CN112540511A - Stage apparatus, lithographic apparatus, and article manufacturing method - Google Patents
Stage apparatus, lithographic apparatus, and article manufacturing method Download PDFInfo
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- CN112540511A CN112540511A CN202010964290.7A CN202010964290A CN112540511A CN 112540511 A CN112540511 A CN 112540511A CN 202010964290 A CN202010964290 A CN 202010964290A CN 112540511 A CN112540511 A CN 112540511A
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- 238000001459 lithography Methods 0.000 claims description 5
- 239000000696 magnetic material Substances 0.000 claims description 3
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
The invention relates to a stage apparatus, a lithographic apparatus and an article manufacturing method. [ problem ] to provide a mounting table device which is advantageous in terms of high precision in positioning a fine movement mounting table. [ solution ] A mounting table device is provided with: a coarse movement stage; a fine movement stage; an electromagnetic actuator disposed between the coarse movement stage and the fine movement stage, the electromagnetic actuator providing a thrust force to the fine movement stage in a direction along a surface of the coarse movement stage; and a control unit that controls the electromagnetic actuator, wherein the control unit determines a control parameter of the electromagnetic actuator based on a drive start position of the rough movement stage.
Description
Technical Field
The invention relates to a stage apparatus, a lithographic apparatus and an article manufacturing method.
Background
A lithographic apparatus used for manufacturing articles such as semiconductor devices includes a stage device that moves while holding a master or a substrate. The stage apparatus in this technical field may include: a coarse movement stage which is driven by a coarse movement linear motor in a large stroke; and a fine movement stage on which fine positioning is performed by a fine movement linear motor. A stage apparatus of a lithographic apparatus is required to perform positioning with a large stroke, high speed, and high accuracy. As a mounting table device which is required to have such performance, there is a device which further includes an electromagnetic actuator for causing a fine movement mounting table to follow a coarse movement mounting table at a high acceleration (for example, patent document 1).
Documents of the prior art
Patent document
Patent document 1: japanese patent laid-open publication No. 2019-121656
Disclosure of Invention
However, in order to improve throughput, a demand for increasing the moving speed of the mounting table has been increasing year by year. Therefore, the problem that the positioning accuracy of the fine movement stage cannot be improved in accordance with the increase in speed of the coarse movement stage becomes remarkable.
The present invention aims to provide a mounting table device which is advantageous for high precision positioning of a fine movement mounting table, for example.
According to a 1 st aspect of the present invention, there is provided a mounting table apparatus comprising: a coarse movement stage; a fine movement stage; an electromagnetic actuator disposed between the coarse movement stage and the fine movement stage, the electromagnetic actuator providing a thrust force to the fine movement stage in a direction along a surface of the coarse movement stage; and a control unit that controls the electromagnetic actuator, wherein the control unit determines a control parameter of the electromagnetic actuator based on a drive start position of the rough movement stage.
According to a 2 nd aspect of the present invention, there is provided a lithographic apparatus comprising the stage apparatus according to the 1 st aspect and a master plate holding unit mounted on the stage apparatus, wherein a pattern of the master plate held by the master plate holding unit is transferred to a substrate.
According to a 3 rd aspect of the present invention, there is provided a lithographic apparatus comprising the stage apparatus according to the 1 st aspect and a substrate holding unit mounted on the stage apparatus, wherein a pattern of an original plate is transferred to a substrate held by the substrate holding unit.
According to the 4 th aspect of the present invention, there is provided a method for manufacturing an article, comprising a step of forming a pattern on a substrate using the lithographic apparatus according to the 2 nd or 3 rd aspect, and a step of processing the substrate on which the pattern is formed, wherein the article is manufactured from the processed substrate.
According to the present invention, for example, a mounting table device advantageous for high accuracy in positioning of a fine movement mounting table can be provided.
Drawings
Fig. 1 is a diagram showing the structure of an exposure apparatus.
Fig. 2 is a diagram showing a structure of a master stage (stage apparatus).
Fig. 3 is a control block diagram of the coarse movement table.
Fig. 4 is a diagram showing the structure of the coarse linear motor.
Fig. 5 is a diagram showing the structure of the electromagnetic actuator.
Fig. 6 is a control block diagram of the fine movement stage in one example.
Fig. 7 is a flowchart illustrating a method of adjusting the gain G.
Fig. 8 is a diagram illustrating a relationship between a driving position of the mover of the coarse movement stage and a thrust constant.
Fig. 9 is a graph showing an average value of the deviation in the constant velocity section of the fine movement stage relative to the drive start position.
