CN112680093A - Solvent-free type photocuring resin composition and preparation method and application thereof - Google Patents

Solvent-free type photocuring resin composition and preparation method and application thereof Download PDF

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CN112680093A
CN112680093A CN202011566841.0A CN202011566841A CN112680093A CN 112680093 A CN112680093 A CN 112680093A CN 202011566841 A CN202011566841 A CN 202011566841A CN 112680093 A CN112680093 A CN 112680093A
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solvent
parts
resin composition
acrylate monomer
mixing
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储磊
牛牧
唐方正
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Shanghai Huilan Material Technology Co ltd
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Abstract

The invention provides a solvent-free type light-cured resin composition, a preparation method and an application thereof, wherein the solvent-free type light-cured resin composition comprises the following components in parts by weight: 1-40 parts of acrylic resin, 1-30 parts of a first acrylate monomer, 1-30 parts of a second acrylate monomer, 1-15 parts of a photoinitiator and 1-10 parts of an antistatic agent; by selecting the combination of the first acrylate monomer and the second acrylate monomer, the solvent-free type photocuring resin composition has lower viscosity and higher refractive index, does not volatilize a large amount of solvent when in use, greatly improves the environmental protection performance, and can be produced and used in a large range.

Description

Solvent-free type photocuring resin composition and preparation method and application thereof
Technical Field
The invention belongs to the technical field of resin materials, and particularly relates to a solvent-free photocuring resin composition as well as a preparation method and application thereof.
Background
With the enhancement of the environmental awareness of human beings, environmental regulations are established for the discharge of VOC (volatile organic compounds) in various countries, and the limited discharge standard is becoming stricter, aiming at encouraging the popularization and use of new products which are green, environment-friendly, energy-saving and emission-reducing. At present, the manufacturing and production mode of the brightening back coating film is mainly coating production in a wet coating (adding a diluting solvent) mode, a large amount of solvent is volatilized when the brightening back coating film is dried by an oven in the production process, pollution is easily caused, the equipment price of VOC (volatile organic compound) post-treatment is high, and the enterprise cost is correspondingly increased. Therefore, in the field of coating application, development and application of safe and low VOC UV curing, powder and high-solid environment-friendly coatings, and the like are imperative.
At present, many researches and reports on the application of the UV curing technology in the aspect of coatings exist in China. CN103232782A discloses an ultraviolet-curing environment-friendly solvent-free acrylate conformal coating for surface coating of electronic products, which is prepared from the following components in percentage by weight: 15-30% of trifunctional polyurethane acrylate, 5-30% of high-functional acrylate monomer, 5-40% of (methyl) acrylic modified organic silicon, 10-40% of acrylic active monomer, 2-10% of photoinitiator, 0.1-1% of polymerization inhibitor and 0-1% of other additives. CN103725245A discloses a solvent-free UV curing glue for an optical transparent adhesive tape, a preparation method and application thereof; the glue comprises the following components in parts by mass: 20-60 parts of aliphatic polyurethane acrylate, 5-15 parts of hyperbranched polyester acrylate, 10-25 parts of acrylate monomer, 1-10 parts of mercaptan, 1-10 parts of tackifying resin, 0.1-1 part of flatting agent, 0.5-2 parts of defoaming agent and 0.5-2 parts of photoinitiator. According to the invention, the low-functionality aliphatic polyurethane acrylate is preferably selected, and the hyperbranched polyester acrylate is added to improve the crosslinking density and the strength of colloid; the acrylate monomer is used for adjusting the viscosity and increasing the colloid strength; the ether structure-containing mercaptan is added to improve the cohesiveness, and the solvent-free UV curing glue for the optical transparent adhesive tape, which has the advantages of high flexibility, high light transmittance, low haze, high colloid strength, high cohesiveness, high thickness and low VOC, is prepared. CN103450793A discloses a solvent-free environment-friendly disposable UV colored spray coating, which comprises the following components in percentage by weight: 2-membered aliphatic urethane acrylate: 25-27%, 3-membered aliphatic urethane acrylate: 18-20%, 6-membered aliphatic urethane acrylate: 8-9%, 3-4% of 6-functional monomer and 10-11% of 3-functional monomer; 8-9% of 2-functional monomer, 8-9% of monofunctional monomer, and a dispersant: 0.5-1%, leveling agent: 0.3-0.5%, 0.2-0.5% of a substrate wetting agent, and dye or pigment: 3-15% of surface layer UV photoinitiator and 1-2% of deep layer UV photoinitiator. The solvent-free environment-friendly disposable UV colored spraying coating is free of solvent when in use, and has no toxic gas emission, environment friendliness and no pollution. However, the UV curable coating or glue still has the problem of too high viscosity and is not easy to coat, which undoubtedly increases the processing difficulty and is not suitable for mass industrial production.
