CN112410699A - Method for optimizing grain size and uniformity of tantalum plate - Google Patents
Method for optimizing grain size and uniformity of tantalum plate Download PDFInfo
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Abstract
The invention discloses a method for optimizing the grain size and uniformity of a tantalum plate, which comprises the following steps: step one, flattening a tantalum ingot with a circular cross section by using a quick forging machine at room temperature to obtain a tantalum blank with a rectangular cross section; step two, sawing to obtain a tantalum blank with a square cross section; step three, forging and rounding after heat preservation to obtain a bar blank with a round section; step four, carrying out primary annealing treatment to obtain an annealed bar blank; step five, extruding after heat preservation to obtain a plate blank with a rectangular cross section; step six, carrying out secondary annealing treatment to obtain an annealed plate blank; step seven, rolling to obtain a plate; and step eight, annealing for the third time to obtain a finished product of the tantalum plate. The method can realize the preparation of the tantalum plate with the medium thickness of 5 mm-20 mm, the grain size is better than 6.5 grade, the maximum size of the grains is less than or equal to 38 mu m, the grain size of the plate in the thickness direction is uniform, and the grain size grade difference between the surface layer and the core part is within 0.5 grade.
Description
Technical Field
The invention belongs to the technical field of material processing, and particularly relates to a method for optimizing the grain size and uniformity of a tantalum plate.
Background
The metal tantalum has high melting point, low vapor pressure, low evaporation rate at high temperature, low ductile-brittle transition temperature (DBTT) and special dielectric property, and can be widely used for preparing sputtering target materials of integrated circuits; in addition, tantalum also has the characteristics of high density, certain tensile strength and good ductility, has higher penetration compared with copper, and is one of ideal materials of the liner. As the size and the uniformity of the crystal grains directly influence the performance of the sputtered film and the use performance of the shaped charge liner, the smaller the size of the crystal grains, the higher the deposition rate and the better uniformity of the sputtered film, and the higher the armor piercing power of the shaped charge liner, the sputtering target and the tantalum plate for the shaped charge liner put high requirements on the internal microstructure of the plate.
Nowadays, the plate with the thickness of less than 5mm, which is prepared by utilizing the process of multiple forging and rolling, has the characteristic of basically uniform structure grains, and the grains are finer as the thickness of the plate is smaller. However, in the prior art, when a plate with a thickness of more than 5mm is prepared, the fineness and uniformity of the crystal grain size in the thickness direction cannot be ensured, so that the finished plate has the crystal grain size of more than 50 μm and the grain size difference in the thickness direction of more than 2 grades, and the requirements of rapid development of integrated circuits and heavy striking of shaped charge liners cannot be met.
The above phenomena of the medium plate are caused by three reasons: firstly, because the crystal grains of the tantalum ingot casting are thick and uneven, especially the original crystal grains of the tantalum ingot casting smelted by the electron beam are thick, the edge of the ingot casting is slightly small isometric crystal with the size of about 10-50 mm, the center of the ingot casting is thick columnar crystal with the maximum size of 100 mm; secondly, due to the poor forging permeability of the tantalum, even if the tantalum is subjected to multiple upsetting forging, the plastic deformation is always unevenly distributed from the surface to the center; thirdly, the total processing rate of the rolling of the medium plate is low, and a plate with fine and uniform grains is difficult to obtain.
Disclosure of Invention
The present invention is directed to a method for optimizing the grain size and uniformity of tantalum plate, which overcomes the above-mentioned shortcomings of the prior art. The method realizes the preparation of the tantalum plate with the medium thickness of 5-20 mm by the processes of flattening, equally sawing, forging to form a circle, rectangular extruding and rolling the tantalum cast ingot, the grain size is superior to 6.5 grade, the maximum size of the grains is less than or equal to 38 mu m, the grain size in the thickness direction of the plate is uniform, and the grain size grade difference between the surface layer and the core part is within 0.5 grade.