Fig. 10 is a flow chart of a method of making a gain table.
Fig. 11 is a diagram illustrating a method of calculating a driving start position from a period of a thrust constant.
Fig. 12 is a control block diagram of the fine movement stage.
Fig. 13 is a diagram illustrating a method of calculating the drive start position from the differential value of the thrust constant.
Detailed Description
The embodiments are described in detail below with reference to the accompanying drawings. The following embodiments do not limit the invention according to the claims. A plurality of features are described in the embodiments, but not all of the plurality of features are essential to the invention, and a plurality of features may be arbitrarily combined. In the drawings, the same or similar components are denoted by the same reference numerals, and redundant description thereof is omitted.
The stage apparatus of the present invention is applicable to a lithographic apparatus for forming a pattern of an original plate on a substrate. The lithography apparatus may be any of an exposure apparatus, an imprint (imprint) apparatus, a charged particle beam lithography apparatus, and the like. The exposure device exposes a photoresist supplied onto the substrate through the master plate, thereby forming a latent image corresponding to the pattern of the master plate on the photoresist. The imprint apparatus forms a pattern on a substrate by curing an imprint material supplied onto the substrate while bringing a mold (original plate) into contact with the imprint material. The charged particle beam writing device forms a latent image on a photoresist supplied onto a substrate by writing a pattern on the photoresist using a charged particle beam. Hereinafter, an example in which the stage apparatus of the present invention is applied to an exposure apparatus which is one of lithography apparatuses will be described in order to provide a specific example. In addition, although an example in which the stage apparatus of the present invention is applied to the original plate stage of the exposure apparatus is described below, the stage apparatus of the present invention may be applied to the substrate stage in the same manner.
Fig. 1 is a schematic diagram illustrating a configuration of an exposure apparatus 100 according to the present embodiment. In the present specification and the drawings, directions are shown in an XYZ coordinate system in which a horizontal plane is an XY plane. Directions parallel to the X, Y, and Z axes in the XYZ coordinate system are referred to as the X, Y, and Z directions. Generally, the substrate W is treated so that the surface of the substrate W becomes parallel to a horizontal plane (XY plane).
The exposure apparatus 100 is, for example, a scanning type exposure apparatus that exposes (transfers) a pattern of a reticle R (projection mask) onto a substrate W by a step-and-scan method. In the step-and-sweep method, exposure is performed for 1 shot (shot) while the original plate R and the substrate W are relatively scanned (swept), and after the exposure for 1 shot is completed, the substrate is moved to the next shot region by step movement.
The illumination system 101 illuminates the original plate R by adjusting light emitted from a light source not shown. The original plate R is made of, for example, quartz glass, and a pattern (for example, a circuit pattern) to be transferred onto the substrate W is formed thereon. The original plate stage 110 is movable in directions X, Y, Z with an original plate holding portion 110a for holding an original plate R mounted thereon. The projection optical system 111 projects the light having passed through the original plate R onto the substrate W at a predetermined magnification (for example, 1/4 times). The substrate W is, for example, a substrate made of single crystal silicon, and a resist (a photosensitive agent) is applied to a surface thereof in advance. The substrate mounting table 104 is movable in directions X, Y, Z with a chuck (chuck)105 (substrate holding section) for holding the substrate W mounted thereon. In the exposure apparatus 100, the illumination system 101 and the projection optical system 111 constitute a forming section for forming a pattern of the original plate R on the substrate W held on the substrate mounting table 104 via the chuck 105.
The control device 106 is constituted by a computer including a CPU and a memory, for example, and is connected to each of the constituent elements of the exposure apparatus 100, and can collectively perform operations of the constituent elements in accordance with a program. The controller 106 may be configured in a common housing with other parts of the exposure apparatus 100, or may be configured independently of other parts of the exposure apparatus 100.
Fig. 2 is a diagram showing a structure of the original plate mounting table 110 (mounting table apparatus). The original plate stage 110 includes a coarse movement stage 11 and a fine movement stage 21 that moves on the coarse movement stage 11.
The coarse movement stage 11 may be driven by a coarse movement linear motor 13. The coarse linear motor 13 includes coarse linear motors 13a and 13b on the left and right sides. The coarse linear motor 13a includes a mover 31a and a stator 32a, and the coarse linear motor 13b includes a mover 31b and a stator 32 b. The stators 32a and 32b are supported by a not-shown mounting table, and the movers 31a and 31b are coupled to be driven in the Y direction together with the coarse movement mounting table 11 by electromagnetic action of the stators 32a and 32 b.
