CN112414565B - Large-field-of-view wavefront measuring device, method, equipment and medium - Google Patents
Large-field-of-view wavefront measuring device, method, equipment and medium Download PDFInfo
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
- G01J2009/002—Wavefront phase distribution
Abstract
The invention discloses a large-field-of-view wavefront measuring device, a method, equipment and a medium, wherein the device comprises a device bodyThe image sensor of formation of image target surface, the place ahead installation of formation of image target surface is provided with the mask plate, evenly be provided with a plurality of miniature light passing holes according to preset distribution density on the mask plate, the diameter d of miniature light passing hole>10 lambda, and the diameter d and the distance between the mask plate and the imaging target surface satisfy the relation:
and L > 25 λ, λ being the wavelength of the light. The invention can utilize the imaging characteristic of a common convergent lens to realize large-field wavefront measurement under the condition of low cost, breaks through the dependence of the traditional wavefront measurement on collimated light by designing a mask plate with micro light through holes with set density during measurement and combining a cross-correlation calculation method, can realize large-field wavefront measurement according to the different field angles of the adopted common lens, does not need additional large-size concave mirrors or lenses, and has low manufacturing cost.
Description
Technical Field
The invention relates to the technical field of wavefront testing, in particular to a large-field-of-view wavefront measuring device, method, equipment and medium.
Background
The earliest Hartmann wavefront sensor was implemented primarily by placing a Hartmann plate with many small holes in front of the imaging target surface. The beam forms many beamlets after passing through the Hartmann plate. The position of the beam on the target surface may change after being affected by the variable index field perturbation. According to the Huygens principle and the distance between the Hartmann flat plate and the target surface, the spatial gradient of the wavefront at the corresponding small hole can be obtained, and a proper integration method is selected to complete wavefront reconstruction. The Shack-Hartmann (S-H) wavefront sensor achieves wavefront information capture by a method similar to the Hartmann wavefront sensor by replacing the earlier Hartmann plate with an array of microlenses through which the light beams would be focused onto the imaging target. The application of the micro lens enables the S-H wavefront sensor to have higher light condensation efficiency and can be better used under the condition of low light. And the size of a light spot on the imaging target surface is smaller, and the beam deflection angle is more accurately determined.
Considering the dependence of the use of the wavefront sensor on the collimated light beams, which are mostly realized by the optical lens and the concave mirror, the measurement of the wavefront with a large field of view needs the optical lens or the concave mirror with a large scale, so that the cost of the test is obviously increased, and the realization difficulty of the wavefront measurement with a larger field of view is also large.
Disclosure of Invention
The invention provides a large-field-of-view wavefront measuring device, which aims to solve the technical problems that the conventional large-field-of-view wavefront measurement needs a large-scale optical lens or concave mirror, so that the test cost is obviously increased, and the larger field-of-view wavefront measurement is difficult to realize.
The technical scheme adopted by the invention is as follows:
the utility model provides a big visual field wavefront measuring device, is including the image sensor who is provided with the formation of image target surface, the place ahead installation of formation of image target surface is provided with the mask plate, evenly be provided with a plurality of miniature light passing holes according to preset distribution density on the mask plate, the diameter d of miniature light passing hole>10 lambda, and the diameter d and the distance between the mask plate and the imaging target surface satisfy the relation:
and L > 25 λ, λ being the wavelength of the light.
Furthermore, the micro light through holes are regularly distributed on the mask plate in a row mode.
Furthermore, the micro light through holes are randomly distributed on the mask plate in a random mode.
Furthermore, the distribution density of the micro light through holes on the mask plate meets the pore ratio of 0.4-0.6, and the micro light through holes are not overlapped with each other.
Further, the imaging target surface is a CCD sensor or a CMOS sensor.
The invention also provides a large-field-of-view wavefront measuring method, and the large-field-of-view wavefront measuring device comprises the following steps:
a pair of dot patterns obtained with/without optical distortion field, respectively;
respectively setting M and N inquiry windows with the same size in the x direction and the y direction in the inquiry areas of the pair of dot matrix maps to obtain an M multiplied by N inquiry window array;
performing cross-correlation calculation processing to obtain light ray offset (delta x, delta y) caused by optical distortion corresponding to the position of the corresponding inquiry window;
and calculating the light ray deflection angles corresponding to the x direction and the y direction by combining the light ray deflection (delta x, delta y) and the distance L between the mask plate and the imaging target surface:
according to the huygens principle, the wavefront propagation direction is always obtained along the normal direction of the local wavefront surface:
and (3) performing wavefront reconstruction by using the wavefront propagation direction obtained in the formula (2) through an integration method, obtaining a corresponding optical path OPL result, and completing wavefront measurement.
