CN112420548A - Edge washing device - Google Patents
Edge washing device Download PDFInfo
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- CN112420548A CN112420548A CN201910785150.0A CN201910785150A CN112420548A CN 112420548 A CN112420548 A CN 112420548A CN 201910785150 A CN201910785150 A CN 201910785150A CN 112420548 A CN112420548 A CN 112420548A
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- Prior art keywords
- supporting rod
- fine adjustment
- adjustment mechanism
- edge washing
- rod
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/60—Arrangements for mounting, supporting or holding spraying apparatus
- B05B15/68—Arrangements for adjusting the position of spray heads
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses an edge washing device which comprises a supporting shaft, a driving device, a rotating support, an L-shaped supporting rod, a sprayer device, a first fine adjustment mechanism and a second fine adjustment mechanism, wherein the driving device is installed at one end of the supporting shaft, the rotating support is installed at the other end of the supporting shaft, the L-shaped supporting rod comprises a vertical supporting rod and a horizontal supporting rod, the vertical supporting rod is rotatably installed at the free end of the rotating support, the sprayer device is rotatably installed on the horizontal supporting rod, the first fine adjustment mechanism is installed on the rotating support and used for driving the L-shaped supporting rod to rotate, and the second fine adjustment mechanism is installed on the L-shaped supporting rod and used for driving the sprayer device to rotate. According to the invention, the height and the angle of the spray head device are flexibly adjusted by manually adjusting the first fine adjustment mechanism and the second fine adjustment mechanism, so that the spray nozzle reaches the optimal edge washing position, the edge washing width and the width of the transition region are accurately controlled, the optimal edge washing effect is achieved, and the product quality is improved.
Description
Technical Field
The invention relates to the technical field of semiconductor manufacturing, in particular to an edge washing device capable of adjusting the edge washing width and the width of a transition area.
Background
In a semiconductor manufacturing process, an edge washing process is performed on a wafer, for example, after the wafer is electrochemically plated with copper and before the wafer is chemically and mechanically polished, the wafer needs to be edge-washed to remove a copper film on the edge of the wafer, and for example, after the wafer is coated with glue, the wafer needs to be edge-washed to remove a photoresist on the edge of the wafer. When the wafer is subjected to edge washing, the removal width of a copper film or photoresist at the edge of the wafer needs to be considered, meanwhile, the width of a transition region needs to be ensured, the edge removal width and the width of the transition region determine the quality of edge washing, and the quality of the edge washing affects the quality of products. The prior art adopts the shower nozzle to carry out the wet process to the wafer and washes the limit usually, washes the limit in-process, and it is even to guarantee that the product washed the limit, also guarantees to wash limit width and transition region width, prevents to wash the limit harmfully to lead to the product yield to reduce or rework, and the play liquid direction of shower nozzle, height etc. all have very big influence to washing limit effect and transition region width, and the play liquid direction of shower nozzle, height etc. are adjusted not accurate all can lead to washing the limit effect not good.
At present, the traditional nozzle device for edge washing cannot flexibly adjust the liquid outlet direction and height of the nozzle and the inclination angle of a liquid column relative to a wafer, so that the width of a wafer edge washing transition area is poor or the edge washing is insufficient, the yield of a product is damaged or reworking is required, the production efficiency is influenced, and meanwhile, the production cost is also lost.
Disclosure of Invention
The invention aims to provide an edge washing device, which can adjust a spray head to an optimal edge washing position, control the edge washing width and the width of a transition area, thereby improving the edge washing effect and further improving the product quality.
In order to achieve the above object, the present invention provides an edge washing device, comprising:
a support shaft;
a driving device mounted at one end of the supporting shaft;
a rotating bracket mounted at the other end of the supporting shaft;
the L-shaped supporting rod comprises a vertical supporting rod and a horizontal supporting rod which are connected with each other, the vertical supporting rod is rotatably arranged at the free end of the rotating bracket, and the horizontal supporting rod is rotatably provided with a spray head device;
the first fine adjustment mechanism is arranged on the rotating bracket and used for driving the L-shaped supporting rod to rotate;
and the second fine adjustment mechanism is arranged on the L-shaped supporting rod and used for driving the spray head device to rotate.
Further, the first fine adjustment mechanism includes:
the first fixing plate is arranged on the rotating bracket;
the first adjusting rod is limited in a first groove formed in the first fixing plate;
the first sliding block is in threaded connection with the first adjusting rod;
the vertical supporting rod is provided with a first opening, the first sliding block is provided with a first lug, and the first lug is in sliding connection with the first opening;
when the first adjusting rod is rotated, the first sliding block moves along the first groove, and the first convex block pushes the L-shaped supporting rod to rotate relative to the rotating support.
