CN112611689A - Device and method for checking deviation of screen mesh - Google Patents
Device and method for checking deviation of screen mesh Download PDFInfo
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- CN112611689A CN112611689A CN201911126732.4A CN201911126732A CN112611689A CN 112611689 A CN112611689 A CN 112611689A CN 201911126732 A CN201911126732 A CN 201911126732A CN 112611689 A CN112611689 A CN 112611689A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N15/00—Investigating characteristics of particles; Investigating permeability, pore-volume, or surface-area of porous materials
- G01N15/02—Investigating particle size or size distribution
- G01N15/0205—Investigating particle size or size distribution by optical means, e.g. by light scattering, diffraction, holography or imaging
- G01N15/0227—Investigating particle size or size distribution by optical means, e.g. by light scattering, diffraction, holography or imaging using imaging, e.g. a projected image of suspension; using holography
Abstract
The invention relates to the technical field of test sieves, and discloses a sieve pore deviation checking device and a checking method, wherein the sieve pore deviation checking device comprises: the upright post is vertically arranged on the base; the adjustable support comprises an upper support and a lower support, the upper support and the lower support are movably mounted on the upright post and can be adjusted back and forth, left and right and up and down relative to the upright post, and the test screen is mounted on the lower support; the size deviation standard plate comprises a bottom plate positioned below the lower support, and a rectangular pattern is drawn on the bottom plate; and the light source is arranged on the upper bracket. The device and the method for checking the deviation of the sieve pores can ensure that any one pore on the checked perforated metal plate test sieve can be vertically aligned with a light source and projected to a reversed-square-shaped pattern drawn by the positive and negative deviations of the sieve pores, can quickly compare and judge the conformity of the size deviation of the sieve pores, and avoid the complicated operation of reading the number after amplification.
Description
Technical Field
The invention relates to the technical field of test sieves, in particular to a sieve pore deviation checking device and a sieve pore deviation checking method.
Background
The metal perforated plate test sieve is mainly applied to the particle size classification, particle size detection and the like of material particles, is widely applied to scientific research units, laboratories and inspection rooms in the industries of food, medicine, chemical industry, grinding materials, pigments, mines, metallurgy, geology, ceramics, national defense and the like, and is used for the inspection and analysis of production control. The test sieve is checked, identified and considered to meet the stipulated test sieve by a specified mechanism, and the accuracy of the test result can be ensured. The current methods all adopt a large optical magnifier or microscope device with the magnification of 50-200 times to carry out measurement.
When the test sieve is calibrated, the test sieve is placed on a glass working table of a universal tool microscope, a sample position is selected, the longitudinal direct measurement is carried out by the universal tool microscope, the size of a mesh opening of the mesh is determined by mainly utilizing Freund diffraction and Fischer diffraction generated when a helium neon laser beam passes through a mesh screen to be measured, and errors are analyzed. Specifically, a laser beam of radius R is directed perpendicularly onto the plane of the screen, a white screen is placed at a sufficient distance parallel to the plane of the screen, and the laser beam is passed through the screen, the resulting vernah and fischer diffraction pattern will be projected clearly onto the white screen, and the dimensions are read X, Y for measurement. Aiming at the specification of the sieve pore size below 5mm, the existing method adopts equipment such as a microscope with the resolution below 1 mu m and the amplification factor of about 10-50 times, has higher accuracy and can quantitatively represent the size of the sieve pore, but has the defects of high cost, difficulty in large-scale popularization, complex operation and the like, and the mode has heavy workload and low efficiency and brings great difficulty to metering departments in various regions.
Disclosure of Invention
The invention aims to provide a device and a method for checking screen hole deviation, and aims to solve the problems of heavy work and low efficiency of test inspection by adopting manual observation in the prior art.
The invention provides a device for checking deviation of sieve pores, which is used for detecting a test sieve and comprises: the upright post is vertically arranged on the base; the adjustable support comprises an upper support and a lower support, the upper support and the lower support are movably mounted on the upright post and can be adjusted back and forth, left and right and up and down relative to the upright post, and the test screen is mounted on the lower support; the size deviation standard plate comprises a bottom plate positioned below the lower support, and a rectangular pattern is drawn on the bottom plate; and the light source is arranged on the upper bracket and used for projecting light rays to pass through the test sieve and project the light rays onto the bottom plate.