Further, when the interrogation window is set, the number of light spots in a single interrogation window is more than 20.
Further, the integration method comprises a Southwell integration algorithm and a gradient integration algorithm.
In another aspect, the present invention further provides an electronic device, which includes a memory, a processor, and a computer program stored in the memory and executable on the processor, wherein the processor implements the large-field wavefront measuring method when executing the program.
In another aspect, the present invention further provides a storage medium, where the storage medium includes a stored program, and when the program runs, the apparatus on which the storage medium is located is controlled to execute the large-field-of-view wavefront measurement method.
The invention has the following beneficial effects:
according to the large-field-of-view wavefront measuring device and method, the mask plate with the high-density micro light through holes is arranged in front of the imaging target surface to replace various Hartmann mask plates in the wavefront testing technology, and a technical idea for realizing large-field-of-view wavefront measurement based on a common convergent lens is provided. Therefore, the invention can utilize the imaging characteristic of a common convergent lens to realize large-field wavefront measurement under the condition of low cost, breaks through the dependence of the traditional wavefront measurement on collimated light by designing a mask plate with micro light through holes with set density and combining a cross-correlation calculation method during measurement, can realize large-field wavefront measurement according to the different field angles of the adopted common lens, does not need additional large-size concave mirrors or lenses, and has low manufacturing cost.
In addition to the objects, features and advantages described above, other objects, features and advantages of the present invention are also provided. The present invention will be described in further detail below with reference to the accompanying drawings.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic diagram of a large field of view wavefront measuring device in accordance with a preferred embodiment of the present invention.
Fig. 2 is a schematic diagram of micro light-passing holes in a regular array on a mask according to another preferred embodiment of the present invention.
Fig. 3 is a schematic diagram of the micro light-passing holes randomly distributed on the mask plate according to another preferred embodiment of the present invention.
Fig. 4 is a flow chart of a large field of view wavefront measuring method according to another preferred embodiment of the present invention.
FIG. 5 is a schematic diagram of an integration grid of a Southwell integration algorithm according to another preferred embodiment of the present invention.
Fig. 6 is a block diagram of an electronic device entity in accordance with a preferred embodiment of the present invention.
In the figure: 1. imaging the target surface; 2. a mask plate; 3. an optical distortion field.
Detailed Description
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail below with reference to the embodiments with reference to the attached drawings.
Referring to FIG. 1, a preferred embodiment of the present invention provides a large field-of-view wavefront measuring device including an optical system configured to provide a wavefront measurement of a large field of viewThe image sensor comprises an image sensor with a target surface 1, wherein a mask plate 2 is arranged in front of the image sensor with the target surface 1, a plurality of micro light through holes are uniformly arranged on the mask plate 2 according to preset distribution density, and the diameter d of each micro light through hole>10 lambda, and the distance between the diameter d and the mask plate 2 from the imaging target surface 1 satisfies the relationship:
and L > 25 λ, λ being the wavelength of the light.
It is considered that when the micro clear aperture d is smaller than or equal to the light wavelength λ, a relatively significant diffraction phenomenon occurs, which affects the effective imaging of the light spot on the imaging target surface 1. To reduce the influence of diffraction phenomena, d is required here>10 lambda. Meanwhile, the distance L > d between the mask plate 2 and the imaging target surface 1 is considered24 lambda, the pronounced Fraunhofer diffraction phenomenon is relatively easy to occur, where we limit L ≈ d2/(4. lambda.), then
At the same time, L > 25. lambda.should be ensured.
The large-field-of-view wavefront measuring device utilizes the mask plate 2 with the high-density micro light through holes to be arranged in front of the imaging target surface 1 to replace various Hartmann mask plates in the wavefront testing technology, and provides a technical idea for realizing large-field-of-view wavefront measurement based on a common convergent lens. Therefore, the invention can utilize the imaging characteristic of a common convergent lens to realize large-field wavefront measurement under the condition of low cost, breaks through the dependence of the traditional wavefront test on collimated light by designing the mask plate 2 with the micro light through holes with set density and combining a cross-correlation calculation method during measurement, can realize large-field wavefront measurement according to the different field angles of the adopted common lens, does not need additional large-size concave mirrors or lenses, and has low manufacturing cost.
Light rays with an undistorted wavefront will show a more pronounced wavefront distortion after passing through the optical distortion field 3. After passing through the equivalent lens group and passing through the mask plate 2 containing a large number of micro light through holes, the light beam is changed into a large number of light beams to irradiate the imaging target surface 1 to form a light spot image.
