CN112015013A - Liquid crystal display panel and preparation method thereof - Google Patents
Liquid crystal display panel and preparation method thereof Download PDFInfo
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- CN112015013A CN112015013A CN202010951320.0A CN202010951320A CN112015013A CN 112015013 A CN112015013 A CN 112015013A CN 202010951320 A CN202010951320 A CN 202010951320A CN 112015013 A CN112015013 A CN 112015013A
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- supporting column
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1339—Gaskets; Spacers; Sealing of cells
- G02F1/13394—Gaskets; Spacers; Sealing of cells spacers regularly patterned on the cell subtrate, e.g. walls, pillars
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Abstract
The invention provides a liquid crystal display panel and a preparation method thereof, wherein the liquid crystal display panel comprises: a first substrate; the second substrate is arranged in a matching mode with the first substrate, one side, close to the first substrate, of the second substrate is provided with a supporting column, the supporting column comprises a main supporting column and an auxiliary supporting column, the height of the main supporting column is 1.2-1.6 micrometers, and the height of the auxiliary supporting column is 0.8-1.2 micrometers; and the liquid crystal is filled between the first substrate and the second substrate. The supporting column height requirement of the display with high refresh frequency and quick response time is met, the liquid crystal box thickness requirement of the display with high refresh frequency and quick response time is further met, and the problem that the display with high refresh frequency and quick response time in the prior art is difficult to prepare is solved.
Description
Technical Field
The application relates to the field of display, in particular to a liquid crystal display panel and a preparation method thereof.
Background
High refresh rate and fast response time, which require lower cell thickness, i.e., lower support post height, have become core requirements for competitive displays. The height of the common main supporting column is generally 2.2 um-2.8 um, and the height of the supporting column of the display meeting the requirements of high refresh frequency and quick response time is 1.2 um-1.6 um.
In the existing process of the support pillar, a negative photoresist and a halftone mask are generally adopted to prepare the support pillar, wherein the transmittance of the area for preparing the main support pillar in the mask is 100%, and the transmittance of the area for preparing the auxiliary support pillar is 25% -30%. The support columns with the height of 1.2 um-1.6 um are prepared by the halftone mask, and the discharge amount of the photoresist discharge machine table needs to be reduced. However, the photoresist film layer with a thickness of 1.2um to 1.6um has reached the limit of a photoresist spitting machine, and is not suitable for mass production, and the photoresist film layer is too thin and has poor stability, so that stripe stripes are easy to appear, and quality problems are caused.
Therefore, the problem that the support posts of the existing display with high refresh frequency and fast response time are difficult to prepare needs to be solved.
Disclosure of Invention
In order to solve the above problems, the technical scheme provided by the invention is as follows:
the present invention provides a liquid crystal display panel, comprising:
a first substrate;
the second substrate is arranged in a closing mode with the first substrate, one side, close to the first substrate, of the second substrate is provided with a supporting column, the supporting column comprises a main supporting column and an auxiliary supporting column, the height of the main supporting column is 1.2-1.6 microns, and the height of the auxiliary supporting column is 0.8-1.2 microns;
and the liquid crystal is filled between the first substrate and the second substrate.
In the liquid crystal display panel provided by the invention, the support column is made of a negative photoresist material.
In the liquid crystal display panel provided by the invention, the main supporting columns are in contact with the first substrate, and the auxiliary supporting columns are not in contact with the first substrate.
In the liquid crystal display panel provided by the invention, the first substrate further comprises a black matrix, and the support column corresponds to the black matrix.
In the liquid crystal display panel provided by the invention, the first substrate further comprises a color resistor, and the color resistor is arranged in an opening area surrounded by the black matrix.
In the liquid crystal display panel provided by the invention, the second substrate further comprises a color resistor, and the color resistor corresponds to an opening region surrounded by the black matrix.
Meanwhile, the invention also provides a preparation method of the liquid crystal display panel, which is used for preparing any liquid crystal display panel provided by the invention, and the preparation method comprises the following steps:
preparing a first substrate and a second substrate;
preparing support pillars on the second substrate; the supporting columns comprise main supporting columns and auxiliary supporting columns, the height of each main supporting column is 1.2-1.6 um, and the height of each auxiliary supporting column is 0.8-1.2 um;
the first substrate and the second substrate are combined, and liquid crystal is filled between the first substrate and the second substrate; the supporting column is located on one side, close to the first substrate, of the second substrate.
