CN112624049A - Comprehensive hydrogen chloride gas recovery device and method - Google Patents
Comprehensive hydrogen chloride gas recovery device and method Download PDFInfo
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- CN112624049A CN112624049A CN202011367823.XA CN202011367823A CN112624049A CN 112624049 A CN112624049 A CN 112624049A CN 202011367823 A CN202011367823 A CN 202011367823A CN 112624049 A CN112624049 A CN 112624049A
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- 239000007789 gas Substances 0.000 title claims abstract description 149
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 title claims abstract description 107
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 title claims abstract description 71
- 229910000041 hydrogen chloride Inorganic materials 0.000 title claims abstract description 71
- 238000000034 method Methods 0.000 title claims abstract description 30
- 238000011084 recovery Methods 0.000 title claims abstract description 27
- 239000002253 acid Substances 0.000 claims abstract description 30
- 239000002699 waste material Substances 0.000 claims abstract description 25
- 239000012071 phase Substances 0.000 claims abstract description 20
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims abstract description 18
- 238000005406 washing Methods 0.000 claims abstract description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 230000007062 hydrolysis Effects 0.000 claims abstract description 12
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 12
- 238000007599 discharging Methods 0.000 claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 claims abstract description 10
- 239000010865 sewage Substances 0.000 claims abstract description 9
- 239000002250 absorbent Substances 0.000 claims abstract description 6
- 230000002745 absorbent Effects 0.000 claims abstract description 6
- 238000010521 absorption reaction Methods 0.000 claims abstract description 6
- VABRONYHMNKEFB-UHFFFAOYSA-N chloromethane;silicon Chemical compound [Si].ClC VABRONYHMNKEFB-UHFFFAOYSA-N 0.000 claims abstract description 6
- 239000007791 liquid phase Substances 0.000 claims abstract description 6
- 239000007921 spray Substances 0.000 claims abstract description 6
- 230000003068 static effect Effects 0.000 claims abstract description 6
- 238000001816 cooling Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 16
- 239000000112 cooling gas Substances 0.000 claims description 15
- 239000007788 liquid Substances 0.000 claims description 15
- 239000011344 liquid material Substances 0.000 claims description 15
- 238000000926 separation method Methods 0.000 claims description 15
- 238000004458 analytical method Methods 0.000 claims description 9
- 238000001704 evaporation Methods 0.000 claims description 7
- 230000008020 evaporation Effects 0.000 claims description 7
- 238000010306 acid treatment Methods 0.000 claims description 5
- 238000009835 boiling Methods 0.000 claims description 5
- 238000005336 cracking Methods 0.000 claims description 5
- 238000003860 storage Methods 0.000 claims description 5
- 238000005516 engineering process Methods 0.000 description 6
- 238000005265 energy consumption Methods 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 238000004134 energy conservation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B7/00—Halogens; Halogen acids
- C01B7/01—Chlorine; Hydrogen chloride
- C01B7/07—Purification ; Separation
- C01B7/0706—Purification ; Separation of hydrogen chloride
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F25—REFRIGERATION OR COOLING; COMBINED HEATING AND REFRIGERATION SYSTEMS; HEAT PUMP SYSTEMS; MANUFACTURE OR STORAGE OF ICE; LIQUEFACTION SOLIDIFICATION OF GASES
- F25J—LIQUEFACTION, SOLIDIFICATION OR SEPARATION OF GASES OR GASEOUS OR LIQUEFIED GASEOUS MIXTURES BY PRESSURE AND COLD TREATMENT OR BY BRINGING THEM INTO THE SUPERCRITICAL STATE
- F25J3/00—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification
- F25J3/06—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation
- F25J3/0605—Processes or apparatus for separating the constituents of gaseous or liquefied gaseous mixtures involving the use of liquefaction or solidification by partial condensation characterised by the feed stream
- F25J3/062—Refinery gas, cracking gas, coke oven gas, gaseous mixtures containing aliphatic unsaturated CnHm or gaseous mixtures of undefined nature
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Thermal Sciences (AREA)
- General Engineering & Computer Science (AREA)
- Inorganic Chemistry (AREA)
- Treating Waste Gases (AREA)
Abstract
