CN112033982A - 一种基于能谱的3d打印无损检测方法 - Google Patents
一种基于能谱的3d打印无损检测方法 Download PDFInfo
- Publication number
- CN112033982A CN112033982A CN202010682913.1A CN202010682913A CN112033982A CN 112033982 A CN112033982 A CN 112033982A CN 202010682913 A CN202010682913 A CN 202010682913A CN 112033982 A CN112033982 A CN 112033982A
- Authority
- CN
- China
- Prior art keywords
- energy
- ray
- printing
- testing method
- nondestructive testing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/04—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and forming images of the material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
- G01N23/083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the radiation being X-rays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/03—Investigating materials by wave or particle radiation by transmission
- G01N2223/04—Investigating materials by wave or particle radiation by transmission and measuring absorption
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/101—Different kinds of radiation or particles electromagnetic radiation
- G01N2223/1016—X-ray
Landscapes
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Toxicology (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Description
技术领域
本发明属于3D打印无损检测的技术领域,具体涉及一种基于能谱的3D打印无损检测方法。
背景技术
现有的3D打印零件的无损检测技术都是基于单能的X射线的正投算法,即假设物体的每个像素的衰减值是一个常数。或者将投影射线穿过的像素值直接相加,或者将投影射线穿过的像素值加权相加(以像素穿过每个像素的长度或者面积为权重)。
如图1所示,X射线的投影值等于μ1+μ5+μ6+μ7+μ11+μ12,但是实际3D打印零件检测时使用的X射线均是多能的,这种单能正投算法与实际采集到的投影图像灰度值差距较大,无法仿真真实的投影图像。设备使用的X射线是多能的,即X射线中光子的能量是不一样的,对于一个均匀物体,对不同能量的光子来说衰减系数是不一样的,因此不能简单的将一个像素的衰减系数设置为一个常数。通常而言,针对某设备使用的X光线,其X射线的能量通常满足二态分布,即以某个特定值为中心的分布。
在使用设备采集的真实的投影图像进行重建时,由于设备使用的X射线是多能的,重建后的图像上会有硬化伪影。然而,为了验证硬化伪影去除算法的好坏,有时候需要仿真数字模体,并且期望能够仿真多能X射线正投的投影值,这时候上述正投算法就无能为力了。
发明内容
本发明的目的在于提供一种基于能谱的3D打印无损检测方法,本发明得到的投影值与实际设备采集得到的正投数据基本一致,从而可以仿真设备真实得到的数据,为科研和算法的验证提供更有力的工具。
本发明主要通过以下技术方案实现:一种基于能谱的3D打印无损检测方法,将X射线能谱处理得到离散的若干个能量的光子,且光子的能量分别为Ia-In,光子穿过物体后剩下的能量分别为I1-Im,则:
其中:ui为衰减系数,
li为X射线穿过物体的长度。
为了更好地实现本发明,进一步的,对X射线能谱进行微分处理得到离散的若干个能量的光子。
为了更好地实现本发明,进一步的,多能X射线的能量满足二态分布。
为了更好地实现本发明,进一步的,多能X射线的能量满足斜二态分布。
本发明的有益效果:
原有技术只能仿真单能X射线的正投数据,与设备上实际采集的结果差距较大。本发明可以仿真多能X射线的正投数据,得到的结果更接近设备采集的结果,为科研和研究算法提供有力的工具。
附图说明
图1为现有技术X射线的正投示意图;
图2为现有技术单能的X射线的正投算法示意图。
具体实施方式
实施例1:
一种基于能谱的3D打印无损检测方法,当用某kVp的多能X射线扫描物体时,则可以根据kVp的值确定该多能X射线的能谱,即确定多能X射线中每个能量的光子的个数。通常而言,某KVP的多能X射线的能量满足二态分布(根据激励源的不同也可以是其他分布,比如斜二态分布等)。可以对这一分布的X射线能谱进行微分处理,得到离散的多个能量的光子,如Ia、Ib、Ic、…In。
下面以多能X射线包含Ia、Ib两种能量的光子来进行示例性说明。这时光子总能量为Ia+Ib。
先看能量Ia的光子,这时候是单能光子,即物体对于Ia的光子来说衰减系数是常数,假设衰减系数分别为μ1、μ2Λμn。假设X射线穿过每个像素的长度分别为l1、l2Λl16,则Ia穿过物体后剩下的能量为其中使用的是长度加权,这里可以直接相加或者使用面积加权等方法。
如图1所示,原有技术只能仿真单能X射线的正投数据,与设备上实际采集的结果差距较大。本发明可以仿真多能X射线的正投数据,得到的结果更接近设备采集的结果,为科研和研究算法提供有力的工具。
以上所述,仅是本发明的较佳实施例,并非对本发明做任何形式上的限制,凡是依据本发明的技术实质对以上实施例所作的任何简单修改、等同变化,均落入本发明的保护范围之内。
Claims (5)
3.根据权利要求1或2所述的一种基于能谱的3D打印无损检测方法,其特征在于,对X射线能谱进行微分处理得到离散的若干个能量的光子。
4.根据权利要求1所述的一种基于能谱的3D打印无损检测方法,其特征在于,多能X射线的能量满足二态分布。
5.根据权利要求1所述的一种基于能谱的3D打印无损检测方法,其特征在于,多能X射线的能量满足斜二态分布。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010682913.1A CN112033982A (zh) | 2020-07-15 | 2020-07-15 | 一种基于能谱的3d打印无损检测方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010682913.1A CN112033982A (zh) | 2020-07-15 | 2020-07-15 | 一种基于能谱的3d打印无损检测方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN112033982A true CN112033982A (zh) | 2020-12-04 |
Family
ID=73579169
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010682913.1A Pending CN112033982A (zh) | 2020-07-15 | 2020-07-15 | 一种基于能谱的3d打印无损检测方法 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112033982A (zh) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102609908A (zh) * | 2012-01-13 | 2012-07-25 | 中国人民解放军信息工程大学 | 基于基图像tv模型的ct射束硬化校正方法 |
CN103559699A (zh) * | 2013-11-18 | 2014-02-05 | 首都师范大学 | 一种基于投影估计的多能谱ct图像重建方法 |
CN105447832A (zh) * | 2015-12-14 | 2016-03-30 | 天津三英精密仪器有限公司 | 一种基于探测器单元标定的ct图像伪影校正方法及应用 |
CN108135560A (zh) * | 2015-10-27 | 2018-06-08 | 株式会社日立制作所 | X射线ct数据处理装置以及搭载其的x射线ct装置 |
CN109613028A (zh) * | 2018-11-30 | 2019-04-12 | 上海航天精密机械研究所 | 3d打印特征编码与检测方法、系统及介质 |
-
2020
- 2020-07-15 CN CN202010682913.1A patent/CN112033982A/zh active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102609908A (zh) * | 2012-01-13 | 2012-07-25 | 中国人民解放军信息工程大学 | 基于基图像tv模型的ct射束硬化校正方法 |
CN103559699A (zh) * | 2013-11-18 | 2014-02-05 | 首都师范大学 | 一种基于投影估计的多能谱ct图像重建方法 |
CN108135560A (zh) * | 2015-10-27 | 2018-06-08 | 株式会社日立制作所 | X射线ct数据处理装置以及搭载其的x射线ct装置 |
CN105447832A (zh) * | 2015-12-14 | 2016-03-30 | 天津三英精密仪器有限公司 | 一种基于探测器单元标定的ct图像伪影校正方法及应用 |
CN109613028A (zh) * | 2018-11-30 | 2019-04-12 | 上海航天精密机械研究所 | 3d打印特征编码与检测方法、系统及介质 |
Non-Patent Citations (2)
Title |
---|
张定华等著: "《锥束CT技术及其应用》", 31 December 2010 * |
陈慧娟等: "一种基于多能统计的射束硬化校正方法", 《CT理论与应用研究》 * |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Wang et al. | Acuros CTS: A fast, linear Boltzmann transport equation solver for computed tomography scatter–Part II: System modeling, scatter correction, and optimization | |
Van Geet et al. | Towards 3-D petrography: application of microfocus computer tomography in geological science | |
EP2843623B1 (en) | X-ray dual-energy CT reconstruction method | |
Van de Casteele et al. | A model-based correction method for beam hardening artefacts in X-ray microtomography | |
DE102017207125A1 (de) | Verfahren zum Durchführen einer Materialzerlegung unter Verwendung einer Dual-Energie-Röntgen-CT und eines entsprechenden Dual-Energie-Röntgen-CT-Gerätes | |
US10987071B2 (en) | Pixelated K-edge coded aperture system for compressive spectral X-ray imaging | |
CN107847198B (zh) | 辐射图像处理方法及射线照相系统 | |
WO2018192909A1 (en) | Beam hardening correction in x-ray dark-field imaging | |
CN101566590A (zh) | 面阵探测器射线数字成像中的散射强度分布获取方法 | |
Altunbas et al. | A unified scatter rejection and correction method for cone beam computed tomography | |
CN113167913A (zh) | 针对常规成像的光子计数的能量加权 | |
Elhamiasl et al. | Low-dose x-ray CT simulation from an available higher-dose scan | |
Ingacheva et al. | Polychromatic CT data improvement with one-parameter power correction | |
CN111145281B (zh) | 一种双能ct直接迭代基材料分解图像重建方法 | |
CN110246199B (zh) | 一种面向能谱ct的投影域数据噪声去除方法 | |
CN112033982A (zh) | 一种基于能谱的3d打印无损检测方法 | |
CN110706299A (zh) | 一种用于双能ct的物质分解成像方法 | |
Gusenbauer et al. | Comparison of metal artefact reduction algorithms from medicine applied to industrial xct applications | |
Cao et al. | Limited angle reconstruction with two dictionaries | |
Ou et al. | Dual-energy materials characterization methods for laminography image enhancement based on photon counting detector | |
Zobly et al. | Whole-Body Bone Scan Image Enhancement Algorithms | |
CN111340127A (zh) | 基于材料聚类的能谱ct迭代材料分解方法和装置 | |
Arunmuthu et al. | Simulation of beam hardening in X-ray tomography and its correction using linearisation and pre-filtering approaches | |
Haase et al. | Estimation of statistical weights for model-based iterative CT reconstruction | |
Xia et al. | Noise and bias properties of monoenergetic images from DECT used for attenuation correction with PET/CT and SPECT/CT |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
RJ01 | Rejection of invention patent application after publication |
Application publication date: 20201204 |
|
RJ01 | Rejection of invention patent application after publication |