CN112044300B - Preparation device and preparation process for electronic-grade silicon dioxide etching solution - Google Patents
Preparation device and preparation process for electronic-grade silicon dioxide etching solution Download PDFInfo
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- CN112044300B CN112044300B CN202010862765.1A CN202010862765A CN112044300B CN 112044300 B CN112044300 B CN 112044300B CN 202010862765 A CN202010862765 A CN 202010862765A CN 112044300 B CN112044300 B CN 112044300B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
- B01F25/51—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle in which the mixture is circulated through a set of tubes, e.g. with gradual introduction of a component into the circulating flow
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
- C09K13/00—Etching, surface-brightening or pickling compositions
- C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
- C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
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Abstract
A preparation device and a preparation process for an electronic-grade silicon dioxide etching solution relate to the technical field of light-sensitive chemistry. The preparation device comprises a first storage tank for storing raw material hydrofluoric acid, a second storage tank for storing raw material ammonium fluoride, a third storage tank for storing raw material surfactant, a fourth storage tank for storing raw material ultrapure water, a mixing tank and a precision filter. The first storage tank, the second storage tank, the third storage tank and the fourth storage tank are selectively communicated with the mixing tank, and the outlet of the mixing tank is communicated with the inlet of the precision filter. The structure is simple, the simplification of the complex process is realized, the simplification of the production flow is facilitated, the operation difficulty is reduced, and the positive significance on the improvement of the production efficiency is realized. The preparation process is simple to operate and easy to implement, the whole production process is simplified, and the production efficiency is improved.
Description
Technical Field
The invention relates to the technical field of light-sensitive chemistry, in particular to a preparation device and a preparation process for an electronic-grade silicon dioxide etching solution.
Background
The existing equipment for preparing the electronic-grade silicon dioxide etching liquid has a complex structure, the matching control difficulty among all parts is high, the use is relatively complicated, and the production efficiency is inhibited to a certain extent.
In view of this, the present application is specifically made.
Disclosure of Invention
The first purpose of the invention is to provide a preparation device for an electronic-grade silicon dioxide etching solution, which has a simple structure, realizes simplification of complex processes, is beneficial to simplifying production flow and reducing operation difficulty, and has positive significance for improving production efficiency.
The second purpose of the invention is to provide a preparation process for the electronic-grade silicon dioxide etching solution, which is simple to operate and easy to implement, so that the whole production process is more simplified, and the production efficiency is improved.
The embodiment of the invention is realized by the following steps:
a preparation device for an electronic grade silicon dioxide etching solution comprises: the device comprises a first storage tank for storing raw material hydrofluoric acid, a second storage tank for storing raw material ammonium fluoride, a third storage tank for storing raw material surfactant, a fourth storage tank for storing raw material ultrapure water, a mixing tank and a precision filter. The first storage tank, the second storage tank, the third storage tank and the fourth storage tank are selectively communicated with the mixing tank, and the outlet of the mixing tank is communicated with the inlet of the precision filter.
Further, the compounding tank includes: a tank body, a tank cover and an auxiliary mixing pipe. The auxiliary mixing pipe is provided with a power pump, the outlet end of the auxiliary mixing pipe is arranged on the bottom wall of the tank body and close to the side wall of the tank body, and the inlet end of the auxiliary mixing pipe is arranged on the side wall of the other side of the tank body and close to the top of the tank body. The inlet end and the outlet end are oppositely arranged.
Furthermore, the mouth of the inlet end is provided with an expanding section, the expanding direction of the expanding section is arranged along the length direction of the groove body, and the expanding amount of the expanding section is gradually reduced along the inflow direction of the inlet end.
Further, the body of assisting the pipe that mixes still disposes sampling mechanism, and sampling mechanism includes: sampling piece, output tube, sample core and drive assembly.
The sampling piece is provided with a cylindrical inner cavity, the sampling piece is connected with the pipe body of the auxiliary mixing pipe, and the inner cavity is communicated with the pipe body of the auxiliary mixing pipe. The output tube is connected with the sampling part and communicated with the inner cavity. The sample core is cylindricly, and the sample core rotationally cooperates in the inner chamber, and the outer wall of sample core all rotates sealedly with the inner wall of sample piece.
The middle part of the sampling core is provided with a sampling groove which is formed by the side wall of the sampling core in a concave way. The sampling core is in transmission connection with the driving assembly so that the sampling core can transfer liquid in the auxiliary mixing pipe to the output pipe in the rotating process.