In order to solve the technical problems, the invention adopts the technical scheme that: a method for optimizing the grain size and uniformity of tantalum sheet material, comprising the steps of:
step one, flattening a tantalum ingot with a circular cross section to obtain a tantalum blank with a rectangular cross section;
step two, sawing the tantalum blank with the rectangular cross section in the step one to obtain the tantalum blank with the square cross section;
step three, forging and rounding the tantalum blank with the square cross section in the step two after heat preservation to obtain a bar blank with a round cross section; the heat preservation is to preserve the heat for 90min to 180min at the temperature of 400 ℃ to 500 ℃;
step four, carrying out primary annealing treatment on the bar blank obtained in the step three to obtain an annealed bar blank;
fifthly, extruding the annealed bar blank after heat preservation to obtain a plate blank with a rectangular cross section; the heat preservation is carried out for 60min to 150min at the temperature of 400 ℃ to 600 ℃;
sixthly, carrying out secondary annealing treatment on the plate blank with the rectangular cross section obtained in the fifth step to obtain an annealed plate blank;
step seven, rolling the annealed plate blank to obtain a plate;
and step eight, carrying out third annealing treatment on the plate obtained in the step seven to obtain a finished product tantalum plate.
The method for optimizing the grain size and uniformity of the tantalum plate is characterized in that in the step one, the length-width ratio of the rectangle is 2: 1; the tantalum cast ingot is a tantalum cast ingot which is subjected to electron beam melting at least twice; the circular diameter of the cross section of the tantalum ingot is 220-380 mm; the flattening was performed at a forging ratio of 1.0.
The method for optimizing the grain size and uniformity of the tantalum plate is characterized in that the forging ratio of the forging gauge circle in the third step is 1.5-2.0.
The method for optimizing the grain size and uniformity of the tantalum plate is characterized in that the temperature of the first annealing treatment in the fourth step is 1100-1200 ℃, and the time is 120-180 min.
The method for optimizing the grain size and uniformity of the tantalum plate is characterized in that in the fifth step, the extrusion speed is 60-150 mm/s, and the extrusion ratio is 2.5-5.0.
The method for optimizing the grain size and uniformity of the tantalum plate is characterized in that the temperature of the second annealing treatment in the sixth step is 1000-1100 ℃, and the time is 90-150 min.
The method for optimizing the grain size and uniformity of the tantalum plate is characterized in that the rolling in the seventh step is multi-pass rolling, the processing rate of each pass is 20-40%, and the total processing rate is 70-90%.
The method for optimizing the grain size and uniformity of the tantalum plate is characterized in that the temperature of the third annealing treatment in the step eight is 900-1000 ℃, and the time is 60-90 min.
Compared with the prior art, the invention has the following advantages:
1. the method for optimizing the grain size and uniformity of the tantalum plate comprises the processes of flattening, equally sawing, forging to form a circle, rectangular extruding and rolling the tantalum cast ingot, can realize the preparation of the tantalum plate with the medium thickness of 5-20 mm, has the grain size of better than 6.5 grade, the maximum size of the grains of less than or equal to 38 mu m, and has uniform grain size in the thickness direction of the plate, and the grain size grade difference between the surface layer and the core part is within 0.5 grade.
2. The method for optimizing the grain size and uniformity of the tantalum plate comprises the steps of flattening a circular tantalum ingot with a cross section to obtain a rectangular tantalum blank with a cross section, equally sawing the rectangular tantalum blank with the cross section into a square tantalum blank with the cross section, and equally sawing to expose a hard-to-deform central area of the rectangular tantalum blank with the cross section to the near surface, so that coarse grains are preferentially deformed in the subsequent processing process, the crushing degree of the grains is improved, the defect of insufficient crushing of the grains is avoided, and the tissue uniformity of the whole blank is improved.
3. The method for optimizing the grain size and uniformity of the tantalum plate comprises the steps of forging a square tantalum blank with a cross section to obtain a bar blank, performing rectangular extrusion on the bar blank to obtain a rectangular plate blank with the cross section, and obtaining more severe plastic deformation and shearing deformation of the internal structure of metal of the bar blank after the round bar blank is forged under the action of three-way stress of the rectangular extrusion, so that the difference of the structures in the thickness direction can be effectively reduced, and the subsequent direct rolling is facilitated.