Further, the first fine adjustment mechanism further includes:
the first pointer is fixedly arranged on the first fixing plate;
the first angle scale is marked on the vertical supporting rod, and the first pointer points to the first angle scale.
Furthermore, a second opening is formed in the vertical supporting rod, the second opening is arc-shaped, and the circle center of the second opening coincides with the rotation center of the L-shaped supporting rod; the L-shaped supporting rod and the rotating bracket are connected through the second opening by a fastener.
Further, the second fine adjustment mechanism includes:
the second fixing plate is arranged on the L-shaped supporting rod;
the second adjusting rod is limited in a second groove formed in the second fixing plate;
the second sliding block is in threaded connection with the second adjusting rod;
the nozzle device is provided with a shell, a second convex block is arranged on the second sliding block, and the second convex block is connected with the shell;
when the second adjusting rod is rotated, the second sliding block moves along the second groove, and the second convex block pushes the shell to enable the spray head device to rotate relative to the horizontal supporting rod.
Further, the second fine adjustment mechanism further includes:
the second pointer is fixedly arranged on the shell;
and the second angle scale is marked on the horizontal supporting rod, and the second pointer points to the second angle scale.
Further, a round hole is further formed in the horizontal supporting rod, at least one circular arc notch is formed in the round hole in a surrounding mode, the circular arc notch and the round hole are arranged in a concentric mode, the sprayer device is installed in the circular hole in a rotating mode, and the fixing piece penetrates through the circular arc notch between the sprayer device and the horizontal supporting rod.
According to the invention, the height and the angle of the spray head are flexibly adjusted by manually adjusting the first fine adjustment mechanism and the second fine adjustment mechanism, so that the spray head reaches the optimal edge washing position, the edge washing width and the width of the transition region are accurately controlled, the optimal edge washing effect is achieved, and the product quality is improved.
Drawings
FIG. 1 discloses a schematic diagram of a cross-section of a portion of a silicon wafer.
Fig. 2 discloses a perspective view of a selvedge washing apparatus according to an embodiment of the present invention.
Fig. 3 discloses a 45 deg. right side view of the manual adjustment portion of the edge washing apparatus of the present invention.
Fig. 4 discloses a 45 deg. left side view of the manual adjustment portion of the edge washing device of the present invention.
Fig. 5 discloses a bottom view of the manual adjustment part in the edge washing device of the invention.
Fig. 6 discloses a perspective view of an L-shaped strut in the edge washing device of the present invention.
Fig. 7 discloses a structural view of a vertical direction fine adjustment structure in the edge washing apparatus of the present invention.
Fig. 8 discloses a cross-sectional view of a vertical micro-adjustment structure in the edge washing device of the present invention.
Fig. 9 discloses a perspective view of a slider in a vertical direction fine adjustment structure in the edge washing device of the present invention.
Fig. 10 discloses a schematic view of adjusting the position of the spray head in the edge washing device of the present invention.
Fig. 11 discloses a perspective view of the lower part of the horizontal direction fine adjustment structure in the edge washing device of the present invention.
Fig. 12 is a view showing a structure of a horizontal direction fine adjustment structure in the edge washing apparatus of the present invention.
Fig. 13 discloses a perspective view of a slider in a horizontal direction fine adjustment structure in the edge washing device of the present invention.
Detailed Description
To explain the technical content, structural features, and achieved objects and effects of the present invention in detail, the following detailed description is given with reference to the accompanying drawings in combination with the embodiments.
Referring to FIG. 1, a schematic diagram of a cross-section of a portion of a silicon wafer 100 used in one embodiment according to the present invention is disclosed. The region 101 is an edge removal region, the region 102 is an edge transition region, and the region 103 is a region requiring reservation. In the wet edge cleaning process, the width of the edge transition region 102 is also considered while the width of the edge removal region 101 is considered, so that the influence on the retention region 103 and the quality of the silicon wafer 100 is avoided.