Furthermore, scales used for marking the height values of the upper support and the lower support are arranged along the upright post.
Further, the upper bracket and the lower bracket are slidably mounted on the upright post.
Furthermore, the end face of the bottom plate is light color, and the square-shaped pattern is dark color.
Further, the zigzag pattern includes a plurality of concentric circles or concentric squares.
Further, the locking device comprises two bidirectional locking buckles, the upper support is mounted on the upright post through one bidirectional locking buckle, the lower support is mounted on the upright post through the other bidirectional locking buckle, and each bidirectional locking buckle is slidably mounted on the upright post and can lock the position of the bidirectional locking buckle.
Further, the light source is a point-like projection light source.
The invention also provides a checking method for detecting the test sieve, which comprises the following steps: assembling the sieve pore deviation checking device; adjusting the upper support to extend to a sufficient length according to the size of a screen mesh of the test screen to be detected so that projection light can vertically irradiate any screen mesh, and then fixing the upper support; fixing the test sieve to be detected at the mounting position of the lower support and ensuring the test sieve to be horizontal, selecting any sieve pore to align with the projection light source, then fixing the extension distance of the lower support, and adjusting the longitudinal position of the lower support so as to enable the projection of the sieve pore to be detected on the bottom plate to be clear. Obtaining the height of the light source and the height of the test sieve, and manufacturing the square-back pattern; the standard plate with the size deviation is placed in the middle of the projection for comparison, and if the projection can completely fall in the square-back pattern, the size deviation of the sieve holes can be judged to meet the requirement; if the projection can not completely fall in the zigzag pattern, the size deviation of the sieve holes can be judged to be not qualified.
Further, let: the height of the light source is LACHeight L of said screen meshBCLength of side L of the test sieve0± deviation w, by the following formula:
L1＝L0-w； (1)
L2＝L0+w； (2)
Lmin＝L1*[LAC/(LAC-LBC)]； (3)
Lmax＝L2*[LAC/(LAC-LBC)]； (4)
(1)L1-the size allows a minimum;
(2)L2-the size allowed maximum;
(3) lmin-the minimum size after magnification;
(4) lmax-maximum of size after amplification
The square-shaped pattern is two concentric squares, and the side lengths of the two squares are Lmax and Lmin respectively.
Further, in the comparison between the projection and the zigzag pattern, if the projection completely falls between the two squares, it can be judged that the size deviation of the sieve pore meets the requirement; if the projection cannot fall completely between two squares, it can be determined that the size deviation of the screen aperture is not satisfactory.
Compared with the prior art, the device and the method for checking the deviation of the sieve pores can ensure that any one hole on the checked metal perforated plate test sieve can vertically align to a light source through the front-back adjustment, the up-down adjustment and the left-right adjustment of the upper support and the lower support, can flexibly select the sieve pores to be tested, can meet the switching between different amplification factors according to the positions of the upper support and the lower support, greatly improve the universality of equipment, and adapt to the sieve pores with various specifications and shapes. By adopting the method of projection comparison, the conformity of the size deviation of the sieve pores can be quickly judged by the square-shaped pattern drawn by the positive and negative deviations of the sieve pores, and the complicated operation of reading the number after amplification is avoided. The device is checked to sieve mesh deviation for separately dismantled and assembled mosaic structure for the device stable in structure, simple operation, maintain simple and convenient, not fragile and the cost is lower, uses the device can accurately high-efficiently judge out the compliance of sieve mesh deviation, easy to maintain maintenance, convenient to popularize and use.