In the preparation method provided by the present invention, the step of preparing the support pillars on the second substrate includes:
preparing a photoresist layer on the second substrate;
and exposing and developing the photoresist layer by adopting a half-tone mask plate to obtain the support pillar.
In the preparation method provided by the invention, the halftone mask comprises a shading area, a first light-transmitting area and a second light-transmitting area, wherein the shading area corresponds to the part except the support columns, the light transmittance of the shading area is 0, the first light-transmitting area corresponds to the main support columns, the light transmittance of the first light-transmitting area is 60-75%, the second light-transmitting area corresponds to the auxiliary support columns, and the light transmittance of the second light-transmitting area is 15-20%.
In the preparation method provided by the present invention, the step of preparing the photoresist layer on the second substrate includes:
depositing a layer of uniform negative photoresist with the thickness of 2.2-2.8 um on the second substrate by adopting a coating process;
and solidifying the negative photoresist to obtain the photoresist layer.
The invention provides a liquid crystal display panel and a preparation method thereof, wherein the liquid crystal display panel comprises: a first substrate; the second substrate is arranged in a closing mode with the first substrate, one side, close to the first substrate, of the second substrate is provided with a supporting column, the supporting column comprises a main supporting column and an auxiliary supporting column, the height of the main supporting column is 1.2-1.6 microns, and the height of the auxiliary supporting column is 0.8-1.2 microns; and the liquid crystal is filled between the first substrate and the second substrate. The height requirement of the support column of the display with high refresh frequency and quick response time is met, the liquid crystal box thickness requirement of the display with high refresh frequency and quick response time is further met, and the problem that the support column of the display with high refresh frequency and quick response time is difficult to prepare in the prior art is solved; in addition, the preparation method of the liquid crystal display panel provided by the embodiment of the invention avoids the problems of influence on the stability and quality of the photoresist layer caused by bubbles in the film layer, uneven film layer, strip-shaped stripes and the like due to too small thickness of the photoresist layer, can realize mass production, and is beneficial to the production and practical application of the liquid crystal display panel.
Drawings
The technical solution and other advantages of the present application will become apparent from the detailed description of the embodiments of the present application with reference to the accompanying drawings.
Fig. 1 is a schematic structural diagram of a liquid crystal display panel according to an embodiment of the invention.
Fig. 2 is a flowchart of a method for manufacturing a liquid crystal display panel according to an embodiment of the invention.
Fig. 3 is a schematic view of a first structure of a halftone mask according to an embodiment of the present invention.
Fig. 4 is a schematic diagram of a second structure of a halftone mask according to an embodiment of the present invention.
Detailed Description
While the embodiments and/or examples of the present invention will be described in detail and fully with reference to the specific embodiments thereof, it should be understood that the embodiments and/or examples described below are only a part of the embodiments and/or examples of the present invention and are not intended to limit the scope of the invention. All other embodiments and/or examples, which can be obtained by a person skilled in the art without making any inventive step, based on the embodiments and/or examples of the present invention, belong to the scope of protection of the present invention.
Directional terms used in the present invention, such as [ upper ], [ lower ], [ left ], [ right ], [ front ], [ rear ], [ inner ], [ outer ], [ side ], are only referring to the directions of the attached drawings. Accordingly, the directional terminology is used for the purpose of describing and understanding the invention and is in no way limiting. The terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature.
Aiming at the problem that the conventional display with high refresh frequency and quick response time has difficulty in manufacturing a support column, the invention provides the liquid crystal display panel and the manufacturing method thereof, which can relieve the problem.
In an embodiment, referring to fig. 1, fig. 1 is a schematic structural diagram of a liquid crystal display panel provided in an embodiment of the present invention, and as shown in the drawing, the liquid crystal display panel includes:
a first substrate 100;
the second substrate 200 is arranged in a matching manner with the first substrate 100, one side of the second substrate 200, which is close to the first substrate 100, is provided with a support column, the support column comprises a main support column 211 and an auxiliary support column 212, the height of the main support column 211 is 1.2-1.6 um, and the height of the auxiliary support column 212 is 0.8-1.2 um;
the liquid crystal 300 is filled between the first substrate 100 and the second substrate 200.
