CN112022737A - Cleaning and moisturizing facial mask capable of removing heavy metal residues and preparation method thereof - Google Patents
Cleaning and moisturizing facial mask capable of removing heavy metal residues and preparation method thereof Download PDFInfo
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- CN112022737A CN112022737A CN202010793001.1A CN202010793001A CN112022737A CN 112022737 A CN112022737 A CN 112022737A CN 202010793001 A CN202010793001 A CN 202010793001A CN 112022737 A CN112022737 A CN 112022737A
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Images
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- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
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- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
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- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
- A61K8/25—Silicon; Compounds thereof
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- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/33—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing oxygen
- A61K8/34—Alcohols
- A61K8/345—Alcohols containing more than one hydroxy group
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- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/67—Vitamins
- A61K8/673—Vitamin B group
- A61K8/675—Vitamin B3 or vitamin B3 active, e.g. nicotinamide, nicotinic acid, nicotinyl aldehyde
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- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
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- A61K8/72—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds
- A61K8/81—Cosmetics or similar toiletry preparations characterised by the composition containing organic macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- A61K8/8141—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
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- A61K8/96—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
- A61K8/97—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
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- Cosmetics (AREA)
Abstract
The invention relates to the technical field of cosmetics, in particular to a clean moisturizing facial mask capable of removing heavy metal residues and an equipment method thereof, wherein the clean moisturizing facial mask comprises a facial mask substrate and facial mask essence, and the facial mask essence comprises the following components in parts by weight of 100 parts of the total amount: 8-10 parts of sodium alginate-sodium polyacrylate/sepiolite hydrogel, 3-5 parts of egg white essence, 6-8 parts of cucumber essence, 3-8 parts of butanediol, 3-5 parts of nicotinamide, 1-3 parts of sodium hyaluronate, 3-8 parts of propylene glycol and the balance of deionized water. The facial cleanser contains the sodium alginate-sodium polyacrylate/sepiolite hydrogel, can effectively remove heavy metal ions such as copper ions, lead ions, chromium ions, manganese ions, zinc ions, nickel ions, barium ions and tungsten ions remained on the face, such as air and cosmetics, can better clean the skin, and is safe and reliable; meanwhile, the main component of the mask is hydrogel, and the components such as butanediol, nicotinamide, propylene glycol and the like can better lock water, so that the aims of moisturizing and moisturizing are fulfilled.
Description
Technical Field
The invention relates to the technical field of cosmetics, in particular to a clean moisturizing facial mask capable of removing heavy metal residues and an equipment method thereof.
Background
With the development of the times, many girls have great beauty at present, and need to make up when going out, and make up is the most important thing that many women must do before going out, and recently, the korean food and drug department has publicly shown that 8 well-known brands of cosmetics such as jasmine of korea detect that heavy metals exceed the standard, and these include 13 products such as concealer, lip pencil and the like.
The skin can absorb various heavy metals (such as mercury, lead, arsenic, copper, etc.) and their salts. Heavy metal poisoning is mostly chronic poisoning caused by long-term exposure. Adult poisoning often causes symptoms such as fatigue, depressed mood, abdominal pain, kidney deficiency, hypertension, heart failure, joint pain, reproductive disorders, and anemia. Lead poisoning of pregnant women can cause abortion, overweight and light newborn, infant death, infantile dysplasia and other serious consequences. Lead poisoning in children can cause symptoms such as inappetence, stomachache, constipation, nausea, diarrhea, fatigue, low intelligence, insomnia, learning disability, anemia and the like.
With the rapid improvement of modern quality of life, skin care becomes a more and more common life style, and the most common skin care product is a facial mask. The traditional mask can not achieve the cleaning effect of removing heavy metals, is generally limited to water supplementing and whitening, and has poor effect.
Disclosure of Invention
The invention aims to overcome the defects in the prior art and provide the moisturizing facial mask capable of effectively removing heavy metal residues such as air, cosmetics and the like.
The technical scheme for realizing the purpose of the invention is as follows: a moisture-keeping facial mask capable of removing heavy metal residue; the facial mask comprises a facial mask substrate and facial mask essence, wherein the facial mask essence comprises the following components in parts by weight: 8-10 parts of sodium alginate-sodium polyacrylate/sepiolite hydrogel, 3-5 parts of egg white essence, 6-8 parts of cucumber essence, 3-8 parts of butanediol, 3-5 parts of nicotinamide, 1-3 parts of sodium hyaluronate, 3-8 parts of propylene glycol and the balance of deionized water.