Referring to fig. 2, according to an embodiment of the present invention, the edge washing apparatus includes a support shaft 200, a driving device 201, a rotating bracket 202, an L-shaped strut 203, a first fine adjustment mechanism 300, a second fine adjustment mechanism 400, and a head unit 500. The driving means 201 is installed at one end of the supporting shaft 200, and is generally a rotating motor and a lifting motor for controlling the lifting and rotating of the whole edge washing apparatus. The rotating bracket 202 is connected to the other end of the support shaft 200. Referring to fig. 2 and 3, the L-shaped strut 203 includes a vertical strut 2031 and a horizontal strut 2032, the vertical strut 2031 is rotatably mounted at the free end of the rotating bracket 202, that is, in this case, the L-shaped strut 203 is integrally used as a rotating member, and the rotating bracket 202 is used as a fixed member, and the L-shaped strut 203 can be driven by the first fine adjustment mechanism 300 to freely rotate relative to the rotating bracket 202. The nozzle assembly 500 is rotatably mounted on the horizontal rod 2032, that is, at this time, the nozzle assembly 500 is a rotating member, the horizontal rod 2032 is a fixed member, and the nozzle assembly 500 can freely rotate relative to the horizontal rod 2032 under the driving of the second fine adjustment mechanism 400.
Referring to fig. 3, the nozzle head apparatus 500 includes a liquid inlet 501, a housing 502, a nozzle 503, and a liquid inlet channel 504. One end of the liquid inlet channel 504 is connected with the liquid inlet 501, the other end is connected with the nozzle 503, and the shell 502 is fixed with the liquid inlet channel 504. Referring to fig. 6, a circular hole 2037 is formed in the horizontal support rod 2032, a plurality of circular notches 2038 concentric with the circular hole 2037 are formed outside the circular hole 2037, the spray head device 500 passes through the circular hole 2037, and the housing 502 is fixed to the horizontal support rod 2032 after passing through the circular notches 2038 by a fixing member, so that the spray head device 500 is rotatably fixed to the horizontal support rod 2032.
Referring to fig. 6, the vertical strut 2031 of the L-shaped strut 203 comprises a first aperture 2034 and a second aperture 2035. The second opening 2035 is a circular arc opening, and a positioning pin 2033 is disposed at a center of the circle corresponding to the circular arc of the second opening 2035. The rotating bracket 202 is provided with a mounting hole matched with the positioning pin 2033, and the positioning pin 2033 is inserted into the mounting hole on the rotating bracket 202, so that the L-shaped support rod 203 and the rotating bracket 202 can be rotatably fixed by using the positioning pin 2033 as a rotation center. Referring to fig. 7, the L-shaped support rod 203 and the rotating bracket 202 are connected by a fastener through the second opening 2035, so that the L-shaped support rod 203 rotates in a vertical plane around the positioning pin 2033, and the size of the second opening 2035 limits the rotation range of the L-shaped support rod 203, i.e., the adjustable range of the spray head device 500.
Referring to fig. 7 to 9, according to an embodiment of the present invention, the first fine adjustment mechanism 300 includes a first slider 302, a first adjustment lever 305, and a first fixing plate 306. The main body of the first adjusting rod 305 is provided with external threads, the center of the first sliding block 302 is provided with a through hole 3021, the first adjusting rod 305 is arranged in the through hole 3021, and the through hole 3021 is internally provided with internal threads matched with the first adjusting rod 305. One end of the first adjusting lever 305 is provided with a first knob 301, and a ring of convex ring is arranged at the position of the main body of the first adjusting lever 305 close to the first knob 301. The first fixing plate 306 is fixed to the rotating bracket 202, a vertical groove is formed in the first fixing plate 306, the first slider 302 is arranged in the vertical groove of the first fixing plate 306, and the first slider 302 can move along the vertical groove. The first fixing plate 306 is further provided with a transverse groove, the convex ring of the first adjusting lever 305 is arranged in the transverse groove of the first fixing plate 306, and the transverse groove is used for fixing the first adjusting lever 305 in the vertical direction. The vertical groove and the horizontal groove on the first fixing plate 306 together form a first groove. When the first knob 301 is rotated, the first adjusting lever 305 cannot move in the vertical groove of the first fixing plate 306 because the convex ring of the first adjusting lever 305 is limited by the horizontal groove, so that the first slider 302 moves up and down in the vertical groove. The first slider 302 is further provided with a first bump 3022, the first bump 3022 is slidably mounted in the first opening 2034 of the vertical strut 2031, and the first opening 2034 is a long strip-shaped opening. Therefore, when the first slider 302 moves in the vertical groove, the first protrusion 3022 thereon drives the L-shaped support rod 203 to rotate in the vertical plane around the positioning pin 2033, and further drives the nozzle 503 to move in the vertical plane.
Referring to fig. 4, the first fine adjustment mechanism 300 is further provided with a first pointer 303, and specifically, the first pointer 303 is fixedly mounted on the first fixing plate 306; the vertical strut 2031 is further provided with a first angle scale 304, and the first pointer 303 points to the first angle scale 304.
