CN112725860A - Simple micro-arc oxidation aluminum material treatment method - Google Patents
Simple micro-arc oxidation aluminum material treatment method Download PDFInfo
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- 238000007745 plasma electrolytic oxidation reaction Methods 0.000 title claims abstract description 103
- 238000000034 method Methods 0.000 title claims abstract description 44
- 239000000463 material Substances 0.000 title claims abstract description 30
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- 229910052782 aluminium Inorganic materials 0.000 title claims abstract description 29
- 238000005498 polishing Methods 0.000 claims abstract description 121
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- 238000005238 degreasing Methods 0.000 description 1
- BJZIJOLEWHWTJO-UHFFFAOYSA-H dipotassium;hexafluorozirconium(2-) Chemical compound [F-].[F-].[F-].[F-].[F-].[F-].[K+].[K+].[Zr+4] BJZIJOLEWHWTJO-UHFFFAOYSA-H 0.000 description 1
- UQGFMSUEHSUPRD-UHFFFAOYSA-N disodium;3,7-dioxido-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane Chemical compound [Na+].[Na+].O1B([O-])OB2OB([O-])OB1O2 UQGFMSUEHSUPRD-UHFFFAOYSA-N 0.000 description 1
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- 229940078494 nickel acetate Drugs 0.000 description 1
- DBJLJFTWODWSOF-UHFFFAOYSA-L nickel(ii) fluoride Chemical group F[Ni]F DBJLJFTWODWSOF-UHFFFAOYSA-L 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
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- 229910052710 silicon Inorganic materials 0.000 description 1
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- TVXXNOYZHKPKGW-UHFFFAOYSA-N sodium molybdate (anhydrous) Chemical compound [Na+].[Na+].[O-][Mo]([O-])(=O)=O TVXXNOYZHKPKGW-UHFFFAOYSA-N 0.000 description 1
- PHIQPXBZDGYJOG-UHFFFAOYSA-N sodium silicate nonahydrate Chemical compound O.O.O.O.O.O.O.O.O.[Na+].[Na+].[O-][Si]([O-])=O PHIQPXBZDGYJOG-UHFFFAOYSA-N 0.000 description 1
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Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/026—Anodisation with spark discharge
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
- B24B29/02—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents designed for particular workpieces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/06—Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/16—Pretreatment, e.g. desmutting
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/02—Anodisation
- C25D11/04—Anodisation of aluminium or alloys based thereon
- C25D11/18—After-treatment, e.g. pore-sealing
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Abstract
The invention provides a simple micro-arc oxidation aluminum material treatment method, which can effectively seal micropores on the surface of a micro-arc oxidation film through a hydration polishing method, fill aluminum oxide fragments obtained through polishing and grinding into a pore channel of the micro-arc oxidation film, and then carry out hole sealing.
Description
Technical Field
The invention belongs to the technical field of surface treatment of aluminum or aluminum alloy materials, relates to a hole sealing treatment method, and particularly relates to a hole sealing method for an aluminum alloy micro-arc oxidation film.
Technical Field
The micro-arc oxidation technology is a new technology developed on the basis of the hard anodic oxidation technology, and can directly form a ceramic membrane with a series of excellent performances such as high corrosion resistance, high wear resistance, high insulation, thermal shock resistance and the like on the surface of metals such as aluminum, magnesium, titanium, zirconium, niobium and the like in situ growth. The method is widely applied to the industries of aviation, ships, textile, automobiles and the like. But the ceramic film formed on the surface is melted under the action of the electric arc in the micro-arc oxidation process, and a large number of micron-sized micropores are formed under the combined action of gas formed on the surface of the ceramic film. The micropores exist in a large amount in the ceramic membrane, and part of the micropores are connected with the metal matrix, so that liquid can easily pass through the micropores to reach the metal matrix, metal corrosion is caused, and the oxide membrane is cracked and falls off seriously, thereby affecting the performance of the micro-arc oxide membrane. Therefore, the micro-arc oxide film must be subjected to sealing treatment.
At present, the hole sealing method of the micro-arc oxide film is rarely researched, such as sealing holes by adopting methods of sealing holes by boiling water, spraying and curing resin, sealing holes or sealing holes by a sealant of an anodic oxide film. The micro-arc oxidation film has larger aperture, and partial holes penetrate through the whole oxidation film, so that the boiling water hole sealing is difficult to realize the effective hole sealing of the micro-arc oxidation film; the investment of resin spraying, curing and hole sealing equipment is more, and the cost is higher; the anodic oxide film hole sealing agent has more types, corresponding micro-arc oxide film hole sealing tests are not carried out, and the micro-arc oxide film hole sealing quality is seriously influenced.
