CN112486093A - Method, apparatus, device and medium for compensating for platform accuracy - Google Patents
Method, apparatus, device and medium for compensating for platform accuracy Download PDFInfo
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- CN112486093A CN112486093A CN202011179963.4A CN202011179963A CN112486093A CN 112486093 A CN112486093 A CN 112486093A CN 202011179963 A CN202011179963 A CN 202011179963A CN 112486093 A CN112486093 A CN 112486093A
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/18—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form
- G05B19/404—Numerical control [NC], i.e. automatically operating machines, in particular machine tools, e.g. in a manufacturing environment, so as to execute positioning, movement or co-ordinated operations by means of programme data in numerical form characterised by control arrangements for compensation, e.g. for backlash, overshoot, tool offset, tool wear, temperature, machine construction errors, load, inertia
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/002—Measuring arrangements characterised by the use of optical techniques for measuring two or more coordinates
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B2219/00—Program-control systems
- G05B2219/30—Nc systems
- G05B2219/35—Nc in input of data, input till input file format
- G05B2219/35408—Calculate new position data from actual data to compensate for contour error
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Abstract
The embodiment of the invention discloses a method, a device, equipment and a medium for compensating platform precision. Wherein, the method comprises the following steps: determining array point measurement data on a target calibration plate; calculating an orthogonality included angle of the platform to be compensated according to the array point measurement data; converting array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated; determining two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data; and compensating the platform to be compensated according to the two-dimensional linearity error compensation. The embodiment of the invention adopts a precision compensation mode in the two-dimensional direction, and realizes the precision compensation of the platform to be compensated according to the two-dimensional linearity error compensation.
Description
Technical Field
The embodiment of the invention relates to the technical field of precision measurement, in particular to a method, a device, equipment and a medium for compensating platform precision.
Background
In the manufacturing of hardware production design, an accurate and efficient process is usually realized on the basis of an accuracy platform; but the stability of the precision platform can also bring influence to the process manufacturing; if the precision of the base platform manufactured by the process is low, the manufactured process can not meet the design requirement; therefore, it is also important for the adjustment of the stage accuracy. In the prior art, the platform precision is mainly debugged through a grating ruler; namely, a grating ruler is installed, and the compensation precision is determined by the direction of the grating ruler and the direction of the motion axis of the platform, so that the compensation is realized.
The defects of the scheme are as follows: the grating ruler is installed manually, and errors exist in parallelism and straightness between the grating ruler and a platform guide rail in the actual installation process, so that the platform compensation precision is insufficient.
Disclosure of Invention
The embodiment of the application provides a platform precision compensation method, a platform precision compensation device and a platform precision compensation medium, and accurate compensation of the platform precision to be compensated can be achieved according to the determined linearity error compensation.
In a first aspect, an embodiment of the present invention provides a method for compensating for platform accuracy, including:
determining array point measurement data on a target calibration plate;
calculating an orthogonality included angle of the platform to be compensated according to the array point measurement data;
converting the array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated;
determining two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data;
and compensating the platform to be compensated according to the two-dimensional linearity error compensation.
Optionally, before determining the array point measurement data on the target calibration plate, the method further includes:
and selecting a calibration plate containing circular array point measurement data from the candidate calibration plate set as a target calibration plate.
Optionally, calculating an orthogonality included angle of the platform to be compensated according to the array point measurement data includes:
acquiring array point theoretical data of the target calibration plate;
determining an affine transformation matrix from the array point measurement data to the array point theoretical data according to the array point theoretical data and the array point measurement data;
and calculating an affine vector included angle of a preset coordinate point according to the affine transformation matrix to obtain an orthogonality included angle of the platform to be compensated.
Optionally, determining two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data includes:
determining a horizontal linearity error compensation value of the middle array point measurement data;
a vertical linearity error compensation value for the intermediate array point measurement data is determined.