Drawings
FIG. 1 is a side view of a screen hole size deviation checking apparatus in a first embodiment of the present invention;
FIG. 2 is a top view of a device for checking the dimensional deviation of a screen hole according to a first embodiment of the present invention;
FIG. 3 is a front view of a device for checking the dimensional deviation of a screen hole according to a first embodiment of the present invention;
FIG. 4 is a square standard plate for checking the size deviation of the square screen holes of the device for checking the size deviation of the screen holes in the first embodiment and the third embodiment of the invention;
FIG. 5 is a circular sieve hole size deviation standard plate of the sieve hole size deviation checking device in the first embodiment and the fourth embodiment of the invention;
fig. 6a, 6b, and 6c are calculation models of the checking method according to the second embodiment of the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
The implementation of the present embodiment is described in detail below with reference to specific drawings.
Example one
As shown in fig. 1 to 6c, the present embodiment provides a mesh deviation checking apparatus, including: the vertical post 1 vertically installed on the base 4, an adjustable bracket, a size deviation standard plate 7 and a light source 5. Wherein, adjustable support includes upper bracket 2 and lower carriage 3, and the two is all movable mounting in stand 1, can realize carrying on around, controlling, adjusting from top to bottom relatively stand 1. The light source 5 is mounted on the upper frame 2, the test sieve 6 is mounted on the lower frame 3, and the size deviation standard plate 7 includes a bottom plate 10 positioned below the lower frame 3, and a zigzag pattern 11/14 is drawn on the bottom plate 10. The light source 5 emits a projection light which passes through the test screen 6 and is projected onto the base plate 10.
When detecting test sieve 6, will await measuring test sieve 6 and install to lower carriage 3 to adjustment upper bracket 2, lower carriage 3 so that light 5 can send the sieve mesh projection that light passed test sieve 6 to size deviation standard plate 7 on, according to data such as the size of test sieve 6, the height of upper bracket 2 and lower carriage 3, draw suitable back font pattern 11/14, compare projection and back font pattern 11/14, can be quick completion testing process.
The sieve pore deviation checking device in the embodiment has the following beneficial effects
1. Through fore-and-aft regulation, upper and lower regulation and control regulation of lower carriage 3, can ensure that any one hole on the perforated metal sheet test sieve 6 that is checked can both aim at light source 5 perpendicularly, can select the sieve mesh that will test in a flexible way, great improvement work efficiency.
2. The positions of the upper bracket 3 and the lower bracket 3 are determined, so that the switching between different amplification factors can be met, the universality of the equipment is greatly improved, and the sieve mesh is suitable for sieve meshes of various specifications and shapes.
3. By adopting the square-back pattern 11/14 drawn by positive and negative deviations of the sieve pores and adopting a projection comparison method, the conformity of the size deviation of the sieve pores can be quickly judged, and the complicated operation of reading the number after amplification is avoided;
4. set up light source 5, stand 1, adjustable bracket, sieve mesh size deviation standard plate 7 into separately dismantled and assembled mosaic structure for the device stable in structure, simple operation, maintain simple and convenient, not fragile and the cost is lower, use the device can be accurate high-efficient judge out the compliance of sieve mesh deviation, easy to maintain maintenance, convenient to popularize and use.
Preferably, as shown in fig. 3, scales are provided along the upright 1, which can mark the height values of the upper bracket 2 and the lower bracket 3, and the heights of the upper bracket 2 and the lower bracket 3 can be obtained by directly reading the scales, so that the measuring process is omitted.
Preferably, the upper bracket 2 and the lower bracket 3 are both slidably mounted on the upright post 1, can longitudinally slide relative to the upright post 1 to realize the adjustment of changing the height position, and are fixed on a certain scale after sliding, so that the height value can be directly read.
Specifically, as shown in fig. 1 and 2, the device for checking the deviation of the mesh opening further includes two-way latches 8/9, the upper rack 2 is mounted to the upright 1 by one two-way latch 8/9, the lower rack 3 is mounted to the upright 1 by another two-way latch 8/9, and the two-way latch 8/9 is slidably mounted to the upright 1 to lock the position thereof. The bidirectional lock 8/9 comprises two parts hinged to each other, wherein one part is sleeved on the upright post 1 and can slide or rotate relative to the upright post 1; the other part is sleeved on the upper support 2 or the lower support 3, and the upper support 2 or the lower support 3 can slide relative to the upper support 2 or the lower support 3 to change the position, so that the upper support 2 and the lower support 3 can be freely adjusted in multiple directions, namely up and down, left and right, and front and back relative to the upright post 1.