The fine movement stage 21 may be driven by a fine movement linear motor disposed between the coarse movement stage 11 and the fine movement stage 21. The micro linear motor may include: a micro X linear motor 51 generating a driving force in the X direction; a fine Y linear motor 52 for generating a driving force in the Y direction; and a fine Z linear motor 53 that generates a driving force in the Z direction. The fine X linear motor 51 includes fine X linear motors 51a and 51b disposed at both ends of the fine mounting table 21 in the X direction. The fine Y linear motors 52 include fine Y linear motors 52a and 52b disposed at both ends of the fine mounting table 21 in the Y direction. The fine Z linear motors 53 include fine Z linear motors 53a, 53b, 53c, and 53d arranged at four corners of the fine mounting table 21. The micro linear motors are position controlled in 6 axes (X, Y, Z and direction of rotation about each axis) by a control system that is independent for each axis.
Further, between the coarse movement stage 11 and the fine movement stage 21, an electromagnetic actuator 41 is disposed which applies thrust to the fine movement stage 21 in the Y direction which is a direction along the surface of the coarse movement stage 11 by the action of an electromagnet. The electromagnetic actuator 41 includes electromagnetic actuators 41a and 41b arranged at positions in the Y direction with the center portion of the fine movement stage 21 interposed therebetween.
Fig. 3 is a control block diagram of the coarse movement table 11. The position of the coarse movement stage 11 is detected by a position detector (not shown) such as a laser interferometer or an encoder, and the input position command value of the coarse movement stage 11 and the deviation of the detected position are input to the controller 101. For example, the controller 101 based on the PID control system generates a command value for providing thrust to the coarse linear motor 11 from the deviation of the input, and outputs the command value to the current driver 102. The current driver 102 supplies a current corresponding to the input command value to the coarse linear motor 13. The coarse linear motor 13 generates a driving force in the Y direction by appropriately flowing a current through the coil, and drives the coarse stage 11. Thus, the position of the coarse movement stage 11 is feedback-controlled.
Fig. 4 is a diagram showing the structure of the coarse linear motor 13 a. The coarse linear motor 13b has the same structure as the coarse linear motor 13a, and therefore, the description of the structure of the coarse linear motor 13b is omitted. In fig. 4, the mover 31a has: a magnet assembly 62 including a magnet group including a plurality of permanent magnets; and a rotor plate 63 mounted on the mounting table for holding the magnet assembly 62. The magnet assembly 62 includes a plurality of main pole magnets 62a whose magnetic poles are oriented in the Z direction and a plurality of complementary pole magnets 62b whose magnetic poles are oriented in the Y direction. The plurality of main pole magnets 62a and the plurality of complementary pole magnets 62b are alternately arranged in the Y direction. Here, the magnetic pole directions of the plurality of main pole magnets 62a are alternately in opposite directions (± Z direction), and similarly, the magnetic pole directions of the plurality of complementary pole magnets 62b are also alternately in opposite directions (± Y direction).
The stator 32a includes a yoke 65 made of a ferromagnetic body and a plurality of coils 61 arranged at equal intervals in the Y direction in the yoke 65. 2 stators 32a having such a structure are prepared, 2 stators 32a are disposed so as to be separated in the Z direction with the coils 61 facing each other, and the mover 31a is disposed between the 2 stators 32 a.
Fig. 5 is a diagram showing the structure of the electromagnetic actuators 41a, 41 b. The electromagnetic actuator 41a includes an E core 82a functioning as an electromagnet and an I core 81a as a magnetic material. In the example of fig. 5, the E core 82a is attached to the side wall of the upper convex portion of the coarse movement stage 11, and the I core 81a is attached to the side wall of the lower convex portion of the fine movement stage 21, so that the E core 82a and the I core 81a face each other in the Y direction.
The positional relationship between the E-core 82a and the I-core 81a may be reversed, and the E-core 82a may be attached to the fine movement stage 21 and the I-core 81a may be attached to the coarse movement stage 11. In this way, the electromagnetic actuator 41a includes an E-core 82a as an electromagnet disposed on one of the coarse movement stage 11 and the fine movement stage 21, and an I-core 81a as a magnetic body disposed on the other of the coarse movement stage 11 and the fine movement stage 21.
A coil 83a is wound around the E-core 82a, and a magnetic flux is generated by a current flowing through the coil 83a, thereby generating magnetic poles in the E-core 82a and the I-core 81 a. An attractive force due to a magnetic force generated between the E-core 82a and the I-core 81a becomes a thrust force of the electromagnetic actuator 41 a.
