CN112051711A - Exposure equipment - Google Patents

Abstract

The invention provides an exposure device, comprising an exposure platform for placing an object to be exposed and an exposure device that can move relative to the exposure platform. The movement direction of the exposure device relative to the exposure platform includes an exposure direction and a stepping direction; the exposure device is along the exposure direction. When moving, the exposed object is exposed, and when the exposure device moves along the stepping direction, the exposure area on the exposed object is changed; The centrally arranged exposure head includes a light source for emitting light and a lens for focusing light. Different from the prior art, at least two exposure heads are arranged along the stepping direction of the exposure device, so that when the exposure device moves along the exposure direction, at least two exposure heads can perform exposure simultaneously, which improves the exposure efficiency.

Description

an exposure device

technical field

The present invention relates to the technical field of exposure equipment, in particular to an exposure equipment with multiple exposure heads.

Background technique

Exposure equipment is a kind of photoreaction to the photoreactive material on the exposed object by using the principle of photoreaction.

In the prior art exposure equipment, one is imaging exposure through a film (Film), and the other is imaging exposure through a digital micromirror wafer (DMD). There are some disadvantages in using the film process: for example, alignment and adjustment are required, and the production efficiency is low; high-energy light source exposure cannot be used, and the speed is slow. The use of DMD exposure can eliminate the use of film. Therefore, the process of light painting and alignment of film can be omitted, and the exposure light source of DMD is exposure, and the exposure speed is improved. However, DMD imaging exposure uses the projection principle, the mechanical part is quite complicated, and the power of the formed light spot group is limited, so the exposure energy projected to the working surface has an upper limit, so the thickness of the photosensitive material that can be exposed is relatively thin.

In the prior art, there is also a method of direct exposure through a single light source. This exposure method has high energy and simple structure, but the spot area of a single light source is small. For large-area or complex exposure patterns, the exposure efficiency of a single light source is very low.

SUMMARY OF THE INVENTION

In order to overcome the defects of the prior art, the present invention provides an exposure device with high efficiency and high exposure energy.

In order to achieve the above object, the present invention provides an exposure device, comprising an exposure platform for placing an object to be exposed and an exposure device that can move relative to the exposure platform, and the movement direction of the exposure device relative to the exposure platform includes an exposure direction and a stepping direction; When the exposing device moves along the exposure direction, it exposes the object to be exposed; when the exposing device moves in the stepping direction, it changes the exposure area on the object to be exposed; the exposing device includes at least one set of exposure head groups, and the exposure head group includes at least two edge The exposure head is arranged concentrically in the stepping direction, and the exposure head includes a light source for emitting light and a lens for focusing light.

Different from the prior art, at least two exposure heads are arranged along the stepping direction of the exposure device, so that when the exposure device moves along the exposure direction, at least two exposure heads can perform exposure simultaneously, which improves the exposure efficiency.

In one embodiment, in each exposure head group, the exposure heads are evenly distributed along the stepping direction.

In one of the embodiments, in each exposure head group, the exposure heads are closely arranged along the stepping direction.

In one embodiment, in each exposure head group, the number N of exposure heads is at least 20.

In one of the embodiments, at least two groups of exposure head groups are arranged along the exposure direction, and each of the two groups of exposure head groups is arranged in an off-center manner.

In one of the embodiments, the step size w of the single movement of the exposure device along the stepping direction is greater than or equal to 1 um.

In one embodiment, during the exposure process, the exposure device first moves in the exposure direction, then moves in the stepping direction, then moves in the opposite direction of the exposure direction, and moves in the stepping direction again, and the above process is repeated.

In one embodiment, during the exposure process, the exposure device first moves in the exposure direction, then moves in the opposite direction of the exposure direction, and then moves in the stepping direction, and the above process is repeated.

In one of the embodiments, each exposure head is provided with an alignment device, and the alignment device is used to acquire and compensate for the position offset of the exposure head.

In one of the embodiments, each exposure head group is provided with an alignment device, and the alignment device is used to acquire and compensate for the position offset of the exposure head group.