In other embodiments, the upper support 2 or the lower support 3 may also be freely adjustable in multiple directions up and down, left and right, and front and back with respect to the upright 1 by other structures, for example, one end of the upper support 2 or the lower support 3 is provided with a hole for inserting the upright 1, and the upper support 2 or the lower support 3 itself has a telescopic structure, so as to finally realize free adjustment in multiple directions up and down, left and right, and front and back.
Preferably, the end face of the base plate 10 is light color, and the square-shaped pattern 11/14 is dark color, and the projection can be observed clearly on the light color base plate 10, and compared with the dark square-shaped pattern 11/14, thereby completing the detection process.
Preferably, the zigzag pattern 11/14 includes a plurality of concentric circles 14 or concentric squares 11, and the relationship between the projection and each of the concentric circles 14 or concentric squares 11 is observed to determine whether the requirement is satisfied.
Preferably, the light source 5 is a point-shaped projection light source 5, which can pass through a screen hole and be clearly projected to the size deviation standard plate 7.
Example two
As shown in fig. 1 to 6c, the present embodiment provides a checking method for checking a test sieve 6, comprising the steps of:
the sieve mesh deviation checking device is assembled, and the upper bracket 2 and the lower bracket 3 can be properly coated with lubricating oil for the convenience of sliding.
According to the size of the screen mesh of the test screen 6 to be measured, the upper support 2 is adjusted to be extended to a sufficient length so that the projection light can vertically irradiate any screen mesh, and then the upper support 2 is fixed.
Fixing the test sieve 6 to be detected at the mounting position of the lower bracket 3 and ensuring the level, selecting any sieve pore to align with the projection light source 5, then fixing the extension distance of the lower bracket 3, and adjusting the longitudinal position of the lower bracket 3 so as to ensure that the projection of the sieve pore to be detected on the bottom plate 10 is clear. Preferably, a level meter is adopted to ensure that the test screen 6 is horizontal, and any hole position which is more than 10cm away from the edge of the screen is selected to be aligned with the projection light source 5. For the convenience of observation, other sieve pores can be shielded by paper or cloth and other articles, and only the selected sieve pores are reserved.
The height of the light source 5 and the height of the test sieve 6 are obtained, and a zigzag pattern 11/14 is manufactured.
The standard plate 7 with the size deviation is placed in the middle of the projection for comparison, and if the projection can completely fall in the square-back pattern 11/14, the size deviation of the sieve holes can be judged to meet the requirement; if the projection does not fall completely within the zigzag pattern 11/14, it can be judged that the size deviation of the screen holes is not satisfactory.
By adopting the checking method in the embodiment, whether the size deviation of the sieve pores meets the requirement or not can be judged quickly and accurately
Preferably, as shown in fig. 6a, 6b, and 6c, the following are provided: the height of the light source 5 is LACHeight L of the screenBCSide length L of test sieve 60± deviation w, by the following formula:
L1＝L0-w； (1)
L2＝L0+w； (2)
Lmin＝L1*[LAC/(LAC-LBC)]； (3)
Lmax＝L2*[LAC/(LAC-LBC)]； (4)
(1)L1-the size allows a minimum;
(2)L2-the size allowed maximum;
(3) lmin-the minimum size after magnification;
(4) lmax-maximum of size after amplification
As shown in fig. 4, the zigzag pattern 11/14 is two concentric squares having side lengths of Lmax and Lmin, respectively. Aiming at a certain specific sieve pore size, the manufactured standard plate 7 pattern can be repeatedly used by recording the scale marks of the upper bracket 3 and the lower bracket 3, and the checking efficiency can be greatly improved.
Preferably, in the comparison between the projected and zigzag patterns 11/14, if the projected pattern falls completely between two squares, it can be judged that the size deviation of the screen aperture meets the requirement; if the projection does not fall completely between the squares, it can be determined that the size deviation of the mesh is not satisfactory.