According to the technical scheme, the mask matrix is mask paper, and the mask paper is made of silk, terylene, all cotton, blended yarn and biological fiber.
Above-mentioned technical scheme, the removable heavy metal ion of moisturizing type facial mask includes: copper ions, lead ions, chromium ions, manganese ions, zinc ions, nickel ions, barium ions, and tungsten ions.
According to the technical scheme, the removal rate of the residual heavy metals on the face of the moisturizing facial mask is more than or equal to 95%.
A preparation method of a moisturizing facial mask capable of removing heavy metal residues comprises the following steps:
the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring at normal temperature;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and continuously stirring uniformly;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: defoaming the obtained mixed solution in vacuum, and then filtering to obtain a mask essence;
step five: and (5) soaking the discharged facial mask essence liquid into the sterile facial mask matrix, and then carrying out sterile packaging to finish the facial mask preparation.
According to the technical scheme, the pH value of the mixed solution obtained in the third step is 6.5.
After the technical scheme is adopted, the invention has the following positive effects:
(1) the facial cleanser contains the sodium alginate-sodium polyacrylate/sepiolite hydrogel, and can effectively remove heavy metal ions such as copper ions, lead ions, chromium ions, manganese ions, zinc ions, nickel ions, barium ions, tungsten ions and the like remained on the face of air, cosmetics and the like through chemical adsorption, so that the facial cleanser can better clean the skin, and is safe and reliable; meanwhile, the main component of the mask is hydrogel, and the components such as butanediol, nicotinamide, propylene glycol and the like can better lock water, so that the aims of moisturizing and moisturizing are fulfilled.
(2) The mask essence disclosed by the invention has the pH of 6.5, is weak acid close to neutrality and is similar to weak acid pH of human skin, and when the mask is used for over-temperature and skin care, adverse effects such as sensitivity and the like are not easily caused;
(3) the invention has simple preparation process, mild preparation conditions, low manufacturing cost, mild and non-irritating used components, no adverse side effect on skin, and higher safety and reliability.
Drawings
In order that the present disclosure may be more readily and clearly understood, reference is now made to the following detailed description of the present disclosure taken in conjunction with the accompanying drawings, in which
FIG. 1 shows the removal rate of the product of the present invention for various metal ions.
Detailed Description
Example 1
The invention provides a cleaning and moisturizing facial mask capable of removing heavy metal residues, which comprises the following components in 100 parts by weight: 8-10 parts of sodium alginate-sodium polyacrylate/sepiolite hydrogel, 3-5 parts of egg white essence, 6-8 parts of cucumber essence, 3-8 parts of butanediol, 3-5 parts of nicotinamide, 1-3 parts of sodium hyaluronate, 3-8 parts of propylene glycol, the balance of deionized water and the balance of deionized water.
The method comprises the following steps:
the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring at normal temperature;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and continuously stirring uniformly;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, fully mixing and stirring uniformly, and keeping the pH = 6.5;
step four: and defoaming the obtained mixed solution in vacuum, and then filtering to obtain the facial mask essence.
Step five: and (4) soaking the discharged facial mask essence into non-woven sterile cloth cover facial mask cloth, and performing sterile packaging to finish the facial mask preparation.
The moisturizing facial mask capable of removing heavy metal residues provided by the invention has the following specific implementation scheme:
TABLE 1 influence of different component contents (parts by weight) in the facial mask essence on the adsorption rate of copper ions on skin for experiment
| Scheme(s) | Sodium alginate-sodium polyacrylate/sepiolite water Gel (%) | Egg white essence （%） | Cucumber essence （%） | Butanediol （%） | Nicotinamide （%） | Hyaluronic acid sodium salt （%） | Propylene glycol （%） | Deionized water （%） | Copper removal rate （%） |
| Inventive example 1 | 8 | 3 | 7 | 5 | 4 | 1 | 8 | 64 | 95.3 |
| Inventive example 2 | 8 | 4 | 6 | 7 | 3 | 3 | 7 | 62 | 95.4 |
| Inventive example 3 | 9 | 5 | 8 | 3 | 5 | 2 | 5 | 63 | 95.6 |
| Inventive example 4 | 9 | 3 | 7 | 6 | 3 | 3 | 6 | 63 | 95.5 |
| Inventive example 5 | 10 | 4 | 6 | 4 | 4 | 2 | 3 | 67 | 95.9 |
| Inventive example 6 | 10 | 5 | 8 | 8 | 5 | 1 | 6 | 57 | 96.0 |
| Comparative example | 0 | 5 | 8 | 7 | 5 | 3 | 8 | 64 | 80 |
As can be seen from the above table, when the sodium alginate-sodium polyacrylate/sepiolite hydrogel is not contained in the comparative example, the removal rate of the residual copper ions is obviously lower than that of the sodium alginate-sodium polyacrylate/sepiolite hydrogel contained in the other invention examples, which indicates that the sodium alginate-sodium polyacrylate/sepiolite hydrogel has a good removal effect on the heavy metal ions remaining in the skin, and can better clean the skin.
