CN112147090A - Biochemical analyzer and method for judging substrate exhaustion in biochemical reaction - Google Patents
Biochemical analyzer and method for judging substrate exhaustion in biochemical reaction Download PDFInfo
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- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
Abstract
A biochemical analyzer and a method for judging substrate exhaustion in biochemical reaction are provided, which obtains the reaction data of a sample; correcting at least the change of the substrate exhaustion threshold value caused by reagent interference to obtain a corrected substrate exhaustion threshold value; and judging whether the substrate exhaustion occurs in the reaction of the sample according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
Description
Technical Field
The invention relates to a biochemical analyzer and a method for judging substrate exhaustion in biochemical reaction.
Background
In biochemical reactions such as kinetic detection, when the enzyme content in a sample is too high, the substrate of the enzyme in the reaction is consumed in a short time, namely, the substrate is exhausted, and the test result is inaccurate. In order to detect this, manufacturers have provided corresponding protocols to identify and determine whether substrate depletion has occurred in a biochemical reaction.
For the identification and judgment of substrate depletion, the current protocols mainly have the following.
The first scheme is as follows: and comparing the absorbance difference of the photometric point in the reaction time with a threshold value to judge whether the substrate is exhausted.
Scheme II: and (3) correcting the absorbance change caused by sample interference by using the absorbance of the main wavelength, and comparing the absorbance with a threshold value to judge whether the substrate is exhausted.
The scheme is a traditional algorithm scheme, but misjudgment or missed judgment of substrate exhaustion often occurs in real situations, and the algorithm scheme is basically not adopted at present. When the technical staff improves the first scheme, the inaccuracy of the first scheme is realized and is caused by sample interference, so a second scheme is proposed, and the second scheme becomes a mainstream algorithm scheme for judging whether substrate depletion occurs in biochemical reaction.
However, when a sample is tested by using a biochemical analyzer, the above two schemes still have the problem that the judgment is missed or misjudged under some conditions.
Disclosure of Invention
In view of the above, the present application provides a biochemical analyzer and a method for determining the occurrence of substrate depletion in a biochemical reaction.
According to a first aspect, there is provided in one embodiment a biochemical analyzer comprising:
a sample part for carrying a sample;
the sample dispensing mechanism is used for sucking a sample and discharging the sample into a reaction cup to be added with the sample;
a reagent component for carrying a reagent;
the reagent dispensing mechanism is used for sucking the reagent and discharging the reagent into a reaction cup to be added with the reagent;
the reaction component is provided with at least one placing position, and the placing position is used for placing the reaction cup and incubating the reaction liquid in the reaction cup;
the blending mechanism is used for blending the reaction liquid to be blended in the reaction cup;
the light measurement component is used for performing light measurement on the incubated reaction liquid to obtain reaction data of the sample; wherein:
the processor is used for controlling the sample dispensing mechanism to suck the sample from the sample component and controlling the reagent dispensing mechanism to suck the reagent from the reagent component so as to add the reagent and the sample into the reaction cup; the processor controls the mixing mechanism to uniformly mix the reaction liquid formed by the sample and the reagent in the reaction cup, controls the reaction component to incubate the reaction liquid in the reaction cup, and controls the light measurement component to perform light measurement on the incubated reaction liquid to obtain the reaction data of the sample; the processor is used for correcting the change of the substrate exhaustion threshold value caused by reagent interference and sample interference to obtain a corrected substrate exhaustion threshold value, and judging whether the reaction of the sample is exhausted according to the reaction data of the sample and the corrected substrate exhaustion threshold value: if the reaction of the sample is the reaction of the rising method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value; and if the reaction of the sample is the reaction of the descent method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value.
In one embodiment, the processor corrects the change of the substrate exhaustion threshold value caused by reagent interference according to the absorbance of the reaction time endpoint in the reaction data of the reagent blank; and correcting the change of the substrate exhaustion threshold value caused by the sample interference according to the absorbance of the first photometric point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
In one embodiment, when the reaction of the sample is a reaction of an ascending method, the processor obtains a corrected substrate exhaustion threshold by adding the absorbance at the end of the reaction time in the reagent blank reaction data, a value obtained by multiplying a difference between the absorbance of the sample at the end of the reaction time and the absorbance of the first photometric point after the sample is added in the reagent blank reaction data by a liquid volume correction coefficient, and a substrate exhaustion conversion threshold;
when the reaction of the sample is the reaction of a descent method, the processor adds the absorbance of the reaction time endpoint in the reagent blank reaction data, a value obtained by multiplying the difference between the absorbance of the first light measuring point after the sample is added in the sample reaction data and the reagent blank reaction data by a liquid volume correction coefficient, and subtracts a substrate depletion transformation threshold value to obtain a corrected substrate depletion threshold value.
According to a second aspect, an embodiment provides a biochemical analyzer comprising:
a sample part for carrying a sample;
the sample dispensing mechanism is used for sucking a sample and discharging the sample into a reaction cup to be added with the sample;
a reagent component for carrying a reagent;
the reagent dispensing mechanism is used for sucking the reagent and discharging the reagent into a reaction cup to be added with the reagent;
the reaction component is provided with at least one placing position, and the placing position is used for placing the reaction cup and incubating the reaction liquid in the reaction cup;
the blending mechanism is used for blending the reaction liquid to be blended in the reaction cup;
the light measurement component is used for performing light measurement on the incubated reaction liquid to obtain reaction data of the sample;
a processor for obtaining reaction data of the sample; correcting at least the change of the substrate exhaustion threshold value caused by reagent interference to obtain a corrected substrate exhaustion threshold value; and judging whether the substrate exhaustion occurs in the reaction of the sample according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
In one embodiment, the processor obtains absorbance at the end of the reaction time in the reaction data of the reagent blank, and corrects the change of the substrate depletion threshold value caused by the reagent interference according to the absorbance.
In one embodiment, when the reaction of the sample is an ascending reaction, the processor adds the absorbance to a substrate depletion transfer threshold to correct for a change in the substrate depletion threshold due to reagent interference;
when the reaction of the sample is a reaction of a descent method, the processor subtracts a substrate depletion shift threshold from the absorbance to correct for a change in the substrate depletion threshold due to reagent interference.
In one embodiment, the processor obtains the reaction data of the reagent blank, and corrects the change of the substrate depletion threshold value caused by the sample interference according to the absorbance of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank.
In one embodiment, the processor corrects the change of the substrate depletion threshold value caused by the sample interference according to a value obtained by multiplying a difference between the absorbance of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient.
In one embodiment, when the reaction of the sample is a reaction of an ascending method, the processor obtains a corrected substrate exhaustion threshold by adding the absorbance at the end of the reaction time in the reagent blank reaction data, a value obtained by multiplying a difference between the absorbance of the same photometric point after the sample is added in the sample reaction data and the reagent blank reaction data by a liquid volume correction coefficient, and a substrate exhaustion conversion threshold; when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value, judging that the substrate exhaustion occurs in the reaction of the sample;
when the reaction of the sample is the reaction of a descent method, the processor adds the absorbance of the reaction time endpoint in the blank reaction data of the reagent, the value obtained by multiplying the difference value of the absorbance of the same light measuring point after the sample is added in the reaction data of the sample and the blank reaction data of the reagent by a liquid volume correction coefficient, and subtracts a substrate depletion transformation threshold value to obtain a corrected substrate depletion threshold value; and when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value, judging that the substrate exhaustion occurs in the reaction of the sample.
According to a third aspect, there is provided in one embodiment a method for determining substrate depletion in a biochemical reaction, comprising:
acquiring reaction data of a sample;
correcting at least the change of the substrate exhaustion threshold value caused by reagent interference to obtain a corrected substrate exhaustion threshold value;
and judging whether the substrate exhaustion of the reaction of the sample occurs according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
In one embodiment, the correcting at least the change in the substrate depletion threshold due to reagent interference comprises:
acquiring reaction data of reagent blanks;
and correcting the change of the substrate exhaustion threshold value caused by reagent interference according to the reaction data of the reagent blank.
In one embodiment, the absorbance at the end of the reaction time in the reaction data of the reagent blank is obtained, and the change of the substrate depletion threshold value caused by the reagent interference is corrected according to the absorbance.
In one embodiment, modifying the change in the substrate depletion threshold due to reagent interference based on the absorbance comprises:
when the reaction of the sample is a reaction of an ascending method, adding the absorbance to a substrate depletion conversion threshold value to correct the change of the substrate depletion threshold value caused by reagent interference;
when the reaction of the sample is a reaction of a descent method, the substrate depletion transition threshold is subtracted from the absorbance to correct a change in the substrate depletion threshold due to reagent interference.
In one embodiment, when the reaction of the sample is a reaction of an ascending method, adding the absorbance to a substrate depletion conversion threshold to obtain a corrected substrate depletion threshold;
and when the reaction of the sample is the reaction of a descent method, subtracting the substrate exhaustion transformation threshold value from the absorbance to obtain a corrected substrate exhaustion transformation threshold value.
In one embodiment, the correcting at least the change in the substrate depletion threshold due to reagent interference comprises: changes in the substrate depletion threshold due to sample disturbances are also corrected.
In one embodiment, correcting for changes in the substrate depletion threshold due to sample disturbances comprises:
acquiring reaction data of reagent blanks;
and correcting the change of the substrate exhaustion threshold value caused by the sample interference according to the absorbance of the same light measuring point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
In one embodiment, the same light measuring point is the first light measuring point.
In one embodiment, the correcting the change of the substrate depletion threshold due to the sample interference according to the absorbance of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank includes: and correcting the change of the substrate exhaustion threshold value caused by the sample interference according to the value obtained by multiplying the difference value of the absorbance of the same light measuring point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient.
In one embodiment, the correcting at least the change in the substrate depletion threshold due to reagent interference comprises:
when the reaction of the sample is the reaction of an ascending method, adding the absorbance of the reaction time end point in the reaction data of the reagent blank, a value obtained by multiplying the difference value of the absorbance of the same photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient, and a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value;
and when the reaction of the sample is the reaction of a descent method, adding the absorbance at the end point of the reaction time in the reaction data of the reagent blank, adding a value obtained by multiplying the difference value of the absorbance of the same photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient, and subtracting a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value.
In one embodiment, the determining method further includes:
if the reaction of the sample is the reaction of the rising method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value;
and if the reaction of the sample is the reaction of the descent method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value.
According to a fourth aspect, there is provided in one embodiment a method for determining substrate depletion in a biochemical reaction, comprising:
adding a reagent and a sample into the reaction cup;
uniformly mixing a reaction solution formed by a sample and a reagent in the reaction cup;
incubating the reaction solution in the reaction cup;
performing light measurement on the incubated reaction solution to obtain reaction data of the sample;
correcting the change of the substrate exhaustion threshold value caused by reagent interference and sample interference to obtain a corrected substrate exhaustion threshold value;
judging whether the reaction of the sample generates substrate exhaustion or not according to the reaction data of the sample and the corrected substrate exhaustion threshold value;
if the reaction of the sample is the reaction of the rising method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value;
and if the reaction of the sample is the reaction of the descent method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value.
In one embodiment, the correcting for the change in the substrate depletion threshold due to reagent interference and sample interference comprises:
correcting the change of a substrate exhaustion threshold value caused by reagent interference according to the absorbance of a reaction time endpoint in the reagent blank reaction data; and
and correcting the change of the substrate exhaustion threshold value caused by the sample interference according to the absorbance of the first light measuring point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
In one embodiment, when the reaction of the sample is a reaction of an ascending method, the absorbance at the end of the reaction time in the reaction data of the reagent blank is added to a value obtained by multiplying a difference between the absorbance of the first photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and a substrate exhaustion conversion threshold is added to obtain a corrected substrate exhaustion threshold;
and when the reaction of the sample is the reaction of a descent method, adding the absorbance of the reaction time end point in the reaction data of the reagent blank, adding a value obtained by multiplying the difference value of the absorbance of the first photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient, and subtracting a substrate depletion conversion threshold value to obtain a corrected substrate depletion threshold value.
According to a fourth aspect, an embodiment provides a computer-readable storage medium comprising a program executable by a processor to implement the method disclosed in any of the embodiments herein.
According to the biochemical analyzer, the method for judging the substrate exhaustion in the biochemical reaction and the computer readable storage medium of the embodiment, the reaction data of the sample is obtained; correcting at least the change of the substrate exhaustion threshold value caused by reagent interference to obtain a corrected substrate exhaustion threshold value; according to the reaction data of the sample and the corrected substrate exhaustion threshold value, whether the substrate exhaustion occurs in the reaction of the sample is judged, and the application finds that the substrate exhaustion is misjudged or misjudged due to reagent interference (such as reagent batch difference, reagent bottle opening and the like), and introduces a new scheme to eliminate the interference, so that the substrate exhaustion is misjudged or misjudged due to the reagent interference is reduced as much as possible, and a reliable technical scheme for detecting the substrate exhaustion is provided.
Drawings
FIGS. 1(a) and 1(b) are some reaction curves in the reactions of the two-reagent descending method and ascending method, respectively;
FIGS. 2(a) and 2(b) are schematic structural views of biochemical analyzers according to two embodiments, respectively;
FIG. 3(a) is a schematic representation of several reaction curves for the descent process;
FIG. 3(b) is a schematic diagram illustrating how a corrected substrate depletion threshold is calculated in conjunction with FIG. 3 (a);
FIG. 4(a) is a schematic representation of several reaction curves for the ascending method;
FIG. 4(b) is a schematic diagram illustrating how a corrected substrate depletion threshold is calculated in conjunction with FIG. 4 (a);
FIG. 5 is a flowchart of a method for determining the occurrence of substrate depletion in a biochemical reaction according to an embodiment;
FIG. 6 is a flow diagram of one embodiment for correcting for variations in substrate depletion threshold due to reagent interference.
Detailed Description
The present invention will be described in further detail with reference to the following detailed description and accompanying drawings. Wherein like elements in different embodiments are numbered with like elements associated therewith. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present application. However, those skilled in the art will readily recognize that some of the features may be omitted or replaced with other elements, materials, methods in different instances. In some instances, certain operations related to the present application have not been shown or described in detail in order to avoid obscuring the core of the present application from excessive description, and it is not necessary for those skilled in the art to describe these operations in detail, so that they may be fully understood from the description in the specification and the general knowledge in the art.
Furthermore, the features, operations, or characteristics described in the specification may be combined in any suitable manner to form various embodiments. Also, the steps or actions in the method descriptions may be transposed or transposed in order in a manner apparent to one skilled in the art. Accordingly, the various sequences in the specification and drawings are for clarity of description of certain embodiments only and are not meant to be required unless otherwise indicated where a certain sequence must be followed.
The numbering of the components as such, e.g., "first", "second", etc., is used herein only to distinguish the objects as described, and does not have any sequential or technical meaning. The term "connected" and "coupled" when used in this application, unless otherwise indicated, includes both direct and indirect connections (couplings).
The inventor conducts intensive research aiming at the situation that whether substrate depletion occurs in biochemical reaction during identification and judgment, and sometimes occurs to be missed or misjudged, and finally finds that when reagents have batch difference, reagent bottle opening and the like, absorbance change of sample reaction can be caused, and the situation can possibly cause misjudgment or missed judgment of substrate depletion.
A description and clarification of several concepts is first made.
The existing substrate exhaustion threshold, or the substrate exhaustion threshold before correction as described herein, is obtained and formulated in a manner known to those skilled in the art, i.e., a plurality of high concentration samples are tested using a reagent to obtain a reaction curve, and the substrate exhaustion threshold is obtained according to the test parameters, the reaction curve and the test result. Referring to FIGS. 1(a) and 1(b), there are shown some reaction curves in the reactions of the descending method and the ascending method of the two reagents, respectively, wherein the lowermost dotted line in the descending method is the substrate exhaustion threshold defined above, the uppermost dotted line in the ascending method is the substrate exhaustion threshold defined above, S represents the sample, and R1 and R2 represent the first addition of the reagent and the second addition of the reagent, respectively. The reaction curve in the figure is a reagent blank reaction curve, and it should be noted that the reagent blank is a concept commonly used in biochemical tests, for example, the reagent blank reaction curve refers to a reaction curve measured by replacing a sample with physiological saline according to the amount of a reagent and the amount of a sample in a normal test. The reagents used in the reagent blank reaction curve of FIG. 1 are the same batch of reagents, or even the same vial of reagents, used to establish the substrate depletion threshold. The inventors obtained the absorbance at the beginning or end of the reaction time, denoted Lm', of a reaction curve for this same batch of reagent blank and then defined the substrate depletion turnover thresholds referred to herein as follows: in the descent method, the substrate depletion transition threshold is equal to Lm' minus the substrate depletion threshold before correction (i.e. the substrate depletion threshold specified above); in the ramp-up method, the substrate depletion shift threshold is equal to the pre-correction substrate depletion threshold (i.e., the substrate depletion threshold established above) minus Lm'.
The present invention is explained below.
Referring to fig. 2(a) and 2(b), an embodiment discloses a biochemical analyzer, which may include a sample unit 10, a sample dispensing mechanism 20, a reagent unit 30, a reagent dispensing mechanism 40, a reaction unit 50, a mixing mechanism 60, a photometric unit 70, and a processor 80, which will be described in detail below.
The sample part 10 is used to carry a sample. In some examples, the Sample section 10 may include a Sample Delivery Module (SDM) and a front end rail; in other examples, the sample section 10 may be a sample disk including a plurality of sample sites on which sample tubes, for example, can be placed, and the sample disk may be configured to move the sample to a corresponding position, for example, a position where the sample is aspirated by the sample dispensing mechanism 20, by rotating the disk structure.
The sample dispensing mechanism 20 is used to suck a sample and discharge the sample into a reaction cup to be loaded. For example, the sample dispensing mechanism 20 may include a sample needle that performs two-dimensional or three-dimensional movement in space by a two-dimensional or three-dimensional driving mechanism, so that the sample needle can move to aspirate a sample carried by the sample member 10 and to a cuvette to be loaded and discharge the sample to the cuvette.
The reagent component 30 is used to carry reagents. In one embodiment, the reagent member 30 may be a reagent disk, which is configured in a disk-shaped structure and has a plurality of positions for holding reagent containers, and the reagent member 30 can rotate and drive the reagent containers held by the reagent member to rotate to a specific position, for example, a position for sucking reagent by the reagent dispensing mechanism 40. The number of the reagent member 30 may be one or more.
The reagent dispensing mechanism 40 is used to suck a reagent and discharge it into a reaction cup to which the reagent is to be added. In one embodiment, the reagent dispensing mechanism 40 may include a reagent needle that performs a two-dimensional or three-dimensional motion in space by a two-dimensional or three-dimensional driving mechanism, so that the reagent needle may move to aspirate a reagent carried by the reagent member 30 and to a cuvette to which the reagent is to be added and discharge the reagent to the cuvette.
The reaction unit 50 has at least one placement site for placing a cuvette and incubating a reaction solution in the cuvette. For example, the reaction component 50 may be a reaction tray, which is configured in a disc-shaped structure and has one or more placing positions for placing reaction cups, and the reaction tray can rotate and drive the reaction cups in the placing positions to rotate, so as to schedule the reaction cups in the reaction tray and incubate the reaction solution in the reaction cups.
The mixing mechanism 60 is used for mixing the reaction solution to be mixed in the reaction cup. The number of the kneading mechanisms 60 may be one or more.
The photometric device 70 is used to perform photometric measurement on the incubated reaction solution to obtain reaction data of the sample. For example, the photometric device 70 detects the light emission intensity of the reaction solution to be measured, and calculates the concentration of the component to be measured in the sample from the calibration curve. In one embodiment, the photometric component 70 is separately disposed outside the reaction component 50.
The processor 80 is used for acquiring reaction data of the sample; correcting at least the change of the substrate exhaustion threshold value caused by reagent interference to obtain a corrected substrate exhaustion threshold value; and judging whether the substrate exhaustion occurs in the reaction of the sample according to the reaction data of the sample and the corrected substrate exhaustion threshold value. The following describes how the change in the substrate exhaustion threshold due to reagent interference is corrected.
In one embodiment, the processor 80 obtains reaction data for a reagent blank and corrects for variations in the substrate depletion threshold (i.e., the substrate depletion threshold defined above, or the substrate depletion threshold before correction) due to reagent interference based on the reaction data for the reagent blank.
In one example, the processor 80 may obtain the absorbance at the beginning or end of the reaction time in the reaction data of the reagent blank, and correct the change in the substrate depletion threshold due to the reagent interference based on the absorbance. It should be noted and understood by those skilled in the art that the processor 80 here obtains the absorbance at the beginning or end of the reaction time in the reaction data of the reagent blank, the reagent used therein, and the reagent used in the actual reaction of the sample to be judged whether the substrate depletion occurs, are reagents of the same condition, such as reagents of the same batch or even the same bottle, and it is understood that they are reagents extracted from the same bottle of reagents at short time intervals.
The processor 80 corrects the change of the substrate depletion threshold value caused by the reagent interference according to the absorbance, and specifically may be: when the reaction of the sample is an ascending reaction, the processor 80 adds the absorbance to a substrate depletion shift threshold to correct for a change in the substrate depletion threshold due to reagent interference; when the reaction of the sample is a reaction of the descent method, the processor 80 subtracts the substrate depletion transfer threshold from the absorbance to correct for a change in the substrate depletion threshold due to reagent interference.
In some examples, under the condition that no sample interference is generated and only reagent interference is considered, the processor 80 adds or subtracts a substrate depletion transform threshold to the absorbance to obtain a corrected substrate depletion threshold, specifically, when the reaction of the sample is a reaction of an ascending method, the processor 80 adds the absorbance to the substrate depletion transform threshold to obtain the corrected substrate depletion threshold, and when the absorbance in the reaction data of the sample is judged to be greater than the corrected substrate depletion threshold, the reaction of the sample is judged to generate substrate depletion; when the reaction of the sample is a reaction of a descent method, the processor 80 subtracts the substrate depletion transform threshold from the absorbance to obtain a corrected substrate depletion threshold, and when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate depletion threshold, it is judged that the substrate depletion occurs in the reaction of the sample. It is understood that the absorbance herein refers to the absorbance at the start or end of the reaction time in the reaction data of the reagent blank in the above-described first example.
In some examples, sample interference is also considered while reagent interference is considered. Processor 80 therefore corrects for variations in the substrate depletion threshold due to sample interferences in addition to variations in the substrate depletion threshold due to reagent interferences. The processor 80 corrects for changes in the substrate depletion threshold due to sample disturbances and may include: the processor 80 obtains the reaction data of the reagent blank, and corrects the change of the substrate depletion threshold value caused by the sample interference according to the reaction data of the sample and the reaction data of the reagent blank, wherein the same light measuring point is added into the sample, for example, the absorbance of the first light measuring point; it should be noted and understood by those skilled in the art that the processor 80 here obtains reaction data for reagent blanks whose reagents are the same as those used in the actual reaction of the sample. For example, the processor 80 corrects the change of the substrate depletion threshold value due to the sample interference, based on the value obtained by multiplying the difference between the absorbance of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient. Thus, where reagent interference and sample interference are considered simultaneously, when the reaction of the sample is that of the ascent method, processor 80 calculates a corrected substrate depletion threshold by the following equation:
the corrected substrate depletion threshold value is Lm + K (L1-Lb) ± substrate depletion transfer threshold value.
Wherein Lm refers to the absorbance of the reaction time starting point or the reaction time ending point in the reaction data of the reagent blank;
l1 and Lb respectively refer to the absorbance of the same light measuring point (for example, the first light measuring point) after the sample is added into the reaction data of the sample and the reaction data of the reagent blank, and K is a liquid volume correction coefficient; it can be seen that Lm and Lb are the absorbances at two different time points in the reagent blank (reagent used in the reagent blank, and reagent used in the actual reaction of the sample for which it is necessary to determine whether substrate depletion has occurred, which are the same conditions), one is the absorbance at the start or end of the reaction time, and the other is the absorbance of, for example, the first photometric point after the sample is added.
When the reaction of the sample is a reaction by the ascending method, the above formula is a value obtained by adding a substrate exhaustion conversion threshold, for example, a value obtained by multiplying the absorbance at the end of the reaction time in the reaction data of the reagent blank, the difference between the absorbance of the same photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid amount correction coefficient, and a substrate exhaustion conversion threshold. And when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value, the processor 80 judges that the substrate exhaustion occurs in the reaction of the sample.
When the reaction of the sample is a reaction of a descent method, the above formula is a value obtained by subtracting a substrate depletion conversion threshold, for example, a value obtained by multiplying the absorbance at the end of the reaction time in the reaction data of the reagent blank by the difference between the absorbance at the same photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient, and a value obtained by subtracting the substrate depletion conversion threshold from the reaction data of the reagent blank. When the absorbance in the reaction data of the sample is judged to be less than the corrected substrate exhaustion threshold value, the processor 80 judges that the substrate exhaustion occurs in the reaction of the sample. In one embodiment, the liquid amount correction coefficient may be determined by:
K1＝VR1/(VR1+VS)；
K2＝(VR1+VS)/(VR1+VS+VR2)；
K3＝(VR1+VS+VR2)/(VR1+VS+VR2+VR3)；
K3＝(VR1+VS+VR2+VR3)/(VR1+VS+VR2+VR3+VR4)；
s denotes the sample, R1, R2, R3 and R4 denote four reagents, respectively, VS、VR1、VR2、 VR3And VR4Respectively showing the volumes of the sample, the reagent R1, the reagent R2, the reagent R3 and the reagent R4 added in the reaction; for example, by reaction of a single reagentIt should be added without being labeled reagent R1; a reaction of two reagents, which may be added in the order of reagent R1, sample S and reagent R2; reaction of three reagents, which can be added in the order of reagent R1, sample S, reagent R2 and reagent R3; the four reagents may be added in the order of reagent R1, sample S, reagent R2, reagent R3, and reagent R4. K1, K2, K3 and K4 respectively represent the liquid amount correction coefficient for the single-reagent reaction, the liquid amount correction coefficient for the double-reagent reaction, the liquid amount correction coefficient for the triple-reagent reaction and the liquid amount correction coefficient for the quadruple-reagent reaction. The flow correction coefficients for five-reagent or other multi-reagent reactions are similarly calculated and will not be described herein.
For example, please refer to fig. 3(a) and fig. 3 (b). The line 3(a) is four reaction curves or reaction data of the descent method, the line 1 is a reaction curve in which substrate depletion occurs due to interference (for example, sample interference and reagent interference), the line 2 is a reaction curve in which substrate depletion occurs without interference, the line 3 is a reaction curve in which substrate depletion does not occur due to interference, the line 4 is a reaction curve in which reagent blank is provided, and similarly, reagents used in reagent blank of the line 4 and reagents used in actual reaction of a sample for which it is necessary to determine whether substrate depletion occurs are reagents of the same condition, for example, if the line for which it is necessary to determine whether actual reaction of a sample for which substrate depletion occurs is the line 1, the reagents used in the line 4 and the line 1 are reagents of the same condition. FIG. 3(b) shows lines 1, 2 and 4 in FIG. 3(a) correspondingly, and first from the reaction curve line 4 for the reagent blank, Lm can be obtained, for example, Lm is the absorbance at the end of the reaction time in the reaction data for the reagent blank shown in the figure; lb can also be obtained from line 4 in the figure, for example, the absorbance of the first light measuring point after adding the sample to the reaction data where Lb is a reagent blank; if it is determined whether the substrate depletion occurs in the sample reaction of line 1, L1 can be obtained from the reaction curve line 1 of the sample, for example, L1 is the absorbance of the first photometric point after the sample is added to the reaction data of the sample, wherein the reaction of the two reagents is shown in the figure, for example, reagent R1 can be added first, then sample S can be added, then the absorbance of the first photometric point after the sample S is added can be obtained, and finally reagent R2 can be added; similarly, if it is determined whether or not substrate depletion occurs in the sample reaction in line 2, L1 can be obtained from the reaction curve line 2 of the sample, and it can be seen that the value of L1 waits for Lb. According to the formula, the corrected substrate exhaustion threshold value is Lm + K (L1-Lb) -substrate exhaustion transformation threshold value, and the substrate exhaustion transformation threshold value is equal to Lm' minus the substrate exhaustion threshold value before correction, and the formula is substituted to obtain:
the substrate depletion threshold after correction was Lm + K (L1-Lb) - (Lm' -substrate depletion threshold before correction)
Lm-Lm' + K (L1-Lb) + substrate depletion threshold before correction;
it can be seen that Lm is the absorbance in the reagent blank using the same reagent as that used in the actual reaction of the sample, and Lm 'is the absorbance in the reagent blank using the same or the same batch of reagent as that used when the substrate depletion threshold before the correction was established, and that the reagent interference in the judgment of substrate depletion can be eliminated or reduced by Lm-Lm'. In fig. 3(b), the example of determining whether the substrate depletion occurs in the sample reaction of line 1 is taken, and it can be seen that the absorbance of the disturbed reaction curve indicated by line 1 after a certain time is smaller than the corrected substrate depletion threshold value, so that the processor 80 can accurately determine that the substrate depletion occurs in the sample reaction indicated by the disturbed line 1.
Similarly, please refer to fig. 4(a) and fig. 4 (b). Fig. 4(a) shows four reaction curves or reaction data in the ascending method, where the line 1 shows a reaction curve in which substrate depletion occurs due to interference (e.g., sample interference and reagent interference), the line 2 shows a reaction curve in which substrate depletion occurs without interference, the line 3 shows a reaction curve in which substrate depletion does not occur due to interference, the line 4 shows a reaction curve in which reagent blank is provided, and similarly, a reagent used in the reagent blank of the line 4 and a reagent used in an actual reaction of a sample in which it is necessary to determine whether substrate depletion occurs are reagents of the same condition, and for example, if the line 1 shows a line in which an actual reaction of a sample in which substrate depletion occurs is determined to be equal condition, the reagents used in the line 4 and the line 1 are reagents of the same condition. FIG. 4(b) shows lines 1, 2 and 4 in FIG. 4(a) correspondingly, and first from the reaction curve line 4 for the reagent blank, Lm can be obtained, for example, the figure shows an example where Lm is the absorbance at the end of the reaction time in the reaction data for the reagent blank; lb can also be obtained from line 4 in the figure, for example, the absorbance of the first photometric point after adding the sample to the reaction data where Lb is a reagent blank; if it is determined whether the substrate depletion occurs in the sample reaction of line 1, L1 can be obtained from the reaction curve line 1 of the sample, for example, L1 is the absorbance of the first photometric point after the sample is added to the reaction data of the sample, wherein the reaction of the two reagents is shown in the figure, for example, reagent R1 can be added first, then sample S is added, then the absorbance of the first photometric point after the sample S is added is obtained, and finally reagent R2 is added; similarly, if it is determined whether or not the substrate depletion occurs in the sample reaction in line 2, L1 can be obtained from the reaction curve line 2 of the sample, and it can be seen that the value of L1 waits for Lb. According to the formula, the corrected substrate exhaustion threshold value is Lm + K (L1-Lb) + substrate exhaustion transformation threshold value, and the substrate exhaustion transformation threshold value is equal to the substrate exhaustion threshold value before correction minus Lm' and is substituted into the formula, so as to obtain:
substrate depletion threshold after correction of Lm + K (L1-Lb) + (substrate depletion threshold before correction of-Lm')
Lm-Lm' + K (L1-Lb) + substrate depletion threshold before correction;
it can be seen that Lm is the absorbance in the reagent blank using the same reagent as that used in the actual reaction of the sample, and Lm 'is the absorbance in the reagent blank using the same or the same batch of reagent as that used when the substrate depletion threshold value before the correction was used and established, and that the reagent interference in the determination of substrate depletion can be eliminated or reduced by Lm-Lm'. (ii) a In fig. 4(b), the example of determining whether the substrate depletion occurs in the sample reaction of line 1 is taken, and it can be seen that the absorbance of the disturbed reaction curve indicated by line 1 after a certain time is greater than the corrected substrate depletion threshold value, so that the processor 80 can accurately determine that the substrate depletion occurs in the sample reaction indicated by the disturbed line 1.
After the processor 80 determines that the substrate is exhausted in the reaction of the sample, various measures may be taken, for example, the processor 80 may search a photometric point range participating in the calculation of the degree of reaction according to the corrected substrate exhaustion threshold, and complete the extended calculation of the test result within the reaction time or outside the reaction time; for example, processor 80 may also provide different outcome indications based on the extent of substrate depletion; for example, the processor 80 may also alert the user.
Here, the absorbance may refer to absorbance at a main wavelength, absorbance at a sub-wavelength, absorbance at a main wavelength and/or a sub-wavelength, and the like.
In an embodiment of the present invention, a method for determining substrate depletion in biochemical reaction (hereinafter referred to as "determination method") is further disclosed, referring to fig. 5, the determination method includes steps 100 to 300, which are specifically described below.
Step 100: and acquiring reaction data of the sample. For example, in one embodiment, reagents and samples may be added to the cuvette; uniformly mixing a reaction solution formed by a sample and a reagent in the reaction cup; incubating the reaction liquid in the reaction cup; and performing light measurement on the incubated reaction solution to obtain reaction data of the sample.
Step 200: and correcting at least the change of the substrate exhaustion threshold value caused by reagent interference to obtain a corrected substrate exhaustion threshold value.
Step 300: and judging whether the substrate exhaustion occurs in the reaction of the sample according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
Step 200 is described in detail below.
Referring to fig. 6, step 200 may comprise step 210 and step 220 in one embodiment.
Step 210: reaction data for reagent blanks were obtained. Similarly as described above, step 210 here obtains reaction data for a reagent blank whose reagent is the same as the reagent used in the actual reaction of the sample.
Step 220: and correcting the change of the substrate exhaustion threshold value caused by reagent interference according to the reaction data of the reagent blank.
In one example, step 220 may obtain the absorbance at the beginning or end of the reaction time in the reaction data of the reagent blank, and correct the change in the substrate depletion threshold due to the reagent interference according to the absorbance. In the above example, the step 220 may correct the change of the substrate exhaustion threshold caused by the reagent interference according to the absorbance, i.e. the absorbance at the reaction time starting point or the reaction time ending point in the reaction data of the reagent blank, by:
when the reaction of the sample is a reaction of an ascending method, adding the absorbance to a substrate depletion conversion threshold value to correct the change of the substrate depletion threshold value caused by reagent interference;
when the reaction of the sample is a reaction of a descent method, the substrate depletion transition threshold is subtracted from the absorbance to correct a change in the substrate depletion threshold due to reagent interference.
Under the condition that no sample interference is generated and only reagent interference is considered, adding or subtracting a substrate exhaustion transformation threshold to the absorbance in step 220 to obtain a corrected substrate exhaustion threshold, specifically, when the reaction of the sample is the reaction of an ascending method, adding the substrate exhaustion transformation threshold to the absorbance in step 220 to obtain the corrected substrate exhaustion threshold, and when the absorbance in the reaction data of the sample is judged to be greater than the corrected substrate exhaustion threshold in step 300, judging that the substrate exhaustion occurs in the reaction of the sample; when the reaction of the sample is a reaction of a descent method, the step 220 subtracts the substrate depletion transform threshold from the absorbance to obtain a corrected substrate depletion threshold, and the step 300 judges that the substrate depletion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be less than the corrected substrate depletion threshold.
In some examples, sample interference is also considered while reagent interference is considered. Thus, step 200 corrects for variations in the substrate depletion threshold due to reagent interference as well as variations in the substrate depletion threshold due to sample interference. Step 200 corrects for variations in the substrate depletion threshold due to sample disturbances may include: step 200 obtains the reaction data of the reagent blank, and corrects the change of the substrate depletion threshold value caused by the sample interference according to the reaction data of the sample and the absorbance of the same photometric point after the sample is added to the reaction data of the reagent blank, for example, the first photometric point. For example, in step 200, the change of the substrate depletion threshold due to the sample interference is corrected based on the value obtained by multiplying the difference between the absorbance values of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient. Therefore, in the case of considering both the reagent interference and the sample interference, when the reaction of the sample is the reaction of the ascending method, the value obtained by multiplying the absorbance difference between the starting point or the ending point of the reaction time in the reaction data of the reagent blank by the absorbance of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank, for example, the absorbance of the first photometric point, by the liquid amount correction coefficient, and the substrate exhaustion conversion threshold value are added to obtain the corrected substrate exhaustion threshold value in step 200, and when the absorbance in the reaction data of the sample is determined to be greater than the corrected substrate exhaustion threshold value in step 300, the substrate exhaustion of the reaction of the sample is determined; when the reaction of the sample is a reaction of a descent method, step 200 is to add the absorbance of the starting point or the ending point of the reaction time in the reagent blank reaction data, to a value obtained by multiplying the difference between the absorbance of the same photometric point after the sample is added in the sample reaction data and the reagent blank reaction data by a liquid volume correction coefficient, and to subtract the substrate depletion conversion threshold, so as to obtain a corrected substrate depletion threshold, and step 300 is to judge that the substrate is depleted in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate depletion threshold.
According to the biochemical analyzer and the method for judging substrate exhaustion in biochemical reaction, substrate exhaustion missing judgment or misjudgment caused by reagent interference (such as reagent batch difference, reagent bottle opening and the like) is found, and a new scheme is introduced to eliminate the interference, so that the substrate exhaustion missing judgment or misjudgment caused by the reagent interference is reduced as much as possible, and a technical scheme for reliably detecting the substrate exhaustion is provided.
Those skilled in the art will appreciate that all or part of the functions of the various methods in the above embodiments may be implemented by hardware, or may be implemented by computer programs. When all or part of the functions of the above embodiments are implemented by a computer program, the program may be stored in a computer-readable storage medium, and the storage medium may include: a read only memory, a random access memory, a magnetic disk, an optical disk, a hard disk, etc., and the program is executed by a computer to realize the above functions. For example, the program may be stored in a memory of the device, and when the program in the memory is executed by the processor, all or part of the functions described above may be implemented. In addition, when all or part of the functions in the above embodiments are implemented by a computer program, the program may be stored in a storage medium such as a server, another computer, a magnetic disk, an optical disk, a flash disk, or a removable hard disk, and may be downloaded or copied to a memory of a local device, or may be updated in a version of a system of the local device, and when the program in the memory is executed by a processor, all or part of the functions in the above embodiments may be implemented.
The present invention has been described in terms of specific examples, which are provided to aid understanding of the invention and are not intended to be limiting. For a person skilled in the art to which the invention pertains, several simple deductions, modifications or substitutions may be made according to the idea of the invention.
Claims (24)
1. A biochemical analyzer, comprising:
a sample part for carrying a sample;
the sample dispensing mechanism is used for sucking a sample and discharging the sample into a reaction cup to be added with the sample;
a reagent component for carrying a reagent;
the reagent dispensing mechanism is used for sucking the reagent and discharging the reagent into a reaction cup to be added with the reagent;
the reaction component is provided with at least one placing position, and the placing position is used for placing the reaction cup and incubating the reaction liquid in the reaction cup;
the blending mechanism is used for blending the reaction liquid to be blended in the reaction cup;
the light measurement component is used for performing light measurement on the incubated reaction liquid to obtain reaction data of the sample; wherein:
the processor is used for controlling the sample dispensing mechanism to suck the sample from the sample component and controlling the reagent dispensing mechanism to suck the reagent from the reagent component so as to add the reagent and the sample into the reaction cup; the processor controls the blending mechanism to blend the reaction liquid formed by the sample and the reagent in the reaction cup, controls the reaction component to incubate the reaction liquid in the reaction cup, and controls the light measurement component to perform light measurement on the incubated reaction liquid to obtain the reaction data of the sample; the processor is used for correcting the change of the substrate exhaustion threshold value caused by reagent interference and sample interference to obtain a corrected substrate exhaustion threshold value, and judging whether the reaction of the sample is exhausted according to the reaction data of the sample and the corrected substrate exhaustion threshold value: if the reaction of the sample is the reaction of the rising method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value; and if the reaction of the sample is the reaction of the descent method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value.
2. The biochemical analyzer of claim 1, wherein the processor corrects the substrate depletion threshold for changes due to reagent interference based on absorbance at the end of reaction time in the reagent blank reaction data; and correcting the change of the substrate exhaustion threshold value caused by the sample interference according to the absorbance of the first light measuring point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
3. The biochemical analyzer of claim 2, wherein:
when the reaction of the sample is the reaction of an ascending method, the processor adds the absorbance of the reaction time endpoint in the blank reaction data of the reagent, a value obtained by multiplying the difference value of the absorbance of the first light measuring point after the sample is added in the reaction data of the sample and the blank reaction data of the reagent by a liquid volume correction coefficient, and a substrate exhaustion conversion threshold value to obtain a corrected substrate exhaustion threshold value;
when the reaction of the sample is the reaction of a descent method, the processor adds the absorbance of the reaction time endpoint in the reagent blank reaction data, a value obtained by multiplying the difference between the absorbance of the first photometric point after the sample is added in the reaction data of the sample and the reagent blank reaction data by a liquid volume correction coefficient, and subtracts a substrate depletion conversion threshold to obtain a corrected substrate depletion threshold.
4. A biochemical analyzer, comprising:
a sample part for carrying a sample;
the sample dispensing mechanism is used for sucking a sample and discharging the sample into a reaction cup to be added with the sample;
a reagent component for carrying a reagent;
the reagent dispensing mechanism is used for sucking the reagent and discharging the reagent into a reaction cup to be added with the reagent;
the reaction component is provided with at least one placing position, and the placing position is used for placing the reaction cup and incubating the reaction liquid in the reaction cup;
the blending mechanism is used for blending the reaction liquid to be blended in the reaction cup;
the light measurement component is used for performing light measurement on the incubated reaction liquid to obtain reaction data of the sample;
a processor for obtaining reaction data of the sample; correcting at least the change of the substrate exhaustion threshold value caused by reagent interference to obtain a corrected substrate exhaustion threshold value; and judging whether the substrate exhaustion occurs in the reaction of the sample according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
5. The biochemical analyzer of claim 4, wherein the processor obtains absorbance at the end of the reaction time in the reaction data of the reagent blank, and corrects the change in the substrate depletion threshold due to reagent interference based on the absorbance.
6. The biochemical analyzer of claim 5, wherein:
when the reaction of the sample is a reaction of an ascending method, the processor adds the absorbance to a substrate depletion transfer threshold to correct a change in the substrate depletion threshold due to reagent interference;
when the reaction of the sample is a reaction of a descent method, the processor subtracts a substrate depletion shift threshold from the absorbance to correct for a change in the substrate depletion threshold due to reagent interference.
7. The biochemical analyzer of any one of claims 4 to 6, wherein the processor obtains the reagent blank reaction data and corrects the substrate depletion threshold for changes due to sample interference based on the absorbance of the same photometric point after the sample is added to the sample reaction data and the reagent blank reaction data.
8. The biochemical analyzer of claim 7, wherein the processor corrects the change in the substrate depletion threshold due to sample interference based on a value obtained by multiplying a difference in absorbance of the same photometric point after the sample is added to the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient.
9. The biochemical analyzer of claim 8, wherein:
when the reaction of the sample is the reaction of an ascending method, the processor adds the absorbance of the reaction time endpoint in the blank reaction data of the reagent, the value obtained by multiplying the difference value of the absorbance of the same light measuring point after the sample is added in the reaction data of the sample and the blank reaction data of the reagent by a liquid volume correction coefficient, and the substrate exhaustion conversion threshold value to obtain the corrected substrate exhaustion threshold value; when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value, judging that the substrate exhaustion occurs in the reaction of the sample;
when the reaction of the sample is the reaction of a descent method, the processor adds the absorbance of the reaction time endpoint in the blank reaction data of the reagent, a value obtained by multiplying the difference value of the absorbance of the same light measuring point after the sample is added in the reaction data of the sample and the blank reaction data of the reagent by a liquid volume correction coefficient, and subtracts a substrate depletion transformation threshold value to obtain a corrected substrate depletion threshold value; and when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value, judging that the substrate exhaustion occurs in the reaction of the sample.
10. A method for determining substrate depletion in a biochemical reaction, comprising:
acquiring reaction data of a sample;
correcting at least the change of the substrate exhaustion threshold value caused by reagent interference to obtain a corrected substrate exhaustion threshold value;
and judging whether the substrate exhaustion occurs in the reaction of the sample according to the reaction data of the sample and the corrected substrate exhaustion threshold value.
11. The method of claim 10, wherein the correcting at least the change in the substrate depletion threshold due to reagent interference comprises:
acquiring reaction data of reagent blanks;
and correcting the change of the substrate exhaustion threshold value caused by reagent interference according to the reaction data of the reagent blank.
12. The method according to claim 11, wherein absorbance at the end point of the reaction time in the reaction data of the reagent blank is obtained, and a change in the substrate depletion threshold value due to the reagent interference is corrected based on the absorbance.
13. The method of claim 11, wherein the correcting a change in the substrate depletion threshold due to reagent interference based on the absorbance comprises:
when the reaction of the sample is a reaction of an ascending method, adding the absorbance to a substrate depletion conversion threshold value to correct the change of the substrate depletion threshold value caused by reagent interference;
when the reaction of the sample is a reaction of a descent method, the substrate depletion transition threshold is subtracted from the absorbance to correct a change in the substrate depletion threshold due to reagent interference.
14. The judgment method according to claim 13, wherein:
when the reaction of the sample is the reaction of an ascending method, adding the absorbance to a substrate exhaustion transformation threshold value to obtain a corrected substrate exhaustion threshold value;
and when the reaction of the sample is the reaction of a descent method, subtracting the substrate exhaustion transformation threshold value from the absorbance to obtain a corrected substrate exhaustion threshold value.
15. The method of any one of claims 10 to 13, wherein the correcting at least the change in the substrate depletion threshold due to reagent interference comprises: changes in the substrate depletion threshold due to sample disturbances are also corrected.
16. The method of claim 15, wherein correcting for changes in the substrate depletion threshold due to sample disturbances comprises:
acquiring reaction data of reagent blanks;
and correcting the change of the substrate exhaustion threshold value caused by the sample interference according to the absorbance of the same photometric point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
17. The method of claim 16, wherein the same light measuring point is a first light measuring point.
18. The method of claim 17, wherein the correcting the change in the substrate depletion threshold due to the sample interference based on the absorbance of the same photometric point after the sample is added to the reaction data for the sample and the reaction data for the reagent blank comprises: and correcting the change of the substrate exhaustion threshold value caused by the sample interference according to the value obtained by multiplying the difference value of the absorbance of the same light measuring point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient.
19. The method of claim 18, wherein the correcting at least the change in the substrate depletion threshold due to reagent interference comprises:
when the reaction of the sample is the reaction of an ascending method, adding the absorbance of the reaction time endpoint in the blank reaction data of the reagent, a value obtained by multiplying the difference value of the absorbance of the same photometric point after the sample is added in the reaction data of the sample and the blank reaction data of the reagent by a liquid volume correction coefficient, and a substrate exhaustion conversion threshold value to obtain a corrected substrate exhaustion threshold value;
and when the reaction of the sample is the reaction of a descent method, adding the absorbance of the reaction time endpoint in the reaction data of the reagent blank, adding a value obtained by multiplying the difference value of the absorbance of the same photometric point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient, and subtracting a substrate depletion transformation threshold value to obtain a corrected substrate depletion threshold value.
20. The method of determining as set forth in claim 19, further comprising:
if the reaction of the sample is the reaction of the rising method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value;
and if the reaction of the sample is the reaction of the descent method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value.
21. A method for determining substrate depletion in a biochemical reaction, comprising:
adding a reagent and a sample into the reaction cup;
uniformly mixing a reaction solution formed by a sample and a reagent in the reaction cup;
incubating the reaction solution in the reaction cup;
performing light measurement on the incubated reaction solution to obtain reaction data of the sample;
correcting the change of the substrate exhaustion threshold value caused by reagent interference and sample interference to obtain a corrected substrate exhaustion threshold value;
judging whether the reaction of the sample is exhausted or not according to the reaction data of the sample and the corrected substrate exhaustion threshold;
if the reaction of the sample is the reaction of the rising method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be larger than the corrected substrate exhaustion threshold value;
and if the reaction of the sample is the reaction of the descent method, judging that the substrate exhaustion occurs in the reaction of the sample when the absorbance in the reaction data of the sample is judged to be smaller than the corrected substrate exhaustion threshold value.
22. The method of claim 21, wherein the correcting for changes in the substrate depletion threshold due to reagent interference and sample interference comprises:
correcting the change of a substrate depletion threshold value caused by reagent interference according to the absorbance of a reaction time endpoint in the blank reaction data of the reagent; and
and correcting the change of the substrate exhaustion threshold value caused by the sample interference according to the absorbance of the first light measuring point after the sample is added into the reaction data of the sample and the reaction data of the reagent blank.
23. The judgment method according to claim 22, wherein:
when the reaction of the sample is the reaction of an ascending method, adding the absorbance of the reaction time endpoint in the blank reaction data of the reagent, a value obtained by multiplying the difference value of the absorbance of the first light measuring point after the sample is added in the reaction data of the sample and the blank reaction data of the reagent by a liquid volume correction coefficient, and a substrate exhaustion conversion threshold value to obtain a corrected substrate exhaustion threshold value;
and when the reaction of the sample is the reaction of a descent method, adding the absorbance of the reaction time endpoint in the reaction data of the reagent blank, adding a value obtained by multiplying the difference value of the absorbance of the first light measuring point after the sample is added in the reaction data of the sample and the reaction data of the reagent blank by a liquid volume correction coefficient, and subtracting a substrate depletion transformation threshold value to obtain a corrected substrate depletion threshold value.
24. A computer-readable storage medium, characterized by comprising a program executable by a processor to implement the method of any one of claims 10 to 23.
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