CN112588665A

CN112588665A - Wet cleaning equipment for wafer processing

Info

Publication number: CN112588665A
Application number: CN202011313134.0A
Authority: CN
Inventors: 赵震
Original assignee: Linzhang Aohuang Network Technology Co ltd
Current assignee: Linzhang Aohuang Network Technology Co ltd
Priority date: 2020-11-20
Filing date: 2020-11-20
Publication date: 2021-04-02

Abstract

The invention discloses wet cleaning equipment for wafer processing, which is structurally provided with a support table, a liquid receiving box, a control table, a cleaning box, a quantity adjusting rod and a cleaning device, wherein a liquid stamping rotating ball generates interaction force with an external connecting plate and has certain buffering effect on liquid, the liquid is easily beaten and split under the action of the external connecting plate, so that the liquid flows into a dispersion cavity along a guide block, an arc swinging block performs hinged fluctuation swinging under the stretching and elastic effects of a telescopic frame and a force spring to perform drainage guiding effect on the liquid, so that the liquid can uniformly disperse and flow into the dispersion cavity, a flap rotating block generates arc swinging under different impact forces, the support rod generates certain extrusion force to push a hinged pulley to slide, the upper end point of the flap rotating block is assisted to perform larger-radian swinging for a fixed hinged shaft point, and then a swing sprinkling block is driven to circularly swing to facilitate inclined drainage along the liquid swing sprinkling block and have a larger range on the surface of a wafer below the wafer The cleaning and showering.

Description

Wet cleaning equipment for wafer processing

Technical Field

The invention belongs to the field of wafer coating, and particularly relates to wet cleaning equipment for wafer processing.

Background

The wafer is a semiconductor integrated circuit carrier manufactured by processing silicon, and can be processed into various circuit element structures, and during processing, along with the continuous fine size characteristics of the wafer, the influence of pollution particles in the air on the cleanliness of the processed wafer is increased, dust particles, metal pollutants and the like easily cause the damage of circuit functions in the wafer, and cleaning equipment is usually used for carrying out wet cleaning on the wafer.

Based on the discovery of the inventor, the existing wet cleaning equipment for wafer processing has the following defects:

the wet cleaning usually adopts liquid chemical agents, and through a spraying method, pollutants on the surface of a wafer are etched and dissolved, because cleaning equipment is usually only provided with one cleaning spray head in order to avoid cross contamination in the process of cleaning the wafer by the wet method, when the large-diameter wafer is cleaned, the wafer is not easy to be rapidly and uniformly cleaned by spraying because the spraying diameter width is smaller than the diameter of the wafer, so that the pollutants which are cleaned are deposited at other positions of the wafer under the action of the liquid which is washed off, and the cleaning difficulty is increased.

Therefore, it is necessary to provide a wet cleaning apparatus for wafer processing.

Disclosure of Invention

Aiming at the defects in the prior art, the invention aims to provide wet cleaning equipment for wafer processing so as to solve the problems in the prior art.

In order to achieve the purpose, the invention is realized by the following technical scheme: the utility model provides a wafer processing is with wet process cleaning equipment, its structure is equipped with props the platform, liquid connects the case, controls the platform, washs the case, measures transfer lever, belt cleaning device, liquid connects the case to establish in the inboard position that props the platform, it installs at wasing case side position to control the platform, it inlays solid the installing in the top surface end that props the platform to wash the case, the volume transfer lever is located washs case outside rear end position, belt cleaning device is connected and just clearance fit with the volume transfer lever, belt cleaning device moves about in wasing incasement portion top position.

The cleaning device is provided with a pipeline, a rear pipe cavity, a connection end, a square swinging head, a flushing pipeline and a spray head, wherein the rear pipe cavity is communicated and connected with the rear end position of the pipeline, the connection end is communicated with the position of the rear end of the pipeline, the square swinging head is movably connected with the front end position of the pipeline, the flushing pipeline is arranged below the square swinging head, and the spray head is communicated with the flushing pipeline.

As a further improvement of the invention, the spray header is provided with an outer frame, a through flow port, a dispersion cavity, a bottom shower area, a side through plate and a hinged pendulum body, wherein the through flow port and the outer frame are of an integrated structure and are arranged at the middle position of the through flow port in a penetrating way, the dispersion cavity is communicated with the through flow port and is arranged below the through flow port, the bottom shower area is arranged at the bottom position of the spray header, the side through plate is embedded in the dispersion cavity, the hinged pendulum body is hinged and connected to the side through plate, the side through plate is in an annular design and is arranged at two sides below the through flow port and is an air through plate controlled to be opened and closed by the hinged pendulum body, the hinged pendulum body is annularly distributed below the through flow port, and the bottom shower area is a plate with a plurality of air through holes.