4. The method for optimizing the grain size and uniformity of the tantalum plate comprises the step of directly performing rectangular extrusion on a bar blank, and an intermediate link of forging the bar blank is not needed, so that the forging cost can be effectively saved.
5. The method for optimizing the grain size and uniformity of the tantalum plate comprises the steps of carrying out multi-pass rolling and heat treatment on the plate blank, wherein the processing rate of each pass is 20-40%, the total processing rate is 70-90%, the rolling permeability of the plate in the thickness direction is better after the rolling with large single-pass processing rate and high total processing rate, the tissue deformation penetrates from the surface of the plate to the central layer, and the grain size is fine and uniform.
The technical solution of the present invention is further described in detail with reference to the accompanying drawings and embodiments.
Drawings
FIG. 1 is a schematic view of the process of the optimization method of the present invention.
FIG. 2 is a metallographic microscopic picture of a surface structure of a longitudinal section of a finished tantalum plate with a thickness of 5.0mm according to example 1;
FIG. 3 is a metallographic microscopic picture of a core structure of a longitudinal section of a finished tantalum plate of example 1 having a thickness of 5.0 mm;
FIG. 4 is a metallographic microscopic picture of a surface structure of a longitudinal section of a finished tantalum plate with a thickness of 8.0mm according to example 2;
FIG. 5 is a metallographic micrograph of a core structure of a longitudinal section of a finished tantalum plate of example 2 having a thickness of 8.0 mm;
FIG. 6 is a metallographic micrograph of a surface structure of a longitudinal section of a finished tantalum plate of 12.0mm in thickness according to example 3;
FIG. 7 is a metallographic micrograph of the core structure of the longitudinal section of a finished tantalum plate of example 3 having a thickness of 12.0 mm;
FIG. 8 is a metallographic micrograph of a surface structure of a longitudinal section of a finished tantalum plate of example 4 having a thickness of 16.0 mm;
FIG. 9 is a metallographic micrograph of the core structure of the longitudinal section of a finished tantalum plate of example 4 having a thickness of 16.0 mm;
FIG. 10 is a metallographic micrograph of a surface structure of a longitudinal section of a finished tantalum plate of example 5 having a thickness of 20.0 mm;
FIG. 11 is a metallographic micrograph of the core structure of a longitudinal section of a finished tantalum plate of example 5 having a thickness of 20.0 mm;
Detailed Description
The experimental methods in the following examples, which are not specified to specific conditions, were carried out according to the conventional methods and conditions.
Example 1
As shown in fig. 1, the method for optimizing the grain size and uniformity of tantalum plate of this embodiment comprises the following steps:
step one, flattening the electron beam melting tantalum ingot with a circular cross section and a circular diameter of 220mm by a rapid forging machine with a forging ratio of 1.0 under a room temperature environment to obtain a tantalum ingot with a size of 137 multiplied by 274 multiplied by L1A tantalum billet with a rectangular mm cross section; the length of the rectangle is 274mm, and the width of the rectangle is 137 mm; the tantalum cast ingot is a tantalum cast ingot which is subjected to electron beam melting at least twice, and the length-diameter ratio of the tantalum cast ingot is more than or equal to 1.2; the forging ratio was 1.0, i.e., the cross-sectional area of the tantalum billet having a rectangular cross-sectional shape and the cross-sectional area of the tantalum billet having a circular cross-sectional shape were constant before and after forgingThe cross-sectional areas of the tantalum ingots are equal; the room temperature is 20-25 ℃;
step two, sawing the tantalum blank with the rectangular cross section in the step one to obtain two tantalum blanks with the size of 137 multiplied by L1The mm cross section of the tantalum blank is square; the sawing is divided equally into two long sides which are divided equally along the axial direction of the tantalum blank with the rectangular cross section and are divided equally by a sawing surface;
