CN1123655C - New structure multi-performance BaTiO3Superlattice materials - Google Patents

New structure multi-performance BaTiO3Superlattice materials Download PDF

Info

Publication number
CN1123655C
CN1123655C CN 99102863 CN99102863A CN1123655C CN 1123655 C CN1123655 C CN 1123655C CN 99102863 CN99102863 CN 99102863 CN 99102863 A CN99102863 A CN 99102863A CN 1123655 C CN1123655 C CN 1123655C
Authority
CN
China
Prior art keywords
batio
mgo
laalo
zro
crystal lattice
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 99102863
Other languages
Chinese (zh)
Other versions
CN1266912A (en
Inventor
吕惠宾
陈正豪
杨国桢
周岳亮
赵彤
陈凡
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institute of Physics of CAS
Original Assignee
Institute of Physics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institute of Physics of CAS filed Critical Institute of Physics of CAS
Priority to CN 99102863 priority Critical patent/CN1123655C/en
Publication of CN1266912A publication Critical patent/CN1266912A/en
Application granted granted Critical
Publication of CN1123655C publication Critical patent/CN1123655C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Physical Vapour Deposition (AREA)
  • Inorganic Insulating Materials (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

The present invention belongs to the field of film science. The present invention provides a composition made of BaTiO3And MgO, SrTiO3、LaAlO3、ZrO2、Al2O3Five materials are formed into a sandwich type and are periodically laminated by A, B two-layer structures or C, D, E three-layer structures, and the multi-functional BaTiO of a plurality of new structures with high dielectric constant, large nonlinear optical coefficient and good ferroelectric property3A superlattice material.