The embodiment of the invention provides a liquid crystal display panel, which comprises a main supporting column and an auxiliary supporting column, wherein the main supporting column and the auxiliary supporting column are arranged in a liquid crystal box, the height of the main supporting column is 1.2-1.6 um, and the height of the auxiliary supporting column is 0.8-1.2 um; the main supporting column and the auxiliary supporting column meet the supporting column height requirement of the display with high refresh frequency and quick response time, further meet the liquid crystal box thickness requirement of the display with high refresh frequency and quick response time, and solve the problem that the display with high refresh frequency and quick response time in the prior art is difficult to prepare.
In the liquid crystal display panel provided in the embodiment of the invention, the main supporting pillars 211 may be in contact with the first substrate 100, or may not be in contact with the first substrate 100; the auxiliary support columns 212 are lower than the main support columns 211 and do not contact the first substrate 100.
In the liquid crystal display panel provided by the embodiment of the invention, the second substrate can be an array substrate, the second substrate comprises a driving circuit layer, and the driving circuit layer is arranged on one side of the support column away from the first substrate; the first substrate may also be an array substrate, and the first substrate includes a driving circuit layer.
In one embodiment, the first substrate 100 further includes a black matrix, and the support pillars correspond to the black matrix, that is, an orthographic projection of the support pillars on the second substrate 200 falls within the orthographic projection of the black matrix on the second substrate 200. Further, in one embodiment, the first substrate 100 may further include a color resist disposed in an opening region defined by the black matrix. Further, in another embodiment, the second substrate 200 further includes a color resistor, and the color resistor corresponds to an opening region surrounded by the black matrix. The color resistor can be a color resistor comprising three colors of red (R), green (G) and blue (B), or a color resistor comprising four colors of red (R), green (G), blue (B) and white (W).
In another embodiment, the second substrate 200 further includes a black matrix, and the support pillars correspond to the black matrix and are disposed on a side of the black matrix close to the first substrate 100. Further, in one embodiment, the second substrate 200 further includes a color resistor corresponding to an opening region surrounded by the black matrix. Further, in another embodiment, the first substrate 100 includes a color resistor corresponding to an opening region surrounded by the black matrix. The color resistor can be a color resistor comprising three colors of red (R), green (G) and blue (B), or a color resistor comprising four colors of red (R), green (G), blue (B) and white (W).
Meanwhile, an embodiment of the present invention further provides a method for manufacturing a liquid crystal display panel, please refer to fig. 2, and fig. 2 shows a flowchart of a method for manufacturing a liquid crystal display panel according to an embodiment of the present invention, as shown in the figure, the method includes:
step S201, preparing a first substrate and a second substrate;
step S202, preparing a support pillar on a second substrate; the supporting columns comprise main supporting columns and auxiliary supporting columns, the height of each main supporting column is 1.2-1.6 um, and the height of each auxiliary supporting column is 0.8-1.2 um;
step S203, the first substrate and the second substrate are combined, and liquid crystal is filled between the first substrate and the second substrate; the supporting column is positioned on one side of the second substrate close to the first substrate.
The embodiment of the invention provides a preparation method of a liquid crystal display panel, the liquid crystal display panel prepared by the preparation method comprises a main supporting column and an auxiliary supporting column which are positioned in a liquid crystal box, wherein the height of the main supporting column is 1.2-1.6 um, and the height of the auxiliary supporting column is 0.8-1.2 um, so that the requirement on the height of the supporting column of a display with high refresh frequency and quick response time is met, the requirement on the thickness of the liquid crystal box of the display with high refresh frequency and quick response time is further met, and the problem that the supporting column of the display with high refresh frequency and quick response time in the prior art is difficult to prepare is solved.
In one embodiment, the step of preparing the support posts on the second substrate includes:
preparing a photoresist layer on the second substrate;
and adopting a half-tone mask to expose and develop the photoresist layer to obtain the support pillar.