step three, selecting one tantalum blank with the square cross section in the step two, preserving the heat of the selected tantalum blank with the square cross section for 90min at 400 ℃, discharging the tantalum blank out of the furnace, and forging the tantalum blank with the forging ratio of 1.5 to obtain a circle with the size of phi 126mm multiplied by L2A bar blank having a circular cross-sectional shape;
step four, carrying out primary vacuum annealing treatment on the bar blank obtained in the step three at the temperature of 1100 ℃ for 120min to obtain an annealed bar blank;
step five, preserving the temperature of the rod blank annealed in the step four for 60min at 400 ℃, and extruding the rod blank at the extrusion ratio of 2.5 and the extrusion speed of 120-150 mm/s to obtain the rod blank with the size of 50 multiplied by 100 multiplied by L3A plate blank with a rectangular mm cross section;
step six, preserving the heat of the plate blank with the rectangular cross section in the step five at 1000 ℃ for 90min for secondary vacuum annealing treatment to obtain an annealed plate blank;
step seven, rolling the annealed plate blank in the step six to obtain a plate with the thickness of 5.0 mm; the rolling is multi-pass rolling, the processing rate of each pass is 20-30%, and the total processing rate is 90%;
and step eight, carrying out third annealing treatment on the plate obtained in the step seven at the temperature of 900 ℃ for 60min to obtain a finished product of the tantalum plate.
In this embodiment, the grain sizes of the surface layer and the core of the finished tantalum plate are both 8.5 grades, as shown in fig. 2 and 3, the grain size difference in the thickness direction of the finished tantalum plate is 0, and the grain size is 18.9 μm.
Example 2
As shown in fig. 1, the method for optimizing the grain size and uniformity of tantalum plate of this embodiment comprises the following steps:
step one, flattening the electron beam melting tantalum ingot with the circular cross section and the circular diameter of 240mm by a fast forging machine with the forging ratio of 1.0 under the room temperature environment to obtain the tantalum ingot with the size of 150 multiplied by 300 multiplied by L1A tantalum billet with a rectangular mm cross section; the length of the rectangle is 300mm, and the width of the rectangle is 150 mm; the tantalum cast ingot is a tantalum cast ingot which is subjected to electron beam melting at least twice, and the length-diameter ratio of the tantalum cast ingot is more than or equal to 1.2; the forging ratio is 1.0, the sectional area before and after forging is unchanged, namely the sectional area of the tantalum blank with the rectangular sectional shape is equal to the sectional area of the tantalum ingot with the circular sectional shape; the room temperature is 20-25 ℃;
step two, sawing the tantalum blank with the rectangular cross section to obtain two tantalum blanks with the size of 150 multiplied by L1The mm cross section of the tantalum blank is square; the sawing is divided equally into two long sides which are divided equally along the axial direction of the tantalum blank with the rectangular cross section and are divided equally by a sawing surface;
step three, selecting one tantalum blank with the square cross section in the step two, preserving the heat of the selected tantalum blank with the square cross section at 400 ℃ for 120min, discharging the tantalum blank out of the furnace, and forging the tantalum blank with the forging ratio of 2.0 to obtain a circle with the size of phi 120mm multiplied by L2A bar blank having a circular cross-sectional shape;
step four, carrying out primary vacuum annealing treatment on the bar blank obtained in the step three at 1150 ℃ for 120min to obtain an annealed bar blank;
step five, preserving the temperature of the rod blank annealed in the step four for 90min at 400 ℃, and extruding the rod blank at the extrusion ratio of 2.8 and the extrusion speed of 110 mm/s-150 mm/s to obtain the rod blank with the size of 40 multiplied by 100 multiplied by L3A plate blank with a rectangular mm cross section;
step six, preserving the heat of the plate blank with the rectangular cross section in the step five at 1050 ℃ for 90min to carry out secondary vacuum annealing treatment to obtain an annealed plate blank;
step seven, rolling the annealed plate blank in the step six to obtain a plate with the thickness of 8.0 mm; the rolling is multi-pass rolling, the processing rate of each pass is 20-30%, and the total processing rate is 80%;
and step eight, carrying out third annealing treatment on the plate obtained in the step seven at the temperature of 900 ℃ for 60min to obtain a finished product of the tantalum plate.