As a further improvement of the invention, the hinged body is provided with a middle connecting rod, a rotating ball and a guide block, the rotating ball is movably connected at the front end of the middle connecting rod, the guide block is embedded and connected at the rear end of the middle connecting rod, the middle connecting rod is in a long plate block shape made of hard resin, and the rotating ball is in a spherical shape.

As a further improvement of the invention, the rotary ball is provided with a ball body, an external connecting plate and six rotation assisting diameters, wherein the external connecting plate is fixedly embedded at the peripheral position of the ball body, the rotation assisting diameters and the ball body are of an integrated structure, the external connecting plates are annularly distributed about the ball body, and the rotation assisting diameters are provided with five positions.

As a further improvement of the invention, the guide block is provided with a hard frame, an expansion bracket, an arc swinging block and a power-assisted spring, the hard frame and the guide block are of an integrated structure, one end of the arc swinging block is hinged to the upper end of the hard frame, the lower end of the expansion bracket is connected with the tail end of the hard frame, the upper end of the expansion bracket is connected with one end of the arc swinging block and is in movable fit with the arc swinging block, and the power-assisted spring is in movable fit with the arc swinging block.

As a further improvement of the invention, the bottom shower area is provided with a plate frame, a fluid guide and a through shower path, the plate frame and the bottom shower area are of an integrated structure, the through shower path is arranged adjacent to the plate frame, the fluid guide is movable in the through shower path, and the through shower path is a through opening.

As a further improvement of the invention, the drainage body is provided with a flap rotating block, a swinging and sprinkling block, a movable cavity, a hinged pulley and two supporting and connecting rods, the swinging and sprinkling block is fixedly embedded at the lower end of the flap rotating block, the movable cavity is positioned at the inner side of the flap rotating block, the hinged pulley slides at the bottom edge of the movable cavity, the supporting and connecting rods are embedded in the movable cavity and are movably matched, the upper end of the supporting and connecting rods is movably connected and movably matched with the inner side of the swinging and sprinkling block, the flap rotating block is in a semi-annular state, the swinging and sprinkling block is in an inverted triangular state, and the number of the supporting and connecting rods is two and is in an inverted eight.

Compared with the prior art, the invention has the following beneficial effects:

1. the ball is changeed in the continuous punching press of liquid, accept by external plate, liquid rush current power and its production interact force, the ball body is done and is rolled, there is certain cushioning effect to liquid, under the effect of external plate, liquid is beaten and produce the share easily, thereby easily by external plate interception and make liquid flow in to the effluence chamber along the guide block, under the flexible and elastic action of expansion bracket and helping hand spring, the swing of articulated fluctuation is done to the arc pendulum piece, its arcuation activity, produce drainage guide effect to liquid, make liquid ability homodisperse flow in the effluence chamber.

2. When liquid flows through the spraying channel, the petal rotating block is in a lower bracket arc state, the petal rotating block swings in an arc shape under different flushing flow forces, a certain extrusion force is generated on the supporting and connecting rod to push the hinge pulley to slide, so that the petal rotating block is assisted to swing in a larger arc shape by taking the upper end point as a fixed hinge shaft point, and then the swinging and spraying block is driven to circularly swing to facilitate the liquid to be drained along the inclination of the swinging and spraying block, and the lower wafer surface can be cleaned and sprayed in a larger range.

Drawings

FIG. 1 is a schematic structural diagram of a wet cleaning apparatus for wafer processing according to the present invention.

FIG. 2 is a schematic view of the internal cross-sectional structure of a cleaning apparatus according to the present invention.

Fig. 3 is a schematic view of an internal cross-sectional structure of a showerhead according to the present invention.

Fig. 4 is a schematic diagram of an internal cross-sectional structure of a pendulum according to the present invention.

Fig. 5 is a schematic view of the internal cross-sectional structure of a rotary ball according to the present invention.

Fig. 6 is a schematic view of an internal cross-sectional structure of a guide block according to the present invention.

FIG. 7 is a schematic view of an internal cross-sectional structure of a bottom shower area according to the present invention.

Fig. 8 is a schematic view of the internal cross-sectional structure of a drainage body according to the present invention.