The invention discloses a comprehensive hydrogen chloride gas recovery device and a method, wherein the comprehensive hydrogen chloride gas recovery device is used for hydrogen chloride gas generated in the production of organic silicon chloromethane, and comprises a static mixer, a hydrolysis reactor, an acid mixer, a phase separator, an HCL washing tower, a condenser, a collector, a charging bucket, a supercharging device, a heat exchange device and a layering device; introducing the mixed gas containing hydrogen chloride into a spray absorption tower which takes diglycol as an absorbent, absorbing the hydrogen chloride gas into a liquid phase by the diglycol, and discharging the residual gas phase from the top of the tower to respectively obtain the diglycol and the residual gas phase for absorbing the hydrogen chloride gas; sending the obtained gas into an HCL washing tower for washing treatment, and sending the gas to a collector after being treated by a first-stage condenser and a second-stage condenser in sequence to obtain mixed gas; the HCl content in the discharged waste acid water is reduced from 1-2% to below 0.5%, and the sewage treatment cost is reduced.
Description
Technical Field
The invention belongs to the technical field of hydrogen chloride treatment, and particularly relates to a comprehensive hydrogen chloride gas recovery device and method.
Background
The domestic organic silicon production technology has reached a certain height through the combination of production, study and research, and although the gap is still remained between the domestic organic silicon production technology and the foreign leading industry, the domestic technology is in continuous progress along with the deep exchange of the technology; with the continuous updating of new material equipment, automation and other technologies, the prior complex acid pretreatment for graded collection and use of hydrochloric acid in organic silicon production is lacked, the process is complex, the discharge amount of acid-containing sewage is large, the generated dilute sulfuric acid is urgently required to be treated, the environment is protected, the market pressure is large, and the energy consumption is also large; the method runs counter to the national advocated green environmental protection, energy conservation and consumption reduction guidelines.
Disclosure of Invention
The invention aims to provide a comprehensive hydrogen chloride gas recovery device and a method thereof, which aim to solve the problems in the background technology.
In order to achieve the purpose, the invention provides the following technical scheme: a hydrogen chloride gas comprehensive recovery device and a method thereof comprise hydrogen chloride gas generated in the production of organic silicon chloromethane, and are characterized in that the hydrogen chloride gas comprehensive recovery device comprises a static mixer, a hydrolysis reactor, an acid mixer, a phase separator, an HCL washing tower, a condenser, a collector, a charging bucket, a supercharging device, a heat exchange device and a layering device;
the comprehensive recovery method of hydrogen chloride gas comprises the following steps:
the method comprises the following steps: introducing the mixed gas containing hydrogen chloride into a spray absorption tower which takes diglycol as an absorbent, absorbing the hydrogen chloride gas into a liquid phase by the diglycol, and discharging the residual gas phase from the top of the tower to respectively obtain the diglycol and the residual gas phase for absorbing the hydrogen chloride gas;
step two: feeding the gas obtained in the step one into an HCL washing tower for washing treatment, and feeding the gas to a collector after being treated by a first-stage condenser and a second-stage condenser in sequence to obtain mixed gas;
step three: pressurizing the gas product obtained in the second step to 0.1-0.18 MPa to obtain pressurized gas, cooling the pressurized gas after pressure equalization to 30-40 ℃ to obtain cooling gas, cooling the cooling gas to-15-25 ℃, and performing gas-liquid separation to obtain primary condensate and primary separated gas; cooling the primary separated gas to-45-55 ℃, and performing gas-liquid separation to obtain secondary condensate;
step four: sending the materials obtained in the step three to a hydrolysis reactor, sending the obtained materials to a condenser in sequence, sending the materials to a collector for high-boiling cracking, sending the liquid materials to a delayer and the delayer in sequence for treatment, sending the liquid materials to a hydrochloric acid storage tank, and sending the liquid materials to a mixer for secondary circulation treatment through a hydrochloric acid pump;
step five: carrying out flash evaporation on the primary condensate and the secondary condensate, and collecting gas, wherein the conditions of the primary condensate and the secondary condensate are that the pressure of a flash evaporation tank is 0.1-0.3 MPa;
step six: the gas product is conveyed through the supercharging device, the gas is conveyed to the heat exchange device to be cooled, then the gas is subjected to gas-liquid separation through the recoverer to obtain condensate and separated gas, and HCl in the waste acid water generated after deep analysis is concentrated and recovered, so that the HCl content in the discharged waste acid water is reduced from 1-2% to below 0.5%, and the sewage treatment cost is reduced.