A magnetic flux detection coil 84a is also wound around the E core 82 a. In the magnetic flux detection coil 84a, the time variation of the magnetic flux is generated as an induced voltage, and the magnetic flux generated in the electromagnetic actuator 41a can be detected by integrating the induced voltage. The thrust of the electromagnetic actuator 41a can be calculated by using the thrust of the electromagnetic actuator 41a in proportion to the square of the magnetic flux.
The electromagnetic actuator 41b is also similar in structure to the electromagnetic actuator 41 a. That is, the electromagnetic actuator 41b includes an E core 82b functioning as an electromagnet and an I core 81b as a magnetic material. The E-core 82b is attached to the side wall of the upper convex portion of the coarse movement stage 11, and the I-core 81b is attached to the side wall of the lower convex portion of the fine movement stage 21, so that the E-core 82b and the I-core 81b face each other in the Y direction.
The positional relationship between the E-core 82b and the I-core 81b may be reversed, that is, the E-core 82b may be attached to the fine movement stage 21, and the I-core 81b may be attached to the coarse movement stage 11. In this way, the electromagnetic actuator 41b includes an E-core 82b as an electromagnet disposed on one of the coarse movement stage 11 and the fine movement stage 21, and an I-core 81b as a magnetic body disposed on the other of the coarse movement stage 11 and the fine movement stage 21.
A coil 83b is wound around the E core 82b, and a magnetic flux is generated by a current flowing through the coil 83b, thereby generating magnetic poles in the E core 82b and the I core 81 b. An attractive force due to a magnetic force generated between the E-core 82b and the I-core 81b becomes a thrust force of the electromagnetic actuator 41 b.
A magnetic flux detection coil 84b is also wound around the E core 82 b. In the magnetic flux detection coil 84b, the time variation of the magnetic flux is generated as an induced voltage, and the magnetic flux generated in the electromagnetic actuator 41b can be detected by integrating the induced voltage. The thrust of the electromagnetic actuator 41b can be calculated by using the thrust of the electromagnetic actuator 41b in proportion to the square of the magnetic flux.
Fig. 6 (a) is a control block diagram of the fine movement stage 21 in one example.
The position of the fine movement stage 21 is detected by a position detector (not shown) such as a laser interferometer or an encoder, and the input position command value of the fine movement stage 21 and the deviation E of the detected position are input to the controller 201. For example, the controller 201 based on the PID control system generates a command value for providing thrust to the inching linear motors 51, 52, 53 from the input deviation E, and outputs the command value to the current driver 202. The current driver 202 supplies a current corresponding to the input command value to the inching linear motors 51, 52, 53. The fine linear motors 51, 52, and 53 generate driving force by supplied current to drive the fine stage 21. Thus, the position of the fine movement stage 21 is feedback-controlled.
At this time, the thrust force F of the electromagnetic actuator 41 output from the electromagnetic actuator control unit 301 is supplied to the fine movement stage 21 during acceleration and deceleration of the fine movement stage 21. The magnetic flux calculator 302 calculates a magnetic flux command value M using the thrust force F of the electromagnetic actuator 41 in proportion to the square of the magnetic flux, and inputs the magnetic flux command value M to the electromagnetic actuator control unit 301. When the micro movement stage 21 is driven in the Y direction in a state where the thrust force F of the electromagnetic actuator 41 has changed (in a state where an error is present), the micro movement Y linear motors 52a and 52b compensate for the amount of change in the thrust force of the electromagnetic actuator 41. The fine movement stage 21 controls the fine position of the nm level in the direction X, Y, Z by fine movement of the linear motors 51, 52, 53, and the electromagnetic actuator 41 is used to apply a thrust force necessary for acceleration and deceleration. This makes it possible to follow the fine movement stage 21 to the coarse movement stage 11 at a high acceleration and perform highly accurate positioning in the nm range during exposure.
Fig. 6 (b) is a control block diagram of the electromagnetic actuator control unit 301. In fig. 6 (b), the electromagnetic actuator control unit 301 includes a feedback control system that feeds back the induced voltage of the electromagnetic actuator 41 to drive the electromagnetic actuator 41.
The induced voltage generated from the electromagnetic actuator 41 is detected by a magnetic flux detection coil 84(84a or 84b), and the value thereof is input to the integrator 401, whereby the detection result of the magnetic flux is obtained. In adder 402, a magnetic flux error that is a difference between magnetic flux command value M and the detected magnetic flux is calculated. This magnetic flux error becomes a command value of the voltage driver 404 that applies a drive voltage to the electromagnetic actuator 41. Here, the controller 403 sends a value obtained by multiplying the magnetic flux error, which is the command value, by the gain G to the voltage driver 404. The voltage driver 404 applies a voltage corresponding to the input value to the coil 83(83a or 83b) of the electromagnetic actuator 41. As a result, a current flows through the coil 83, thereby generating a thrust force F. The thrust force F of the electromagnetic actuator 41 is equivalently controlled by controlling the magnetic flux in proportion to the square of the magnetic flux.
