CN112299726A - Anti-dazzle glass polishing solution - Google Patents
Anti-dazzle glass polishing solution Download PDFInfo
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- CN112299726A CN112299726A CN201910711271.0A CN201910711271A CN112299726A CN 112299726 A CN112299726 A CN 112299726A CN 201910711271 A CN201910711271 A CN 201910711271A CN 112299726 A CN112299726 A CN 112299726A
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- polishing solution
- sulfuric acid
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- glass polishing
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
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- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Glass Compositions (AREA)
Abstract
An anti-glare glass polishing solution belongs to the technical field of glass polishing solutions. The chemical composition comprises the following components in percentage by mass: 10-14% of ammonium bifluoride, 3-6% of sulfuric acid, 4-6% of saccharin, 1-3% of trisodium phosphate, 7-9% of an accelerator and the balance of water. The technical effects are as follows: the raw materials used in the formula are few, so that the method is simple; all raw materials in the formula are easy to obtain and have relatively low price, so that the use requirements of anti-dazzle glass manufacturers can be met, and the economy is reflected.
Description
Technical Field
The invention belongs to the technical field of glass polishing solution, and particularly relates to anti-glare glass polishing solution.
Background
At present, in the preparation process of anti-glare glass, two main ways of polishing the glass after the previous cleaning procedure are adopted: one is physical polishing; the second is chemical etching, and the physical polishing usually uses fine sand to polish (referred to as "frosting polishing" in the industry), which has the advantages of low cost and environmental protection, but the uniformity of the particle size of the obtained glass surface is poor, and the range of the particle pit diameter is extremely poor above 45 μm. The chemical etching method is more important than the industry due to the aforementioned shortcomings of physical polishing, but if the formula of the polishing solution used in the aforementioned chemical etching is too complicated and the chemical raw materials are economically disadvantageous, the use thereof is affected to some extent, and the technical solution described below is generated in this context.
Disclosure of Invention
The invention aims to provide the anti-dazzle glass polishing solution which is simple in formula, easy in raw material obtaining and capable of reflecting good economical efficiency.
The task of the invention is completed in such a way that the anti-glare glass polishing solution comprises the following chemical components in percentage by mass: 10-14% of ammonium bifluoride, 3-6% of sulfuric acid, 4-6% of saccharin, 1-3% of trisodium phosphate, 7-9% of an accelerator and the balance of water.
The anti-glare glass polishing solution comprises the following chemical components in percentage by mass: ammonium bifluoride 14%, sulfuric acid 4%, saccharin 5%, trisodium phosphate 1% and promoter 9%, the balance being water.
The anti-glare glass polishing solution comprises the following chemical components in percentage by mass: 12.5 percent of ammonium bifluoride, 6 percent of sulfuric acid, 4.5 percent of saccharin, 3 percent of trisodium phosphate, 7.5 percent of accelerator and the balance of water.
The anti-glare glass polishing solution comprises the following chemical components in percentage by mass: 11% of ammonium bifluoride, 3% of sulfuric acid, 6% of saccharin, 2% of trisodium phosphate, 7% of an accelerator and the balance of water.
The anti-glare glass polishing solution comprises the following chemical components in percentage by mass: 10% of ammonium bifluoride, 5% of sulfuric acid, 4% of saccharin, 2.5% of trisodium phosphate, 8% of an accelerator and the balance of water.
In one embodiment of the present invention, the ammonium acid fluoride is ammonium acid fluoride prepared by a neutralization process.
In another specific embodiment of the present invention, the sulfuric acid is concentrated sulfuric acid.
In another specific embodiment of the present invention, the concentrated sulfuric acid has a concentration of 98% by mass.
The technical scheme provided by the invention has the technical effects that: the raw materials used in the formula are few, so that the method is simple; all raw materials in the formula are easy to obtain and have relatively low price, so that the use requirements of anti-dazzle glass manufacturers can be met, and the economy is reflected.
Detailed Description
Example 1:
the anti-glare glass polishing solution comprises the following chemical components in percentage by mass: 14% of ammonium bifluoride produced by a neutralization method, 4% of concentrated sulfuric acid with the mass percentage concentration of 98%, 5% of saccharin, 1% of trisodium phosphate, 9% of an accelerant and the balance of water. The accelerator described in this embodiment is preferably a GG-II promoter manufactured and sold by Ming photochemicals, Inc. of Suzhou city, Jiangsu province, China.
Example 2:
the anti-glare glass polishing solution comprises the following chemical components in percentage by mass: 12.5 percent of ammonium bifluoride produced by a neutralization method, 6 percent of concentrated sulfuric acid with the mass percentage concentration of 98 percent, 4.5 percent of saccharin, 3 percent of trisodium phosphate, 7.5 percent of accelerant and the balance of water. The accelerator described in this embodiment is preferably a GG-II promoter manufactured and sold by Ming photochemicals, Inc. of Suzhou city, Jiangsu province, China.