EXAMPLE III
As shown in fig. 1 to 4, and fig. 6a, 6b, and 6c, the basic size L is selected in the present embodiment0The metal perforated plate type test sieve 6 with the allowable size deviation w of 1.25mm is 25mm, the shape of the sieve hole is square, the diameter of the sieve is 400mm, and the concrete inspection is carried out according to the following steps:
a. after the device is assembled, the upper bracket 2 is stretched to about 300mm and screwed, the power supply of the projection light source 5 is switched on, the light source 5 is confirmed to be normally started, and the height L of the upper bracket 2 is confirmedAC＝380mm；
b. Fixing the screen on the lower bracket 3, screwing down, adjusting the level by using a horizontal ruler, selecting the sieve pores in the central area of the screen, and adjusting the extension length of the lower bracket 3 to enable the selected sieve pores to be aligned with the projection light source 5; then the up-down position of the lower bracket 3 is adjusted, and the height L of the lower bracket 3BCThe projection is clear when 325 mm.
c. Passing the side length (L) of the test sieve 60+/-w), making 7-shaped square of the standard platePattern 11/14 for projection alignment.
d. The standard plate 7 glyph 11/14 rendering may be calculated as follows according to the model shown in FIG. 6:
Lmin＝L1*[LAC/(LAC-LBC)]＝23.75*[380/(380-345)]＝257mm
Lmax＝L2*[LAC/(LAC-LBC)]＝26.25*[380/(380-345)]＝285mm
e. the square-shaped pattern 11/14 on the bottom plate 10 is placed on a horizontal plane, the center of the square is aligned with the projection light source 5, the light shadow projected on the bottom plate 10 can completely fall between two squares of the square-shaped pattern 11/14, and the sieve mesh is judged to meet the deviation requirement.
Example four
As shown in fig. 1 to 3, and fig. 5, 6a, 6b, and 6c, the basic size L is selected in this embodiment060mm, the metal perforated plate type test sieve 6 with the allowable size deviation w of 5mm is provided with a circular sieve pore, the diameter of the sieve mesh is 800mm, and the specific checking is implemented according to the following steps:
a. after the equipment is assembled, the upper bracket 2 is stretched to about 500mm and screwed, the power supply of the projection light source 5 is switched on, the light source 5 is confirmed to be normally turned on, and the height LAC of the upper bracket 2 is confirmed to be 450 mm;
b. fixing the screen on the lower bracket 3, screwing down, adjusting the level by using a horizontal ruler, selecting the sieve pores in the central area of the screen, and adjusting the extension length of the lower bracket 3 to enable the selected sieve pores to be aligned with the projection light source 5; then the up-down position of the lower bracket 3 is adjusted, and the height L of the lower bracket 3BCThe projection is clear when the thickness is 400 mm.
c. Passing the side length (L) of the test sieve 60W), standard plate 7 zigzag pattern 11/14 was made for projection alignment.
d. The standard plate 7 glyph 11/14 rendering may be calculated as follows according to the model shown in FIG. 6:
Rmin＝L1*[LAC/(LAC-LBC)]＝55*[450/(450-400)]＝495mm
Rmax＝L2*[LAC/(LAC-LBC)]＝65*[450/(450-400)]＝585mm
e. the square-shaped pattern 11/14 on the bottom plate 10 is placed on a horizontal plane, the center of the circular pattern is aligned with the projection light source 5, the light shadow projected on the bottom plate 10 can completely fall between two circles of the square-shaped pattern 11/14, and the sieve mesh is judged to meet the deviation requirement.
The present invention is not limited to the above preferred embodiments, and any modifications, equivalent substitutions and improvements made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. Sieve mesh deviation checks device for detect test sieve, its characterized in that includes:
the upright post is vertically arranged on the base;
the adjustable support comprises an upper support and a lower support, the upper support and the lower support are movably mounted on the upright post and can be adjusted back and forth, left and right and up and down relative to the upright post, and the test screen is mounted on the lower support;
the size deviation standard plate comprises a bottom plate positioned below the lower support, and a rectangular pattern is drawn on the bottom plate;
and the light source is arranged on the upper bracket and used for projecting light rays to pass through the test sieve and project the light rays onto the bottom plate.