Example 2
The facial mask essence prepared according to the proportion of 5 in the invention example 1 is used for testing the removal rate of copper ions, lead ions, chromium ions, manganese ions, zinc ions, nickel ions, barium ions and tungsten ions in skin for experiments, and the specific scheme is as follows
Scheme 1: copper ion removal rate test
According to the steps: the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and uniformly stirring;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: and defoaming the obtained mixed solution in vacuum, and then filtering to obtain the facial mask essence.
Step five: and (4) soaking the discharged facial mask essence into non-woven sterile cloth cover facial mask cloth, and performing sterile packaging to finish the facial mask preparation.
The prepared mask is applied to experimental skin containing copper ion residues, and a copper ion removal rate test is carried out to obtain a copper ion removal rate of 96%.
Scheme 2: lead ion removal test
According to the steps: the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and uniformly stirring;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: and defoaming the obtained mixed solution in vacuum, and then filtering to obtain the facial mask essence.
Step five: and (4) soaking the discharged facial mask essence into non-woven sterile cloth cover facial mask cloth, and performing sterile packaging to finish the facial mask preparation.
The prepared mask is applied to experimental skin containing lead ion residues, and a lead ion removal rate test is carried out to obtain a lead ion removal rate of 98%.
Scheme 3: chromium ion removal test
According to the steps: the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and uniformly stirring;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: and defoaming the obtained mixed solution in vacuum, and then filtering to obtain the facial mask essence.
Step five: and (4) soaking the discharged facial mask essence into non-woven sterile cloth cover facial mask cloth, and performing sterile packaging to finish the facial mask preparation.
The prepared mask is applied to experimental skin containing chromium ion residues, and a chromium ion removal rate test is carried out to obtain a chromium ion removal rate of 96.5%.
Scheme 4: manganese ion removal Rate test
According to the steps: the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and uniformly stirring;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: and defoaming the obtained mixed solution in vacuum, and then filtering to obtain the facial mask essence.
Step five: and (4) soaking the discharged facial mask essence into non-woven sterile cloth cover facial mask cloth, and performing sterile packaging to finish the facial mask preparation.
The prepared mask is applied to experimental skin containing manganese ion residues, and a manganese ion removal rate test is carried out to determine that the manganese ion removal rate is 97%.
Scheme 5: test of Zinc ion removal Rate
According to the steps: the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and uniformly stirring;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: and defoaming the obtained mixed solution in vacuum, and then filtering to obtain the facial mask essence.
Step five: and (4) soaking the discharged facial mask essence into non-woven sterile cloth cover facial mask cloth, and performing sterile packaging to finish the facial mask preparation.
The prepared mask is applied to experimental skin containing zinc ion residues, and a zinc ion removal rate test is carried out to determine that the zinc ion removal rate is 97%.
Scheme 6: removal rate test of nickel ions
According to the steps: the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and uniformly stirring;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: and defoaming the obtained mixed solution in vacuum, and then filtering to obtain the facial mask essence.
Step five: and (4) soaking the discharged facial mask essence into non-woven sterile cloth cover facial mask cloth, and performing sterile packaging to finish the facial mask preparation.
The prepared mask is applied to experimental skin containing nickel ion residues, and a nickel ion removal rate test is carried out to obtain that the nickel ion removal rate is 97.5%.
Scheme 7: barium ion removal Rate test
According to the steps: the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and uniformly stirring;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: and defoaming the obtained mixed solution in vacuum, and then filtering to obtain the facial mask essence.
Step five: and (4) soaking the discharged facial mask essence into non-woven sterile cloth cover facial mask cloth, and performing sterile packaging to finish the facial mask preparation.
The prepared facial mask is applied to experimental skin containing barium ion residues, and a barium ion removal rate test is carried out to determine that the barium ion removal rate is 96%.
Scheme 8: tungsten ion removal Rate test
According to the steps: the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and uniformly stirring;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: and defoaming the obtained mixed solution in vacuum, and then filtering to obtain the facial mask essence.
Step five: and (4) soaking the discharged facial mask essence into non-woven sterile cloth cover facial mask cloth, and performing sterile packaging to finish the facial mask preparation.
