CN112563098B - Direct current photocathode ultrafast electron gun with immersed electrostatic lens - Google Patents
Direct current photocathode ultrafast electron gun with immersed electrostatic lens Download PDFInfo
- Publication number
- CN112563098B CN112563098B CN202110027537.7A CN202110027537A CN112563098B CN 112563098 B CN112563098 B CN 112563098B CN 202110027537 A CN202110027537 A CN 202110027537A CN 112563098 B CN112563098 B CN 112563098B
- Authority
- CN
- China
- Prior art keywords
- electrostatic lens
- electron gun
- ceramic
- disc
- cathode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/065—Construction of guns or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
- H01J37/10—Lenses
- H01J37/12—Lenses electrostatic
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/295—Electron or ion diffraction tubes
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
The invention provides a rear-mounted direct current photocathode ultrafast electron gun with an immersed electrostatic lens, which comprises a cathode, an anode, an electrostatic lens electrode, a ceramic disc, a fine ceramic column, an electrostatic lens electrode ceramic support and an electron gun support, wherein the cathode, the anode and the electrostatic lens electrode are determined by an electric field and a particle simulation program. The cathode comprises a hollow cylinder, a round top surface and an arc-shaped connecting surface. The anode comprises two smooth discs and a cylindrical bulge at the back side, and a through hole is formed in the center of the anode. The electrostatic lens electrode comprises a circular top surface, a cylindrical side surface and an arc-shaped connecting surface, and a through hole is formed in the center of the electrostatic lens electrode. The center of the round top surface is provided with a cylindrical bulge, and the bulged top ring surface is subjected to rounding treatment. The electron gun support is of a double-disc connection structure, the top disc is connected with the fine ceramic column and the ceramic disc, the cathode is fixed on the ceramic disc, and the anode is placed in a groove in the top disc. The electrostatic lens electrode is fixed to a ceramic support, which is fixed to a disk at the bottom of the support.
Description
Technical Field
The invention belongs to the field of ultrafast electron diffraction, and particularly relates to a direct current photocathode ultrafast electron gun with an immersed electrostatic lens and arranged in a rear mode.
Background
Biological, chemical and material, information science, etc., the most critical primary mechanism often occurs at the molecular or sub-molecular structural level, the time often ranges from picoseconds to femtoseconds, and the ultra-fast detection of picosecond to femtosecond processes is mostly aided by ultra-short pulse lasers. Ultra-fast electron diffraction (UED) is a technique that utilizes ultra-short pulse lasers to achieve time-resolved pump detection. The principle is that the light splitting device is used to split the ultra-short pulse laser into two beams, one beam is used to excite the cathode of the electron gun to generate probe electrons, and the other beam induces the reaction area, and the probe electrons are used to detect the reaction area in advance or delay by controlling the optical path of the two beams of laser, so as to realize time resolution measurement. The direct current photocathode electron gun is one of the core parts of the ultrafast electron diffraction technology and is a probe electron source.
In order to ensure parallelism, the cathode, anode, etc. components of the electron gun are generally assembled and then fixed on a bracket. However, since the cathode is connected to a negative high voltage power supply, the support needs to avoid structures such as tips, protrusions, openings, edges, vertical junctions, etc. to reduce the discharge caused by breakdown of the vacuum electric field. Part of the structural tip (e.g., the edges of the openings, etc.) is very difficult to eliminate, so the stent design requires rigorous electric field simulation and smoothing. The farther the support is from the cathode, the better from the standpoint of avoiding discharge, but this would result in an excessively large electron gun volume.
Due to the existence of electron space repulsive force, the probe electron pulse can be widened in the process of drifting to a sample, the radial radius is increased, and the spatial resolution of the electron pulse is reduced. The magnetic lens can focus the electron pulse but can cause electrons therein to rotate perpendicular to the propagation direction, creating a spiral path that is detrimental to the relevant applications of "shadowing" and "schlieren" in ultrafast electron diffraction techniques. The electrostatic lens focuses the electron pulse using the generated electrostatic field without creating a spiral path. Magnetic and electrostatic lens combination focusing may be used to improve the performance of the ultrafast electron diffraction system.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide a direct current photocathode ultrafast electron gun with an immersed electrostatic lens, which is arranged at the rear part and comprises a cathode, an anode and an electrostatic lens electrode, wherein the cathode, the anode and the electrostatic lens electrode are determined by an electric field and a particle simulation program result.