For example, in the southwest petroleum university of CN201210357957, a normal-temperature micro-arc oxide film hole sealing method adopts a solution prepared from sodium silicate, nickel salt, a solvent and an accelerator as a hole sealing agent, the hole sealing agent is kept stand for at least 2 hours, then the micro-arc oxide film is sealed by soaking at normal temperature, and the hole sealing agent forms an adsorption crystal filler in micropores on the surface of the micro-arc oxide film after hole sealing, so that the hole sealing purpose is achieved. The solvent is deionized water, and the ratio of sodium silicate, nickel salt and accelerant is as follows: 5-15g/L of sodium silicate, 2-8g/L of nickel salt and 0.1-2g/L of accelerator. The sodium silicate is sodium silicate pentahydrate or sodium silicate nonahydrate, the nickel salt is nickel fluoride, nickel acetate or a mixture thereof, and the accelerator is boric acid, thiourea, potassium fluorozirconate or a mixture thereof. The hole sealing agent solution can be operated at normal temperature without heating, the hole sealing effect is good, the operation is simple and easy, the hardness of the ceramic membrane is not influenced, and the corrosion resistance of the ceramic membrane can be improved.
For example, CN 201811114851A method for modifying the surface of an aluminum alloy profile by micro-arc oxidation and a surface-modified aluminum alloy profile, the method comprises the following steps: a) pretreatment: the aluminum alloy section is subjected to blowing, ash removal, cleaning, oil removal, water washing and drying to complete pretreatment; b) micro-arc oxidation treatment: placing the aluminum alloy section in electrolyte for micro-arc oxidation, wherein the electrolyte comprises the following components: na2SiO3, Na2B4O7, KOH, glycerol, Na2MoO4 and EDTA-2 Na; taking out after micro-arc oxidation is finished; c) and (3) post-treatment: after the aluminum alloy section is cleaned and dried, hole sealing treatment is carried out on the surface of the micro-arc oxidation film layer by adopting polyvinylidene fluoride resin. The surface modified aluminum alloy section bar obtained by the invention is subjected to hole sealing treatment by using polyvinylidene fluoride resin after micro-arc oxidation treatment, has good hole sealing effect, compact and flat surface, excellent wear resistance, corrosion resistance and electrical insulation performance, and greatly improves the comprehensive performance of the aluminum alloy section bar, the existing defects are that the polyvinylidene fluoride resin is physically adsorbed in micro-arc oxidized holes, the adsorption force is limited, the peeling between a base material and the resin is very easy to occur, the micro-arc oxidized ceramic membrane known by the technical personnel in the field has extremely low porosity which is usually not higher than 10%, under the condition of the low porosity, the hole sealing rate of the polyvinylidene fluoride resin to the micro-arc oxidized ceramic membrane is extremely poor, the wear resistance, the corrosion resistance and the electrical insulation performance of the micro-arc oxidized ceramic membrane are excellent, and the polyvinylidene fluoride resin is not just adhered to the surface of the oxidized membrane and has the property of the polyvinylidene fluoride resin, has no direct relation with hole sealing.
As another example, the sealing treatment method of the micro-arc oxidation ceramic membrane disclosed in CNCN201110288402, firstly, uses acetone to remove dirt and oil on the surface of the micro-arc oxidation sample of the aluminum alloy to be sealed, and then uses distilled water with the temperature of 50-60 ℃ to perform ultrasonic vibration cleaning; then, carrying out vacuum infiltration by adopting organic silicon stock solution and alcohol with the mass concentration of more than 95%; finally, the micro-arc oxidation ceramic membrane sealing treatment method is placed in a heat preservation furnace for heat preservation to complete sealing treatment, and can greatly improve the wear resistance and corrosion resistance of the micro-arc oxidation membrane layer, effectively reduce the contamination of the oxidation membrane layer, improve the electrical insulation performance of the oxidation membrane layer and improve the toughness of the membrane layer.