Description

A kind of many performances of new texture BaTiO 3Super crystal lattice material
Technical field
The invention belongs to the membrane science field, particularly a kind of many performances of new texture BaTiO 3Super crystal lattice material.
Background technology
The film of high-k is vital for the raising and the improvement of performances such as the exploration of new unit and microelectronic device, optical material with big nonlinear factor has important use aspect optics, have thin-film material well ferroelectric, thermoelectricity capability and also be widely used at aspects such as storer and detectors.As document: 1.M.Sayer and K.Screenivas, Science, Vol.247,1056 (1990); 2.Gene H.Haertling, J.Vac.Sci.Technol.A, 9 (3), 414 (1991).Hitoshi Tabato of Osaka, Japan university and Tomoji Kanwai utilize (Sr, Ca) TiO of pulse laser method preparation 3/ (Ba, Sr) TiO 3Artificial super crystal lattice material, specific inductivity reaches 900, as document 3, H.Tabata and T.Kawai, Appl.Phys.Lett.70 (3), 321 (1997).BaTiO with the laser molecular beam epitaxy preparation 3/ SrTiO 3Super crystal lattice material has big optical nonlinearity coefficient, as document 4, and pavilion Lin Zhen etc., Chinese science (A) 28,1107 (1998).People estimate that the ferroelectric superlattice material not only has the superinsulation characteristic, and may have super ferroelectric properties.
Summary of the invention
The objective of the invention is to: provide several from BaTiO 3Have high-k, big nonlinear optical coefficients, a good ferroelectric many performances BaTiO with five kinds of materials are formed different structures 3Super crystal lattice material.
Many performances BaTiO provided by the invention 3Super crystal lattice material is achieved in that and uses laser molecular beam epitaxy or pulsed laser deposition or magnetron sputtering film-forming method, BaTiO 3Material and MgO, SrTiO 3, LaAlO 3, ZrO 2, Al 2O 3Form with the periodically folded system of the film of different bed thickness Deng material, its structure mainly contains following two kinds:
One, the superlattice of two kinds of material preparations:
BaTiO by two kinds of material preparations 3Superstructure as shown in Figure 1, at first growth thickness is the A material film of m on monocrystal chip, and then growth thickness is that the B material of n is thin on the A material film, periodically growing and preparing becomes superlattice on demand.As A (or B) thin-film material is BaTiO 3, then B (or A) thin-film material is MgO or LaAlO 3Or ZrO 2Or Al 2O 3Wherein thickness m and n can equate, also can be unequal.
Two, the superlattice of three kinds of material preparations:
BaTiO by three kinds of material preparations 3Superstructure as shown in Figure 2, at first growth thickness is the C material film of i on monocrystal chip, growth thickness is the D material of j on the C material film then, and growth thickness is the E material film of k on the D material film, and periodically growing and preparing becomes superlattice on demand.As the C thin-film material is BaTiO 3, then D and E thin-film material are selected MgO, SrTiO for use 3, LaAlO 3, ZrO 2, Al 2O 3In two kinds of materials; If the D thin-film material is BaTiO 3, then C and E thin-film material are selected MgO, SrTiO for use 3, LaAlO 3, ZrO 2, Al 2O 3In two kinds of materials; If the E thin-film material is BaTiO 3, then C and D thin-film material are selected MgO, SrTiO for use 3, LaAlO 3, ZrO 2, Al 2O 3In two kinds of materials.Thickness i wherein, j, k can equate, also can be unequal.
Prepare above-mentioned two kinds of structure BaTiO 3Superlattice, its substrate can be MgO, BaTiO 3, SrTiO 3, LaAlO 3, ZrO 2, Al 2O 3Deng monocrystal chip, also can be adulterated above-mentioned monocrystal chip.BaTiO 3Also can be the BaTiO that mixes Ce and mix Rh 3The used various targets of preparation superlattice can be the monocrystalline targets, also can be the agglomerating polycrystal targets.The thick m of every tunic, n, I, the scope that j, k select from 4 to 1000 .The cycle number average of the folded system of two kinds of structures can be a number of cycles from 1-1000 cycle, also can be non-number of cycles.
With film-forming methods such as laser molecular beam epitaxy, pulsed laser deposition or magnetron sputterings, press above-mentioned two kinds of structures BaTiO 3With MgO, SrTiO 3, LaAlO 3, ZrO 2, Al 2O 3In the BaTiO of one or both laminations preparation in material sandwich style ground cycle 3Super crystal lattice material, since the effect of the aspects such as crystal lattice stress between layer and the layer, prepared BaTiO 3Super crystal lattice material has over-all propertieies such as high specific inductivity, big nonlinear optical coefficients and excellent ferroelectric.
The present invention will be further described below in conjunction with drawings and Examples.
Description of drawings
Fig. 1 is the superstructure figure of two kinds of material preparations of the present invention
Fig. 2 is the superstructure figure of three kinds of material preparations of the present invention
Embodiment
Embodiment 1:
Use the laser molecular beam epitaxy method, select BaTiO for use 3, MgO monocrystalline target and SrTiO 3Monocrystal chip prepares the BaTiO of double-layer structure shown in Figure 1 3(20 )/MgO (20 ) superlattice, material (A) is BaTiO 3, material B is MgO, BaTiO 3(A) Ceng thickness m=20 , the thickness n=20 of MgO (B) layer.
Embodiment 2:
Press embodiment 1 and make BaTiO 3Use the BaTiO that mixes Ce instead 3Target prepares the BaTiO that 25 cycles mix Ce 3(20 )/MgO (20 ) superlattice.
Embodiment 3:
Press embodiment 2 and make BaTiO 3(A) Ceng thickness m=50 , the thickness n=10 of MgO (B) layer prepares the BaTiO that 30.5 cycles mix Rh 3(50 )/MgO (10 ) superlattice.
Embodiment 4:
Press embodiment 1 and make, use LaAlO 3Target replaces the MgO target, preparation BaTiO 3(100 )/LaAlO 3(100 ) superlattice.
Embodiment 5:
Use the laser deposition film-forming method, use ZrO 2Substrate replaces SrTiO 3Substrate is pressed embodiment 2 and is made.
Embodiment 6:
Use agglomerating BaTiO 3Pressing embodiment 1 with the MgO polycrystal target makes.
Embodiment 7:
Use the magnetron sputtering film-forming method, press embodiment 2 and make.
Embodiment 8:
Use the laser molecular beam epitaxy method, select BaTiO for use 3, SrTiO 3, MgO monocrystalline target and SrTiO 3Substrate prepares the superlattice of three-decker shown in Figure 2.Material (C) is MgO, thickness i=50 ; Material (D) is SrTiO 3, thickness j=50 ; Material (E) is BaTiO 3, thickness k=50 .Be total to the BaTiIO in 15 cycles of extension 3(50 )/SrTiO 3The superlattice of (50 )/MgO (50 );
Embodiment 9:
Use LaAlO 3The monocrystalline target replaces MgO, presses embodiment 8 and makes the BaTiO in 20 cycles of preparation 3(50 )/SrTiO 3(50 )/LaAlO 3(50 ) superlattice.
Embodiment 10:
Use the pulsed laser deposition film-forming method, select ZrO for use 2, Al 2O 3With the BaTiO that mixes Ce 3The monocrystalline target prepares three-decker superlattice shown in Figure 2.Material (C) is ZrO 2, bed thickness i=100 ; Material (D) is BaTiO 3, bed thickness j=500 ; Material (E) is Al 2O 3, bed thickness k=200 , the ZrO in long 10 cycles of symbiosis 2(100 )/BaTiO 3(500 )/Al 2O 3The superlattice of (200 ).
Embodiment 11:
Use agglomerating BaTiO 3And SrTiO 3Polycrystal target replaces the monocrystalline target, presses embodiment 8 and makes.
Embodiment 12:
Press embodiment 8 and make, preparation material (C) MgO bed thickness i=12 , material (D) SrTiO 3Bed thickness j=4 , material (E) BaTiO 3The MgO in 200 cycles of bed thickness k=16 (12 )/SrTiO 3(4 )/BaTiO 3(16 ) superlattice.
Embodiment 13:
Press embodiment 2 and make, use LaAlO 3Target replaces the MgO target, prepares the BaTiO that 1 cycle mixes Ce 3(1000 )/LaAlO 3The superlattice of (1000 ).
Embodiment 14:
Press embodiment 8 and make, use ZrO 2Target replaces SrTiO 2Target is used Al 2O 3Target replaces the MgO target, the BaTiO in 1000 cycles of preparation 3(4 )/ZrO 2(8 )/Al 2O 3The superlattice of (12 ).