2. The mesh deviation checking apparatus according to claim 1, wherein scales for indicating the height of said upper frame and said lower frame are provided along said columns.
3. The mesh deviation checking apparatus according to claim 1, wherein said upper frame and said lower frame are slidably mounted to said columns.
4. The device for checking screen hole deviation according to claim 1, wherein said bottom plate end surface is light color and said zigzag pattern is dark color.
5. The mesh deviation checking apparatus according to claim 1, wherein said zigzag pattern comprises a plurality of concentric circles or concentric squares.
6. The mesh deviation checking apparatus according to claim 1, further comprising two bi-directional latches, wherein said upper frame is mounted to said vertical column by one of said bi-directional latches, said lower frame is mounted to said vertical column by the other of said bi-directional latches, and each of said bi-directional latches is slidably mounted to said vertical column and can lock its position.
7. The mesh deviation checker according to claim 1, wherein said light source is a point-like projection light source.
8. The checking method is used for detecting the test sieve, and is characterized by comprising the following steps:
assembling the mesh deviation checking device according to any one of claims 1 to 7;
adjusting the upper support to extend to a sufficient length according to the size of a screen mesh of the test screen to be detected so that projection light can vertically irradiate any screen mesh, and then fixing the upper support;
fixing the test sieve to be detected at the mounting position of the lower bracket and ensuring the test sieve to be horizontal, selecting any sieve pore to align with a projection light source, then fixing the extension distance of the lower bracket, and adjusting the longitudinal position of the lower bracket to ensure that the projection of the sieve pore to be detected on the bottom plate is clear;
obtaining the height of the light source and the height of the test sieve, and manufacturing the square-back pattern;
the standard plate with the size deviation is placed in the middle of the projection for comparison, and if the projection can completely fall in the square-back pattern, the size deviation of the sieve holes can be judged to meet the requirement; if the projection can not completely fall in the zigzag pattern, the size deviation of the sieve holes can be judged to be not qualified.
9. The checking method according to claim 8,it is characterized in that: the height of the light source is LACHeight L of said screen meshBCLength of side L of the test sieve0± deviation w, by the following formula:
L1＝L0-w； (1)
L2＝L0+w； (2)
Lmin＝L1*[LAC/(LAC-LBC)]； (3)
Lmax＝L2*[LAC/(LAC-LBC)]； (4)
(1)L1-the size allows a minimum;
(2)L2-the size allowed maximum;
(3) lmin-the minimum size after magnification;
(4) lmax-maximum of size after amplification
The square-shaped pattern is two concentric squares, and the side lengths of the two squares are Lmax and Lmin respectively.
10. The method for checking as claimed in claim 9, wherein in the comparison between the projection and said zigzag pattern, if the projection falls completely between two of said squares, it is judged that the size deviation of said screen hole is satisfactory; if the projection cannot fall completely between two squares, it can be determined that the size deviation of the screen aperture is not satisfactory.