Further, the sampling groove is formed by the sidewall of the sampling core being recessed in the radial direction thereof, and the width of the sampling groove decreases in the recessed direction of the sampling groove.
Furthermore, the rotating axis of the sampling core is perpendicular to the axis of the tube body of the auxiliary mixing tube at the sampling position.
Furthermore, the pipe wall of the output pipe is provided with an air blowing pipe, and the air blowing pipe is arranged towards the opening of the sampling groove.
Further, the sampling mechanism further comprises: and a conveying assembly. The conveying assembly comprises a rotary table, a first sliding chute, a second sliding chute and a driver. The first sliding groove is arc-shaped and is arranged around the rotary disc, the rotary disc is provided with a notch for accommodating the sample cup, and the notch is formed by the edge of the rotary disc along the radial direction of the rotary disc in a concave mode, so that the rotary disc can push the sample cup to slide along the first sliding groove by utilizing the notch in the rotating process. The second sliding groove is arranged at the tail end of the first sliding groove and used for receiving the sample cup which slides out of the first sliding groove, and therefore the sample cup is led out. The driver is in driving connection with the turntable to intermittently drive the turntable.
Further, the transfer assembly further comprises a cup cylinder. The cup cylinder is arranged above the turntable and arranged towards the sliding chute and is used for conveying the sample cup to the notch.
A preparation process for preparing the electronic-grade silicon dioxide etching solution by using the preparation device comprises the following steps: mixing raw hydrofluoric acid, raw ammonium fluoride, raw surfactant and raw ultrapure water in a mixing tank according to a preset proportion, filtering by a precision filter, and subpackaging into a warehouse.
The embodiment of the invention has the beneficial effects that:
in the use process of the preparation device for the electronic-grade silicon dioxide etching liquid, provided by the embodiment of the invention, the first storage tank, the second storage tank, the third storage tank and the fourth storage tank are used for directly storing various raw materials before production, after the production is started, the raw materials are input into the mixing tank according to corresponding proportions to complete mixing, and after the raw materials are qualified, the raw materials are filtered by the precision filter, and then the raw materials can be subpackaged and put in storage.
In general, the preparation device for the electronic-grade silicon dioxide etching solution provided by the embodiment of the invention has a simple structure, realizes simplification of complex processes, is beneficial to simplifying the production flow and reducing the operation difficulty, and has positive significance for improving the production efficiency. The preparation process for the electronic-grade silicon dioxide etching solution provided by the embodiment of the invention is simple to operate and easy to implement, so that the whole production process is more simplified, and the production efficiency is improved.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present invention and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained according to the drawings without inventive efforts.
FIG. 1 is a schematic structural diagram of a manufacturing apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a mixing tank of a preparation apparatus according to an embodiment of the present invention;
FIG. 3 is a schematic view of the inlet end of the auxiliary mixing tube of the FIG. 2 tank;
fig. 4 is a schematic view of a first perspective of an arrangement manner of a sampling member of a sampling mechanism of a preparation apparatus according to an embodiment of the present invention;
fig. 5 is a schematic diagram of a second perspective view illustrating an arrangement manner of a sampling member of a sampling mechanism of a manufacturing apparatus according to an embodiment of the present invention;
fig. 6 is a schematic internal structural diagram of an arrangement manner of a sampling member of a sampling mechanism of a preparation apparatus according to an embodiment of the present invention;
fig. 7 is a schematic internal structural diagram of another view angle of an arrangement manner of a sampling member of a sampling mechanism of a preparation apparatus according to an embodiment of the present invention;
FIG. 8 is a schematic structural diagram of a sampling core of a sampling mechanism of a preparation device according to an embodiment of the present invention;
FIG. 9 is a schematic cross-sectional view of a sampling core of a sampling mechanism of a preparation device according to an embodiment of the present invention;
FIG. 10 is a schematic view of the combination of a sampling core and a sampling member of a sampling mechanism of a preparation device according to an embodiment of the present invention;
FIG. 11 is a schematic view of the sampling core and the sampling member of the sampling mechanism of the preparation device provided in the embodiment of the present invention in cooperation from another viewing angle;
FIG. 12 is a schematic view of a conveying assembly of a preparation apparatus according to an embodiment of the present invention;
fig. 13 is a schematic flow chart of a manufacturing process according to an embodiment of the invention.