In this embodiment, the grain sizes of the surface layer and the core of the finished tantalum plate are both 8.0 grades, as shown in fig. 4 and 5, the grain size difference in the thickness direction of the finished tantalum plate is 0, and the grain size is 22.5 μm.
Example 3
As shown in fig. 1, the method for optimizing the grain size and uniformity of tantalum plate of this embodiment comprises the following steps:
step one, flattening the electron beam melting tantalum ingot with the circular cross section and the circular diameter of 280mm by a fast forging machine with the forging ratio of 1.0 under the room temperature environment to obtain the tantalum ingot with the size of 175 x 350 x L1A tantalum billet with a rectangular mm cross section; the length of the rectangle is 350mm, and the width of the rectangle is 175 mm; the tantalum cast ingot is a tantalum cast ingot which is subjected to electron beam melting at least twice, and the length-diameter ratio of the tantalum cast ingot is more than or equal to 1.2; the forging ratio is 1.0, the sectional area before and after forging is unchanged, namely the sectional area of the tantalum blank with the rectangular sectional shape is equal to the sectional area of the tantalum ingot with the circular sectional shape; the room temperature is 20-25 ℃;
step two, sawing the tantalum blank with the rectangular cross section to obtain two tantalum blanks with the dimensions of 175 x L1The mm cross section of the tantalum blank is square; the sawing is divided equally into two long sides which are divided equally along the axial direction of the tantalum blank with the rectangular cross section and are divided equally by a sawing surface;
step three, selecting one tantalum blank with the square cross section in the step two, preserving the heat of the selected tantalum blank with the square cross section at 450 ℃ for 150min, discharging the tantalum blank out of the furnace, and forging the tantalum blank with the forging ratio of 1.7 to obtain the tantalum blank with the size of phi 150mm multiplied by L2A bar blank having a circular cross-sectional shape;
step four, carrying out primary vacuum annealing treatment on the bar blank obtained in the step three at 1150 ℃ for 150min to obtain an annealed bar blank;
step (ii) ofFifthly, preserving the temperature of the rod blank annealed in the step four for 120min at 500 ℃, and extruding the rod blank at the extrusion ratio of 3.5 and the extrusion speed of 90-130 mm/s to obtain the rod blank with the dimension of 50 multiplied by 100 multiplied by L3A plate blank with a rectangular mm cross section;
step six, preserving the heat of the plate blank with the rectangular cross section in the step five at 1050 ℃ for 120min to carry out secondary vacuum annealing treatment to obtain an annealed plate blank;
step seven, rolling the annealed plate blank in the step six to obtain a plate with the thickness of 12.0 mm; the rolling is multi-pass rolling, the processing rate of each pass is 25-35%, and the total processing rate is 76%;
and step eight, carrying out third annealing treatment on the plate obtained in the step seven at 950 ℃ for 70min to obtain a finished product of the tantalum plate.
In this embodiment, the grain sizes of the surface layer and the core of the finished tantalum plate are both 7.5 grades, as shown in fig. 6 and 7, the grain size difference in the thickness direction of the finished tantalum plate is 0, and the grain size is 26.7 μm.