The gain G is a gain for a magnetic flux error that is a command value of the voltage driver 404. More specifically, the gain G is a coefficient (control parameter) used to reduce an increase in the deviation E of the fine movement stage 21 due to assembly errors of the electromagnetic actuator 41, fluctuations of parts, and the like. Therefore, the gain G needs to be determined in advance before the stage apparatus is actually used.
Fig. 7 shows a flowchart of the adjustment process of the gain G.
In S11, a normal initialization operation is performed. The initialization of the position measuring device and the setting of the origin of the coarse movement stage 11 and the fine movement stage 21 are completed by the initialization operation. Thereby, the position servo system functions to drive the coarse movement stage 11 to an arbitrary position while causing the fine movement stage 21 to follow.
In S12, a drive start position P (sweep start position) and a drive stroke length S of the coarse movement stage 11 are determined. These parameters may be determined according to the conditions under which the mounting table apparatus is used. The set of the drive start position P and the drive stroke length S is 1 set. The drive start position may be, for example, an initial position of the scanning drive corresponding to the angle of view.
In S13, the gain G of the electromagnetic actuator 41 is determined. The thrust force F of the electromagnetic actuator 41 that the fine movement stage 21 can follow without interfering with the coarse movement stage 11 when the coarse movement stage 11 is driven is determined, and the initial value of the gain G is set to a value at which the controller 403 can output the determined thrust force F. After the 2 nd and subsequent times, the value of gain G is adjusted within a predetermined range based on the initial value, and the optimal value is determined. Furthermore, the adjustment amplitude is arbitrary.
In S14, the coarse movement stage 11 is driven by the driving stroke length S from the driving start position P determined in S12. The driving may also be performed a plurality of times.
In S15, an evaluation value is calculated. The driving speed of the coarse movement stage 11 can be divided into an acceleration section, a constant speed section, and a deceleration section. For example, when it is desired to reduce the deviation E during the period in which the coarse movement stage 11 is in the constant velocity section, the evaluation value is determined using the deviation in the constant velocity section. In this case, a statistical value such as an average value, an integral value, or a maximum value of the deviation of the constant velocity section may be an evaluation value. In S14, when the coarse movement stage 11 is driven continuously a plurality of times, a statistical value such as an average value, an integral value, or a maximum value of all the deviations obtained at this time may be used as the evaluation value.
In S16, a gain G at which the evaluation value becomes minimum is used. By repeating steps S14 to S15 while changing the gain G, the gain G at which the obtained evaluation value becomes the minimum is fit into the control frame of the fine movement stage shown in fig. 6.
However, when the stage apparatus is driven with the gain G adjusted according to the procedure of fig. 7, the deviation E of the fine movement stage 21 in the constant velocity section tends to become large depending on the driving start position of the coarse movement stage 11. This is because the deviation E is affected by the fluctuation of the thrust constant of the coarse linear motor 13. The thrust constant is a thrust generated when a unit current (for example, 1[ a ]) is applied to the coarse linear motor 13, and is a value indicating the efficiency of the thrust. Therefore, when the thrust constant of the coarse linear motor 13 is K [ N/A ], the thrust LF [ N ] of the coarse linear motor 13 when the I [ A ] current flows becomes K [ N/A ]
LF＝K×I…(1)。
The thrust constant is ideally constant regardless of the relative position of the stator and mover. However, in an actual linear motor, the thrust constant K fluctuates depending on the position of the mover with respect to the stator due to positional displacement of the magnets and coils, and therefore, the thrust generated when a constant current is applied to the linear motor varies depending on the position of the mover. Such variation (fluctuation) of the thrust constant is referred to as "thrust pulsation (ripple)".
This tendency of the thrust constant can be obtained by the following measurement. When the mover 31 of the coarse linear motor 13 is operated at a speed V m/s, an induced voltage Ve V is generated by the interaction between the magnet and the coil. The thrust constant K can be obtained from the velocity v and the induced voltage Ve by the following equation.