Referring to FIG. 10, a schematic illustration of the position adjustment of the nozzle 503 of the present invention is disclosed, according to one embodiment. By calculation in advance, an angle interval of 30 ° -60 ° is provided on the first angle scale 304 (it is of course understood that in other embodiments, the angle adjustment range may also be changed by changing the size of the circular arc angle of the second opening, the first angle scale 304 showing a corresponding angle range, such as 20 ° -50 °, etc.). The initial position of the nozzle 503 forms an angle of 45 degrees with the silicon wafer 100, the first knob 301 is rotated to drive the first slider 302 to move, so that the L-shaped support rod 203 is driven to rotate by taking the positioning pin 2033 as a circle center, the nozzle 503 is driven to move, a specific moving angle is determined by the first pointer 303, and the specific moving position of the nozzle 503 is controlled.
Referring to fig. 11 to 13, according to an embodiment of the present invention, the second fine adjustment mechanism 400 includes a second slider 402, a second adjustment lever 403, and a second fixing plate 404. The main body of the second adjusting rod 403 is provided with external threads, the center of the second sliding block 402 is provided with a through hole 4021, the second adjusting rod 403 is arranged in the through hole 4021, and the through hole 4021 is internally provided with internal threads matched with the second adjusting rod 403. One end of the second adjusting lever 403 is provided with a second knob 401, and a circle of convex ring is arranged at the position of the main body of the second adjusting lever 403 close to the second knob 401. The second fixing plate 404 is fixed to the L-shaped support rod 203, a vertical groove is formed in the second fixing plate 404, the second slider 402 is arranged in the vertical groove of the second fixing plate 404, and the second slider 402 can move along the vertical groove. The second fixing plate 404 is further provided with a transverse groove, the convex ring of the second adjusting rod 403 is arranged in the transverse groove of the second fixing plate 404, and the transverse groove is used for limiting the movement of the second adjusting rod 403. The vertical grooves and the horizontal grooves on the second fixing plate 404 together form second grooves. When the second knob 401 is rotated, the protruding ring of the second adjusting rod 403 is limited by the horizontal groove, and the second adjusting rod 403 cannot move in the vertical groove of the second fixing plate 404, so that the second slider 402 moves up and down in the vertical groove. The second slider 402 is further provided with a second bump 4022, and the horizontal strut 2032 of the L-shaped strut 203 is further provided with a strip-shaped opening 2036. The second protrusion 4022 passes through the elongated opening 2036 and is connected to the housing 502, so that the second fine adjustment mechanism 400 is connected to the nozzle device 500, and the second fine adjustment mechanism 400 can adjust the position of the nozzle device 500. The second fine adjustment mechanism 400 is basically the same as the first fine adjustment mechanism 300 in working principle, and when the second fine adjustment mechanism is used, the second knob 401 is pulled, the second slider 402 moves along the vertical groove, the nozzle device 500 is driven to rotate in the horizontal direction through the connection between the second bump 4022 and the housing 502, more specifically, the nozzle device 500 is driven to rotate by taking the circular hole 2037 as the center of a circle through the second bump 4022, and the rotation range is limited by the circular arc notch 2038 of the horizontal support rod 2032.
Referring to fig. 11, a second pointer 505 is further disposed on the housing 502, a second angular scale 506 is further disposed on the horizontal strut 2032, and the second pointer 505 points to the second angular scale 506. When the second fine adjustment mechanism 400 adjusts the rotational position of the head unit 500, it is possible to judge whether the nozzle angle is adjusted to an appropriate position by observing the reading on the second angle scale 506.
When the edge washing apparatus of the present invention is used to wash the edge of a silicon wafer, the driving device 201 (typically, a rotary motor and an elevating motor) is used to control the rotation and elevating movement of the entire apparatus, and the driving device 201 directly controls the movement of the support shaft 200 and drives the movement of the rotary bracket 202 and the L-shaped support rod 203, so that the nozzle 503 reaches a rough edge washing position. The position of the nozzle 503 in the vertical plane is then specifically controlled by manually adjusting the first fine adjustment mechanism 300. The first knob 301 is rotated, so that the first slider 302 drives the L-shaped supporting rod 203 to rotate in the vertical plane around the positioning pin 2033, and simultaneously drives the nozzle 503 to move in the vertical plane, and the specific moving angle is determined by the first pointer 303 and the first angle scale 304, thereby controlling the specific moving position of the nozzle 503. The position of the nozzle 503 in the horizontal plane is then specifically controlled by manually adjusting the second fine adjustment mechanism 400. Rotating the second knob 401 causes the second slider 402 to rotate the nozzle device 500, thereby moving the nozzle 503 in the horizontal plane. The position of the nozzle 503 is precisely controlled by the second pointer 505 and the second angle scale 506, so that the nozzle 503 reaches an optimal edge washing position.