In addition, the invention discloses a method for sealing the surface of the micro-arc aluminum oxide, which comprises the following steps:
(1) the surface of the aluminum alloy is pretreated by sand blasting, water washing, alkali washing, water washing, acid washing and water washing;
(2) the method comprises the following steps of (1) performing micro-arc oxidation in electrolyte by taking aluminum alloy subjected to surface pretreatment as an anode to form a micro-arc oxidation film on the surface of the aluminum alloy, wherein the micro-arc oxidation solution consists of sodium hydroxide, sodium silicate, glycerol, disodium ethylene diamine tetraacetate and deionized water;
(3) removing the porous surface layer on the surface of the micro-arc oxidation film by one-time mechanical polishing;
(4) removing thermal stress through primary heat treatment;
(5) filling alumina sol in vacuum for one time to obtain amorphous alumina;
(6) secondary heat treatment: the heat treatment condition is air atmosphere at 550-580-oC, performing heat treatment for 3-4h to obtain gamma-aluminum oxide;
(7) filling alumina sol in vacuum for the second time to obtain amorphous alumina;
(6) and (3) third heat treatment: carrying out three times of heat treatment by using superheated steam;
(8) secondary mechanical polishing;
(9) acid washing and water washing.
The process comprises multiple heat treatment, filling treatment and polishing treatment, the hardness of the micro-arc aluminum oxide alloy material is 2538 +/-200 Hv, the corrosion resistance is 3700 +/-100 h, and the friction coefficient is 0.28 +/-0.2, although the hardness and the corrosion resistance of the micro-arc oxide film are obviously improved, the preparation process is relatively complex, the cost performance barrier is still obvious when the micro-arc aluminum oxide film is amplified to be applied industrially, and the simplification of the micro-arc oxidation hole sealing process needs to be solved.
Disclosure of Invention
Based on the problems in the prior art, the invention provides a simple method for processing a micro-arc oxidized aluminum material, which is simple, firstly proposes that hydration polishing is used for processing the micro-arc oxidized aluminum material, so that polishing and hole sealing are integrally realized, the corrosion resistance and the wear resistance of a micro-arc oxidation film can be effectively improved, and the surface roughness is reduced through polishing.
A simple micro-arc oxidation aluminum material treatment method comprises the following steps:
(1) the surface pretreatment of the aluminum alloy comprises sand blasting, water washing, alkali washing, water washing, acid washing and water washing.
(2) The method comprises the following steps of taking aluminum alloy subjected to surface pretreatment as an anode, carrying out micro-arc oxidation in electrolyte to form a micro-arc oxidation film on the surface of the aluminum alloy, wherein the micro-arc oxidation solution consists of sodium hydroxide, sodium silicate, glycerol, disodium ethylene diamine tetraacetate and deionized water.
(3) And (3) carrying out hydration polishing on the aluminum alloy subjected to micro-arc oxidation treatment, wherein the polishing disk is a diamond polishing disk, the polishing speed is 3000rpm, the polishing time is 5-15s, and the polishing pressure is 900 MPa.
(4) Stopping hydration polishing, separating the polishing disc from the micro-arc oxidized aluminum material, standing and sealing holes for 5-8 min.
(5) Secondary polishing, acid washing and water washing.
Further, the temperature of the water vapor for the hydration polishing in the step (3) is 130-150-oC, the standing temperature in the step (4) is 130-150-oC。
Further, the carrier gas of water vapor for hydration polishing is N2Or Ar.
Further, the removal amount of the polishing is 5 to 15 μm.
Further, the sand blasting: the quartz sand with the hardness of 385Hv has the grain diameter of 2-3mm and the air pressure of 0.3-0.5 Mpa.
Further, the alkali washing: NaOH 40-50g/L, sodium tartrate 2-4g/L, temperature 40-55oC, the time is 3-5 min.
Further, the acid washing: HNO 3250-300 g/L at 25-30oC, the time is 3-5 min.
Further, the micro-arc oxidation comprises 1-2g/L of sodium hydroxide, 8-12g/L of sodium silicate, 3-5ml/L of glycerol and 2-4g/L of disodium ethylene diamine tetraacetate.
Further, the micro-arc oxidation parameter current density is 6-10A/dm2The frequency is 450-500Hz, the duty ratio is 30-40%, and the positive-negative pulse ratio is 1:1The time interval is 20-40 min.
Further, the acid is washed by nitric acid in 15-17vol.%, HF in 1-1.5vol.%, and the temperature is room temperature for 5-10 min.
The preparation process and the principle of the simple micro-arc oxidation aluminum material treatment method are explained as follows:
(A) pretreatment of the aluminum alloy: regardless of the surface treatment process, cleaning the surface is the primary condition to achieve good results. Since the surface of the component sent to the surface treatment workshop usually has various defects of grinding marks, pits, burrs, scratches and the like, has lubricating oil marks or is covered with abrasive materials and some dirt to different degrees, the effective pretreatment can ensure that the micro-arc oxidation film has good corrosion resistance and has good bonding force with the surface of the substrate.
The pretreatment process adopted by the invention comprises sand blasting, water washing, alkali washing, water washing, acid washing and water washing.
