Plasm display device
Technical field
The present invention relates to a kind of plasm display device, particularly a kind of plasm display device with bigger main clear zone.
Background technology
General plasm display device (Plasma Display Panel, abbreviation PDP) front plate electrodes is to make with known semiconductor fabrication, can be divided into two kinds of penetrating type and reflection-types by its luminous mode, wherein so-called penetrating type PDP is meant that fluorescent material is formed on the header board; Reflective PDP then refers to fluorescent material and is formed on the plate of back.Research now is the PDP development of orientating reflex type.
Front plate electrodes can be divided into two kinds, and one is transparency electrode, generally is to utilize the ITO material to make, and another is an auxiliary electrode, is opaque material, and is general then be the three-decker that adopts Cr/Cu/Cr or Cr/Al/Cr etc.At present, adopt the PDP of known front plate electrodes structure, when luminous, can cause in same pixel (pixel), the phenomenon that has bright dark bright dark bright dark space to distribute, cause effectively focus utilization of clear zone light, and can cause the dark space bright partially, simultaneously, at the adhesion of auxiliary electrode and harmful effect is all being arranged aspect the etching.
With reference to Fig. 1 a, it is the structure of general PDP, comprising: pair of parallel opposing substrates 10 includes the first substrate 10a and the second substrate 10b; Many to transparency electrode 12, be formed on the above-mentioned first substrate 10a, extend to first direction, parallel to each other, each is equi-spaced apart to transparency electrode 12 on perpendicular to the second direction of above-mentioned first direction simultaneously; Many to auxiliary electrode 14, be formed on above-mentioned manyly on the transparency electrode 12, extend to first direction, parallel to each other; One dielectric layer 16, cover the whole first substrate 10a and on transparency electrode 12 and auxiliary electrode 14; Many group addressing-electrodes 18 are formed on the above-mentioned second substrate 10b, extend to second direction, and parallel to each other, each addressing-electrode 18 is an equi-spaced apart on first direction simultaneously; A plurality of walls 20 are formed on the second substrate 10b, parallel with these a plurality of addressing-electrodes 18, and be pel array in order to define this discharge space; And a plurality of fluorescence coatings 22, be formed on 20 of above-mentioned walls, in order to when applying voltage, when the gas in the guiding discharge space begins to discharge, be subjected to the effect of ultraviolet light of discharge generation and luminous at above-mentioned addressing-electrode 18 and above-mentioned transparency electrode 12 and auxiliary electrode 14.
Wherein, between two substrates 10a, 10b, charged into gas, generally be He gas, when electrode passed to the voltage of suitable polarity, the gas that charges between forward and backward substrate 10a, 10b can collapse (breakdown) phenomenon, gas is by a large amount of ionizations, so the generation plasma, and the ultraviolet light that utilizes plasma to produce excites the fluorescent material of the red, green, blue look of specific pattern, after fluorescent material is stimulated, can emit visible light, and visible light can penetrate via prebasal plate.In existing front plate electrodes structure, with reference to Fig. 1 b, auxiliary electrode 14 is affixed on the transparency electrode 12 fully, and problem because of aiming in making, usually there is a bit of distance at the edge of auxiliary electrode 14 and the edge of transparency electrode 12, generally be about 10~20 μ m, this position is the part of printing opacity, and the material of auxiliary electrode 14 is light tight, so in the time of can causing fluorescent material to radiate light, except main clear zone, between the dark space, still have 3 little clear zones to exist, cause the dark accurate position meeting of dark space low inadequately, influence correlative value.In addition, as the auxiliary electrode of Cr/Cu/Cr structure, wherein the Cr layer is not good with the tackness of the ITO material that forms transparency electrode, peels off in follow-up technology easily.And, in etching process,, can cause the Cr layer that bigger lateral etch is arranged because of having the problem of current potential between Cu/Cr/ITO, more reduced the tackness between auxiliary electrode and transparency electrode.And, when forming dielectric layer, may cause residual bubble, these situations are in large-sized PDP, because inhomogeneity problem can cause bigger influence.