Further, the waste acid generated in the second step is discharged to a waste acid treatment unit after being subjected to deep cooling.
Further, the gas product is pressurized to 0.14-0.16 MPa.
Further, in the step of pressurizing the gas to prepare the cooling gas, the pressurizing gas is cooled to 30-35 ℃.
Further, the temperature of the flash tank in the fifth step is 50-60 ℃.
Compared with the prior art, the invention has the beneficial effects that: the concentration of HCl in the acid water is increased, 19-20% of dilute hydrochloric acid is generated, the energy consumption of hydrochloric acid deep analysis is reduced, the HCl in the waste acid water generated after the deep analysis is concentrated and recycled, the content of HCl in the discharged waste acid water is reduced to be below 0.5% from 1-2%, the sewage treatment cost is reduced, the chlorine circulation is realized, the hydrochloric acid can be optimized from the perspective of the whole system, and the gradient use of hydrochloric acid with different concentrations is realized.
Drawings
FIG. 1 is a schematic structural diagram of a process for recovering hydrogen chloride from a gas phase by hydrolysis of dimethyldichlorosilane according to the comprehensive recovery device and method of hydrogen chloride gas.
FIG. 2 is a schematic diagram of a hydrogen chloride gas comprehensive recovery device and method for recovering hydrogen chloride gas from hydrogen-containing silicone oil gas phase.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Example 1
A hydrogen chloride gas comprehensive recovery device and a method thereof comprise hydrogen chloride gas generated in the production of organic silicon chloromethane, and are characterized in that the hydrogen chloride gas comprehensive recovery device comprises a static mixer, a hydrolysis reactor, an acid mixer, a phase separator, an HCL washing tower, a condenser, a collector, a charging bucket, a supercharging device, a heat exchange device and a layering device;
the comprehensive recovery method of hydrogen chloride gas comprises the following steps:
the method comprises the following steps: introducing the mixed gas containing hydrogen chloride into a spray absorption tower which takes diglycol as an absorbent, absorbing the hydrogen chloride gas into a liquid phase by the diglycol, and discharging the residual gas phase from the top of the tower to respectively obtain the diglycol and the residual gas phase for absorbing the hydrogen chloride gas;
step two: feeding the gas obtained in the step one into an HCL washing tower for washing treatment, and feeding the gas to a collector after being treated by a first-stage condenser and a second-stage condenser in sequence to obtain mixed gas;
step three: pressurizing the gas product obtained in the step two to 0.1MPa to obtain pressurized gas, cooling the pressurized gas after pressure equalization to 30 ℃ to obtain cooling gas, cooling the cooling gas to-15 ℃, and performing gas-liquid separation to obtain primary condensate and primary separated gas; cooling the primary separated gas to-45 ℃, and carrying out gas-liquid separation to obtain secondary condensate;
step four: sending the materials obtained in the step three to a hydrolysis reactor, sending the obtained materials to a condenser in sequence, sending the materials to a collector for high-boiling cracking, sending the liquid materials to a delayer and the delayer in sequence for treatment, sending the liquid materials to a hydrochloric acid storage tank, and sending the liquid materials to a mixer for secondary circulation treatment through a hydrochloric acid pump;
step five: carrying out flash evaporation on the primary condensate and the secondary condensate, and collecting gas, wherein the conditions of the primary condensate and the secondary condensate are that the pressure of a flash tank is 0.1 MPa;
step six: the gas product is conveyed through the supercharging device, the gas is conveyed to the heat exchange device to be cooled, then the gas is subjected to gas-liquid separation through the recoverer to obtain condensate and separated gas, and HCl in waste acid water generated after deep analysis is concentrated and recovered, so that the HCl content in the discharged waste acid water is reduced from 1% to below 0.5%, and the sewage treatment cost is reduced.