Optionally, determining a horizontal linearity error compensation value of the intermediate array point measurement data includes:
determining the linearity error of an orthogonal included angle of a platform to be compensated; and determining horizontal measurement errors of the measurement data of each intermediate array point; wherein the horizontal measurement error is a difference between a horizontal measurement length from the middle array point measurement data to the initial array point measurement data and a horizontal theoretical length from the middle array point measurement data to the initial array point measurement data;
taking the difference between the linearity error of the orthogonal included angle and the horizontal measurement error of the middle array point measurement data as a horizontal linearity error compensation value of the middle array point measurement data;
accordingly, determining a vertical linearity error compensation value for the intermediate array point measurement data comprises:
determining the vertical measurement error of the measurement data of each middle array point; wherein the vertical measurement error is a difference between a vertical measurement length from the middle array point measurement data to the initial array point measurement data and a vertical theoretical length from the middle array point measurement data to the initial array point measurement data;
and taking the difference value between the linearity error of the orthogonal included angle and the vertical measurement error of the middle array point measurement data as a vertical linearity error compensation value of the middle array point measurement data.
Optionally, compensating the platform to be compensated according to the two-dimensional linearity error compensation, including:
converting the horizontal linearity error compensation value and the vertical linearity error compensation value into a compensation coordinate of the platform to be compensated;
and performing platform precision compensation on the platform to be compensated according to the compensation coordinate of the platform to be compensated.
In a second aspect, an embodiment of the present invention provides an apparatus for compensating for platform accuracy, including:
the data determination module is used for determining array point measurement data on the target calibration plate;
the orthogonality included angle calculation module is used for calculating an orthogonality included angle of the platform to be compensated according to the array point measurement data;
the data conversion module is used for converting the array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated;
the error compensation determining module is used for determining two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data;
and the platform compensation module is used for compensating the platform to be compensated according to the two-dimensional linearity error compensation.
Optionally, the method further includes:
and the target calibration plate selection module is used for selecting a calibration plate containing circular array point measurement data from the candidate calibration plate set as a target calibration plate.
Optionally, the orthogonality included angle calculating module is specifically configured to:
acquiring array point theoretical data of the target calibration plate;
determining an affine transformation matrix from the array point measurement data to the array point theoretical data according to the array point theoretical data and the array point measurement data;
and calculating an affine vector included angle of a preset coordinate point according to the affine transformation matrix to obtain an orthogonality included angle of the platform to be compensated.
Optionally, the error compensation determining module is specifically configured to:
determining a horizontal linearity error compensation value of the middle array point measurement data;
a vertical linearity error compensation value for the intermediate array point measurement data is determined.
Optionally, the error compensation determining module is further specifically configured to:
determining the linearity error of an orthogonal included angle of a platform to be compensated; and determining horizontal measurement errors of the measurement data of each intermediate array point; wherein the horizontal measurement error is a difference between a horizontal measurement length from the middle array point measurement data to the initial array point measurement data and a horizontal theoretical length from the middle array point measurement data to the initial array point measurement data;
taking the difference between the linearity error of the orthogonal included angle and the horizontal measurement error of the middle array point measurement data as a horizontal linearity error compensation value of the middle array point measurement data;
correspondingly, the error compensation determining module is further specifically configured to:
determining the vertical measurement error of the measurement data of each middle array point; wherein the vertical measurement error is a difference between a vertical measurement length from the middle array point measurement data to the initial array point measurement data and a vertical theoretical length from the middle array point measurement data to the initial array point measurement data;
and taking the difference value between the linearity error of the orthogonal included angle and the vertical measurement error of the middle array point measurement data as a vertical linearity error compensation value of the middle array point measurement data.
Optionally, the platform compensation module is specifically configured to:
converting the horizontal linearity error compensation value and the vertical linearity error compensation value into a compensation coordinate of the platform to be compensated;
and performing platform precision compensation on the platform to be compensated according to the compensation coordinate of the platform to be compensated.
In a third aspect, an embodiment of the present invention further provides an electronic device, where the electronic device includes:
one or more processors;
a storage device for storing one or more programs,
when the one or more programs are executed by the one or more processors, the one or more processors implement the method for compensating for platform accuracy according to any one of the embodiments of the present invention.
In a fourth aspect, the embodiments of the present invention further provide a computer-readable storage medium, on which a computer program is stored, where the computer program, when executed by a processor, implements the platform precision compensation method according to any one of the embodiments of the present invention.
The embodiment of the invention determines the array point measurement data on the target calibration plate; calculating an orthogonality included angle of the platform to be compensated according to the array point measurement data; converting array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated; determining two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data; and compensating the platform to be compensated according to the two-dimensional linearity error compensation. The embodiment of the invention adopts a precision compensation mode in the two-dimensional direction, and realizes the precision compensation of the platform to be compensated according to the two-dimensional linearity error compensation.