Example 4
As shown in fig. 1, the method for optimizing the grain size and uniformity of tantalum plate of this embodiment comprises the following steps:
step one, flattening the electron beam melting tantalum ingot with the circular cross section and the circular diameter of 320mm by a rapid forging machine with the forging ratio of 1.0 under the room temperature environment to obtain the tantalum ingot with the size of 200 multiplied by 400 multiplied by L1A tantalum billet with a rectangular mm cross section; the length of the rectangle is 400mm, and the width of the rectangle is 200 mm; the tantalum cast ingot is a tantalum cast ingot which is subjected to electron beam melting at least twice, and the length-diameter ratio of the tantalum cast ingot is more than or equal to 1.2; the forging ratio is 1.0, the sectional area before and after forging is unchanged, namely the sectional area of the tantalum blank with the rectangular sectional shape is equal to the sectional area of the tantalum ingot with the circular sectional shape; the room temperature is 20-25 ℃;
step two, sawing the tantalum blank with the rectangular cross section to obtain two tantalum blanks with the sizes of 200 multiplied by L1The mm cross section of the tantalum blank is square; the sawing is divided into equal sawing which is a tantalum billet with a rectangular cross sectionThe material axial direction and the sawing surface vertically and equally divide two long edges of the rectangular section;
step three, selecting one tantalum blank with the square cross section in the step two, preserving the heat of the selected tantalum blank with the square cross section for 180min at 500 ℃, discharging the tantalum blank out of the furnace, and forging the tantalum blank with the forging ratio of 1.6 to obtain the tantalum blank with the size of phi 180mm multiplied by L2A bar blank having a circular cross-sectional shape;
step four, carrying out primary vacuum annealing treatment on the bar blank obtained in the step three at 1200 ℃ for 180min to obtain an annealed bar blank;
step five, preserving the temperature of the rod blank annealed in the step four for 150min at 600 ℃, and extruding the rod blank at an extrusion ratio of 4.2 and an extrusion speed of 60 mm/s-100 mm/s to obtain the rod blank with the size of 60 multiplied by 100 multiplied by L3A plate blank with a rectangular mm cross section;
step six, carrying out secondary vacuum annealing treatment on the plate blank with the rectangular cross section in the step five at 1100 ℃ for 150min to obtain an annealed plate blank;
step seven, rolling the annealed plate blank in the step six to obtain a plate with the thickness of 16.0 mm; the rolling is multi-pass rolling, the processing rate of each pass is 30-40%, and the total processing rate is 73%;
and step eight, carrying out third annealing treatment on the plate obtained in the step seven at the temperature of 1000 ℃ for 70min to obtain a finished product of the tantalum plate.
In this embodiment, the surface grain size of the finished tantalum plate is 7.0 grade, and the core grain size is 6.5 grade, as shown in fig. 8 and 9, the grain size difference in the thickness direction of the finished tantalum plate is 0.5 grade, and the grain size is 31.8 μm to 37.8 μm.
Example 5
As shown in fig. 1, the method for optimizing the grain size and uniformity of tantalum plate of this embodiment comprises the following steps:
step one, flattening the electron beam melting tantalum ingot with a circular cross section and a circular diameter of 380mm by a rapid forging machine with a forging ratio of 1.0 under a room temperature environment to obtain a material with the size of 238 multiplied by 476 multiplied by L1A tantalum billet with a rectangular mm cross section; the length of the rectangle is 476mm, and the width of the rectangle is 238 mm;the tantalum cast ingot is a tantalum cast ingot which is subjected to electron beam melting at least twice, and the length-diameter ratio of the tantalum cast ingot is more than or equal to 1.2; the forging ratio is 1.0, the sectional area before and after forging is unchanged, namely the sectional area of the tantalum blank with the rectangular sectional shape is equal to the sectional area of the tantalum ingot with the circular sectional shape; the room temperature is 20-25 ℃;
step two, sawing the tantalum blank with the rectangular cross section in the step one to obtain two tantalum blanks with the dimensions of 238 multiplied by L1The mm cross section of the tantalum blank is square; the sawing is divided equally into two long sides which are divided equally along the axial direction of the tantalum blank with the rectangular cross section and are divided equally by a sawing surface;
step three, selecting one tantalum blank with the square cross section in the step two, preserving the heat of the selected tantalum blank with the square cross section for 180min at 500 ℃, discharging the tantalum blank out of the furnace, and forging the tantalum blank with the forging ratio of 1.7 to obtain the tantalum blank with the size of phi 206mm multiplied by L2A bar blank having a circular cross-sectional shape;
step four, carrying out primary vacuum annealing treatment on the bar blank obtained in the step three at 1200 ℃ for 180min to obtain an annealed bar blank;
step five, preserving the temperature of the rod blank annealed in the step four for 150min at 600 ℃, and extruding the rod blank at an extrusion ratio of 5.0 and an extrusion speed of 60 mm/s-100 mm/s to obtain the rod blank with the size of 66 multiplied by 100 multiplied by L3A plate blank with a rectangular mm cross section;
step six, carrying out secondary vacuum annealing treatment on the plate blank with the rectangular cross section in the step five at 1100 ℃ for 150min to obtain an annealed plate blank;
step seven, rolling the annealed plate blank in the step six to obtain a plate with the thickness of 20.0 mm; the rolling is multi-pass rolling, the processing rate of each pass is 30-40%, and the total processing rate is 70%;
and step eight, carrying out third annealing treatment on the plate obtained in the step seven at the temperature of 1000 ℃ for 90min to obtain a finished product of the tantalum plate.
