground contact surface, heat may be generated by the friction or the like, and the accuracy of the measurement value may be lowered. Further, if the amount of energy loss due to heat can be estimated, what the state of the ground plane with a small amount of energy loss is can be estimated, and the development of a product with good energy efficiency can be promoted.

The temperature sensor 800 may use a film sheet having a thickness of 20 μm to 3mm which can be bonded, or an additional electrode in each element of the first electrode. Since the temperature sensor is not bulky, it can be installed at various positions of the capacitance detection device 1, and it is possible to know which position of the capacitance detection device 1 generates heat and accumulates the heat. As a result, the distribution of both the shear force 60 and the temperature can be measured at the same time. The temperature sensor 800 made of a film sheet includes a film type thermistor temperature sensor in which a thermistor material layer and a temperature sensor electrode are laminated on a film sheet. The film type thermistor temperature sensor is a thermistor temperature sensor in which a thermistor material layer having a resistance value that decreases or increases as the temperature increases is patterned, and the change in the resistance value is measured by a temperature sensor electrode to measure the temperature. Examples of the film sheet include synthetic resin sheets such as polyimide, polyethylene terephthalate, polyethylene naphthalate, polysulfone, polyetherimide, polyether ether ketone, polycarbonate, polyacetal, and liquid crystal polymer, and also include film glass, ceramics, heat-resistant nonwoven fabric, and the like. Alternatively, the sheet may be a sheet having a structure in which a heat-resistant insulating film is formed on a metal sheet. The thickness is preferably in the range of 20 μm to 3 mm.

The material of the thermistor material layer may include oxides of transition metals such as manganese, cobalt, and iron, and nitrides of any of thallium, niobium, chromium, titanium, and zirconium, and any of aluminum, silicon, and bismuth. The former method includes the following methods: the above transition metal oxides are used as raw materials, and they are mixed in a mixer, subjected to calcination, granulated into granules of an appropriate size by a granulation method such as a pressure granulation method or a spray drying method, and pressure-molded into a desired shape. The latter method of manufacturing includes a method of forming a pattern by sputtering in an atmosphere containing nitrogen gas using a material containing the above-described elements as a target. In order to obtain stable thermistor characteristics, it is preferable that these thermistor material layers are subjected to main firing at a high temperature. Examples of the material of the temperature sensor electrode include a metal electrode layer such as gold, silver, palladium, etc., and the electrode may be patterned into a comb shape with fine glass powder (glass frit). In addition, a bonding layer of chromium, nickel chromium, titanium nitride, or the like may be provided between the thin film sheet and the temperature sensor electrode in order to improve the bonding property. After the temperature sensor electrode is formed, a lead wire may be attached and sealed with an epoxy resin or the like to protect the thermistor material layer and the temperature sensor electrode.

As the temperature sensor other than the thermistor, the following temperature sensors can be used: a thermocouple system in which 2 different metals are connected and electromotive force generated between both contacts due to a temperature difference is used; a resistance temperature measuring resistor system in which the resistance of a metal changes almost in proportion to the temperature; a thermal expansion mode that liquid and gas expand and contract due to temperature change is utilized; a bimetal system utilizing a phenomenon that a metal plate is warped in one direction due to a difference in thermal expansion coefficient when the metal plate undergoes a temperature change in a state where two thin metal plates having different thermal expansion coefficients are bonded and one end is fixed. The temperature sensor 800 may function only by an electrode additionally formed in parallel with each element of the first electrode 20 and the second electrode 40. That is, a temperature detection electrode 900 made of a semiconductor or the like may be provided in the vicinity of the first electrode 20 and the second electrode 40 instead of the temperature sensor 800 (see fig. 20). One end of the temperature detection electrode 900 is connected to the control power supply via a current limiting resistor, and the other end is connected to the ground side terminal. The control power source corresponds to a current source for applying a forward current to the temperature detection electrode. The temperature detection electrode 900 may be formed of a metal electrode layer of gold, silver, palladium, or the like, or may be formed of a conductive paste film in which these metal particles are dispersed in a resin binder, or an organic semiconductor such as polyhexamethylene thiophene, polydioctylfluorene, pentacene, tetraphenylporphyrin, or the like. The method for manufacturing the temperature detection electrode 900 includes a method of forming a conductive film on the entire surface by a plating method, a sputtering method, a vacuum evaporation method, an ion plating method, or the like, and then patterning the conductive film by etching, and in the latter case, a method of directly forming a pattern by a printing method such as a screen printing method, a gravure printing method, an offset printing method, or the like.