Therefore, the development of a solvent-free photocurable resin composition with low viscosity and easy coating is an urgent problem to be solved.
Disclosure of Invention
Aiming at the defects of the prior art, the invention aims to provide a solvent-free type photocuring resin composition, a preparation method and an application thereof, wherein the solvent-free type photocuring resin composition comprises a combination of acrylic resin, a first acrylate monomer, a second acrylate monomer, a photoinitiator and an antistatic agent, the combination of the first acrylate monomer and the second acrylate monomer is selected, so that the solvent-free type photocuring resin composition has lower viscosity and higher refractive index, a brightening back coating film can be prepared by copying the structure of an atomizing roller (Matte roller) and a UV curing process, a large amount of solvent is not volatilized in the production process, and the environmental protection performance is greatly improved. In order to achieve the purpose, the invention adopts the following technical scheme:
in a first aspect, the present invention provides a solvent-free photocurable resin composition, which comprises the following components in parts by weight: 1-40 parts of acrylic resin, 1-30 parts of first acrylate monomer, 1-30 parts of second acrylate monomer, 1-15 parts of photoinitiator and 1-10 parts of antistatic agent.
The acrylic resin may be 4 parts by weight, 8 parts by weight, 12 parts by weight, 16 parts by weight, 20 parts by weight, 24 parts by weight, 28 parts by weight, 32 parts by weight, 36 parts by weight, 40 parts by weight, or the like.
The first acrylate monomer may be 3 parts by weight, 6 parts by weight, 9 parts by weight, 11 parts by weight, 14 parts by weight, 17 parts by weight, 20 parts by weight, 23 parts by weight, 26 parts by weight, 29 parts by weight, or the like.
The second acrylate monomer may be 3 parts by weight, 6 parts by weight, 9 parts by weight, 11 parts by weight, 14 parts by weight, 17 parts by weight, 20 parts by weight, 23 parts by weight, 26 parts by weight, 29 parts by weight, or the like.
The photoinitiator may be 2 parts by weight, 4 parts by weight, 6 parts by weight, 8 parts by weight, 10 parts by weight, 12 parts by weight, 14 parts by weight, or the like.
The antistatic agent may be 1 part by weight, 2 parts by weight, 3 parts by weight, 4 parts by weight, 5 parts by weight, 6 parts by weight, 7 parts by weight, 8 parts by weight, 9 parts by weight, or the like.
The solvent-free type photocuring resin composition provided by the invention comprises a combination of acrylic resin, a first acrylate monomer, a second acrylate monomer, a photoinitiator and an antistatic agent, wherein the combination of the first acrylate monomer and the second acrylate monomer is selected, so that the solvent-free type photocuring resin composition has lower viscosity, and the photoinitiator is added, so that the solvent-free type photocuring resin composition has higher refractive index, a large amount of solvent is not volatilized, the environmental protection performance is greatly improved, and the solvent-free type photocuring resin composition is suitable for large-scale application.