In one of the embodiments, the exposure device is provided with an alignment device, and the alignment device is used to acquire and compensate for the position offset of the exposure device.

In one of the embodiments, an alignment device is arranged on the exposure platform, and the alignment device is used to acquire and compensate for the position offset of the exposure head.

In one embodiment, the exposure head group includes at least two exposure head rows arranged along the exposure direction, each of the two exposure head rows is arranged concentrically, and the wavelengths of the light sources of the exposure heads of each of the two exposure head rows are different from each other. same.

In one of the embodiments, the exposure head group includes three rows of exposure head rows arranged along the exposure direction.

In one of the embodiments, the wavelength range of the light source of the exposure head is 100nm-420nm.

An exposure method for exposing an object to be exposed by using the above-mentioned exposure equipment, wherein the object to be exposed has an exposure range to be exposed, comprising the following steps:

A1. Divide the exposure range into at least one exposure block along the stepping direction, each exposure block is divided into at least one exposure area along the stepping direction, and one exposure block has the corresponding exposure head, and the exposure head can An exposure area is exposed;

A2. The exposure device moves along the exposure direction, and the exposure head exposes an exposure area of the corresponding exposure block;

A3. The exposure device moves in the stepping direction, so that the exposure head can expose another exposure area.

An exposure method for exposing an object to be exposed by an exposure device, the object to be exposed has an exposure range to be exposed, and the movement direction of the exposure device includes an exposure direction and a stepping direction, including the following steps:

S1. Divide the exposure range into at least one exposure block, and each exposure block is divided into at least one exposure area;

S2. The exposure device is aligned with one exposure area of at least one exposure block;

S3. The exposure device moves along the exposure direction to expose an exposure area of at least one exposure block;

S4. The exposure device moves along the stepping direction to align another exposure area of at least one exposure block.

In one embodiment, the exposure method further includes the following steps: S5. The exposure device moves in the opposite direction of the exposure direction to expose an exposure area of at least one exposure block; step S5 is located between the step S3 and the step S4 .

In one embodiment, the exposure method further includes the following steps: S5. The exposure device moves in the opposite direction of the exposure direction to expose another exposure area of at least one exposure block; step S5 is located after the step S4.

Description of drawings

In order to illustrate the technical solutions in the embodiments of the present invention more clearly, the following briefly introduces the accompanying drawings used in the description of the embodiments. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention. For those of ordinary skill in the art, other drawings can also be obtained from these drawings without creative effort.

1 is a schematic diagram of an exposure apparatus having an exposure head group;

Fig. 2 is the schematic diagram of exposure head arrangement;

3 is a schematic diagram of the arrangement of multiple exposure head groups;

Fig. 4 is the schematic diagram of the exposure mode of exposure head;

5 is a schematic diagram of an exposure apparatus having an exposure head row;

6 is a schematic diagram of a multi-row exposure head row arrangement.

Detailed ways

In order to make the above objects, features and advantages of the present invention more clearly understood, the present invention will be further described below with reference to the accompanying drawings and embodiments.

It should be noted that specific details are set forth in the following description in order to facilitate a thorough understanding of the present invention. However, the present invention can be implemented in many other ways different from those described herein, and those skilled in the art can make similar promotions without departing from the connotation of the present invention. Accordingly, the present invention is not limited by the specific embodiments disclosed below.

As shown in Figures 1, 2, and 3, exposure equipment A is used to expose object B to be exposed. Exposure equipment A includes an exposure platform 1 and an exposure device 2 that can move relative to exposure platform 1. Object B to be exposed is placed on the exposure platform 1, with the movement of the exposure platform 1 relative to the exposure device 2, to receive all or part of the exposure of the exposure device 2. The relative movement here may be that the exposure platform 1 is stationary and the exposure device 2 is moving, or the exposure platform 1 is moving and the exposure device 2 is stationary, or both the exposure platform 1 and the exposure device 2 are moving.