Next, the frame 700 forming the lead line of the first electrode 20 or the second electrode 40 will be described. In the capacitance detection device 1, it is preferable that the frame portion 700 is not present in any of two directions orthogonal to the periphery of the sensor portion 600 of the first electrode 20 or the second electrode 40 (see fig. 21). If a space for providing the wiring is required in both the vertical direction of the sensor unit 600 and the right or left direction orthogonal to each other, the shear force 60 cannot be measured in the region where the wiring is formed, and therefore the length of the range in which measurement is possible is limited. On the other hand, if the frame portion 700 is not present in any of two directions orthogonal to the periphery of the sensor portion 600 of the first electrode 20 or the second electrode 40 of the capacitance detection device 1, if a plurality of capacitance detection devices 1 are arranged and joined to form an elongated form, the length of the measurable range can be extended infinitely.

If the sensor unit 600 can be extended to a desired length, for example, the following effects are obtained: it is possible to easily detect the degree of variation in pressure and shear force values due to subtle irregularities or the like at each portion of the tire, the change in shear force 60 received when accelerating or decelerating the running speed of the tire or the like, and other conventionally difficult measurements. The method of forming the frame 700 not to exist above and below the sensor unit 600 is not particularly limited, and for example, the positions of the first electrode 20 and the second electrode 40 and the positions of the routing wire 250 and the routing wire 450 may be slightly shifted and patterned in parallel (see fig. 21). In the case where the accuracy and resolution of the measurement value required for the shear force 60 are high and a large number of wires 250 and 450 need to be thinned, the frame portions 700 may be provided on both the left and right sides of the sensor unit 600, and the wires 250 and 450 may be formed to be left-right separated, thereby increasing the interval between the wires.

Furthermore, by bending a part of the routing wire 250 and the routing wire 450 near the first electrode 20 and the second electrode 40 at right angles, the length of the routing wire is substantially increased, and thereby the number of the routing wires 250 and the routing wires 450 can be reduced by about half. This increases the degree of freedom in the line widths of the bypass lines 250 and 450, and thus the first electrode 20 and the second electrode 40 can be further miniaturized, and the accuracy and resolution of the measurement value of the shear force 60 can be improved. When a plurality of capacitance detection devices 1 are arranged and joined, a convex portion 1200 and a concave portion 1300 (see fig. 22) that are in a relationship between a key and a keyhole may be provided in a part of the capacitance detection device 1 in order to avoid displacement of the capacitance detection device 1 due to movement.

If the convex portion 1200 and the concave portion 1300 are firmly fitted, the plurality of capacitance detection devices 1 exhibit the same function and effect as those of the long capacitance detection device 1 integrated together. The convex portion 1200 and the concave portion 1300 may be formed in the frame portion 700 or in the sensor portion 600. The shapes of the convex portion 1200 and the concave portion 1300 may be any shapes as long as they do not fall off from the relationship between the key and the keyhole.

The long capacitance detection device 1 can be applied to various applications such as measurement of a shear force 60 applied to a sole surface when a person walks or runs, measurement of a force applied to a floor by a golf ball in a golf putter, a force applied when a bowling ball travels on a lane, a force applied when a person traces a display surface of IT equipment with fingertips, and a force applied to a track when a train travels, in addition to a running test of a tire. For example, in walking or running of a person, the portions in contact with the ground contact surface are scattered, and the walking stride or running stride differs from person to person, and even in the same person, the walking stride or running stride at the start and end of walking or running differs. Therefore, if the sensor unit 600 is formed on the entire surface of the long bar, the long capacitance detection device 1 can be measured regardless of the walking stride length and the running width, and therefore, is highly useful.