Preferably, the acrylic resin includes any one of polyester acrylic resin, urethane acrylic resin or epoxy acrylic resin or a combination of at least two thereof.
The acrylic resin can be selected from any one or a combination of at least two of American PU210, American PU340, American PU610, American PE230, American EA2235, American EA2259 or American ME2110, Zhanxin EB230, Zhanxin EB284, Zhanxin EB1291, Zhanxin EB4201, Zhanxin EB605/20, Changxing 6103, Changxing 6112-100, Changxing 6113, Changxing 620-100, Changxing 621A-80 or Changxing 6313-100.
Preferably, the first acrylate monomer includes any one of hydroxyethyl methacrylate, hydroxyethyl acrylate or hydroxypropyl acrylate or a combination of at least two thereof.
Preferably, the second acrylate monomer includes any one of 1, 6-hexanediol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, ethoxylated bisphenol a diacrylate, pentaerythritol triacrylate, or trimethylolpropane triacrylate, or a combination of at least two thereof.
Preferably, the mass of the first acrylate monomer and the second acrylate monomer is 1 (0.5-1.5), such as 1:0.6, 1:0.7, 1:0.8, 1:0.9, 1:1, 1:1.1, 1:1.2, 1:1.3, or 1: 1.4.
According to the preferable technical scheme, when the mass of the first acrylate monomer and the mass of the second acrylate monomer are 1 (0.5-1.5), the first acrylate monomer and the second acrylate monomer are matched with each other, so that the solvent-free type photo-curing resin composition has lower viscosity, and is easier to coat during processing, if the first acrylate monomer is used in an excessive amount, the performance of a paint film is influenced after the resin is cured to form the film, for example, the curing reaction speed is slowed, the surface of the paint film is sticky, the adhesion is poor, and the hardness of the paint film is reduced; if the amount of the second type acrylate monomer is too large, the viscosity of the resin composition may increase due to a large viscosity of the second type acrylate monomer relative to the first type acrylate monomer, and the coating speed may be affected by the excessive amount of the second type acrylate monomer.
Preferably, the photoinitiator comprises any one or a combination of at least two of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 1-hydroxycyclohexyl phenyl ketone, 2,4, 6-trimethylbenzoyl-diphenyl phosphine oxide, ethyl 2,4, 6-trimethylbenzoyl phenyl phosphonate, phenyl bis (2,4, 6-trimethylbenzoyl) phosphine oxide or methyl benzoylformate.
Preferably, the antistatic agent comprises a salt ionic antistatic agent and/or a non-ionic antistatic agent, for example, any one or a combination of at least two of Craine SAS93, Heda 129V, Cyanote 609, SN, Tatay Chaowei CF-1101 or 1107 can be selected.
Preferably, the solvent-free photocurable resin composition further comprises an auxiliary agent.
Preferably, the solvent-free photocurable resin composition contains 1 to 10 parts by weight of an auxiliary, such as 1 part by weight, 2 parts by weight, 3 parts by weight, 4 parts by weight, 5 parts by weight, 6 parts by weight, 7 parts by weight, 8 parts by weight or 9 parts by weight, and the specific values therebetween are not exhaustive, and for the sake of brevity, the specific values included in the range are not limited by the disclosure.
Preferably, the auxiliary agent comprises a modified organic silicon auxiliary agent, for example, any one or a combination of at least two of TEGO RAD2200N, ZG400, BYK-333, BYK-3500, BYK-3505, BYK-3530 and BYK-3510 can be selected.
In a second aspect, the present invention provides a method for preparing the solvent-free photocurable resin composition according to the first aspect, the method comprising the steps of:
(1) mixing a first acrylate monomer, a second acrylate monomer and a photoinitiator to obtain a first mixture;
(2) mixing an acrylic resin and the first mixture obtained in the step (1) to obtain a second mixture;
(3) and (3) mixing the second mixture obtained in the step (2), an antistatic agent and an optional auxiliary agent, and filtering to obtain the solvent-free type photocuring resin composition.