Referring to fig. 3 and 4, fig. 3 and 4 respectively show two schematic structural diagrams of a halftone mask provided by an embodiment of the invention. As shown, the halftone mask includes: a light-shielding region 301 corresponding to a portion other than the support columns, the light transmittance of the light-shielding region being 0; a first light-transmitting area 302 corresponding to the main support pillar, wherein the light transmittance of the first light-transmitting area 302 is 60-75%; the second light-transmitting area 303 corresponds to the auxiliary supporting columns, and the light transmittance of the second light-transmitting area 303 is 15-20%.
In one embodiment, the step of preparing a photoresist layer on the second substrate comprises:
a layer of negative photoresist with the uniform thickness of 2.2 um-2.8 um is deposited on the substrate by adopting a coating process. The coating process generally includes spin coating, blade coating and a combination of spin coating, and fine blade coating, preferably fine blade coating, of a negative photoresist layer on the substrate. The coating speed of the fine blade coating method is required to be controlled to be about 300mm/s, and the thickness of the negative photoresist layer is about 30 nm.
Curing the negative photoresist to obtain the photoresist layer. In order to prevent the solvent bumping in the subsequent pre-drying process and the defects caused by the flowing of photoresist in the carrying process, a low-pressure drying process is generally carried out immediately after the coating is finished, and partial solvent is evaporated by utilizing the principle that the melting point of liquid is reduced under low pressure; after the substrate is dried at low pressure, the substrate is transferred to a heat engine table for pre-drying, wherein the pre-drying temperature is generally 100-150 ℃, so that the solvent in the photoresist is further evaporated, and meanwhile, the photoresist is solidified and hardened, and the adhesion force between the photoresist and the substrate is enhanced.
In one embodiment, the step of exposing and developing the photoresist layer using a halftone mask to obtain the support pillars comprises:
first, the photoresist layer is irradiated with ultraviolet light through a halftone mask.
In one embodiment, the photoresist layer is exposed using a halftone mask as shown in FIG. 3. The halftone mask provided by the present embodiment includes a transparent substrate 310 and a light-transmitting film attached to the transparent substrate 310, wherein the light-transmitting film includes a first light-transmitting film 321 in the light-shielding region 301, a second light-transmitting film 322 in the first light-transmitting region 302, and a third light-transmitting film 323 in the second light-transmitting region 303. The transparent substrate 310 is a colorless and transparent substrate, and the light transmittance of the transparent substrate is 100%. The first light-transmitting film 321 is a completely opaque light-shielding film, the light transmittance of the first light-shielding film 321 is 0, the second light-transmitting film 322 is a partially light-transmitting semi-permeable film, the light transmittance of the second light-transmitting film 322 is 60-75%, the third light-transmitting film 323 is also a partially light-transmitting semi-permeable film, and the light transmittance of the third light-transmitting film 323 is 15-20%.
When the ultraviolet light irradiates the first light shielding film 321, all the ultraviolet light is blocked by the first light shielding film 321, no light passes through the halftone mask, and no ultraviolet light reaches the photoresist layer corresponding to the light shielding region 301, so that the photoresist layer corresponding to the light shielding region 301 is not exposed to the ultraviolet light. When the ultraviolet light irradiates the second light shielding film 322, 35-40% of the ultraviolet light is blocked by the second light shielding film 322 and cannot pass through the halftone mask, and the remaining 60-75% of the ultraviolet light passes through the halftone mask and reaches the photoresist layer corresponding to the first light transmission region 302, so that the photoresist layer corresponding to the first light transmission region 302 is exposed by the ultraviolet light. When the ultraviolet light irradiates on the third light shielding film 323, 80-85% of the ultraviolet light is blocked by the third light shielding film 323 and cannot pass through the halftone mask, and the remaining 15-20% of the ultraviolet light passes through the halftone mask and reaches the photoresist layer corresponding to the second light transmission region 303, so that the photoresist layer corresponding to the second light transmission region 303 is exposed by the ultraviolet light. And the exposure of the photoresist layer corresponding to the second transparent region 303 is less than the exposure of the photoresist layer corresponding to the first transparent region 302.