In addition, when a very severe test such as a running test of a tire is repeated several times, the capacitance detection device 1 has a problem in that the protective layer 50 and the like on the surface are worn out, the second electrode 40 and the like are damaged, and the capacitance detection device cannot be used. Therefore, the entire or a part of the substrate 10 of the worn protective layer 50, the damaged insulating layer 30 of the second electrode 40, and the damaged first electrode 20 can be removed, and these can be replaced as appropriate for use. The term "detachable" as used herein means that they can be separated by any means, and the means, the labor for detachment, and the time are not limited. In addition, even if a part of the layer is separated without being completely detached, the layer is considered to be detachable in the case where the detached layer has its original function.

The detachable protective layer 50 and the like are preferably configured by a multilayer stack, and only the protective layer 50 of the base material 51 and the layer 71 made of self-adhesive paste or micro-suction pad can be detached and replaced (see fig. 23). With such a configuration, only a part of the worn protective layer 50 can be very easily peeled off from the capacitance detection device 1 and removed for replacement (see fig. 23), and there is an advantage that the cost can be significantly reduced from the standpoint of a tester.

Examples of the material of the self-adhesive paste include synthetic rubber-based resins such as two-pack curable urethane-based resin composed of a polyol and a polyisocyanate crosslinking agent, styrene butadiene latex, butadiene rubber, nitrile rubber, isoprene rubber, and chloroprene rubber, and further include natural rubber-based resins, acrylic resins, and silicone-based resins. The method for forming the self-adhesive paste layer is not particularly limited, and for example, the self-adhesive paste layer can be applied by a general-purpose printing method such as an offset plate or a screen, or a general-purpose coater such as a lip coater or a reverse coater, and is preferably formed to have a thickness of 10 to 500 μm.

The micro-suction pad has a property of performing pressure-sensitive adsorption if the surface to which the micro-suction pad is attached is smooth. Moreover, the adhesive can be easily peeled off by hand and is not sticky as an adhesive. The micro-suction pad preferably has micro-holes in the shape of a suction plate of 1 to 500 μm in a ratio of 0.1 to 10 ten thousand per 1 square centimeter. If the size of the suction pad is less than 2 μm, the suction effect is generated by the difference in air pressure by the soft suction on the contact surface. When the average size of the chuck-shaped fine holes is less than 1 μm and only 0.1 ten thousand are formed per 1 square centimeter, and when the average size of the chuck-shaped fine holes is more than 500 μm and more than 10 ten thousand are formed per 1 square centimeter, the adsorption force may be reduced. As a method for forming a fine suction pad, a method may be used in which air is mechanically blown into a synthetic resin emulsion to generate countless fine bubbles, the resultant emulsion is foamed into a foam-like synthetic resin emulsion, the foam-like synthetic resin emulsion is applied by a coater or a spray coating, and a solvent is scattered and removed.