Preferably, the mixing in step (1) and step (2) is carried out under the condition of keeping out light.
Preferably, the mixing temperature in step (1), step (2) and step (3) is 20-40 ℃, such as 22 ℃, 24 ℃, 26 ℃, 28 ℃, 30 ℃, 32 ℃, 34 ℃, 36 ℃ or 38 ℃, and the specific values therebetween are limited by space and for the sake of brevity, and the invention is not exhaustive of the specific values included in the ranges.
Preferably, the mixing time of step (1), step (2) and step (3) is 30-60 min, such as 33min, 36min, 39min, 42min, 45min, 48min, 51min, 53min, 56min or 59min, and the specific point values between the above point values are limited to space and for the sake of brevity, and the invention is not exhaustive.
Preferably, the mixing in step (1), step (2) and step (3) is carried out under stirring.
Preferably, the rotation speeds of the stirring are each independently 500 to 700rpm, such as 520rpm, 540rpm, 560rpm, 580rpm, 600rpm, 620rpm, 640rpm, 660rpm or 680rpm, and specific points therebetween, which are not exhaustive for the invention and are included in the range for brevity.
As a preferred technical scheme, the preparation method comprises the following steps:
(1) mixing a first acrylate monomer, a second acrylate monomer and a photoinitiator in a dark place for 30-60 min under the stirring conditions of 20-40 ℃ and 500-700 rpm to obtain a first mixture;
(2) mixing acrylic resin and the first mixture obtained in the step (1) for 30-60 min in a dark place under the stirring conditions of 20-40 ℃ and 500-700 rpm to obtain a second mixture;
(3) and (3) mixing the second mixture obtained in the step (2), an antistatic agent and an optional auxiliary agent for 30-60 min under the stirring conditions of the temperature of 20-40 ℃ and the rotating speed of 500-700 rpm, and filtering to obtain the solvent-free photocuring resin composition.
In a third aspect, the present invention provides a solvent-free photocurable resin composition as described in the first aspect for use in a brightness enhancement film.
Compared with the prior art, the invention has the following beneficial effects:
(1) the solvent-free type light-cured resin provided by the invention has the advantages that the solvent-free type light-cured resin composition has lower viscosity and higher refractive index, is easy to coat and copy the structure of a Matte mold roller and is suitable for the production of a brightness enhancement film back coating film from low haze to high haze by the combination of acrylic resin, a first acrylate monomer, a second acrylate monomer, a photoinitiator and an antistatic agent and the combination of the first acrylate monomer and the second acrylate monomer.
(2) Specifically, the solvent-free photocurable resin composition provided by the invention has the viscosity of 100-180 CPS and the refractive index of 1.48nD25The adhesive force of the grids can reach 5B, and the surface resistance can reach 1011Omega/edge, pencil hardnessThe degree is H-2H, compared with the existing solvent type brightness enhancement film back coating resin, the light diffusion particles do not need to be additionally added, a large amount of solvent is not volatilized in the production process, the environmental protection performance is greatly improved, and the solvent type brightness enhancement film back coating resin can be produced and used in a large range.
Detailed Description
The technical solution of the present invention is further explained by the following embodiments. It should be understood by those skilled in the art that the examples are only for the understanding of the present invention and should not be construed as the specific limitations of the present invention.
Examples 1 to 5
A solvent-free type light-cured resin composition comprises the following specific components shown in Table 1, wherein the dosage unit of each component is 'part by weight';
TABLE 1
Figure BDA0002861897180000071
Figure BDA0002861897180000081
The preparation method comprises the following steps:
(1) mixing hydroxyethyl methacrylate, hydroxypropyl acrylate and methyl benzoylformate at stirring speed of 600rpm at 30 deg.C in dark for 40min to obtain a first mixture;
(2) mixing polyurethane acrylic resin (Meiyuan PU210) and the first mixture obtained in the step (1) at 30 ℃ and under the stirring condition of the rotating speed of 600rpm for 40min in a dark place to obtain a second mixture;
(3) and (3) mixing the second mixture obtained in the step (2), the antistatic agent and the auxiliary agent ZG400 for 40min under the stirring conditions of 30 ℃ and 600rpm, and filtering to obtain the solvent-free photocurable resin composition.