In another embodiment, the photoresist layer is exposed using a halftone mask as shown in FIG. 4. The halftone mask provided by the present embodiment includes a real part 410, a first grating part 420, and a second grating part 430. The halftone mask is made of opaque material. Wherein, the real part 410 is a mask part with the front surface filled with light-tight material, the real part corresponds to the light-shielding region 301, and the light transmittance of the real part 410 is 0; the first grating part 420 is a mask part provided with a first density grating, the first grating part 420 corresponds to the first light-transmitting area 302, and the light transmittance of the first grating part 420 is 60-75%; the second grating portion 430 is a mask portion provided with a second density grating, the second grating portion 430 corresponds to the second light-transmitting area 303, and the light transmittance of the second grating portion 430 is 15-20%. The second density is greater than the first density.
When the ultraviolet light irradiates the real part 410, all the ultraviolet light is blocked by the real part 410, no light passes through the halftone mask, and no ultraviolet light reaches the photoresist layer corresponding to the light-shielding region 301, so that the photoresist layer corresponding to the light-shielding region 301 is not exposed by the ultraviolet light. When the ultraviolet light irradiates the first grating part 420, due to diffraction of the gratings, 35-40% of the ultraviolet light is blocked by the gratings and cannot pass through the halftone mask, and the remaining 60-75% of the ultraviolet light passes through the halftone mask through the hollow areas between the gratings and reaches the photoresist layer corresponding to the first light-transmitting area 302, so that the photoresist layer corresponding to the first light-transmitting area 302 is exposed by the ultraviolet light. When the ultraviolet light irradiates on the second grating part 430, due to diffraction of the gratings, 80-85% of the ultraviolet light is blocked by the gratings and cannot pass through the halftone mask, and the remaining 15-20% of the ultraviolet light passes through the halftone mask through the hollow areas between the gratings and reaches the photoresist layer corresponding to the second light-transmitting area 303, so that the photoresist layer corresponding to the second light-transmitting area 303 is exposed by the ultraviolet light. And the exposure of the photoresist layer corresponding to the second transparent region 303 is less than the exposure of the photoresist layer corresponding to the first transparent region 302.
And then, developing the photoresist layer by using a developing solution to obtain the support pillar.
The negative photoresist mainly comprises a solvent, a pigment, a dispersing agent, a monomer, a polymer and a photoinitiator, and has the characteristic of light retention. When the negative photoresist receives the irradiation of ultraviolet light, a chemical reaction is carried out, a photoinitiator in the negative photoresist is decomposed to generate free radicals, double bonds of monomers and polymers are promoted to be opened, and a cross-linking and bridging reaction is carried out to form a network, so that a film structure which is not easy to dissolve in alkaline developing solution is generated; the negative photoresist which does not receive the ultraviolet irradiation is easy to react and dissolve with the alkaline developing solution because the polymer resin contains carboxyl acid groups and does not generate the cross-linking and bridging reaction. Therefore, the unexposed part of the negative photoresist layer can react with the developing solution quickly to be dissolved when encountering the alkaline developing solution, and the exposed part of the negative photoresist layer forms a network structure due to the cross-linking and bridging reaction and is not dissolved but retained when encountering the alkaline developing solution.
The photoresist layer is developed by using an alkaline developing solution, and the photoresist layer corresponding to the shading area 301 is very easy to be dissolved by the alkaline developing solution because the photoresist layer is not irradiated by ultraviolet light; because the photoresist layer corresponding to the first light-transmitting area 302 is irradiated by 60-75% of ultraviolet light, part of the negative photoresist is exposed, the negative photoresist irradiated by the ultraviolet light is not dissolved by the alkaline developer to be reserved, and the negative photoresist not irradiated by the ultraviolet light is dissolved and removed by the alkaline developer to finally obtain the main support column with the height of 1.2-1.6 um; because the photoresist layer corresponding to the second light-transmitting area 303 is irradiated by 15-20% of ultraviolet light, part of the negative photoresist is exposed, the negative photoresist irradiated by the ultraviolet light is not dissolved by the alkaline developer to be reserved, and the negative photoresist not irradiated by the ultraviolet light is dissolved and removed by the alkaline developer to finally obtain the auxiliary supporting column with the height of 0.8-1.2 um.
Commonly used alkaline developers include strong base systems typified by KOH (K is an alkali metal) and weak base systems typified by a bicarbonate salt.