K＝Ve/v…(2)
In the coarse linear motor 13 for the coarse stage 11, a current is applied to only one of the 2 movers 31a and 31b to drive the mover. At this time, an induced voltage generated by the interaction between the other mover (magnet) and the stator (coil) is measured. This makes it possible to obtain a pure thrust constant K that does not include any disturbance force applied to the rough movement stage 11.
In the coarse linear motor 13, the mover 31 is driven throughout the entire movable section (the section indicated by the arrow in fig. 8 (a)) in order to measure the thrust constant K of the movable section of the mover 31. However, as shown in fig. 8 (b), the mover 31 must stop at both ends of the movable section, so the movable section is composed of acceleration/deceleration sections 92 at both end portions and constant velocity sections 91 at an intermediate portion. Thereby, the velocity profile of the mover 31 in the movable section becomes a profile as shown by the broken line graph in fig. 8 (b). As a result of driving the mover 31 throughout the entire movable section, a thrust constant 71 corresponding to the driving position as shown in (c) of fig. 8 is obtained. In the constant velocity section 91, since the driving speed at which the SN ratio of the induced voltage becomes large can be maintained, the thrust constant 71 can be accurately obtained, and it is understood that the thrust constant 71 has a periodicity corresponding to the arrangement pitch (pitch) of the plurality of coils.
When the coarse movement stage 11 is driven, the positional deviation of the coarse movement stage 11 fluctuates due to the influence of the fluctuation of the thrust constant 71. Therefore, since the gain G of the electromagnetic actuator 41 is constant, the fine movement stage 21 following the coarse movement stage 11 is affected by the fluctuation of the positional deviation of the coarse movement stage 11.
Fig. 9 is a graph showing an average value of the deviation in the constant velocity section of the fine movement stage 21 with respect to the driving start position P of the coarse movement stage 11. Further, the drive stroke length is set constant. In example 1 of fig. 9, the gain G is adjusted with the drive start position P set to 13 mm. In this case, the average value of the deviation generated when the coarse movement stage is driven by changing the drive start position P to 9 to 17mm tends to increase with distance from the drive start position (13mm) at which the gain G is adjusted. The 2 nd example of fig. 9 is a case where the gain G is adjusted for each driving start position and driving is performed at a driving start position corresponding to the gain G. In this case, the average value of the deviations represents a substantially constant value of about 3 to 4 nm. That is, it is found that the gain G depends on the driving start position at the time of adjustment. Therefore, adjusting the gain G for each assumed drive start position can be said to contribute to improvement in positioning accuracy. However, it takes much time to adjust the gain G at all the assumed driving start positions, and it is not practical.
Therefore, in the present embodiment, a limited number of drive start positions for adjusting the gain G are determined from the fluctuation of the thrust constant 71, and the gain G is obtained for each determined position to create a gain table. Fig. 10 shows a flowchart of a procedure of making the gain table.
In S21, a normal initialization operation is performed. The contents thereof are the same as S11. In S22, the drive start position group of the coarse movement stage 11 is calculated. As shown in fig. 11, the fluctuation of the thrust constant 71 of the coarse linear motor 13 has a periodicity corresponding to the arrangement period of the plurality of coils 61. Is defined as a period S in which the thrust constant 71 is divided by the division number NRAnd the obtained constant C ═ SRPosition groups of multiples of/N. Here, when m is a cycle number of each cycle of the thrust constant 71, N is a division position of each cycle (N is 1 to N), and the driving start position group is P (m, N), the driving start position group P (m, N) is expressed by the following equation.
P(m，n)＝(m×N+n)×C
And M is equal to MSPosition group of time:
P1＝(MS×N+1)×C，
P2＝(MS×N+2)×C，
…，
PN＝(MS+1)×N×C、
(wherein P (M) is designated for conveniences，n)＝Pn)
The drive start positions of the coarse movement stage 11 are set. In accordance with the later procedure, the gain G is adjusted for each of these drive start positions.
In S23, the drive start position P of the coarse movement stage 11 is determinednAnd a drive stroke length S. 1 position is sequentially selected from the N drive start positions obtained in S22. The drive stroke length S is determined according to the conditions under which the mounting table apparatus is used. The drive stroke length S may not be based on the drive start position PnBut rather a constant value.
In S24, the gain G of the electromagnetic actuator 41 is determined. The method for determining the gain G may be the same as S13.
In S25, the drive start position P determined in S23 is usednThe coarse movement stage 11 starts to be driven for the drive stroke length S. The driving may also be performed a plurality of times.
In S26, an evaluation value is calculated. The evaluation value may be calculated in the same manner as S15.