The prepared mask is applied to experimental skin containing tungsten ion residues, and a tungsten ion removal rate test is carried out to obtain that the tungsten ion removal rate is 96.5%.
The cleaning and moisturizing mask capable of removing heavy metal residues provided by the invention is used for testing the removal rate of each heavy metal ion, the test result is shown in fig. 1, the heavy metal ion residue effect is remarkable, and the removal rate of each ion is as follows: 96% of copper ions, 98% of lead ions, 96.5% of chromium ions, 97% of manganese ions, 97% of zinc ions, 97.5% of nickel ions, 96% of barium ions and 96.5% of tungsten ions.
The above-mentioned embodiments are intended to illustrate the objects, technical solutions and advantages of the present invention in further detail, and it should be understood that the above-mentioned embodiments are only exemplary embodiments of the present invention, and are not intended to limit the present invention, and any modifications, equivalents, improvements and the like made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (6)
1. A moisture-keeping facial mask capable of removing heavy metal residue; comprises a mask substrate and mask essence, and is characterized in that: the facial mask essence comprises the following components in parts by weight: 8-10 parts of sodium alginate-sodium polyacrylate/sepiolite hydrogel, 3-5 parts of egg white essence, 6-8 parts of cucumber essence, 3-8 parts of butanediol, 3-5 parts of nicotinamide, 1-3 parts of sodium hyaluronate, 3-8 parts of propylene glycol and the balance of deionized water.
2. The moisture mask according to claim 1, wherein the mask is characterized in that: the facial mask matrix is facial mask paper, and the facial mask paper material is silk, dacron, all cotton, blending and biological fiber.
3. The moisture mask according to claim 1, wherein the mask is characterized in that: the moisturizing facial mask can remove heavy metal ions, including: copper ions, lead ions, chromium ions, manganese ions, zinc ions, nickel ions, barium ions, and tungsten ions.
4. The moisture mask according to claim 1, wherein the mask is characterized in that: the removal rate of the residual heavy metals on the face of the moisturizing facial mask is more than or equal to 95%.
5. A method for preparing the moisturizing mask capable of removing heavy metal residues according to any one of claims 1 to 4, wherein the moisturizing mask comprises the following steps: the method comprises the following steps:
the method comprises the following steps: adding egg white essence and cucumber essence into deionized water, and stirring at normal temperature;
step two: adding sodium alginate-sodium polyacrylate/sepiolite hydrogel and sodium hyaluronate into the liquid obtained in the step one, and continuously stirring uniformly;
step three: adding propylene glycol, nicotinamide and butanediol into the liquid obtained in the step two, and fully mixing and stirring uniformly;
step four: defoaming the obtained mixed solution in vacuum, and then filtering to obtain a mask essence;
step five: and (5) soaking the discharged facial mask essence liquid into the sterile facial mask matrix, and then carrying out sterile packaging to finish the facial mask preparation.
6. The method for preparing a moisturizing mask capable of removing heavy metal residues according to claim 5, wherein the method comprises the following steps: and the pH value of the mixed solution obtained in the third step is 6.5.
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| CN105380887A (en) * | 2015-12-04 | 2016-03-09 | 遵义医学院 | Purely-natural moisture-retaining toner and preparation method thereof |
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| CN107412078A (en) * | 2017-09-05 | 2017-12-01 | 广州聚注通用技术研究院有限公司 | A kind of facial mask for adsorbing heavy metal |
| CN110922530A (en) * | 2018-09-20 | 2020-03-27 | 天津科技大学 | Preparation method of sodium alginate crosslinked acrylic acid and montmorillonite hydrogel |
| CN111167423A (en) * | 2020-01-29 | 2020-05-19 | 兰州理工大学 | Preparation method and application of sodium alginate-sodium polyacrylate/sepiolite hydrogel |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105380887A (en) * | 2015-12-04 | 2016-03-09 | 遵义医学院 | Purely-natural moisture-retaining toner and preparation method thereof |
| CN105816412A (en) * | 2016-04-30 | 2016-08-03 | 马明娥 | Toxin-expelling, speckle-removing and whitening facial mask and preparation method thereof |
| CN107412078A (en) * | 2017-09-05 | 2017-12-01 | 广州聚注通用技术研究院有限公司 | A kind of facial mask for adsorbing heavy metal |
| CN110922530A (en) * | 2018-09-20 | 2020-03-27 | 天津科技大学 | Preparation method of sodium alginate crosslinked acrylic acid and montmorillonite hydrogel |
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