During exposure work, the movement of the exposure device 2 relative to the exposure platform 1 includes the exposure direction x and the stepping direction y. When the exposure device 2 moves along the exposure direction x, it exposes the exposed object B; when the exposure device 2 moves along the stepping direction y, it changes the exposure area on the exposed object B. Due to the limitations of the function and size of the exposure device 2, after a single movement along the exposure direction x, the exposure device 2 cannot complete the exposure of the entire range that needs to be exposed on the object B to be exposed. Therefore, it can be understood that the exposure device 2 will expose the object to be exposed. The range that needs to be exposed on B is divided into multiple exposure areas, the exposure device 2 completes the exposure of one of the exposure areas after one movement along the exposure direction x, and then the exposure device 2 moves along the stepping direction y to change the exposure area, The exposure can be continued for another exposure area. In this embodiment, the exposure direction x and the stepping direction y are vertical.

As shown in FIG. 2 , in the embodiment of the present invention, the exposure device 2 includes at least one set of exposure head groups 21 , and each exposure head group 21 includes at least two exposure heads 211 arranged concentrically along the stepping direction y. The exposure head 211 includes a light source 211a for emitting light and a lens 211b for focusing light. The light source 211a can be an LED light source, a laser source (solid laser source, gas laser source, excimer laser source), etc., and the emitted light can be parallel light or non-parallel light. The lens 211b is used to focus the light emitted by the light source 211a to form a Focusing the spot 211c increases the brightness, energy, etc. of the light, making the exposure more sufficient. The two exposure heads 211 are arranged concentrically along the stepping direction y. When the exposure device 2 moves along the exposure direction x, the two exposure heads 211 expose the object B to be exposed at the same time, and then the exposure device 2 moves along the stepping direction y. The two exposure heads 211 can continue to expose another area of the object B to be exposed at the same time. Two exposure heads 211 perform exposure at the same time, and the exposure speed is significantly higher than that of a single exposure head 211, and the time to complete the exposure is significantly reduced. It can be seen that the more the number of exposure heads 211, the more areas that can be exposed to the exposed object B when the exposure device 2 moves in the exposure direction x, and the exposure speed will be higher, and the time to complete the exposure will be less, which improves the work efficiency.

As shown in FIG. 3 , in each exposure head group 21 , the exposure heads 211 are evenly distributed along the stepping direction y, that is, the center distances of the exposure heads 211 are equal. This is equivalent to dividing the exposure range of the object B to be exposed into a plurality of exposure areas. During the exposure work, the plurality of exposure heads 211 simultaneously perform exposure work and step in the corresponding exposure areas, and also end the exposure work at the same time. , avoiding repeated exposures.

As shown in FIG. 3 , in each exposure head group 21 , the exposure heads 211 are closely arranged along the stepping direction y. The close arrangement here can be understood as the outlines of the exposure heads next to each other, so that the space of the exposure device can be fully utilized as much as possible, and the exposure heads can be arranged as much as possible, so that the exposure speed and efficiency can be maximized.

The outlines of each exposure head are closely arranged, but since the size of the light spot 211c formed by focusing the light source 211a by the lens 211b is usually smaller than that of the exposure head, there will be a large distance between the adjacent light spots 211c. , the exposure device needs to move in the stepping direction y to continue exposing the distance between the light spots 211c, usually multiple stepping movements are required to achieve full exposure within the exposure range.

Preferably, in each group of exposure heads 21, the number N of exposure heads 211 is at least 20. The more the number of exposure heads 211, the larger the exposure area at one time, and the fewer times the exposure device 2 needs to step. Exposure efficiency is improved.