Example 6
A solvent-free photocurable resin composition was distinguished from example 1 only in that hydroxyethyl methacrylate was added in an amount of 20 parts by weight, pentaerythritol triacrylate was added in an amount of 10 parts by weight, and the other components, amounts and preparation methods were the same as in example 1.
Example 7
A solvent-free photocurable resin composition was distinguished from example 1 only in that hydroxyethyl methacrylate was added in an amount of 12 parts by weight, pentaerythritol triacrylate was added in an amount of 18 parts by weight, and the other components, amounts and preparation methods were the same as in example 1.
Example 8
A solvent-free photocurable resin composition was distinguished from example 1 only in that hydroxyethyl methacrylate was added in an amount of 25 parts by weight, pentaerythritol triacrylate was added in an amount of 5 parts by weight, and the other components, amounts and preparation methods were the same as in example 1.
Example 9
A solvent-free photocurable resin composition was distinguished from example 1 only in that hydroxyethyl methacrylate was added in an amount of 10 parts by weight, pentaerythritol triacrylate was added in an amount of 20 parts by weight, and the other components, amounts and preparation methods were the same as in example 1.
Comparative example 1
A solvent-free photocurable resin composition was distinguished from example 1 only in that hydroxyethyl methacrylate was added in an amount of 30 parts by weight, pentaerythritol triacrylate was not added, and the other components, amounts and preparation methods were the same as in example 1.
Comparative example 2
A solvent-free photocurable resin composition was distinguished from example 1 only in that hydroxyethyl methacrylate was not added, pentaerythritol triacrylate was added in an amount of 30 parts by weight, and the other components, amounts and preparation methods were the same as in example 1.
And (3) performance testing:
(1) viscosity: the test was carried out according to GB/T22235-;
(2) refractive index: testing is carried out according to GB/T6488-;
(3) and (3) hundred-lattice adhesive force: testing is carried out according to GB/T9286-1998 test for marking out paint films of colored paint and varnish;
(4) surface resistance: testing according to GBT1410-2006 volume resistivity and surface resistivity test method for solid insulating materials;
(5) pencil hardness: GBT6739-1996 test according to "pencil hardness test for film coating".
The solvent-free photocurable resin compositions provided in examples 1 to 9 and comparative examples 1 to 2 were tested according to the above test methods, and the test results are shown in table 2:
TABLE 2
Figure BDA0002861897180000101
As can be seen from the data in table 2:
the solvent-free photocurable resin composition provided by the invention has the advantages of low viscosity, high refractive index, high hundred-grid adhesive force and high pencil hardness.
Specifically, the solvent-free photocurable resin compositions provided in examples 1 to 9 had a viscosity of 100 to 180CPS and a refractive index of 1.48nD25The adhesive force of the grids can reach 5B, and the surface resistance can reach 1011Omega/mouth, pencil hardness is H-2H; compared with the solvent-free type photocuring resin composition obtained by only adding the first or second acrylic monomers in the comparative examples 1 and 2, the solvent-free type photocuring resin composition has the advantages that the viscosity is greatly reduced, the pencil hardness and the Baige adhesive force are improved, and the fact that the solvent-free type photocuring resin composition with low viscosity and excellent adhesive property is obtained through the matching of the first acrylic monomer and the second acrylic monomer in specific parts is proved.