And D, discharging the waste acid generated in the step II to a waste acid treatment unit after cryogenic treatment.
Wherein the gas product is pressurized to 0.14 MPa.
Wherein, in the step of pressurizing the gas to produce the cooling gas, the pressurizing gas is cooled to 30 ℃.
Wherein the temperature of the flash tank in the fifth step is 50 ℃.
Example 2
A hydrogen chloride gas comprehensive recovery device and a method thereof comprise hydrogen chloride gas generated in the production of organic silicon chloromethane, and are characterized in that the hydrogen chloride gas comprehensive recovery device comprises a static mixer, a hydrolysis reactor, an acid mixer, a phase separator, an HCL washing tower, a condenser, a collector, a charging bucket, a supercharging device, a heat exchange device and a layering device;
the comprehensive recovery method of hydrogen chloride gas comprises the following steps:
the method comprises the following steps: introducing the mixed gas containing hydrogen chloride into a spray absorption tower which takes diglycol as an absorbent, absorbing the hydrogen chloride gas into a liquid phase by the diglycol, and discharging the residual gas phase from the top of the tower to respectively obtain the diglycol and the residual gas phase for absorbing the hydrogen chloride gas;
step two: feeding the gas obtained in the step one into an HCL washing tower for washing treatment, and feeding the gas to a collector after being treated by a first-stage condenser and a second-stage condenser in sequence to obtain mixed gas;
step three: pressurizing the gas product obtained in the step two to 0.13MPa to obtain pressurized gas, cooling the pressurized gas after pressure equalization to 35 ℃ to obtain cooling gas, cooling the cooling gas to-20 ℃, and performing gas-liquid separation to obtain primary condensate and primary separated gas; cooling the primary separated gas to-48 ℃, and carrying out gas-liquid separation to obtain secondary condensate;
step four: sending the materials obtained in the step three to a hydrolysis reactor, sending the obtained materials to a condenser in sequence, sending the materials to a collector for high-boiling cracking, sending the liquid materials to a delayer and the delayer in sequence for treatment, sending the liquid materials to a hydrochloric acid storage tank, and sending the liquid materials to a mixer for secondary circulation treatment through a hydrochloric acid pump;
step five: carrying out flash evaporation on the primary condensate and the secondary condensate, and collecting gas, wherein the conditions of the primary condensate and the secondary condensate are that the pressure of a flash tank is 0.2 MPa;
step six: the gas product is conveyed through the supercharging device, the gas is conveyed to the heat exchange device to be cooled, then the gas is subjected to gas-liquid separation through the recoverer to obtain condensate and separated gas, and HCl in waste acid water generated after deep analysis is concentrated and recovered, so that the HCl content in the discharged waste acid water is reduced from 2% to below 0.5%, and the sewage treatment cost is reduced.
And D, discharging the waste acid generated in the step II to a waste acid treatment unit after cryogenic treatment.
Wherein the gas product is pressurized to 0.15 MPa.
Wherein, in the step of pressurizing the gas to prepare the cooling gas, the pressurizing gas is cooled to 32 ℃.
Wherein the temperature of the flash tank in the fifth step is 55 ℃.