As shown in fig. 2, in the preferred embodiment of the present invention, the micro light passing holes are regularly distributed on the mask 2 in a row.
As shown in fig. 3, in the preferred embodiment of the present invention, the micro light passing holes are randomly distributed on the mask 2.
In a preferred embodiment of the invention, the distribution density of the micro light through holes on the mask plate 2 satisfies a void ratio of 0.4-0.6, and the micro light through holes are not overlapped with each other.
In the embodiment, the micro light through holes are relatively densely distributed, but are not overlapped with each other, so that the number of light spots in a single inquiry window in the cross-correlation calculation is ensured to be more than 20, and the displacement data obtained by the cross-correlation calculation can reach the sub-pixel precision.
In a preferred embodiment of the invention, the imaging target 1 is a CCD sensor or a CMOS sensor.
As shown in fig. 4, another preferred embodiment of the present invention further provides a large-field-of-view wavefront measuring method, based on the large-field-of-view wavefront measuring apparatus, including the steps of:
s1, a pair of dot patterns obtained with/without optical distortion field 3, respectively;
s2, respectively setting M and N inquiry windows with the same size in the x direction and the y direction in the inquiry area of the dot matrix map pair to obtain an M multiplied by N inquiry window array;
s3, performing cross-correlation calculation processing to obtain light ray offset (delta x, delta y) caused by optical distortion corresponding to the position of the corresponding inquiry window;
s4, calculating the light deflection angle corresponding to the x direction and the y direction by combining the light deflection (delta x, delta y) and the distance L between the mask plate 2 and the imaging target surface 1:
s5, according to the Huygens principle, obtaining that the wave front propagation direction is always along the normal direction of the local wave front curved surface:
and S6, performing wavefront reconstruction by using the wavefront propagation direction obtained in the formula (2) through an integration method, obtaining a corresponding optical path OPL result, and completing wavefront measurement.
The large-field wavefront measurement is realized by utilizing the imaging characteristic of a common convergent lens under the condition of low cost, the mask plate 2 with the miniature light through holes with set density is designed during measurement, the dependence of the traditional wavefront test on collimated light is broken through by combining a cross-correlation calculation method, the large-field wavefront measurement can be realized according to the different field angles of the adopted common lens, no additional large-size concave mirror or lens is needed, and the manufacturing cost is low.
It should be noted that, in this embodiment, the displacement data obtained in step S3 is not a displacement result of a single optical spot, but a common characteristic quantity of displacement structures of a large number of optical spots in the inquiry window, and although a large number of optical spots are included in the inquiry window, a relatively high spatial resolution can still be obtained because the size of the inquiry window used is very small.
In the preferred embodiment of the invention, when the interrogation window is set, the number of the light spots in a single interrogation window is more than 20, thereby ensuring that the displacement data obtained by the cross-correlation calculation can reach the sub-pixel precision.
In the preferred embodiment of the present invention, the integration method includes Southwell integration algorithm, gradient integration algorithm, and the negative sign in equation (2) is mainly determined by the optical path arrangement and can be explained by using the pinhole imaging principle. Here, we will describe the basic process of obtaining the optical path OPL by using the Southwell method as an example.
Fig. 5 shows an integral grid diagram of the Southwell integration algorithm, where h is the grid spacing in the x direction and l is the grid spacing in the y direction.
In the x direction, the OPL of two adjacent points has the following relationship:
in the y direction, OPLs of two adjacent points have the following relationship:
using equations (3) and (4), we can construct correlations between OPL at any point (i, j) and its surrounding four points ((i, j-1), (i, j +1), (i-1, j), (i +1, j)). Obtaining OPL (i, j) by integrating equations (3) and (4) and performing weighted average processing on the obtained four values:
in the equation (5), ω represents the weight of each point, and considering the specificity of the boundary, the weight of an existing point is 1, and the weight of an nonexistent point is 0, so as to reasonably represent the information of each point. In the calculation process, after the whole area is calculated according to the formula (5), the next iteration is carried out. Here, the number of iterations required may be determined according to the relative difference between two adjacent steps, and of course, a threshold condition may be set artificially according to a relevant condition until a satisfactory calculation result is obtained. In general, the Southwell integration algorithm has low sensitivity to the initial condition, and even if the given initial condition is far from the real condition, a relatively good calculation result can be obtained as long as the iteration times are enough. If the initial condition is closer to the actual condition, a better result can be obtained through fewer iterations. Here we set the initial value to zero and the reliability of this setting was verified against the wavefront reconstruction results for a standard plano-convex lens.
There is also provided in a preferred embodiment of the present invention, as shown in fig. 6, an electronic device comprising a memory, a processor and a computer program stored on the memory and executable on the processor, the processor implementing the large field of view wavefront measurement method when executing the program.