Furthermore, as can be seen from comparison of examples 6 to 9, the solvent-free photocurable resin composition obtained in example 8 has reduced one-hundred-grid adhesion and pencil hardness compared to those of examples 6 and 7, because the content of the first type acrylate monomer in the composition is too high; the solvent-free photocurable resin composition obtained in example 9 was found to have an increased viscosity as compared with examples 6 and 7, because of the excessive addition of the second type acrylate monomer.
The applicant states that the present invention is illustrated by the above examples to a solvent-free photocurable resin composition and its preparation method and application, but the present invention is not limited to the above examples, i.e. it is not meant that the present invention must be implemented by the above examples. It should be understood by those skilled in the art that any modification of the present invention, equivalent substitutions of the raw materials of the product of the present invention, addition of auxiliary components, selection of specific modes, etc., are within the scope and disclosure of the present invention.

Claims (10)

1. The solvent-free photocurable resin composition is characterized by comprising the following components in parts by weight: 1-40 parts of acrylic resin, 1-30 parts of first acrylate monomer, 1-30 parts of second acrylate monomer, 1-15 parts of photoinitiator and 1-10 parts of antistatic agent.
2. A solvent-free photocurable resin composition according to claim 1, wherein the acrylic resin comprises any one of polyester acrylic resin, polyurethane acrylic resin or epoxy acrylic resin or a combination of at least two thereof.
3. A solvent-free photocurable resin composition according to claim 1 or 2, wherein the first acrylate monomer comprises any one or a combination of at least two of hydroxyethyl methacrylate, hydroxyethyl acrylate or hydroxypropyl acrylate;
preferably, the second acrylate monomer comprises any one of 1, 6-hexanediol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, ethoxylated bisphenol a diacrylate, pentaerythritol triacrylate, or trimethylolpropane triacrylate, or a combination of at least two thereof;
preferably, the mass of the first acrylate monomer and the second acrylate monomer is 1 (0.5-1.5).
4. The solventless photocurable resin composition according to any one of claims 1 to 3, wherein the photoinitiator comprises any one or a combination of at least two of 2-hydroxy-2-methyl-1-phenyl-1-propanone, 1-hydroxycyclohexyl phenyl ketone, 2,4, 6-trimethylbenzoyl-diphenyl phosphine oxide, ethyl 2,4, 6-trimethylbenzoylphenyl phosphonate, phenyl bis (2,4, 6-trimethylbenzoyl) phosphine oxide, or methyl benzoylformate.
5. A solvent-free photocurable resin composition according to any one of claims 1-4, wherein the antistatic agent comprises a salt ion type antistatic agent and/or a nonionic antistatic agent.
6. A solvent-free photocurable resin composition according to any one of claims 1 to 5, wherein the solvent-free photocurable resin composition further comprises an auxiliary agent;
preferably, the solvent-free photocurable resin composition contains 1-10 parts by weight of an auxiliary agent;
preferably, the auxiliary agent comprises a modified silicone auxiliary agent.
7. A method for preparing the solvent-free photocurable resin composition according to any one of claims 1 to 6, comprising the steps of:
(1) mixing a first acrylate monomer, a second acrylate monomer and a photoinitiator to obtain a first mixture;
(2) mixing an acrylic resin and the first mixture obtained in the step (1) to obtain a second mixture;
(3) and (3) mixing the second mixture obtained in the step (2), an antistatic agent and an optional auxiliary agent, and filtering to obtain the solvent-free type photocuring resin composition.
8. The method according to claim 7, wherein the mixing in step (1) and step (2) is carried out under a condition of keeping out light;
preferably, the mixing temperature of the step (1), the step (2) and the step (3) is 20-40 ℃ independently;
preferably, the mixing time of the step (1), the step (2) and the step (3) is 30-60 min independently;
preferably, the mixing of the step (1), the step (2) and the step (3) is carried out under stirring;
preferably, the rotation speed of the stirring is 500-700 rpm respectively and independently.