Example 3:
the anti-glare glass polishing solution comprises the following chemical components in percentage by mass: 11% of ammonium bifluoride produced by a neutralization method, 3% of concentrated sulfuric acid with the mass percentage concentration of 98%, 6% of saccharin, 2% of trisodium phosphate, 7% of an accelerant and the balance of water. The accelerator described in this embodiment is preferably a GG-II promoter manufactured and sold by Ming photochemicals, Inc. of Suzhou city, Jiangsu province, China.
Example 4:
the anti-glare glass polishing solution comprises the following chemical components in percentage by mass: 10% of ammonium bifluoride produced by a neutralization method, 5% of concentrated sulfuric acid with the mass percentage concentration of 98%, 4% of saccharin, 2.5% of trisodium phosphate, 8% of an accelerant and the balance of water. The accelerator described in this embodiment is preferably a GG-II promoter manufactured and sold by Ming photochemicals, Inc. of Suzhou city, Jiangsu province, China.
Claims (8)
1. The anti-glare glass polishing solution is characterized by comprising the following chemical components in percentage by mass: 10-14% of ammonium bifluoride, 3-6% of sulfuric acid, 4-6% of saccharin, 1-3% of trisodium phosphate, 7-9% of an accelerator and the balance of water.
2. The anti-glare glass polishing solution is characterized by comprising the following chemical components in percentage by mass: ammonium bifluoride 14%, sulfuric acid 4%, saccharin 5%, trisodium phosphate 1% and promoter 9%, the balance being water.
3. The anti-glare glass polishing solution is characterized by comprising the following chemical components in percentage by mass: 12.5 percent of ammonium bifluoride, 6 percent of sulfuric acid, 4.5 percent of saccharin, 3 percent of trisodium phosphate, 7.5 percent of accelerator and the balance of water.
4. The anti-glare glass polishing solution is characterized by comprising the following chemical components in percentage by mass: 11% of ammonium bifluoride, 3% of sulfuric acid, 6% of saccharin, 2% of trisodium phosphate, 7% of an accelerator and the balance of water.
5. The anti-glare glass polishing solution is characterized by comprising the following chemical components in percentage by mass: 10% of ammonium bifluoride, 5% of sulfuric acid, 4% of saccharin, 2.5% of trisodium phosphate, 8% of an accelerator and the balance of water.
6. The polishing solution for anti-glare glass according to any one of claims 1 to 5, wherein the ammonium bifluoride is ammonium bifluoride prepared by a neutralization method.
7. The polishing solution for anti-glare glass according to any one of claims 1 to 5, wherein the sulfuric acid is concentrated sulfuric acid.
8. The polishing solution for anti-glare glass according to claim 7, wherein the concentration of the concentrated sulfuric acid is 98% by mass.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910711271.0A CN112299726A (en) | 2019-08-02 | 2019-08-02 | Anti-dazzle glass polishing solution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910711271.0A CN112299726A (en) | 2019-08-02 | 2019-08-02 | Anti-dazzle glass polishing solution |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN112299726A true CN112299726A (en) | 2021-02-02 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910711271.0A Pending CN112299726A (en) | 2019-08-02 | 2019-08-02 | Anti-dazzle glass polishing solution |
Country Status (1)
| Country | Link |
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| CN (1) | CN112299726A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104860541A (en) * | 2015-05-12 | 2015-08-26 | 中国船舶重工集团公司第七一七研究所 | Polishing solution and polishing method |
| CN107365560A (en) * | 2017-08-04 | 2017-11-21 | 安徽宽居电器有限公司 | A kind of efficient polishing fluid of glass processing |
| CN107502894A (en) * | 2017-08-22 | 2017-12-22 | 无锡市恒利弘实业有限公司 | A kind of environment-friendly type brightening solution for stainless steel and preparation method thereof and glossing |
| CN108624237A (en) * | 2017-03-21 | 2018-10-09 | 上海铝通化学科技有限公司 | A kind of Chemical Millering Polishing liquid and abrasive polishing method |
-
2019
- 2019-08-02 CN CN201910711271.0A patent/CN112299726A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104860541A (en) * | 2015-05-12 | 2015-08-26 | 中国船舶重工集团公司第七一七研究所 | Polishing solution and polishing method |
| CN108624237A (en) * | 2017-03-21 | 2018-10-09 | 上海铝通化学科技有限公司 | A kind of Chemical Millering Polishing liquid and abrasive polishing method |
| CN107365560A (en) * | 2017-08-04 | 2017-11-21 | 安徽宽居电器有限公司 | A kind of efficient polishing fluid of glass processing |
| CN107502894A (en) * | 2017-08-22 | 2017-12-22 | 无锡市恒利弘实业有限公司 | A kind of environment-friendly type brightening solution for stainless steel and preparation method thereof and glossing |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20210202 |
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| RJ01 | Rejection of invention patent application after publication |