The cathode is of an axisymmetric structure, the bottom of the cathode is a hollow cylinder, the top of the cathode is of a spherical cap structure similar to a bell structure, an electrode connecting hole is formed in the side face of the hollow cylinder, and the spherical cap is of an axisymmetric structure and comprises a first circular top face at the top and a first arc-shaped connecting face connected with the first circular top face and the side face of the hollow cylinder. The anode is of an axisymmetric structure and is integrally a disc with two smooth surfaces, a first cylindrical bulge is arranged in the center of the back side of the disc with the two smooth surfaces, the top of the first cylindrical bulge is a smooth hemispherical surface, and a first through hole with the diameter of 0.2mm is formed in the center of the anode. The electrostatic lens electrode is provided with an axisymmetric structure, a second circular top surface, a cylindrical side surface and a second arc-shaped connecting surface for connecting the second circular top surface and the cylindrical side surface, a second cylindrical bulge is arranged in the center of the second circular top surface, a second through hole with the diameter of 4mm is formed in the center of the electrostatic lens electrode, and the top annular surface, connected with the inner side surface of the second through hole, of the second cylindrical bulge is subjected to rounding treatment to obtain a third arc-shaped connecting surface.
According to the simulation result of the electronic pulse computer program, the electric field is required to be symmetrically distributed, the electron gun is provided with a mounting structure which is specially ensured to be coaxially symmetrical, the parts are fixedly mounted, the flange on the anode side is mounted in a rear mode, the fixing part comprises a ceramic disc and a fine ceramic column which are used for fixing the cathode, a ceramic support used for fixing the electrostatic lens electrode, and an electron gun support used for fixing the parts.
According to the direct current photocathode ultrafast electron gun with the immersed electrostatic lens, preferably, the ceramic support comprises a bottom disc and a cylinder, the center of the ceramic support is provided with a third through hole, the whole electron gun support is of a double-disc connecting structure, the outer side face of the top disc of the double-disc connecting structure is provided with a circular groove with the diameter of 70mm and the depth of 1mm, the top disc is connected with the fine ceramic support and the ceramic disc, the ceramic support is fixed on the inner side face of the bottom disc of the double-disc connecting structure, the cathode is fixed in the center of the ceramic disc, and the anode is placed in the circular groove.
According to the direct current photocathode ultrafast electron gun with the immersed electrostatic lens, preferably, the diameter of a disc with smooth two surfaces of the anode is 70mm and the thickness of the disc is 1mm, and the height of the first cylindrical bulge is 4mm and the outer diameter of the first cylindrical bulge is 2mm; the diameter of the second circular top surface is 20mm, the radius of the second arc-shaped connecting surface is 5mm, the height of the second cylindrical bulge is 5mm, the outer diameter is 8mm, and the radius of the third arc-shaped connecting surface is 1mm.
The fixing mode of the rear-mounted electron gun ensures uniform and symmetrical electric field distribution, ensures the realization of acceleration and convergence of the electron pulse, reduces the volume of the device and is convenient for transplanting to other devices. The immersion type electrostatic lens can be used in combination with the magnetic lens for focusing, so that the adjustment of the spatial resolution of the device is more flexible, and the experimental function is expanded.
Drawings
Embodiments of the invention are further described below with reference to the accompanying drawings, in which:
FIG. 1 is an external perspective view of an electron gun and a peripheral vacuum chamber in accordance with an embodiment of the present invention;
FIG. 2 is a perspective view of the internal electron gun structure with one quarter of the leaked vacuum cavity outside the electron gun removed after being cut along the central axis Z shown in FIG. 1 in the X and Y directions;
FIG. 3 is a perspective view of a cathode of an electron gun according to an embodiment of the invention;
FIG. 4 is a perspective view of an electron gun anode according to an embodiment of the present invention;
fig. 5 is a perspective view of an electron gun immersion electrostatic lens electrode and its support according to an embodiment of the present invention;
fig. 6 is a perspective view of the cathode fixing member;
fig. 7 is a perspective view of an electronic gun rest according to an embodiment of the invention;
FIG. 8 is a simulation diagram of an electron gun immersion electrostatic lens potential distribution in accordance with an embodiment of the present invention;
fig. 9 is a graph showing the result of particle simulation of the focusing effect of probe electron pulses under an immersion electrostatic lens of an electron gun according to an embodiment of the present invention.