Drawings
FIG. 1 is a flowchart illustrating a method for compensating for platform accuracy according to a first embodiment of the present invention;
FIG. 2 is a flowchart illustrating a method for compensating for platform accuracy according to a second embodiment of the present invention;
FIG. 3 is a schematic structural diagram of a compensation apparatus for stage accuracy according to a third embodiment of the present invention;
fig. 4 is a schematic structural diagram of an electronic device in the fourth embodiment.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings and examples. It is to be understood that the specific embodiments described herein are merely illustrative of the invention and are not limiting of the invention. It should be further noted that, for the convenience of description, only some of the structures related to the present invention are shown in the drawings, not all of the structures.
Example one
Fig. 1 is a flowchart illustrating a method for compensating for platform accuracy according to a first embodiment of the present invention. The present embodiment is applicable to the case of effectively compensating for the platform accuracy. The method of the embodiment can be executed by a platform-precision compensation device, which can be implemented in a hardware/software manner and can be configured in an electronic device. The compensation method for the platform precision can be realized according to any embodiment of the application. As shown in fig. 1, the method specifically includes the following steps:
and S110, determining array point measurement data on the target calibration plate.
In the traditional mode, the compensation of the platform precision is mainly realized by selecting a grating ruler so as to debug the platform precision by using a moving direction of the grating ruler relative to the platform; however, the selected grating ruler must be installed on a platform manually, and errors exist in the parallelism and straightness between the grating ruler and the platform guide rail in the actual installation process, so that the precision of the platform after debugging can not meet the process manufacturing requirements.
Therefore, a calibration plate is introduced in the embodiment to assist in achieving effective compensation of the platform precision, so as to achieve effective compensation of the platform precision; the array point measurement data is a measurement result of array point data on the target calibration plate; for example, but not limited to, array point data on the target calibration plate may be measured by a CCD (Charge Coupled Device) camera to obtain array point measurement data.
In this embodiment, optionally, before determining the array point measurement data on the target calibration board, the method of this embodiment further includes: and selecting a calibration plate containing circular array point measurement data from the candidate calibration plate set as a target calibration plate. Due to the more usage of calibration plates, the shapes of the array points on the surface of the calibration plates may be different; this embodiment is circular as the target calibration board through selecting the array point on the calibration board, can make the later stage can be clear accurate every data of measuring on the array board when measuring this calibration board.
And S120, calculating the orthogonality included angle of the platform to be compensated according to the array point measurement data.
In this embodiment, the platform to be compensated is a working platform whose tested precision does not meet the process measurement requirement; when the precision of a working platform has a large error, a product manufactured by using the working platform has a large deviation from a design requirement, so that when the precision of a tested working platform is weak, precision compensation is necessary.
The orthogonality included angle is an included angle between the side edge of the platform to be compensated and a self-defined horizontal direction line; at the moment, the platform to be compensated can be regarded as a plane, and an included angle is formed between the direction line of the water taking plane and the side of the platform to be compensated.
And S130, converting the array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated.
In this embodiment, the orthogonal coordinate system data is a representation of the array point measurement data in the orthogonal coordinate system, and is mainly used to enable the array point measurement data and the platform to be compensated to perform compensation operation in one coordinate system.
And S140, determining two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data.
In the prior art, a calibration scale is used, the actual advancing distance is calculated according to the change of a scale mark of the measurement calibration scale in a preset layout period, and then the deviation value between the actual advancing distance and the preset step pitch is adjusted by the preset step pitch, so that the compensation of the platform precision is realized; but the method is only precision control in one-dimensional direction, so that the compensated platform precision is still low.
Therefore, the precision compensation is performed in the two-dimensional direction, and the problem that the platform compensation precision is low due to the one-dimensional precision compensation can be effectively solved.
And S150, compensating the platform to be compensated according to the two-dimensional linearity error compensation.
In this embodiment, according to the two-dimensional linearity error compensation, the compensation information of each compensation point on the platform to be compensated can be effectively calculated, so that the accurate compensation of the platform to be compensated is effectively realized. The embodiment of the invention adopts a precision compensation mode in the two-dimensional direction, and realizes the precision compensation of the platform to be compensated according to the two-dimensional linearity error compensation.