In S27, the gain G at which the evaluation value becomes the minimum is registered in the gain table. Repeating steps S25 to S26 by changing the gain G, and registering the gain G when the obtained evaluation value is the minimum in the gain table Gn. At the time of registration, the drive start position P is setnIs associated with the gain G. As described above, the gain table G describes a correspondence relationship obtained in advance between the drive start position in the period of the fluctuation of the thrust constant and the gain as the control parameter.
For all the drive start positions P decided in S22n(N is 1 to N), S24 to S27 are repeated to create a gain table G n501, and is fitted into a control block of the fine movement stage 21 shown in fig. 12.
Fig. 12 is a control block diagram of the fine movement stage 21 according to the embodiment. According to this control block diagram, the gain G, which is a control parameter of the electromagnetic actuator, is determined based on the drive start position of the coarse movement stage. In fig. 12, a gain table G is configured instead of the gain G of fig. 6n501 and a gain decider 502. The function of the gain determiner 502 may be included in the electromagnetic actuator control unit 301 (control unit).
In actual use, the drive start position P' of the coarse movement stage 11 is input to the gain determiner 502. The gain determiner 502 determines that the condition m × n × C is satisfied<P' ≦ m × (n +1) × C (m is an integer, C is a constant calculated in S22). Then, the gain determiner 502 refers to the gain table G n501, a gain G corresponding to the coefficient n is obtained and input to the controller 403 of the electromagnetic actuator 41. The timing of switching the gain G is, for example, when the electromagnetic actuator 41 does not output thrust.
In accordance with the procedure shown in fig. 10, the gain table G adjusted so that the average value of the variation of the fine movement stage 21 in the constant velocity section is reduced is usedn501, the gain G of the electromagnetic actuator 41 is switched according to the driving start position P' of the coarse movement stage 11. Thus, the gain determiner 502 (control unit) can determine the thrust force for the position of the mover relative to the statorThe fluctuation of the constant determines a gain G as a control parameter corresponding to the drive start position. Therefore, the average value of the variations of the fine movement stage 21 in the constant velocity section can be improved without depending on the driving start position P' of the coarse movement stage 11. In fact, the same result as that obtained when the adjustment is performed for each driving start position as shown in fig. 9 can be obtained. Further, by obtaining the adjustment position of the gain G from the period of the thrust constant, the time for adjusting the gain G can be shortened.
In S22, the driving start position group of the coarse movement stage 11 is calculated from the period of the thrust constant 71 as shown in fig. 11, but a position where the differential value becomes zero during 1 period of the thrust constant 71 may be set as the driving start position group as shown in fig. 13. Since the position where the differential value of the thrust constant is zero is a position where the thrust constant may be extremely large or small, and the positional deviation of the coarse movement stage 11 is likely to change greatly, the deviation of the fine movement stage 21 may be improved as compared with the case where the division is performed at equal intervals as described above.
In the above embodiment, the gain G is obtained for a discrete group of drive start positions, but if there is a time margin, the gain G may be adjusted for each drive start position. If it is desired to reduce the deviation after driving (after stopping), the gain G may be adjusted for each driving end position.
In the above, for the sake of simplifying the description, a mounting table apparatus having the coarse movement mounting table 11 driven in the Y direction as shown in fig. 2 is described. However, the present invention can also be applied to a stage apparatus having a coarse movement stage driven only in the X direction or a coarse movement stage driven in the X direction and the Y direction. In this case, it is necessary to provide the electromagnetic actuator shown in fig. 5 in the X direction so that the fine movement stage follows when the coarse movement stage is driven in the X direction.
< embodiment of method for producing article >
The article manufacturing method according to the embodiment of the present invention is suitable for manufacturing articles such as micro devices such as semiconductor devices and devices having a microstructure, for example. The method for manufacturing an article according to the present embodiment includes a step of forming a pattern of an original plate on a substrate using the above-described lithography apparatus (exposure apparatus, imprint apparatus, drawing apparatus, and the like), and a step of processing the substrate on which the pattern has been formed in the above-described step. The above-described manufacturing method includes other known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like). The method for manufacturing an article according to the present embodiment is more advantageous than conventional methods in at least 1 of the performance, quality, productivity, and production cost of the article.
(other embodiments)
The present invention can also be realized by the following processing: a program that realizes 1 or more functions of the above-described embodiments is supplied to a system or an apparatus via a network or a storage medium, and 1 or more processors in a computer of the system or the apparatus read out and execute the program. Alternatively, the function can be realized by a circuit (for example, ASIC) that realizes 1 or more functions.