Detailed Description
For the purpose of making the technical solutions and advantages of the present invention more apparent, the present invention will be described in further detail below by way of specific embodiments with reference to the accompanying drawings, in which like reference numerals refer to like parts throughout the various drawings. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
For ease of description, the coordinate system is drawn in fig. 1, with the Z-axis coinciding with the central axis of the electron gun, and herein, "front side" refers to the face facing the incident laser beam 13 along the central axis Z shown in fig. 1, and "back side" refers to the face facing away from the incident laser beam 13.
Fig. 1 is an external perspective view of the electron gun and the peripheral vacuum chamber, and fig. 2 is a structural view of the internal electron gun with a quarter of the leakage removed from the peripheral vacuum chamber 9 of the electron gun cut along the central axis Z shown in fig. 1 in the X and Y directions. The electron gun mainly comprises a cathode 1, an anode 2, a cathode fixing disc 3, an electron gun bracket 4, an immersed electrostatic lens electrode 5, an electrostatic lens ceramic support 6 and a fine ceramic column 11, wherein the above components are fixed on an electron gun supporting flange 10 after being combined and are arranged in a vacuum cavity 9, the cathode 1 is externally connected with a negative high-voltage power supply through a vacuum electrode 7, and the electrostatic lens electrode 5 is externally connected with a focusing control power supply through a vacuum electrode 8. The incident laser 13 is incident into the cathode through the laser window 12 of the chamber, exciting probe electrons.
Fig. 3 is an external perspective view of a cathode 1 of an electron gun, the cathode of the electron gun has an axisymmetric structure, the bottom of the cathode is a hollow metal cylinder 1.1, an electrode connecting hole 1.2 is formed on the circular side surface of the hollow cylinder 1.1, and an electrode wire of a vacuum electrode 7 is inserted into the hole to realize power supply to the cathode. The top of the cathode is similar to a bell structure, and the bell structure comprises a central circular top surface 1.4 (the first circular top surface) and an arc-shaped connecting surface 1.3 (the first arc-shaped connecting surface) for connecting the circular top surface 1.4 and the side surface of the cylinder 1.1. The diameter of the round top surface 1.4 is 15mm, the center is provided with a light-passing hole, a quartz sheet is adhered on the surface through conductive silver, and a metal film with nano-scale thickness is plated on the quartz sheet. The chamfer radius of the arc-shaped connecting surface 1.3 is 13.8mm.
Fig. 4 is a perspective view of an anode 2 comprising a disc 2.1 and a cylindrical protrusion 2.2. The disc 2.1 is a disc with smooth two surfaces, the diameter is 70mm, the thickness is 1mm, and the two surfaces are polished smoothly. The cylindrical protrusion 2.2 (the first cylindrical protrusion) is positioned at the center of the back of the disc, the diameter is 2mm, the surface of the disc 2.1 is protruded by 4mm, the top of the cylindrical protrusion 2.2 is subjected to smooth treatment, and a smooth spherical surface 2.3 and a radius of 1mm are obtained. The center of the disc 2.1 and the cylindrical protrusion 2.2 are jointly provided with a through hole 2.4 (the first through hole) with the diameter of 0.2 mm.
Fig. 5 is a perspective view of the immersed electrostatic lens electrode 5 and its ceramic support 6, the electrode 5 has an axisymmetric structure, comprising a circular top surface 5.3 (the second circular top surface), a cylindrical side surface 5.1, an arc-shaped connecting surface 5.2 connecting the circular top surface 5.3 and the cylindrical side surface 5.1 (the second arc-shaped connecting surface), and a cylindrical protrusion 5.4 (the second cylindrical protrusion) in the center of the circular top surface 5.3. The electrode 5 has a through hole 5.6 (said second through hole) in the centre. The circular top surface of the top of the cylindrical protrusion 5.4 is chamfered and smooth, so that the outer side surface of the cylindrical protrusion 5.4 is connected with the inner side surface of the opening 5.6 through an arc-shaped connecting surface 5.5 (the third arc-shaped connecting surface). The diameter of the cylindrical side face is 5.1 mm, the height is 5mm, the radius of the arc-shaped connecting face is 5.2 fillets is 5mm, the diameter of the circular top face is 5.3 mm, the outer diameter of the cylindrical protrusion is 5.4 mm, the surface of the protrusion is 5.3 mm, the diameter of the opening is 5.6 mm, the diameter of the opening is 4mm, and the radius of the arc-shaped connecting face is 5.5 fillets is 1mm.