The embodiment of the invention determines the array point measurement data on the target calibration plate; calculating an orthogonality included angle of the platform to be compensated according to the array point measurement data; converting array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated; determining two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data; and compensating the platform to be compensated according to the two-dimensional linearity error compensation. The embodiment of the invention adopts a precision compensation mode in the two-dimensional direction, and realizes the precision compensation of the platform to be compensated according to the two-dimensional linearity error compensation.
Example two
Fig. 2 is a flowchart illustrating a method for compensating for platform accuracy according to a second embodiment of the present invention. The embodiment is further expanded and optimized on the basis of the embodiment, and can be combined with any optional alternative in the technical scheme. As shown in fig. 2, the method includes:
s210, determining array point measurement data on the target calibration plate.
And S220, calculating the orthogonality included angle of the platform to be compensated according to the array point measurement data.
In this embodiment, optionally, calculating the orthogonality angle of the platform to be compensated according to the array point measurement data includes:
acquiring array point theoretical data of a target calibration plate;
determining an affine transformation matrix from the array point measurement data to the array point theoretical data according to the array point theoretical data and the array point measurement data;
and calculating an affine vector included angle of the preset coordinate point according to the affine transformation matrix to obtain an orthogonality included angle of the platform to be compensated.
In this embodiment, the theoretical data of the array points of the target calibration plate is theoretical coordinate data of each array point obtained by using the target calibration plate as a coordinate system; the expression of the affine transformation matrix may be as shown in the following formula (1).
R*A＝Y (1)
Wherein R is an affine transformation parameter; a is a characteristic matrix of array point measurement data; and Y is a feature matrix of array point theoretical data.
The least squares solution of the above equation (1) can be derived as shown in equation (2).
A＝(RT·R)-1·RT·Y (2)
Specifically, in the present embodiment, the preset coordinate point is used to calculate the affine vector angle, and may be set to, for example, point (0,1) and point (1, 0); and then the orthogonality included angle theta of the platform to be compensated can be obtained.
And S230, converting the array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated.
In the present embodiment, the array point measurement data may be converted into orthogonal coordinate system data by the following formula (3) to achieve effective unification of the array point measurement data.
Wherein x' is the abscissa of the array point measurement data; y' is the ordinate of the array point measurement data; theta is an orthogonality included angle of the platform to be compensated; x is the abscissa of the orthogonal coordinate system data; y is the ordinate of the orthogonal coordinate system data.
S240, determining a horizontal linearity error compensation value of the middle array point measurement data; a vertical linearity error compensation value for the intermediate array point measurement data is determined.
In this embodiment, precision compensation is performed on the platform to be compensated in the two-dimensional direction, and therefore error compensation values in the horizontal and vertical directions need to be calculated, so as to perform two-dimensional precision control on each node in the platform to be compensated.
And S250, compensating the platform to be compensated according to the two-dimensional linearity error compensation.
On the basis of the above embodiment, optionally, determining the horizontal linearity error compensation value of the middle array point measurement data includes:
determining the linearity error of an orthogonal included angle of a platform to be compensated; and determining horizontal measurement errors of the measurement data of each intermediate array point; the horizontal measurement error is the difference between the horizontal measurement length from the middle array point measurement data to the initial array point measurement data and the horizontal theoretical length from the middle array point measurement data to the initial array point measurement data;
taking the difference between the linearity error of the orthogonal included angle and the horizontal measurement error of the middle array point measurement data as the horizontal linearity error compensation value of the middle array point measurement data;
accordingly, determining a vertical linearity error compensation value for the intermediate array point measurement data comprises:
determining the vertical measurement error of the measurement data of each middle array point; the vertical measurement error is the difference between the vertical measurement length from the middle array point measurement data to the initial array point measurement data and the vertical theoretical length from the middle array point measurement data to the initial array point measurement data;
and taking the difference between the linearity error of the orthogonal included angle and the vertical measurement error of the middle array point measurement data as a vertical linearity error compensation value of the middle array point measurement data.