As shown in FIG. 3 , at least two groups of exposure head groups 21 are arranged along the exposure direction x, and each two groups of exposure head groups 21 are arranged in an off-center manner, that is, the two exposure heads 211 in each two groups of exposure head groups 21 are Arranged off-center, the connecting line of the two exposure heads 211 forms an angle with the exposure direction x. The purpose of this setting is to make each group of exposure groups compensate for each other during exposure, there will be gaps between the exposure areas of each exposure head 211 in one group of exposure groups, and each exposure head 211 in the other group of exposure groups will at least partially The gap is supplemented, which reduces the number of times the exposure device needs to step, and improves the exposure efficiency of the exposure apparatus A. If the number of exposure groups is large enough to completely fill the gap, then the exposure of the exposure range can be completed with one movement in the exposure direction x, and the number of movements in the step direction y is 0.

Preferably, the step length w of the single movement of the exposure device 2 along the stepping direction y is greater than or equal to 1um. If the step length is too small, the exposure head will repeatedly expose the exposed area, which not only wastes the exposure efficiency, but also makes the repeatedly exposed area different from Areas that have not been repeatedly exposed produce unevenness.

As shown in Figure 4, in the exposure process, the exposure device 2 first moves along the exposure direction x to expose an exposure area, and then moves along the step direction y, steps by one step, replaces the exposure area, and then moves along the exposure direction. Move in the opposite direction of x to expose the new exposure area. In this way, the exposure head completes the exposure of two adjacent areas, steps to the next exposure area, and repeats the above process to complete the exposure of the entire exposure range.

Preferably, in the exposure process, the exposure device 2 first moves along the exposure direction x to expose an exposure area, then moves along the opposite direction of the exposure direction x, exposes the exposure area again, and then moves along the stepping direction y , to change the exposure area. In this way, the exposure head completes two exposures of the same area, and steps to the next exposure area, and the above process is repeated to complete the exposure of the entire exposure range.

As shown in FIG. 1, each exposure head is equipped with an alignment device 212. During the working process, the expansion and contraction caused by temperature and the offset caused by vibration will cause the exposure range and exposure area to be offset relative to each exposure head. The positioning device 212 is used to obtain the position offset of each exposure head and compensate for the position offset. The alignment device 212 here may include an alignment camera for grabbing the position point, a processor for calculating the position offset, and a driver for performing position compensation on each exposure head. Usually, the driver is a linear motor, or other drives that can drive The driver of the exposure head.

Preferably, each exposure head group is equipped with an alignment device 212, and the alignment device 212 can obtain the position offset of each exposure head group, adjust the exposure head, and compensate for the position offset.

Preferably, the exposure device is provided with an alignment device 212, and the alignment device 212 can obtain the overall position offset of the exposure device and adjust the exposure head to compensate for the position offset.

As shown in FIG. 1 , an alignment device 212 is provided on the exposure platform 1 , and the alignment device 212 can obtain the position offset of the exposed object B and adjust the exposure head to compensate for the position offset.

As shown in FIGS. 5 and 6 , the exposure head group 21 includes at least two rows of exposure head rows 22 arranged along the exposure direction x, and every two rows of exposure head rows 22 are arranged concentrically, that is, the The heads are arranged concentrically, and the direction of the center line of the two exposure heads is parallel to the exposure direction x. The wavelengths of the light sources 211a of the exposure heads 211 of the exposure head rows 22 of every two rows are different from each other. Since the exposure layer on the exposure area has a certain thickness, different wavelengths of light can expose different thicknesses. Light with a short wavelength can expose the surface layer of the exposure layer, and light with a longer wavelength can expose the deeper area of the exposure layer. Exposure to light with longer wavelengths can expose the underlying layers of the exposure layer. Therefore, each exposure head group 21 is provided with concentrically arranged exposure head rows 22 with different wavelengths, which can expose different thicknesses of the exposure layer in one movement in the exposure direction x, which results in more thorough exposure and higher efficiency.

As shown in FIG. 6 , the exposure head group 21 includes three rows of exposure head rows 22 arranged along the exposure direction x. In one movement in the exposure direction x, the shallow layer, the middle layer and the bottom layer of the exposure layer are exposed at the same time, and the exposure is more thorough. higher efficiency. In FIG. 6 , the three exposure head rows 22 are arranged adjacently. In other feasible embodiments, the exposure head rows can also be arranged separately, and other exposure head groups are arranged between the two exposure head rows.

Preferably, the wavelength range of the light source 211a of the exposure head 211 is 100nm-420nm. In this embodiment, what the exposure device A needs to expose is the solder resist layer of the circuit board, and different exposure heads 211 with wavelengths of 100nm-420nm can respectively expose the surface layer, the middle layer and the bottom layer of the solder resist layer.

As shown in FIG. 4 , the method for exposing the exposed object B by using the above-mentioned exposure device 2 includes the following steps:

A1. Divide the exposure range of the exposure object B into at least one exposure block along the stepping direction, each exposure block is divided into at least one exposure area along the stepping direction, and an exposure block has an exposure head corresponding to it, and the exposure head can An exposure area is exposed.

In step A1, the exposure range is divided into at least one exposure block along the stepping direction, and each group of exposure heads includes at least one exposure head arranged concentrically along the stepping direction, so one exposure block corresponds to one exposure head. If each exposure head group includes multiple rows of exposure heads, then one exposure block corresponds to multiple exposure heads.

An exposure block is divided into at least one exposure area along the stepping direction, and one exposure area can be exposed by moving an exposure head along the exposure direction.

In step A2, the exposure device moves along the exposure direction, and the exposure head exposes an exposure area of the corresponding exposure block. In step A3, the exposure device moves in the stepping direction, so that the exposure head can expose another exposure area. Generally speaking, after the exposure device moves in the stepping direction, the exposure head is moved to the position of another exposure area, usually an adjacent exposure area, so that the exposure head can expose the exposure area.

The above exposure method can be understood as that the exposure device simultaneously exposes a plurality of exposure blocks of the object to be exposed. Specifically, the exposure device has movement along the exposure direction and movement along the stepping direction, and the exposure step includes:

S1. Divide the exposure range into at least one exposure block, and each exposure block is divided into at least one exposure area;

S2. The exposure device is aligned with one exposure area of at least one exposure block;

S3. The exposure device moves along the exposure direction to expose an exposure area of at least one exposure block;

S4. The exposure device moves along the stepping direction to align another exposure area of at least one exposure block.

In addition, the exposure step can also include:

S5. The exposure device moves in the opposite direction of the exposure direction to expose one exposure area of at least one exposure block.

Step S5 is located between step S3 and step S4, that is, after the same exposure area of the exposure device is exposed twice, the exposure area is changed.

In other feasible embodiments, S5 in the exposure step may also be that the exposure device moves in the opposite direction of the exposure direction to expose another exposure area of at least one exposure block; step S5 is located after step S4. This can be understood as that after the exposure device exposes the exposure area, it changes the exposure area and exposes the new exposure area.

It should be noted that the directional words such as "up", "down", "left", and "right" described in the embodiments of the present invention are described from the angles shown in the drawings, and should not be construed as implementing the present invention. example limitations. Also, in this context, it will also be understood that when an element is referred to as being formed "on" or "under" another element, it can not only be directly formed "on" or "under" the other element, but also It can also be formed "on" or "under" another element indirectly through intervening elements.

The above content is a further detailed description of the present invention in combination with specific preferred embodiments, and it cannot be considered that the specific implementation of the present invention is limited to these descriptions. For those of ordinary skill in the technical field of the present invention, without departing from the concept of the present invention, some simple deductions or substitutions can be made, which should be regarded as belonging to the protection scope of the present invention.

Claims (19)

1. An exposure device comprises an exposure platform for placing an object to be exposed and an exposure device which can move relative to the exposure platform, wherein the movement direction of the exposure device relative to the exposure platform comprises an exposure direction and a stepping direction; when the exposure device moves along the exposure direction, exposing the exposed object, and when the exposure device moves along the stepping direction, changing an exposure area on the exposed object; the exposure device is characterized by comprising at least one exposure head group, wherein the exposure head group comprises at least one exposure head concentrically arranged along the stepping direction, and the exposure head comprises a light source for emitting light and a lens for focusing the light.

2. The exposure apparatus according to claim 1, wherein in each of the exposure head groups, the exposure heads are uniformly distributed in the step direction.

3. The exposure apparatus according to claim 2, wherein in each of the exposure head groups, the exposure heads are closely arranged in the step direction.

4. The exposure apparatus according to claim 1, wherein the number N of the exposure heads in each of the exposure head groups is at least 20.

5. The exposure apparatus according to claim 1, wherein the exposure head groups are arranged in at least two groups along the exposure direction, each of the two groups being arranged in an off-center manner.

6. The exposure apparatus according to claim 1, wherein a step w of a single movement of the exposer in the stepping direction is equal to or larger than 1 um.

7. The exposure apparatus according to claim 1, wherein during exposure, the exposer moves in the exposure direction, then moves in the step direction, then moves in a direction opposite to the exposure direction, and moves in the step direction again, and the above processes are repeated.

8. The exposure apparatus according to claim 1, wherein during exposure, the exposer moves in the exposure direction, then moves in a direction opposite to the exposure direction, and then moves in the step direction, and the above processes are repeated.

9. The exposure apparatus according to claim 1, wherein each of the exposure heads is provided with an alignment apparatus for acquiring and compensating a positional offset of the exposure head.

10. The exposure apparatus according to claim 1, wherein each exposure head group is provided with an alignment apparatus, and the alignment apparatus is configured to acquire and compensate a positional offset of the exposure head group.

11. The exposure apparatus according to claim 1, wherein the exposer is provided with an alignment apparatus for acquiring and compensating a positional offset of the exposer.

12. The exposure apparatus according to any one of claims 9, 10, or 11, wherein an alignment apparatus is cooperatively disposed on the exposure stage, and the alignment apparatus is configured to acquire and compensate a positional offset of the exposure head.

13. The exposure apparatus according to claim 1, wherein the exposure head group includes at least two rows of exposure head rows arranged in an exposure direction, each two rows of the exposure head rows being arranged concentrically, and the wavelengths of the light sources of the exposure heads of each two rows of the exposure head rows being different from each other.

14. The exposure apparatus according to claim 13, wherein the exposure head group includes three rows of exposure head rows arranged in an exposure direction.

15. The exposure apparatus according to claim 13, wherein a wavelength range of the light source of the exposure head is 100nm to 420 nm.

16. An exposure method for exposing an object to be exposed with the exposure apparatus according to claims 1 to 15, the object to be exposed having an exposure range to be exposed, comprising the steps of:

A1. dividing an exposure range into at least one exposure block along a stepping direction, wherein each exposure block is divided into at least one exposure area along the stepping direction, one exposure block is provided with an exposure head corresponding to the exposure block, and the exposure head can expose one exposure area;

A2. the exposure device moves along the exposure direction, and the exposure head exposes one exposure area of the corresponding exposure block;

A3. the exposer moves in a step direction so that the exposure head can expose another exposure area.

17. An exposure method for exposing an object to be exposed by an exposure apparatus, the object to be exposed having an exposure range to be exposed, a moving direction of the exposure apparatus including an exposure direction and a stepping direction, the method comprising the steps of:

s1, dividing an exposure range into at least one exposure block, wherein each exposure block is divided into at least one exposure area;

s2, aligning an exposure area of at least one exposure block by an exposure device;

s3, the exposure device moves along the exposure direction to expose one exposure area of at least one exposure block;

and S4, the exposure device moves along the stepping direction and is aligned to the other exposure area of at least one exposure block.

18. The exposure method for exposing an object to be exposed by an exposure apparatus according to claim 17, further comprising the steps of:

s5, the exposure device moves along the direction opposite to the exposure direction to expose one exposure area of at least one exposure block;

the step S5 is located between the step S3 and the step S4.

19. The exposure method for exposing an object to be exposed by an exposure apparatus according to claim 17, further comprising the steps of:

s5, the exposure device moves along the direction opposite to the exposure direction to expose the other exposure area of at least one exposure block;

the step S5 is located after the step S4.

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