Wherein, sand blasting: the quartz sand with the hardness of 385Hv has the particle size of 2-3mm and the air pressure of 0.3-0.5Mpa, is used for preliminarily removing an obvious oxidation film on the surface of a base material, flattening obvious defects of unevenness of a base plate metal part and improving the surface roughness of a workpiece.
Wherein, alkali washing: NaOH 40-50g/L, sodium tartrate 2-4g/L, temperature 40-55oC, time is 3-5min, and the alkali washing has two purposes: (1) degreasing: removal of grease from metal surfaces mainly by saponification: (C17H35COO)3C3H5+3NaOH→3C17H35COONa+C3H5(OH)3(ii) a (2) Removing the oxide film: al (Al)2O3+2NaOH→2NaAlO2+H2O, reaction of sodium hydroxide with aluminum base inevitably occurs during the removal of oxide film, and in order to avoid reaction of aluminum base with hydrogen hydroxide, it is necessary to strictly control the alkali washing time, and NaAlO known to those skilled in the art2Hydrolysis reactions can obviously occur: NaAlO2+2H2O → Al (OH)3+ NaOH, and therefore to avoid hydrolysis, the addition of sodium tartrate or like complexing agent which may be apparently consistent with NaAlO2Hydrolysis reaction of (3).
Wherein, acid washing: HNO 3250-300 g/L at 25-30oAnd C, for 3-5min, wherein the acid cleaning aims to remove gray substances on the metal surface, the gray substances can be precipitates after hydrolysis of sodium metaaluminate and can also be copper oxide formed by metals such as Cu in the aluminum alloy, and the gray substances must be removed, otherwise, the influence on subsequent micro-arc oxidation is large, so that the acid cleaning is an indispensable treatment step.
(B) Micro-arc oxidation: in the micro-arc oxidation, because the phenomena of glow discharge, spark discharge and the like can occur on the surface of the oxide film in the implementation process, the micro-arc oxidation is also called as electric spark discharge, so that the phase and the structure of the oxide layer with an amorphous structure are changed and are accompanied by alpha-Al2O3And gamma Al2O3The typical micro-arc oxidation film structure generally comprises the following components: such asFIG. 1 of the drawingsIt shows that the porous surface layer has high porosity (usually 10-15%), and gamma-Al2O3The porous layer has a high porosity and thus a low hardness, usually 400-500Hv, and thus the porous layer does not contribute to the high wear resistance or corrosion resistance of the micro-arc oxide film, and therefore needs to be polished and removed, the thickness of the porous layer is about 30 μm, and the micro-arc oxide film contacting the surface layer has a higher porosity and a lower hardness, and thus needs to be polished later.
The second layer is a low-density hardness layer which is a main technical contribution layer of the micro-arc oxidation film and mainly comprises the alpha-Al2O3And a small amount of gamma-Al2O3The thickness of the low-density hardness layer is within the range of 100-300 mu m, the porosity is usually maintained at 2-5%, and the contribution of the low-density hardness layer to the hardness of the micro-arc oxidation film is 1500-2000Hv depending on the electrolysis parameters of the micro-arc oxidation.
The transition layer is closest to the substrate, has a thickness of about 2-5 μm, and is engaged with the substrate, and has a porosity generally higher than that of the low-density hard layer and lower than that of the porous surface layer.
The micro-arc oxidation of the invention comprises 1-2g/L sodium hydroxide and 812g/L of sodium silicate, 3-5ml/L of glycerol, 2-4g/L of disodium ethylene diamine tetraacetate and current density of 6-10A/dm2The frequency is 450-500Hz, the duty ratio is 30-40%, the positive-negative pulse ratio is 1:1, and the time is 20-40 min.
The performance of the micro-arc oxidation film layer is related to the components and the phase structure of the micro-arc oxidation film layer, the components and the phase structure of the film layer are in great relation to the components and the matrix of electrolyte used in the test, wherein 1-2g/L of sodium hydroxide is taken as a basic component, 8-12g/L of sodium silicate is taken as a passivating agent, the passivating agent can promote the formation of a barrier type oxidation film and can more easily passivate the matrix metal, so that the breakdown phenomenon occurs and the micro-arc oxidation starts, wherein glycerol OH-The conductivity of the solution can be improved by the conductive agent, the dispersity of the micro-arc oxidation solution can be improved by the glycerol, the stability of the pH values of the solution and the solution can be improved by the disodium ethylene diamine tetraacetate stabilizer, and the disodium ethylene diamine tetraacetate stabilizer is used for complexing metal ions in the electrolyte.