In this embodiment, the orthogonality included angle linearity error of the platform to be compensated can be calculated according to array point measurement data and array point theoretical data on the target calibration plate; the intermediate array point measurement data is obtained by measuring array point data on the target array plate according to the CCD camera, and the initial array point measurement data and the intermediate array point measurement data are measurement results obtained under different measurement sequences respectively; the horizontal linearity error compensation value can effectively reflect the compensation defect of the middle array point measurement data in the horizontal direction; the vertical linearity error compensation value can effectively reflect the compensation defect of the middle array point measurement data in the vertical direction.
According to the embodiment, the two-dimensional linear compensation of the platform to be compensated can be effectively realized by calculating the horizontal linearity error compensation value and the vertical linearity error compensation value of each node of the platform to be compensated.
On the basis of the above embodiment, optionally, compensating the platform to be compensated according to the two-dimensional linearity error compensation, includes:
converting the horizontal linearity error compensation value and the vertical linearity error compensation value into compensation coordinates of a platform to be compensated;
and performing platform precision compensation on the platform to be compensated according to the compensation coordinate of the platform to be compensated.
In this embodiment, since the horizontal linearity error compensation value and the vertical linearity error compensation value belong to data coordinates represented in an orthogonal coordinate system, in order to achieve effective docking with the platform to be compensated, the horizontal linearity error compensation value and the vertical linearity error compensation value need to be converted into compensation coordinates of the platform to be compensated. Specifically, the conversion may be performed according to the following formula (4).
Wherein x is2The compensation abscissa of the platform to be compensated is taken as the reference coordinate; y is2The vertical coordinate of the platform to be compensated is taken as the compensation vertical coordinate; theta is an orthogonality included angle of the platform to be compensated; x is the number of1Is a horizontal linearity error compensation value; y is1Is a vertical linearity error compensation value.
EXAMPLE III
Fig. 3 is a schematic structural diagram of a compensation apparatus for stage accuracy according to a third embodiment of the present invention, which is applicable to a case of effectively compensating for stage accuracy. The device is configured in the electronic equipment, and can realize the compensation method of the platform precision in any embodiment of the application. The device specifically comprises the following steps:
a data determination module 310, configured to determine array point measurement data on the target calibration plate;
the orthogonality included angle calculation module 320 is configured to calculate an orthogonality included angle of the platform to be compensated according to the array point measurement data;
the data conversion module 330 is configured to convert the array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated;
the error compensation determining module 340 is configured to determine two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data;
and a platform compensation module 350, configured to compensate the platform to be compensated according to the two-dimensional linearity error compensation.
On the basis of the foregoing embodiment, optionally, the apparatus of this embodiment further includes:
and the target calibration plate selection module is used for selecting a calibration plate containing circular array point measurement data from the candidate calibration plate set as a target calibration plate.
On the basis of the foregoing embodiment, optionally, the orthogonality included angle calculating module 320 is specifically configured to:
acquiring array point theoretical data of the target calibration plate;
determining an affine transformation matrix from the array point measurement data to the array point theoretical data according to the array point theoretical data and the array point measurement data;
and calculating an affine vector included angle of a preset coordinate point according to the affine transformation matrix to obtain an orthogonality included angle of the platform to be compensated.
On the basis of the foregoing embodiment, optionally, the error compensation determining module 340 is specifically configured to:
determining a horizontal linearity error compensation value of the middle array point measurement data;
a vertical linearity error compensation value for the intermediate array point measurement data is determined.
On the basis of the foregoing embodiment, optionally, the error compensation determining module 340 is further specifically configured to:
determining the linearity error of an orthogonal included angle of a platform to be compensated; and determining horizontal measurement errors of the measurement data of each intermediate array point; wherein the horizontal measurement error is a difference between a horizontal measurement length from the middle array point measurement data to the initial array point measurement data and a horizontal theoretical length from the middle array point measurement data to the initial array point measurement data;
taking the difference between the linearity error of the orthogonal included angle and the horizontal measurement error of the middle array point measurement data as a horizontal linearity error compensation value of the middle array point measurement data;
accordingly, the error compensation determining module 340 is further specifically configured to:
determining the vertical measurement error of the measurement data of each middle array point; wherein the vertical measurement error is a difference between a vertical measurement length from the middle array point measurement data to the initial array point measurement data and a vertical theoretical length from the middle array point measurement data to the initial array point measurement data;
and taking the difference value between the linearity error of the orthogonal included angle and the vertical measurement error of the middle array point measurement data as a vertical linearity error compensation value of the middle array point measurement data.