In prior art, at the bad problem of contrast, there is proposition in known PDP structure, header board to be added black-tape, with the improvement contrast.Its mode that forms black-tape can that is to say that black-tape 30,32 can be formed at each between the transparency electrode 12 as Fig. 2 or shown in Figure 3, perhaps can form and cover to be positioned at each space to 12 of transparency electrodes.Yet, no matter be that a kind of mode, though it can improve contrast, can't be at fixing pixel size, with the clear zone expanded range.
Summary of the invention
Thus, in order to solve the problem of prior art, the objective of the invention is to propose a kind of plasm display device, it can enlarge the scope in clear zone under the situation of fixing pixel size.
Another object of the present invention is to provide a kind of plasm display device, its auxiliary electrode has preferable tack, can avoid being subjected to the external force effect in the mill and peels off, the acceptance rate when making to promote plasm display device.
In order to achieve the above object, the present invention utilizes change to form the position of auxiliary electrode in the mill, makes auxiliary electrode and be not only with transparency electrode to contact, also while and substrate contacts.So, though,, therefore can improve the tack of whole auxiliary electrode because chromium is good to the tack of glass substrate as the chromium (Cr) of auxiliary electrode material and poor as the tack between the ITO of transparent electrode material.Moreover, if the formation position of auxiliary electrode is offset to the outside of transparency electrode, then can make the clear zone area of transparency electrode increase.
In addition, as mentioned above, in etching process, because of having the problem of current potential between Cu/Cr/ITO, can cause the Cr layer that bigger lateral etch is arranged, so making auxiliary electrode directly and during substrate contacts, just can avoid the generation of above-mentioned potential problem, just can prevent that also the Cr layer from having bigger lateral etch, therefore, also can improve the tack of auxiliary electrode.
Description of drawings
In order to illustrate further method of the present invention, structure and feature, existing accompanying drawings is preferable
Embodiment is as follows, wherein:
Fig. 1 a is the stereographic map of the structure of a known plasm display device.
Fig. 1 b is the sectional view of the plasm display device shown in Fig. 1 a.
Fig. 2 is the sectional view of the structure of another kind of known plasm display device.
Fig. 3 is the sectional view of the structure of another kind of known plasm display device.
Fig. 4 is the sectional view according to the structure of the plasm display device of one embodiment of the invention.
Fig. 5 is according to the sectional view of the structure of the plasm display device of an embodiment more of the present invention
Fig. 6 is the sectional view of the structure of plasm display device according to still another embodiment of the invention
Fig. 7 is the sectional view of the structure of plasm display device according to another embodiment of the present invention
Embodiment
When making the disclosed plasm display device of the present invention, can adopt the technology similar and make parameter to known plasm display device, need not to change significantly the step of manufacturing.Therefore, general plasm display device fabricator uses original equipment can implement the present invention, needn't increase extra cost again.
First embodiment according to the invention, in order to improve the tack of auxiliary electrode, can be in the step of etching transparency electrode, simultaneously etching is carried out in the position that forms auxiliary electrode on the transparency electrode, so, after forming auxiliary electrode, because auxiliary electrode is direct and substrate contacts, so it has good tack.
With reference to Fig. 4, in the present embodiment, plasm display device is to comprise: the pair of parallel opposing substrates, include the first substrate 10a and the second substrate 10b, mutually in the face of and form a discharge space; Many to transparency electrode 42, be formed on the described first substrate 10a, extend to first direction, parallel to each other, each is equi-spaced apart to transparency electrode 42 on perpendicular to the second direction of described first direction simultaneously; Many to auxiliary electrode 44, be formed on described manyly on the transparency electrode 42, extend to first direction, parallel to each other, and each is to be formed on each symmetrically to the relative outside on the transparency electrode 42 to auxiliary electrode 44; One dielectric layer 16, cover the whole first substrate 10a and on transparency electrode 42 and auxiliary electrode 44; A plurality of addressing-electrodes 18 are formed on the described second substrate 10b, extend to second direction, and are parallel to each other, and each addressing-electrode 18 is an equi-spaced apart on first direction simultaneously; A plurality of walls (not being shown in the sectional view) are formed on the second substrate 10b, parallel with these a plurality of addressing-electrodes 18, and be pel array in order to define this discharge space; A plurality of fluorescence coatings 22 are formed between above-mentioned wall, in order to when applying voltage at described addressing-electrode 18 and described transparency electrode 42 and auxiliary electrode 44, when the gas in the guiding discharge space begins to discharge, are subjected to the effect of ultraviolet light of discharge generation and luminous.