In the figure: the device comprises a supporting table-1, a liquid connection box-2, a control table-3, a cleaning box-4, a quantity adjusting rod-5, a cleaning device-6, a pipeline-61, a rear pipe cavity-62, a connection end-63, a square swinging head-64, an impact flow pipeline-65, a spray head-66, an outer frame-661, a through port-662, a flow dispersing cavity-663, a bottom shower area-664, a side through plate-665, a hinged body-666, a middle connecting rod-q 1, a rotating ball-q 2, a guide block-q 3, a ball body-q 21, an external connecting plate-q 22, a rotation assisting diameter-q 23, a hard frame-q 31, an expansion bracket-q 32, an arc swinging block-q 33, a force assisting spring-q 34, a plate frame-w 1, a drainage body-w 2, a through shower diameter-w 3, a flap rotating block-w 21, a shower block-w 22, a movable connecting rod-23, a pulley-24 and a hinged rod-582.

Detailed Description

The invention is further described below with reference to the accompanying drawings:

example 1:

as shown in figures 1 to 6:

the invention provides wet cleaning equipment for wafer processing, which is structurally provided with a supporting table 1, a liquid receiving box 2, a control table 3, a cleaning box 4, a quantity adjusting rod 5 and a cleaning device 6, wherein the liquid receiving box 2 is arranged at the inner side position of the supporting table 1, the control table 3 is arranged at the side position of the cleaning box 4, the cleaning box 4 is fixedly embedded at the top surface end of the supporting table 1, the quantity adjusting rod 5 is positioned at the rear end position of the outer side of the cleaning box 4, the cleaning device 6 is connected with the quantity adjusting rod 5 and is movably matched with the quantity adjusting rod 5, and the cleaning device 6 is movably arranged at the upper position inside the cleaning box 4.

The cleaning device 6 is provided with a pipeline 61, a rear pipe cavity 62, a connection end 63, a square swinging head 64, a flushing pipeline 65 and a spray head 66, wherein the rear pipe cavity 62 is connected to the rear end of the pipeline 61 in a penetrating manner, the connection end 63 is connected to the position of the rear end of the pipeline 61 in a penetrating manner, the square swinging head 64 is movably connected to the front end of the pipeline 61, the flushing pipeline 65 is arranged below the square swinging head 64, and the spray head 66 is communicated with the flushing pipeline 65.

Wherein the spray head 66 is provided with an outer frame 661, a through-flow opening 662, a flow dispersing cavity 663, a bottom shower area 664, a side through plate 665 and a hinged pendulum body 666, the flow port 662 is integrated with the outer frame 661 and is disposed at a middle position thereof, the dispersion cavity 663 is communicated with the through flow port 662 and is arranged below the same, the bottom shower area 664 is positioned at the bottom of the shower head 66, the side through plate 665 is embedded in the dispersion cavity 663, the hinge body 666 is hinged with the side through plate 665, the side through plates 665 are designed in a ring shape, are positioned at two sides below the through flow port 662 and are hollow through plates controlled to be opened and closed by the hinged bodies 666, the hinged bodies 666 are annularly distributed below the through flow port 662, the bottom shower area 664 is a plate with a plurality of hollow through holes, the pendulum 666 swings under the force of the liquid flowing down, so that the side through plate 665 can allow the liquid to flow into the dispersion chamber 663.

Wherein, the hinge pendulum body 666 is equipped with well extension pole q1, commentaries on classics ball q2, guide block q3, commentaries on classics ball q2 swing joint connects the front end position of well extension pole q1, guide block q3 inlays the solid and connects in well extension pole q1 rear end, well extension pole q1 is the long plate body form of hard resin material, commentaries on classics ball q2 is globular, commentaries on classics ball q2 can constantly overturn and roll under receiving the impulsive flow power, and the liquid that the subtend is undershot has certain resistance to flow, leads liquid to control platform 3 simultaneously, makes the liquid share flow.

Wherein, ball q2 changes is equipped with spheroid q21, outer fishplate bar q22, helps and changes footpath q23, outer fishplate bar q22 inlays the peripheral position of connecting at spheroid q21, help and change footpath q23 and spheroid q21 structure as an organic whole, outer fishplate bar q22 is equipped with six, is cyclic annular distribution about spheroid q21, help and change footpath q23 and be equipped with five, outer fishplate bar q22 can be when accepting liquid and drive spheroid q21 and roll, makes liquid flow to other directions because of being hindered to flow.