The ceramic support 6 comprises a bottom disc 6.1 and a cylinder 6.2, the whole support 6 being machined from a monolithic ceramic in order to ensure flatness. The center of the pillar 6 is provided with a through hole 6.4 (the third through hole) which is an electronic pulse channel. Four through holes 6.5 are distributed around the periphery of the through hole 6.4 for fixing the electrostatic lens electrode 5. Four through holes 6.3 are distributed on the periphery of the bottom disc 6.1 for fixing the whole support.
Fig. 6 is a perspective view of the cathode fixing ceramic disk 3 and the fine ceramic posts 11. The center of the ceramic disc 3 is provided with a through hole 3.1. The through holes 3.1 are laser channels around which four through holes 3.2 are distributed for fixing the cathode. Four through holes 3.3 are formed at the edge of the disc 3. The fine ceramic columns are connecting columns, four in total, and are used for connecting the disc 3 with the electron gun bracket 4. Threaded holes 11.1 are formed in two sides of the ceramic connecting column 11.
Fig. 7 is a perspective view of an electron gun support 4, the support 4 is a bimetal disc connection structure, a larger through hole is formed in the center of a top disc, and a circular groove 4.1 is formed in the upper surface of the disc. The circular groove 4.1 has a diameter of 70mm and a depth of 1mm and is used for placing the anode. 4 threaded holes 4.2 are formed in the outer side of the groove 4.1 and used for fixing the ceramic connecting column 11. The center of the disk plane at the bottom side of the bracket 4 is provided with a through hole 4.4 which is an electronic pulse channel. The inner side of the disk at the bottom side of the bracket is provided with 4 threaded holes 4.5 for fixing the ceramic bracket 6. The edge side of the disk at the bottom side of the bracket is provided with 4 through holes 4.3, and the bracket 4 can be fixed on the electron gun support flange 10 by bolts through the through holes 4.3. The center of the electron gun support flange 10 is provided with a through hole 10.1, and the outer side of the electron gun support flange is provided with a flange knife edge which can be connected with other devices.
In order to further optimize the surface electric field distribution and ensure the surface smoothness, the surfaces of the cathode 1, the anode 2, the electrostatic lens electrode 5 and the electron gun support 4 are subjected to mechanical rough polishing, electrolytic polishing, artificial fine polishing and high vacuum cleaning, so that the surface smoothness reaches the micrometer level.
Electron gun assembly: the bottom surface of the groove 4.1 is coated with conductive silver paste, and the anode 2 is placed and bonded. The electrostatic lens electrode 5 is fixed to the post 6 by the through hole 6.5 and the bolt. The support column 6 is fixed on the disk surface at the bottom of the bracket 4 by using the through hole 6.3, the threaded hole 4.5 and the bolt. The ceramic connecting posts 11, the ceramic disc 3 are connected with the top disc of the bracket 4 by means of through holes 3.3, threaded holes 11.1, threaded holes 4.2, bolts or the like. The cathode 1 is fixed to the disk 3 by means of through holes 3.2 and bolts. The bracket 4 is fixed to the electron gun support flange 10 by means of bolts and through holes 4.3, and then the electron gun is mounted in the chamber 9, and the flange 10 is fixed by means of bolts. The cathode vacuum electrode 7 is installed, the electrode wire is inserted into the connecting through hole 1.2, the vacuum electrode 8 is installed, and the electrode wire is connected with the electrostatic lens electrode 5. The cathode, anode, electrostatic lens electrode, etc. are all mounted on a mount that is mounted on flange 10 on the side of the anode opposite the incident laser beam 13, and thus are mounted in a rear position.