But, though the foregoing description can improve the tack of auxiliary electrode, but because it is the same with the position of formation auxiliary electrode in the known plasm display device to form the position of auxiliary electrode, so under the situation of fixing pixel size, and can't enlarge the clear zone of plasm display device.
In second embodiment of the present invention, except the tack of improving auxiliary electrode, in order to enlarge the clear zone of plasm display device further,, make auxiliary electrode be formed on transparency electrode and the substrate so the formation position of auxiliary electrode is offset to the outside of transparency electrode.So, because auxiliary electrode and substrate contacts can be improved its tack, simultaneously because it is to the skew of the outside of transparency electrode, so can enlarge the clear zone area of transparency electrode inboard.
With reference to Fig. 5, according to present embodiment, plasm display device comprises: the pair of parallel opposing substrates, include the first substrate 10a and the second substrate 10b, mutually in the face of and form a discharge space; Many to transparency electrode 12, be formed on the described first substrate 10a, extend to first direction, parallel to each other, each is equi-spaced apart to transparency electrode 12 on perpendicular to the second direction of described first direction simultaneously; Many to auxiliary electrode 54, be formed on described manyly on the transparency electrode 12, extend to first direction, parallel to each other, and each is to be formed on each symmetrically to the relative outside on the transparency electrode 12 to auxiliary electrode 54; One dielectric layer 16, cover the whole first substrate 10a and on transparency electrode 12 and auxiliary electrode 54; A plurality of addressing-electrodes 18 are formed on the described second substrate 10b, extend to second direction, and are parallel to each other, and each addressing-electrode 18 is an equi-spaced apart on first direction simultaneously; A plurality of walls are formed on the second substrate 10b, parallel with these a plurality of addressing-electrodes 18, and be pel array in order to define this discharge space; A plurality of fluorescence coatings 22 are formed between described wall, in order to when applying a voltage to described addressing-electrode 18 and described transparency electrode 12 and auxiliary electrode 54, when the gas in the guiding discharge space begins to discharge, are subjected to the effect of ultraviolet light of discharge generation and luminous.
In the above-described embodiments, data with reality, the height of auxiliary electrode is about 2.4 μ m, width is about 70~100 μ m, and the height of transparency electrode is about 0.13 μ m, width is about 250~350 μ m, and the main clear zone width of as can be known known plasm display device is about 400 μ m.Adopt the structure of present embodiment, compare with known person, its main clear zone can enlarge about 400 μ m, and in other words, whole main clear zone can enlarge about 10%.
Among two embodiment in front, all need only revise the pattern on the photomask in the mill, get final product according to original step manufacturing again.In first embodiment, must revise the pattern of the photomask of transparency electrode, and in second embodiment, then must revise the pattern of the photomask that covers auxiliary electrode.
Moreover, use structure of the present invention, the contrast when showing in order to improve, similarly can between each is to transparency electrode 12, form black-tape 34, as shown in Figure 6, and for fear of the situation that is short-circuited, preferably make black-tape, for example ink (ink) or carbon black with non electrically conductive material.Because ink or carbon black become when solid-state from liquid state, have the phenomenon of contraction again, so, black-tape 36 directly can be formed and covers between the space of adjacent two pairs of electrodes 54, as shown in Figure 7 for further opposing black-tape shrinks the stress that produces.