Icon: a manufacturing apparatus 1000; a first reservoir 100; a second reservoir 200; a third reservoir 300; a fourth reservoir 400; a mixing tank 500; a trough 510; a slot cover 520; an auxiliary mixing pipe 600; an inlet end 610; a diameter expanding section 611; an outlet end 620; a sampling mechanism 700; a sampling member 710; an inner cavity 711; an output pipe 720; a sampling core 730; a sampling well 731; a transfer assembly 740; a turntable 741; a notch 742; a first chute 743; a second runner 744; a cup cylinder 745; a precision filter 800; a sample cup 910; a drive shaft 920; an air blow pipe 930.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are some, but not all, embodiments of the present invention. The components of embodiments of the present invention generally described and illustrated in the figures herein may be arranged and designed in a wide variety of different configurations.
Thus, the following detailed description of the embodiments of the present invention, presented in the figures, is not intended to limit the scope of the invention, as claimed, but is merely representative of selected embodiments of the invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
The terms "first," "second," "third," "fourth," and the like are used merely to distinguish one description from another, and are not to be construed as indicating or implying relative importance.
In the description of the present invention, it should also be noted that, unless otherwise explicitly specified or limited, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Examples
Referring to fig. 1, the present embodiment provides a device 1000 for preparing an electronic-grade silicon dioxide etching solution.
The manufacturing apparatus 1000 includes: a first storage tank 100 for storing raw material hydrofluoric acid, a second storage tank 200 for storing raw material ammonium fluoride, a third storage tank 300 for storing raw material surfactant, a fourth storage tank 400 for storing raw material ultrapure water, a mixing tank 500, and a precision filter 800.
The first reservoir 100, the second reservoir 200, the third reservoir 300 and the fourth reservoir 400 are all selectively communicated with the mixing tank 500, and the outlet of the mixing tank 500 is communicated with the inlet of the precision filter 800.
It should be noted that "selectively communicate" means that the time of opening (communicating) and the time of closing (disconnecting) can be flexibly selected according to actual production needs, and this function can be realized by using a control valve, for example, although other implementation manners can be selected, and is not limited thereto.
In the using process, the first storage tank 100, the second storage tank 200, the third storage tank 300 and the fourth storage tank 400 are used for directly storing various raw materials before production, after the production is started, the raw materials are input into the mixing tank 500 according to corresponding proportions to complete mixing, and after the raw materials are inspected to be qualified, the raw materials are filtered by the precision filter 800 and then are subpackaged and stored.
In general, the preparation device 1000 for the electronic-grade silicon dioxide etching solution has a simple structure, realizes simplification of complexity, is beneficial to simplifying the production flow and reducing the operation difficulty, and has positive significance for improving the production efficiency.
Further, referring to fig. 2 to 3, the mixing tank 500 includes: a tank 510, a tank cover 520, and an auxiliary mixing pipe 600.
The auxiliary mixing pipe 600 is provided with a power pump (not shown in the drawings) for driving the liquid in the auxiliary mixing pipe 600 to flow directionally. The outlet end 620 of the auxiliary mixing pipe 600 is disposed at the bottom wall of the tank 510 and near the sidewall of the tank 510, and the inlet end 610 of the auxiliary mixing pipe 600 is disposed at the other sidewall of the tank 510 and near the top of the tank 510. The inlet end 610 of the secondary mixing pipe 600 and the outlet end 620 of the secondary mixing pipe 600 are disposed to face each other.
Through the driving action of the power pump of the auxiliary mixing pipe 600, the liquid in the mixing tank 500 can continuously enter from the inlet end 610 of the auxiliary mixing pipe 600 and return to the mixing tank 500 from the outlet end 620, so that the self-circulation of the mixing tank 500 is realized, and the mixing efficiency is greatly improved.
In the mixing process, the upper layer liquid in the liquid phase of the mixing tank 500 enters the auxiliary mixing pipe 600 from the inlet end 610, and the liquid in the auxiliary mixing pipe 600 returns to the bottom of the mixing tank 500 from the outlet end 620, so that the liquid in the mixing tank 500 is stirred from the bottom, the mobile phase from the bottom to the top is realized, and the mixing effect is greatly optimized.
Alternatively, the central axes of both the inlet end 610 and the outlet end 620 may be collinear.
Further, in order to reduce the degree of disturbance of the upper liquid in the mixing tank 500 and avoid splashing of the liquid, the opening of the inlet end 610 has an expanding section 611, the expanding direction of the expanding section 611 is arranged along the longitudinal direction of the tank body 510, and the expanding amount of the expanding section 611 decreases progressively along the inflow direction of the inlet end 610. In this embodiment, the expanded diameter section 611 has a semicircular pie shape.
Please refer to fig. 4 to 11, the tube body of the auxiliary mixing tube 600 is further configured with a sampling mechanism 700, the sampling mechanism 700 includes: a sampling member 710, an output tube 720, a sampling core 730, and a driving assembly (not shown).
In the present embodiment, the sampling member 710 has a cylindrical shape, and the sampling member 710 has a cylindrical inner cavity 711 disposed coaxially therewith. The sampling member 710 is connected to the pipe body of the auxiliary mixing pipe 600 through the outer wall, and the inner chamber 711 is communicated with the pipe body of the auxiliary mixing pipe 600.
The outlet tube 720 is connected to the sampling member 710, and the outlet tube 720 communicates with the lumen 711. The sampling core 730 is cylindrical, the sampling core 730 is rotatably matched with the inner cavity 711, and the outer wall of the sampling core 730 is rotatably sealed with the inner wall of the sampling piece 710, so that in the rotating process of the sampling core 730 in the inner cavity 711, the liquid in the auxiliary mixing pipe 600 cannot leak.
The sampling core 730 has a sampling groove 731 in the middle, and the sampling groove 731 is formed by a sidewall recess of the sampling core 730. The sampling core 730 is drivingly connected to the driving assembly, so that the sampling core 730 can transfer the liquid in the auxiliary mixing tube 600 to the output tube 720 during the rotation process.
The specific sampling mode can be as follows: the sampling core 730 is driven to rotate by the driving component, so that the sampling groove 731 of the sampling core 730 rotates and faces to the lumen of the auxiliary mixing pipe 600, the sampling groove 731 is communicated with the lumen of the auxiliary mixing pipe 600, and thus liquid in the auxiliary mixing pipe 600 enters the sampling groove 731 of the sampling core 730. Then, the driving assembly is used to drive the sampling core 730 to rotate, so that the sampling groove 731 filled with the mixed liquid rotates to one side of the output tube 720, and the sampling groove 731 is communicated with the output tube 720, so that the mixed liquid in the sampling groove 731 flows into the output tube 720 and is output through the output tube 720. The sample cup 910 is used to hold the mixed liquid outputted from the output pipe 720, and the sampling is completed.
In this embodiment, the sampling slots 731 are two, two sampling slots 731 are located on two opposite sides of the sampling core 730, and the output tube 720 and the auxiliary mixing tube 600 are also located on two opposite sides of the sampling member 710, so as to improve the sampling efficiency. The sampling core 730 has a first working position and a second working position, when the sampling core 730 is located at the first working position, one sampling slot 731 is communicated with the auxiliary mixing pipe 600, and the other sampling slot 731 is communicated with the output pipe 720. When the sampling core 730 is located at the second working position, the positions of the two sampling slots 731 are opposite.
Specifically, the driving assembly may be a stepping motor or a servo motor, but is not limited thereto. The drive assembly is drivingly connected to the end of the sampling core 730 by a drive shaft 920.
Further, the sampling groove 731 is formed by a sidewall of the sampling core 730 being recessed in a radial direction thereof, and a width of the sampling groove 731 is decreased in a recessed direction of the sampling groove 731. The axis of rotation of the sampling core 730 is perpendicular to the axis of the tube of the auxiliary mixing tube 600 at the sampling position. Through this design for sample core 730 can sample more conveniently, is convenient for mix and joins in marriage the liquid and is full of sample groove 731 fast.
In order to improve the sampling precision and avoid the mutual interference between samples of different sampling batches, the wall of the output pipe 720 is provided with a gas blowing pipe 930, and the gas blowing pipe 930 is arranged towards the mouth of the sampling slot 731. In this embodiment, the two sets of blowing pipes 930 are provided, and the two sets of blowing pipes 930 are disposed on opposite sides of the output pipe 720. Taking the sampling core 730 located at the first working position or the second working position as an example, one set of the blowing pipes 930 faces one side edge of the mouth of the sampling slot 731, and the other set of the blowing pipes 930 faces the other side edge of the mouth of the sampling slot 731.
Through above design, after the thoughtlessly join in marriage liquid entering output tube 720 in the sample groove 731, control a set of gas blow pipe 930 earlier and blow, blow to sample groove 731 from a side edge of the oral area of sample groove 731, thereby blow down the remaining thoughtlessly join in marriage liquid of the outer wall of sample core 730 in the sample groove 731, close gas blow pipe 930 afterwards and open another set of gas blow pipe 930, thereby continue to blow to sample groove 731 from the opposite side edge of the oral area of sample groove 731, thereby improve the clearance thoroughness to remaining liquid greatly, improve the clearance effect greatly, avoid remaining. By this operation, interference to the sample liquid when sampling is performed by the empty sampling groove 731 next time is avoided to improve the accuracy and reliability of the sample.
Of course, other ways of avoiding interference between different batches of samples may be used. For example: the holding time of the sampling core 730 at the first working position and the second working position is prolonged, so that the liquid in the auxiliary mixing pipe 600 can thoroughly flush the sampling groove 731, and the influence of the residual liquid is eliminated.
Further, referring to fig. 12, the sampling mechanism 700 further includes: a transfer assembly 740. The transport assembly 740 includes a turntable 741, a first chute 743, a second chute 744, and a drive. The first sliding slot 743 is arc-shaped and disposed around the turntable 741, the turntable 741 has a notch 742 for accommodating the sample cup 910, and the notch 742 is formed by an edge of the turntable 741 along a radial direction thereof, so that the turntable 741 can push the sample cup 910 to slide along the first sliding slot 743 by using the notch 742 during rotation.
The second chute 744 is disposed at the rear end of the first chute 743, and is used for receiving the sample cup 910 slid out from the first chute 743, so as to guide out the sample cup 910. A drive is drivingly connected to the disc 741 for intermittently driving the disc 741.
The driver may be a servo motor, a stepping motor, or a stepping transmission member, as shown in fig. 12.
In this embodiment, the transfer assembly 740 further includes a cup cartridge 745. The cup cylinder 745 is provided above the turntable 741, faces the chute, and is used to feed the sample cup 910 to the notch 742.
Referring to fig. 13, the present embodiment further provides a process for preparing an electronic-grade silicon dioxide etching solution by using the preparation apparatus 1000, which includes: mixing raw hydrofluoric acid, raw ammonium fluoride, raw surfactant and raw ultrapure water in a mixing tank 500 according to a preset proportion, filtering by a precision filter 800, and subpackaging and warehousing.
In summary, the preparation device 1000 for the electronic-grade silicon dioxide etching solution has a simple structure, realizes simplification of complexity, facilitates simplification of a production flow, reduces operation difficulty, and has a positive significance in improving production efficiency. The preparation process for the electronic-grade silicon dioxide etching solution is simple to operate and easy to implement, so that the whole production process is simplified, and the production efficiency is improved.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. A preparation device for an electronic grade silicon dioxide etching solution is characterized by comprising:
a first storage tank for storing raw hydrofluoric acid;
a second storage tank for storing raw material ammonium fluoride;
a third reservoir for holding a feedstock surfactant;
a fourth storage tank for storing raw material ultrapure water;
a mixing tank; and
a precision filter;
the first storage tank, the second storage tank, the third storage tank and the fourth storage tank are selectively communicated with the mixing tank, and an outlet of the mixing tank is communicated with an inlet of the precision filter;
the mixing tank comprises: a tank body, a tank cover and an auxiliary mixing pipe; the auxiliary mixing pipe is provided with a power pump, the outlet end of the auxiliary mixing pipe is arranged on the bottom wall of the tank body and close to the side wall of the tank body, and the inlet end of the auxiliary mixing pipe is arranged on the side wall of the other side of the tank body and close to the top of the tank body; the inlet end and the outlet end are oppositely arranged; the mouth of the inlet end is provided with an expanding section, the expanding direction of the expanding section is arranged along the length direction of the groove body, and the expanding amount of the expanding section is gradually reduced along the inflow direction of the inlet end;
the body of assisting the pipe that mixes still disposes sampling mechanism, sampling mechanism includes: the sampling device comprises a sampling piece, an output pipe, a sampling core and a driving assembly;
the sampling piece is provided with a cylindrical inner cavity, the sampling piece is connected with the pipe body of the auxiliary mixing pipe, and the inner cavity is communicated with the pipe body of the auxiliary mixing pipe; the output pipe is connected with the sampling piece and communicated with the inner cavity; the sampling core is cylindrical, the sampling core is rotatably matched with the inner cavity, and the outer wall of the sampling core is rotatably sealed with the inner wall of the sampling piece;
the middle part of the sampling core is provided with two symmetrically arranged sampling grooves which are formed by the side wall of the sampling core in a concave way; the sampling core is in transmission connection with the driving assembly so that the sampling core can transfer the liquid in the auxiliary mixing pipe to the output pipe in the rotating process;
the pipe wall of output tube is provided with the gas blow pipe of symmetry setting, the gas blow pipe orientation the oral area of sample groove sets up for in the sample groove and the outer wall of sample core remaining thoughtlessly join in marriage the liquid and blow off.
2. The manufacturing apparatus according to claim 1, wherein the sampling groove is formed by recessing a side wall of the sampling core in a radial direction thereof, and a width of the sampling groove decreases in a direction of the recessing of the sampling groove.
3. The manufacturing apparatus as set forth in claim 1, wherein the rotational axis of the sampling core is disposed perpendicular to the axis of the tube body of the sub-mixing tube at the sampling position.
4. The manufacturing apparatus of claim 1, wherein the sampling mechanism further comprises: a transfer assembly; the conveying assembly comprises a rotary table, a first sliding chute, a second sliding chute and a driver; the first sliding chute is arc-shaped and is arranged around the rotary disc, the rotary disc is provided with a notch for accommodating the sample cup, and the notch is formed by the edge of the rotary disc along the radial direction of the rotary disc in a concave mode, so that the sample cup can be pushed to slide along the first sliding chute by the notch in the rotating process of the rotary disc; the second sliding groove is arranged at the tail end of the first sliding groove and used for receiving the sample cup which slides out of the first sliding groove, so that the sample cup is led out; the driver is in transmission connection with the turntable to intermittently drive the turntable.
5. The manufacturing apparatus of claim 4, wherein the transfer assembly further comprises a cup; the cup cylinder is arranged above the rotary disc and faces the chute and is used for conveying the sample cup to the notch.
6. A preparation process for preparing an electronic-grade silicon dioxide etching solution by using the preparation device as claimed in any one of claims 1 to 5, which is characterized by comprising the following steps: and mixing raw hydrofluoric acid, raw ammonium fluoride, raw surfactant and raw ultrapure water in the mixing tank according to a preset proportion, filtering by the precision filter, and subpackaging into a warehouse.
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| CN202010862765.1A CN112044300B (en) | 2020-08-25 | 2020-08-25 | Preparation device and preparation process for electronic-grade silicon dioxide etching solution |
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| CN114369460B (en) * | 2021-12-09 | 2023-07-11 | 湖北兴福电子材料股份有限公司 | Etching solution for improving silicon dioxide etching uniformity of concave groove structure |
| CN115253987B (en) * | 2022-09-26 | 2022-12-09 | 山东新港化工有限公司 | Surfactant neutralization auxiliary device for oil displacement and use method |
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| US7238295B2 (en) * | 2002-09-17 | 2007-07-03 | m·FSI Ltd. | Regeneration process of etching solution, etching process, and etching system |
| CN103756680A (en) * | 2013-12-31 | 2014-04-30 | 浙江凯圣氟化学有限公司 | Method for preparing BOE (Buffer Oxide Etch) etching liquid |
| CN204193801U (en) * | 2014-09-28 | 2015-03-11 | 四川德成动物保健品有限公司 | The Agitation Tank dosing circulatory system |
| CN204784820U (en) * | 2015-06-30 | 2015-11-18 | 浙江诚信医化设备有限公司 | Sample valve |
| CN106190129B (en) * | 2016-08-31 | 2018-05-11 | 江阴市化学试剂厂有限公司 | Ferric trichloride ITO etching liquid compounding systems |
| CN106244147B (en) * | 2016-08-31 | 2018-05-11 | 江阴市化学试剂厂有限公司 | ITO etching liquid compounding systems |
| CN106628422A (en) * | 2016-09-14 | 2017-05-10 | 浙江工业大学 | Flexible loading mechanism based on cup fragile flexible automatic packer |
| CN208760985U (en) * | 2018-08-21 | 2019-04-19 | 安徽朗旭玻璃器皿有限公司 | It is a kind of for temporarily accommodating the device of glass |
| CN111471463B (en) * | 2020-04-24 | 2021-10-19 | 湖北兴福电子材料有限公司 | Etching solution for silicon dioxide film |
| CN111474017A (en) * | 2020-06-08 | 2020-07-31 | 山西潞安煤基清洁能源有限责任公司 | High-pressure liquid quantitative sampling structure and method |
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