In particular, in a preferred embodiment of the present invention, there is also provided a storage medium including a stored program, which when executed controls an apparatus in which the storage medium is located to perform the large-field wavefront measurement method.
It should be noted that the steps illustrated in the flowcharts of the figures may be performed in a computer system such as a set of computer-executable instructions and that, although a logical order is illustrated in the flowcharts, in some cases, the steps illustrated or described may be performed in an order different than presented herein.
The functions of the method of the present embodiment, if implemented in the form of software functional units and sold or used as independent products, may be stored in one or more storage media readable by a computing device. Based on such understanding, part of the contribution of the embodiments of the present invention to the prior art or part of the technical solution may be embodied in the form of a software product stored in a storage medium and including instructions for causing a computing device (which may be a personal computer, a server, a mobile computing device, a network device, or the like) to execute all or part of the steps of the method described in the embodiments of the present invention. And the aforementioned storage medium includes: a U-disk, a removable hard disk, a Read-Only Memory (ROM), a Random Access Memory (RAM), a magnetic disk or an optical disk, and other various media capable of storing program codes.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (5)
1. A large-view-field wavefront measurement method is based on a large-view-field wavefront measurement device, the large-view-field wavefront measurement device comprises an image sensor provided with an imaging target surface (1), a mask plate (2) is arranged in front of the imaging target surface (1), a plurality of micro light through holes are uniformly formed in the mask plate (2) according to preset distribution density, and the diameter d of each micro light through hole>10 lambda, and the distance L between the diameter d and the mask plate (2) and the imaging target surface (1) satisfies the relation:
and L > 25 λ, λ being the wavelength of the light, comprising the steps of:
obtaining a pair of dot patterns with/without an optical distortion field, respectively;
respectively setting M and N inquiry windows with the same size in the x direction and the y direction in the inquiry areas of the pair of dot matrix maps to obtain an M multiplied by N inquiry window array;
performing cross-correlation calculation processing to obtain light ray offset (delta x, delta y) caused by optical distortion corresponding to the position of the corresponding inquiry window;
and calculating the light deflection angle corresponding to the x direction and the y direction by combining the light deflection (delta x, delta y) and the distance L between the mask plate (2) and the imaging target surface (1):
according to the huygens principle, the wavefront propagation direction is always obtained along the normal direction of the local wavefront surface:
and (3) performing wavefront reconstruction by using the wavefront propagation direction obtained in the formula (2) through an integration method, obtaining a corresponding optical path OPL result, and completing wavefront measurement.
2. The large field of view wavefront measuring method of claim 1, wherein:
when the interrogation window is set, the number of light spots in a single interrogation window is more than 20.
3. The large field of view wavefront measuring method of claim 1, wherein:
the integration method comprises a Southwell integration algorithm and a gradient integration algorithm.
4. An electronic device comprising a memory, a processor, and a computer program stored on the memory and executable on the processor, wherein the processor when executing the program implements the large field of view wavefront measurement method of any of claims 1-2.
5. A storage medium comprising a stored program, characterized in that the program, when executed, controls an apparatus in which the storage medium is located to perform a large-field wavefront measurement method according to any one of claims 1 to 3.
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101726366A (en) * | 2009-12-02 | 2010-06-09 | 山东师范大学 | Wavefront measurement method and device based on multiple-pinhole plate |
| CN102735348A (en) * | 2012-06-15 | 2012-10-17 | 中国科学院光电技术研究所 | Wavefront measuring method based on Hartmann wavefront sensor |
| CN104913843A (en) * | 2015-05-22 | 2015-09-16 | 中国科学院光电研究院 | Device and method for measuring micropore diffraction wavefront quality |
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| JP5988643B2 (en) * | 2012-03-26 | 2016-09-07 | キヤノン株式会社 | Measuring device, measuring method, and optical component manufacturing method |
| JP2015055544A (en) * | 2013-09-11 | 2015-03-23 | キヤノン株式会社 | Wavefront measurement instrument, wavefront measurement method, method of manufacturing optical element, and assembly adjustment device of optical system |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101726366A (en) * | 2009-12-02 | 2010-06-09 | 山东师范大学 | Wavefront measurement method and device based on multiple-pinhole plate |
| CN102735348A (en) * | 2012-06-15 | 2012-10-17 | 中国科学院光电技术研究所 | Wavefront measuring method based on Hartmann wavefront sensor |
| CN104913843A (en) * | 2015-05-22 | 2015-09-16 | 中国科学院光电研究院 | Device and method for measuring micropore diffraction wavefront quality |
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