The current density is 6-10A/dm2: the current density is an important parameter in the micro-arc oxidation process, and has great influence on the structure and the appearance of the micro-arc oxidation film layer. For example, the current density seriously affects the increase of the thickness of the micro-arc oxidation film layer, the thickening speed of the oxidation film and the dense layer thereof is increased with the increase of the current density, but the proportion of the dense layer is gradually reduced, and in the constant current mode, when the current density is higher, the spark discharge intensity is gradually increased but the number of sparks is gradually reduced, so the formed film layer is relatively rough.
The frequency is 450-500 Hz: the low frequency represents that the pulse energy lasts longer in a single period, the time of spark discharge is increased, the growth speed of the film is higher, for example, the higher the frequency is, the larger the number of micropores of the film is, the more uniform the distribution is, and the pore diameter is reduced along with the increase of the frequency.
Duty cycle 30-40%: the increase of the duty ratio can improve the spark discharge energy, so that the porosity of the film layer is improved, and the improvement of the porosity can reduce the strength of the anodic oxide film, for example, the micro-arc sparks are more in quantity under the low duty ratio, and the generated film layer has smaller micropores; at high duty cycles the spark discharge becomes intense and the film is relatively rough.
The time is 20-40 min: the micro-arc oxidation time mainly influences the roughness and the thickness of the micro-arc oxidation film, and the micro-arc oxidation film has long time, thick thickness and obviously improved roughness in a certain time range.
The surface appearance of the aluminum alloy after the micro-arc oxidation film treatment is shown in figure 2.
(C) Hydration and polishing: the polishing disc is a diamond polishing disc, the polishing speed is 3000rpm, the polishing time is 5-15s, and the polishing pressure is 900 MPa; the water vapor temperature of the hydration polishing is 130-150-oC。
First, with respect to hydration polishing: hydration polishing is a novel efficient, ultra-precise polishing method that utilizes hydration reactions that occur at the workpiece interface. The polishing machine is mainly characterized in that abrasive particles and processing liquid are not used, and the processing device is similar to the currently used polishing machine and only processes in a water vapor environment. Therefore, materials that react with the workpiece in a solid phase are avoided as much as possible. On a common polishing machine, a heat-resistant material cover is added to the part of a polished workpiece, so that the workpiece is polished in a superheated water vapor medium. By heating, the temperature of the water vapor medium can be adjusted. The workpiece holder reciprocates on the polishing pad as the polishing pad rotates. During the hydration polishing process, the two objects generate relative friction, high temperature and high pressure are generated in a contact area, and atoms or molecules on the surface of the workpiece are activated. The surface of the material is acted by superheated water swallow gas molecules and water to form a hydration layer on the interface. The hydration layer is separated and removed from the surface of the workpiece by superheated water vapor (instead of free abrasive particles) or by external friction under the condition of one atmosphere of water vapor, and in short, the hydration polishing is performed with the workpiece by a polishing disc and then the hydration layer is removed.
However, the above limitations of the hydration polishing provide excellent reaction sites for sealing the micro-arc oxide film, and the following reasons are specifically:
the main reason for influencing micro-arc oxidation in the prior art is that the micro-arc oxidation film has micro-pores, and the micro-arc oxidation film is formed by the traditional hole sealing means, such as high-temperature steam heat treatment, 100-type and 120-typeoC superheated steam, forming Al on the surface of the pore channel2O3H2O (AlOOH) expands 25 to 30 percent in volume to realize hole sealing, but the hole sealing is only suitable for small holes of anodic oxidation and is not suitable for micro-arc oxidized micro-holes. During the hydration polishing process, there are two key factors: (1) polishing; (2) superheated water vapor, wherein for polishing: the high-speed rotation of the polishing disk rubs with the porous surface layer of the micro-arc oxidation film to generate high temperature, the hardness of the surface layer of the micro-arc oxidation film is usually lower than 1000Hv, under the action of strong and quick polishing friction force, the convex part is cut and flows, the concave part is filled by the cut fragments, so that the porosity of the surface of the micro-arc oxidation film is reduced, and the micro-arc oxidation film becomes flat step by step, namely, in the polishing process, part of the fragments are filled in the micropores of the micro-arc oxidation film, so that the gaps of the pore channels of the micro-arc oxidation film are reduced, namely, two processes occur in the hydration polishing process: debris fills the pores, and water vapor expands to fill the pores.
(D) Stopping hydration polishing, separating the polishing disc from the micro-arc oxidized aluminum material, standing and sealing holes for 5-8min, wherein the standing temperature in the step (4) is 130-oC, after hydration polishing, although hole sealing effect can be generated under the action of water vapor, the strong friction force of polishing can also move scraps or grind the base material again, so that hydration polishing needs to be stopped, standing hole sealing is carried out, the hole sealing effect is fully generated on gaps between the scraps and micropores, and then the hole sealing effect is realized.