The guide block q3 is provided with a hard frame q31, an expansion bracket q32, an arc swinging block q33 and a power-assisted spring q34, the hard frame q31 and the guide block q3 are of an integrated structure, one end of the arc swinging block q33 is hinged to the upper end of the hard frame q31, the lower end of the expansion bracket q32 is connected with the tail end of the hard frame q31, the upper end of the expansion bracket q32 is connected with one end of the arc swinging block q33 and movably matched with the same, the power-assisted spring q34 is movably matched with the arc swinging block q33, the arc swinging block q33 is in a sliding arc shape, and the expansion bracket q32 drives the arc swinging block q33 to perform radian swinging movement under the elastic matching of the power-assisted spring q 34.

The specific use mode and function of the embodiment are as follows: a person puts the wafer in the cleaning box 4, adjusts the console 3, so that the cleaning agent enters the pipeline 61 through the flow connecting end 63, the surface of the wafer can be cleaned in an angle change manner by breaking the square swinging head 64, the liquid flowing into the flushing pipeline 65 flows through the spray head 66 at the through-flow opening 662, the downward flushing force of the liquid presses the hinged body 666, the hinged body swings on the side through-flow plate 665 to tend to be transverse, the side through-flow plate 665 is not vertically blocked to be in a left-right through state, the liquid can conveniently flow into the dispersion cavity 663, the liquid continuously presses the rotary ball q2 and is received by the outer connecting plate q22, the liquid flushing force and the generated interaction force cause the outer connecting plate 22 to continuously drive the ball q21 to roll, the liquid can have a certain buffer blocking effect while the downward flow is not blocked, and the liquid can be easily beaten to generate split strands under the action of the outer connecting plate q22, therefore, the liquid is easily intercepted by the outer connecting plate q22 and flows into the dispersion cavity 663 along the guide block q3, when the arc swinging block q33 is subjected to different liquid pressures, the arc swinging block performs hinged fluctuation swinging under the stretching and elastic effects of the telescopic frame q32 and the power-assisted spring q34, performs arc movement, performs a drainage guide effect on the liquid, and enables the liquid to uniformly disperse and flow into the dispersion cavity 663.

Example 2:

as shown in fig. 7 to 8:

the bottom shower area 664 is provided with a plate frame w1, a drainage body w2 and a through shower path w3, the plate frame w1 and the bottom shower area 664 are of an integrated structure, the through shower path w3 is arranged adjacent to the plate frame w1, the drainage body w2 moves in the through shower path w3, the through shower path w3 is a through opening, and the drainage body w2 swings in a semi-ring arc shape along with the flowing-down liquid impact force to control the liquid flow and the flow direction flowing through the through shower path w 3.

Wherein the diversion body w2 is provided with a flap rotating block w21, a swing sprinkling block w22, a movable cavity w23, a hinge pulley w24 and a support connecting rod w25, the swing sprinkling block w22 is embedded and fixedly connected with the lower end of the flap rotating block w21, the movable cavity w23 is positioned inside the flap rotating block w21, the hinge pulley w24 slides on the bottom edge of the movable cavity w23, the support connecting rods w25 are embedded inside the movable cavity w23 and are movably matched, the upper end of the support connecting rod w25 is movably connected and movably matched with the inner side of the swing sprinkling block w22, the flap rotating block w21 is in a semi-annular state, the swing sprinkling block w22 is in an inverted triangular state, the support connecting rods w25 are provided with two inverted eight states and are hinged and connected with the hinge pulley w24 to form a group for matching movement, the flap rotating block w21 is subjected to different liquid flushing forces about the center to make the support connecting rod w25 subjected to different forces, push the arc pulley w24, displace the flap rotating block 24 to assist the swing of the flap rotating block to swing the flap sprinkling block 22 to change the swing angle, the cleaning surface of the liquid is prolonged.

The specific use mode and function of the embodiment are as follows: when the liquid flows uniformly in the dispersion cavity 663 and flows downwards through the bottom sprinkling region 664, and the liquid flows through the through sprinkling diameter w3, because the flap rotating block w21 is in a downward-extending arc-shaped state, the liquid can lead the flap rotating block w21 to swing in an arc shape under different flushing flow forces, a certain extrusion force is generated on the supporting rod w25, the supporting rod w24 is pushed to slide, the supporting rod w25 at the other end is pushed to move, so that the upper end point of the flap rotating block w21 is assisted to swing in a larger arc shape as a fixed hinge point, the swinging sprinkling block w22 is driven to swing in a circulating direction, the downward flushing flow of the liquid is guided, and the liquid can be conveniently drained along the inclination of the swinging sprinkling block w22 to clean and sprinkle the surface of a wafer below in a larger range.