On the basis of the foregoing embodiment, optionally, the platform compensation module 350 is specifically configured to:
converting the horizontal linearity error compensation value and the vertical linearity error compensation value into a compensation coordinate of the platform to be compensated;
and performing platform precision compensation on the platform to be compensated according to the compensation coordinate of the platform to be compensated.
By the platform precision compensation device in the third embodiment of the invention, precision compensation of the precision of the platform to be compensated can be realized by adopting a precision compensation mode in a two-dimensional direction according to two-dimensional linearity error compensation.
The platform precision compensation device provided by the embodiment of the invention can execute the platform precision compensation method provided by any embodiment of the invention, and has corresponding functional modules and beneficial effects of the execution method.
Example four
Fig. 4 is a schematic structural diagram of an electronic device according to a fourth embodiment of the present invention, as shown in fig. 4, the electronic device includes a processor 410, a memory 420, an input device 430, and an output device 440; the number of the processors 410 in the electronic device may be one or more, and one processor 410 is taken as an example in fig. 4; the processor 410, the memory 420, the input device 430 and the output device 440 in the electronic apparatus may be connected by a bus or other means, and the bus connection is exemplified in fig. 4.
The memory 420 serves as a computer-readable storage medium for storing software programs, computer-executable programs, and modules, such as program instructions/modules corresponding to the platform accuracy compensation method in the embodiments of the present invention. The processor 410 executes various functional applications and data processing of the electronic device by executing software programs, instructions and modules stored in the memory 420, that is, implements the platform accuracy compensation method provided by the embodiment of the present invention.
The memory 420 may mainly include a program storage area and a data storage area, wherein the program storage area may store an operating system, an application program required for at least one function; the storage data area may store data created according to the use of the terminal, and the like. Further, the memory 420 may include high speed random access memory, and may also include non-volatile memory, such as at least one magnetic disk storage device, flash memory device, or other non-volatile solid state storage device. In some examples, memory 420 may further include memory located remotely from processor 410, which may be connected to an electronic device over a network. Examples of such networks include, but are not limited to, the internet, intranets, local area networks, mobile communication networks, and combinations thereof.
The input device 430 may be used to receive input numeric or character information and generate key signal inputs related to user settings and function control of the electronic apparatus, and may include a keyboard, a mouse, and the like. The output device 440 may include a display device such as a display screen.
EXAMPLE five
The present embodiments provide a storage medium containing computer-executable instructions that, when executed by a computer processor, are used to implement a method of compensating for platform accuracy provided by embodiments of the present invention.
Of course, the storage medium containing the computer-executable instructions provided by the embodiments of the present invention is not limited to the method operations described above, and may also perform related operations in the platform precision compensation method provided by any embodiments of the present invention.
From the above description of the embodiments, it is obvious for those skilled in the art that the present invention can be implemented by software and necessary general hardware, and certainly, can also be implemented by hardware, but the former is a better embodiment in many cases. Based on such understanding, the technical solutions of the present invention may be embodied in the form of a software product, which can be stored in a computer-readable storage medium, such as a floppy disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a FLASH Memory (FLASH), a hard disk or an optical disk of a computer, and includes several instructions for enabling a computer device (which may be a personal computer, a server, or a network device) to execute the methods according to the embodiments of the present invention.
It should be noted that, in the embodiment of the above search apparatus, each included unit and module are merely divided according to functional logic, but are not limited to the above division as long as the corresponding functions can be implemented; in addition, specific names of the functional units are only for convenience of distinguishing from each other, and are not used for limiting the protection scope of the present invention.
It is to be noted that the foregoing is only illustrative of the preferred embodiments of the present invention and the technical principles employed. It will be understood by those skilled in the art that the present invention is not limited to the particular embodiments described herein, but is capable of various obvious changes, rearrangements and substitutions as will now become apparent to those skilled in the art without departing from the scope of the invention. Therefore, although the present invention has been described in greater detail by the above embodiments, the present invention is not limited to the above embodiments, and may include other equivalent embodiments without departing from the spirit of the present invention, and the scope of the present invention is determined by the scope of the appended claims.