Example 3
A hydrogen chloride gas comprehensive recovery device and a method thereof comprise hydrogen chloride gas generated in the production of organic silicon chloromethane, and are characterized in that the hydrogen chloride gas comprehensive recovery device comprises a static mixer, a hydrolysis reactor, an acid mixer, a phase separator, an HCL washing tower, a condenser, a collector, a charging bucket, a supercharging device, a heat exchange device and a layering device;
the comprehensive recovery method of hydrogen chloride gas comprises the following steps:
the method comprises the following steps: introducing the mixed gas containing hydrogen chloride into a spray absorption tower which takes diglycol as an absorbent, absorbing the hydrogen chloride gas into a liquid phase by the diglycol, and discharging the residual gas phase from the top of the tower to respectively obtain the diglycol and the residual gas phase for absorbing the hydrogen chloride gas;
step two: feeding the gas obtained in the step one into an HCL washing tower for washing treatment, and feeding the gas to a collector after being treated by a first-stage condenser and a second-stage condenser in sequence to obtain mixed gas;
step three: pressurizing the gas product obtained in the step two to 0.18MPa to obtain pressurized gas, cooling the pressurized gas after pressure equalization to 40 ℃ to obtain cooling gas, cooling the cooling gas to-25 ℃, and performing gas-liquid separation to obtain primary condensate and primary separated gas; cooling the primary separated gas to-55 ℃, and carrying out gas-liquid separation to obtain secondary condensate;
step four: sending the materials obtained in the step three to a hydrolysis reactor, sending the obtained materials to a condenser in sequence, sending the materials to a collector for high-boiling cracking, sending the liquid materials to a delayer and the delayer in sequence for treatment, sending the liquid materials to a hydrochloric acid storage tank, and sending the liquid materials to a mixer for secondary circulation treatment through a hydrochloric acid pump;
step five: carrying out flash evaporation on the primary condensate and the secondary condensate, and collecting gas, wherein the conditions of the primary condensate and the secondary condensate are that the pressure of a flash tank is 0.3 MPa;
step six: the gas product is conveyed through the supercharging device, the gas is conveyed to the heat exchange device to be cooled, then the gas is subjected to gas-liquid separation through the recoverer to obtain condensate and separated gas, and HCl in waste acid water generated after deep analysis is concentrated and recovered, so that the HCl content in the discharged waste acid water is reduced from 2% to below 0.5%, and the sewage treatment cost is reduced.
And D, discharging the waste acid generated in the step II to a waste acid treatment unit after cryogenic treatment.
Wherein the gas product is pressurized to 0.16 MPa.
Wherein, in the step of pressurizing the gas to prepare the cooling gas, the pressurizing gas is cooled to 35 ℃.
Wherein the temperature of the flash tank in the fifth step is 60 ℃.
The working principle and the using process of the invention are as follows: the concentration of HCl in the acid water is increased, 19-20% of dilute hydrochloric acid is generated, the energy consumption of hydrochloric acid deep analysis is reduced, the HCl in the waste acid water generated after the deep analysis is concentrated and recycled, the content of HCl in the discharged waste acid water is reduced to be below 0.5% from 1-2%, the sewage treatment cost is reduced, the chlorine circulation is realized, the hydrochloric acid can be optimized from the perspective of the whole system, and the gradient use of hydrochloric acid with different concentrations is realized.
Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that changes, modifications, substitutions and alterations can be made in these embodiments without departing from the principles and spirit of the invention, the scope of which is defined in the appended claims and their equivalents.