9. The method according to claim 7 or 8, characterized in that it comprises the steps of:
(1) mixing a first acrylate monomer, a second acrylate monomer and a photoinitiator in a dark place for 30-60 min under the stirring conditions of 20-40 ℃ and 500-700 rpm to obtain a first mixture;
(2) mixing acrylic resin and the first mixture obtained in the step (1) for 30-60 min in a dark place under the stirring conditions of 20-40 ℃ and 500-700 rpm to obtain a second mixture;
(3) and (3) mixing the second mixture obtained in the step (2), an antistatic agent and an optional auxiliary agent for 30-60 min under the stirring conditions of the temperature of 20-40 ℃ and the rotating speed of 500-700 rpm, and filtering to obtain the solvent-free photocuring resin composition.
10. Use of the solvent-free photocurable resin composition according to any one of claims 1-6 in a brightness enhancement film.
CN202011566841.0A 2020-12-25 2020-12-25 Solvent-free type photocuring resin composition and preparation method and application thereof Pending CN112680093A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115010849A (en) * 2022-05-23 2022-09-06 武汉工程大学 Solvent-free high-refractive-index optical material and preparation method and application thereof
CN116102971A (en) * 2022-12-29 2023-05-12 上海绘兰材料科技有限公司 Resin composition for photocuring dirt-resistant micro-permeable membrane, and preparation method and application thereof

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050147838A1 (en) * 2003-12-30 2005-07-07 3M Innovative Properties Company Polymerizable compositions for optical articles
KR20110014293A (en) * 2009-08-05 2011-02-11 제일모직주식회사 Photocurable resin composition with antistaticity and optical film manufactured using the resin composition
KR20110137958A (en) * 2010-06-18 2011-12-26 주식회사 블루폴리텍 High refractive ultraviolet cured resin composition for optical film
CN103952062A (en) * 2014-05-13 2014-07-30 广州申威新材料科技有限公司 Preparation method of dually-cured photo-polymerization composition and application of obtained composition
CN104312390A (en) * 2014-09-28 2015-01-28 上海维凯光电新材料有限公司 Brightness-enhancement paint composition with high refraction rate
CN104592884A (en) * 2015-01-19 2015-05-06 上海乘鹰新材料有限公司 Ultraviolet light curing elastic self-healing coating composition
CN110079208A (en) * 2019-04-10 2019-08-02 宁波激智科技股份有限公司 A kind of composition and a kind of brightness enhancement film and its application

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050147838A1 (en) * 2003-12-30 2005-07-07 3M Innovative Properties Company Polymerizable compositions for optical articles
KR20110014293A (en) * 2009-08-05 2011-02-11 제일모직주식회사 Photocurable resin composition with antistaticity and optical film manufactured using the resin composition
KR20110137958A (en) * 2010-06-18 2011-12-26 주식회사 블루폴리텍 High refractive ultraviolet cured resin composition for optical film
CN103952062A (en) * 2014-05-13 2014-07-30 广州申威新材料科技有限公司 Preparation method of dually-cured photo-polymerization composition and application of obtained composition
CN104312390A (en) * 2014-09-28 2015-01-28 上海维凯光电新材料有限公司 Brightness-enhancement paint composition with high refraction rate
CN104592884A (en) * 2015-01-19 2015-05-06 上海乘鹰新材料有限公司 Ultraviolet light curing elastic self-healing coating composition
CN110079208A (en) * 2019-04-10 2019-08-02 宁波激智科技股份有限公司 A kind of composition and a kind of brightness enhancement film and its application

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115010849A (en) * 2022-05-23 2022-09-06 武汉工程大学 Solvent-free high-refractive-index optical material and preparation method and application thereof
CN115010849B (en) * 2022-05-23 2023-07-18 武汉工程大学 Solvent-free high-refractive-index optical material and preparation method and application thereof
CN116102971A (en) * 2022-12-29 2023-05-12 上海绘兰材料科技有限公司 Resin composition for photocuring dirt-resistant micro-permeable membrane, and preparation method and application thereof

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