(E) Secondary mechanical polishing: as mentioned above, hydration polishing can obtain a high-precision polished surface, but because the subsequent standing sealing still causes the bulge or expansion of the sealing alumina at the gap, which affects the polishing precision of the micro-arc oxide film, secondary polishing is required to obtain the micro-arc oxide film with high precision and low roughness.
(F) Acid washing and water washing: nitric acid 15-17vol.%, HF 1-1.5vol.%, room temperature, 5-10min, etching to remove particulate alumina that is not removed by partial polishing.
The scheme of the invention has the following beneficial effects:
(1) the invention firstly proposes that hydration polishing is used for treating the micro-arc oxidation aluminum alloy material, and the porosity of surface micro-arc oxidation is effectively reduced through hydration polishing.
(2) The integrated process of polishing and hole sealing is realized through hydration polishing, and the preparation process is simple, high in efficiency and high in cost performance.
(3) The hardness and the corrosion resistance of the micro-arc oxidation film are effectively improved and the roughness is reduced through hydration and polishing.
Drawings
FIG. 1 is a SEM image of a cross section of an aluminum alloy subjected to micro-arc oxidation treatment according to the invention.
FIG. 2 is an SEM image of the surface of the aluminum alloy treated by micro-arc oxidation according to the present invention.
FIG. 3 is a SEM image of the invention after hydration polishing for 5 s.
FIG. 4 is a SEM image of the invention after hydration polishing for 10 s.
FIG. 5 is a SEM image of the invention after hydration polishing for 15 s.
FIG. 6 is an SEM image of the invention subjected to hydration polishing for 15s + standing hole sealing.
FIG. 7 is a SEM image of the low roughness obtained by the process of the present invention.
Detailed Description
As shown in fig. 3, fig. 4 and fig. 5, which respectively represent SEM images of 5s, 10s and 15s after hydration polishing, the sealing efficiency is higher with long time of hydration polishing, and simultaneously with the reduction of surface roughness, but a large amount of new pores still exist on the surface of the aluminum alloy, and fine pores which are not filled with chips or incompletely sealed are still present on the surface of the aluminum alloy, and the fine pores are further sealed by standing, but part of bulges are generated due to sealing, and after secondary polishing, a micro-arc oxide film with low porosity and high polishing degree is obtained as shown in fig. 7.
Example 1
A simple micro-arc oxidation aluminum material treatment method comprises the following steps:
(1) the surface pretreatment of the aluminum alloy comprises sand blasting, water washing, alkali washing, water washing, acid washing and water washing.
The sand blasting: the quartz sand with the hardness of 385Hv has the grain diameter of 2mm, and the air pressure is 0.3 Mpa.
And (3) alkali washing: NaOH 40g/L, sodium tartrate 2g/L, temperature 40oC, time 3 min.
Acid washing: HNO 3250 g/L, temperature 25oC, time 3 min.
(2) The aluminum alloy subjected to surface pretreatment is taken as an anode, micro-arc oxidation is carried out in electrolyte to form a micro-arc oxidation film on the surface of the aluminum alloy, the micro-arc oxidation comprises 1g/L sodium hydroxide, 8g/L sodium silicate, 3ml/L glycerol, 2g/L disodium ethylene diamine tetraacetate, and the oxidation parameter current density is 6A/dm2The frequency is 450Hz, the duty ratio is 30 percent, the positive-negative pulse ratio is 1:1, and the time is 20 min.
(3) Carrying out hydration polishing on the aluminum alloy subjected to micro-arc oxidation treatment, wherein the polishing disk is a diamond polishing disk, the polishing speed is 2000rpm, the polishing time is 5s, the polishing pressure is 600Mpa, and the water vapor temperature is 130-oC；
(4) Stopping hydration polishing, separating the polishing disc from the micro-arc oxidized aluminum material, standing and sealing holes for 5min at the standing temperature of 130 DEGoC；
(5) Secondary polishing, secondary mechanical polishing to alpha-Al2O3The polishing solution of (a), the alpha-Al2O3The grain diameter of the polishing solution is 500nm, and the polishing time is 3 min.
(6) Acid washing, water washing, wherein the acid washing is nitric acid 15vol.%, HF 1vol.%, room temperature and 5 min.
Example 2
A simple micro-arc oxidation aluminum material treatment method comprises the following steps:
(1) and (4) pretreating the surface of the aluminum alloy.