Claims (6)

1. BaTiO 3Super crystal lattice material is characterized in that:
This BaTiO 3Super crystal lattice material is to utilize laser molecular beam epitaxy, and the technology and the method for preparation such as pulsed laser deposition or magnetron sputtering film are BaTiO 3With a kind of MgO that is selected from, ZrO 2, LaAlO 3Or Al 2O 3The material sandwich style with A, B double-layer structure or BaTiO 3With two kinds be selected from MgO, SrTiO 3, ZrO 2, LaAlO 3Or Al 2O 3Forming of sandwich style with folded system of C, D, E three-decker cycle, wherein, the thickness m of A, B, C, D, E, n, i, j, the variation range of k be from 4 to 1000 , the cycle of superlattice lamination is from 1 to 1000.
2. by the described BaTiO of claim 1 3Super crystal lattice material is characterized in that, the lamination of different samples can replace in the super crystal lattice material: in double-layer structure, work as BaTiO 3When being materials A, MgO then, ZrO 2, LaAlO 3, Al 2O 3In any be material B; Work as BaTiO 3When being material B, any in then above-mentioned other 4 kinds of materials is materials A; For three-decker, work as BaTiO 3In different samples, be respectively material C, material D, or during material E, MgO then, ZrO 2, LaAlO 3, Al 2O 3In choose two kinds and be respectively material D, E or material C, E or material C, D.
3. by the described BaTiO of claim 1 3Super crystal lattice material is characterized in that, used target can be a monocrystal material, also can be polycrystalline material.
4. by the described BaTiO of claim 1 3Super crystal lattice material is characterized in that, used BaTiO 3, MgO, ZrO 2, LaAlO 3, Al 2O 3Material is adulterated.
5. by the described BaTiO of claim 1 3Super crystal lattice material is characterized in that, two-layer and three-decker superlattice, and its lamination can be a number of cycles, also can be non-number of cycles.
6. by the described BaTiO of claim 1 3Super crystal lattice material is characterized in that, used substrate is SrTiO 3, BaTiO 3, MgO, ZrO 2, LaAlO 3, Al 2O 3Monocrystal chip also can be adulterated above-mentioned six kinds of monocrystal chips.
CN 99102863 1999-03-10 1999-03-10 New structure multi-performance BaTiO3Superlattice materials Expired - Fee Related CN1123655C (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 99102863 CN1123655C (en) 1999-03-10 1999-03-10 New structure multi-performance BaTiO3Superlattice materials

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 99102863 CN1123655C (en) 1999-03-10 1999-03-10 New structure multi-performance BaTiO3Superlattice materials

Publications (2)

Publication Number Publication Date
CN1266912A CN1266912A (en) 2000-09-20
CN1123655C true CN1123655C (en) 2003-10-08