Claims (10)
1. A method of compensating for platform accuracy, the method comprising:
determining array point measurement data on a target calibration plate;
calculating an orthogonality included angle of the platform to be compensated according to the array point measurement data;
converting the array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated;
determining two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data;
and compensating the platform to be compensated according to the two-dimensional linearity error compensation.
2. The method of claim 1, wherein prior to determining the array point measurement data on the target calibration plate, the method further comprises:
and selecting a calibration plate containing circular array point measurement data from the candidate calibration plate set as a target calibration plate.
3. The method of claim 1, wherein calculating the orthogonality angle of the platform to be compensated based on the array point measurement data comprises:
acquiring array point theoretical data of the target calibration plate;
determining an affine transformation matrix from the array point measurement data to the array point theoretical data according to the array point theoretical data and the array point measurement data;
and calculating an affine vector included angle of a preset coordinate point according to the affine transformation matrix to obtain an orthogonality included angle of the platform to be compensated.
4. The method of claim 1, wherein determining two-dimensional linearity error compensation for a platform to be compensated based on the orthogonal coordinate system data comprises:
determining a horizontal linearity error compensation value of the middle array point measurement data;
a vertical linearity error compensation value for the intermediate array point measurement data is determined.
5. The method of claim 4, wherein determining a horizontal linearity error compensation value for the intermediate array point measurement data comprises:
determining the linearity error of an orthogonal included angle of a platform to be compensated; and determining horizontal measurement errors of the measurement data of each intermediate array point; wherein the horizontal measurement error is a difference between a horizontal measurement length from the middle array point measurement data to the initial array point measurement data and a horizontal theoretical length from the middle array point measurement data to the initial array point measurement data;
taking the difference between the linearity error of the orthogonal included angle and the horizontal measurement error of the middle array point measurement data as a horizontal linearity error compensation value of the middle array point measurement data;
accordingly, determining a vertical linearity error compensation value for the intermediate array point measurement data comprises:
determining the vertical measurement error of the measurement data of each middle array point; wherein the vertical measurement error is a difference between a vertical measurement length from the middle array point measurement data to the initial array point measurement data and a vertical theoretical length from the middle array point measurement data to the initial array point measurement data;
and taking the difference value between the linearity error of the orthogonal included angle and the vertical measurement error of the middle array point measurement data as a vertical linearity error compensation value of the middle array point measurement data.
6. The method of claim 4, wherein compensating the platform to be compensated for the two-dimensional linearity error compensation comprises:
converting the horizontal linearity error compensation value and the vertical linearity error compensation value into a compensation coordinate of the platform to be compensated;
and performing platform precision compensation on the platform to be compensated according to the compensation coordinate of the platform to be compensated.
7. An apparatus for compensating for platform accuracy, the apparatus comprising:
the data determination module is used for determining array point measurement data on the target calibration plate;
the orthogonality included angle calculation module is used for calculating an orthogonality included angle of the platform to be compensated according to the array point measurement data;
the data conversion module is used for converting the array point measurement data into orthogonal coordinate system data based on the orthogonality included angle of the platform to be compensated;
the error compensation determining module is used for determining two-dimensional linearity error compensation of the platform to be compensated according to the orthogonal coordinate system data;
and the platform compensation module is used for compensating the platform to be compensated according to the two-dimensional linearity error compensation.
8. The apparatus of claim 7, further comprising:
and the target calibration plate selection module is used for selecting a calibration plate containing circular array point measurement data from the candidate calibration plate set as a target calibration plate.
9. An electronic device, comprising:
one or more processors;
a storage device for storing one or more programs,
when executed by the one or more processors, cause the one or more processors to implement a method of compensating for platform accuracy as claimed in any one of claims 1 to 6.