Sand blasting: the quartz sand with the hardness of 385Hv has the grain diameter of 2.5mm, and the air pressure is 0.4 Mpa.
Alkali washing: NaOH 45g/L, sodium tartrate 3g/L, temperature 47oC, time 4 min.
Acid washing: HNO 3275 g/L, temperature 27.5oC, time 4 min.
(2) The aluminum alloy subjected to surface pretreatment is used as an anode, and micro-arc oxidation is carried out in electrolyte to form a micro-arc oxidation film on the surface of the aluminum alloy: micro-arc oxidation parameters: 1.5g/L sodium hydroxide, 10g/L sodium silicate, 4ml/L glycerol, 3g/L disodium ethylene diamine tetraacetate and current density of 8A/dm2The frequency is 475Hz, the duty ratio is 35%, the positive-negative pulse ratio is 1:1, and the time is 30 min.
(3) Performing hydration polishing on the aluminum alloy subjected to micro-arc oxidation treatment, wherein the polishing disk is a diamond polishing disk, the polishing speed is 2500rpm, the polishing time is 10s, the polishing pressure is 750Mpa, and the water vapor temperature is 140 DEG CoC；
(4) Stopping hydration and polishing, separating the polishing disc from the micro-arc oxidized aluminum material, standing and sealing holes for 6.5min at the standing temperature of 140oC；
(5) Secondary polishing, secondary mechanical polishing to alpha-Al2O3The polishing solution of (a), the alpha-Al2O3The particle diameter of (2) is 650nm, and the polishing time is 4 min.
(6) Acid washing, water washing, wherein the acid washing is nitric acid 16vol.%, HF 1.25vol.%, and room temperature is 7.5 min.
Example 3
A simple micro-arc oxidation aluminum material treatment method comprises the following steps:
(1) the surface pretreatment of the aluminum alloy comprises sand blasting, water washing, alkali washing, water washing, acid washing and water washing.
The sand blasting: the quartz sand with the hardness of 385Hv has the grain diameter of 3mm, and the air pressure is 0.5 Mpa.
And (3) alkali washing: NaOH 50g/L, sodium tartrate 4g/L, temperature 55oC, time 5 min.
Acid washing: HNO 3300 g/L, temperature 30oC, time 5 min.
(2) The aluminum alloy after surface pretreatment is taken as an anode, and micro-arc oxidation is carried out in electrolyteForming a micro-arc oxidation film on the surface of the aluminum alloy, wherein the micro-arc oxidation comprises 2g/L sodium hydroxide, 12g/L sodium silicate, 5ml/L glycerol and 4g/L disodium ethylene diamine tetraacetate, and the oxidation parameter current density is 10A/dm2The frequency is 500Hz, the duty ratio is 40%, the positive-negative pulse ratio is 1:1, and the time is 40 min.
(3) Carrying out hydration polishing on the aluminum alloy subjected to micro-arc oxidation treatment, wherein the polishing disk is a diamond polishing disk, the polishing speed is 3000rpm, the polishing time is 15s, the polishing pressure is 900Mpa, and the water vapor temperature is 150 MPaoC；
(4) Stopping hydration polishing, separating the polishing disc from the micro-arc oxidized aluminum material, standing and sealing holes for 8min at the standing temperature of 150oC；
(5) Secondary polishing, secondary mechanical polishing to alpha-Al2O3The polishing solution of (a), the alpha-Al2O3The grain diameter of the polishing solution is 800nm, and the polishing time is 5 min.
(6) Acid washing, water washing, wherein the acid washing is 17vol.% of nitric acid, 1.5vol.% of HF, room temperature and 10 min.
Comparative example 1
A hole sealing method for an aluminum alloy micro-arc oxidation film comprises the following processing steps:
(1) and (4) pretreating the surface of the aluminum alloy.
Sand blasting: the quartz sand with the hardness of 385Hv has the grain diameter of 2.5mm, and the air pressure is 0.4 Mpa.
Alkali washing: NaOH 45g/L, sodium tartrate 3g/L, temperature 47oC, time 4 min.
Acid washing: HNO 3275 g/L, temperature 27.5oC, time 4 min.
(2) The aluminum alloy subjected to surface pretreatment is used as an anode, and micro-arc oxidation is carried out in electrolyte to form a micro-arc oxidation film on the surface of the aluminum alloy: micro-arc oxidation parameters: 1.5g/L sodium hydroxide, 10g/L sodium silicate, 4ml/L glycerol, 3g/L disodium ethylene diamine tetraacetate and current density of 8A/dm2The frequency is 475Hz, the duty ratio is 35%, the positive-negative pulse ratio is 1:1, and the time is 30 min.