The bracket 4 is obtained by hollowing out a whole piece of metal without welding so as to ensure the perpendicularity and the parallelism of an upper disk surface and a lower disk surface. The cathode 1, the anode 2 and the electrostatic lens electrode 5 are all fixed by the bracket to form a whole, so that the parallelism between the anode disc surface and the cathode surface is ensured, and the axial center lines of the cathode 1, the anode 2 and the electrostatic lens electrode 5 are ensured to be positioned on a straight line. The parallelism and the axis center line are aligned to prevent the electric field from being unevenly distributed, otherwise, the local electric field is too large to influence the convergence and acceleration of electrons by the electric field. All the fixing parts (e.g. bolts or screws etc.) are built in or back-stored, thereby preventing local electric field discharge. All metal parts in the electron gun are made of weak magnetic stainless steel, so that the antimagnetic performance is improved.
The electron gun works: the laser 13 passes through the chamber laser window 12 and then enters the inside of the cathode through the central opening 3.1 of the ceramic disc 3, exciting the metal film on the surface of the circular top surface 1.4 of the cathode to generate an electronic pulse. The generated electron pulse is accelerated by the electric field between the cathode and the anode and then passes through the through hole 2.4 in the centre of the anode. The electric field between the electrostatic lens electrode and the anode concentrates the electric pulses. The electronic pulse then leaves the electron gun through the through holes 5.6, 6.4, 4.4 and finally leaves the chamber through the through hole 10.1.
Fig. 8 is a simulated view of the potential distribution of an immersed electrostatic lens, wherein the anode potential is 0, the potential of the electrostatic lens electrode 5 is-10000V, and some parts are marked in the figure, and the relevant dimensions are described above. The anode 2 and the electrostatic lens electrode 5 together constitute an immersion electrostatic lens.
Fig. 9 shows a simulation of an electronic pulse under the present design using a particle simulation program, where the horizontal axis distance is the distance from the cathode surface in meters and the vertical axis Radius is the Radius of the electronic pulse. The initial radius of the electron pulse is 50 microns, the initial radial diffusion speed is set to 0, and the acceleration voltage between the cathode and the anode is-100 kV. The top most end of the arc-shaped connection surface 5.5 at the top of the electrostatic lens electrode 5 is 13mm from the cathode, the general position of the immersed electrostatic lens being marked with a straight dashed line AA' in fig. 9. In fig. 9, the solid curve is marked with v= -10000, and n=10000, which means that the simulation parameter adopted by the result is voltage-10000V on the electrostatic lens electrode, and the number of electrons in the electronic pulse is 10000. Similarly, the virtual curve is marked with V= -5000 and N=1000, which indicates that the simulation parameters adopted by the result are that the voltage on the electrostatic lens electrode is-5000V and the number of electrons in the electronic pulse is 1000. As can be seen from the figure, the immersion electrostatic lens of the present invention has a converging effect on the electric pulse.
It should be noted here that the dimensions and configurations mentioned in the present invention are only suitable for a certain application scenario, and are not necessarily optimal configurations for other situations, and the design parameters most suitable for the application scenario need to be obtained by electric field and particle program simulation for specific situation analysis. The dimensions and configurations mentioned in this invention can be used as references for related scientific research and design applications.
While the invention has been described in terms of preferred embodiments, the invention is not limited to the embodiments described herein, but encompasses various changes and modifications that may be made without departing from the scope of the invention.