Claims (5)
1. A hydrogen chloride gas comprehensive recovery device and a method are used for hydrogen chloride gas generated in the production of organic silicon chloromethane, and are characterized in that the hydrogen chloride gas comprehensive recovery device comprises a static mixer, a hydrolysis reactor, an acid mixer, a phase separator, an HCL washing tower, a condenser, a collector, a charging bucket, a supercharging device, a heat exchange device and a layering device;
the comprehensive recovery method of hydrogen chloride gas comprises the following steps:
the method comprises the following steps: introducing the mixed gas containing hydrogen chloride into a spray absorption tower which takes diglycol as an absorbent, absorbing the hydrogen chloride gas into a liquid phase by the diglycol, and discharging the residual gas phase from the top of the tower to respectively obtain the diglycol and the residual gas phase for absorbing the hydrogen chloride gas;
step two: feeding the gas obtained in the step one into an HCL washing tower for washing treatment, and feeding the gas to a collector after being treated by a first-stage condenser and a second-stage condenser in sequence to obtain mixed gas;
step three: pressurizing the gas product obtained in the second step to 0.1-0.18 MPa to obtain pressurized gas, cooling the pressurized gas after pressure equalization to 30-40 ℃ to obtain cooling gas, cooling the cooling gas to-15-25 ℃, and performing gas-liquid separation to obtain primary condensate and primary separated gas; cooling the primary separated gas to-45-55 ℃, and performing gas-liquid separation to obtain secondary condensate;
step four: sending the materials obtained in the step three to a hydrolysis reactor, sending the obtained materials to a condenser in sequence, sending the materials to a collector for high-boiling cracking, sending the liquid materials to a delayer and the delayer in sequence for treatment, sending the liquid materials to a hydrochloric acid storage tank, and sending the liquid materials to a mixer for secondary circulation treatment through a hydrochloric acid pump;
step five: carrying out flash evaporation on the primary condensate and the secondary condensate, and collecting gas, wherein the conditions of the primary condensate and the secondary condensate are that the pressure of a flash evaporation tank is 0.1-0.3 MPa;
step six: the gas product is conveyed through the supercharging device, the gas is conveyed to the heat exchange device to be cooled, then the gas is subjected to gas-liquid separation through the recoverer to obtain condensate and separated gas, and HCl in the waste acid water generated after deep analysis is concentrated and recovered, so that the HCl content in the discharged waste acid water is reduced from 1-2% to below 0.5%, and the sewage treatment cost is reduced.
2. The comprehensive recovery device and method of hydrogen chloride gas according to claim 1, characterized in that: and discharging the waste acid generated in the step two to a waste acid treatment unit after deep cooling.
3. The comprehensive recovery device and method of hydrogen chloride gas according to claim 1, characterized in that: and pressurizing the gas product to 0.14-0.16 MPa.
4. The comprehensive recovery device and method of hydrogen chloride gas according to claim 1, characterized in that: in the step of pressurizing the gas to prepare the cooling gas, the pressurizing gas is cooled to 30-35 ℃.
5. The comprehensive recovery device and method of hydrogen chloride gas according to claim 1, characterized in that: and the temperature of the flash tank in the fifth step is 50-60 ℃.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113800484A (en) * | 2021-09-24 | 2021-12-17 | 中船重工（邯郸）派瑞特种气体有限公司 | Recovery device and recovery method for nitrogen trifluoride gas in vented tail gas |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4113786A (en) * | 1976-04-02 | 1978-09-12 | The Lummus Company | Hydrogen chloride recovery |
| CN107804827A (en) * | 2017-11-02 | 2018-03-16 | 成都蜀菱科技发展有限公司 | A kind of hydrogen chloride recovery method and hydrogen chloride recovery system |
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2020
- 2020-11-29 CN CN202011367823.XA patent/CN112624049A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4113786A (en) * | 1976-04-02 | 1978-09-12 | The Lummus Company | Hydrogen chloride recovery |
| CN107804827A (en) * | 2017-11-02 | 2018-03-16 | 成都蜀菱科技发展有限公司 | A kind of hydrogen chloride recovery method and hydrogen chloride recovery system |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113800484A (en) * | 2021-09-24 | 2021-12-17 | 中船重工（邯郸）派瑞特种气体有限公司 | Recovery device and recovery method for nitrogen trifluoride gas in vented tail gas |
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