According to the above embodiments:
the embodiment of the invention provides a liquid crystal display panel and a preparation method thereof, wherein the liquid crystal display panel comprises: a first substrate; the second substrate is arranged in a closing mode with the first substrate, one side, close to the first substrate, of the second substrate is provided with a supporting column, the supporting column comprises a main supporting column and an auxiliary supporting column, the height of the main supporting column is 1.2-1.6 microns, and the height of the auxiliary supporting column is 0.8-1.2 microns; and the liquid crystal is filled between the first substrate and the second substrate. The height requirement of the support column of the display with high refresh frequency and quick response time is met, the liquid crystal box thickness requirement of the display with high refresh frequency and quick response time is further met, and the problem that the support column of the display with high refresh frequency and quick response time is difficult to prepare in the prior art is solved; in addition, the preparation method of the liquid crystal display panel provided by the embodiment of the invention avoids the problems of influence on the stability and quality of the photoresist layer caused by bubbles in the film layer, uneven film layer, strip-shaped stripes and the like due to too small thickness of the photoresist layer, can realize mass production, and is beneficial to the production and practical application of the liquid crystal display panel.
In summary, although the present invention has been described with reference to the preferred embodiments, the above-described preferred embodiments are not intended to limit the present invention, and those skilled in the art can make various changes and modifications without departing from the spirit and scope of the present invention, therefore, the scope of the present invention shall be determined by the appended claims.
Claims (10)
1. A liquid crystal display panel, comprising:
a first substrate;
the second substrate is arranged in a closing mode with the first substrate, one side, close to the first substrate, of the second substrate is provided with a supporting column, the supporting column comprises a main supporting column and an auxiliary supporting column, the height of the main supporting column is 1.2-1.6 microns, and the height of the auxiliary supporting column is 0.8-1.2 microns;
and the liquid crystal is filled between the first substrate and the second substrate.
2. The liquid crystal display panel of claim 1, wherein the material of the support posts is a negative photoresist material.
3. The liquid crystal display panel of claim 1, wherein the main supporting columns are in contact with the first substrate, and the auxiliary supporting columns are not in contact with the first substrate.
4. The liquid crystal display panel of claim 1, wherein the first substrate further comprises a black matrix, and the support columns correspond to the black matrix.
5. The liquid crystal display panel of claim 4, wherein the first substrate further comprises a color resist, and the color resist is disposed in an opening region surrounded by the black matrix.
6. The liquid crystal display panel of claim 4, wherein the second substrate further comprises a color resist corresponding to an opening area surrounded by the black matrix.
7. A method for manufacturing a liquid crystal display panel, for manufacturing the liquid crystal display panel according to any one of claims 1 to 6, the method comprising:
preparing a first substrate and a second substrate;
preparing support pillars on the second substrate; the supporting columns comprise main supporting columns and auxiliary supporting columns, the height of each main supporting column is 1.2-1.6 um, and the height of each auxiliary supporting column is 0.8-1.2 um;
the first substrate and the second substrate are combined, and liquid crystal is filled between the first substrate and the second substrate; the supporting column is located on one side, close to the first substrate, of the second substrate.
8. The method of manufacturing of claim 7, wherein the step of manufacturing the support pillars on the second substrate comprises:
preparing a photoresist layer on the second substrate;
and exposing and developing the photoresist layer by adopting a half-tone mask plate to obtain the support pillar.
9. The method of claim 8, wherein the halftone mask includes a light-shielding region corresponding to a portion other than the support pillars, a first light-transmitting region having a light transmittance of 0, the first light-transmitting region corresponding to the main support pillars, the first light-transmitting region having a light transmittance of 60 to 75%, the second light-transmitting region corresponding to the auxiliary support pillars, the second light-transmitting region having a light transmittance of 15 to 20%.
10. The method according to claim 8, wherein the step of preparing a photoresist layer on the second substrate comprises:
depositing a layer of uniform negative photoresist with the thickness of 2.2-2.8 um on the second substrate by adopting a coating process;
and solidifying the negative photoresist to obtain the photoresist layer.
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| CN112908165A (en) * | 2021-01-21 | 2021-06-04 | 厦门天马微电子有限公司 | Display panel and display device |
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