Description of the symbols

1: capacitance detection device, 5: independent AC drive circuit, 10: substrate, 20: first electrode, 21: lower first electrode, 22: upper first electrode, 25, 26, 27: respective electrodes of the first electrode, 30, 31, 32: insulating layer, 40, 45, 46: second electrode, 41, 401: lower second electrode, 42, 402: upper second electrode, 45, 46, 47: electrodes of the second electrode, 50: protective layer, 51: substrate for protective layer, 60: shear force, 65: component force component of shear force in the X-axis direction, 66: component force component of shear force in the Y-axis direction, 70: spot-faced unevenness, 71: layer consisting of self-adhesive paste, micro-suction cup, 80: conductive particles, 100: capacitance detection device group, 110: drive circuit, 120: processing unit, 130: signal conversion section, 250, 450: routing wire, 300: bubble size, 600: sensing portion, 700: frame portion, 800: temperature sensor, 900: temperature detection electrode, 1200: projection, 1300: concave portion, S1: a region where a part of the island-like pattern of the first electrode overlaps with a part of the pattern of the upper second electrode in a plan view, S2: a region where a part of the island-like pattern of the first electrode overlaps with a part of the pattern of the lower second electrode in a plan view, S1': a region where a capacitance value increased between the first electrode and the upper second electrode as a result of applying a component force component in the X-axis direction from the right to the left on the paper surface can be detected, S2': a region in which a capacitance value that increases between the first electrode and the lower second electrode as a result of a component force component in the Y-axis direction being applied from above to below the paper surface can be detected, t20: average distance in the thickness direction between the first electrode and the lower second electrode of the island-like pattern, t40: average distance in the thickness direction between the first electrode and the upper second electrode of the island-like pattern, d20: distance in the short side direction of the first electrode in plan view and distance in the pattern direction of the lower second electrode, d40: the distance between the end of the intersection point where the upper second electrode and the lower second electrode intersect in a plan view is the distance in the pattern direction of the upper second electrode.

Claims (9)

1. A capacitance detecting device having a first electrode, an insulating layer formed on the first electrode, and a second electrode formed on the insulating layer,

the capacitance detection device can calculate a shearing force applied from an upper portion of the second electrode,

the first electrode is formed of an island-like pattern, the second electrode is formed of two layers of an upper second electrode and a lower second electrode, and the upper second electrode and the lower second electrode are formed of a plurality of line-like patterns intersecting each other in a plan view,

a part of the island-like pattern of the first electrode overlaps with a part of the pattern of the upper second electrode and a part of the pattern of the lower second electrode, respectively, in a plan view,

an area where a part of the island-like pattern of the first electrode and a part of the pattern of the upper second electrode overlap in a plan view is larger than an area where a part of the island-like pattern of the first electrode and a part of the pattern of the lower second electrode overlap in a plan view.

2. The capacitance detecting device according to claim 1, one AC drive circuit being connected to each of the respective first electrodes,

the AC drive circuit is connected to the processing section via a drive circuit,

the AC drive circuit is a circuit having 2 or more inputs received from the drive circuit and 1 output for outputting an AC signal to each of the electrodes of the first electrodes, and applying an AC signal to each of the electrodes of the first electrodes in accordance with an input signal pattern from the drive circuit,

the second electrode is connected to the processing unit via the signal conversion unit.

3. The capacitance detection device according to claim 1, wherein the insulating layer is formed of a plurality of layers which are sequentially continuous, and a layer having a low elastic modulus is formed by laminating a layer having a high elastic modulus on the insulating layer of the plurality of layers.

4. The capacitance detection device according to claim 1, wherein the insulating layer is formed of a plurality of layers that are successively connected, and the insulating layer of the plurality of layers is formed of a plurality of types of foams having different cell sizes.

5. The capacitance detection device according to claim 1, wherein the insulating layer is formed of a plurality of sequentially continuous layers, and the insulating layers of the plurality of layers are formed of a plurality of types of electrically viscous fluids having different viscoelasticity.

6. The capacitance detection device according to claim 1, wherein the insulating layer is formed of a plurality of layers which are sequentially continuous, a protective layer is formed on the second electrode, and a cut is formed on a surface of the protective layer.

7. The capacitance detecting device according to claim 1, wherein the insulating layer has a multilayer structure of foams of the same material which are continuous in this order,

the insulating layer has a layer in which the hardness or the elastic modulus of the material changes stepwise in one direction.

8. The capacitance detection device according to claim 1, the insulating layer having a layer in which a physical property or a chemical property changes stepwise in one direction,

the insulating layer is composed of a single layer.

9. The capacitance detection device according to claim 8, wherein the insulating layer is made of a foam having a layer formed by changing a concentration of bubbles and a size of bubbles in a stepwise manner.

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