Family

ID=5271019

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 99102863 Expired - Fee Related CN1123655C (en) 1999-03-10 1999-03-10 New structure multi-performance BaTiO3Superlattice materials

Country Status (1)

Country Link
CN (1) CN1123655C (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100398690C (en) * 2005-03-08 2008-07-02 电子科技大学 Displacement ferroelectric super-lattice thin film material having stress-limiting layer and preparation method thereof
CN101210311B (en) * 2006-12-31 2010-06-16 中国科学院物理研究所 System for preparing composite film
CN102693837B (en) * 2011-03-23 2015-11-18 成都锐华光电技术有限责任公司 A kind of have electric capacity of cycle laminated iron conductive film and preparation method thereof
CN108531857B (en) * 2017-12-29 2020-01-07 西安电子科技大学 Method for regulating and controlling residual polarization and coercive field of barium titanate single crystal film by utilizing bending deformation
CN109825872B (en) * 2019-03-01 2020-09-25 宝鸡文理学院 One-dimensional high-performance BaTiO3/SrTiO3Controllable preparation method of nano composite mesoscopic crystal
CN110527952A (en) * 2019-07-26 2019-12-03 沈阳工业大学 A kind of barium titanate/nickel acid lanthanum ferroelectric superlattice material and preparation method thereof

Also Published As

Publication number Publication date
CN1266912A (en) 2000-09-20

Similar Documents

Publication Publication Date Title
Ramesh et al. Epitaxial growth of ferroelectric bismuth titanate thin films by pulsed laser deposition
Bu et al. Perovskite phase stabilization in epitaxial Pb (Mg1/3Nb2/3) O3–PbTiO3 films by deposition onto vicinal (001) SrTiO3 substrates
Nguyen et al. Relaxor-ferroelectric thin film heterostructure with large imprint for high energy-storage performance at low operating voltage
Ramesh et al. Ferroelectric bismuth titanate/superconductor (Y‐Ba‐Cu‐O) thin‐film heterostructures on silicon
Hwang et al. Effect of substrate material on the crystallinity and epitaxy of Pb (Zr, Ti) O3 thin films
CN1123655C (en) New structure multi-performance BaTiO3Superlattice materials
Aratani et al. Preparation of Pb (Zrx, Ti1-x) O3 Thin Films by Source Gas Pulse-Introduced Metalorganic Chemical Vapor Deposition
Wakiya et al. Nucleation and growth behavior of epitaxial Pb (Zr, Ti) O3/MgO (100) observed by atomic force microscopy
Lee et al. Dielectric properties of sol-gel derived PZT (40/60)/PZT (60/40) heterolayered thin films
Yokoyama et al. Preparation of orientation-controlled polycrystalline Pb (Zr, Ti) O3 thick films on (100) Si substrates by metalorganic chemical vapor deposition and their electrical properties
CN1741253A (en) Process for producing single-orientation ferroelectric thin film with double-axle texture MgO as buffer layer
Le Rhun et al. Fatigue properties of oriented PZT ferroelectric thin films
CN100485867C (en) Epitaxial growth of lanthanum aluminate film material on silicon substrate and preparation method
CN1453832A (en) Gas phase growth method of oxidative dielectric thin film
Vilquin et al. Compositionally graded Pb (Zr, Ti) O3 thin films with different crystallographic orientations
Wasa Thin films as material engineering
CN1258618C (en) Method of forming texture epitaxial film on metallic substrate
Chae et al. Initial Stage Nucleation and Growth of Epitaxial SrRuO 3 Thin Films on (0 0 1) SrTiO 3 Substrates
Kim et al. Proximity to a ferroelectric instability in Ba1− xCaxZrO3
Boikov et al. Epitaxial ferroelectric/superconductor heterostructures
CN1831184A (en) Displacement ferroelectric super-lattice thin film material having stress-limiting layer and preparation method thereof
Izuha et al. Electrical properties and microstructures of all-perovskite-oxide capacitors (SrRuO3/BaxSr1− xTiO3/SrRuO3)
Tang et al. Crystallographic Axis Transition of Sm1+ xBa2− x Cu3O7− δ Film Prepared by Liquid Phase Epitaxy (LPE)
Ansari et al. In-situ deposition of PZT thin films by RF magnetron sputtering
Takano et al. Annealing in a PbO atmosphere for high T c superconductivity of Bi‐Sr‐Ca‐Cu‐O films

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee