CN112222592A - Material increase manufacturing method for controlling metal droplet transition by pulse electron beam - Google Patents
Material increase manufacturing method for controlling metal droplet transition by pulse electron beam Download PDFInfo
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- CN112222592A CN112222592A CN202011021008.8A CN202011021008A CN112222592A CN 112222592 A CN112222592 A CN 112222592A CN 202011021008 A CN202011021008 A CN 202011021008A CN 112222592 A CN112222592 A CN 112222592A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K15/00—Electron-beam welding or cutting
- B23K15/0046—Welding
- B23K15/0086—Welding welding for purposes other than joining, e.g. built-up welding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K15/00—Electron-beam welding or cutting
- B23K15/06—Electron-beam welding or cutting within a vacuum chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
Abstract
The invention provides a material increase manufacturing method for controlling metal droplet transition by using a pulse electron beam, which particularly adopts an electron gun to output a base value beam and a peak value beam in a time-sharing way, avoids the technical difficulty of respectively outputting a pulse beam and a continuous transmission beam by adopting two electron guns, and greatly reduces the equipment cost; and in the time period of the base value beam current, a smaller base value beam current is adopted, the wire is heated and fed at a constant speed in an electron beam scanning mode, in the time period of the peak value beam current, a larger electron beam current is adopted to scan and heat the end part of the wire of the metal wire along the feeding direction of the wire and melt the end part of the wire, the scanning waveform of the electron beam is changed in the later period of the time period of the peak value beam current, the scanning of the electron beam is perpendicular to the feeding direction of the wire, the separation process of the metal droplet and the wire end is accelerated, and therefore the heat input in the process of the fuse.
Description
Technical Field
The invention relates to the technical field of electron beam additive manufacturing, in particular to a method for additive manufacturing by controlling metal droplet transition through a pulse electron beam.
Background
The electron beam fuse forming technology has the characteristics of high forming efficiency, good forming quality, obvious advantages in preparing large-scale complex metal structures and the like, and has a good application prospect. A great deal of research reports exist at home and abroad on the electron beam fuse additive manufacturing technology for commonly feeding wires on the hot cathode shaft side, and some titanium alloy parts developed by adopting the technology are installed and applied in the aerospace field.
In order to further improve the processing quality of the electron beam fuse forming parts and obtain excellent texture properties, two techniques capable of further improving the electron beam fuse forming quality have appeared in the prior art. Firstly, in patent 201811291854.4, a resistance heating system is used to preheat the wire material to be melted, so as to change the internal stress distribution of the material, thereby achieving the purpose of reducing the deformation of the substrate; second, patent 201610842124.3 discloses two electron beams, one of which is a main electron beam for melting the wire to form, and the other is a pulsed electron beam for striking the molten pool to refine the grains, so as to reduce coarse columnar grains, thereby obtaining a refined microstructure of grains and further improving the forming quality.
The two electron beam forming methods, no matter adopting an auxiliary heating system to preheat wires or adopting an electron beam fusing method of using a beam of fusing wire and a beam of impacting and refining grains, cannot eliminate excessive heat input of formed parts from the source and cannot greatly reduce deformation of the formed parts. Moreover, the two electron beams adopted in patent 201610842124.3 are generated by two electron guns, which respectively require independent accelerating power supply, filament heating power supply and bias power supply, so that not only is the cost of the apparatus increased, but also the complexity and difficulty of the apparatus control are increased.
Disclosure of Invention
The embodiment of the invention provides a material increase manufacturing method for controlling metal droplet transition by a pulse electron beam, which is used for further improving the forming quality of an electron beam fuse and meeting the requirement of high-quality manufacturing of large-scale complex metal components.
A material increase manufacturing method for controlling metal droplet transition by pulsed electron beam comprises the following steps:
step S100, starting a vacuum system, reaching a set vacuum degree, and setting relevant parameters through a control system, wherein the relevant parameters comprise wire specification, wire feeding speed Vs, base value beam current Ib, peak value beam current Ip, pulse beam current period T0 and pulse beam current duty ratio Db;
step S200, starting a high-voltage inverter power supply, and enabling the metal wire to be fed at a constant speed at a wire feeding speed Vs through a wire feeding system until the position of the wire end is contacted with a beam current with a preset value I0;
step S300, operating an electron beam by using a basic value beam current Ib, wherein the operating time is Tib, and simultaneously starting an electron beam deflection scanning system to preheat a metal wire fed at a constant speed Vs;
step S400, operating an electron beam by using a peak beam current Ip, wherein the operation time is Tip1, and simultaneously starting an electron beam deflection scanning system to melt a metal wire fed at a constant speed Vs so as to form a metal droplet at the wire end;
and S500, operating the electron beam by using the peak beam current Ip, wherein the operating time is Tip2, starting the electron beam deflection scanning system to electrify the Y-direction scanning coil, closing the X-direction scanning coil, and concentrating the scanning position of the electron beam at the contact position of the metal molten drop and the metal wire so as to ensure that the metal molten drop is separated from the metal wire and is transferred to the base material under the action of gravity and the impact force of the electron beam current Ip.
Further, the peak beam current Ip is determined according to the specification of the metal wire, the wire feeding speed Vs and an early process parameter test, wherein the base beam current Ib is (1/3-1/2) Ip, and the preset value I0 is 10 mA;
the operating time Tib of the base beam current Ib is T0 × (1-Db);
the operation time Tip of the peak beam current Ip is T0 xDb ═ Tip1+ Tip2, and Tip1 is more than or equal to Tip 2.
Furthermore, when the electron beam is operated by the base beam current Ib and the operation time is Tib,
the electron beam deflection scanning system enables X to apply sawtooth wave current to the scanning coil, the waveform period Txb is less than or equal to (L1/Vs) multiplied by 60%, wherein L1 is the distance between the wire end and the metal base material along the wire feeding speed direction, and the waveform amplitude Pxb is determined through early process parameter tests;
the electron beam deflection scanning system enables the Y to apply alternating sawtooth current to the scanning coil, the waveform period Tyb is less than or equal to 10ms, and the waveform amplitude Pyb is determined by the diameter of the 1/2 metal wire material deflected by the basic value beam current Ib.
Further, when the control system detects that the operation time Tib of the electron beam with the basic value beam current Ib is finished, the currents of an X-direction scanning coil and a Y-direction scanning coil in the electron beam deflection scanning system are both 0, and the time Ts is less than or equal to 1 ms.
Further, the waveform amplitude Pxb is used to deflect the base beam Ib in the direction of feeding the metal wire, and the maximum deflection angle a gives a deflection distance L2.
Further, the sum of the distance L2 and the distance L1 is less than the melting length of the molten metal wire at the peak beam current Ip running time Tip, and the melting length is T0 XVs.
Further, when the electron beam is operated at the peak beam current Ip and the operation time is Tip1,
the electron beam deflection scanning system enables X to apply sine wave current to the scanning coil, the waveform period Txp1 is 1 ms-10 ms, the waveform amplitude Pxp1 is used for enabling the peak beam current Ip to deflect along the direction of feeding the metal wire, and the maximum deflection distance is generated, and the maximum deflection distance is larger than 1/2(L2+ L1);
the electron beam deflection scanning system makes Y-direction scanning coil apply cosine wave current whose phase difference is 90 deg. with X-direction scanning coil, the waveform period Typ1 is identical with Txp1, and the waveform amplitude Pyp1 is less than or equal to 1/2Pxp 1.
Further, when the electron beam is operated at the peak beam current Ip and the operation time is Tip2,
the electron beam deflection scanning system makes the current waveform period Txp2 of the X-direction scanning coil 0 and the waveform amplitude Pxp2 0;
the electron beam deflection scanning system applies an alternating sawtooth current to the scanning coil Y, and has a waveform period Typ2 of 1ms to 100ms and a waveform amplitude Pyp2 for adjusting a deflection distance range of the peak beam current Ip to ± 5mm to ± 10 mm.
Further, when the electron beam is operated at the peak beam current Ip and the operation time is Tip2,
the electron beam deflection scanning system causes X to apply a sine wave current to the scanning coil, the waveform period Txp2 is equal to the waveform period Typ2, and the waveform amplitude Pxp2 < the waveform amplitude Pyp 2;
the electron beam deflection scanning system applies an alternating sawtooth current to the scanning coil Y, and has a waveform period Typ2 of 1ms to 100ms and a waveform amplitude Pyp2 for adjusting a deflection distance range of the peak beam current Ip to ± 5mm to ± 10 mm.
Further, the volume of the metal droplet is increased along with the increase of the quantity of the metal wire which is fed at a constant speed at the wire feeding speed Vs after the continuously input peak beam current Ip is melted.
In conclusion, the invention has the following advantages:
firstly, one electron gun is adopted to output a base value beam and a peak value beam in a time-sharing manner, so that the technical difficulty of respectively outputting a pulse beam and a continuous transmission beam by adopting two electron guns is avoided, and the equipment cost is greatly reduced;
secondly, in the time period of the base value beam current, a smaller base value beam current is adopted, the wire is heated and fed at a constant speed in an electron beam scanning mode, in the time period of the peak value beam current, a larger electron beam current is adopted to scan and heat the end part of the wire of the metal wire along the feeding direction of the wire and melt the end part of the wire, the scanning waveform of the electron beam is changed in the later period of the time period of the peak value beam current, the scanning of the electron beam is perpendicular to the feeding direction of the wire, the separation process of the metal droplet and the wire end is accelerated, and therefore the heat input in the process of the.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments of the present invention will be briefly described below, and it is obvious that the drawings described below are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without creative efforts.
Fig. 1 is a schematic diagram of hardware conditions for implementing an additive manufacturing method for controlling metal droplet transition by using a pulsed electron beam according to the present invention.
Fig. 2 is a flow chart of an additive manufacturing method for controlling metal droplet transition by using pulsed electron beam according to the present invention.
Fig. 3 is a flow chart of an additive manufacturing method for controlling metal droplet transition by using a pulsed electron beam according to the present invention.
Fig. 4(a) is a schematic diagram showing the change in the base beam current and the peak beam current with time in the present invention.
Fig. 4(b) is a current waveform diagram of the X-direction scanning coil in the present invention.
Fig. 4(c) is a current waveform diagram of the Y-direction scanning coil in the present invention.
FIG. 4(d) is a waveform diagram of the X-direction scanning coil and the Y-direction scanning coil in the present invention.
FIG. 4(e) is a schematic flow chart of the electron beam controlled droplet transfer molding according to the present invention.
In the figure: 1-a pulsed electron gun; 101-a filament; 102-a gate; 103-anode; 104-a focusing coil; 105-a scanning coil; a 1051-X direction scanning coil; 1052-Y direction scanning coils; 2-high voltage inverter power supply; 201-an acceleration power supply; 202-filament heating power supply; 203-gate power supply; 3-a wire feeding system; 301-a wire reel; 302-a guidewire nozzle; 4-metal wire; 5-a substrate; 6-a workbench movement mechanism; 7-pulsed electron beam; 8-an electron beam deflection scanning system; 9-a control system; 10-a vacuum pump group; 11-a vacuum system; 1101-vacuum duct; 1102-a vacuum valve; 12-vacuum chamber.
Detailed Description
The embodiments of the present invention will be described in further detail with reference to the drawings and examples. The following detailed description of the embodiments and the accompanying drawings are provided to illustrate the principles of the invention and are not intended to limit the scope of the invention, i.e., the invention is not limited to the embodiments described, but covers any modifications, alterations, and improvements in the parts, components, and connections without departing from the spirit of the invention.
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present application will be described in detail below with reference to the embodiments with reference to the attached drawings.
Referring to fig. 1, hardware conditions for implementing the additive manufacturing method for controlling metal droplet transition by using pulsed electron beam provided by the present invention include: the device comprises a pulse electron gun 1, a high-voltage inverter power supply 2, a scanning coil 105, a wire feeding system 3, a vacuum system 11, a workbench movement mechanism 6, a control system 9 and the like.
Specifically, the pulse electron gun 1 belongs to a hot cathode electron gun, beam current regulation is realized by controlling grid voltage, and the grid voltage is set to pulse voltage with adjustable amplitude, so that pulse beam current can be realized; an X-direction scanning coil 1051 and a Y-direction scanning coil 1052 are arranged in the horizontal direction of the vertical beam channel and are used for realizing the scanning of an electron beam 7;
the high-voltage inverter power supply 2 at least comprises an accelerating power supply 201, a filament heating power supply 202 and a grid power supply 203;
the electron beam deflection scanning system 8 is used for adjusting the current of the X-direction scanning coil 1051 and the current of the Y-direction scanning coil 1052 respectively, so as to realize the adjustment of a space magnetic field and realize the controllable deflection scanning of the electron beam 7;
the wire feeding system 3 realizes the loading and the controllable feeding of a wire disc 301 of a metal wire 4 in the electron beam fuse additive manufacturing process;
the vacuum system 11 comprises a vacuum chamber 12, a vacuum pump group 10, a vacuum pipeline 1101 and a valve 1102;
the workbench movement mechanism 6 is a necessary condition for performing electron beam fuse additive manufacturing.
Referring to fig. 2, the additive manufacturing method for controlling metal droplet transition by using pulsed electron beam provided by the present invention includes the following steps:
step S100, starting a vacuum system, reaching a set vacuum degree, and setting relevant parameters through a control system, wherein the relevant parameters comprise wire specification, wire feeding speed Vs, base value beam current Ib, peak value beam current Ip, pulse beam current period T0 and pulse beam current duty ratio Db;
step S200, starting a high-voltage inverter power supply, and enabling the metal wire to be fed at a constant speed at a wire feeding speed Vs through a wire feeding system until the position of the wire end is contacted with a beam current with a preset value I0;
step S300, operating an electron beam by using a basic value beam current Ib, wherein the operating time is Tib, and simultaneously starting an electron beam deflection scanning system to preheat a metal wire fed at a constant speed Vs;
step S400, operating an electron beam by using a peak beam current Ip, wherein the operation time is Tip1, and simultaneously starting an electron beam deflection scanning system to melt a metal wire fed at a constant speed Vs so as to form a metal droplet at the wire end;
and S500, operating the electron beam by using the peak beam current Ip, wherein the operating time is Tip2, starting the electron beam deflection scanning system to electrify the Y-direction scanning coil, closing the X-direction scanning coil, and concentrating the scanning position of the electron beam at the contact position of the metal molten drop and the metal wire so as to ensure that the metal molten drop is separated from the metal wire and is transferred to the base material under the action of gravity and the impact force of the electron beam current Ip.
It should be noted that, the invention adopts one electron gun to output the base beam and the peak beam in a time-sharing manner, thereby avoiding the technical difficulty of adopting two electron guns to output the pulse beam and the continuous beam respectively and greatly reducing the equipment cost; and in the time period of the base value beam current, a smaller base value beam current is adopted, the wire is heated and fed at a constant speed in an electron beam scanning mode, in the time period of the peak value beam current, a larger electron beam current is adopted to scan and heat the end part of the wire of the metal wire along the feeding direction of the wire and melt the end part of the wire, the scanning waveform of the electron beam is changed in the later period of the time period of the peak value beam current, the scanning of the electron beam is perpendicular to the feeding direction of the wire, the separation process of the metal droplet and the wire end is accelerated, and therefore the heat input in the process of.
The following is a detailed description of specific examples:
referring to fig. 3, fig. 4(a) to fig. 4(e), the method for manufacturing an additive material by using a pulsed electron beam to control metal droplet transition according to the present invention includes the following steps:
step one, equipment inspection and forming preparation: checking the state of the equipment, and mounting a base material 5 on a workbench movement mechanism 6;
step two, starting a vacuum system: closing a gate of the vacuum chamber 12, starting the vacuum system 11 and reaching a set vacuum degree;
step three, setting pulse beam current and scanning parameters: when the vacuum degrees of the vacuum chamber 12 and the pulse electron gun 1 reach the design requirements, the specification of the metal wire 4, the wire feeding speed Vs, the base value beam current Ib, the peak value beam current Ip, the pulse beam current period T0 and the pulse beam current duty ratio Db are set on a human-computer interaction interface of the control system 9;
in the step, the peak beam current Ip is determined by an early process parameter test according to the specification of the metal wire 4 and the wire feeding speed Vs, the base beam current Ib is (1/3-1/2) Ip, and the preset value I0 is 10 mA;
the operating time Tib of the base beam current Ib is T0 × (1-Db);
the running time Tip of the peak beam current Ip is T0 xDb ═ Tip1+ Tip2, and Tip1 is more than or equal to Tip 2;
further, the control system 9 calculates the period Txb and the amplitude Pxb of the current waveform applied to the scanning coil 1051 by X and the period Tyb and the amplitude Pyb of the current waveform applied to the scanning coil 1052 by Y at the running time Tib of the base beam current Ib;
meanwhile, the control system 9 calculates a current waveform period Txp1 and an amplitude Pxp1 applied to the scanning coil 1051 by X and a current waveform period Typ1 and an amplitude Pyp1 applied to the scanning coil 1052 by Y at the running time Tip1 of the peak beam current Ip;
further, the control system 9 calculates a current waveform period Txp2 and an amplitude Pxp2 applied to the scanning coil 1051 at X of the peak beam current Ip running time Tip2, and a current waveform period Typ2 and an amplitude Pyp2 applied to the scanning coil 1052 at Y;
step four, starting the high-voltage inverter: starting the high-voltage inverter power supply 2 to enable the output voltage of the accelerating power supply 201 to reach a set value and enable the output of the filament heating power supply 202 to reach the set value;
step five, centering and adjusting the tows: adjusting the output voltage of the grid power supply 203 to enable the beam output to reach a preset value I0, starting the wire feeding system 3 according to a set wire feeding speed Vs, enabling the metal wire 4 to be fed at a constant speed according to Vs until the wire end position is contacted with the beam 7, stopping feeding the wire, and closing the beam 7;
step six, preheating the metal wire by the base beam: the control system 9 sets a base value beam current Ib, a pulse beam current period T0 and a pulse beam current duty ratio Db according to the second step, so that the grid power supply 203 in the high-voltage inverter power supply 2 outputs a corresponding voltage value Ub at the running time Tib of the base value beam current Ib, and meanwhile, the wire feeding system 3 feeds the metal wire 4 at a constant speed according to Vs; meanwhile, the electron beam deflection scanning system 8 is started to apply sawtooth waves with positive amplitude to the scanning coil 1051 for X and alternating sawtooth waves with equal amplitude to the scanning coil 1052 for Y, and the waveform period Txb and the amplitude Pxb of current applied to the scanning coil 1051 for X, and the waveform period Tyb and the amplitude Pyb of current applied to the scanning coil 1052 for Y are set according to the calculation result of the control system 9 in the second step;
it should be clear that, in this step, the electron beam deflection scanning system 8 makes X apply sawtooth current to the scanning coil 1051, and the waveform period Txb is less than or equal to (L1/Vs) × 60%, where L1 is the distance from the wire end to the metal substrate 4 along the wire feeding speed direction, and the waveform amplitude Pxb is determined by the early process parameter test;
the electron beam deflection scanning system 8 enables the Y to apply alternating sawtooth current to the scanning coil 1052, the waveform period Tyb is less than or equal to 10ms, the waveform amplitude Pyb is determined by the diameter of the metal wire 4 deflected by the base value beam current Ib 1/2, the waveform amplitude Pxb is used for deflecting the base value beam current Ib along the direction of feeding the metal wire, and the deflection distance L2 is generated by the maximum deflection angle a.
Further, the sum of the distance L2 and the distance L1 is less than the melting length of the molten metal wire at the peak beam current Ip running time Tip, and the melting length is T0 XVs.
It should be further noted that in this step, when the control system 9 detects that the operation time Tib of the base value beam Ib is over, the electron beam deflection scanning system 8 makes the currents of the X-direction scanning coil 1051 and the Y-direction scanning coil 1052 both 0;
and the time period Ts when the currents of the X-direction scanning coil 1051 and the Y-direction scanning coil 1052 are both 0 is less than or equal to 1 ms.
Step seven, setting the scanning waveform of the melting wire material: the control system 9 sets the peak beam Ip, the pulse beam period T0 and the pulse beam duty ratio Db according to the third step, so that the pulse electron gun 1 outputs the corresponding beam value Ip at the operation time Tip1 of the peak beam Ip; meanwhile, an electron beam deflection scanning system 8 is started to apply sine waves to the scanning coil 1051 for X, wherein the current waveform period is Txp1 and the amplitude is Pxp1, cosine waves with a phase difference of 90 degrees are applied to the scanning coil 1052 for Y, the current waveform period is Typ1 and the amplitude is Pyp 1;
in this step, when the electron beam is operated at the peak beam current Ip and the operation time is Tip1,
the electron beam deflection scanning system 8 causes the X to apply sine wave current to the scanning coil 1051, the waveform period Txp1 is 1 ms-10 ms, the waveform amplitude Pxp1 is used for deflecting the peak beam current Ip along the direction of feeding the metal wire material, and the maximum deflection distance is generated, and the maximum deflection distance is larger than 1/2(L2+ L1);
the electron beam deflection scanning system 8 makes the Y-direction scanning coil 1052 apply the cosine wave current with the phase difference of 90 degrees with the X-direction scanning coil 1051, the waveform period Typ1 is consistent with Txp1, and the waveform amplitude Pyp1 is equal to or less than 1/2Pxp 1.
Step eight, scanning and melting the growth process of partial metal at the wire end and the molten drop at the wire end by the peak beam: in the operation time Tip1 of the peak beam current Ip, the peak electron beam current Ip melts the metal wire 4 fed at the speed of Vs, a metal droplet is formed at the wire end, the volume of the metal droplet is increased along with the quantity of the continuously input peak electron beam current Ip which is greatly melted and fed into the metal wire 4 at the speed of Vs, the metal droplet at the end part of the wire is rapidly increased, and the metal wire 4 moves to drive the metal droplet at the wire end to move towards the base material 5;
step nine, separating the molten drop from the filament end and transferring the molten drop to a base material: when the control system 9 detects that the peak beam running time Tip1 is over, in the peak beam running time Tip2, the electron beam deflection scanning system 8 sets the current of the X-direction scanning coil to be 0, applies alternating current sawtooth waves to the Y-direction scanning coil 1502, the current waveform period of the alternating current sawtooth waves is Typ2, the amplitude of the alternating current sawtooth waves is Pyp2, the scanning position of the electron beam 7 is concentrated at the contact position of the metal molten drop and the metal wire 4, the metal molten drop is separated from the metal wire 4, and the metal molten drop is transferred to the base material 5 under the action of gravity and the impact force of the electron beam Ip;
it should be clear that, in this step, when the electron beam is operated with the peak beam current Ip and the operation time is Tip2, the electron beam deflection scanning system 8 makes X apply a sine wave current to the scanning coil 1051, the waveform period Txp2 may be 0, and the amplitude Pxp2 may be 0; or the waveform with the period Txp2 being Typ2 and the amplitude Pxp2 being less than Pyp 2;
the electron beam deflection scanning system 8 applies an alternating sawtooth current to the scanning coil 1052 by Y, the waveform period Typ2 is 1ms to 100ms, and the waveform amplitude Pyp2 is used for the deflection distance range of the peak beam current Ip to be ± 5mm to ± 10mm, and can be determined by an early process parameter test.
Step ten, detecting whether the silk carrying quantity is sufficient: the control system 9 detects whether the wire loading amount of the wire feeding system 3 is sufficient;
step eleven, detecting whether the current layer is formed or not: when the control system 9 detects that the operation time Tip2 of the peak beam Ip is finished, the control system 9 detects whether the current layer is formed according to the scanning path;
step twelve, adjusting the forming position: when the fuse forming of the current layer is not finished and the wire loading amount of the wire feeding system 3 is enough, the control system 9 controls the movement of the worktable movement mechanism 6 to move the fuse deposition position on the substrate 5 to the next deposition point, and then the six-twelve steps are repeated;
step thirteen, whether the fuse forming part is prepared or not is detected: when the control system 9 detects that the current layer is formed according to the scanning path, the beam output of the pulse electron gun 1 is closed, the wire feeding system 3 stops feeding wires, and the control system 9 detects whether the fuse forming part is accumulated according to the requirement;
fourteen, preparing the next layer of fuse forming: when the control system 9 detects that the current layer is formed according to the scanning path and the fuse forming part is not prepared, the control system 9 moves the workbench motion mechanism 6 or the pulse electron gun 1 to the starting point position of the next layer of the scanning path, and then the five-step to the fourteen-step are repeated;
step fifteen, reloading the filaments: when the control system 9 detects that the filament loading amount of the filament feeding system 3 is small and is not enough to complete the fuse deposition task of the current layer, the high-voltage inverter power supply 2 is turned off, the output voltage of the accelerating power supply 201 is set to be zero, and the outputs of the filament heating power supply 202 and the grid power supply 203 are set to be zero; simultaneously closing the wire feeding system 3; the vacuum system 11 is maintained 10 according to the process requirements-2After the vacuum degree is over Pa for a period of time, deflating the vacuum chamber 12, opening the gate of the vacuum chamber 12, replacing a new wire disc 301 with sufficient wire for the wire feeding system 3, and repeating the second step to the fifteenth step;
sixthly, taking out the parts after the fuse forming parts are prepared: after the fuse forming parts are stacked as required, the high-voltage inverter power supply 2 is turned off, the output voltage of the accelerating power supply 201 is set to be zero, and the outputs of the filament heating power supply 202 and the grid power supply 203 are set to be zero; simultaneously closing the wire feeding system 3; the vacuum system 11 is maintained 10 according to the process requirements-2And after the vacuum degree is over Pa for a period of time, the vacuum chamber 12 is deflated, the large door of the vacuum chamber 12 is opened, and the part is taken out, namely the additive manufacturing process of controlling metal droplet transition by the pulse electron beam is realized.
It should be clear that the embodiments in this specification are described in a progressive manner, and the same or similar parts in the embodiments are referred to each other, and each embodiment focuses on the differences from the other embodiments. For embodiments of the method, reference is made to the description of the apparatus embodiments in part. The present invention is not limited to the specific steps and structures described above and shown in the drawings. Also, a detailed description of known process techniques is omitted herein for the sake of brevity.
The above description is only an example of the present application and is not limited to the present application. Various modifications and alterations to this application will become apparent to those skilled in the art without departing from the scope of this invention. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application should be included in the scope of the claims of the present application.
Claims (10)
1. A material increase manufacturing method for controlling metal droplet transition by pulse electron beams is characterized by comprising the following steps:
step S100, starting a vacuum system, reaching a set vacuum degree, and setting relevant parameters through a control system, wherein the relevant parameters comprise wire specification, wire feeding speed Vs, base value beam current Ib, peak value beam current Ip, pulse beam current period T0 and pulse beam current duty ratio Db;
step S200, starting a high-voltage inverter power supply, and enabling the metal wire to be fed at a constant speed at a wire feeding speed Vs through a wire feeding system until the position of the wire end is contacted with a beam current with a preset value I0;
step S300, operating an electron beam by using a basic value beam current Ib, wherein the operating time is Tib, and simultaneously starting an electron beam deflection scanning system to preheat a metal wire fed at a constant speed Vs;
step S400, operating an electron beam by using a peak beam current Ip, wherein the operation time is Tip1, and simultaneously starting an electron beam deflection scanning system to melt a metal wire fed at a constant speed Vs so as to form a metal droplet at the wire end;
and S500, operating the electron beam by using the peak beam current Ip, wherein the operating time is Tip2, starting the electron beam deflection scanning system to electrify the Y-direction scanning coil, closing the X-direction scanning coil, and concentrating the scanning position of the electron beam at the contact position of the metal molten drop and the metal wire so as to ensure that the metal molten drop is separated from the metal wire and is transferred to the base material under the action of gravity and the impact force of the electron beam current Ip.
2. The additive manufacturing method for controlling metal droplet transition by using pulsed electron beam as claimed in claim 1, wherein the peak beam current Ip is determined according to the specification of the metal wire, the wire feeding speed Vs and early process parameter tests, the base beam current Ib is (1/3-1/2) Ip, and the preset value I0 is 10 mA;
the operating time Tib of the base beam current Ib is T0 × (1-Db);
the operation time Tip of the peak beam current Ip is T0 xDb ═ Tip1+ Tip2, and Tip1 is more than or equal to Tip 2.
3. The method of claim 2, wherein when the electron beam is operated at the base beam current Ib and the operation time is Tib,
the electron beam deflection scanning system enables X to apply sawtooth wave current to the scanning coil, the waveform period Txb is less than or equal to (L1/Vs) multiplied by 60%, wherein L1 is the distance between the wire end and the metal base material along the wire feeding speed direction, and the waveform amplitude Pxb is determined through early process parameter tests;
the electron beam deflection scanning system enables the Y to apply alternating sawtooth current to the scanning coil, the waveform period Tyb is less than or equal to 10ms, and the waveform amplitude Pyb is determined by the diameter of the 1/2 metal wire material deflected by the basic value beam current Ib.
4. The method according to claim 3, wherein when the control system detects that the operation time Tib of the electron beam with the fundamental beam current Ib is over, the currents of the X-direction scanning coil and the Y-direction scanning coil in the electron beam deflection scanning system are both 0, and the time Ts is less than or equal to 1 ms.
5. The method according to claim 3, wherein the waveform amplitude Pxb is used for deflecting the base beam current Ib in the direction of feeding the metal wire, and the maximum deflection angle a is used for generating the deflection distance L2.
6. The method of claim 4, wherein the sum of the distance L2 and the distance L1 is less than the melting length of the molten metal wire at the peak beam current Ip in the operating time Tip of the peak beam current Ip, the melting length being T0 x Vs.
7. The method for additive manufacturing of metal droplet transition controlled by pulsed electron beam according to claim 5, wherein when the electron beam is operated at peak beam current Ip and the operation time is Tip1,
the electron beam deflection scanning system enables X to apply sine wave current to the scanning coil, the waveform period Txp1 is 1 ms-10 ms, the waveform amplitude Pxp1 is used for enabling the peak beam current Ip to deflect along the direction of feeding the metal wire, and the maximum deflection distance is generated, and the maximum deflection distance is larger than 1/2(L2+ L1);
the Y-direction scanning coil in the electron beam deflection scanning system applies cosine wave current with 90 degrees phase difference with the X-direction scanning coil, the waveform period Typ1 is consistent with Txp1, and the waveform amplitude Pyp1 is not more than 1/2Pxp 1.
8. The method of claim 2, wherein when the electron beam is operated at a peak beam current Ip and a time of operation is Tip2,
the electron beam deflection scanning system makes the current waveform period Txp2 of the X-direction scanning coil 0 and the waveform amplitude Pxp2 0;
the electron beam deflection scanning system applies an alternating sawtooth current to the scanning coil Y, and has a waveform period Typ2 of 1ms to 100ms and a waveform amplitude Pyp2 for adjusting a deflection distance range of the peak beam current Ip to ± 5mm to ± 10 mm.
9. The method of claim 2, wherein when the electron beam is operated at a peak beam current Ip and a time of operation is Tip2,
the electron beam deflection scanning system causes X to apply a sine wave current to the scanning coil, the waveform period Txp2 is equal to the waveform period Typ2, and the waveform amplitude Pxp2 < the waveform amplitude Pyp 2;
the electron beam deflection scanning system applies an alternating sawtooth current to the scanning coil Y, and has a waveform period Typ2 of 1ms to 100ms and a waveform amplitude Pyp2 for adjusting a deflection distance range of the peak beam current Ip to ± 5mm to ± 10 mm.
10. A pulsed electron beam controlled metal droplet transfer additive manufacturing method according to any one of claims 1 to 9, wherein the volume of the metal droplet increases as the number of the continuously fed metal wire is fed at a constant velocity at a wire feed speed Vs while melting the continuously fed peak beam current Ip.
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