Claims (2)
1. The direct current photocathode ultrafast electron gun with the immersed electrostatic lens is characterized in that the main structure of the direct current photocathode ultrafast electron gun comprises a cathode, an anode, an electrostatic lens electrode, a ceramic disc, a fine ceramic column, a ceramic support, an electron gun support flange, a vacuum electrode 7 and a vacuum electrode 8;
the cathode is of an axisymmetric structure and comprises a hollow cylinder, a first circular top surface and a first arc-shaped connecting surface for connecting the side surface of the hollow cylinder and the first circular top surface, a light passing hole is formed in the center of the first circular top surface, and an electrode connecting hole is formed in the circular side surface of the hollow cylinder;
the anode is of an axisymmetric structure and comprises two smooth-surface discs and a first cylindrical bulge, wherein the top of the first cylindrical bulge is a smooth spherical surface with the radius of 1mm, the first cylindrical bulge is positioned at the center of the back surfaces of the two smooth-surface discs, and the two smooth-surface discs and the center of the first cylindrical bulge are jointly provided with a through first through hole with the diameter of 0.2 mm;
the electrostatic lens electrode is of an axisymmetric structure, and comprises a second circular top surface, a cylindrical side surface, a second arc-shaped connecting surface for connecting the second circular top surface and the cylindrical side surface, a second cylindrical bulge and a second through hole with the diameter of 4mm in the center of the electrostatic lens electrode, wherein the outer side surface of the second cylindrical bulge and the top annular surface connected with the inner side surface of the second through hole are subjected to rounding treatment to obtain a third arc-shaped connecting surface, and the second cylindrical bulge is positioned in the center of the second circular top surface;
the ceramic support column comprises a bottom disc and a cylinder, a third through hole is formed in the center of the ceramic support column, 4 through holes 6.5 are distributed at the periphery of the third through hole, and 4 through holes 6.3 are distributed at the periphery of the bottom disc of the ceramic support column; the electron gun bracket is a bimetal disc connecting structure, the upper surface of a top disc of the bimetal disc connecting structure is provided with a circular groove with the diameter of 70mm and the depth of 1mm, and 4 threaded holes are formed in the outer side of the circular groove;
a through hole 3.1 is formed in the center of the ceramic disc, and 4 through holes 3.2 are distributed around the through hole 3.1;
the cathode is fixed on the ceramic disc through the 4 through holes 3.2, the number of the thin ceramic columns is 4, one end of the thin ceramic columns is connected with the ceramic disc, the other end of the thin ceramic columns is fixed on the 4 threaded holes on the outer side of the circular groove of the electron gun support, the anode is arranged in the circular groove of the electron gun support, the electrostatic lens electrode is fixed on the ceramic support through the 4 through holes 6.5, the bottom disc of the ceramic support is fixed on the bottom disc surface of the electron gun support through the 4 through holes 6.3, the electron gun support is fixed on an electron gun support flange, the electrode wire of the vacuum electrode 7 is inserted into the electrode connecting hole of the cathode, and the electrode wire of the vacuum electrode 8 is connected with the electrostatic lens electrode;
the axial center lines of the cathode, the anode and the electrostatic lens electrode are positioned on a straight line, and the topmost end of the third arc-shaped connecting surface at the top of the electrostatic lens electrode is 13mm away from the cathode.
2. A direct current photocathode ultrafast electron gun with an immersed electrostatic lens, as in claim 1, wherein the diameter of the first circular top surface of the cathode is 15mm, and the chamfer radius of the first arc-shaped connecting surface is 13.8mm; the diameter of the smooth discs on the two surfaces of the anode is 70mm, the thickness of the smooth discs is 1mm, and the first cylindrical bulges protrude out of the surfaces of the discs by 4mm and the outer diameter of the first cylindrical bulges is 2mm; the diameter of the cylindrical side face of the electrostatic lens electrode is 30mm, the height of the cylindrical side face of the electrostatic lens electrode is 5mm, the diameter of the second circular top face is 20mm, the radius of the second arc-shaped connecting face rounding angle is 5mm, the second cylindrical protruding second circular top face is 5mm, the outer diameter of the second cylindrical protruding second circular top face is 8mm, and the radius of the third arc-shaped connecting face rounding angle is 1mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110027537.7A CN112563098B (en) | 2021-01-10 | 2021-01-10 | Direct current photocathode ultrafast electron gun with immersed electrostatic lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202110027537.7A CN112563098B (en) | 2021-01-10 | 2021-01-10 | Direct current photocathode ultrafast electron gun with immersed electrostatic lens |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN112563098A CN112563098A (en) | 2021-03-26 |