10. A computer-readable storage medium, on which a computer program is stored, which, when being executed by a processor, carries out a method of compensating for platform accuracy according to any one of claims 1 to 6.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114001655A (en) * | 2021-11-02 | 2022-02-01 | 深圳市腾盛精密装备股份有限公司 | Method and device for determining precision of machine equipment |
| CN114415597A (en) * | 2021-12-30 | 2022-04-29 | 武汉铱科赛科技有限公司 | Linkage machining method, system, equipment and device for platform galvanometer and industrial personal computer |
| CN115876148A (en) * | 2023-02-07 | 2023-03-31 | 昂坤视觉(北京)科技有限公司 | Method and system for compensating operation error of wafer flatness measuring platform |
| CN117161550A (en) * | 2023-11-02 | 2023-12-05 | 珠海市申科谱工业科技有限公司 | 2D platform compensation method and device and laser processing equipment |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101418462B1 (en) * | 2013-02-26 | 2014-07-14 | 애니모션텍 주식회사 | Stage Calibration Method using 3-D coordinate measuring machine |
| CN104006777A (en) * | 2014-06-10 | 2014-08-27 | 清华大学 | Self-calibrating method of two-dimensional large-stroke precision workbench measuring system |
| KR20140106299A (en) * | 2013-02-26 | 2014-09-03 | 애니모션텍 주식회사 | Stage Calibration Method using camera and displacement sensor |
| CN105094051A (en) * | 2014-04-15 | 2015-11-25 | 睿励科学仪器（上海）有限公司 | Planar positioning compensation method for motion platform system |
| CN108303023A (en) * | 2018-01-22 | 2018-07-20 | 合肥芯碁微电子装备有限公司 | A kind of method of ultraprecise two-dimension moving platform system place precision compensation |
| CN109916342A (en) * | 2019-03-25 | 2019-06-21 | 合肥芯碁微电子装备有限公司 | A kind of locating platform straight line degree measurement system and method |
| CN110823155A (en) * | 2018-08-10 | 2020-02-21 | 维嘉数控科技（苏州）有限公司 | Error correction method and device for mechanical platform |
-
2020
- 2020-10-29 CN CN202011179963.4A patent/CN112486093A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101418462B1 (en) * | 2013-02-26 | 2014-07-14 | 애니모션텍 주식회사 | Stage Calibration Method using 3-D coordinate measuring machine |
| KR20140106299A (en) * | 2013-02-26 | 2014-09-03 | 애니모션텍 주식회사 | Stage Calibration Method using camera and displacement sensor |
| CN105094051A (en) * | 2014-04-15 | 2015-11-25 | 睿励科学仪器（上海）有限公司 | Planar positioning compensation method for motion platform system |
| CN104006777A (en) * | 2014-06-10 | 2014-08-27 | 清华大学 | Self-calibrating method of two-dimensional large-stroke precision workbench measuring system |
| CN108303023A (en) * | 2018-01-22 | 2018-07-20 | 合肥芯碁微电子装备有限公司 | A kind of method of ultraprecise two-dimension moving platform system place precision compensation |
| CN110823155A (en) * | 2018-08-10 | 2020-02-21 | 维嘉数控科技（苏州）有限公司 | Error correction method and device for mechanical platform |
| CN109916342A (en) * | 2019-03-25 | 2019-06-21 | 合肥芯碁微电子装备有限公司 | A kind of locating platform straight line degree measurement system and method |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114001655A (en) * | 2021-11-02 | 2022-02-01 | 深圳市腾盛精密装备股份有限公司 | Method and device for determining precision of machine equipment |
| CN114001655B (en) * | 2021-11-02 | 2022-11-15 | 深圳市腾盛精密装备股份有限公司 | Method and device for determining precision of machine equipment |
| CN114415597A (en) * | 2021-12-30 | 2022-04-29 | 武汉铱科赛科技有限公司 | Linkage machining method, system, equipment and device for platform galvanometer and industrial personal computer |
| CN114415597B (en) * | 2021-12-30 | 2023-11-14 | 武汉铱科赛科技有限公司 | Platform vibrating mirror linkage processing method, system, equipment, device and industrial personal computer |
| CN115876148A (en) * | 2023-02-07 | 2023-03-31 | 昂坤视觉(北京)科技有限公司 | Method and system for compensating operation error of wafer flatness measuring platform |
| CN115876148B (en) * | 2023-02-07 | 2023-05-19 | 昂坤视觉(北京)科技有限公司 | Method and system for compensating running error of wafer flatness measurement platform |
| CN117161550A (en) * | 2023-11-02 | 2023-12-05 | 珠海市申科谱工业科技有限公司 | 2D platform compensation method and device and laser processing equipment |
| CN117161550B (en) * | 2023-11-02 | 2024-01-26 | 珠海市申科谱工业科技有限公司 | 2D platform compensation method and device and laser processing equipment |
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