(3) Removing the porous surface layer on the surface of the micro-arc oxidation film by one-time mechanical polishing: the mechanical polishing is an artificial diamond grinding wheel, the grinding thickness is 6.5 mu m, the grinding speed of the diamond is 15m/s, and the grain diameter of the diamond on the surface of the grinding wheel is 3.5 microns.
(4) And (3) heat treatment: high temperature steam Heat treatment, 120oC, overheating water vapor for 13 min;
(5) acid washing, water washing, wherein the acid washing is nitric acid 16vol.%, HF 1.25vol.%, and room temperature is 7.5 min.
From the above, it can be concluded that extremely low surface roughness is obtained by high precision hydrated polishing treatment, although the subsequent sealing process will cause protrusions at the sealing holes, which are easy to polish and remove, and the friction coefficient and roughness are much lower than those of the similar invention by secondary polishing, and the main contribution is from hydrated polishing.
But the porosity of the micro-arc oxidation film is maintained at 2-3%, and the corrosion resistance of a 5% NaCl salt spray test is 2730h due to low porosity, so that the hole sealing process does not greatly contribute to the hardness of the micro-arc oxidation film.
Although the present invention has been described above by way of examples of preferred embodiments, the present invention is not limited to the specific embodiments, and can be modified as appropriate within the scope of the present invention.
Claims (10)
1. A simple micro-arc oxidation aluminum material processing method is characterized by comprising the following steps:
(1) the surface of the aluminum alloy is pretreated by sand blasting, water washing, alkali washing, water washing, acid washing and water washing;
(2) the method comprises the following steps of (1) performing micro-arc oxidation in electrolyte by taking aluminum alloy subjected to surface pretreatment as an anode to form a micro-arc oxidation film on the surface of the aluminum alloy, wherein the micro-arc oxidation solution consists of sodium hydroxide, sodium silicate, glycerol, disodium ethylene diamine tetraacetate and deionized water;
(3) carrying out hydration polishing on the aluminum alloy subjected to micro-arc oxidation treatment, wherein the polishing disk is a diamond polishing disk, the polishing speed is 3000rpm, the polishing time is 5-15s, and the polishing pressure is 900 MPa;
(4) stopping hydration polishing, separating the polishing disc from the micro-arc oxidized aluminum material, standing and sealing holes for 5-8 min;
(5) secondary polishing, acid washing and water washing.
2. The method as claimed in claim 1, wherein the temperature of the vapor in the step (3) is 130-oC, the standing temperature in the step (4) is 130-150-oC。
3. The simple micro-arc oxidation aluminum material processing method as set forth in claim 2, characterized in that the hydrated and polished water vapor carrier gas is N2Or Ar.
4. The method for processing a simple micro-arc oxidized aluminum material as recited in claim 2, wherein the removal amount of the hydrated finish is 5 to 15 μm.
5. The simple micro-arc oxidation aluminum material processing method as set forth in claim 1, characterized in that the sand blasting: the quartz sand with the hardness of 385Hv has the grain diameter of 2-3mm and the air pressure of 0.3-0.5 Mpa.
6. The simple micro-arc oxidation aluminum material treatment method as set forth in claim 1, characterized in that the alkali washing: NaOH 40-50g/L, sodium tartrate 2-4g/L, temperature 40-55oC, time is 3-5min, and acid washing: HNO 3250-300 g/L at 25-30oC, the time is 3-5 min.
7. The simple micro-arc oxidation aluminum material processing method as set forth in claim 1, characterized in that the micro-arc oxidation comprises 1-2g/L sodium hydroxide, 8-12g/L sodium silicate, 3-5ml/L glycerol, and 2-4g/L disodium ethylene diamine tetraacetate.
8. As claimed in claim1, the simple micro-arc oxidation aluminum material processing method is characterized in that the micro-arc oxidation parameter current density is 6-10A/dm2The frequency is 450-500Hz, the duty ratio is 30-40%, the positive-negative pulse ratio is 1:1, and the time is 20-40 min.
9. The method for processing simple micro-arc oxidized aluminum material according to claim 1, wherein the secondary mechanical polishing is alpha-Al containing2O3The polishing solution of (a), the alpha-Al2O3The particle size of the polishing solution is 500-800nm, and the polishing time is 3-5 min.
10. The method for treating a simple micro-arc oxidized aluminum material as recited in claim 1, wherein the acid washing is performed for 15-17vol.% of nitric acid, 1-1.5vol.% of HF, room temperature, and 5-10 min.
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