| CN112563098B true CN112563098B (en) | 2023-06-09 |
Family
ID=75035429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202110027537.7A Active CN112563098B (en) | 2021-01-10 | 2021-01-10 | Direct current photocathode ultrafast electron gun with immersed electrostatic lens |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112563098B (en) |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000055690A2 (en) * | 1999-03-18 | 2000-09-21 | Etec Systems, Inc. | A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| WO2012126792A1 (en) * | 2011-03-18 | 2012-09-27 | Ecole Polytechnique Federale De Lausanne (Epfl) | Electron beam apparatus |
| CN106409635A (en) * | 2016-10-19 | 2017-02-15 | 中国科学院西安光学精密机械研究所 | Short magnetic focusing device and method for transversal compression of ultrafast electronic pulses |
| CN106645236A (en) * | 2016-10-20 | 2017-05-10 | 中国科学院物理研究所 | Ultra-fast transmission electron microscope system and use method thereof |
| CN106816349A (en) * | 2017-01-09 | 2017-06-09 | 中国科学院物理研究所 | A kind of direct current photocathode ultra-fast electron gun |
| CN111326380A (en) * | 2020-03-30 | 2020-06-23 | 赣南师范大学 | Direct current ultrafast electron gun of composite focusing grid-carrying photocathode |
-
2021
- 2021-01-10 CN CN202110027537.7A patent/CN112563098B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2000055690A2 (en) * | 1999-03-18 | 2000-09-21 | Etec Systems, Inc. | A compact photoemission source, field and objective lens arrangement for high throughput electron beam lithography |
| WO2012126792A1 (en) * | 2011-03-18 | 2012-09-27 | Ecole Polytechnique Federale De Lausanne (Epfl) | Electron beam apparatus |
| CN106409635A (en) * | 2016-10-19 | 2017-02-15 | 中国科学院西安光学精密机械研究所 | Short magnetic focusing device and method for transversal compression of ultrafast electronic pulses |
| CN106645236A (en) * | 2016-10-20 | 2017-05-10 | 中国科学院物理研究所 | Ultra-fast transmission electron microscope system and use method thereof |
| CN106816349A (en) * | 2017-01-09 | 2017-06-09 | 中国科学院物理研究所 | A kind of direct current photocathode ultra-fast electron gun |
| CN111326380A (en) * | 2020-03-30 | 2020-06-23 | 赣南师范大学 | Direct current ultrafast electron gun of composite focusing grid-carrying photocathode |
Non-Patent Citations (4)
| Title |
|---|
| 100 keV直流光阴极电子枪接入真空电极后的电场仿真;李梦超等;《赣南师范大学学报》;20201231;第41卷(第006期);全文 * |
| 百千伏超快电子衍射系统的研发;李梦超;《 博士电子期刊》;20170915;全文 * |
| 超快电子脉冲的时域压缩;田进寿等;《光学精密工程》;20111015(第10期);全文 * |
| 超短电子脉冲展宽的外场依赖性分析;王超等;《真空科学与技术学报》;20130215(第02期);全文 * |
Also Published As
| Publication number | Publication date |
|---|---|
| CN112563098A (en) | 2021-03-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101022075B (en) | Scanning electron microscope and apparatus for detecting defect | |
| JP2010520581A (en) | Device for field emission of particles and manufacturing method | |
| CN106816349B (en) | A kind of direct current photocathode ultra-fast electron gun | |
| US3644731A (en) | Apparatus for producing an ion beam by removing electrons from a plasma | |
| JP2009230999A (en) | Time-of-flight mass spectrometer and charged particle detector used for it | |
| CN112563098B (en) | Direct current photocathode ultrafast electron gun with immersed electrostatic lens | |
| KR20210095176A (en) | electrostatic chuck | |
| US4870283A (en) | Electric multipole lens | |
| JP2007087885A (en) | Electrically-charged particle detector | |
| KR102123887B1 (en) | Ion milling device | |
| CN111326380B (en) | Direct current ultrafast electron gun of composite focusing grid-carrying photocathode | |
| CN214099571U (en) | Direct current ultrafast electron gun with static single lens | |
| CN112490100A (en) | Direct current ultrafast electron gun with static single lens | |
| CN209133447U (en) | Scanning camera with electronic impulse alignment function | |
| CN109545640A (en) | Scanning camera with electronic impulse alignment function | |
| JPS61225746A (en) | Electron beam apparatus | |
| CN110890256B (en) | Non-magnetic femtosecond electron source device with adjustable convergence angle | |
| CN114355432A (en) | Miniature weak charged particle beam detection device | |
| CN105470082B (en) | A kind of 90 degree of deflectors of electron beam | |
| KR101089234B1 (en) | X-ray tube | |
| JP6947831B2 (en) | Drawer electrode for electron source | |
| KR102601456B1 (en) | Schottky thermal field emitter with integrated beam splitter | |
| CN219094026U (en) | Laser vacuum perforating device for electrostatic adsorption of slag ash | |
| JPH01260742A (en) | Charged beam gun | |
| TWI769728B (en) | Charged Particle Gun and Charged Particle Beam System |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |