CN112082517A - Defect detecting apparatus - Google Patents
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- CN112082517A CN112082517A CN202010848316.1A CN202010848316A CN112082517A CN 112082517 A CN112082517 A CN 112082517A CN 202010848316 A CN202010848316 A CN 202010848316A CN 112082517 A CN112082517 A CN 112082517A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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Abstract
A defect detection apparatus comprising: a base; the base station is positioned on the base and suspended above the base; and the flatness detection unit is positioned on the base platform and is used for measuring and obtaining the flatness of the surface of the base platform, and when the measured flatness exceeds a set threshold value, a signal for stopping the operation of the defect detection equipment is sent out. Can real-time detection through roughness detecting element the roughness on base surface, when there is unusual (for example have mar or granule) in the roughness on base surface, it is corresponding the roughness that obtains of measurement can exceed when setting for the threshold value, and at this moment roughness detecting element can send the signal that stops defect detection equipment operation to defect detection equipment for equipment personnel can in time shut down and inspect defect detection equipment, in time eliminate abnormal conditions (for example eliminate the mar, clear away the granule, adjust the position etc.) rate of relevant part.
Description
Technical Field
The invention relates to the field of semiconductors, in particular to a defect detection device for photomask defect detection.
Background
Photolithography is an important process for integrated circuit fabrication, and the task of the photolithography process is to transfer a mask pattern on a photomask to a photoresist layer on a silicon wafer. The projection light is transmitted to the silicon chip after passing through the mask pattern, and the mask pattern is equivalent to an obstacle on a transmission path for light waves, so that a photoetching pattern related to the mask pattern is obtained on the silicon chip.
With the increasing demand of products and the decreasing of line widths, the requirements on various performance indexes such as the precision of the photomask are higher and higher (for example, the precision is increased from micrometer to nanometer level), and thus the requirements on the quality of photomask manufacturing are more and more important. In order to monitor the quality of photomask fabrication, defect monitoring is generally performed after the photomask fabrication is completed, and defect detection is performed by photomask defect detection equipment.
The existing mask defect detecting equipment generally comprises a base and a base platform suspended on the base, wherein a mask to be detected is placed on the base platform, and the base platform can move relative to the base in the defect detecting process.
In the use process of the photomask defect detection equipment, the base station has the problem that the initialization cannot be successfully carried out, the maintenance of the photomask defect detection equipment needs a long time, and the utilization rate of the photomask defect detection equipment is reduced.
Disclosure of Invention
The invention aims to solve the technical problem of how to avoid the problem that defect detection equipment cannot be initialized and improve the utilization rate of the equipment.
The present invention provides a defect detecting apparatus, including:
a base;
the base station is positioned on the base and suspended above the base;
and the flatness detection unit is positioned on the base platform and is used for measuring and obtaining the flatness of the surface of the base platform, and when the measured flatness exceeds a set threshold value, a signal for stopping the operation of the defect detection equipment is sent out.
Optionally, the flatness detecting unit includes a light emitting unit, a light sensing unit, a processing unit, and a determining unit, where the light generating unit is configured to emit detection light to irradiate the surface of the base, the light sensing unit is configured to receive reflected light from the surface of the base to generate an electrical signal, the processing unit obtains the flatness of the surface of the base based on the electrical signal, the determining unit is configured to determine whether the obtained flatness exceeds a set threshold, and when the obtained flatness exceeds the set threshold, a signal for stopping the operation of the defect detecting device is sent.
Optionally, the flatness obtained by the measurement is represented by a transmission time of light obtained by the measurement, the set threshold is a set standard transmission time, and when the transmission time of the light obtained by the measurement is greater than or less than the standard transmission time, it is determined that the flatness obtained by the measurement exceeds the set threshold.
Optionally, the flatness obtained by measurement is represented by a distance obtained by measurement, the set threshold is a set standard distance, and when the distance obtained by measurement is greater than or less than the standard distance, it is determined that the flatness obtained by measurement exceeds the set threshold.
Optionally, the flatness detection unit includes a laser ranging sensor or a TOF sensor.
Optionally, the flatness obtained by measurement is represented by a detection image obtained by measurement, the set threshold is a set standard image, and when the detection image does not match the standard image, it is determined that the flatness obtained by measurement exceeds the set threshold.
Optionally, the flatness detection unit includes a TDI-CCD image sensor.
Optionally, an air bearing is disposed between the base platform and the base, and the air bearing is used for suspending the base platform above the base.
Optionally, the defect detecting apparatus further includes a driving unit, and the driving unit is connected to the base station and configured to drive the base station to move relative to the base station.
Optionally, the defect detecting device is configured to detect whether the photomask has a defect, and the base station is configured to place the photomask to be detected.
Compared with the prior art, the technical scheme of the invention has the following advantages:
the defect detecting apparatus of the present invention includes: a base; the base station is positioned on the base and suspended above the base; and the flatness detection unit is positioned on the base platform and is used for measuring and obtaining the flatness of the surface of the base platform, and when the measured flatness exceeds a set threshold value, a signal for stopping the operation of the defect detection equipment is sent out. Can real-time detection through roughness detecting element the roughness on base surface, when there is unusually (for example there is mar or granule) in the roughness on base surface, it is corresponding the roughness that the measurement obtained can exceed when setting for the threshold value, at this moment roughness detecting element can send the signal that stops defect detection equipment operation to defect detection equipment for equipment personnel can in time shut down and inspect defect detection equipment, in time eliminate the abnormal conditions (for example eliminate the mar, clear away the granule, adjust the position of relevant part etc.), thereby can prevent effectively that the abnormal conditions deterioration of base surface from bringing bigger cost of maintenance and longer maintenance duration, with the utilization ratio that improves defect detection equipment.
Further, the flatness obtained by the measurement is represented by the transmission time of the light obtained by the measurement, the set threshold is a set standard transmission time, and when the transmission time of the light obtained by the measurement is greater than or less than the standard transmission time, the flatness obtained by the measurement is judged to exceed the set threshold. When the base surface flatness has abnormity (scratches or particles), when the flatness detection unit measures, the transmission time from the light emitted by the light emitting unit to the section of light of which the light sensing unit receives the reflected light is different from the transmission time of the light under the normal condition (when the base surface flatness does not have abnormity), so that the base surface flatness condition can be judged by measuring the transmission time of the light, and the detection process can be carried out in real time in the moving process of the base platform when the defect detection equipment carries out defect detection without additionally setting the detection time of the defect detection equipment.
Further, the flatness obtained by the measurement is represented by a distance obtained by the measurement, the set threshold is a set standard distance, and when the distance obtained by the measurement is greater than or less than the standard distance, it is determined that the flatness obtained by the measurement exceeds the set threshold. When the base surface flatness has abnormity (scratch or particle), when the flatness detecting unit measures, the transmission distance from the light emitted by the light emitting unit to the section of light of the reflected light received by the light sensing unit is different from the transmission distance of the light under the normal condition (when the base surface flatness does not have abnormity), so that the base surface flatness condition can be judged by measuring the transmission distance of the light, and the detection process can be carried out in real time in the moving process of the base platform when the defect detecting equipment carries out defect detection without additionally setting the detection time of the defect detecting equipment.
And the flatness obtained by measurement is represented by a detection image obtained by measurement, the set threshold is a set standard image, and when the detection image is not matched with the standard image, the flatness obtained by measurement is judged to exceed the set threshold. The standard pattern is an image obtained when the flatness of the surface of the base is not abnormal, and when the flatness of the surface of the base is abnormal (scratches or particles), a detection image obtained is distinguished from the standard image, so that by comparing or matching the detection image with the standard image, when the detection image is different from the standard image, the flatness of the surface of the base is considered to be abnormal, and the detection process can be performed in real time in the moving process of the base when the defect detection equipment performs defect detection without additionally setting the detection time.
Drawings
Fig. 1-2 are schematic structural diagrams of a defect detection apparatus according to an embodiment of the invention.
Detailed Description
As mentioned in the background art, in the using process of the mask defect inspection apparatus, the problem that the base station cannot be initialized successfully exists, and the mask defect inspection apparatus needs a long time to be maintained, which reduces the utilization rate of the mask defect inspection apparatus.
Research shows that the conventional photomask defect detection device has a base platform suspended on a base (e.g., a marble base) through an air bearing, the air bearing is mounted on the bottom surface of the base platform, and the distance between the air bearing and the surface of the stone base platform is only about 0.5 micrometer, so that when the base platform moves relative to the base platform, the base platform is very sensitive to the size change of the surface of the base platform, and if the surface of the base platform has tiny scratches or particles, the movement of the base platform is affected, so that the base platform cannot be initialized successfully.
When the problem that initialization cannot be carried out occurs, the photomask defect detection equipment needs to be stopped for maintenance, specifically, one maintenance mode is to repair the place with scratches on the surface of the base by using a resin material, the mode takes long time and has low repair success rate, the repaired position is easy to have problems again, and the other maintenance mode is to return the equipment to the factory for maintenance, and the maintenance mode has longer time period and high cost. In addition, when the stage cannot be initialized, the reticle on the stage needs to be manually removed, increasing the risk of damage to the reticle.
To this end, the present invention provides a defect detecting apparatus comprising: a base; the base station is positioned on the base and suspended above the base; and the flatness detection unit is positioned on the base platform and is used for measuring and obtaining the flatness of the surface of the base platform, and when the measured flatness exceeds a set threshold value, a signal for stopping the operation of the defect detection equipment is sent out. Can real-time detection through roughness detecting element the roughness on base surface, when there is unusually (for example there is mar or granule) in the roughness on base surface, it is corresponding the roughness that the measurement obtained can exceed when setting for the threshold value, at this moment roughness detecting element can send the signal that stops defect detection equipment operation to defect detection equipment for equipment personnel can in time shut down and inspect defect detection equipment, in time eliminate the abnormal conditions (for example eliminate the mar, clear away the granule, adjust the position of relevant part etc.), thereby can prevent effectively that the abnormal conditions deterioration of base surface from bringing bigger cost of maintenance and longer maintenance duration, with the utilization ratio that improves defect detection equipment.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in detail below. In describing the embodiments of the present invention in detail, the drawings are not to be considered as being enlarged partially in accordance with the general scale, and the drawings are only examples, which should not be construed as limiting the scope of the present invention. In addition, the three-dimensional dimensions of length, width and depth should be included in the actual fabrication.
Referring to fig. 1, an embodiment of the present invention provides a defect detecting apparatus, including:
a base 101;
a base platform 102 located on the base 101, wherein the base platform 102 is suspended on the base 101;
and the flatness detection unit 103 is positioned on the base platform 102, and the flatness detection unit 103 is used for measuring and obtaining the flatness of the surface of the base 101, and sending a signal for stopping the operation of the defect detection equipment when the measured flatness exceeds a set threshold value.
The base 101 is made of stone, specifically, the base is made of granite or marble, and the base 101 has a flat surface. In one embodiment, the surface roughness Ra of the base 101 is less than or equal to 0.4 μm.
The base platform 102 is located above the base 101, and specifically, the base platform 102 is suspended above the base 101, so as to reduce the influence of external vibration on the base platform 102 when performing defect detection.
In one embodiment, an air bearing (not shown) is disposed between the base platform 102 and the base platform 101, and the air bearing is used to suspend the base platform 102 above the base platform 101. in one embodiment, the air bearing is disposed at the bottom of the base platform 102. in other embodiments, the air bearing may be disposed at other portions of the base platform 102. When the base platform 102 is suspended above the base platform 101, the distance between the bottom of the base platform 102 and the surface of the base platform 101 is 0.5-0.8 microns.
The defect detecting apparatus further comprises a driving unit (not shown in the figure) connected to the base 102 for driving the base 102 to move relative to the base 101. In a specific embodiment, the driving unit can drive the base station 102 to scan and move along a certain direction.
In this embodiment, the defect detecting device is a detecting device for detecting whether a defect exists in a photomask, and the base 102 is used for placing the photomask to be detected. In other embodiments, the defect detection apparatus may also be used for defect detection of wafers.
Since the distance between the base 102 and the surface of the base 101 is small (0.5-0.8 μm), the flatness (or roughness) of the surface of the base 101 has a large influence on the movement of the base 102, and therefore, in the present application, the defect detecting apparatus further includes a flatness detecting unit 103, wherein the flatness detecting unit 103 is configured to measure and obtain the flatness of the surface of the base 101, and when the measured flatness exceeds a set threshold, to send a signal for stopping the operation of the defect detecting apparatus. Can real-time detection through roughness detecting element 103 the roughness on base 101 surface, when the roughness on base 101 surface exists unusually (for example have mar or granule), it is corresponding the roughness that obtains of measurement can exceed when setting for the threshold value, at this moment roughness detecting element 103 can send the signal that stops defect detection equipment operation to defect detection equipment for equipment personnel can in time shut down and inspect defect detection equipment, in time eliminate abnormal conditions (for example eliminate the mar, clear away the granule, adjust the position of relevant part etc.), thereby can effectively prevent that the abnormal conditions deterioration on base 101 surface from bringing bigger cost of maintenance and longer maintenance time, with the utilization ratio that improves defect detection equipment.
In an embodiment, referring to fig. 1, the flatness detecting unit 103 may be fixed on a sidewall of the base 102, specifically, the sidewall is a sidewall of the base perpendicular to a moving direction (or scanning direction) X of the base 102, so as to facilitate the flatness detection.
In an embodiment, referring to fig. 2, the flatness detecting unit 103 includes a light emitting unit 11, a light sensing unit 12, a processing unit 13, and a determining unit 14, wherein the light generating unit 11 is configured to emit detection light to irradiate the surface of the substrate 101, the light sensing unit 12 is configured to receive reflected light from the surface of the substrate 101 to generate an electrical signal, the processing unit 13 is configured to obtain the flatness of the surface of the substrate 101 based on the electrical signal, the determining unit 14 is configured to determine whether the obtained flatness exceeds a set threshold, and when the obtained flatness exceeds the set threshold, a signal for stopping the operation of the defect detecting apparatus is sent out.
The light emitting unit 11 includes a laser light source or a white light source, the light sensing unit 12 includes an image sensor, which may be a CCD image sensor or a CMOS image sensor, and the processing unit 13 includes a corresponding electrical signal processing circuit. The set threshold is a flatness value that does not affect the movement of the base 102 or a flatness value measured by the flatness detection unit 103 when there is no abnormality in the flatness of the surface of the receiving base 101. The set threshold may be set experimentally or empirically.
The flatness of the surface of the base 101 may be characterized or indicated by different parameters obtained by measurement, and the corresponding set threshold may also be characterized by different parameters. In an embodiment, the measured flatness is represented by a measured light transmission time, the set threshold is a set standard transmission time, and when the measured light transmission time is greater than or less than the standard transmission time, the measured flatness is judged to exceed the set threshold. When there is an abnormality (scratch or particle) in the surface flatness of the base 101, and the flatness detecting unit 103 measures, the transmission time of the light from the light emitted from the light emitting unit 11 to the light sensing unit 12 receiving the reflected light is different from the transmission time of the light in a normal condition (when there is no abnormality in the surface flatness of the base 101), so that the surface flatness condition of the base 101 can be determined by measuring the transmission time of the light, and the detection process can be performed in real time during the movement of the base 102 when the defect detecting device performs defect detection, without additionally setting the detection time of the defect detecting device.
In another embodiment, the measured flatness is represented by a measured distance, the set threshold is a set standard distance, and when the measured distance is greater than or less than the standard distance, the measured flatness is judged to exceed the set threshold. When there is an abnormality (scratch or particle) in the surface flatness of the base 101, and the flatness detecting unit 103 measures the surface flatness, the transmission distance from the light emitted from the light emitting unit 11 to the section of light where the light sensing unit 12 receives the reflected light is different from the transmission distance of the light under a normal condition (when there is no abnormality in the surface flatness of the base 101), so that the surface flatness of the base 101 can be determined by measuring the transmission distance of the light, and the detection process can be performed in real time during the movement of the base 102 when the defect detecting device performs defect detection, without additionally setting the detection time of the defect detecting device.
In a specific embodiment, the flatness detection unit 103 includes a laser ranging sensor or a TOF (time of flight) sensor, and the laser ranging sensor or the TOF sensor can measure the transmission time or the transmission distance of the light.
In another embodiment, the flatness obtained by measurement is represented by a detection image obtained by measurement, the set threshold is a set standard image, and when the detection image does not match the standard image, the flatness obtained by measurement is judged to exceed the set threshold. The standard pattern is an image obtained when there is no abnormality in the surface flatness of the base 101, and when there is an abnormality (scratch or particle) in the surface flatness of the base 101, there is a difference between the obtained inspection image and the standard image, so that by comparing or matching the inspection image with the standard image, when the inspection image is different from the standard image, it is considered that there is an abnormality in the surface flatness of the base 101, and the inspection process can be performed in real time during the movement of the base 102 when the defect inspection apparatus performs defect inspection, without additionally setting the inspection time by the defect inspection apparatus.
In a specific embodiment, the detection image is a graph corresponding to a certain area on the surface of the base 101 obtained when the base 102 moves to a certain position, and the standard image is a standard image corresponding to the area. In another specific embodiment, the detection image may be a detection image formed by splicing a plurality of sub detection images (different regions of the surface of the base 101 in different sub detection images, all the sub detection images correspond to the whole surface of the base 101), and the standard image is a standard image corresponding to the whole surface of the base 101.
In one embodiment, the flatness detection unit 103 includes a TDI-ccd (time delayed and integration ccd) image sensor for acquiring a detection image of the surface of the susceptor 101. The TDI-CCD image sensor has the advantages of high sensitivity, large dynamic range, image motion elimination and the like in a dark environment, and can greatly improve the accuracy of image acquisition, so that the accuracy of surface flatness detection of the base 101 is improved.
In an embodiment, the defect detecting unit may further include an aligning unit, configured to align the base platform 102 with the base platform 101, so that the base platform 102 establishes a positional relationship with the base platform 101, and since the position of the flatness detecting unit 103 relative to the base platform 102 is fixed, the real-time position of the base platform 102 is known, and when performing flatness detection on the base platform 101, a specific position where the flatness of the base platform 101 exceeds a set threshold may be known, which is convenient for an equipment worker to check.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (10)
1. A defect detection apparatus, comprising:
a base;
the base station is positioned on the base and suspended above the base;
and the flatness detection unit is positioned on the base platform and is used for measuring and obtaining the flatness of the surface of the base platform, and when the measured flatness exceeds a set threshold value, a signal for stopping the operation of the defect detection equipment is sent.
2. The defect detection apparatus of claim 1, wherein the flatness detection unit includes a light emitting unit for emitting detection light to irradiate the surface of the susceptor, a light sensing unit for receiving reflected light from the surface of the susceptor to generate an electrical signal, a processing unit for acquiring the flatness of the surface of the susceptor based on the electrical signal, and a judging unit for judging whether the acquired flatness exceeds the set threshold, and when the acquired flatness exceeds the set threshold, issuing a signal to stop the operation of the defect detection apparatus.
3. The defect detection apparatus of claim 1, wherein the flatness obtained by the measurement is expressed by a transmission time of light obtained by the measurement, the set threshold is a set standard transmission time, and when the transmission time of light obtained by the measurement is greater than or less than the standard transmission time, it is judged that the flatness obtained by the measurement exceeds the set threshold.
4. The defect detection apparatus of claim 1, wherein the flatness obtained by the measurement is represented by a distance obtained by the measurement, the set threshold is a set standard distance, and when the distance obtained by the measurement is greater than or less than the standard distance, it is judged that the flatness obtained by the measurement exceeds the set threshold.
5. The defect detection apparatus of claim 1, wherein the flatness detection unit comprises a laser ranging sensor or a TOF sensor.
6. The defect detection apparatus according to claim 1, wherein the flatness obtained by the measurement is represented by a detection image obtained by the measurement, the set threshold is a set standard image, and when the detection image does not match the standard image, it is judged that the flatness obtained by the measurement exceeds the set threshold.
7. The defect detection apparatus of claim 1, wherein the flatness detection unit comprises a TDI-CCD image sensor.
8. The defect inspection apparatus of claim 1, wherein an air bearing is disposed between the base platform and the pedestal, the air bearing configured to suspend the base platform above the pedestal.
9. The defect inspection apparatus of claim 1, further comprising a drive unit coupled to the base for driving the base to move relative to the base.