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Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4498775A (en) * | 1982-02-17 | 1985-02-12 | Rca Corporation | Method for detecting distance deviations to a photoresist surface in an optical printer |
| CN2181050Y (en) * | 1993-04-08 | 1994-10-26 | 赵永柱 | Tolerance and fit demonstration device |
| CN2283830Y (en) * | 1996-12-20 | 1998-06-10 | 王建强 | Projector for measuring impact test piece |
| US20050219515A1 (en) * | 2004-04-06 | 2005-10-06 | Hiroshi Morohoshi | Aberration measuring method |
| CN101272184A (en) * | 2008-04-17 | 2008-09-24 | 深圳市世纪人无线通讯设备有限公司 | Light beam calibration method and device of optical system |
| CN101839691A (en) * | 2010-04-28 | 2010-09-22 | 苏州天准精密技术有限公司 | Image-based test sieve automatic calibrator |
| CN102566296A (en) * | 2010-12-31 | 2012-07-11 | 上海微电子装备有限公司 | Integration assembly method for photoetching exposure system |
| CN202350698U (en) * | 2011-11-17 | 2012-07-25 | 浙江金刚汽车有限公司 | Hole position degree deviation measuring device |
| CN102645171A (en) * | 2012-05-14 | 2012-08-22 | 厦门理工学院 | Device and method for measuring size and roundness of tiny round hole at same time |
| CN104048604A (en) * | 2014-06-23 | 2014-09-17 | 深圳市巨兆数码有限公司 | Battery size optical measurement method and system |
| CN106814557A (en) * | 2015-11-30 | 2017-06-09 | 上海微电子装备有限公司 | It is a kind of to Barebone and alignment methods |
| CN208171137U (en) * | 2018-04-19 | 2018-11-30 | 丹阳旭铃精密零部件有限公司 | Piece test tooling |
| CN109307485A (en) * | 2017-07-28 | 2019-02-05 | 徐广鑫 | A kind of vial vertical axis deviation test device |
| CN109375652A (en) * | 2018-11-05 | 2019-02-22 | 中国电力科学研究院有限公司 | A kind of Flat type photovoltaic tracking system tracking accuracy tester and test method |
| CN208902056U (en) * | 2018-08-14 | 2019-05-24 | 广西真龙实业有限责任公司 | A kind of device of quick inspection tipping sheet hole shape |
| CN110355819A (en) * | 2019-06-18 | 2019-10-22 | 成都飞机工业（集团）有限责任公司 | A kind of method for drilling of covering and skeleton connection structure |
-
2019
- 2019-11-18 CN CN201911126732.4A patent/CN112611689A/en active Pending
Patent Citations (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4498775A (en) * | 1982-02-17 | 1985-02-12 | Rca Corporation | Method for detecting distance deviations to a photoresist surface in an optical printer |
| CN2181050Y (en) * | 1993-04-08 | 1994-10-26 | 赵永柱 | Tolerance and fit demonstration device |
| CN2283830Y (en) * | 1996-12-20 | 1998-06-10 | 王建强 | Projector for measuring impact test piece |
| US20050219515A1 (en) * | 2004-04-06 | 2005-10-06 | Hiroshi Morohoshi | Aberration measuring method |
| CN101272184A (en) * | 2008-04-17 | 2008-09-24 | 深圳市世纪人无线通讯设备有限公司 | Light beam calibration method and device of optical system |
| CN101839691A (en) * | 2010-04-28 | 2010-09-22 | 苏州天准精密技术有限公司 | Image-based test sieve automatic calibrator |
| CN102566296A (en) * | 2010-12-31 | 2012-07-11 | 上海微电子装备有限公司 | Integration assembly method for photoetching exposure system |
| CN202350698U (en) * | 2011-11-17 | 2012-07-25 | 浙江金刚汽车有限公司 | Hole position degree deviation measuring device |
| CN102645171A (en) * | 2012-05-14 | 2012-08-22 | 厦门理工学院 | Device and method for measuring size and roundness of tiny round hole at same time |
| CN104048604A (en) * | 2014-06-23 | 2014-09-17 | 深圳市巨兆数码有限公司 | Battery size optical measurement method and system |
| CN106814557A (en) * | 2015-11-30 | 2017-06-09 | 上海微电子装备有限公司 | It is a kind of to Barebone and alignment methods |
| CN109307485A (en) * | 2017-07-28 | 2019-02-05 | 徐广鑫 | A kind of vial vertical axis deviation test device |
| CN208171137U (en) * | 2018-04-19 | 2018-11-30 | 丹阳旭铃精密零部件有限公司 | Piece test tooling |
| CN208902056U (en) * | 2018-08-14 | 2019-05-24 | 广西真龙实业有限责任公司 | A kind of device of quick inspection tipping sheet hole shape |
| CN109375652A (en) * | 2018-11-05 | 2019-02-22 | 中国电力科学研究院有限公司 | A kind of Flat type photovoltaic tracking system tracking accuracy tester and test method |
| CN110355819A (en) * | 2019-06-18 | 2019-10-22 | 成都飞机工业（集团）有限责任公司 | A kind of method for drilling of covering and skeleton connection structure |
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Application publication date: 20210406 |