The technical solutions of the present invention or similar technical solutions designed by those skilled in the art based on the teachings of the technical solutions of the present invention are all within the scope of the present invention to achieve the above technical effects.

Claims

1. The utility model provides a wafer processing is with wet process cleaning equipment, its structure is equipped with props platform (1), connects case (2), controls platform (3), washs case (4), volume transfer bar (5), belt cleaning device (6), liquid connects case (2) to establish in the inboard position that props platform (1), control platform (3) and install and wash case (4) side position, wash case (4) build solid and install the top surface end that props platform (1), volume transfer bar (5) are located and wash case (4) outside rear end position, belt cleaning device (6) are connected and clearance fit with volume transfer bar (5), belt cleaning device (6) move about in the inside top position of washing case (4), its characterized in that:

the cleaning device (6) is provided with a pipeline (61), a rear pipe cavity (62), a connecting end (63), a square swinging head (64), a flushing pipeline (65) and a spray head (66), the rear pipe cavity (62) is connected to the rear end of the pipeline (61) in a penetrating mode, the connecting end (63) penetrates through the position of the rear end of the pipeline (61) in a deviating mode, the square swinging head (64) is movably connected to the front end of the pipeline (61), the flushing pipeline (65) is arranged below the square swinging head (64), and the spray head (66) is communicated with the flushing pipeline (65).

2. The wet cleaning apparatus for wafer processing according to claim 1, wherein: shower head (66) are equipped with frame (661), through-flow mouth (662), scattered class chamber (663), end drench district (664), side and lead to board (665), the hinge pendulum body (666), through-flow mouth (662) and frame (661) be the integrated structure and link up and establish in its middle part position, scattered class chamber (663) link up mutually with through-flow mouth (662) and establish below it, end drench the bottom position that district (664) is located shower head (66), side leads to board (665) embedded in scattered class chamber (663), hinge pendulum body (666) articulated connection is in side and leads to board (665).

3. The wet cleaning apparatus for wafer processing according to claim 2, wherein: the articulated body (666) is equipped with extension rod (q1), commentaries on classics ball (q2), guide block (q3), change ball (q2) swing joint and connect the front end position of extension rod (q1) in the centre, guide block (q3) embedded solid is connected in extension rod (q1) rear end in the centre.

4. The wet cleaning apparatus for wafer processing according to claim 3, wherein: the rotary ball (q2) is provided with a ball body (q21), an external connecting plate (q22) and a rotation assisting diameter (q23), the external connecting plate (q22) is fixedly connected to the periphery of the ball body (q21) in an embedded mode, and the rotation assisting diameter (q23) and the ball body (q21) are of an integrated structure.

5. The wet cleaning apparatus for wafer processing according to claim 3, wherein: guide block (q3) are equipped with hard frame (q31), expansion bracket (q32), arc pendulum piece (q33), helping hand spring (q34), hard frame (q31) and guide block (q3) structure as an organic whole, the one end of arc pendulum piece (q33) is articulated to be connected in hard frame (q31) upper end position, the lower extreme and the hard frame (q31) end of expansion bracket (q32) are connected, the upper end and the arc pendulum piece (q33) one end of expansion bracket (q32) are connected and clearance fit, helping hand spring (q34) and arc pendulum piece (q33) clearance fit.

6. The wet cleaning apparatus for wafer processing according to claim 2, wherein: the end drenches district (664) and is equipped with grillage (w1), drainage body (w2), the penetrating footpath of drenching (w3), grillage (w1) drench district (664) with the end and be the integral structure, the penetrating drenches footpath (w3) and adjacent setting of grillage (w1), it drenches footpath (w2) in the penetrating activity of drenching in (w 3).

7. The wet cleaning apparatus for wafer processing according to claim 6, wherein: draw fluid (w2) to be equipped with lamella commentaries on classics piece (w21), pendulum drench piece (w22), activity chamber (w23), hinge pulley (w24), prop and connect pole (w25), pendulum drench piece (w22) and inlay solid and connect at lamella commentaries on classics piece (w21) lower extreme, activity chamber (w23) are located lamella commentaries on classics piece (w21) inboard, hinge pulley (w24) slide in the base in activity chamber (w23), prop and connect pole (w25) embedding in activity chamber (w23) inside and clearance fit, prop the upper end and the pendulum of connecting pole (w25) and drench piece (w22) inboard swing joint and clearance fit.