OTHER EMBODIMENTS
The embodiments of the present invention can also be realized by a method in which software (programs) that perform the functions of the above-described embodiments are supplied to a system or an apparatus through a network or various storage media, and a computer or a Central Processing Unit (CPU), a Micro Processing Unit (MPU) of the system or the apparatus reads out and executes the methods of the programs.
The present invention is not limited to the above embodiments, and various changes and modifications can be made without departing from the spirit and scope of the invention. Accordingly, the claims are appended for purposes of disclosing the invention.
Claims (11)
1. A mounting table device is characterized by comprising:
a coarse movement stage;
a fine movement stage;
an electromagnetic actuator disposed between the coarse movement stage and the fine movement stage, the electromagnetic actuator providing a thrust force to the fine movement stage in a direction along a surface of the coarse movement stage; and
a control section that controls the electromagnetic actuator,
the control unit determines a control parameter of the electromagnetic actuator based on a drive start position of the coarse movement stage.
2. The table apparatus of claim 1,
a coarse linear motor for driving the coarse mounting table,
the coarse linear motor includes a stator and a mover,
the control unit determines the control parameter corresponding to the drive start position based on fluctuations in a position of the mover relative to the stator, the fluctuations being indicative of a thrust constant of a thrust generated when a unit current is supplied to the coarse linear motor.
3. The table apparatus of claim 2,
the control unit determines the control parameter based on a correspondence relationship between the drive start position and the control parameter obtained in advance.
4. The table apparatus of claim 3,
the stator includes a plurality of coils arranged in the direction,
the fluctuation of the thrust constant has a period corresponding to an arrangement period of the plurality of coils,
the correspondence is a previously obtained correspondence between the drive start position in the cycle and the control parameter.
5. The table apparatus of claim 1,
the placing table device has a micro linear motor for driving the micro placing table,
the control unit is configured to include a feedback control system for feeding back an induced voltage of the electromagnetic actuator to drive the electromagnetic actuator, and to apply a thrust force of the electromagnetic actuator to the fine movement stage in addition to a driving force of the fine movement linear motor,
the control section includes a voltage driver that applies a drive voltage to the electromagnetic actuator,
the control parameter is a gain for a command value of the voltage driver.
6. The table apparatus of claim 1,
the electromagnetic actuator includes:
an E-core as an electromagnet disposed on one of the coarse movement stage and the fine movement stage; and
an I-core as a magnetic material is disposed on the other of the coarse movement stage and the fine movement stage so as to face the E-core in the above-described direction.
7. A lithographic apparatus, comprising:
the table apparatus of claim 1; and
a master plate holding unit mounted on the mounting table device,
and transferring the pattern of the original plate held by the original plate holding section to a substrate.
8. A lithographic apparatus, comprising:
the table apparatus of claim 1; and
a substrate holding section mounted on the mounting table device,
and transferring the pattern of the original plate to the substrate held by the substrate holding section.
9. The lithographic apparatus of claim 7,
the lithography apparatus is an exposure apparatus that exposes the substrate while scanning the original plate and the substrate.
10. The lithographic apparatus of claim 8,
the lithography apparatus is an exposure apparatus that exposes the substrate while scanning the original plate and the substrate.
11. A method for manufacturing an article, comprising:
a process of forming a pattern on a substrate using the lithographic apparatus of any of claims 7 to 10; and
a step of processing the substrate on which the pattern is formed,
and manufacturing an article according to the processed substrate.
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| JP2006211873A (en) | 2005-01-31 | 2006-08-10 | Canon Inc | Moving body control device and moving body controlling method |
| JP6576111B2 (en) | 2015-06-12 | 2019-09-18 | キヤノン株式会社 | Drive system, motor control method, lithographic apparatus, and article manufacturing method |
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| JP2001175332A (en) * | 1999-12-22 | 2001-06-29 | Nikon Corp | Method for driving stage, stage device and exposure device |
| JP2006173500A (en) * | 2004-12-17 | 2006-06-29 | Nikon Corp | Actuator, stage device, exposure system and device manufacturing method |
| WO2010131485A1 (en) * | 2009-05-15 | 2010-11-18 | 株式会社ニコン | Mobile apparatus, power transmission apparatus, exposure apparatus, and device manufacturing method |
| CN102645850A (en) * | 2011-02-22 | 2012-08-22 | Asml荷兰有限公司 | Electromagnetic actuator, stage apparatus and lithographic apparatus |
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| JP2019121656A (en) * | 2017-12-28 | 2019-07-22 | キヤノン株式会社 | Control method, control device, lithography device, and manufacturing method of article |
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| JP2021048379A (en) | 2021-03-25 |
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