In this embodiment, the surface grain size of the finished tantalum plate is 7.0 grade, and the core grain size is 6.5 grade, as shown in fig. 10 and 11, the grain size difference in the thickness direction of the finished tantalum plate is 0.5 grade, and the grain size is 31.8 μm to 37.8 μm.
The above description is only a preferred embodiment of the present invention, and is not intended to limit the present invention, and all simple modifications, changes and equivalent structural changes made to the above embodiment according to the technical spirit of the present invention still fall within the protection scope of the technical solution of the present invention.
Claims (8)
1. A method for optimizing the grain size and uniformity of tantalum sheet material, comprising the steps of:
step one, flattening a tantalum ingot with a circular cross section to obtain a tantalum blank with a rectangular cross section;
step two, sawing the tantalum blank with the rectangular cross section in the step one to obtain the tantalum blank with the square cross section;
step three, forging and rounding the tantalum blank with the square cross section in the step two after heat preservation to obtain a bar blank with a round cross section; the heat preservation is to preserve the heat for 90min to 180min at the temperature of 400 ℃ to 500 ℃;
step four, carrying out primary annealing treatment on the bar blank obtained in the step three to obtain an annealed bar blank;
fifthly, extruding the annealed bar blank after heat preservation to obtain a plate blank with a rectangular cross section; the heat preservation is carried out for 60min to 150min at the temperature of 400 ℃ to 600 ℃;
sixthly, carrying out secondary annealing treatment on the plate blank with the rectangular cross section obtained in the fifth step to obtain an annealed plate blank;
step seven, rolling the annealed plate blank to obtain a plate;
and step eight, carrying out third annealing treatment on the plate obtained in the step seven to obtain a finished product tantalum plate.
2. The method of claim 1, wherein in step one said rectangular shape has an aspect ratio of 2: 1; the tantalum cast ingot is a tantalum cast ingot which is subjected to electron beam melting at least twice; the circular diameter of the cross section of the tantalum ingot is 220-380 mm; the flattening was performed at a forging ratio of 1.0.
3. The method for optimizing the grain size and uniformity of tantalum plates according to claim 1, wherein the forging ratio of the forging gauge circle in step three is 1.5-2.0.
4. The method for optimizing the grain size and uniformity of tantalum plates according to claim 1, wherein the temperature of the first annealing treatment in the fourth step is 1100-1200 ℃ and the time is 120-180 min.
5. The method for optimizing the grain size and uniformity of tantalum plate as claimed in claim 1, wherein the extrusion speed in step five is 60mm/s to 150mm/s and the extrusion ratio is 2.5 to 5.0.
6. The method for optimizing the grain size and uniformity of tantalum plate as claimed in claim 1, wherein the temperature of the second annealing treatment in step six is 1000-1100 ℃ for 90-150 min.
7. The method for optimizing the grain size and uniformity of tantalum plate as claimed in claim 1, wherein said rolling in step seven is multi-pass rolling, each pass having a reduction ratio of 20% to 40% and a total reduction ratio of 70% to 90%.
8. The method for optimizing the grain size and uniformity of tantalum plates according to claim 1, wherein the temperature of the third annealing treatment in step eight is 900-1000 ℃ and the time is 60-90 min.
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