The edge washing device of the invention utilizes the driving device to move the nozzle 503 to the approximate position, and then the height and the angle of the nozzle 503 are flexibly adjusted by manually adjusting the first fine adjustment mechanism and the second fine adjustment mechanism, so that the nozzle 503 reaches the optimal edge washing position, the edge washing width and the width of the transition area are accurately controlled, the optimal edge washing effect is achieved, and the product quality is improved.
In summary, the present invention has been described in detail with reference to the above embodiments and the accompanying drawings, so that those skilled in the art can implement the invention. The above-described embodiments are intended to be illustrative, but not limiting, of the present invention, the scope of which is defined by the appended claims. Variations on the number of elements described herein or substitutions of equivalent elements are intended to be within the scope of the present invention.
Claims (7)
1. An edge washing device, comprising:
a support shaft;
a driving device mounted at one end of the supporting shaft;
a rotating bracket mounted at the other end of the supporting shaft;
the L-shaped supporting rod comprises a vertical supporting rod and a horizontal supporting rod which are connected with each other, the vertical supporting rod is rotatably arranged at the free end of the rotating bracket, and the horizontal supporting rod is rotatably provided with a spray head device;
the first fine adjustment mechanism is arranged on the rotating bracket and used for driving the L-shaped supporting rod to rotate;
and the second fine adjustment mechanism is arranged on the L-shaped supporting rod and used for driving the spray head device to rotate.
2. The edge washing apparatus of claim 1, wherein the first fine adjustment mechanism comprises:
the first fixing plate is arranged on the rotating bracket;
the first adjusting rod is limited in a first groove formed in the first fixing plate;
the first sliding block is in threaded connection with the first adjusting rod;
the vertical supporting rod is provided with a first opening, the first sliding block is provided with a first lug, and the first lug is in sliding connection with the first opening;
when the first adjusting rod is rotated, the first sliding block moves along the first groove, and the first convex block pushes the L-shaped supporting rod to rotate relative to the rotating support.
3. The edge washing apparatus of claim 2, wherein the first fine adjustment mechanism further comprises:
the first pointer is fixedly arranged on the first fixing plate;
the first angle scale is marked on the vertical supporting rod, and the first pointer points to the first angle scale.
4. The edge washing device according to claim 2, wherein the vertical support rod is further provided with a second opening, the second opening is arc-shaped, and the circle center of the second opening coincides with the rotation center of the L-shaped support rod; the L-shaped supporting rod and the rotating bracket are connected through the second opening by a fastener.
5. The edge washing apparatus of claim 1, wherein the second fine adjustment mechanism comprises:
the second fixing plate is arranged on the L-shaped supporting rod;
the second adjusting rod is limited in a second groove formed in the second fixing plate;
the second sliding block is in threaded connection with the second adjusting rod;
the nozzle device is provided with a shell, a second convex block is arranged on the second sliding block, and the second convex block is connected with the shell;
when the second adjusting rod is rotated, the second sliding block moves along the second groove, and the second convex block pushes the shell to enable the spray head device to rotate relative to the horizontal supporting rod.
6. The edge washing apparatus of claim 5, wherein the second fine adjustment mechanism further comprises:
the second pointer is fixedly arranged on the shell;
and the second angle scale is marked on the horizontal supporting rod, and the second pointer points to the second angle scale.
7. The edge washing device as claimed in claim 5, wherein the horizontal support bar is further provided with a circular hole and at least one circular arc notch uniformly distributed around the circular hole, the circular arc notch is concentric with the circular hole, the nozzle device is rotatably installed in the circular hole, and the nozzle device and the horizontal support bar are connected by a fixing member penetrating through the circular arc notch.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910785150.0A CN112420548A (en) | 2019-08-23 | 2019-08-23 | Edge washing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910785150.0A CN112420548A (en) | 2019-08-23 | 2019-08-23 | Edge washing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112420548A true CN112420548A (en) | 2021-02-26 |
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ID=74779861
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910785150.0A Pending CN112420548A (en) | 2019-08-23 | 2019-08-23 | Edge washing device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN112420548A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114308424A (en) * | 2022-03-08 | 2022-04-12 | 宁波润华全芯微电子设备有限公司 | High pressure nozzle assembly, high pressure nozzle moving part, degumming cavity and degumming machine |
-
2019
- 2019-08-23 CN CN201910785150.0A patent/CN112420548A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114308424A (en) * | 2022-03-08 | 2022-04-12 | 宁波润华全芯微电子设备有限公司 | High pressure nozzle assembly, high pressure nozzle moving part, degumming cavity and degumming machine |
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