10. The apparatus of claim 1, wherein the apparatus is configured to inspect a reticle for defects, and wherein the stage is configured to receive a reticle to be inspected.
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| CN202010848316.1A CN112082517B (en) | 2020-08-21 | 2020-08-21 | Defect detecting apparatus |
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| CN202010848316.1A CN112082517B (en) | 2020-08-21 | 2020-08-21 | Defect detecting apparatus |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116609493A (en) * | 2023-07-21 | 2023-08-18 | 宁德时代新能源科技股份有限公司 | Indentation detection method, laminated cell manufacturing method and device and electronic equipment |
| CN117268257A (en) * | 2023-08-18 | 2023-12-22 | 国能锅炉压力容器检验有限公司 | Micro-pit detection equipment and method |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11104741A (en) * | 1997-09-29 | 1999-04-20 | Amutec:Kk | Method of and device for detecting bending angle of bending machine |
| CN101900952A (en) * | 2010-08-02 | 2010-12-01 | 中南大学 | Mask aligner mask platform adopting magnetic suspension technology |
| CN102809346A (en) * | 2011-05-31 | 2012-12-05 | 上海微电子装备有限公司 | Position measuring device of motion platform and measuring method of position measuring device |
| CN103630098A (en) * | 2013-11-14 | 2014-03-12 | 中国科学院上海光学精密机械研究所 | Non-contact detection method of motion parallelism of linear displacement platform |
| US20150226539A1 (en) * | 2013-06-14 | 2015-08-13 | Kla-Tencor Corporation | System and method for determining the position of defects on objects, coordinate measuring unit and computer program for coordinate measuring unit |
| CN105486255A (en) * | 2015-12-01 | 2016-04-13 | 江苏帝业仪器科技有限公司 | Linear guide pair precision detection method |
| CN105509660A (en) * | 2015-11-30 | 2016-04-20 | 广东长盈精密技术有限公司 | Flatness measurement method |
| CN110186397A (en) * | 2019-04-12 | 2019-08-30 | 华中科技大学 | A kind of guide rail parallelism measuring device and method |
-
2020
- 2020-08-21 CN CN202010848316.1A patent/CN112082517B/en active Active
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH11104741A (en) * | 1997-09-29 | 1999-04-20 | Amutec:Kk | Method of and device for detecting bending angle of bending machine |
| CN101900952A (en) * | 2010-08-02 | 2010-12-01 | 中南大学 | Mask aligner mask platform adopting magnetic suspension technology |
| CN102809346A (en) * | 2011-05-31 | 2012-12-05 | 上海微电子装备有限公司 | Position measuring device of motion platform and measuring method of position measuring device |
| US20150226539A1 (en) * | 2013-06-14 | 2015-08-13 | Kla-Tencor Corporation | System and method for determining the position of defects on objects, coordinate measuring unit and computer program for coordinate measuring unit |
| CN103630098A (en) * | 2013-11-14 | 2014-03-12 | 中国科学院上海光学精密机械研究所 | Non-contact detection method of motion parallelism of linear displacement platform |
| CN105509660A (en) * | 2015-11-30 | 2016-04-20 | 广东长盈精密技术有限公司 | Flatness measurement method |
| CN105486255A (en) * | 2015-12-01 | 2016-04-13 | 江苏帝业仪器科技有限公司 | Linear guide pair precision detection method |
| CN110186397A (en) * | 2019-04-12 | 2019-08-30 | 华中科技大学 | A kind of guide rail parallelism measuring device and method |
Non-Patent Citations (1)
| Title |
|---|
| 何乐 等: "一种步进扫描投影光刻机承片台不平度检测新技术", 《光学学报》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116609493A (en) * | 2023-07-21 | 2023-08-18 | 宁德时代新能源科技股份有限公司 | Indentation detection method, laminated cell manufacturing method and device and electronic equipment |
| CN116609493B (en) * | 2023-07-21 | 2023-09-22 | 宁德时代新能源科技股份有限公司 | Indentation detection method, laminated cell manufacturing method and device and electronic equipment |
| CN117268257A (en) * | 2023-08-18 | 2023-12-22 | 国能锅炉压力容器检验有限公司 | Micro-pit detection equipment and method |
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| CN112082517B (en) | 2022-07-05 |
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